US5576926A - Capacitor with buried isolated electrode - Google Patents

Capacitor with buried isolated electrode Download PDF

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Publication number
US5576926A
US5576926A US08/415,499 US41549995A US5576926A US 5576926 A US5576926 A US 5576926A US 41549995 A US41549995 A US 41549995A US 5576926 A US5576926 A US 5576926A
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United States
Prior art keywords
dielectric layer
layer
electrode layer
dielectric
length
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US08/415,499
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English (en)
Inventor
Richard Monsorno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
American Technical Ceramics Corp
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American Technical Ceramics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by American Technical Ceramics Corp filed Critical American Technical Ceramics Corp
Priority to US08/415,499 priority Critical patent/US5576926A/en
Assigned to AMERICAN TECHNICAL CERAMICS CORPORATION reassignment AMERICAN TECHNICAL CERAMICS CORPORATION ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: MONSORNO, RICHARD
Priority to IL11728096A priority patent/IL117280A/xx
Priority to TW085103349A priority patent/TW297129B/zh
Priority to EP96912432A priority patent/EP0835516B1/de
Priority to KR1019970706951A priority patent/KR100413813B1/ko
Priority to GB9715053A priority patent/GB2312327B/en
Priority to PCT/US1996/003883 priority patent/WO1996031890A1/en
Priority to DE69636455T priority patent/DE69636455T2/de
Priority to CN96192789A priority patent/CN1102795C/zh
Priority to JP8530326A priority patent/JPH11503271A/ja
Priority to CA002217155A priority patent/CA2217155C/en
Publication of US5576926A publication Critical patent/US5576926A/en
Application granted granted Critical
Priority to MXPA/A/1997/007136A priority patent/MXPA97007136A/xx
Priority to HK98110398A priority patent/HK1009553A1/xx
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G9/00Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/004Details
    • H01G9/04Electrodes or formation of dielectric layers thereon
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/002Details
    • H01G4/255Means for correcting the capacitance value
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/002Details
    • H01G4/018Dielectrics
    • H01G4/06Solid dielectrics
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/43Electric condenser making
    • Y10T29/435Solid dielectric type

