US4797182A - Electrode with a platinum metal catalyst in surface film and its use - Google Patents
Electrode with a platinum metal catalyst in surface film and its use Download PDFInfo
- Publication number
- US4797182A US4797182A US07/037,661 US3766187A US4797182A US 4797182 A US4797182 A US 4797182A US 3766187 A US3766187 A US 3766187A US 4797182 A US4797182 A US 4797182A
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- oxide
- electrode
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- metal
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- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 title claims abstract description 70
- 239000003054 catalyst Substances 0.000 title description 3
- 229910052751 metal Inorganic materials 0.000 claims abstract description 44
- 239000002184 metal Substances 0.000 claims abstract description 44
- 239000000758 substrate Substances 0.000 claims abstract description 33
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 29
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 27
- 238000000034 method Methods 0.000 claims abstract description 25
- 229910000457 iridium oxide Inorganic materials 0.000 claims abstract description 24
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims abstract description 19
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 19
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 claims abstract description 19
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims abstract description 18
- 239000010411 electrocatalyst Substances 0.000 claims abstract description 17
- 229910052741 iridium Inorganic materials 0.000 claims abstract description 15
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000001301 oxygen Substances 0.000 claims abstract description 12
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 12
- 239000010948 rhodium Substances 0.000 claims abstract description 11
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910003450 rhodium oxide Inorganic materials 0.000 claims abstract description 8
- 229910052703 rhodium Inorganic materials 0.000 claims abstract description 7
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910003445 palladium oxide Inorganic materials 0.000 claims abstract description 6
- 229910052707 ruthenium Inorganic materials 0.000 claims abstract description 6
- 229910001925 ruthenium oxide Inorganic materials 0.000 claims abstract description 6
- 238000009713 electroplating Methods 0.000 claims abstract description 5
- 229910052763 palladium Inorganic materials 0.000 claims abstract description 5
- 230000003197 catalytic effect Effects 0.000 claims abstract description 3
- HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 claims description 31
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical group O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 23
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 16
- 229910052719 titanium Inorganic materials 0.000 claims description 16
- 239000010936 titanium Substances 0.000 claims description 16
- 239000003792 electrolyte Substances 0.000 claims description 5
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 5
- SJLOMQIUPFZJAN-UHFFFAOYSA-N oxorhodium Chemical compound [Rh]=O SJLOMQIUPFZJAN-UHFFFAOYSA-N 0.000 claims description 4
- HBEQXAKJSGXAIQ-UHFFFAOYSA-N oxopalladium Chemical compound [Pd]=O HBEQXAKJSGXAIQ-UHFFFAOYSA-N 0.000 claims description 2
- 239000006104 solid solution Substances 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000000576 coating method Methods 0.000 description 38
- 239000011248 coating agent Substances 0.000 description 21
- 239000000243 solution Substances 0.000 description 19
- 239000003973 paint Substances 0.000 description 12
- 238000011068 loading method Methods 0.000 description 11
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 9
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 8
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- 239000000956 alloy Substances 0.000 description 8
- 229910045601 alloy Inorganic materials 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 5
- 229910003556 H2 SO4 Inorganic materials 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 239000010970 precious metal Substances 0.000 description 4
- DANYXEHCMQHDNX-UHFFFAOYSA-K trichloroiridium Chemical compound Cl[Ir](Cl)Cl DANYXEHCMQHDNX-UHFFFAOYSA-K 0.000 description 4
- 229910017895 Sb2 O3 Inorganic materials 0.000 description 3
- 229910004446 Ta2 O5 Inorganic materials 0.000 description 3
- 239000011149 active material Substances 0.000 description 3
- YADSGOSSYOOKMP-UHFFFAOYSA-N lead dioxide Inorganic materials O=[Pb]=O YADSGOSSYOOKMP-UHFFFAOYSA-N 0.000 description 3
- 235000006408 oxalic acid Nutrition 0.000 description 3
- -1 platinum group metal oxide Chemical class 0.000 description 3
- 229910021638 Iridium(III) chloride Inorganic materials 0.000 description 2
- 229910019639 Nb2 O5 Inorganic materials 0.000 description 2
- 238000004873 anchoring Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000005363 electrowinning Methods 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 2
- 238000002161 passivation Methods 0.000 description 2
- 229910003446 platinum oxide Inorganic materials 0.000 description 2
