USD838681S1 - Plasma chamber liner - Google Patents

Plasma chamber liner Download PDF

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Publication number
USD838681S1
USD838681S1 US29/602,211 US201729602211F USD838681S US D838681 S1 USD838681 S1 US D838681S1 US 201729602211 F US201729602211 F US 201729602211F US D838681 S USD838681 S US D838681S
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United States
Prior art keywords
plasma chamber
chamber liner
liner
view
plasma
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US29/602,211
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English (en)
Inventor
Eric Kihara Shono
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Applied Materials Inc
Original Assignee
Applied Materials Inc
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Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Priority to US29/602,211 priority Critical patent/USD838681S1/en
Assigned to APPLIED MATERIALS, INC. reassignment APPLIED MATERIALS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: SHONO, ERIC KIHARA
Priority to TW106306300F priority patent/TWD191654S/zh
Priority to JPD2017-24107F priority patent/JP1614744S/ja
Application granted granted Critical
Publication of USD838681S1 publication Critical patent/USD838681S1/en
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US29/602,211 2017-04-28 2017-04-28 Plasma chamber liner Active USD838681S1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US29/602,211 USD838681S1 (en) 2017-04-28 2017-04-28 Plasma chamber liner
TW106306300F TWD191654S (zh) 2017-04-28 2017-10-27 電漿腔室襯墊
JPD2017-24107F JP1614744S (enrdf_load_stackoverflow) 2017-04-28 2017-10-30

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29/602,211 USD838681S1 (en) 2017-04-28 2017-04-28 Plasma chamber liner

Publications (1)

Publication Number Publication Date
USD838681S1 true USD838681S1 (en) 2019-01-22

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Family Applications (1)

Application Number Title Priority Date Filing Date
US29/602,211 Active USD838681S1 (en) 2017-04-28 2017-04-28 Plasma chamber liner

Country Status (3)

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US (1) USD838681S1 (enrdf_load_stackoverflow)
JP (1) JP1614744S (enrdf_load_stackoverflow)
TW (1) TWD191654S (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD875053S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD875054S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD875055S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD882536S1 (en) * 2017-04-28 2020-04-28 Applied Materials, Inc. Plasma source liner
USD901405S1 (en) * 2017-03-28 2020-11-10 Rohm Co., Ltd. Semiconductor device
USD925481S1 (en) * 2018-12-06 2021-07-20 Kokusai Electric Corporation Inlet liner for substrate processing apparatus

Citations (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5964947A (en) * 1996-07-12 1999-10-12 Applied Materials, Inc. Removable pumping channel liners within a chemical vapor deposition chamber
US6277237B1 (en) * 1998-09-30 2001-08-21 Lam Research Corporation Chamber liner for semiconductor process chambers
US6374871B2 (en) * 1999-05-25 2002-04-23 Micron Technology, Inc. Liner for use in processing chamber
US7011039B1 (en) * 2000-07-07 2006-03-14 Applied Materials, Inc. Multi-purpose processing chamber with removable chamber liner
USD583838S1 (en) 2007-09-19 2008-12-30 Riley Power, Inc. Grinding chamber side liner
USD658692S1 (en) * 2011-03-30 2012-05-01 Tokyo Electron Limited Liner for plasma processing apparatus
USD658691S1 (en) * 2011-03-30 2012-05-01 Tokyo Electron Limited Liner for plasma processing apparatus
USD658693S1 (en) * 2011-03-30 2012-05-01 Tokyo Electron Limited Liner for plasma processing apparatus
USD678228S1 (en) * 2011-03-30 2013-03-19 Tokyo Electron Limited Chamber block
USD699692S1 (en) * 2012-01-19 2014-02-18 Applied Materials, Inc. Upper liner
US20140116366A1 (en) 2011-04-21 2014-05-01 Eaton Corporation Pivot foot for deactivating rocker arm
US8858754B2 (en) * 2010-05-25 2014-10-14 Tokyo Electron Limited Plasma processing apparatus
USD716239S1 (en) * 2013-11-06 2014-10-28 Applied Materials, Inc. Upper chamber liner
USD716240S1 (en) * 2013-11-07 2014-10-28 Applied Materials, Inc. Lower chamber liner
US20140322897A1 (en) 2013-04-30 2014-10-30 Applied Materials, Inc. Flow controlled liner having spatially distributed gas passages
USD717746S1 (en) * 2013-11-06 2014-11-18 Applied Materials, Inc. Lower chamber liner
US8980005B2 (en) 2011-03-22 2015-03-17 Applied Materials, Inc. Liner assembly for chemical vapor deposition chamber
USD802545S1 (en) * 2015-06-12 2017-11-14 Hitachi High-Technologies Corporation Lower chamber for a plasma processing apparatus
USD804436S1 (en) * 2015-06-12 2017-12-05 Hitachi High-Technologies Corporation Upper chamber for a plasma processing apparatus
USD812578S1 (en) * 2016-02-26 2018-03-13 Hitachi High-Technologies Corporation Upper chamber for a plasma processing apparatus