Definitions

  • This invention relates generally to capacitors and more particularly to a ceramic capacitor which utilizes a buried layer.
  • Another object of the invention is to provide a buried layer capacitor which is highly reliable.
  • Another object of the invention is to provide a buried layer capacitor which is capable of highly reliable operation over a broad range of operating temperatures.
  • Yet another object of the invention is to provide a buried layer capacitor which can be manufactured in quantity at a low unit cost while maintaining high levels of quality.
  • a buried layer capacitor which includes a planar electrode layer mounted between a pair of dielectric layers. Length and width dimensions of the dielectric layers are slightly greater than corresponding length and width dimensions of the electrode layer and the electrode layer generally is centered with respect to the dielectric layers.
  • One layer of the pair of dielectric layers has a pair of spaced apart contact members, each having a different polarity from the other.
  • the dielectric layer which is attached to the contact member has a selected thickness which allows the dielectric layer, in combination with the electrode layer, to develop a desired value of capacitance between the contact members.
  • the pair of spaced apart contact members is replaced by a pair of metallized areas (each having a different polarity from the other) and the dielectric layer in combination with the electrode layer develop a desired value of capacitance between the two metallized areas.
  • the metallized areas facilitate mounting the buried layer capacitor on a circuit board while using minimum surface area of the circuit board.
  • the metallized areas extend onto end portions of the dielectric layer in order to facilitate testing of the capacitor.
  • FIG. 1 is a generally downwardly looking perspective view of a buried layer capacitor made in accordance with the present invention and having a portion of the capacitor shown broken away to reveal details of internal construction;
  • FIG. 2 is an elevational cross-sectional view taken along line 2--2 of FIG. 1;
  • FIG. 3 is a planar cross-sectional view taken along line 3--3 of FIG. 2;
  • FIG. 4 is an elevational cross-sectional view taken along the line 4--4 of FIG. 1;
  • FIG. 5 is a side elevational view taken along the line 5--5 of FIG. 1;
  • FIG. 6 is a generally downwardly looking perspective view of an alternative embodiment of the buried layer capacitor of FIG. 1;
  • FIG. 7 is a bottom planar view of the capacitor of FIG. 6 taken along the line 7--7 of FIG. 6;
  • FIG. 8 is a side elevational view of the capacitor of FIG. 6;
  • FIG. 9 is an end elevational view of the capacitor of FIG. 6;
  • FIG. 10 is a side elevational view of an alternative embodiment of the buried layer capacitor of FIG. 1, incorporating a pair of axial leads;
  • FIG. 11 is a bottom planar view of the capacitor of FIG. 10, taken along line 11--11 of FIG. 10;
  • FIG. 12 is a side elevational view of another embodiment of the buried layer capacitor of FIG. 1, incorporating metallized portions, each having a different polarity from the other, on the end surfaces of the dielectric layers;
  • FIG. 13 is an end elevational view of the capacitor of FIG. 12;
  • FIG. 14 is a perspective view of the capacitor of FIG. 12;
  • FIG. 15 is a bottom planar view of another embodiment of the buried layer capacitor of FIG. 1, similar to FIG. 7 and incorporating a square configuration;
  • FIG. 16 is an end elevational view of the capacitor of FIG. 15.
  • FIG. 1 a buried layer capacitor generally designated 10, made in accordance with the present invention, which includes an electrode layer 12, a first dielectric layer 14, a second dielectric layer 16 and a pair of contact members 18, 20, each having a different polarity from the other.
  • the dielectric layers 14, 16 are generally rectangular and as is shown in FIGS. 1 and 3, the electrode layer 12 also is generally rectangular, with length and width dimensions which are somewhat smaller than corresponding length and width dimensions of the dielectric layers 14, 16.
  • the electrode layer 12 is planar and generally is centered relative to the dielectric layers 14, 16 resulting in a border, generally designated by the reference numeral 22, which surrounds the periphery of the electrode layer 12.
  • the electrode layer 12 thus is completely contained or buried in the dielectric layers 14, 16.
  • the electrode layer may be silver, gold, nickel, copper or palladium or another high conductivity metal.
  • the contacts members 18, 20 are attached to a bottom surface 24 of the dielectric layer 14.
  • the contacts members 18, 20 are each planar and are made of any one of a number of metals which have desirable combination of stiffness and conductivity. Appropriate materials for the contact members are to be copper and silver.
  • the dielectric layers 14, 16 are made of any one of a number of dielectric materials such as magnesium titanate, strontium titanate or barium titanate.
  • the first dielectric layer 14 is disposed between the electrode layer 12 and the contacts members 18, 20.
  • the contacts members 18, 20 have a preferred thickness which is in the order of 0.01 inches.
