USD911985S1 - Gas introduction plate for plasma etching apparatus for etching semiconductor wafer - Google Patents

Gas introduction plate for plasma etching apparatus for etching semiconductor wafer Download PDF

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Publication number
USD911985S1
USD911985S1 US29/671,716 US201829671716F USD911985S US D911985 S1 USD911985 S1 US D911985S1 US 201829671716 F US201829671716 F US 201829671716F US D911985 S USD911985 S US D911985S
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Prior art keywords
semiconductor wafer
gas introduction
introduction plate
plasma etching
etching
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US29/671,716
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English (en)
Inventor
Takaaki Nezu
Yoshitaka Tamura
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Assigned to TOKYO ELECTRON LIMITED reassignment TOKYO ELECTRON LIMITED ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: NEZU, TAKAAKI, TAMURA, YOSHITAKA
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US29/671,716 2018-06-08 2018-11-29 Gas introduction plate for plasma etching apparatus for etching semiconductor wafer Active USD911985S1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018-012651 2018-06-08
JPD2018-12651F JP1624668S (cs) 2018-06-08 2018-06-08

Publications (1)

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USD911985S1 true USD911985S1 (en) 2021-03-02

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JP (1) JP1624668S (cs)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1005974S1 (en) * 2022-05-19 2023-11-28 Asm Ip Holding B.V. Gas distributor for semiconductor manufacturing apparatus
USD1037778S1 (en) * 2022-07-19 2024-08-06 Applied Materials, Inc. Gas distribution plate
USD1052548S1 (en) * 2023-06-26 2024-11-26 Applied Materials, Inc. Gas diffuser

Citations (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD363464S (en) * 1992-08-27 1995-10-24 Tokyo Electron Yamanashi Limited Electrode for a semiconductor processing apparatus
USD411516S (en) * 1996-03-15 1999-06-29 Tokyo Electron Limited Gas diffusion plate for electrode of semiconductor wafer processing apparatus
US6379466B1 (en) * 1992-01-17 2002-04-30 Applied Materials, Inc. Temperature controlled gas distribution plate
US20050056218A1 (en) * 2002-02-14 2005-03-17 Applied Materials, Inc. Gas distribution plate fabricated from a solid yttrium oxide-comprising substrate
US20050252447A1 (en) * 2004-05-11 2005-11-17 Applied Materials, Inc. Gas blocker plate for improved deposition
US20070131168A1 (en) * 2005-10-31 2007-06-14 Hisashi Gomi Gas Supplying unit and substrate processing apparatus
US20090159002A1 (en) * 2007-12-19 2009-06-25 Kallol Bera Gas distribution plate with annular plenum having a sloped ceiling for uniform distribution
USD654882S1 (en) * 2010-10-21 2012-02-28 Tokyo Electron Limited Gas-separating plate for reactor for manufacturing semiconductor
USD655261S1 (en) * 2010-10-21 2012-03-06 Tokyo Electron Limited Gas-separating plate for reactor for manufacturing semiconductor
USD655260S1 (en) * 2010-10-21 2012-03-06 Tokyo Electron Limited Gas-separating plate for reactor for manufacturing semiconductor
US8206506B2 (en) * 2008-07-07 2012-06-26 Lam Research Corporation Showerhead electrode
US8402918B2 (en) * 2009-04-07 2013-03-26 Lam Research Corporation Showerhead electrode with centering feature
US8419959B2 (en) * 2009-09-18 2013-04-16 Lam Research Corporation Clamped monolithic showerhead electrode
US8573152B2 (en) * 2010-09-03 2013-11-05 Lam Research Corporation Showerhead electrode
USD694790S1 (en) * 2011-09-20 2013-12-03 Tokyo Electron Limited Baffle plate for manufacturing semiconductor
USD697038S1 (en) * 2011-09-20 2014-01-07 Tokyo Electron Limited Baffle plate
USD733257S1 (en) * 2014-02-14 2015-06-30 Hansgrohe Se Overhead shower
USD736348S1 (en) * 2014-07-07 2015-08-11 Jiangmen Triumph Rain Showers Co., LTD Spray head for a shower
USD745641S1 (en) * 2011-06-20 2015-12-15 Neoperl Gmbh Stream straightener for faucet
USD751176S1 (en) * 2014-08-07 2016-03-08 Hansgrohe Se Overhead shower
USD787458S1 (en) * 2015-11-18 2017-05-23 Asm Ip Holding B.V. Gas supply plate for semiconductor manufacturing apparatus
USD796458S1 (en) * 2016-01-08 2017-09-05 Asm Ip Holding B.V. Gas flow control plate for semiconductor manufacturing apparatus
USD880437S1 (en) * 2018-02-01 2020-04-07 Asm Ip Holding B.V. Gas supply plate for semiconductor manufacturing apparatus

