WO1999042903A1 - Terpolymere radiosensible, compositions de resine photosensible a base de ce terpolymere et systemes a deux couches de 193 nm - Google Patents

Terpolymere radiosensible, compositions de resine photosensible a base de ce terpolymere et systemes a deux couches de 193 nm Download PDF

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Publication number
WO1999042903A1
WO1999042903A1 PCT/US1999/003861 US9903861W WO9942903A1 WO 1999042903 A1 WO1999042903 A1 WO 1999042903A1 US 9903861 W US9903861 W US 9903861W WO 9942903 A1 WO9942903 A1 WO 9942903A1
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Prior art keywords
units
terpolymer
radiation
mol
methyl
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PCT/US1999/003861
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English (en)
Inventor
Ulrich Schaedeli
Andrew J. Blakeney
Thomas Steinhausler
Daniela White
Allen H. Gabor
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Olin Microelectronic Chemicals, Inc.
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Publication of WO1999042903A1 publication Critical patent/WO1999042903A1/fr

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains

Definitions

  • This invention relates to a new radiation sensitive terpolymer for use as a top layer resist in a bilayer system for use in 193 nm photolithography.
  • the invention also relates to radiation sensitive photoresist compositions comprising a new terpolymer and to a process for the lithographic treatment of a substrate by means of the photoresist composition, as well as a process for the production of electronic components using the new terpolymer in a radiation sensitive photoresist top layer coating in a 193 nm lithographic system.
  • Photoresists without a sufficiently high proportion of aromatic components e.g., resists based on methacrylate resins, have proven sufficiently transparent for radiation below 260 nm, but they do not have the plasma etch resistance that is customary for resists based on aromatic resins; plasma etching being one principal method for producing microstructures on silicon substrates.
  • the plasma etch resistance is essentially based on the aromatic groups in these resists.
  • ArF excimer base (193 nm) lithography is a prime candidate for sub 0.18 ⁇ m lithography.
  • the leading resist technology approaches for practical 193 nm lithography are top surface imaging (TSI) bilayer resists and single layer.
  • TSI top surface imaging
  • Each approach has its own characteristic advantages and disadvantages as the result of the underlying technology and the materials, which can be utilized.
  • the numerous problems for the 193 nm photoresist chemists to solve, (e.g., transparency, photospeed, adhesion, sensitivity, various process time delay latitudes, and plasma etch resistance), are somewhat different for each technology due to the materials requirements.
  • Lithographic aspect ratios and other issues require that resist films be thinner (about 0.5 ⁇ m) for sub 0.18 ⁇ m devices. This, in turn, requires either greatly improved etch processes or improved etch resistance or both. Thus, having excellent plasma etch resistance is critical and it is preferable that it be even better than before because of the thinner films. This presents a materials problem to the resist chemist because now both the aromatic character and the alkali-solubilizing group must be replaced. Thus, new materials, or groups of materials, with high transparency, etch resistance, and a different alkali-solubilizing group are required.
  • bilayer resists an initial resin coating, commonly called an undercoat layer, which is not photoimageable, is introduced onto the substrate. This undercoat layer provides the plasma etch resistance when etching the substrate.
  • the substrate coated in this way is selectively exposed, i.e., in an image-forming way, in the conventional manner and then treated with a suitable developer, so that a desired image-forming structure is generated in the covering coating that can be photostructured.
  • a subsequently conducted treatment in oxygen plasma leads to the organosilicon compounds being oxidized to silicon oxides, at least on the surface, and these oxides form a closed etching barrier for the oxidative decomposition of the organic material that lies underneath, particularly the planarizing layer, while the planarizing layer is removed completely in an oxidative manner on those places that are not coated by the silicon- containing covering layer.
  • Such bilayer resists generally offer improved depth of focus, resolution, substrate compatibility, and aspect ratios.
  • the present invention provides a new terpolymer suitable for use for forming a top layer photoimageable coating in a 193 nm bilayer system providing high-resolution lithography.
  • the present invention also provides a new photoresist composition for forming such a photoimageable coating on a substrate for use in 193 nm photolithography.
  • the invention also provides such a terpolymer with chemically amplified (acid labile) moieties and organosilicon moieties suitable for use as the binder resin for a photoimageable etching resist photoresist composition suitable for use in 193 nm photolithographic processes.
  • novel terpolymers of this invention have the following structural units: about 1 to 55 wt % of units of the formula
