USD884855S1 - Heater pedestal - Google Patents

Heater pedestal Download PDF

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Publication number
USD884855S1
USD884855S1 US29/711,377 US201929711377F USD884855S US D884855 S1 USD884855 S1 US D884855S1 US 201929711377 F US201929711377 F US 201929711377F US D884855 S USD884855 S US D884855S
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US
United States
Prior art keywords
view
heater pedestal
sectional
heater
pedestal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
US29/711,377
Inventor
Mahesh RAMAKRISHNA
Naman APURVA
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Priority to US29/711,377 priority Critical patent/USD884855S1/en
Assigned to APPLIED MATERIALS, INC. reassignment APPLIED MATERIALS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: APURVA, Naman, RAMAKRISHNA, Mahesh
Priority to TW109301975F priority patent/TWD214069S/en
Priority to JPD2020-8775F priority patent/JP1689809S/ja
Application granted granted Critical
Publication of USD884855S1 publication Critical patent/USD884855S1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Description

FIG. 1 is an isometric top view of a heater pedestal showing our new design;
FIG. 2 is an isometric bottom view thereof;
FIG. 3 is a bottom plan view thereof;
FIG. 4 is a top plan view thereof;
FIG. 5 is a side elevational view thereof along lines 5-5 of FIG. 1, the opposite side elevational view being identical;
FIG. 6 is a side cross-sectional view thereof along lines 6-6 of FIG. 4;
FIG. 7 is a detail view thereof shown in FIG. 4;
FIG. 8 is a partial sectional view thereof along lines 8-8 of FIG. 4;
FIG. 9 is a side cross-sectional view thereof along lines 9-9 of FIG. 4;
FIG. 10 is a detail view of the sectional view thereof shown in FIG. 6;
FIG. 11 is a detail view of the sectional view thereof shown in FIG. 6;
FIG. 12 is a detail view of the sectional view thereof shown in FIG. 6;
FIG. 13 is a detail view of the sectional view thereof shown in FIG. 6;
FIG. 14 is a detail view of the sectional view thereof shown in FIG. 9;
FIG. 15 is a partial sectional view thereof along lines 15-15 of FIG. 4; and,
FIG. 16 is a detail view of the sectional view thereof shown in FIG. 9.

Claims (1)

    CLAIM
  1. The ornamental design for a heater pedestal, as shown and described.
US29/711,377 2019-10-30 2019-10-30 Heater pedestal Active USD884855S1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US29/711,377 USD884855S1 (en) 2019-10-30 2019-10-30 Heater pedestal
TW109301975F TWD214069S (en) 2019-10-30 2020-04-13 Heater pedestal
JPD2020-8775F JP1689809S (en) 2019-10-30 2020-04-30

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29/711,377 USD884855S1 (en) 2019-10-30 2019-10-30 Heater pedestal

Publications (1)

Publication Number Publication Date
USD884855S1 true USD884855S1 (en) 2020-05-19

Family

ID=70615523

Family Applications (1)

Application Number Title Priority Date Filing Date
US29/711,377 Active USD884855S1 (en) 2019-10-30 2019-10-30 Heater pedestal

Country Status (3)

Country Link
US (1) USD884855S1 (en)
JP (1) JP1689809S (en)
TW (1) TWD214069S (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD998112S1 (en) * 2020-12-08 2023-09-05 Bromic Pty Limited Heater

Citations (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6278089B1 (en) 1999-11-02 2001-08-21 Applied Materials, Inc. Heater for use in substrate processing
US6544340B2 (en) 2000-12-08 2003-04-08 Applied Materials, Inc. Heater with detachable ceramic top plate
US6907924B2 (en) 1997-01-02 2005-06-21 Veeco Rochester Inc. Thermally conductive chuck for vacuum processor
US20060096972A1 (en) * 2004-10-28 2006-05-11 Kyocera Corporation Heater, wafer heating apparatus and method for manufacturing heater
US20070151517A1 (en) * 2005-12-31 2007-07-05 Ips Ltd. Heater for depositing thin film
USD583394S1 (en) * 2006-12-15 2008-12-23 Tokyo Electron Limited Cover for a heater stage of a plasma processing apparatus
US7705275B2 (en) 2005-08-17 2010-04-27 Applied Materials, Inc. Substrate support having brazed plates and resistance heater
USD614593S1 (en) * 2008-07-21 2010-04-27 Asm Genitech Korea Ltd Substrate support for a semiconductor deposition apparatus
US20120164829A1 (en) * 2010-12-22 2012-06-28 Applied Materials, Inc. Fabrication of through-silicon vias on silicon wafers
US20140014642A1 (en) * 2012-06-12 2014-01-16 Component Re-Engineering Company, Inc. Multiple Zone Heater
US20140251214A1 (en) * 2013-03-06 2014-09-11 Applied Materials, Inc. Heated substrate support with flatness control
USD716742S1 (en) * 2013-09-13 2014-11-04 Asm Ip Holding B.V. Substrate supporter for semiconductor deposition apparatus
US20150108203A1 (en) * 2011-11-30 2015-04-23 Component Re-Engineering Company, Inc. Low Temperature Method For Hermetically Joining Non-Diffusing Ceramic Materials
US9673077B2 (en) * 2012-07-03 2017-06-06 Watlow Electric Manufacturing Company Pedestal construction with low coefficient of thermal expansion top
US20170204514A1 (en) * 2014-08-08 2017-07-20 Ok Ryul Kim Cvd process chamber component having aluminum fluoride barrier film thereon
USD807481S1 (en) 2016-04-08 2018-01-09 Applied Materials, Inc. Patterned heater pedestal
US20180251893A1 (en) * 2017-03-03 2018-09-06 Lam Research Corporation Wafer level uniformity control in remote plasma film deposition
US20190276366A1 (en) * 2018-03-07 2019-09-12 Applied Materials, Inc. Y2O3-ZrO2 EROSION RESISTANT MATERIAL FOR CHAMBER COMPONENTS IN PLASMA ENVIRONMENTS
USD862539S1 (en) * 2017-12-04 2019-10-08 Liqua-Tech Corporation Register gear adapter plate
US20200035520A1 (en) * 2018-07-26 2020-01-30 Samsung Electronics Co., Ltd. Stable heater rebuild inspection and maintenance platform
US20200098651A1 (en) * 2015-11-17 2020-03-26 Lam Research Corporation Systems and Methods for Controlling Plasma Instability in Semiconductor Fabrication

