USD658691S1 - Liner for plasma processing apparatus - Google Patents
Liner for plasma processing apparatus Download PDFInfo
- Publication number
- USD658691S1 USD658691S1 US29/400,581 US201129400581F USD658691S US D658691 S1 USD658691 S1 US D658691S1 US 201129400581 F US201129400581 F US 201129400581F US D658691 S USD658691 S US D658691S
- Authority
- US
- United States
- Prior art keywords
- liner
- processing apparatus
- plasma processing
- view
- ornamental design
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Description
Claims (1)
- The ornamental design for a liner for plasma processing apparatus, as shown and described.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011007264 | 2011-03-30 | ||
JP2011-007264 | 2011-03-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
USD658691S1 true USD658691S1 (en) | 2012-05-01 |
Family
ID=45991331
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29/400,581 Active USD658691S1 (en) | 2011-03-30 | 2011-08-30 | Liner for plasma processing apparatus |
Country Status (2)
Country | Link |
---|---|
US (1) | USD658691S1 (en) |
TW (1) | TWD149224S (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD802545S1 (en) * | 2015-06-12 | 2017-11-14 | Hitachi High-Technologies Corporation | Lower chamber for a plasma processing apparatus |
USD802790S1 (en) * | 2015-06-12 | 2017-11-14 | Hitachi High-Technologies Corporation | Cover ring for a plasma processing apparatus |
USD826300S1 (en) * | 2016-09-30 | 2018-08-21 | Oerlikon Metco Ag, Wohlen | Rotably mounted thermal plasma burner for thermalspraying |
USD837754S1 (en) * | 2017-04-28 | 2019-01-08 | Applied Materials, Inc. | Plasma chamber liner |
USD838681S1 (en) * | 2017-04-28 | 2019-01-22 | Applied Materials, Inc. | Plasma chamber liner |
USD842259S1 (en) * | 2017-04-28 | 2019-03-05 | Applied Materials, Inc. | Plasma chamber liner |
USD909439S1 (en) * | 2018-11-30 | 2021-02-02 | Ferrotec (Usa) Corporation | Two-piece crucible cover |
USD925481S1 (en) * | 2018-12-06 | 2021-07-20 | Kokusai Electric Corporation | Inlet liner for substrate processing apparatus |
-
2011
- 2011-08-30 US US29/400,581 patent/USD658691S1/en active Active
- 2011-09-09 TW TW100304784F patent/TWD149224S/en unknown
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD802545S1 (en) * | 2015-06-12 | 2017-11-14 | Hitachi High-Technologies Corporation | Lower chamber for a plasma processing apparatus |
USD802790S1 (en) * | 2015-06-12 | 2017-11-14 | Hitachi High-Technologies Corporation | Cover ring for a plasma processing apparatus |
USD826300S1 (en) * | 2016-09-30 | 2018-08-21 | Oerlikon Metco Ag, Wohlen | Rotably mounted thermal plasma burner for thermalspraying |
USD837754S1 (en) * | 2017-04-28 | 2019-01-08 | Applied Materials, Inc. | Plasma chamber liner |
USD838681S1 (en) * | 2017-04-28 | 2019-01-22 | Applied Materials, Inc. | Plasma chamber liner |
USD842259S1 (en) * | 2017-04-28 | 2019-03-05 | Applied Materials, Inc. | Plasma chamber liner |
USD909439S1 (en) * | 2018-11-30 | 2021-02-02 | Ferrotec (Usa) Corporation | Two-piece crucible cover |
USD925481S1 (en) * | 2018-12-06 | 2021-07-20 | Kokusai Electric Corporation | Inlet liner for substrate processing apparatus |
Also Published As
Publication number | Publication date |
---|---|
TWD149224S (en) | 2012-09-11 |
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