WO1998055660A1 - Technique de purification de titane et appareil correspondant - Google Patents

Technique de purification de titane et appareil correspondant Download PDF

Info

Publication number
WO1998055660A1
WO1998055660A1 PCT/JP1998/002526 JP9802526W WO9855660A1 WO 1998055660 A1 WO1998055660 A1 WO 1998055660A1 JP 9802526 W JP9802526 W JP 9802526W WO 9855660 A1 WO9855660 A1 WO 9855660A1
Authority
WO
WIPO (PCT)
Prior art keywords
zone
titanium
vapor
solid
tiglx
Prior art date
Application number
PCT/JP1998/002526
Other languages
English (en)
Japanese (ja)
Inventor
Shigenori Okudaira
Original Assignee
Shigenori Okudaira
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP16352897A external-priority patent/JPH111728A/ja
Priority claimed from JP13122898A external-priority patent/JPH11302752A/ja
Application filed by Shigenori Okudaira filed Critical Shigenori Okudaira
Publication of WO1998055660A1 publication Critical patent/WO1998055660A1/fr

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22BPRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B34/00Obtaining refractory metals
    • C22B34/10Obtaining titanium, zirconium or hafnium
    • C22B34/12Obtaining titanium or titanium compounds from ores or scrap by metallurgical processing; preparation of titanium compounds from other titanium compounds see C01G23/00 - C01G23/08
    • C22B34/1295Refining, melting, remelting, working up of titanium
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22BPRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B34/00Obtaining refractory metals
    • C22B34/10Obtaining titanium, zirconium or hafnium
    • C22B34/12Obtaining titanium or titanium compounds from ores or scrap by metallurgical processing; preparation of titanium compounds from other titanium compounds see C01G23/00 - C01G23/08
    • C22B34/129Obtaining titanium or titanium compounds from ores or scrap by metallurgical processing; preparation of titanium compounds from other titanium compounds see C01G23/00 - C01G23/08 obtaining metallic titanium from titanium compounds by dissociation, e.g. thermic dissociation of titanium tetraiodide, or by electrolysis or with the use of an electric arc
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22BPRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B9/00General processes of refining or remelting of metals; Apparatus for electroslag or arc remelting of metals
    • C22B9/02Refining by liquating, filtering, centrifuging, distilling, or supersonic wave action including acoustic waves
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00Technologies related to metal processing
    • Y02P10/20Recycling

Definitions

  • This curve s When the temperature is higher or lower than 2 , that is, on the lower right side of the curve s () 2 , only titanium Ti (S) can be present in the solid phase, and TiCI 2 (S) is present in the solid phase. Or that TiGI 3 (S) cannot exist.
  • the curve S 02 O Li also low temperature side or high pressure side, i.e. the curve s. If it is located on the upper left side, it means that titanium Ti (S) cannot exist in the solid phase.
  • the lower titanium chloride deposited on the inner wall of the separation chamber 6 is continuously scraped off by the scraper 17 and falls into the lower pyrolysis chamber 3.
  • the electric furnace 38 is placed in the center of the reaction tube 31 because, for example, low-grade titanium chloride clogged in the left purification chamber 36 is pyrolyzed at the electric furnace 38 position on the left side. This is because the lower titanium chloride generated along with the solidification deposits on the purified titanium in the right purification chamber 37, and if the electric furnace 38 is placed at the center of the reaction tube 3 3, this lower titanium chloride will be located at both ends of the furnace. Solidified around the left and right production chambers 33, 34, and the purified titanium in the left and right purification chambers 36, 37 is protected from contamination with low-grade titanium chloride.
  • the electric furnace 8 of this example is a temperature control mechanism, and is configured to surround the reaction vessel 1. In the electric furnace 8, the temperature and the temperature distribution of the production chamber 2, the separation chamber 6, and the thermal decomposition chamber 3 are adjusted.
  • the electric furnace 8 is divided into at least three upper and lower stages, and each section can independently adjust the temperature and the temperature distribution arbitrarily.
  • the supply amount of titanium tetrachloride in the first production reaction was 60.0 (moI), that is, 11.4 (Kg). This is because titanium tetrachloride vapor at a flow rate of 30 (moI / Hr.) Was supplied for about 2 hours.
  • the emission amount of titanium tetrachloride was 23.8 (moI), that is, 4.52 (Kg). After the discharged titanium tetrachloride vapor is liquefied by the condenser, it is stored as liquid titanium tetrachloride in the recovery receiver. This is a numerical value obtained by measuring the amount of liquid stored in this recovery receiver. From the above, the titanium tetrachloride emission was 39.7% of the titanium tetrachloride supply. It is probable that the difference between the supply and the discharge, 6 ⁇ 30/0, was consumed in the production of lower titanium chloride.

