US3878083A - Anode for oxygen evolution - Google Patents
Anode for oxygen evolution Download PDFInfo
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- US3878083A US3878083A US361022A US36102273A US3878083A US 3878083 A US3878083 A US 3878083A US 361022 A US361022 A US 361022A US 36102273 A US36102273 A US 36102273A US 3878083 A US3878083 A US 3878083A
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- Prior art keywords
- metal
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- oxide
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- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 title abstract description 14
- 239000001301 oxygen Substances 0.000 title abstract description 14
- 229910052760 oxygen Inorganic materials 0.000 title abstract description 14
- 238000000576 coating method Methods 0.000 claims abstract description 48
- 239000011248 coating agent Substances 0.000 claims abstract description 41
- 239000000463 material Substances 0.000 claims abstract description 12
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims abstract description 12
- HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910000457 iridium oxide Inorganic materials 0.000 claims abstract description 11
- 229910001936 tantalum oxide Inorganic materials 0.000 claims abstract description 11
- 229910052751 metal Inorganic materials 0.000 claims description 62
- 239000002184 metal Substances 0.000 claims description 62
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 22
- 229910052719 titanium Inorganic materials 0.000 claims description 22
- 239000010936 titanium Substances 0.000 claims description 22
- 150000002739 metals Chemical class 0.000 claims description 15
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 14
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 10
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 10
- 229910045601 alloy Inorganic materials 0.000 claims description 10
- 239000000956 alloy Substances 0.000 claims description 10
- 229910052715 tantalum Inorganic materials 0.000 claims description 10
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 10
- 229910052741 iridium Inorganic materials 0.000 claims description 7
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 7
- 229910052763 palladium Inorganic materials 0.000 claims description 7
- 229910017052 cobalt Inorganic materials 0.000 claims description 6
- 239000010941 cobalt Substances 0.000 claims description 6
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 6
- -1 platinum group metals Chemical class 0.000 claims description 6
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 5
- 150000001342 alkaline earth metals Chemical class 0.000 claims description 5
- 229910052742 iron Inorganic materials 0.000 claims description 5
- 229910052759 nickel Inorganic materials 0.000 claims description 5
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 4
- 229910052750 molybdenum Inorganic materials 0.000 claims description 4
- 239000011733 molybdenum Substances 0.000 claims description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 239000011651 chromium Substances 0.000 claims description 3
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 claims description 2
- 229910001069 Ti alloy Inorganic materials 0.000 claims description 2
- 229910052748 manganese Inorganic materials 0.000 claims description 2
- 239000011572 manganese Substances 0.000 claims description 2
- 238000002360 preparation method Methods 0.000 abstract description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 16
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 16
- 238000000034 method Methods 0.000 description 16
- 238000010438 heat treatment Methods 0.000 description 14
- 239000003792 electrolyte Substances 0.000 description 11
- 239000000203 mixture Substances 0.000 description 9
- 239000010949 copper Substances 0.000 description 8
- 238000005868 electrolysis reaction Methods 0.000 description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 230000004580 weight loss Effects 0.000 description 6
- 239000002253 acid Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 229910044991 metal oxide Inorganic materials 0.000 description 5
- 150000004706 metal oxides Chemical class 0.000 description 5
- 238000002161 passivation Methods 0.000 description 5
- 239000011701 zinc Substances 0.000 description 5
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 4
- 230000003197 catalytic effect Effects 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 4
- 229910052801 chlorine Inorganic materials 0.000 description 4
- 229910052725 zinc Inorganic materials 0.000 description 4
- 229910001252 Pd alloy Inorganic materials 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 239000011575 calcium Substances 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 238000005363 electrowinning Methods 0.000 description 3
- 229910052758 niobium Inorganic materials 0.000 description 3
- 239000010955 niobium Substances 0.000 description 3
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 3
- 230000010287 polarization Effects 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 229910052726 zirconium Inorganic materials 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- 229910052787 antimony Inorganic materials 0.000 description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
- 235000013405 beer Nutrition 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 239000008199 coating composition Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229910000510 noble metal Inorganic materials 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 229910000967 As alloy Inorganic materials 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- XTEGARKTQYYJKE-UHFFFAOYSA-M Chlorate Chemical class [O-]Cl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-M 0.000 description 1