  • the dielectric layer 14, in combination with the electrode layer 12 and the contacts members 18, 20, (each having a different polarity from the other) allow development of capacitance between the contacts members 18, 20.
  • the buried layer capacitor 10 of FIGS. 1-5 typically has the following dimensions which should be considered as given by way of illustration only and should not be considered as limiting in any way.
  • Overall length of the capacitor 10 is in an order of 0.05 inches, its width is in an order of 0.05 inches, its height is in an order of 0.02 inches.
  • Thickness of the dielectric layer 14 is in an order of 0.003 inches and thickness of the dielectric layer 16 is in an order of 0.017 inches.
  • the thickness of the dielectric layer 14 typically may range from 0.0005 inches to 0.01 inches in order to vary capacitance and the voltage rating of the capacitor 10.
  • the dimensions of the electrode layer 12 are typically as follows: length 0.045 inches, width 0.045 inches, and thickness 0.0001 inches.
  • FIGS. 6 and 7. An alternative embodiment of a capacitor generally designated 100 according to the invention is shown in FIGS. 6 and 7.
  • the contact members 18, 20 are replaced by a pair of metallized areas 102, 104 on a bottom surface 106 of the capacitor.
  • the metallized areas 102, 104 function as terminations, each having a different polarity from the other, and facilitate mounting of the capacitor 100 directly to a printed circuit board. Elimination of the contacts members 18, 20 results in use of a minimum amount of circuit board area for the capacitor 100.
  • the capacitor 100 includes a first dielectric layer 14 and a second dielectric layer 16 and an electrode layer 12, each of which are generally similar to corresponding parts which have been described in connection with the embodiment depicted in FIGS. 1-5.
  • the capacitor 100 typically includes an electrode layer 12 made of palladium and metallized areas 102, 104 or terminals made of silver.
  • the following physical dimensions and capacitance values for the buried layer capacitor 100 should be considered as given by way of example and should not be considered as limiting in any way.
  • the length dimension (as measured along edge 106) may range from 0.040 inches to 0.50 inches; the width (as measured along edge 108) may range from 0.020 inches to 0.50 inches; and the thickness (as measured along edge 110) may range from 0.010 to 0.10 inches.
  • the capacitor 100 is manufactured in the following sizes:
  • the margin or barrier at the sides and at the ends of the electrode layer 12 as indicated by the reference numeral 112 in FIG. 7 may range from 0.005 inches to 0.010 inches.
  • the gap between the terminations 102, 104 as indicated by the reference numeral 114 in FIGS. 6, 7 and 8 may range from 0.005 inches to 0.020 inches.
  • the thickness of the dielectric layer 14 between the electrode layer 12 and the terminations 102, 104 may range from less than 0.001 inches to 0.010 inches.
  • the length and width dimensions are made equal, thereby resulting in a the square configuration of the buried layer capacitor 200.
  • Typical values for capacitance for a buried layer capacitor 100 having a size designated as Size A in Table 1 for various values of dielectric thickness, margin size, gap spacing and dielectric constant are shown in Table 2.
  • the capacitance values shown are in pico Farads (pF) as measured between terminations 102, 104.
  • the capacitance of the buried layer capacitor 100 can be adjusted by adjusting the gap 114 between the terminations 102, 104 each having a different polarity from the other. This adjustment may be performed as part of a final manufacturing process and eliminates need for contacting and trimming the electrode layer 12. This adjustment may be accomplished by trimming or cutting away a small portion of the terminations along the edges 116, 118 using conventional abrasion cutting or laser cutting equipment.
  • FIGS. 10 and 11 show an alternative embodiment of the buried layer capacitor contacts members 300 which incorporates axial leads contacts members 302, 304.
  • the axial contacts members 302, 304 provide an alternative mounting configuration.
  • FIGS. 12-14 show another alternate embodiment of the buried layer capacitor generally designated 400 in which the metallized areas 102, 104 or cathode and anode shown in FIG. 6 have been modified to extend onto the end surfaces 402, 404 of the dielectric layers 14, 16.
  • the terminations 406, 408 on the buried layer capacitor 400 facilitate the use of test equipment in which probes are placed on surfaces 410, 412 in order to measure performance characteristics of the capacitor 400.
  • the relatively thicker dielectric layer 16 contributes to overall ruggedness of the buried layer capacitors generally designated 10, 100, 200, 300, 400, respectively thicker dielectric layer 16. This makes it possible to handle these capacitors using conventional production type automatic handling equipment, even though the dielectric layer 14 is in the range of 0.0001 inches to 0.01 inches.
  • a key feature of the buried layer capacitors generally designate 10, 100, 200, 300, 400, respectively is their performances at very high frequencies.
  • a typical capacitor made according to the prior art is useful up to approximately 11 gigaHertz (11 GHz).
  • Tests performed on capacitors made according to the present invention indicate useful performance to approximately 20 GHz.

