US3902930A - Method of manufacturing iron-silicon-aluminum alloy particularly suitable for magnetic head core - Google Patents

Method of manufacturing iron-silicon-aluminum alloy particularly suitable for magnetic head core Download PDF

Info

Publication number
US3902930A
US3902930A US339829A US33982973A US3902930A US 3902930 A US3902930 A US 3902930A US 339829 A US339829 A US 339829A US 33982973 A US33982973 A US 33982973A US 3902930 A US3902930 A US 3902930A
Authority
US
United States
Prior art keywords
alloy
silicon
layer
plate
aluminum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US339829A
Other languages
English (en)
Inventor
Takeo Sata
Tomoo Yamagishi
Kanzaburou Iijima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Gakki Co Ltd
Original Assignee
Nippon Gakki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP47025410A external-priority patent/JPS5229247B2/ja
Priority claimed from JP47025518A external-priority patent/JPS515990B2/ja
Priority claimed from JP47025456A external-priority patent/JPS4893522A/ja
Application filed by Nippon Gakki Co Ltd filed Critical Nippon Gakki Co Ltd
Application granted granted Critical
Publication of US3902930A publication Critical patent/US3902930A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C1/00—Making non-ferrous alloys
    • C22C1/02—Making non-ferrous alloys by melting
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C10/00—Solid state diffusion of only metal elements or silicon into metallic material surfaces
    • C23C10/28—Solid state diffusion of only metal elements or silicon into metallic material surfaces using solids, e.g. powders, pastes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/11—Magnetic recording head
    • Y10T428/115—Magnetic layer composition