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 241000845082 Panama Species 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910000676 Si alloy Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000001464 adherent effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 238000004210 cathodic protection Methods 0.000 description 1
- 239000004568 cement Substances 0.000 description 1
- 230000002925 chemical effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- WCCJDBZJUYKDBF-UHFFFAOYSA-N copper silicon Chemical compound [Si].[Cu] WCCJDBZJUYKDBF-UHFFFAOYSA-N 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- 229960003280 cupric chloride Drugs 0.000 description 1
- 229940045803 cuprous chloride Drugs 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 231100000989 no adverse effect Toxicity 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000003223 protective agent Substances 0.000 description 1
- 230000003763 resistance to breakage Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 1
- OEIMLTQPLAGXMX-UHFFFAOYSA-I tantalum(v) chloride Chemical compound Cl[Ta](Cl)(Cl)(Cl)Cl OEIMLTQPLAGXMX-UHFFFAOYSA-I 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
- C25C7/02—Electrodes; Connections thereof
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/055—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material
- C25B11/057—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material consisting of a single element or compound
- C25B11/061—Metal or alloy
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
- C25B11/093—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
Definitions
- These dimensionally stable electrodes usually have a film forming valve metal base such as titanium, tantalum, zirconium, aluminum, niobium and tungsten, which has the capacity to conduct current in the cathodic direction and to resist the passage of current in the anodic direction and are sufficiently resistant to the electrolyte and conditions used within an electrolytic cell, for example, in the production of chlorine and caustic soda, to be used as electrodes in electrolytic processes.
- a film forming valve metal base such as titanium, tantalum, zirconium, aluminum, niobium and tungsten
- Electrode coatings must have the capacity to continue to conduct current to the electrolyte over long periods of time without becoming passivated, and in chlorine production, must have the capacity to catalyze the formation of chlorine molecules from the chloride ions at an anode. They must be electroconductive and electrocatalytic and must adhere firmly to the valve metal base over long periods of time under cell operating conditions.
- the commercially available coatings contain. a catalytic metal or oxide from the platinum group metals, i.e., platinum, palladium, iridium, ruthenium, rhodium, osmium and a binding or protective agent such as titanium, dioxide, tantalum pentoxide and other valve metal oxides in sufficient amount to protect the platinum group metal or oxide from being removed from the electrode in the electrolysis process and to bind the platinum group metal or oxide to the electrode base.
- the binding and protective metal oxide is usually in excess of the platinum group metal or oxide. Anodes of this nature have been described in British Pat. No. 1,231,280.
- novel electrodes of the invention are comprised of an electroconductive base provided with a coating over at least a portion of its outer surface of a mixed material of tantalum oxide and iridium oxide.
- the coating may be as little as 5% of the outer surface of the electrode but preferably covers 50 to of the active face of the electrode.
- the preferred ratio of tantalum to iridium calculated in percent of metal is 1:1 to 0.34:1.
- the electrode base may be made of any electroconductive material such as iron, nickel, lead, copper, etc. or alloys thereof but is preferably a valve metal such as tungsten, titanium, tantalum, niobium, aluminum or zirconium or alloys of two or more of said metals.
- the valve metals bases may be provided with an intermediate layer such as an oxide of the valve metal or a coating of another metal such as platinum group metals.
- the base may be a valve metal and at least either one metal having a low hydrogen overvoltage such as alloy of titanium with iron, cobalt, nickel, palladium, vandadium or molybdenum, or mixtures of two or more of said metals; or one metal suitable to form with titanium a protective oxide film even in acid solution such as an alloy of titanium with niobium, tantalum, zirconium or mixtures of two or more of said metals.
- one metal having a low hydrogen overvoltage such as alloy of titanium with iron, cobalt, nickel, palladium, vandadium or molybdenum, or mixtures of two or more of said metals
- one metal suitable to form with titanium a protective oxide film even in acid solution such as an alloy of titanium with niobium, tantalum, zirconium or mixtures of two or more of said metals.
- the electroconductive base is an alloy of a valve metal with a platinum group metal which has an improved corrosion resistance to acid electrolytes encountered in the use of the electrodes such as 5 to 15% sulfuric acid or 1 to 5% hydrochloric acid.
- a particularly useful alloy is titanium containing 0.1 to 0.20% by weight of palladium. This corrosion resistance of the support of the coating prevents chipping off of the coating even if the anode is immersed for a few hours in an acid electrolyte without anodic polarization.
- the coating containing tantalum oxide and iridium oxide can be doped with an oxide of a metal with a valence of less than +4 to increase the catalytic activity for oxygen evolution without adversely effecting the mechanical properties of the coatings.