  • R is a methyl or hydroxyethyl group
  • R 1 is a hydrogen atom, a methyl group or a — CH 2 COOCH 3 group
  • R 2 and R 3 are each independently a hydrogen atom or a methyl group.
  • a photoresist composition for forming a photoimageable top layer coating in a 193 nm bilayer system are produced from these terpolymers by forming the photoresist composition from the terpolymer, a suitable photoacid generator (PAG) compound, a base comprising 2,4,5-2,4,5- triphenylimidazole (TPI), and a solvent comprising ethyl lactate (EL), propylene glycol methyl ether acetate (PGMEA) or a mixture of said solvents.
  • PAG photoacid generator
  • TPI 2,4,5-2,4,5- triphenylimidazole
  • EL ethyl lactate
  • PGMEA propylene glycol methyl ether acetate
  • a bilayer coated substrate for use in 193 nm photolithography is produced by applying an undercoat or planarizing layer to the substrate and then applying onto the undercoated substrate a photoimageable top layer from the photoresist composition of the terpolymer as described in the previous paragraph.
  • the new terpolymers of this invention provide photoresist compositions suitable for use at 193 nm wavelength that produce an excellent combination of adhesion, resolution and plasma etch resistance.
  • the terpolymers of this invention can be prepared from the corresponding monomers by any suitable conventional polymerization processes, such as for example, by free radical, controlled radical or group transfer polymerization.
  • the number average molecular weight Mn, of the terpolymers of the invention can range from about 7,000 to about 40,000, preferable from about 8,000 to about 25,000, and most preferably from about 10,000 to about 20,000.
  • terpolymers of this invention there can be mentioned a terpolymer comprising about 71 mol % tetrahydropyranyl methacrylate units, about 13 mol % methylmethacrylate units and about 16 mol % methylacryloxypropyltris (trimethylsiloxy) silane units, and a terpolymer of said units comprising about 52/30/18 mol % of the units, respectively.
  • terpolymers with less than about 52 mol % tetrahydropyranyl methacrylate units or higher than 18 mol % of the silicon- containing units do not perform well in photoresist compositions since they experience micropeeling and adhesion loss.
  • R, R 1 , R 2 and R 3 are each methyl groups.
  • the terpolymers of this invention are used with a photoacid generator compound (PAG) to form radiation-sensitive photoresist compositions for providing a photoimageable top coat layer of a 193 nm bilayer system.
  • the radiation-sensitive compositions of this invention will generally contain about 80 to about 99.9 wt % of the terpolymer of this invention, about 0.1 to about 10 wt % photoacid generator (PAG) and 2,4, 5-2,4, 5-triphenylimidazole (TPI) base in an amount of from about 1 to about 5 parts base per 5 parts PAG compound, i.e., a ratio of PAG/TPI of from about 5:1 to 1 :1 ; preferably about 3.33:1 to 1 :1.
  • This ratio of PAG to TPI base is quite different than the ratio of PAG to base, namely 10:1 to 40:1 , usually employed with such photoresist compositions. At a ratio above 5:1 , micropeeling occurs and below the ratio of 1 :1 , photospeed is too slow and scumming occurs.
  • bases other than TPI with the terpolymers of this invention do not provide radiation-sensitive compositions with acceptable photolithographic properties.
  • Other bases produce compositions with photospeeds that are too fast and usually produce micropeeling as demonstrated in the comparative results presented hereinafter.
  • the components of the radiation-sensitive composition are to be dissolved in an ethyl lactate or propylene glycol methyl ether acetate or mixtures thereof, otherwise the compositions are characterized as non-imageable because of the photospeed being either too fast or too slow.
  • Any suitable photoacid generator particularly onium sulfonate salts, which generate acid under the effects of active radiation from exposure sources ranging from election beam, ArF excimer lasers and KrF excimer lasers can be used to form the radiation-sensitive compositions with the terpolymers of this invention to prepare the radiation-sensitive photoresist compositions of this invention.
  • aryl sulfonium and iodonium sulfonates especially triaryl sulfonium and iodonium sulfonates.
  • the aryl groups of the sulfonium or iodonium moieties may be substituted or unsubstituted aryl groups, such as unsubstituted phenyl or naphthyl, or these moieties may be substituted by one or more substituents such as halogen, C ⁇ - alkyl, C ⁇ alkoxy, -OH and/or nitro substituents.
  • the aryl groups or substituents on each aryl group may be the same or different.
  • the anion of the photoacid generator may be any suitable anion of a suitable organic sulfonic acid, such as acids of aliphatic, cycloaliphatic, carbocyclic-aromatic, heterocyclic-aromatic or araliphatic sulfonic acids. These anions may be substituted or unsubstituted. Partially fluorinated or perfluorinated sulfonic acid derivatives or sulfonic acid derivatives substituted in the neighboring position to the respective acid group are
  • substituents are halogens, such as chlorine, and particularly fluorine, alkyl, such as methyl, ethyl or n-propyl, or alkoxy, such as methoxy, ethoxy or n-propoxy and the like.
  • the anion is a monovalant anion from a partially fluorinated or perfluorinated sulfonic acid.
