USD954986S1 - Electrode cover for a plasma processing device - Google Patents
Electrode cover for a plasma processing device Download PDFInfo
- Publication number
- USD954986S1 USD954986S1 US29/731,604 US202029731604F USD954986S US D954986 S1 USD954986 S1 US D954986S1 US 202029731604 F US202029731604 F US 202029731604F US D954986 S USD954986 S US D954986S
- Authority
- US
- United States
- Prior art keywords
- processing device
- plasma processing
- electrode cover
- view
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Description
The broken lines show the boundary of enlarged portions and form no part of the claimed design.
Claims (1)
- The ornamental design for an electrode cover for a plasma processing device, as shown and described.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019-023330 | 2019-02-13 | ||
JPD2019-23330F JP1659287S (en) | 2019-10-18 | 2019-10-18 |
Publications (1)
Publication Number | Publication Date |
---|---|
USD954986S1 true USD954986S1 (en) | 2022-06-14 |
Family
ID=70483560
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29/731,604 Active USD954986S1 (en) | 2019-10-18 | 2020-04-16 | Electrode cover for a plasma processing device |
Country Status (3)
Country | Link |
---|---|
US (1) | USD954986S1 (en) |
JP (1) | JP1659287S (en) |
TW (1) | TWD210379S (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11996315B2 (en) | 2020-11-18 | 2024-05-28 | Applied Materials, Inc. | Thin substrate handling via edge clamping |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP1704964S (en) | 2021-04-19 | 2022-01-14 | Suceptoring for plasma processing equipment |
Citations (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4579354A (en) * | 1984-12-05 | 1986-04-01 | Vassallo Research And Development Corporation | Gasket |
USD638550S1 (en) * | 2009-11-13 | 2011-05-24 | 3M Innovative Properties Company | Sample processing disk cover |
USD667561S1 (en) * | 2009-11-13 | 2012-09-18 | 3M Innovative Properties Company | Sample processing disk cover |
USD770992S1 (en) * | 2015-06-12 | 2016-11-08 | Hitachi High-Technologies Corporation | Electrode cover for a plasma processing apparatus |
USD803917S1 (en) * | 2015-06-16 | 2017-11-28 | Hitachi Kokusai Electric, Inc. | Heat reflector for substrate processing apparatus |
USD804556S1 (en) * | 2015-06-16 | 2017-12-05 | Hitachi Kokusai Electric Inc. | Heat reflector for substrate processing apparatus |
USD810705S1 (en) * | 2016-04-01 | 2018-02-20 | Veeco Instruments Inc. | Self-centering wafer carrier for chemical vapor deposition |
JP1598998S (en) | 2017-08-31 | 2018-03-05 | ||
USD827592S1 (en) * | 2017-01-31 | 2018-09-04 | Hitachi High-Technologies Corporation | Electrode cover for a plasma processing apparatus |
USD830435S1 (en) * | 2015-12-28 | 2018-10-09 | Ntn Corporation | Inner ring for tapered roller bearing |
USD840364S1 (en) * | 2017-01-31 | 2019-02-12 | Hitachi High-Technologies Corporation | Electrode cover for a plasma processing apparatus |
USD868993S1 (en) * | 2017-08-31 | 2019-12-03 | Hitachi High-Technologies Corporation | Electrode plate for a plasma processing apparatus |
USD868995S1 (en) * | 2017-11-06 | 2019-12-03 | Hitachi High-Technologies Corporation | Gas diffusion plate for a plasma processing apparatus |
USD871608S1 (en) * | 2017-07-31 | 2019-12-31 | Hitachi High-Technologies Corporation | Gas ring for a plasma processing apparatus |
USD871609S1 (en) * | 2017-08-31 | 2019-12-31 | Hitachi High-Technologies Corporation | Electrode plate peripheral ring for a plasma processing apparatus |
USD891636S1 (en) * | 2018-10-25 | 2020-07-28 | Hitachi High-Tech Corporation | Ring for a plasma processing apparatus |