- the semiconductivity of the Ta O -IrO- system is of the n type and that the addition of the doping metal oxide reverses the type of conductivity from n-type to p-type which improves the anodic process by producing electronic holes.
- the doping metal oxide may be present in the coating in amounts ranging from 0.5 to 5.0% preferably 1.5 to 3.0% by weight of the said system calculated as metal.
- suitable doping metal oxides are alkaline earth metals such as calcium, magnesium, barium and members of Groups VIII, VI B and VII B of the periodic Table such as cobalt, iron and nickel, chromium, molybdenum, manganese, etc.
- the increase in the catalytic activity of the doped coatings is shown by the lower anode potential of doped anodes as compared to undoped anodes after 8,000 hours of operation of the anodes under identical working conditions.
- the doping seems to have no adverse effect on the mechanical properties of the coatings as there is no coating loss in either instance even after 8,000 hours operation.
- the electrodes of the invention are particularly useful for electrolytic processes such as cathodic protection, electroflotation, organic electrosynthesis such as hydrodimerization of acrylonitrile and most particularly the electrowinning of metals.
- the said electrodes have a high electrocatalytic activity and a very low passivation rate of a few millivolts per month at a current density of 1.2 to 2.0 KA per m and a negligible weight loss if kept under anodic polarization.
- the novel method of the invention for the preparation of the electrodes of the invention comprises applying to an electroconductive electrode base a solution of a thermally decomposible compound of tantalum and a thermally decomposible compound ofiridium, drying the coated electrode base by evaporation of the solvent and then heating the dried electrode base in the presence of an oxygen containing gas such as to form the desired electrode.
- the heating step is preferably effected at temperatures of 350 to 600C, the optinum temperature being 500 to 550C. At temperatures below 350C, the oxidation is not completed or requires too long heating time and at temperatures above 600C, the electrode base is likely to be subjected to distortions and/or destruction by the high temperatures.
- the preliminary drying step is preferably effected by gentle heating in air to evaporate the solvent and codeposit the metal compounds.
- any convenient procedure may be used to remove the solvent such as standing under reduced pressure.
- the coating is applied in multiple coats with short periods of intermediate heating such as 500 to 550C for 5 to minutes with a longer final heating after the last coat such as 500 to 550C for 45 minutes to l 1% hours.
- the electrodes of this invention are particularly useful for electrowinning process used in the production of various metals because they do not add impurities to the bath which deposit on the cathode, .with the metals being won, and thereby contaminate the refined metal, as do anodes of for example lead containing antimony and bismuth which give impure cathode refined metals. Moreover, their resistance to the acid solutions and oxygen evolution and their excellent anode potential makes them desirable for this use.
- EXAMPLE I 24 Titanium plates 10 mm by 10 mm were etched in boiling 20% hydrochoric acid for 60 minutes and were then thoroughly washed with water. The plates were then coated with an aqueous solution of the compositions of Table I in 12 to 15 coats. After the application of each coat, the plates were dried and then heated for 10 minutes at 450C to 600C in an oven with forced air circulation and then allowed to air cool. After the last coat, the plates were heated in the oven at the same temperature for 1 hour and were then air cooled. The values of Table I are calculated as weight of free metal. The tantalum chloride was used as a solution in 20% hydrochloric acid.
- the anode potential for each anode was then determined by electrolysis of 10% by weight sulfuric acid at 60C and a current density of 1.2 KA/m
- the initial anode potential (against NHE) and the anode potential after 3,000 and 6,000 hours was determined and the coating loss' was then determined. The values are reported in Table II.
- NHE Anode potential in Volts after coating loss initial 600 h i000 h 1200 h in mg/cm anode potential and the anode potential after 600, 1,000 or 1,200 hours are reported in Table IV. The final loss of the coating was determined at the end of 5 the test.
- compositions in mg of Sample No. free metal plates were then coated with the compositions of Table V.
- the compositions were applied in 15 to 20 coats 2 and the Ta O -RuO coated electrodes are only slightly improved and the TiO -lrO coated electrodes are no better.
- EXAMPLE II For comparative purposes, electrodes were prepared as follows. Titanium plates 10 mm by 10 mm were The results of Table 11 show that the electrodes of the invention have high electrocatalytic activity and a very low passivation rate and that the weight loss of the coating is negligible when within the limits of the invention. It should be noted that the ratio of Ta to lr for samples F to F is about 034. Optimum values are obtained in the heating range of 500550C.