  • Preferred are fluorinated lower alkyl sulfonate anions.
  • onium salts are triphenyl sulfonium bromide, triphenyl sulfonium chloride, triphenyl sulfonium iodide, triphenylsulfonium methane sulfonate, triphenylsulfonium trifluoromethane sulfonate, triphenylsulfonium hexafluoro-propane sulfonate, triphenylsulfonium nonafluorobutane sulfonate, triphenylsulfonium phenyl sulfonate, triphenylsulfonium 4-methylphenyl sulfonate, triphenylsulfonium 4-methoxyphenyl sulfonate, triphenylsulfonium 4-chlorophenyl sulfonate, triphenyl-sulfonium camphorsulfonate, 4-methylphenyl-
  • the photoresist compositions of the invention may also contain suitable conventional additives in conventional quantities, stabilizers, pigments, dyes, colorants, fillers, antistriation agents, bonding agents, leveling agents, wetting agents and softeners, generally in an amount of up to about 3% by weight of the total composition.
  • the photoresist compositions are dissolved in one of the suitable solvents for the application.
  • the selection of the solvent and the concentration are primarily directed according to the type of composition and according to the coating process.
  • the radiation-sensitive resist formulations according to the invention may be produced, for example, by mixing of the individual components with stirring, whereby a homogeneous solution is obtained.
  • the compositions of the invention are suitable as positive photoresists, which dissolve better in an aqueous-alkaline solution after radiation, and a subsequent heat treatment, if needed.
  • Another aspect of this invention is a process for the lithographic treatment of a substrate by means of a multilayer technique, in which: the substrate is provided with a first coating of a film-forming aromatic polymer material and then suitably cured, a second coating containing a terpolymer of the invention and a substance that forms acid under the effect of actinic radiation of a wavelength of about 193 nm, is introduced on this first coating, the thus-coated substrate is irradiated in an image-forming way with radiation of a wavelength of 248 to 254 or of 193 nm, to which the photoacid generator is sensitive,
  • the irradiated substrate is subjected to a heat treatment, the heat treated irradiated substrate is treated with an aqueous alkaline developer solution, until the irradiated regions of the second coating are removed, and after this, the substrate is treated with an oxygen-containing plasma until the first coating is completely removed on those places where it is not covered by the second coating.
  • any suitable film-forming organic polymers can be used as the film- forming organic material for the first coating (undercoat layer) with the use of the multilayer technique.
  • Particularly preferred are phenolic resins, particularly novolak resins, such as formaldehyde cresol or formaldehyde phenol novolaks, polyimide resins, poly(meth) acrylate resins and styrene- allyl alcohol copolymer resins, the latter being preferred.
  • the undercoat layer is generally 0.5 to 1 ⁇ m thick.
  • the resin is first dissolved in a suitable solvent and then introduced by the usual coating processes onto the substrate, e.g., by dipping, blade coating, painting, spraying, particularly by electrostatic spraying, and reverse-role coating, and above all by spinning, and subsequently cured by methods known in the art.
  • the second coating containing a terpolymer of the invention, a substance that forms acid under the effect of actinic radiation of a wavelength below 300 nm, preferably below 260 nm, and more preferably at about 193 nm, as well as other additives, if needed, is introduced onto the first coating.
  • the second coating may also be produced with any conventional coating process, for example, one of those named above, but here also spin coating is particularly preferred.
  • the covering layer is appropriately approximately 0.2 to 0.5 ⁇ m thick.
  • Exposure is preferably produced with actinic radiation of a wavelength of 190-300 nm, particularly of 190 to 260 nm. All known sources of the respective radiation can be utilized in principle for irradiation, for example, mercury high-pressure
  • the image-forming irradiation is produced either by means of a mask, preferably a chromium-quartz mask, or-when laser exposure devices are used-also by moving the laser beam in a computer-controlled manner over the surface of the coated substrate and thus the image is produced.
  • a mask preferably a chromium-quartz mask
  • laser exposure devices are used-also by moving the laser beam in a computer-controlled manner over the surface of the coated substrate and thus the image is produced.
  • the high sensitivity of the photoresist materials of the invention is very advantageously noticeable in that it permits high writing speeds at relatively low intensities.
  • the high sensitivity of the resist is also of advantage for exposure by means of steppers, where very short exposure times are desired.
  • the process of the invention also encompasses, between selective irradiation and treatment with a developer, a heating of the coating as a further process measure.
  • a heating of the coating By means of this heat treatment, the so-called "post-exposure bake", a practically complete reaction of the resist material, is obtained in an especially rapid time.
  • the time and temperature of this post-exposure bake may vary within broad regions and essentially depend on the composition of the resist, particularly by the type of its acid-sensitive photoacid generator used, as well as the concentrations of these two components.
  • the exposed resist is subjected to several seconds up to several minutes of temperatures of approximately 50-150°C.
  • the irradiation areas of the top coat that are more soluble in aqueous alkaline as a consequence of the irradiation are dissolved out with an aqueous-alkaline developer, i.e., with an aqueous solution of bases to which small quantities of organic solvents or their mixtures may also be added as needed.
  • aqueous alkaline solution as they are also utilized for the development of conventional novolak naphthoquinone diazide positive resist coatings.
  • developers include, e.g., aqueous solutions of alkali metal silicates, phosphates, hydroxides, and carbonates, but particularly tetraalkylammonium hydroxide solutions, such
  • tetramethylammonium hydroxide solution which is free of metal ions.
  • wetting agents and/or organic solvents may also be added to these solutions.
  • Typical organic solvents, which may be added to the developer fluids, are, for example, 2-ethoxyethanol, isopropanol or ethanol, as well as mixtures of two or more of these solvents.
  • the thus-treated workpiece is treated with an oxygen or oxygen-containing plasma, whereby a closed silicon oxide layer is formed within several seconds, at least in the uppermost regions of the top coating of organosilicon components in the covering layer, and this silicon oxide layer protects the regions of the organic material lying underneath against an attack of oxygen plasma.
  • Treatment with the oxygen plasma is continued until the substrate is completely free in those places where the top coating has been removed beforehand by means of the developer. In general, an etching time of 5 to 15 minutes is sufficient for this purpose.
  • the substrate can finally be subjected to a conventional structuring treatment, e.g., a dry etching in halogen or fluorocarbon plasmas on those places free of the coating.
  • the structure and composition of the terpolymer was analyzed using a Bruker 250 MHz proton NMR-spectrometer and found to be consistent with the expected composition.
  • undercoat solution The undercoat was spun coated on a silicon water and baked at 120°C for 60 seconds to yield a 0.5 micron thick film.
  • the undercoat film was then Deep UV cured using a Fusion System DUV cure unit model number M150PC.
  • the wafer was heated at 85°C for 10 seconds at low lamp intensity.
  • the temperature was then ramped to 120°C over 30 seconds with the lamp on high intensity.
  • the temperature was maintained at 125°C for 20-60 seconds, the time depending on which particular unit was being used.
  • the lamp intensity remained high during this period.
  • the wafer was then removed from the Fusion cure system and cooled to room temperature.
  • the cured film usually was approximately 0.45 ⁇ m thick.
  • Example 4 Preparation of resist film A silicon wafer with undercoat prepared in Example 3, was spun- coated with the photoresist formulation of Example 2 and baked at 100°C for 1 minute to yield a 0.25 ⁇ m thick film on top of the undercoat. The coated wafer was then imagewise exposed using a 0.6 NA ISI 193 nm Microstepper. The wafer was then post exposure baked at 100°C for 1 minute. The film was then immersion developed for 30 seconds in 0.262 N aqueous tetramethylammonium hydroxide (TMAH); rinsed, and spun dry. Images from scanning electron microscopy showed the resist could resolve L/S features as small as 0.12 micron.
  • TMAH aqueous tetramethylammonium hydroxide
  • the undercoat pattern transfer was carried out using a Trikon (formerly PMT) Pinnacle 8000 HDP etcher.
  • the etching conditions were 1375 W (source), 350 W (bias), -30°C and 60 seem O 2 flow at 1.875 mtorr. Images from scanning electron microscopy after the etch showed the resist/undercoat stack could resolve L/S features as small as 0.13 micron.
  • the photoresist compositions of the terpolymer of this invention utilize 2,4,5-triphenylimidazole as the base since other bases produce photoresist compositions that result in micropeeling and photospeeds that are too fast as shown by the following examples.
  • the terpolymer used in these examples was similar to the terpolymer produced in Example 1 , the solvent was PGMEA and the PAG was triphenylsulfonium triflate used at 3 wt % of the photoresist composition.
  • the bases evaluated were the base of this invention, namely 2,4,5- triphenylimidazole (TPI), and comparative bases hexamethyltriethylenetetraamine (HMETA), tetramethyl-hexanediamine (TMHD), oxydianiline (ODA), piperonylamine (pip. am.), N,N- dimethyiformamide di-t-butylacetal (di-Bu a.) and N,N-dimethylformamide diisopropyl acetal (diprop. a.).
  • TPI 2,4,5- triphenylimidazole
  • HMETA hexamethyltriethylenetetraamine
  • TMHD tetramethyl-hexanediamine
  • ODA oxydianiline
  • piperonylamine pip. am.
  • di-Bu a. N,N-dimethylformamide diisopropyl acetal
  • TPI 3.33 clean imaging, vertical wall profiles, resolution 0.16 ⁇ m (about 9 mJ/cm2), slight micropeeling at partially resolved 0.12 ⁇ m features (Mn of polymer 9300)
  • a HMTETA 4.29 distorted images, poor resolution bridging, and scum.

