US9360713B2 - Method for manufacturing color filter, color filter, and display device - Google Patents

Method for manufacturing color filter, color filter, and display device Download PDF

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Publication number
US9360713B2
US9360713B2 US14/126,964 US201214126964A US9360713B2 US 9360713 B2 US9360713 B2 US 9360713B2 US 201214126964 A US201214126964 A US 201214126964A US 9360713 B2 US9360713 B2 US 9360713B2
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Prior art keywords
color filter
transparent
pixel
substrate
resin layers
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Expired - Fee Related
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US14/126,964
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English (en)
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US20140118670A1 (en
Inventor
Jinbo LU
Zhuo Zhang
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BOE Technology Group Co Ltd
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BOE Technology Group Co Ltd
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Assigned to BOE TECHNOLOGY GROUP CO., LTD. reassignment BOE TECHNOLOGY GROUP CO., LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: LU, JINBO, ZHANG, ZHUO
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2203/00—Function characteristic
    • G02F2203/01—Function characteristic transmissive

Definitions

  • the present disclosure relates to liquid display, particularly, to a method of manufacturing a color filter, a color filter and a display device.
  • Forming apertures in the pixel region of the color filters is often adopted in the conventional technique to realize greater transmissivity and brightness of the color filters, and in particular, it is widely used in the production of transflective color filters.
  • the conventional techniques usually adopt the way of forming apertures in the reflection region.
  • process of forming apertures is realized by using a mask etched with aperture patterns, and forming apertures in the pixel resin layer (color resin layer) of the reflection region by exposure and development processes. It is not easy to control the size of the apertures, which greatly increases the difficulty of manufacturing; on the other hand, difficulty in controlling the size of the apertures can result in the uncertainty of the aperture area, and may result in the deviation of the resulted color from the design value.
  • the present disclosure provides a method of manufacturing a color filter, a color filter and a display device, so as to accurately control the aperture size and the aperture area in the pixel region of the color filter.
  • the embodiments of the present disclosure provide a method of manufacturing a color filter, the method comprising: forming a plurality of transparent columns in pixel regions of a substrate; forming a black matrix on the substrate having the transparent columns, wherein the black matrix defines the pixel regions; and forming pixel resin layers in the pixel regions, wherein the transparent columns project from the pixel resin layers and serve as post spacers.
  • the manufacturing method further comprises forming a transparent conductive layer on the black matrix and pixel resin layers.
  • the manufacturing method further comprises forming a transparent protective layer between the black matrix and pixel resin layers, and the transparent conductive layer.
  • forming of the plurality of transparent columns in pixel regions of a substrate comprises: forming an aperture mask in the pixel regions of the substrate; coating transparent resin on the substrate having the aperture mask; removing the transparent resin outside the pixel regions; curing the transparent resin; and removing the aperture mask.
  • forming of the aperture mask in the pixel regions of the substrate comprises: applying a metal foil to the substrate; removing the metal foil outside the pixel regions; forming the porous metal oxide mask by a two-step anodization process.
  • the metal foil is an aluminum foil.
  • the embodiments of the present disclosure provide a color filter, comprising: a substrate; a plurality of transparent columns formed in pixel regions of the substrate; a black matrix formed on the substrate, wherein the black matrix defines the pixel regions; and pixel resin layers formed in the pixel regions, wherein the transparent columns project from the pixel resin layers and serve as post spacers.
  • each of the transparent columns has a height of 6-15 ⁇ m.
  • a liquid crystal display panel comprises the above said color filters.
  • a display device comprises the above said liquid crystal display panel.