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD859484S1 (en) 2017-06-12 2019-09-10 Asm Ip Holding B.V. Heater block

Patent Citations (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6907924B2 (en) 1997-01-02 2005-06-21 Veeco Rochester Inc. Thermally conductive chuck for vacuum processor
US6278089B1 (en) 1999-11-02 2001-08-21 Applied Materials, Inc. Heater for use in substrate processing
US6544340B2 (en) 2000-12-08 2003-04-08 Applied Materials, Inc. Heater with detachable ceramic top plate
US20060096972A1 (en) * 2004-10-28 2006-05-11 Kyocera Corporation Heater, wafer heating apparatus and method for manufacturing heater
US7705275B2 (en) 2005-08-17 2010-04-27 Applied Materials, Inc. Substrate support having brazed plates and resistance heater
US20070151517A1 (en) * 2005-12-31 2007-07-05 Ips Ltd. Heater for depositing thin film
USD583394S1 (en) * 2006-12-15 2008-12-23 Tokyo Electron Limited Cover for a heater stage of a plasma processing apparatus
USD614593S1 (en) * 2008-07-21 2010-04-27 Asm Genitech Korea Ltd Substrate support for a semiconductor deposition apparatus
US20120164829A1 (en) * 2010-12-22 2012-06-28 Applied Materials, Inc. Fabrication of through-silicon vias on silicon wafers
US20150108203A1 (en) * 2011-11-30 2015-04-23 Component Re-Engineering Company, Inc. Low Temperature Method For Hermetically Joining Non-Diffusing Ceramic Materials
US20140014642A1 (en) * 2012-06-12 2014-01-16 Component Re-Engineering Company, Inc. Multiple Zone Heater
US9673077B2 (en) * 2012-07-03 2017-06-06 Watlow Electric Manufacturing Company Pedestal construction with low coefficient of thermal expansion top
US20140251214A1 (en) * 2013-03-06 2014-09-11 Applied Materials, Inc. Heated substrate support with flatness control
USD716742S1 (en) * 2013-09-13 2014-11-04 Asm Ip Holding B.V. Substrate supporter for semiconductor deposition apparatus
US20170204514A1 (en) * 2014-08-08 2017-07-20 Ok Ryul Kim Cvd process chamber component having aluminum fluoride barrier film thereon
US20200098651A1 (en) * 2015-11-17 2020-03-26 Lam Research Corporation Systems and Methods for Controlling Plasma Instability in Semiconductor Fabrication
USD807481S1 (en) 2016-04-08 2018-01-09 Applied Materials, Inc. Patterned heater pedestal
US20180251893A1 (en) * 2017-03-03 2018-09-06 Lam Research Corporation Wafer level uniformity control in remote plasma film deposition
USD862539S1 (en) * 2017-12-04 2019-10-08 Liqua-Tech Corporation Register gear adapter plate
US20190276366A1 (en) * 2018-03-07 2019-09-12 Applied Materials, Inc. Y2O3-ZrO2 EROSION RESISTANT MATERIAL FOR CHAMBER COMPONENTS IN PLASMA ENVIRONMENTS
US20200035520A1 (en) * 2018-07-26 2020-01-30 Samsung Electronics Co., Ltd. Stable heater rebuild inspection and maintenance platform

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD998112S1 (en) * 2020-12-08 2023-09-05 Bromic Pty Limited Heater

Also Published As

Publication number Publication date
JP1689809S (en) 2021-07-12
TWD214069S (en) 2021-09-21

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