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
US08/415,499 1995-04-03 1995-04-03 Capacitor with buried isolated electrode Expired - Lifetime US5576926A (en)

Priority Applications (13)

Application Number Priority Date Filing Date Title
US08/415,499 US5576926A (en) 1995-04-03 1995-04-03 Capacitor with buried isolated electrode
IL11728096A IL117280A (en) 1995-04-03 1996-02-27 Buried layer capacitor
TW085103349A TW297129B (de) 1995-04-03 1996-03-20
PCT/US1996/003883 WO1996031890A1 (en) 1995-04-03 1996-03-22 Buried layer capacitor
CA002217155A CA2217155C (en) 1995-04-03 1996-03-22 Buried layer capacitor
GB9715053A GB2312327B (en) 1995-04-03 1996-03-22 Buried layer capacitor
EP96912432A EP0835516B1 (de) 1995-04-03 1996-03-22 Kondensator mit vergrabener schicht
DE69636455T DE69636455T2 (de) 1995-04-03 1996-03-22 Kondensator mit vergrabener schicht
CN96192789A CN1102795C (zh) 1995-04-03 1996-03-22 埋层式电容器
JP8530326A JPH11503271A (ja) 1995-04-03 1996-03-22 埋込層形容量素子
KR1019970706951A KR100413813B1 (ko) 1995-04-03 1996-03-22 매몰층커패시터
MXPA/A/1997/007136A MXPA97007136A (en) 1995-04-03 1997-09-19 Buried layer capacitor
HK98110398A HK1009553A1 (en) 1995-04-03 1998-09-03 Buried layer capacitor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/415,499 US5576926A (en) 1995-04-03 1995-04-03 Capacitor with buried isolated electrode