Definitions

  • ABSTRACT A silicon layer is first formed on the surface of an iron-aluminum (Fe-Al) alloy and is then diffused into the Fe-Al alloy by subjecting the silicon layer thus formed on the alloy to a substantial amount of heat, so that an iron-silicon-aluminum alloy or the so-called sendust alloy can be produced.
  • the Fe-Al alloy may be ion-bombarded before the silicon layer is deposited thereon, so as to prevent the silicon layer from peeling off during the silicon-layer-depositing process.
  • an Fe-Al alloy is siliconized through the chemically siliconizing process and then the silicon contained in the siliconized alloy is diffused to obtain the resultant sendust alloy.
  • sendust alloys having a greater range of thickness, from thin to thick can be produced without any complicated process, and moreover, the layer of silicon will never come off during the manufacturing process.
  • the sendust alloy thus produced is quite suitable for use as the core material of magnetic heads requiring highly desirable performance.
  • the present invention relates to an iron-silicon aluminum alloy or the so-called sendust alloy, especially suitable for use as magnetic head cores. More particularly, the present invention concerns a method of making a sendust alloy by diffusing silicon in an Fe-Al alloy and also concerns a magnetic head core made of such an Fe-Si-Al alloy.
  • Sendust alloy is of a high hardness and a high magnetic permeability. Accordingly, it is suitable for use as the material of, for example, magnetic recording (or reproducing) heads for video tape recorders or for audio tape recorders.
  • magnetic recording (or reproducing) heads for video tape recorders or for audio tape recorders.
  • the magnetic heads of the recorder are required to have a high ability of performance.
  • These magnetic heads require that their core is made of a magnetic material having a high magnetic permeability with little loss of permeability during use. The majority of this loss occurring in the magnetic material is represented by the eddy current loss.
  • One of them is to obtain thin plates from a pre-cast alloy block by cutting it with a grinder or by electrolytic cutting or discharge cutting. Another one of them is to manufacture thin plates by subjecting powder of material to sintering at high temperature or to discharge-sintering or to rolling. Still another one of them is to obtain thin plates by vapor plating method from the vapor of a compound of iron, aluminum, silicon or the like.
  • each of these known methods requires a fairly long time till the product is obtained.
  • such a known method has further drawbacks that the manufacturing process is complicated or that it is difficult to produce thin plates.
  • One such known method has a difficulty in producing thick plates, and another known method has a difficulty in processing the material into a required shape.
  • a primary object of the present invention to provide a method of easily making a high quality iron-silicon-aluminum or sendust alloy of a desired shape.
  • Such iron-silicon-aluminum or sendust alloy intended to produce by the method of this invention is an alloy consisting preferably of 4 to 8% of aluminum, 8 to 12% of silicon and the remainder of iron.
  • Another object of the present invention is to provide a method of especially making very thin sendust alloy with easiness.
  • Still another object of the present invention is to provide magnetic head cores made of a sendust alloy prepared according to the above-mentioned method of the present invention.
  • FIG. 1 is a photograph of actual size showing the state in which a layer of silicon is formed on an Fe-Al alloy which has not been given an ion bombardment treatment.
  • FIG. 2 is a'photograph of real size showing the state in which a layer of silicon is formed on an Fe-Al alloy according to the method of the present invention- DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
  • An iron-silicon-aluminum or sendust alloy intended to produce by the method of this invention is an alloy consisting preferably of 4 to 8% of aluminum, 8 to l2of silicon and the remainder of iron.
  • the methods of forming a layer of silicon on the surface of an Fe-Al alloy there are those methods one of which is to heat silane or dichloro silane or the like in a vacuum vessel to evaporation-deposit silicon on the surface of the alloy. Another method is to deposit silicon on the surface of the alloy by sputtering in a vacuum vessel. Each of these methods may be employed.
  • an Fe-Al alloy on which a layer of silicon has been formed is heated in a diffusion furnace to diffuse silicon into this alloy, thereby making a sendust alloy.
  • a silicon layer is deposited by heating an Fe-Al alloy plate as stated above, there is the fear that the thus formed layer of silicon comes off the surface of the alloy plate due to the difference in the expansion coefficient between the formed silicon layer and the Fe-Al alloy plate carrying this layer when the latter plate is cooled close to room temperature.