- EXAMPLE IV To demonstrate the improved corrosion resistance of a titanium palladium alloy, 10 plates made of titanium containing 0.15% by weight of palladium (10 X 10 mm) were sand-blasted and then etched in refluxing 20% hydrochloric acid for 60 minutes. The plates were then coated with the compositions of Table V using the procedure of Example 111. The anode potential was determined for each electrode by electrolysis of 10% sulfuric acid at 60C and a current density of 1.2 KA/m The initial anode potential and the value after 1,000 and 2,000 hours and the coating weight loss after 2,000 hours was determined. Moreover, the current was halted for minutes in each 24 hour period without removing the electrode from the acid bath. The results are reported in Table V11.
- EXAMPLE V 10 titanium plates X 20 mm) were etched in refluxing 20% hydrochloric acid for 60 minutes and after being thoroughly washed with water, the plates were coated with an aqueous solution containing 2.01 mg (as free metal) of TaCl 3.2 mg (as free metal) oflrC1 and 0.0394 ml of hydrochloric acid. The solution was applied in 12 coats-with intermediate heating and cooling and a final heating as described in Example I.
- the coated titanium plates were used as anodes in cells for the recovery of zinc from an aqueous electrolyte containing 100 g/liter of Zn S0 (as free metal), 10% sulfuric acid and 10 to 50 ppm of glue.
- the cathode was a pure aluminum sheet with a smooth surface and the electrolyte gap was 10 mm.
- the current density was 500 A/m and the electrolyte temperature was 35C.
- the anode potential, loss of coating, zinc thickness on the cathode and the morphology of the zinc deposit are reported in Table V111 The cathodic current efficiency was found to be 92-95% in all cases and the purity of the zinc deposit was 99.9999%.
- EXAMPLE V1 Using the procedure of Example V, five titanium plates (20 X 20 cm) were coated with the composition of Example V. The coated plates were used as anodes in ace for recovery of copper from an aqueous electrolyte containing 100 g/liter (as free metal) of CuSO and 10 g/liter of sulfuric acid and the cathode was a smooth steel plate. The electrolyte gap was 15 mm and the bath temperature was C. The current density was 500 A/m The anode potential, loss of coating and copper thickness and morphology of the copper deposit are reported in Table 1X.
- lrCl 3.2 do. do. lr 1(1 CaCl2.6HgO 0.26 do. do. Ca HCl 0.0362 mls.
- An electrode comprising an electroconductive base provided with a coating over at least a portion of its outer surface of a mixed material of tantalum oxide
- EXAMPLE V111 Using the procedure of Example V11, 20 X 20mm titanium coupons were coated with the composition of Table X11 with the same heatings.
- iridium oxide in which the ratio of tantalum to iridium calculated as metal is 1:1 to 0.34 to l.
- the electrode of claim 1 wherein the said base is an alloy of a valve metal and at least one of the platinum group metals.
- valve metal is titanium
- the electrode of claim 1 wherein the said base is an alloy containing at least two valve metals and at least 0.34 to l.
- An electrode comprising an electroconductive base provided with a coating over at least a portion of its outer surface of a mixed material of tantalum oxide and iridium oxide, in which the ratio of the tantalum to the iridium calculated as metal is 1:1 to 0.34 to 1, said coating further contains 0.1 to 5.0% by weight of an oxide of a metal selected from the group consisting of alkaline earth metals, cobalt, iron, nickel, chromium, molybdenum and manganese.