Publications (1)

Publication Number Publication Date
US5576926A true US5576926A (en) 1996-11-19

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Family Applications (1)

Application Number Title Priority Date Filing Date
US08/415,499 Expired - Lifetime US5576926A (en) 1995-04-03 1995-04-03 Capacitor with buried isolated electrode

Country Status (12)

Country Link
US (1) US5576926A (de)
EP (1) EP0835516B1 (de)
JP (1) JPH11503271A (de)
KR (1) KR100413813B1 (de)
CN (1) CN1102795C (de)
CA (1) CA2217155C (de)
DE (1) DE69636455T2 (de)
GB (1) GB2312327B (de)
HK (1) HK1009553A1 (de)
IL (1) IL117280A (de)
TW (1) TW297129B (de)
WO (1) WO1996031890A1 (de)

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6362948B1 (en) * 1998-07-10 2002-03-26 Murata Manufacturing Co., Ltd. Electronic component
US6366443B1 (en) 1997-12-09 2002-04-02 Daniel Devoe Ceramic chip capacitor of conventional volume and external form having increased capacitance from use of closely-spaced interior conductive planes reliably connecting to positionally-tolerant exterior pads through multiple redundant vias
US6473291B1 (en) * 1999-03-16 2002-10-29 Gb Aquisition Co., Inc. Low inductance four terminal capacitor lead frame
US6542352B1 (en) 1997-12-09 2003-04-01 Daniel Devoe Ceramic chip capacitor of conventional volume and external form having increased capacitance from use of closely spaced interior conductive planes reliably connecting to positionally tolerant exterior pads through multiple redundant vias
US6587327B1 (en) * 2002-05-17 2003-07-01 Daniel Devoe Integrated broadband ceramic capacitor array
US6661639B1 (en) 2002-07-02 2003-12-09 Presidio Components, Inc. Single layer capacitor
US20040042156A1 (en) * 2002-05-17 2004-03-04 Daniel Devoe Integrated broadband ceramic capacitor array
US20040057192A1 (en) * 2001-09-05 2004-03-25 Galvagni John L. Cascade capacitor
US20040111880A1 (en) * 1998-08-25 2004-06-17 Norio Sakai Multilayer electronic part and method of producing the same
US6777254B1 (en) 1999-07-06 2004-08-17 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and fabrication method thereof
US6885539B1 (en) 2003-12-02 2005-04-26 Presidio Components, Inc. Single layer capacitor
US6917509B1 (en) 2002-11-21 2005-07-12 Daniel F. Devoe Single layer capacitor with dissimilar metallizations
US20050185360A1 (en) * 2004-02-06 2005-08-25 Avx Corporation Integrated capacitor assembly
US6992879B2 (en) * 2000-06-19 2006-01-31 Monsorno Richard V Capacitor with buried electrode
US7035080B1 (en) 2004-11-22 2006-04-25 Lambert Devoe Combined multilayer and single-layer capacitor for wirebonding
US7075776B1 (en) * 2002-05-17 2006-07-11 Daniel Devoe Integrated broadband ceramic capacitor array
US20070084032A1 (en) * 2004-09-14 2007-04-19 John Mruz Method of making an orientation-insensitive ultra-wideband coupling capacitor
US20070151313A1 (en) * 2005-12-31 2007-07-05 Hon Hai Precision Industry Co., Ltd. Computer enclosure with locking apparatus
US7307829B1 (en) 2002-05-17 2007-12-11 Daniel Devoe Integrated broadband ceramic capacitor array
EP2267737A2 (de) 2004-09-13 2010-12-29 American Technical Ceramics Corporation elektronisches Komponent mit einem RF-Komponent
DE102012108035A1 (de) * 2012-08-30 2014-06-12 Epcos Ag Kondensator mit verbessertem linearen Verhalten
US10192952B2 (en) 2016-03-07 2019-01-29 Avx Corporation Multi-layer electronic device

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6483692B2 (en) * 2000-12-19 2002-11-19 Intel Corporation Capacitor with extended surface lands and method of fabrication therefor
US7548432B2 (en) 2005-03-24 2009-06-16 Agency For Science, Technology And Research Embedded capacitor structure

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US5170317A (en) * 1990-01-09 1992-12-08 Murata Manufacturing Co., Ltd. Multilayer capacitor

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Publication number Priority date Publication date Assignee Title
US3648132A (en) * 1970-04-20 1972-03-07 Illinois Tool Works Multilayer capacitor and process for adjusting the value thereof
US4193106A (en) * 1978-01-24 1980-03-11 Sprague Electric Company Monolithic ceramic capacitor with fuse link
US4887186A (en) * 1988-04-12 1989-12-12 Matsushita Electric Industrial Co., Ltd. Multi-layered dielectric element
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Cited By (52)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6751082B2 (en) 1997-12-09 2004-06-15 Daniel Devoe Ceramic chip capacitor of conventional volume and external form having increased capacitance from use of closely spaced interior conductive planes reliably connecting to positionally tolerant exterior pads through multiple redundant vias
US6366443B1 (en) 1997-12-09 2002-04-02 Daniel Devoe Ceramic chip capacitor of conventional volume and external form having increased capacitance from use of closely-spaced interior conductive planes reliably connecting to positionally-tolerant exterior pads through multiple redundant vias
US6542352B1 (en) 1997-12-09 2003-04-01 Daniel Devoe Ceramic chip capacitor of conventional volume and external form having increased capacitance from use of closely spaced interior conductive planes reliably connecting to positionally tolerant exterior pads through multiple redundant vias
US20030161091A1 (en) * 1997-12-09 2003-08-28 Daniel Devoe Ceramic chip capacitor of conventional volume and external form having increased capacitance from use of closely spaced interior conductive planes reliably connecting to positionally tolerant exterior pads through multiple redundant vias
US20030161090A1 (en) * 1997-12-09 2003-08-28 Daniel Devoe Ceramic chip capacitor of conventional volume and external form having increased capacitance from use of closely spaced interior conductive planes reliably connecting to positionally tolerant exterior pads through multiple redundant vias
US6753218B2 (en) 1997-12-09 2004-06-22 Daniel Devoe Ceramic chip capacitor of conventional volume and external form having increased capacitance from use of closely spaced interior conductive planes reliably connecting to positionally tolerant exterior pads through multiple redundant vias
US6362948B1 (en) * 1998-07-10 2002-03-26 Murata Manufacturing Co., Ltd. Electronic component
US20040111880A1 (en) * 1998-08-25 2004-06-17 Norio Sakai Multilayer electronic part and method of producing the same
US6473291B1 (en) * 1999-03-16 2002-10-29 Gb Aquisition Co., Inc. Low inductance four terminal capacitor lead frame
US8530896B2 (en) 1999-07-06 2013-09-10 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device comprising a pixel unit including an auxiliary capacitor
US8859353B2 (en) 1999-07-06 2014-10-14 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and fabrication method thereof
US9343570B2 (en) 1999-07-06 2016-05-17 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and fabrication method thereof
US6777254B1 (en) 1999-07-06 2004-08-17 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and fabrication method thereof
US7569854B2 (en) 1999-07-06 2009-08-04 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and fabrication method thereof
US20040222467A1 (en) * 1999-07-06 2004-11-11 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and fabrication method thereof
US9786787B2 (en) 1999-07-06 2017-10-10 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and fabrication method thereof
US6992879B2 (en) * 2000-06-19 2006-01-31 Monsorno Richard V Capacitor with buried electrode
US20040057192A1 (en) * 2001-09-05 2004-03-25 Galvagni John L. Cascade capacitor
US6757152B2 (en) 2001-09-05 2004-06-29 Avx Corporation Cascade capacitor
US7263764B2 (en) 2001-09-05 2007-09-04 Avx Corporation Method for adjusting performance characteristics of a multilayer component
US7075776B1 (en) * 2002-05-17 2006-07-11 Daniel Devoe Integrated broadband ceramic capacitor array
US6970341B1 (en) 2002-05-17 2005-11-29 Daniel Devoe Integrated broadband ceramic capacitor array
US6816356B2 (en) 2002-05-17 2004-11-09 Daniel Devoe Integrated broadband ceramic capacitor array
US6587327B1 (en) * 2002-05-17 2003-07-01 Daniel Devoe Integrated broadband ceramic capacitor array
US7307829B1 (en) 2002-05-17 2007-12-11 Daniel Devoe Integrated broadband ceramic capacitor array
US20040042156A1 (en) * 2002-05-17 2004-03-04 Daniel Devoe Integrated broadband ceramic capacitor array
US6822847B2 (en) 2002-07-02 2004-11-23 Presidio Components, Inc. Single layer capacitor
US6969647B2 (en) 2002-07-02 2005-11-29 Presidio Components, Inc. Method of making single layer capacitor
US20050057887A1 (en) * 2002-07-02 2005-03-17 Presidio Components, Inc. Single layer capacitor
US20040090733A1 (en) * 2002-07-02 2004-05-13 Presidio Components, Inc. Single layer capacitor
US6661639B1 (en) 2002-07-02 2003-12-09 Presidio Components, Inc. Single layer capacitor
US6917509B1 (en) 2002-11-21 2005-07-12 Daniel F. Devoe Single layer capacitor with dissimilar metallizations
US6885539B1 (en) 2003-12-02 2005-04-26 Presidio Components, Inc. Single layer capacitor
US7685703B1 (en) 2003-12-02 2010-03-30 Presidio Components, Inc. Method of making an essentially monolithic capacitor
US7444726B1 (en) 2003-12-02 2008-11-04 Presidio Components, Inc. Method of making an essentially monolithic capacitor
US20060250748A1 (en) * 2004-02-06 2006-11-09 Robert Purple Integrated capacitor assembly
US7133275B2 (en) 2004-02-06 2006-11-07 Avx Corporation Integrated capacitor assembly
US20050185360A1 (en) * 2004-02-06 2005-08-25 Avx Corporation Integrated capacitor assembly
US7641933B2 (en) 2004-02-06 2010-01-05 Avx Corporation Integrated capacitor assembly
EP2267737A2 (de) 2004-09-13 2010-12-29 American Technical Ceramics Corporation elektronisches Komponent mit einem RF-Komponent
US7554424B2 (en) 2004-09-14 2009-06-30 American Technical Ceramics Corporation Electronic component and method of making
US20080197940A1 (en) * 2004-09-14 2008-08-21 John Mruz Method of making an orientation-insensitive ultra-wideband coupling capacitor
US7364598B2 (en) * 2004-09-14 2008-04-29 American Technical Ceramics Corporation Method of making an orientation-insensitive ultra-wideband coupling capacitor
US20070084032A1 (en) * 2004-09-14 2007-04-19 John Mruz Method of making an orientation-insensitive ultra-wideband coupling capacitor
US7035080B1 (en) 2004-11-22 2006-04-25 Lambert Devoe Combined multilayer and single-layer capacitor for wirebonding
US7428835B2 (en) * 2005-12-31 2008-09-30 Hon Hai Precision Industry Co., Ltd. Computer enclosure with locking apparatus
US20070151313A1 (en) * 2005-12-31 2007-07-05 Hon Hai Precision Industry Co., Ltd. Computer enclosure with locking apparatus
DE102012108035A1 (de) * 2012-08-30 2014-06-12 Epcos Ag Kondensator mit verbessertem linearen Verhalten
DE102012108035B4 (de) * 2012-08-30 2016-06-16 Epcos Ag Kondensator mit verbessertem linearen Verhalten
US9837214B2 (en) 2012-08-30 2017-12-05 Snaptrack, Inc. Capacitor having an improved linear behavior
US10192952B2 (en) 2016-03-07 2019-01-29 Avx Corporation Multi-layer electronic device
US10622438B2 (en) 2016-03-07 2020-04-14 Avx Corporation Multi-layer electronic device

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EP0835516A4 (de) 2003-05-02
WO1996031890A1 (en) 1996-10-10
CN1102795C (zh) 2003-03-05
CN1179230A (zh) 1998-04-15
JPH11503271A (ja) 1999-03-23
IL117280A0 (en) 1996-06-18
KR100413813B1 (ko) 2004-04-03
CA2217155A1 (en) 1996-10-10
GB2312327A (en) 1997-10-22
EP0835516A1 (de) 1998-04-15
KR19980703547A (ko) 1998-11-05
TW297129B (de) 1997-02-01
GB9715053D0 (en) 1997-09-24
IL117280A (en) 2003-09-17
MX9707136A (es) 1998-06-30
HK1009553A1 (en) 1999-09-10
EP0835516B1 (de) 2006-08-16
DE69636455T2 (de) 2007-03-29
GB2312327B (en) 1998-10-07
DE69636455D1 (de) 2006-09-28
CA2217155C (en) 2002-08-20

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