  • the fear of this silicon layer to come off can be eliminated by performing the diffusion treatment while maintaining the silicon layer-coated Fe-Al alloy plate at a high temperature, preferably from 900 to 1,300C.
  • the aforesaid Fe-Al alloy which is used in the aforesaid process may be formed into a plate having a thickness of 5 to 500 micrometers (pm), which can be easily obtained by rolling and also can be easily punched.
  • a sendust alloy of a desired shape such as a plate having a considerable thickness or having a small thickness or a plate of a shape formed by punching.
  • a thin plate of Fe-Al alloy is not of an extremely complicated configuration, it is still possible to punch this alloy plate even after silicon has been diffused therein.
  • a sendust alloy either by the use of an Fe-Si alloy containing therein silicon to such a degree as will permit rolling of this alloy and by depositing both Al and Si in appropriate amounts onto this alloy, or by the use of an Fe-Si-Al alloy containing therein both Si and Al to such a degree as will permit the rolling of this alloy and by depositing thereon Si and Al in appropriate amounts, and by diffusing Si and Al into the resulting alloy having Al and Si deposited thereon as a layer.
  • Si diffuses quicker than does Al, there is a difficulty in the control of the ratio of silicon and aluminum in such layer and the control of the temperature for the diffusion, thus making these methods impractical.
  • the method of making a sendust alloy according to the present invention which is designed to form a silicon layer whose diffusion speed is greater than aluminum on the surface of an Fe-Al alloy and to diffuse silicon into this alloy is most advantageous.
  • An Fe-Al alloy plate containing 6% of aluminum is rolled to a plate of 0.05 mm in thickness. Then, the surface of this alloy plate is cleaned by electrolytic polishing.
  • the resulting alloy base plate is placed in a vacuum vessel in which silicon is heated to cause silicon to evaporate by the use of an electron beam. As a result, a layer of silicon having a thickness of 0.014 mm is deposited on the surface of the thin Fe-A] alloy plate. In the same way, a layer of silicon having a thickness of 0.014 mm is deposited on the other side of said thin alloy plate. Thereafter, the resulting thin plate is placed in a diffusion furnace held at 1,200C to subject it to a diffusion treatment for 60 minutes in a high purity hydrogen currents to prevent oxidation of silicon.
  • the sendust alloy plate made according to the method described above shows the following magnetic characteristic at 0.4 A/m:
  • the diffusion treatment is carried out at a temperature of l,200C for 60 minutes in a hydrogen gas.
  • the temperature may range from 900 to l,300C and that the time during which such temperature is maintained is varied depending on the temperature selected and the thickness of the Fe-Al alloy as well as the amount of silicon.
  • a hydrogen gas used in the above-mentioned example, a helium, argon, or nitrogen gas may be used, or the diffusion treatment may be carried out in a vacuum.
  • an improved method of making a sendust alloy such that, during the manufacture of a thin Fe-Si-Al alloy plate by first forming a layer of silicon on the surface of a thin Fe-Al alloy plate and then by diffusing silicon in this alloy by heating the alloy carrying said layer, there occurs no separation of the layer of silicon formed.
  • a thin Fe-Si-Al alloy plate by first forming a layer of only silicon on the surface of a thin plate of Fe-Al alloy obtained by rolling an Fe-Al alloy block having a relatively low hardness than a'sendust alloy and then by diffusing silicon into the alloy by heating the silicon layercarrying alloy plate in an atmosphere such as hydrogen, there has been a difficulty encountered during the step of forming the layer of silicon on the surface of the thin Fe-Al alloy base plate by deposition of silicon by an electron beam or like method because of the fact that, in case the thickness of the silicon layer being formed is of a thickness especially in the order of 5-10, pm, the silicon layer comes off in fibrous manner as shown in FIG. 1.
  • This method according to another embodiment of the present invention solves these drawbacks and insures that, during the formation of a silicon layer on the surface of an Fe-Al alloy base, this layer of silicon never comes off the base plate. To this end, the surface of the Fe-Al alloy base plate is subjected to an ion bombarding treatment prior to the formation of a silicon layer on this surface.
  • a thin Fe-Al alloy plate having a desired thickness of pm or less is prepared by rolling an Fe-Al block.
  • This thin alloy plate is placed within a bell jar filled with argon gas held at a pressure of 10 to 10 mmHg.
  • the surface of the thin plate is subjected to ion bombardment with argon ions for about minutes by the ion bombarding device provided in said bell jar.
  • a layer of silicon is evaporation-deposited on the surface of the plate to a thickness of about 10 ,um.
  • the resulting plate carrying this silicon layer is heated to diffuse silicon into the alloy.
  • a thin Fe-Si-Al alloy plate is produced.