Patent Citations (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6379466B1 (en) * 1992-01-17 2002-04-30 Applied Materials, Inc. Temperature controlled gas distribution plate
USD363464S (en) * 1992-08-27 1995-10-24 Tokyo Electron Yamanashi Limited Electrode for a semiconductor processing apparatus
USD411516S (en) * 1996-03-15 1999-06-29 Tokyo Electron Limited Gas diffusion plate for electrode of semiconductor wafer processing apparatus
US20050056218A1 (en) * 2002-02-14 2005-03-17 Applied Materials, Inc. Gas distribution plate fabricated from a solid yttrium oxide-comprising substrate
US20050252447A1 (en) * 2004-05-11 2005-11-17 Applied Materials, Inc. Gas blocker plate for improved deposition
US20070131168A1 (en) * 2005-10-31 2007-06-14 Hisashi Gomi Gas Supplying unit and substrate processing apparatus
US20090159002A1 (en) * 2007-12-19 2009-06-25 Kallol Bera Gas distribution plate with annular plenum having a sloped ceiling for uniform distribution
US8206506B2 (en) * 2008-07-07 2012-06-26 Lam Research Corporation Showerhead electrode
US8402918B2 (en) * 2009-04-07 2013-03-26 Lam Research Corporation Showerhead electrode with centering feature
US8419959B2 (en) * 2009-09-18 2013-04-16 Lam Research Corporation Clamped monolithic showerhead electrode
US8573152B2 (en) * 2010-09-03 2013-11-05 Lam Research Corporation Showerhead electrode
USD655260S1 (en) * 2010-10-21 2012-03-06 Tokyo Electron Limited Gas-separating plate for reactor for manufacturing semiconductor
USD654882S1 (en) * 2010-10-21 2012-02-28 Tokyo Electron Limited Gas-separating plate for reactor for manufacturing semiconductor
USD655261S1 (en) * 2010-10-21 2012-03-06 Tokyo Electron Limited Gas-separating plate for reactor for manufacturing semiconductor
USD745641S1 (en) * 2011-06-20 2015-12-15 Neoperl Gmbh Stream straightener for faucet
USD694790S1 (en) * 2011-09-20 2013-12-03 Tokyo Electron Limited Baffle plate for manufacturing semiconductor
USD697038S1 (en) * 2011-09-20 2014-01-07 Tokyo Electron Limited Baffle plate
USD733257S1 (en) * 2014-02-14 2015-06-30 Hansgrohe Se Overhead shower
USD736348S1 (en) * 2014-07-07 2015-08-11 Jiangmen Triumph Rain Showers Co., LTD Spray head for a shower
USD751176S1 (en) * 2014-08-07 2016-03-08 Hansgrohe Se Overhead shower
USD787458S1 (en) * 2015-11-18 2017-05-23 Asm Ip Holding B.V. Gas supply plate for semiconductor manufacturing apparatus
USD796458S1 (en) * 2016-01-08 2017-09-05 Asm Ip Holding B.V. Gas flow control plate for semiconductor manufacturing apparatus
USD880437S1 (en) * 2018-02-01 2020-04-07 Asm Ip Holding B.V. Gas supply plate for semiconductor manufacturing apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1005974S1 (en) * 2022-05-19 2023-11-28 Asm Ip Holding B.V. Gas distributor for semiconductor manufacturing apparatus
USD1037778S1 (en) * 2022-07-19 2024-08-06 Applied Materials, Inc. Gas distribution plate
USD1052548S1 (en) * 2023-06-26 2024-11-26 Applied Materials, Inc. Gas diffuser

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