USD917026S1 (en) * | 2019-09-12 | 2021-04-20 | S & B Technical Products, Inc. | Pipe sealing gasket |
USD933725S1 (en) * | 2019-02-08 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a substrate processing chamber |
-
2019
- 2019-10-18 JP JPD2019-23330F patent/JP1659287S/ja active Active
-
2020
- 2020-04-16 TW TW109302067F patent/TWD210379S/en unknown
- 2020-04-16 US US29/731,604 patent/USD954986S1/en active Active
Patent Citations (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4579354A (en) * | 1984-12-05 | 1986-04-01 | Vassallo Research And Development Corporation | Gasket |
USD638550S1 (en) * | 2009-11-13 | 2011-05-24 | 3M Innovative Properties Company | Sample processing disk cover |
USD667561S1 (en) * | 2009-11-13 | 2012-09-18 | 3M Innovative Properties Company | Sample processing disk cover |
USD770992S1 (en) * | 2015-06-12 | 2016-11-08 | Hitachi High-Technologies Corporation | Electrode cover for a plasma processing apparatus |
USD803917S1 (en) * | 2015-06-16 | 2017-11-28 | Hitachi Kokusai Electric, Inc. | Heat reflector for substrate processing apparatus |
USD804556S1 (en) * | 2015-06-16 | 2017-12-05 | Hitachi Kokusai Electric Inc. | Heat reflector for substrate processing apparatus |
USD830435S1 (en) * | 2015-12-28 | 2018-10-09 | Ntn Corporation | Inner ring for tapered roller bearing |
USD810705S1 (en) * | 2016-04-01 | 2018-02-20 | Veeco Instruments Inc. | Self-centering wafer carrier for chemical vapor deposition |
USD827592S1 (en) * | 2017-01-31 | 2018-09-04 | Hitachi High-Technologies Corporation | Electrode cover for a plasma processing apparatus |
USD840364S1 (en) * | 2017-01-31 | 2019-02-12 | Hitachi High-Technologies Corporation | Electrode cover for a plasma processing apparatus |
USD871608S1 (en) * | 2017-07-31 | 2019-12-31 | Hitachi High-Technologies Corporation | Gas ring for a plasma processing apparatus |
JP1598998S (en) | 2017-08-31 | 2018-03-05 | ||
USD868993S1 (en) * | 2017-08-31 | 2019-12-03 | Hitachi High-Technologies Corporation | Electrode plate for a plasma processing apparatus |
USD870314S1 (en) * | 2017-08-31 | 2019-12-17 | Hitachi High-Technologies Corporation | Electrode cover for a plasma processing apparatus |
USD871609S1 (en) * | 2017-08-31 | 2019-12-31 | Hitachi High-Technologies Corporation | Electrode plate peripheral ring for a plasma processing apparatus |
USD868995S1 (en) * | 2017-11-06 | 2019-12-03 | Hitachi High-Technologies Corporation | Gas diffusion plate for a plasma processing apparatus |
USD891636S1 (en) * | 2018-10-25 | 2020-07-28 | Hitachi High-Tech Corporation | Ring for a plasma processing apparatus |
USD933725S1 (en) * | 2019-02-08 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a substrate processing chamber |
USD917026S1 (en) * | 2019-09-12 | 2021-04-20 | S & B Technical Products, Inc. | Pipe sealing gasket |
Non-Patent Citations (1)
Title |
---|
4″ Storz Pressure Gasket. Online, published date unknown. Retrieved on Feb. 20, 2022 from URL: https://www.firehosedirect.com/4-storz-pressure-gasket. * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11996315B2 (en) | 2020-11-18 | 2024-05-28 | Applied Materials, Inc. | Thin substrate handling via edge clamping |
Also Published As
Publication number | Publication date |
---|---|
TWD210379S (en) | 2021-03-11 |
JP1659287S (en) | 2020-05-11 |
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Legal Events
Date | Code | Title | Description |
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FEPP | Fee payment procedure |
Free format text: ENTITY STATUS SET TO UNDISCOUNTED (ORIGINAL EVENT CODE: BIG.); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |