USRE30883E - Method of producing synthetic quartz glass - Google Patents

Method of producing synthetic quartz glass Download PDF

Info

Publication number
USRE30883E
USRE30883E US06/121,078 US12107880A USRE30883E US RE30883 E USRE30883 E US RE30883E US 12107880 A US12107880 A US 12107880A US RE30883 E USRE30883 E US RE30883E
Authority
US
United States
Prior art keywords
free
quartz glass
hydrogen
fluorine
oxygen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US06/121,078
Other languages
English (en)
Inventor
Karlheinz Rau
Fritz Simmat
Albert Muhlich
Norbert Treber
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Heraeus Quarzglas GmbH and Co KG
Original Assignee
Heraeus Quarzschmelze GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19752536457 external-priority patent/DE2536457C3/de
Application filed by Heraeus Quarzschmelze GmbH filed Critical Heraeus Quarzschmelze GmbH
Application granted granted Critical
Publication of USRE30883E publication Critical patent/USRE30883E/en
Anticipated expiration legal-status Critical
Assigned to HERAEUS QUARZGLAS GMBH reassignment HERAEUS QUARZGLAS GMBH ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: HERAEUS QUARZSCHMELZE GMBH
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413—Reactant delivery systems
    • C03B37/0142—Reactant deposition burners
    • C03B37/01426—Plasma deposition burners or torches
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
    • C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
    • C03B37/01815—Reactant deposition burners or deposition heating means
    • C03B37/01823—Plasma deposition burners or heating means
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/07—Impurity concentration specified
    • C03B2201/075—Hydroxyl ion (OH)
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
    • C03B2201/12—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/80—Feeding the burner or the burner-heated deposition site
    • C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/08—Doped silica-based glasses containing boron or halide
    • C03C2201/12—Doped silica-based glasses containing boron or halide containing fluorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes

Definitions

  • the invention relates to a method for the production of synthetic quartz glass, to an apparatus for the practice of the method, and to the use of the synthetic quartz glass.
  • a quartz glass doped either with boron oxide or with fluorine As the jacket material a quartz glass doped either with boron oxide or with fluorine.
  • the fluorine-doped quartz glass is obtained by oxidizing silicon tetrafluoride in accordance with the equation SiF 4 +2H 2 O+O 2 ⁇ SiO 2 +4HF, whereby small amounts of fluorine are to be incorporated into SiO 2 .
  • the oxidation can also be brought about by reactive methods in which no hydrogen or H 2 O is present, such as for example in the high-frequency plasma, so that no hydrofluoric acid will form.
  • hydroxyl-ion-free quartz glass which is substantially free of "water” and thus free of absorption bands at wavelengths of 1.4, 2.2 and 2.7 ⁇ m--hereinafter referred to as "hydroxyl-ion-free"--is known from German Pat. No. 1,208,740.
  • the hydroxyl-ion-free quartz glass is obtained by oxidizing a hydrogen-free silicon compound in a hydrogen-free gas stream containing elemental and/or bound oxygen, and depositing the oxidation product as a vitreous mass on a refractory support, the gas stream being passed through an induction-coupled plasma burner.
  • this invention contemplates an improvement in a process for producing a synthetic hydroxyl ion-free quartz glass wherein a hydrogen-free silicon compound is heated in a hydrogen-free gas stream, the gas stream being passed through an induction coupled plasma burner and containing elemental and/or bound oxygen and the oxidation product is deposited on the refractory support as a vitreous mass, the improvement comprising including in said gas stream a gaseous hydrogen-free thermally decomposable compound which yields fluorine in an amount of at least 500 gms per kg of silica to be produced.
  • the objects of the present invention are achieved in a process for the production of synthetic, hydroxyl-ion-free quartz glass by oxidizing a hydrogen-free silicon compound in a hydrogen-free gas stream containing elemental and/or bound oxygen and depositing the oxidation product as a vitreous mass on a refractory support, the gas stream being passed through an induction-coupled plasma burner, by the fact that, in accordance with the invention, for the achievement of a prescribed reduction of the refractive index of synthetic quartz glass, a hydrogen-free, heat-decomposable fluorine compound in vapor form, especially dichlorodifluoromethane (CCl 2 F 2 ), is introduced into the flame of the plasma burner in the amount of at least 500 g per kg of synthesized SiO 2 .
  • CCl 2 F 2 dichlorodifluoromethane
  • a rod of synthetic, hydroxyl-ion-free quartz glass is used as the refractory support and is set in motion relative to the plasma burner, by rotating it for example, during the depositing of the fluorine-doped, synthetic, hydroxyl-ion-free quartz glass, one obtains a foreproduct for the manufacture of light conducting fibers, which consists of a core of the refractory support material and a covering of fluorine-doped synthetic quartz glass.
  • a parabolic decrease of the refractive index in the covering is obtained if the amount of fluorine compound added is increased as the thickness of the covering increases.
  • a light conducting fiber is then produced by drawing a foreproduct of this kind.
  • a rod of synthetic quartz glass can advantageously be used whose refractive index is increased by the addition of refractive index increasing metal ions. It is advantageous to use a doped rod of synthetic quartz glass whose refractive index decreases with distance from the rod axis.
  • Thermally decomposable hydrogen-free-fluorine compounds which can be used according to the invention include the following: CClF 3 , CF 4 .
  • the amount of hydrogen-free thermally decomposable fluorine compound relative to the hydrogen-free silicon compound would depend upon the nature of the glass desired and in particular the relative amount of the fluorine in the compound. Broadly speaking, however, the weight relationship of the fluorine in the thermally decomposable fluorine compound to the silicon in the hydrogen free silicon compound will be in the range of 50 to 800 gms. fluorine per kg of silicon, preferably between 150 and 300 gms. fluorine per kg of silicon.
  • the process is conducted by heating the hydrogen free silicon compound in the presence of the hydrogen-free gas stream containing elemental and/or bound oxygen and thermally decomposable fluorine compound at temperatures generally in the range of 1800° to 2600° C., preferably between 1850° and 2000° C.
  • the temperatures are employed in an amount sufficient to deposit the so-heated mass upon a refractory support as a vitreous mass.
  • the fluorine is present together with the silicon compound for a residence time of between 0.02 and 0.3 seconds, preferably between 0.04 and 0.15 seconds.
  • a burner having three quartz glass tubes disposed concentrically at some distance from one another, the outer tube overreaching the middle and innermost tube and the middle tube overreaching the innermost tube.
  • the working gas and the silicon compound including the fluorine compound present in vapor form are fed through the innermost tube, and a separating gas, preferably oxygen, is fed through the interstice between the innermost and the middle tube and between the middle tube and outermost tube.
  • a separating gas preferably oxygen
  • Reductions of the index of refraction to values of 1.4532 can easily be achieved in the synthetic quartz glass produced by the process of the invention, thereby providing the assurance that this quartz glass will be suitable also for the manufacture of light-conducting fibers, especially also for those light conducting fibers whose core consists of quartz glass of high purity.
  • FIG. 1 is a side elevational view of an apparatus which can be employed to carry out the claimed process.
  • FIG. 2 is a view similar to FIG. 1 showing a further apparatus for carrying out the claimed process.
  • reference numeral 1 indicates a silicon tetrachloride reservoir from which the silicon tetrachloride is pumped by a proportioning pump 2 through the feed line 2 into a heated vaporizing dish 4, via line 3.
  • Oxygen is fed into the vessel 5 containing the vaporizing dish through the line 6.
  • the mixture of oxygen and silicon tetrachloride formed in vessel 5 is delivered through the ground-glass connection 7-8 made of quartz glass, into the plasma burner.
  • the plasma burner is composed of a metal base 9 and the three quartz glass tubes 10, 11 and 12 which are sealed from one another and from the outside atmosphere within the metal base.
  • the induction coil 13, which is supplied by the high-frequency electric power generator 14 is disposed about the free end of the outermost tube 12.
  • the working gas and the two separating gases T-1 and T-2 are delivered through tangentially disposed lines 15, 16 and 17.
  • a quartz glass piece 19 which serves as the substrate on which the fluorine-doped synthetic quartz glass is deposited.
  • the piece of quartz glass 19 is held on a mandrel 20 in a device 21 which makes it possible to rotate and slowly draw back the piece during the depositing process, as indicated by the arrows 22 and 23.
  • the positioning system 24 it is possible to orientate the quartz glass piece 19 in all three directions with respect to the plasma flame.
  • the igniting of the plasma burner is performed in a conventional manner.
  • Argon gas is introduced through the lines 15 and "ignited" by means of a tungsten rod in the vicinity of the coil 13 which is supplied with high-frequency energy.
  • oxygen is slowly fed to the argon, and the argon content of the mixture is reduced until finally only oxygen is being fed.
  • oxygen is fed through lines 16 and 17 as separating gases T-1 and T-2.
  • the quartz glass piece 19 is advanced into the flame and heated with simultaneous rotation.
  • a temperature of about 1900° C. the vaporous mixture of silicon chloride and oxygen is fed from vessel 5 into the plasma burner and then dichlorodifluoromethane (CCl 2 F 2 ) is admixed, at a rate, for example, of 0.7 kg/h, with the oxygen being introduced through line 15.
  • CCl 2 F 2 dichlorodifluoromethane
  • Due to the high temperature of the plasma flame the SiCl 4 decomposes and reacts with the oxygen to form SiO 2 , which deposits itself on the quartz glass piece 19 and vitrifies.
  • the dichlorodifluoromethane is also decomposed by the high temperature of the plasma flame and fluorine is incorporated into the vitreous SiO 2 in a proportion of, for example, 5000 parts per million.
  • the product fluorine-doped synthetic quartz glass, is free of hydroxyl ions.
  • a rod 19' of hydroxyl-ion-free synthetic quartz glass can be used, as represented diagrammatically in FIG. 2, which is held in end mounts 26 which are longitudinally displaceable and contain machinery for the rotation of the rod 19' (arrows 27 and 28).
  • the fluorine-doped synthetic quartz glass is then deposited as a covering 29 on the rod 19'.
  • the product thus obtained is a foreproduct which can then be drawn directly to form a light-conductive fiber.
  • a plasma burner having three concentric quartz glass tubes in a stepped configuration with the outermost tube overreaching the middle and innermost tubes and the middle tube overreaching the innermost tube, and blanketing the innermost and middle tubes with a separating gas, preferably oxygen, has the advantage that no silica can collect on the burner.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)
US06/121,078 1975-08-16 1980-02-13 Method of producing synthetic quartz glass Expired - Lifetime USRE30883E (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE2536572 1975-08-16
DE19752536457 DE2536457C3 (de) 1975-08-16 Verfahren zur Herstellung von synthetischem, OH-Ionen-freiem Quarzglas, Vorrichtung zur Durchführung des Verfahrens und Verwendung des synthetischen Quarzglases
DE2536457 1975-08-16

Related Parent Applications (2)

Application Number Title Priority Date Filing Date
US71354176A Continuation 1975-08-16 1976-08-11
US05/874,965 Reissue US4162908A (en) 1975-08-16 1978-02-03 Method of producing synthetic quartz glass, apparatus for the practice of the method, and use of the synthetic quartz glass

Publications (1)

Publication Number Publication Date
USRE30883E true USRE30883E (en) 1982-03-16

Family

ID=5954072

Family Applications (1)

Application Number Title Priority Date Filing Date
US06/121,078 Expired - Lifetime USRE30883E (en) 1975-08-16 1980-02-13 Method of producing synthetic quartz glass

Country Status (6)

Country Link
US (1) USRE30883E (OSRAM)
JP (1) JPS5224217A (OSRAM)
CH (1) CH620181A5 (OSRAM)
FR (1) FR2321459A1 (OSRAM)
GB (1) GB1492920A (OSRAM)
NL (1) NL176662C (OSRAM)

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0096878A1 (en) * 1982-06-14 1983-12-28 International Standard Electric Corporation Fabrication of preforms for optical fibers by chemical vapor deposition using a plasma torch
US4440556A (en) 1982-06-23 1984-04-03 International Telephone And Telegraph Corporation Optical fiber drawing using plasma torch
US4557561A (en) 1980-08-18 1985-12-10 Siemens Aktiengesellschaft Doped glass and process for making
FR2568242A1 (fr) * 1984-07-25 1986-01-31 Int Standard Electric Corp Procede et appareil pour le depot en phase vapeur de verre dope
EP0173183A1 (en) * 1984-08-18 1986-03-05 Mitsubishi Materials Corporation Radiation-resistant optical conductor
US4689212A (en) 1986-05-14 1987-08-25 Polaroid Corporation Method for forming doped optical preforms
US4716572A (en) 1984-12-19 1987-12-29 Sigri Gmbh Method for coating carbon and graphite bodies
US4880452A (en) 1984-06-04 1989-11-14 Sumitomo Electric Industries, Ltd. Method for producing glass preform for optical fiber containing fluorine in cladding
FR2714371A1 (fr) * 1993-12-24 1995-06-30 Cabloptic Sa Procédé de recharge d'une préforme de fibre optique, dispositif pour la mise en Óoeuvre de ce procédé et fibre optique par ce procédé.
US5474589A (en) * 1990-11-28 1995-12-12 Sumitomo Electric Industries, Ltd. UV light-permeable glass and article comprising the same
US20020005051A1 (en) * 2000-04-28 2002-01-17 Brown John T. Substantially dry, silica-containing soot, fused silica and optical fiber soot preforms, apparatus, methods and burners for manufacturing same
US20020083741A1 (en) * 2000-12-29 2002-07-04 Pandelisev Kiril A. Hot substrate deposition of fused silica
US20030002796A1 (en) * 2001-05-22 2003-01-02 Thomas Kupper Optical waveguide
US20040028362A1 (en) * 2002-08-07 2004-02-12 Shin-Etsu Chemical Co., Ltd. Optical fiber preform, method for manufacturing thereof, and optical fiber obtained by drawing thereof
US20040187525A1 (en) * 2003-03-31 2004-09-30 Coffey Calvin T. Method and apparatus for making soot
US20050120752A1 (en) * 2001-04-11 2005-06-09 Brown John T. Substantially dry, silica-containing soot, fused silica and optical fiber soot preforms, apparatus, methods and burners for manufacturing same
US20090020705A1 (en) * 2001-02-26 2009-01-22 Pandelisev Kiril A Fiber Optic Enhanced Scintillator Detector
CN111320177A (zh) * 2020-04-13 2020-06-23 黄冈师范学院 一种去除石英砂粉中羟基的方法

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1029993A (en) * 1975-09-11 1978-04-25 Frederick D. King Optical fibre transmission line
IT1091498B (it) * 1977-11-25 1985-07-06 Cselt Centro Studi Lab Telecom Procedimento ed apparecchiatura per la produzione continua di fibre ottiche
FR2428618A1 (fr) * 1978-06-16 1980-01-11 Telecommunications Sa Procede de fabrication d'une ebauche en vue de la realisation d'un guide de lumiere et ebauche obtenue selon le procede
FR2432478B1 (OSRAM) * 1978-07-31 1982-03-12 Quartz & Silice
JPS5537465A (en) * 1978-09-09 1980-03-15 Nippon Telegr & Teleph Corp <Ntt> Production of glass fiber base material
JPS5852935B2 (ja) * 1978-11-20 1983-11-26 三菱マテリアル株式会社 光伝送用素材の製造方法
FR2447890B1 (fr) * 1979-02-05 1985-06-28 Lyonnaise Transmiss Optiques Procede de fabrication de preformes de fibres optiques a gradient d'indice, et dispositif de mise en oeuvre de ce procede
DE3036915C2 (de) * 1979-10-09 1987-01-22 Nippon Telegraph And Telephone Corp., Tokio/Tokyo Verfahren und Vorrichtung zur Herstellung von Lichtleitfaserausgangsformen sowie deren Verwendung zum Ziehen von Lichtleitfasern
FR2476058A1 (fr) 1980-02-15 1981-08-21 Quartz Silice Sa Semi-produit pour la production de fibres optiques, procede de preparation du semi-produit et fibres optiques obtenues a partir du semi-produit
JPS57100928A (en) * 1980-12-12 1982-06-23 Nippon Telegr & Teleph Corp <Ntt> Burner for preparing base material for optical fiber
DE3206177A1 (de) * 1982-02-20 1983-08-25 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren zur herstellung einer vorform, aus der optische fasern ziehbar sind
DE3304721A1 (de) * 1983-02-11 1984-08-16 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren zur herstellung einer vorform fuer lichtwellenleiter
FR2540997B1 (fr) * 1983-02-14 1987-02-27 Western Electric Co Procede de fabrication de fibres optiques
JPS6117435A (ja) * 1984-07-05 1986-01-25 Hitachi Cable Ltd 光フアイバ母材の製造方法
JP4763877B2 (ja) * 2000-05-29 2011-08-31 信越石英株式会社 Ｆ２エキシマレーザー用合成石英ガラス光学材料及び光学部材
WO2019238808A1 (de) 2018-06-15 2019-12-19 Solar Silicon Gmbh Verfahren zur herstellung von elementarem silizium

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3275408A (en) * 1963-01-29 1966-09-27 Thermal Syndicate Ltd Methods for the production of vitreous silica
US3659915A (en) * 1970-05-11 1972-05-02 Corning Glass Works Fused silica optical waveguide
US3778132A (en) * 1972-10-06 1973-12-11 Bell Telephone Labor Inc Optical transmission line
DE2247307A1 (de) * 1972-09-27 1974-03-28 Siemens Ag Verfahren zur herstellung von ausgangsstaeben zum ziehen von aus einem dotierten kern und einem undotierten mantel bestehenden lichtleitfasern
US3843229A (en) * 1971-11-25 1974-10-22 Siemens Ag Optical waveguide having a graded refractive index core formed of silicon and germanium
FR2253723A1 (en) * 1973-12-07 1975-07-04 Passaret Michel Preform for optical waveguide mfr. - by plasma arc spraying a lower RI glass around or inside a higher RI glass
JPS5156641A (ja) * 1974-11-13 1976-05-18 Sumitomo Electric Industries Hikaridensoyofuaibaano seizohoho
US3981707A (en) * 1975-04-23 1976-09-21 Corning Glass Works Method of making fluorine out-diffused optical device

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1380371A (fr) * 1963-01-29 1964-11-27 Thermal Syndicate Ltd Procédé de fabrication de silice vitreuse pure
GB1368093A (en) * 1972-10-17 1974-09-25 Post Office Silica-based vitreous material
JPS5515682B2 (OSRAM) * 1972-11-25 1980-04-25
GB1456371A (en) * 1972-11-25 1976-11-24 Sumitomo Electric Industries Optical transmission fibre
GB1450123A (en) * 1973-11-27 1976-09-22 Post Office Doped vitreous silica
JPS50102610A (OSRAM) * 1974-01-17 1975-08-14

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3275408A (en) * 1963-01-29 1966-09-27 Thermal Syndicate Ltd Methods for the production of vitreous silica
US3659915A (en) * 1970-05-11 1972-05-02 Corning Glass Works Fused silica optical waveguide
US3843229A (en) * 1971-11-25 1974-10-22 Siemens Ag Optical waveguide having a graded refractive index core formed of silicon and germanium
DE2247307A1 (de) * 1972-09-27 1974-03-28 Siemens Ag Verfahren zur herstellung von ausgangsstaeben zum ziehen von aus einem dotierten kern und einem undotierten mantel bestehenden lichtleitfasern
US3778132A (en) * 1972-10-06 1973-12-11 Bell Telephone Labor Inc Optical transmission line
FR2253723A1 (en) * 1973-12-07 1975-07-04 Passaret Michel Preform for optical waveguide mfr. - by plasma arc spraying a lower RI glass around or inside a higher RI glass
JPS5156641A (ja) * 1974-11-13 1976-05-18 Sumitomo Electric Industries Hikaridensoyofuaibaano seizohoho
US3981707A (en) * 1975-04-23 1976-09-21 Corning Glass Works Method of making fluorine out-diffused optical device

Cited By (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4557561A (en) 1980-08-18 1985-12-10 Siemens Aktiengesellschaft Doped glass and process for making
EP0096878A1 (en) * 1982-06-14 1983-12-28 International Standard Electric Corporation Fabrication of preforms for optical fibers by chemical vapor deposition using a plasma torch
US4440558A (en) 1982-06-14 1984-04-03 International Telephone And Telegraph Corporation Fabrication of optical preforms by axial chemical vapor deposition
US4440556A (en) 1982-06-23 1984-04-03 International Telephone And Telegraph Corporation Optical fiber drawing using plasma torch
US4880452A (en) 1984-06-04 1989-11-14 Sumitomo Electric Industries, Ltd. Method for producing glass preform for optical fiber containing fluorine in cladding
FR2568242A1 (fr) * 1984-07-25 1986-01-31 Int Standard Electric Corp Procede et appareil pour le depot en phase vapeur de verre dope
US4735648A (en) 1984-07-25 1988-04-05 Stc Plc Optical fibre manufacture
EP0173183A1 (en) * 1984-08-18 1986-03-05 Mitsubishi Materials Corporation Radiation-resistant optical conductor
US4716572A (en) 1984-12-19 1987-12-29 Sigri Gmbh Method for coating carbon and graphite bodies
US4689212A (en) 1986-05-14 1987-08-25 Polaroid Corporation Method for forming doped optical preforms
US5474589A (en) * 1990-11-28 1995-12-12 Sumitomo Electric Industries, Ltd. UV light-permeable glass and article comprising the same
FR2714371A1 (fr) * 1993-12-24 1995-06-30 Cabloptic Sa Procédé de recharge d'une préforme de fibre optique, dispositif pour la mise en Óoeuvre de ce procédé et fibre optique par ce procédé.
US20020005051A1 (en) * 2000-04-28 2002-01-17 Brown John T. Substantially dry, silica-containing soot, fused silica and optical fiber soot preforms, apparatus, methods and burners for manufacturing same
US7089766B2 (en) 2000-04-28 2006-08-15 Corning Inc Method of forming optical fiber preforms
US20050155388A1 (en) * 2000-04-28 2005-07-21 Burke Gerald E. Substantially dry, silica-containing soot, fused silica and optical fiber soot preforms, apparatus, methods and burners for manufacturing same
US7797966B2 (en) 2000-12-29 2010-09-21 Single Crystal Technologies, Inc. Hot substrate deposition of fused silica
US20020083741A1 (en) * 2000-12-29 2002-07-04 Pandelisev Kiril A. Hot substrate deposition of fused silica
US20090020705A1 (en) * 2001-02-26 2009-01-22 Pandelisev Kiril A Fiber Optic Enhanced Scintillator Detector
US20050120752A1 (en) * 2001-04-11 2005-06-09 Brown John T. Substantially dry, silica-containing soot, fused silica and optical fiber soot preforms, apparatus, methods and burners for manufacturing same
US20030002796A1 (en) * 2001-05-22 2003-01-02 Thomas Kupper Optical waveguide
US7752869B2 (en) 2002-08-07 2010-07-13 Shin-Etsu Chemical Co., Ltd. Optical fiber preform, method for manufacturing thereof, and optical fiber obtained by drawing thereof
US20050229639A1 (en) * 2002-08-07 2005-10-20 Shin-Etsu Chemical Co., Ltd. Optical fiber preform, method for manufacturing thereof, and optical fiber obtained by drawing thereof
US20040028362A1 (en) * 2002-08-07 2004-02-12 Shin-Etsu Chemical Co., Ltd. Optical fiber preform, method for manufacturing thereof, and optical fiber obtained by drawing thereof
US20040187525A1 (en) * 2003-03-31 2004-09-30 Coffey Calvin T. Method and apparatus for making soot
CN111320177A (zh) * 2020-04-13 2020-06-23 黄冈师范学院 一种去除石英砂粉中羟基的方法
CN111320177B (zh) * 2020-04-13 2023-09-15 黄冈师范学院 一种去除石英砂粉中羟基的方法