- An electrode of claim 9 wherein the metal is selected from the group consisting of cobalt and an alkaline earth metal.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US546112*A US3926751A (en) | 1972-05-18 | 1975-01-31 | Method of electrowinning metals |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IT24526/72A IT959730B (it) | 1972-05-18 | 1972-05-18 | Anodo per sviluppo di ossigeno |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US3878083A true US3878083A (en) | 1975-04-15 |
Family
ID=11213858
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US361022A Expired - Lifetime US3878083A (en) | 1972-05-18 | 1973-05-17 | Anode for oxygen evolution |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US3878083A (enrdf_load_stackoverflow) |
| CA (1) | CA989773A (enrdf_load_stackoverflow) |
| FR (1) | FR2185014B1 (enrdf_load_stackoverflow) |
| GB (1) | GB1399576A (enrdf_load_stackoverflow) |
| IT (1) | IT959730B (enrdf_load_stackoverflow) |
| ZA (1) | ZA732977B (enrdf_load_stackoverflow) |
Cited By (39)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3926751A (en) * | 1972-05-18 | 1975-12-16 | Electronor Corp | Method of electrowinning metals |
| US4003817A (en) * | 1967-12-14 | 1977-01-18 | Diamond Shamrock Technologies, S.A. | Valve metal electrode with valve metal oxide semi-conductive coating having a chlorine discharge in said coating |
| US4032427A (en) * | 1975-11-03 | 1977-06-28 | Olin Corporation | Porous anode separator |
| US4072585A (en) * | 1974-09-23 | 1978-02-07 | Diamond Shamrock Technologies S.A. | Valve metal electrode with valve metal oxide semi-conductive coating having a chlorine discharge catalyst in said coating |
| US4072586A (en) * | 1975-12-10 | 1978-02-07 | Diamond Shamrock Technologies S.A. | Manganese dioxide electrodes |
| US4107025A (en) * | 1977-11-09 | 1978-08-15 | Noranda Mines Limited | Stable electrode for electrochemical applications |
| FR2408665A1 (fr) * | 1977-11-09 | 1979-06-08 | Noranda Mines Ltd | Electrode stable pour applications electrochimiques |
| US4173518A (en) * | 1974-10-23 | 1979-11-06 | Sumitomo Aluminum Smelting Company, Limited | Electrodes for aluminum reduction cells |
| US4185142A (en) * | 1978-08-09 | 1980-01-22 | Diamond Shamrock Corporation | Oxygen electrode rejuvenation methods |
| DE3020260A1 (de) * | 1979-05-29 | 1980-12-11 | Diamond Shamrock Corp | Verfahren zur herstellung von chromsaeure unter verwendung von zweiraum- und dreiraum-zellen |
| US4263112A (en) * | 1980-06-20 | 1981-04-21 | Frosch Robert A | Cell and method for electrolysis of water and anode therefor |
| US4285799A (en) * | 1978-03-28 | 1981-08-25 | Diamond Shamrock Technologies, S.A. | Electrodes for electrolytic processes, especially metal electrowinning |
| US4306950A (en) * | 1979-10-15 | 1981-12-22 | Westinghouse Electric Corp. | Process for forming sulfuric acid |
| US4468416A (en) * | 1981-05-19 | 1984-08-28 | Permelec Electrode Ltd. | Electrolytic electrodes having high durability and process for the production of same |
| US4543174A (en) * | 1983-02-16 | 1985-09-24 | Eltech Systems Corporation | Method of making a catalytic lead-based oxygen evolving anode |
| US4797182A (en) * | 1986-04-17 | 1989-01-10 | Eltech Systems Corporation | Electrode with a platinum metal catalyst in surface film and its use |
| US5098546A (en) * | 1989-12-22 | 1992-03-24 | Tdk Corporation | Oxygen-generating electrode |
| US5314601A (en) * | 1989-06-30 | 1994-05-24 | Eltech Systems Corporation | Electrodes of improved service life |
| US5324407A (en) * | 1989-06-30 | 1994-06-28 | Eltech Systems Corporation | Substrate of improved plasma sprayed surface morphology and its use as an electrode in an electrolytic cell |
| US5545262A (en) * | 1989-06-30 | 1996-08-13 | Eltech Systems Corporation | Method of preparing a metal substrate of improved surface morphology |
| EP1162288A1 (en) * | 2000-06-09 | 2001-12-12 | De Nora Elettrodi S.P.A. | Electrode characterized by highly adhering superficial catalytic layer |