  • FIG. 2 shows such a thin Fe-Al-Si'alloy plate produced according to said'embodiment of the present invention. It is to be noted that this product is made in a manner similar to that for the manufacture of the product shown in FIG. 1 excepting the fact that the former is subjected to ion bombardment. According to this embodiment, the adherency of the silicon layer, as it is being formed, to the surface of the Fe-Alalloy base plate is such that no fibrous peel-off of the silicon layer occurs at all.
  • the iron-silicon-aluminum alloy is produced by first siliconizing an Fe-Al alloy base plate through the chemically siliconizing process and then by diffusing the siliconized alloy at a high temperature.
  • a block of Al-Fe alloy consisting, for example, of 5.6% of aluminum the remainder of iron and having been shaped previously by a predetermined method is rolled to have a desired thickness, for example, 0.2 mm (a thickness range of 0.1 to 2 mm is preferred).
  • This plate of alloy is then punched into the shape of, for example, the core of a magnetic head.
  • This shaped thin Al-Fe alloy plate is introduced into, for example, a reaction furnace held at l,200C.
  • silicon tetrachloride SiCl at the rate of 100 cc per minute.
  • siliconizing of the Fe-Al alloy base plate is conducted for 10 minutes.
  • silicon tetrachloride reacts against the Al-Fe alloy plate and silicon infiltrates in the region close to the surface of the Al-Fe alloy plate, forming there a layer of infiltrated silicon or siliconized layer.
  • the resulting alloy plate having saidlayer of infiltrated silicon close to the surface of this alloy is placed in a diffusion furnace held at, for example, l,200C and is heated for 30 minutes in hydrogen gas currents of high purity to perform diffusion of silicon in the Al-Fe alloy.
  • hydrogen gas a helium, argon, or nitrogen gas may be used, or the diffusion is carried out in a vacuum.
  • the component silicon contained in the siliconized layer which has been formed close to the surface of the Al-Fe alloy plate is caused to diffuse uniformly in the alloy.
  • a sendust alloy is produced.
  • the reaction and diffusion furnaces are held at a temperature of 1,200C, but the temperature at which the reaction and diffusion furnaces are held may range from 900 to 1,300C. Also, the volume percent of the silicon tetrachloride contained in the argon gas may be from I to 20 volume'percent.
  • this method rolling or desired punching is performed on the Al-Fe alloy plate in the stage before being added with silicon.
  • This method is especially effective in the manufacture of a sendust alloy of a small thickness. If such thin pieces of sendust alloy prepared according to this method are used as the magnetic material of the core of magnetic heads for instance, it is possible to construct a core by laminating several very thin pieces of sendust alloy one upon another. Thus, it is possible to obtain a highly capable magnetic head presenting a very low loss of eddy current and yet exhibiting an excellent magnetic characteristic.
  • a sendust alloy plate prepared in the manner described above is heated at 1,000C for minutes in a high purity hydrogen, then cooling it to 700C at which temperature the plate is held for 30 minutes. Thereafter, the plate is cooled from 700C to room temperature at the rate of lowering by 300C per hour.
  • the resulting alloy plate having received the aforesaid heat treatment which is now used as a magnetic material, shows a magnetic characteristic: at 0.8 A/m, the initial relative magnetic permeability of 8,000 and the maximum relative magnetic permeability of 35,000.
  • a sendust alloy having a very good magnetic characteristic is obtained.
  • a mixed atmosphere consisting of argon current containing silicon tetrachloride is used. It should be understood, however, that the type of atmosphere is not limited thereto, but a mixed atmosphere consisting of silicon tetrachloride and hydrogen or nitrogen as a carrier, or a mixed atmosphere consisting of silane or dichloro silane and hydrogen or argon or nitrogen as a carrier may be used also.
  • step (a) sputtering silicon onto the surface of the Fe-Al alloy under vacuum conditions; and thereafter b. heating the thus-coated alloy of step (a) in a diffusion furnace at a temperature of about 900 to about 1,300C and diffusing the silicon layer uniformly into the underlying Fe-Al alloy, the high temperature employed avoiding separating and improving the adherency of the deposited silicon layer during process, to produce said alloy com- 8 posed of 4 to 8% aluminum, 8 to 12% silicon and balance iron.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Magnetic Heads (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
  • Soft Magnetic Materials (AREA)
US339829A 1972-03-13 1973-03-09 Method of manufacturing iron-silicon-aluminum alloy particularly suitable for magnetic head core Expired - Lifetime US3902930A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP47025410A JPS5229247B2 (enrdf_load_stackoverflow) 1972-03-13 1972-03-13
JP47025518A JPS515990B2 (enrdf_load_stackoverflow) 1972-03-13 1972-03-13
JP47025456A JPS4893522A (enrdf_load_stackoverflow) 1972-03-13 1972-03-13