  • the present disclosure forms uniformly distributed transparent columns in the pixel regions of the substrate by using aperture/porous mask of aluminum oxide, the formation of the transparent columns is alike to forming apertures in the pixel resin layers.
  • the transparent columns act as the post spacers, and since they are uniformly distributed in the pixel regions, the stability of the cell gap is improved and bad display caused by uneven cell gap is avoided.
  • FIG. 1 is a sectional view of the color filter wherein the transparent columns are formed in the embodiments of the present disclosure
  • FIG. 2 is a sectional view of the color filter wherein the black matrix pattern is formed in the embodiments of the present disclosure
  • FIG. 3 is a sectional view of the color filter wherein the pixel resin layers are formed in the embodiments of the present disclosure
  • FIG. 4 is a sectional view of the color filter wherein the transparent protective layer is formed in the embodiments of the present disclosure
  • FIG. 5 is a sectional view of the color filter in the embodiments of the present disclosure.
  • FIG. 6 is an SEM photograph of the porous aluminum oxide mask in the embodiments of the present disclosure.
  • FIG. 7 is a flow chart of the method of manufacturing the color filter in the embodiments of the present disclosure.
  • FIG. 8 is a flow chart of the method of forming a plurality of transparent columns.
  • FIG. 9 is a flow chart of the method of forming the aperture mask in the pixel regions of the substrate.
  • the embodiments of the present disclosure provide a method of manufacturing a color filter, which forms uniformly distributed transparent columns in the pixel regions of the substrate by using aperture/porous mask of aluminum oxide, and the formation of the transparent columns is alike forming apertures in the pixel resin layers.
  • a method of manufacturing a color filter which forms uniformly distributed transparent columns in the pixel regions of the substrate by using aperture/porous mask of aluminum oxide, and the formation of the transparent columns is alike forming apertures in the pixel resin layers.
  • the transparent columns act as the post spacers, and since they are uniformly distributed in the pixel regions, the stability of the cell gap is improved and bad display caused by uneven cell gap is avoided.
  • the color filter of the embodiments of the present disclosure may comprise: a substrate 1 ; a plurality of transparent columns 2 formed in the pixel regions of the substrate 1 ; a black matrix 3 formed on the substrate 1 , the black matrix 3 defining the pixel regions; pixel resin layers (comprising a red pixel resin layer 4 , a green pixel resin layer 5 and a blue pixel resin layer 6 ) formed in the pixel regions, the transparent columns 2 projecting from the pixel resin layers and serving as post spacers.
  • the color filter may further comprise: a transparent conductive layer 8 formed over the black matrix 3 and the pixel resin layers; or
  • a transparent protective layer 7 formed on the black matrix 3 and the pixel resin layers, and a transparent conductive layer 8 formed on the transparent protective layer 7 .
  • each of the transparent columns may have a height of 6-15 ⁇ m
  • the black matrix may have a thickness of 1-5 ⁇ m
  • the pixel resin layers may have a thickness of 1-5 ⁇ m
  • the transparent protective layer may have a thickness of 1-5 ⁇ m.
  • the transparent columns and the transparent protective layer may be made of same material.
  • the transparent columns can be made of other transparent resin materials.
  • the method of manufacturing the color filter in the embodiments of the present disclosure may comprise:
  • Step 101 forming a plurality of transparent columns 2 in pixel regions of the substrate 1 ;
  • the method of forming a plurality of transparent columns 2 comprises: Step 201 : forming an aperture mask in the pixel regions of the substrate; Step 202 : coating transparent resin on the substrate having the aperture mask; Step 203 : removing the transparent resin outside the pixel regions by photolithography; and Step 204 : curing the transparent resin before Step 205 : removing the aperture mask, so that the transparent columns 2 are formed (as shown in FIG. 1 ).
  • the method of forming the aperture mask in the pixel regions of the substrate comprises: Step 301 : applying an aluminum foil to the substrate; Step 302 : removing the metal foil outside the pixel regions by etching; Step 303 : forming porous aluminum oxide mask by a two-step anodization process.
  • FIG. 6 is a top view of the formed porous aluminum oxide mask.
  • the aperture mask may be formed by applying other types of metal foils.
  • Each of the formed transparent columns 2 may have a height of 6-15 ⁇ m.