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Geology (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Manufacture And Refinement Of Metals (AREA)

Abstract

Cette technique de purification de titane par réaction de titane brut comme matière première avec du tétrachlorure de titane (TiCl4) et ce, afin d'obtenir du titane purifié consiste, (a), à faire réagir le titane brut comme matière première avec du TiCl4 afin de produire de la vapeur de chlorure de titane inférieur (TiClx), (b), à précipiter le TiClx solide à partir de la vapeur de TiClx et, (c), de décomposer par voie thermique le TiClx solide afin de produire du titane purifié, le TiClx étant un chlorure de titane inférieur dans lequel x vaut 2 ou 3. La température t1 (°C) et la pression p1 (Torr) auxquelles se réalise la première étape sont, respectivement, de 750 °C ≤ t1 et log (p1) < 20,158-(21859/(t1 + 273)). La pression (p2) et la température (t2) auxquelles se réalise la deuxième étape sont, respectivement, de 0,001 Torr < p2 < 1520 Torr et de 150 °C < t2 < (21859/(20,158 - log (p2)) - 273 °C. La température t3 (°C) et la pression p3 (Torr) auxquelles se réalise la troisième étape sont, respectivement, de 750 °C ≤ t3 et log (p3) < 20,158-(21859/(t3 + 273)).
PCT/JP1998/002526 1997-06-06 1998-06-08 Technique de purification de titane et appareil correspondant WO1998055660A1 (fr)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP16352897A JPH111728A (ja) 1997-06-06 1997-06-06 チタンの精製法及びチタンの精製装置
JP9/163528 1997-06-06
JP10/131228 1998-04-24
JP13122898A JPH11302752A (ja) 1998-04-24 1998-04-24 チタンの精製法

Publications (1)

Publication Number Publication Date
WO1998055660A1 true WO1998055660A1 (fr) 1998-12-10

Family

ID=26466126

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP1998/002526 WO1998055660A1 (fr) 1997-06-06 1998-06-08 Technique de purification de titane et appareil correspondant

Country Status (2)

Country Link
TW (1) TW373026B (fr)
WO (1) WO1998055660A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115786737A (zh) * 2023-01-18 2023-03-14 海朴精密材料(苏州)有限责任公司 一种利用化学气相输运沉积制备高纯低氧钛的方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0853756A (ja) * 1990-02-15 1996-02-27 Toshiba Corp 高純度金属材
JPH0860350A (ja) * 1990-02-15 1996-03-05 Toshiba Corp 高純度金属材の製造方法、スパッタターゲットの製造方法および配線網の形成方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0853756A (ja) * 1990-02-15 1996-02-27 Toshiba Corp 高純度金属材
JPH0860350A (ja) * 1990-02-15 1996-03-05 Toshiba Corp 高純度金属材の製造方法、スパッタターゲットの製造方法および配線網の形成方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115786737A (zh) * 2023-01-18 2023-03-14 海朴精密材料(苏州)有限责任公司 一种利用化学气相输运沉积制备高纯低氧钛的方法

Also Published As

Publication number Publication date
TW373026B (en) 1999-11-01

Similar Documents

Publication Publication Date Title
JP3865033B2 (ja) 酸化珪素粉末の連続製造方法及び連続製造装置
EP2105410B1 (fr) Appareil de purification de chlorosilanes et procédé de purification de chlorosilanes
TWI575574B (zh) 自固體材料製備化合物或其中間體的設備與方法及利用化合物與中間體的方法
WO2004050928A1 (fr) Titane a debit eleve et a faible cout et sa production d&#39;alliage
JP5387267B2 (ja) クロロシラン精製装置及び精製方法
US9346681B2 (en) Method for synthesising diamond
US2997385A (en) Method of producing refractory metal
TWI583442B (zh) B2f4之製造程序
JP5335075B2 (ja) 多結晶シリコンの製造方法
CN101679043A (zh) 生产高纯硅的方法和反应器
TWI429792B (zh) 製造固體產物的方法和設備
WO1998055660A1 (fr) Technique de purification de titane et appareil correspondant
JPH01108322A (ja) 蒸留精製方法
JP2005225690A (ja) SiOの製造方法及び製造装置
JPH111728A (ja) チタンの精製法及びチタンの精製装置
US2090451A (en) Manufacture of aluminium
JPH11302752A (ja) チタンの精製法
JP3820198B2 (ja) 精製シリコンの製造装置
JP2001172020A (ja) 高純度六フッ化タングステンの精製方法
TW201942064A (zh) 鉭氯化物以及鉭氯化物之製造方法
US3039866A (en) Method of manufacturing crystallized titanium of high purity and an apparatus for carrying out the method
US2840466A (en) Method of reducing metal chlorides
JP5335074B2 (ja) 多結晶シリコンの製造方法及び多結晶シリコン製造用の反応炉
JPS5935017A (ja) 三塩化シランの製法
JP2009256126A (ja) 水素化スズの製造方法及び製造装置

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A1

Designated state(s): KR US

AL Designated countries for regional patents

Kind code of ref document: A1

Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE

WWE Wipo information: entry into national phase

Ref document number: 09230730

Country of ref document: US

121 Ep: the epo has been informed by wipo that ep was designated in this application
122 Ep: pct application non-entry in european phase