Patent Citations (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5964947A (en) * 1996-07-12 1999-10-12 Applied Materials, Inc. Removable pumping channel liners within a chemical vapor deposition chamber
US6277237B1 (en) * 1998-09-30 2001-08-21 Lam Research Corporation Chamber liner for semiconductor process chambers
US6374871B2 (en) * 1999-05-25 2002-04-23 Micron Technology, Inc. Liner for use in processing chamber
US7011039B1 (en) * 2000-07-07 2006-03-14 Applied Materials, Inc. Multi-purpose processing chamber with removable chamber liner
USD583838S1 (en) 2007-09-19 2008-12-30 Riley Power, Inc. Grinding chamber side liner
US8858754B2 (en) * 2010-05-25 2014-10-14 Tokyo Electron Limited Plasma processing apparatus
US8980005B2 (en) 2011-03-22 2015-03-17 Applied Materials, Inc. Liner assembly for chemical vapor deposition chamber
USD658692S1 (en) * 2011-03-30 2012-05-01 Tokyo Electron Limited Liner for plasma processing apparatus
USD658691S1 (en) * 2011-03-30 2012-05-01 Tokyo Electron Limited Liner for plasma processing apparatus
USD658693S1 (en) * 2011-03-30 2012-05-01 Tokyo Electron Limited Liner for plasma processing apparatus
USD678228S1 (en) * 2011-03-30 2013-03-19 Tokyo Electron Limited Chamber block
US20140116366A1 (en) 2011-04-21 2014-05-01 Eaton Corporation Pivot foot for deactivating rocker arm
USD699692S1 (en) * 2012-01-19 2014-02-18 Applied Materials, Inc. Upper liner
US20140322897A1 (en) 2013-04-30 2014-10-30 Applied Materials, Inc. Flow controlled liner having spatially distributed gas passages
USD716239S1 (en) * 2013-11-06 2014-10-28 Applied Materials, Inc. Upper chamber liner
USD717746S1 (en) * 2013-11-06 2014-11-18 Applied Materials, Inc. Lower chamber liner
USD716240S1 (en) * 2013-11-07 2014-10-28 Applied Materials, Inc. Lower chamber liner
USD802545S1 (en) * 2015-06-12 2017-11-14 Hitachi High-Technologies Corporation Lower chamber for a plasma processing apparatus
USD804436S1 (en) * 2015-06-12 2017-12-05 Hitachi High-Technologies Corporation Upper chamber for a plasma processing apparatus
USD812578S1 (en) * 2016-02-26 2018-03-13 Hitachi High-Technologies Corporation Upper chamber for a plasma processing apparatus

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
Japanese Office Action for Application No. JP 2017-024106 dated Apr. 10, 2018.
Japanese Office Action for Application No. JP 2017-024107 dated Apr. 10, 2018.
Taiwan Search Report for Application No. 106306300 dated May 7, 2018.

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD901405S1 (en) * 2017-03-28 2020-11-10 Rohm Co., Ltd. Semiconductor device
USD875053S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD875054S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD875055S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD882536S1 (en) * 2017-04-28 2020-04-28 Applied Materials, Inc. Plasma source liner
USD925481S1 (en) * 2018-12-06 2021-07-20 Kokusai Electric Corporation Inlet liner for substrate processing apparatus

Also Published As

Publication number Publication date
JP1614744S (enrdf_load_stackoverflow) 2018-10-01
TWD191654S (zh) 2018-07-11

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