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)

Abstract

Terpolymère avec fractions amplifiées chimiquement (instabilité acide) et fractions organosiliciées convenant comme liant résine pour une composition de résine photosensible/résine photoimageable pouvant être utilisée pour des procédés photolithographiques de 193 nm. Les terpolymères possèdent les unités structurelles (I), (II), (III) où R est un groupe méthyle ou hydroxyméthyle, R1 est un atome d'hydrogène, un groupe méthyle ou un groupe -CH¿2?COOCH3 et R?2 et R3¿ sont chacun et indépendamment un atome d'hydrogène ou un groupe méthyle.
PCT/US1999/003861 1998-02-23 1999-02-23 Terpolymere radiosensible, compositions de resine photosensible a base de ce terpolymere et systemes a deux couches de 193 nm WO1999042903A1 (fr)

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US7559298P 1998-02-23 1998-02-23
US60/075,592 1998-02-23

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WO1999042903A1 true WO1999042903A1 (fr) 1999-08-26

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6165682A (en) * 1999-09-22 2000-12-26 Arch Specialty Chemicals, Inc. Radiation sensitive copolymers, photoresist compositions thereof and deep UV bilayer systems thereof
EP1096319A1 (fr) * 1999-10-29 2001-05-02 Fuji Photo Film Co., Ltd. Composition pour photoréserve de type positif
US6380339B1 (en) 2000-09-22 2002-04-30 Industrial Technology Research Institute Silicon-containing vinyl copolymer and resist composition containing the same

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4839109A (en) * 1985-07-19 1989-06-13 Japan Atomic Energy Research Institute Process for producing a contact lens
US5395734A (en) * 1992-11-30 1995-03-07 Minnesota Mining And Manufacturing Company Shoot and run printing materials
US5856071A (en) * 1993-09-24 1999-01-05 Fujitsu Limited Resist material including si-containing resist having acid removable group combined with photo-acid generator

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4839109A (en) * 1985-07-19 1989-06-13 Japan Atomic Energy Research Institute Process for producing a contact lens
US5395734A (en) * 1992-11-30 1995-03-07 Minnesota Mining And Manufacturing Company Shoot and run printing materials
US5856071A (en) * 1993-09-24 1999-01-05 Fujitsu Limited Resist material including si-containing resist having acid removable group combined with photo-acid generator

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6165682A (en) * 1999-09-22 2000-12-26 Arch Specialty Chemicals, Inc. Radiation sensitive copolymers, photoresist compositions thereof and deep UV bilayer systems thereof
WO2001022163A2 (fr) * 1999-09-22 2001-03-29 Arch Specialty Chemicals, Inc. Copolymeres sensibles au rayonnement, compositions de photoresist et systemes a deux couches sensibles a l'uv profond constitues de ces copolymeres radiosensibles
WO2001022163A3 (fr) * 1999-09-22 2002-09-12 Arch Spec Chem Inc Copolymeres sensibles au rayonnement, compositions de photoresist et systemes a deux couches sensibles a l'uv profond constitues de ces copolymeres radiosensibles
KR100754230B1 (ko) * 1999-09-22 2007-09-03 아치 스페셜티 케미칼즈, 인코포레이티드 방사선 민감성 공중합체, 이의 포토레지스트 조성물 및이의 심 자외선 이층 시스템
EP1096319A1 (fr) * 1999-10-29 2001-05-02 Fuji Photo Film Co., Ltd. Composition pour photoréserve de type positif
US6589705B1 (en) 1999-10-29 2003-07-08 Fuji Photo Film Co., Ltd. Positive-working photoresist composition
KR100788806B1 (ko) * 1999-10-29 2007-12-27 후지필름 가부시키가이샤 포지티브 포토레지스트 조성물
US6380339B1 (en) 2000-09-22 2002-04-30 Industrial Technology Research Institute Silicon-containing vinyl copolymer and resist composition containing the same

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