| US6527939B1 (en) | 1999-06-28 | 2003-03-04 | Eltech Systems Corporation | Method of producing copper foil with an anode having multiple coating layers |
| US20030085199A1 (en) * | 2001-11-08 | 2003-05-08 | Korea Atomic Energy Research Institute & Technology Winners Co., Ltd. | Method for manufacturing catalytic oxide anode using high temperature sintering |
| US6589405B2 (en) | 2000-05-15 | 2003-07-08 | Oleh Weres | Multilayer oxide coated valve metal electrode for water purification |
| RU2216609C2 (ru) * | 2001-04-23 | 2003-11-20 | Общество с ограниченной ответственностью "Эмеральд" | Способ изготовления малоизнашиваемых анодов |
| US20040045834A1 (en) * | 2002-04-18 | 2004-03-11 | Bayer Aktiengesellschaft | Process for the utilization of vanadium bound in chromium ore as vanadium(V) oxide by electrolysis |
| US20040182551A1 (en) * | 2003-03-17 | 2004-09-23 | Cooligy, Inc. | Boiling temperature design in pumped microchannel cooling loops |
| US20040234378A1 (en) * | 2003-01-31 | 2004-11-25 | James Lovette | Method and apparatus for low-cost electrokinetic pump manufacturing |
| US20050044352A1 (en) * | 2001-08-30 | 2005-02-24 | Riverhead Networks, Inc. | Protecting against spoofed DNS messages |
| US20070080071A1 (en) * | 2005-10-12 | 2007-04-12 | All My Relations, Inc. | Internal combustion apparatus and method utilizing electrolysis cell |
| US20070201204A1 (en) * | 2006-02-16 | 2007-08-30 | Girish Upadhya | Liquid cooling loops for server applications |
| US20090288856A1 (en) * | 2008-05-24 | 2009-11-26 | Phelps Dodge Corporation | Multi-coated electrode and method of making |
| US20100096260A1 (en) * | 2008-10-16 | 2010-04-22 | Finnchem Usa Inc | Water chlorinator having dual functioning electrodes |
| US8580091B2 (en) | 2010-10-08 | 2013-11-12 | Water Star, Inc. | Multi-layer mixed metal oxide electrode and method for making same |
| WO2014165912A1 (en) * | 2013-04-10 | 2014-10-16 | Murdoch University | Coated composite anodes |
| WO2016112976A1 (en) | 2015-01-15 | 2016-07-21 | Abb Technology Ltd | Ionomer coated electrode |
| CN105803482A (zh) * | 2016-03-17 | 2016-07-27 | 同济大学 | 一种电解水制氢用电解池的集电极材料的改性方法及用途 |
| CN114774998A (zh) * | 2022-04-08 | 2022-07-22 | 西安泰金工业电化学技术有限公司 | 一种低贵金属Ir-Ta复合氧化物涂层阳极的制备方法 |
| US11668017B2 (en) | 2018-07-30 | 2023-06-06 | Water Star, Inc. | Current reversal tolerant multilayer material, method of making the same, use as an electrode, and use in electrochemical processes |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA1232227A (en) * | 1982-02-18 | 1988-02-02 | Christopher Vance | Manufacturing electrode by immersing substrate in aluminium halide and other metal solution and electroplating |
| DE102004015633A1 (de) * | 2004-03-31 | 2005-10-20 | Studiengesellschaft Kohle Mbh | Verfahren zur Herstellung von Beschichtungen aus Iridiumoxiden |
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| CN111686727B (zh) * | 2020-05-25 | 2022-10-04 | 中国科学院广州能源研究所 | 一种负载型析氧催化剂及水电解器膜电极的制备方法 |
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| US3616446A (en) * | 1969-03-28 | 1971-10-26 | Ppg Industries Inc | Method of coating an electrode |
| US3632498A (en) * | 1967-02-10 | 1972-01-04 | Chemnor Ag | Electrode and coating therefor |
| US3711385A (en) * | 1970-09-25 | 1973-01-16 | Chemnor Corp | Electrode having platinum metal oxide coating thereon,and method of use thereof |
| US3751296A (en) * | 1967-02-10 | 1973-08-07 | Chemnor Ag | Electrode and coating therefor |
-
1972
- 1972-05-18 IT IT24526/72A patent/IT959730B/it active
-
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- 1973-05-02 ZA ZA732977A patent/ZA732977B/xx unknown
- 1973-05-17 FR FR7318007A patent/FR2185014B1/fr not_active Expired
- 1973-05-17 US US361022A patent/US3878083A/en not_active Expired - Lifetime
- 1973-05-18 GB GB2382073A patent/GB1399576A/en not_active Expired
- 1973-05-18 CA CA171,777A patent/CA989773A/en not_active Expired
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3632498A (en) * | 1967-02-10 | 1972-01-04 | Chemnor Ag | Electrode and coating therefor |
| US3751296A (en) * | 1967-02-10 | 1973-08-07 | Chemnor Ag | Electrode and coating therefor |
| US3616446A (en) * | 1969-03-28 | 1971-10-26 | Ppg Industries Inc | Method of coating an electrode |
| US3711385A (en) * | 1970-09-25 | 1973-01-16 | Chemnor Corp | Electrode having platinum metal oxide coating thereon,and method of use thereof |
Cited By (51)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4003817A (en) * | 1967-12-14 | 1977-01-18 | Diamond Shamrock Technologies, S.A. | Valve metal electrode with valve metal oxide semi-conductive coating having a chlorine discharge in said coating |
| US3926751A (en) * | 1972-05-18 | 1975-12-16 | Electronor Corp | Method of electrowinning metals |
| US4072585A (en) * | 1974-09-23 | 1978-02-07 | Diamond Shamrock Technologies S.A. | Valve metal electrode with valve metal oxide semi-conductive coating having a chlorine discharge catalyst in said coating |
| US4173518A (en) * | 1974-10-23 | 1979-11-06 | Sumitomo Aluminum Smelting Company, Limited | Electrodes for aluminum reduction cells |
| US4032427A (en) * | 1975-11-03 | 1977-06-28 | Olin Corporation | Porous anode separator |
| US4072586A (en) * | 1975-12-10 | 1978-02-07 | Diamond Shamrock Technologies S.A. | Manganese dioxide electrodes |
| US4107025A (en) * | 1977-11-09 | 1978-08-15 | Noranda Mines Limited | Stable electrode for electrochemical applications |
| FR2408665A1 (fr) * | 1977-11-09 | 1979-06-08 | Noranda Mines Ltd | Electrode stable pour applications electrochimiques |
| US4285799A (en) * | 1978-03-28 | 1981-08-25 | Diamond Shamrock Technologies, S.A. | Electrodes for electrolytic processes, especially metal electrowinning |
| US4185142A (en) * | 1978-08-09 | 1980-01-22 | Diamond Shamrock Corporation | Oxygen electrode rejuvenation methods |
| DE3020260A1 (de) * | 1979-05-29 | 1980-12-11 | Diamond Shamrock Corp | Verfahren zur herstellung von chromsaeure unter verwendung von zweiraum- und dreiraum-zellen |
| US4306950A (en) * | 1979-10-15 | 1981-12-22 | Westinghouse Electric Corp. | Process for forming sulfuric acid |
| US4263112A (en) * | 1980-06-20 | 1981-04-21 | Frosch Robert A | Cell and method for electrolysis of water and anode therefor |
| US4468416A (en) * | 1981-05-19 | 1984-08-28 | Permelec Electrode Ltd. | Electrolytic electrodes having high durability and process for the production of same |
| US4469581A (en) * | 1981-05-19 | 1984-09-04 | Permelec Electrode Ltd. | Electrolytic electrode having high durability |
| US4543174A (en) * | 1983-02-16 | 1985-09-24 | Eltech Systems Corporation | Method of making a catalytic lead-based oxygen evolving anode |
| US4797182A (en) * | 1986-04-17 | 1989-01-10 | Eltech Systems Corporation | Electrode with a platinum metal catalyst in surface film and its use |
| US6071570A (en) * | 1989-06-30 | 2000-06-06 | Eltech Systems Corporation | Electrodes of improved service life |
| US5314601A (en) * | 1989-06-30 | 1994-05-24 | Eltech Systems Corporation | Electrodes of improved service life |
| US5324407A (en) * | 1989-06-30 | 1994-06-28 | Eltech Systems Corporation | Substrate of improved plasma sprayed surface morphology and its use as an electrode in an electrolytic cell |
| US5435896A (en) * | 1989-06-30 | 1995-07-25 | Eltech Systems Corporation | Cell having electrodes of improved service life |
| US5545262A (en) * | 1989-06-30 | 1996-08-13 | Eltech Systems Corporation | Method of preparing a metal substrate of improved surface morphology |
| US5578176A (en) * | 1989-06-30 | 1996-11-26 | Eltech Systems Corporation | Method of preparing electrodes of improved service life |
| US5672394A (en) * | 1989-06-30 | 1997-09-30 | Eltech Systems Corporation | Electrodes of improved service life |
| US5098546A (en) * | 1989-12-22 | 1992-03-24 | Tdk Corporation | Oxygen-generating electrode |
| US6527939B1 (en) | 1999-06-28 | 2003-03-04 | Eltech Systems Corporation | Method of producing copper foil with an anode having multiple coating layers |