Also Published As

Publication number Publication date
CH620181A5 (en) 1980-11-14
NL176662B (nl) 1984-12-17
FR2321459A1 (fr) 1977-03-18
NL7609083A (nl) 1977-02-18
DE2536457B2 (de) 1977-06-08
DE2536457A1 (de) 1977-02-17
JPS5224217A (en) 1977-02-23
FR2321459B1 (OSRAM) 1979-06-22
NL176662C (nl) 1985-05-17
GB1492920A (en) 1977-11-23

Similar Documents

Publication Publication Date Title
USRE30883E (en) Method of producing synthetic quartz glass
US4162908A (en) Method of producing synthetic quartz glass, apparatus for the practice of the method, and use of the synthetic quartz glass
US4221825A (en) Continuous production of synthetic silica doped with fluorine
US4402720A (en) Process for preparing glass preform for optical fiber
US4650511A (en) Method for the preparation of a dehydrated quartz glass material for light transmission
US4367013A (en) Preparation of semifinished product for manufacture of optical fibers
US5217516A (en) Method of making optical glass article
JPS6038345B2 (ja) 光伝送用ガラス素材の製造方法
EP0146659B1 (en) A method for the preparation of synthetic quartz glass suitable as a material of optical fibers
US4504297A (en) Optical fiber preform manufacturing method
GB2129417A (en) A process for preparing a glass preform for optical transmission
EP0228082B1 (en) Method of making optical glass article
EP0164103B1 (en) Method for producing glass preform for optical fiber containing fluorine in cladding
US4564378A (en) Method for producing a preform for light waveguides
EP0135126B1 (en) Preparation of glass for optical fibers
JPH0479981B2 (OSRAM)
JP3428066B2 (ja) フッ素ドープ石英ガラスの製造方法
JPS6289B2 (OSRAM)
JPS60264338A (ja) 光フアイバ母材の製造方法
JPS59162143A (ja) 合成石英の製造方法
JPH0559052B2 (OSRAM)
JPS62162639A (ja) Ｗ型シングルモ−ド光フアイバ母材の製造方法
JPS6117432A (ja) 光フアイバ用母材の製造方法
JPH0460057B2 (OSRAM)
JP2000169175A (ja) ガラス母材の製造方法

Legal Events

Date Code Title Description
AS Assignment

Owner name: HERAEUS QUARZGLAS GMBH, GERMANY

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:HERAEUS QUARZSCHMELZE GMBH;REEL/FRAME:008677/0739

Effective date: 19900528