Publications (1)

Publication Number Publication Date
US3902930A true US3902930A (en) 1975-09-02

Family

ID=27285005

Family Applications (1)

Application Number Title Priority Date Filing Date
US339829A Expired - Lifetime US3902930A (en) 1972-03-13 1973-03-09 Method of manufacturing iron-silicon-aluminum alloy particularly suitable for magnetic head core

Country Status (3)

Country Link
US (1) US3902930A (enrdf_load_stackoverflow)
GB (1) GB1376852A (enrdf_load_stackoverflow)
NL (1) NL7303477A (enrdf_load_stackoverflow)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4177089A (en) * 1976-04-27 1979-12-04 The Arnold Engineering Company Magnetic particles and compacts thereof
US4244722A (en) * 1977-12-09 1981-01-13 Noboru Tsuya Method for manufacturing thin and flexible ribbon of dielectric material having high dielectric constant
US4257830A (en) * 1977-12-30 1981-03-24 Noboru Tsuya Method of manufacturing a thin ribbon of magnetic material
US4265682A (en) * 1978-09-19 1981-05-05 Norboru Tsuya High silicon steel thin strips and a method for producing the same
US4548643A (en) * 1983-12-20 1985-10-22 Trw Inc. Corrosion resistant gray cast iron graphite flake alloys
US4714632A (en) * 1985-12-11 1987-12-22 Air Products And Chemicals, Inc. Method of producing silicon diffusion coatings on metal articles
US4822642A (en) * 1985-12-11 1989-04-18 Air Products And Chemicals, Inc. Method of producing silicon diffusion coatings on metal articles
US4869929A (en) * 1987-11-10 1989-09-26 Air Products And Chemicals, Inc. Process for preparing sic protective films on metallic or metal impregnated substrates
US5372843A (en) * 1991-03-12 1994-12-13 Hitachi, Ltd. Process for producing a magnetic recording medium using a patterned diffusion barrier
US5558944A (en) * 1993-08-10 1996-09-24 Tdk Corporation Magnetic head and a process for production thereof
US5571591A (en) * 1992-05-01 1996-11-05 International Business Machines Corporation Magnetic film patterning by germanium or silicon diffusion
CN103658640A (zh) * 2013-12-27 2014-03-26 安徽华东光电技术研究所 一种用于速调管的铁硅铝吸收膏剂的配置、涂覆及烧结方法

Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2193768A (en) * 1932-02-06 1940-03-12 Kinzoku Zairyo Kenkyusho Magnetic alloys
US2911533A (en) * 1957-12-24 1959-11-03 Arthur C Damask Electron irradiation of solids
US3159511A (en) * 1956-11-08 1964-12-01 Yawata Iron & Steel Co Process of producing single-oriented silicon steel
US3224909A (en) * 1961-11-29 1965-12-21 Licentia Gmbh Siliconizing of electrical sheet steel by diffusion
US3230074A (en) * 1962-07-16 1966-01-18 Chrysler Corp Process of making iron-aluminum alloys and components thereof
US3347718A (en) * 1964-01-20 1967-10-17 Armco Steel Corp Method for improving the magnetic properties of ferrous sheets
US3384517A (en) * 1964-12-22 1968-05-21 Nat Res Dev Copper/iron/aluminm alloys
US3385725A (en) * 1964-03-23 1968-05-28 Ibm Nickel-iron-phosphorus alloy coatings formed by electroless deposition
US3423253A (en) * 1968-02-23 1969-01-21 Allegheny Ludlum Steel Method of increasing the silicon content of wrought grain oriented silicon steel
US3681152A (en) * 1971-03-25 1972-08-01 Allegheny Ludlum Ind Inc Method of siliconizing
US3718502A (en) * 1969-10-15 1973-02-27 J Gibbons Enhancement of diffusion of atoms into a heated substrate by bombardment
US3756867A (en) * 1969-11-03 1973-09-04 Cie Ateliers Et Forges De La L Method of producing silicon steels with oriented grains by coiling with aluminum strip

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2193768A (en) * 1932-02-06 1940-03-12 Kinzoku Zairyo Kenkyusho Magnetic alloys
US3159511A (en) * 1956-11-08 1964-12-01 Yawata Iron & Steel Co Process of producing single-oriented silicon steel
US2911533A (en) * 1957-12-24 1959-11-03 Arthur C Damask Electron irradiation of solids
US3224909A (en) * 1961-11-29 1965-12-21 Licentia Gmbh Siliconizing of electrical sheet steel by diffusion
US3230074A (en) * 1962-07-16 1966-01-18 Chrysler Corp Process of making iron-aluminum alloys and components thereof
US3347718A (en) * 1964-01-20 1967-10-17 Armco Steel Corp Method for improving the magnetic properties of ferrous sheets
US3385725A (en) * 1964-03-23 1968-05-28 Ibm Nickel-iron-phosphorus alloy coatings formed by electroless deposition
US3384517A (en) * 1964-12-22 1968-05-21 Nat Res Dev Copper/iron/aluminm alloys
US3423253A (en) * 1968-02-23 1969-01-21 Allegheny Ludlum Steel Method of increasing the silicon content of wrought grain oriented silicon steel
US3718502A (en) * 1969-10-15 1973-02-27 J Gibbons Enhancement of diffusion of atoms into a heated substrate by bombardment
US3756867A (en) * 1969-11-03 1973-09-04 Cie Ateliers Et Forges De La L Method of producing silicon steels with oriented grains by coiling with aluminum strip
US3681152A (en) * 1971-03-25 1972-08-01 Allegheny Ludlum Ind Inc Method of siliconizing

