WO1998055660A1 - Technique de purification de titane et appareil correspondant - Google Patents
Technique de purification de titane et appareil correspondant Download PDFInfo
- Publication number
- WO1998055660A1 WO1998055660A1 PCT/JP1998/002526 JP9802526W WO9855660A1 WO 1998055660 A1 WO1998055660 A1 WO 1998055660A1 JP 9802526 W JP9802526 W JP 9802526W WO 9855660 A1 WO9855660 A1 WO 9855660A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- zone
- titanium
- vapor
- solid
- tiglx
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B34/00—Obtaining refractory metals
- C22B34/10—Obtaining titanium, zirconium or hafnium
- C22B34/12—Obtaining titanium or titanium compounds from ores or scrap by metallurgical processing; preparation of titanium compounds from other titanium compounds see C01G23/00 - C01G23/08
- C22B34/1295—Refining, melting, remelting, working up of titanium
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B34/00—Obtaining refractory metals
- C22B34/10—Obtaining titanium, zirconium or hafnium
- C22B34/12—Obtaining titanium or titanium compounds from ores or scrap by metallurgical processing; preparation of titanium compounds from other titanium compounds see C01G23/00 - C01G23/08
- C22B34/129—Obtaining titanium or titanium compounds from ores or scrap by metallurgical processing; preparation of titanium compounds from other titanium compounds see C01G23/00 - C01G23/08 obtaining metallic titanium from titanium compounds by dissociation, e.g. thermic dissociation of titanium tetraiodide, or by electrolysis or with the use of an electric arc
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B9/00—General processes of refining or remelting of metals; Apparatus for electroslag or arc remelting of metals
- C22B9/02—Refining by liquating, filtering, centrifuging, distilling, or supersonic wave action including acoustic waves
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
Definitions
- This curve s When the temperature is higher or lower than 2 , that is, on the lower right side of the curve s () 2 , only titanium Ti (S) can be present in the solid phase, and TiCI 2 (S) is present in the solid phase. Or that TiGI 3 (S) cannot exist.
- the curve S 02 O Li also low temperature side or high pressure side, i.e. the curve s. If it is located on the upper left side, it means that titanium Ti (S) cannot exist in the solid phase.
- the lower titanium chloride deposited on the inner wall of the separation chamber 6 is continuously scraped off by the scraper 17 and falls into the lower pyrolysis chamber 3.
- the electric furnace 38 is placed in the center of the reaction tube 31 because, for example, low-grade titanium chloride clogged in the left purification chamber 36 is pyrolyzed at the electric furnace 38 position on the left side. This is because the lower titanium chloride generated along with the solidification deposits on the purified titanium in the right purification chamber 37, and if the electric furnace 38 is placed at the center of the reaction tube 3 3, this lower titanium chloride will be located at both ends of the furnace. Solidified around the left and right production chambers 33, 34, and the purified titanium in the left and right purification chambers 36, 37 is protected from contamination with low-grade titanium chloride.
- the electric furnace 8 of this example is a temperature control mechanism, and is configured to surround the reaction vessel 1. In the electric furnace 8, the temperature and the temperature distribution of the production chamber 2, the separation chamber 6, and the thermal decomposition chamber 3 are adjusted.
- the electric furnace 8 is divided into at least three upper and lower stages, and each section can independently adjust the temperature and the temperature distribution arbitrarily.
- the supply amount of titanium tetrachloride in the first production reaction was 60.0 (moI), that is, 11.4 (Kg). This is because titanium tetrachloride vapor at a flow rate of 30 (moI / Hr.) Was supplied for about 2 hours.
- the emission amount of titanium tetrachloride was 23.8 (moI), that is, 4.52 (Kg). After the discharged titanium tetrachloride vapor is liquefied by the condenser, it is stored as liquid titanium tetrachloride in the recovery receiver. This is a numerical value obtained by measuring the amount of liquid stored in this recovery receiver. From the above, the titanium tetrachloride emission was 39.7% of the titanium tetrachloride supply. It is probable that the difference between the supply and the discharge, 6 ⁇ 30/0, was consumed in the production of lower titanium chloride.
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Geology (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Manufacture And Refinement Of Metals (AREA)
Abstract
Cette technique de purification de titane par réaction de titane brut comme matière première avec du tétrachlorure de titane (TiCl4) et ce, afin d'obtenir du titane purifié consiste, (a), à faire réagir le titane brut comme matière première avec du TiCl4 afin de produire de la vapeur de chlorure de titane inférieur (TiClx), (b), à précipiter le TiClx solide à partir de la vapeur de TiClx et, (c), de décomposer par voie thermique le TiClx solide afin de produire du titane purifié, le TiClx étant un chlorure de titane inférieur dans lequel x vaut 2 ou 3. La température t1 (°C) et la pression p1 (Torr) auxquelles se réalise la première étape sont, respectivement, de 750 °C ≤ t1 et log (p1) < 20,158-(21859/(t1 + 273)). La pression (p2) et la température (t2) auxquelles se réalise la deuxième étape sont, respectivement, de 0,001 Torr < p2 < 1520 Torr et de 150 °C < t2 < (21859/(20,158 - log (p2)) - 273 °C. La température t3 (°C) et la pression p3 (Torr) auxquelles se réalise la troisième étape sont, respectivement, de 750 °C ≤ t3 et log (p3) < 20,158-(21859/(t3 + 273)).
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16352897A JPH111728A (ja) | 1997-06-06 | 1997-06-06 | チタンの精製法及びチタンの精製装置 |
JP9/163528 | 1997-06-06 | ||
JP10/131228 | 1998-04-24 | ||
JP13122898A JPH11302752A (ja) | 1998-04-24 | 1998-04-24 | チタンの精製法 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO1998055660A1 true WO1998055660A1 (fr) | 1998-12-10 |
Family
ID=26466126
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP1998/002526 WO1998055660A1 (fr) | 1997-06-06 | 1998-06-08 | Technique de purification de titane et appareil correspondant |
Country Status (2)
Country | Link |
---|---|
TW (1) | TW373026B (fr) |
WO (1) | WO1998055660A1 (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115786737A (zh) * | 2023-01-18 | 2023-03-14 | 海朴精密材料(苏州)有限责任公司 | 一种利用化学气相输运沉积制备高纯低氧钛的方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0853756A (ja) * | 1990-02-15 | 1996-02-27 | Toshiba Corp | 高純度金属材 |
JPH0860350A (ja) * | 1990-02-15 | 1996-03-05 | Toshiba Corp | 高純度金属材の製造方法、スパッタターゲットの製造方法および配線網の形成方法 |
-
1998
- 1998-06-06 TW TW087109005A patent/TW373026B/zh active
- 1998-06-08 WO PCT/JP1998/002526 patent/WO1998055660A1/fr active Application Filing
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0853756A (ja) * | 1990-02-15 | 1996-02-27 | Toshiba Corp | 高純度金属材 |
JPH0860350A (ja) * | 1990-02-15 | 1996-03-05 | Toshiba Corp | 高純度金属材の製造方法、スパッタターゲットの製造方法および配線網の形成方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115786737A (zh) * | 2023-01-18 | 2023-03-14 | 海朴精密材料(苏州)有限责任公司 | 一种利用化学气相输运沉积制备高纯低氧钛的方法 |
Also Published As
Publication number | Publication date |
---|---|
TW373026B (en) | 1999-11-01 |
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