| US6589405B2 (en) | 2000-05-15 | 2003-07-08 | Oleh Weres | Multilayer oxide coated valve metal electrode for water purification |
| EP1162288A1 (en) * | 2000-06-09 | 2001-12-12 | De Nora Elettrodi S.P.A. | Electrode characterized by highly adhering superficial catalytic layer |
| RU2216609C2 (ru) * | 2001-04-23 | 2003-11-20 | Общество с ограниченной ответственностью "Эмеральд" | Способ изготовления малоизнашиваемых анодов |
| US20050044352A1 (en) * | 2001-08-30 | 2005-02-24 | Riverhead Networks, Inc. | Protecting against spoofed DNS messages |
| US20030085199A1 (en) * | 2001-11-08 | 2003-05-08 | Korea Atomic Energy Research Institute & Technology Winners Co., Ltd. | Method for manufacturing catalytic oxide anode using high temperature sintering |
| US20040045834A1 (en) * | 2002-04-18 | 2004-03-11 | Bayer Aktiengesellschaft | Process for the utilization of vanadium bound in chromium ore as vanadium(V) oxide by electrolysis |
| US20040234378A1 (en) * | 2003-01-31 | 2004-11-25 | James Lovette | Method and apparatus for low-cost electrokinetic pump manufacturing |
| US20040182551A1 (en) * | 2003-03-17 | 2004-09-23 | Cooligy, Inc. | Boiling temperature design in pumped microchannel cooling loops |
| US20070080071A1 (en) * | 2005-10-12 | 2007-04-12 | All My Relations, Inc. | Internal combustion apparatus and method utilizing electrolysis cell |
| EP1949481A4 (en) * | 2005-10-12 | 2009-10-28 | All My Relations Inc | DEVICE AND METHOD FOR INTERNAL COMBUSTION THROUGH THE USE OF ELECTROLYSIS CELLS |
| US20070201204A1 (en) * | 2006-02-16 | 2007-08-30 | Girish Upadhya | Liquid cooling loops for server applications |
| US7599184B2 (en) | 2006-02-16 | 2009-10-06 | Cooligy Inc. | Liquid cooling loops for server applications |
| US8124556B2 (en) | 2008-05-24 | 2012-02-28 | Freeport-Mcmoran Corporation | Electrochemically active composition, methods of making, and uses thereof |
| US20090288958A1 (en) * | 2008-05-24 | 2009-11-26 | Phelps Dodge Corporation | Electrochemically active composition, methods of making, and uses thereof |
| US8022004B2 (en) | 2008-05-24 | 2011-09-20 | Freeport-Mcmoran Corporation | Multi-coated electrode and method of making |
| US20090288856A1 (en) * | 2008-05-24 | 2009-11-26 | Phelps Dodge Corporation | Multi-coated electrode and method of making |
| US20100096260A1 (en) * | 2008-10-16 | 2010-04-22 | Finnchem Usa Inc | Water chlorinator having dual functioning electrodes |
| US8075751B2 (en) * | 2008-10-16 | 2011-12-13 | Finnchem Usa, Inc. | Water chlorinator having dual functioning electrodes |
| US8580091B2 (en) | 2010-10-08 | 2013-11-12 | Water Star, Inc. | Multi-layer mixed metal oxide electrode and method for making same |
| WO2014165912A1 (en) * | 2013-04-10 | 2014-10-16 | Murdoch University | Coated composite anodes |
| WO2016112976A1 (en) | 2015-01-15 | 2016-07-21 | Abb Technology Ltd | Ionomer coated electrode |
| CN105803482A (zh) * | 2016-03-17 | 2016-07-27 | 同济大学 | 一种电解水制氢用电解池的集电极材料的改性方法及用途 |
| US11668017B2 (en) | 2018-07-30 | 2023-06-06 | Water Star, Inc. | Current reversal tolerant multilayer material, method of making the same, use as an electrode, and use in electrochemical processes |
| US12305300B2 (en) | 2018-07-30 | 2025-05-20 | Water Star, Inc. | Current reversal tolerant multilayer material, method of making the same, use as an electrode, and use in electrochemical processes |
| CN114774998A (zh) * | 2022-04-08 | 2022-07-22 | 西安泰金工业电化学技术有限公司 | 一种低贵金属Ir-Ta复合氧化物涂层阳极的制备方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2185014A1 (enrdf_load_stackoverflow) | 1973-12-28 |
| GB1399576A (en) | 1975-07-02 |
| IT959730B (it) | 1973-11-10 |
| FR2185014B1 (enrdf_load_stackoverflow) | 1977-12-30 |
| ZA732977B (en) | 1974-12-24 |
| CA989773A (en) | 1976-05-25 |
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Owner name: ELECTRODE CORPORATION, A DE CORP., OHIO Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNOR:DIAMOND SHAMROCK TECHNOLOGIES, S.A.;REEL/FRAME:005004/0145 Effective date: 19881026 |
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