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4177089A (en) * 1976-04-27 1979-12-04 The Arnold Engineering Company Magnetic particles and compacts thereof
US4244722A (en) * 1977-12-09 1981-01-13 Noboru Tsuya Method for manufacturing thin and flexible ribbon of dielectric material having high dielectric constant
US4257830A (en) * 1977-12-30 1981-03-24 Noboru Tsuya Method of manufacturing a thin ribbon of magnetic material
US4265682A (en) * 1978-09-19 1981-05-05 Norboru Tsuya High silicon steel thin strips and a method for producing the same
US4548643A (en) * 1983-12-20 1985-10-22 Trw Inc. Corrosion resistant gray cast iron graphite flake alloys
US4822642A (en) * 1985-12-11 1989-04-18 Air Products And Chemicals, Inc. Method of producing silicon diffusion coatings on metal articles
US4714632A (en) * 1985-12-11 1987-12-22 Air Products And Chemicals, Inc. Method of producing silicon diffusion coatings on metal articles
US4869929A (en) * 1987-11-10 1989-09-26 Air Products And Chemicals, Inc. Process for preparing sic protective films on metallic or metal impregnated substrates
US5372843A (en) * 1991-03-12 1994-12-13 Hitachi, Ltd. Process for producing a magnetic recording medium using a patterned diffusion barrier
US5571591A (en) * 1992-05-01 1996-11-05 International Business Machines Corporation Magnetic film patterning by germanium or silicon diffusion
US5558944A (en) * 1993-08-10 1996-09-24 Tdk Corporation Magnetic head and a process for production thereof
CN103658640A (zh) * 2013-12-27 2014-03-26 安徽华东光电技术研究所 一种用于速调管的铁硅铝吸收膏剂的配置、涂覆及烧结方法
CN103658640B (zh) * 2013-12-27 2016-08-17 安徽华东光电技术研究所 一种用于速调管的铁硅铝吸收膏剂的配置、涂覆及烧结方法

Also Published As

Publication number Publication date
NL7303477A (enrdf_load_stackoverflow) 1973-09-17
DE2312430A1 (de) 1973-10-04
DE2312430B2 (de) 1975-06-26
GB1376852A (en) 1974-12-11

Similar Documents

Publication Publication Date Title
US3902930A (en) Method of manufacturing iron-silicon-aluminum alloy particularly suitable for magnetic head core
GB1583898A (en) Method of producing magnetic thin film
US3656229A (en) Process for producing magnetic head
US3702239A (en) Magnetic storage medium
JPS6122852B2 (enrdf_load_stackoverflow)
US3700500A (en) Magnetic films having a predetermined coercivity
JPH0199203A (ja) 軟磁性積層膜
US1855562A (en) Method of insulating bodies
US3108912A (en) Magnetic material
US3162554A (en) Heat treatment of grain oriented steel to obtain a substantially constant magnetic permeability
JP2508462B2 (ja) 軟磁性薄膜
JPS6313256B2 (enrdf_load_stackoverflow)
JPS59125607A (ja) 高飽和磁化、高透磁率磁性膜
JPS58100412A (ja) 軟質磁性材料の製法
JPS63205811A (ja) 磁気ヘツド
JPH0758647B2 (ja) 結晶質軟磁性薄膜
US3271203A (en) Method for producing oriented silicon-iron
JP2802852B2 (ja) ターゲツト材およびその製造方法
JPH0789525B2 (ja) 磁気ヘッド用軟磁性薄膜
JP2522284B2 (ja) 軟磁性薄膜
JPH0789524B2 (ja) 磁気ヘッド用軟磁性薄膜
JPH01146312A (ja) 軟磁性薄膜
JPS59112425A (ja) 磁気記録媒体
JPH0789527B2 (ja) 結晶質軟磁性薄膜
JPH0261030A (ja) 磁性材料及び磁気ヘッド