  • the density of the transparent columns 2 may be adjusted according to the desired aperture area in the pixel regions.
  • the transparent columns 2 may be formed throughout the pixel regions, or in a part of the pixel regions.
  • Step 102 forming a black matrix 3 on the substrate 1 having the transparent columns 2 , wherein the black matrix defines the pixel regions.
  • the black matrix 3 may be formed by photolithography or by ink jet method, and preferably by the ink jet method.
  • the black matrix 3 may have a thickness of 1-5 ⁇ m.
  • the pattern of the formed black matrix 3 is shown in FIG. 2 .
  • Step 103 forming pixel resin layers on the substrate having the black matrix 3 , the transparent columns 2 projecting from the pixel resin layers.
  • the transparent columns 2 may serve as post spacers.
  • the pixel resin layer(s) may be formed by photolithography or by an ink jet method, and preferably by the ink jet method. In this step, a red pixel resin layer, a green pixel resin layer and a blue pixel resin layer may be individually formed in three separate times.
  • the pixel resin layers may have a thickness of 1-5 ⁇ m. The pattern of the formed pixel resin layers is shown in FIG. 3 .
  • Step 104 forming a transparent protective layer 7 on the black matrix and the pixel resin layers.
  • the transparent protective layer 7 (as shown in FIG. 4 ) may be formed by coating, spraying or baking process, and preferably by the spraying process.
  • the transparent protective layer 7 may have a thickness of 1-5 ⁇ m.
  • Step 105 forming a transparent conductive layer 8 on the transparent protective layer 7 .
  • the transparent columns 2 project from the transparent conductive layer 8 and may serve as post spacers.
  • the transparent conductive layer (as shown in FIG. 5 ) may be formed by depositing or electroplating process.
  • the transparent conductive layer 8 may have a thickness of 500-2000 ⁇ .
  • the foregoing steps 104 and 105 may be selectively performed according to the practical situations.
  • the step 104 when the color filter does not comprise the transparent protective layer, the step 104 may be omitted; when the color filter does not comprise the transparent conductive layer, the step 105 may be omitted.
  • the embodiments of the present disclosure further provide a liquid crystal display panel, which comprises an array substrate, a color filter mentioned above, and a liquid crystal layer filled between the array substrate and the color filter.
  • the embodiments of the present disclosure further provide a display device, which comprises the above mentioned liquid crystal display panel.
  • the embodiments of the present disclosure provide a method of manufacturing a color filter, which forms uniformly distributed transparent columns in the pixel regions of the substrate by using aperture/porous mask of aluminum oxide, the formation of the transparent columns is alike to forming aperture in the pixel resin layers.
  • the transparent columns act as the post spacers, and since they are uniformly distributed in the pixel regions, the stability of the cell gap is improved and bad display caused by uneven cell gap is avoided.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
US14/126,964 2012-04-01 2012-11-12 Method for manufacturing color filter, color filter, and display device Expired - Fee Related US9360713B2 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
CN201210096977.9A CN102707360B (zh) 2012-04-01 2012-04-01 一种彩色滤光片的制作方法、彩色滤光片及显示装置
CN201210096977.9 2012-04-01
CN201210096977 2012-04-01
PCT/CN2012/084482 WO2013149469A1 (fr) 2012-04-01 2012-11-12 Procédé de fabrication de filtre coloré, filtre coloré et dispositif d'affichage

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US20140118670A1 US20140118670A1 (en) 2014-05-01
US9360713B2 true US9360713B2 (en) 2016-06-07

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EP (1) EP2835669B1 (fr)
CN (1) CN102707360B (fr)
WO (1) WO2013149469A1 (fr)

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Publication number Priority date Publication date Assignee Title
CN102707360B (zh) * 2012-04-01 2014-05-28 京东方科技集团股份有限公司 一种彩色滤光片的制作方法、彩色滤光片及显示装置
US10782184B2 (en) * 2016-09-06 2020-09-22 Advanced Semiconductor Engineering, Inc. Optical device and method of manufacturing the same
CN111199167B (zh) * 2018-11-16 2023-06-20 世界先进积体电路股份有限公司 光学感测结构及其形成方法
CN111274844B (zh) * 2018-12-04 2023-04-07 世界先进积体电路股份有限公司 半导体装置及其形成方法

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Publication number Publication date
CN102707360B (zh) 2014-05-28
US20140118670A1 (en) 2014-05-01
CN102707360A (zh) 2012-10-03
WO2013149469A1 (fr) 2013-10-10
EP2835669A4 (fr) 2015-09-09
EP2835669B1 (fr) 2018-07-25
EP2835669A1 (fr) 2015-02-11

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