- 239000001117 sulphuric acid Substances 0.000 description 2
- 235000011149 sulphuric acid Nutrition 0.000 description 2
- 229910001936 tantalum oxide Inorganic materials 0.000 description 2
- 229910001887 tin oxide Inorganic materials 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910021274 Co3 O4 Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910004353 Ti-Cu Inorganic materials 0.000 description 1
- 229910004337 Ti-Ni Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910011212 Ti—Fe Inorganic materials 0.000 description 1
- 229910011209 Ti—Ni Inorganic materials 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 229910000410 antimony oxide Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 230000002301 combined effect Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005323 electroforming Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- KHYBPSFKEHXSLX-UHFFFAOYSA-N iminotitanium Chemical compound [Ti]=N KHYBPSFKEHXSLX-UHFFFAOYSA-N 0.000 description 1
- 150000002504 iridium compounds Chemical class 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 229910000484 niobium oxide Inorganic materials 0.000 description 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical class [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 1
- MUMZUERVLWJKNR-UHFFFAOYSA-N oxoplatinum Chemical class [Pt]=O MUMZUERVLWJKNR-UHFFFAOYSA-N 0.000 description 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 1
- 238000007750 plasma spraying Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- SONJTKJMTWTJCT-UHFFFAOYSA-K rhodium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Rh+3] SONJTKJMTWTJCT-UHFFFAOYSA-K 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
- C25B11/093—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
Definitions
- the invention relates to an electrode for use in electrolytic processes having a substrate of film-forming metal comprising an electrocatalyst incorporated in an integral surface film of the film-forming metal oxide grown from the substrate.
- the electrocatalyst incorporated into the integral surface film comprises at least one platinum-group metal and platinum-group metal oxide.
- the invention is particularly but not exclusively concerned with an electrode suitable for use as an oxygen anode in high speed electroplating (electrogavanizing).
- Lifetimes of electrodes with a relatively small amount of the active material in the coating rapidly decrease with an increase in current density.
- an early failure of an electrode is attributed to two major factors, loss of the active coating and dissolution, or in case of the film-forming metals, passivation of the substrate. Sometimes these occur simultaneously and the electrode at the end of its lifetime may show some active material left in the coating but the substrate passivated.
- electrode lifetime is particularly important with oxygen evolving electrodes used as anodes in various industrially important electrochemical processes e.g. metal electrowinning, electroforming, electroflotation, and electrosynthesis.
- electrodes with platinum-group metal oxide coatings are used as oxygen evolving anodes.
- These platinum metal oxide anodes are found to operate very well under relatively difficult conditions imposed by these processes (e.g. current densities of up to 2-3 kA/m 2 in aggressive electrolytes).
- these electrodes must have relatively high platinum-group metal loadings (e.g more than 4.5-7 g/m 2 ).
- Another electrode for oxygen-evolution is that described in GB No. 1 399 576, having a coating containing a mixed crystal of tantalum oxide and iridium oxide.
- known electrodes of this type contain at least about 7.5 g/m 2 of iridium so that despite their excellent performance in terms of over-voltage and lifetime, the high cost of iridium makes these electrodes less attractive.
- the electrode proposed in GB No. 1 463 553 has a base which consts entirely or at its surface of an alloy of a film-forming metal and an activating metal for instance a platinum-group metal, whose surface is oxidized during use or is preactivated by an oxidizing treatment to form in the outer part of the alloy a surface oxide layer to a depth of 1 to 30 micrometers.
- an activating metal for instance a platinum-group metal
- Such alloys have shown promise for electrowinning but are quite difficult to prepare by sintering or in another manner and are quite expensive because of the quantity of platinum-group metal in the alloy.
- the pre-activation methods are difficult to control to obtain an improvement in the electrode performance.
- An electrode with a titanium substrate and an active platinum/iridium metal coating has been disclosed in GB No. 964 913.
- the electrode is produced by thermal decomposition of platinum and iridium compounds in a reducing atmosphere at 350° C. By modifying this process it has been possible to produce coatings of platinum and iridium oxide.
- An oxygen evolving anode made by coating a titanium substrate with iridium oxide or iridium/ruthenium oxide using a mixture of codedeposited titanium oxide or tin oxide and tantalum oxide or niobium oxide with platinum metal as the electrode underlayer has been disclosed in U.S. Pat. No. 4,481,097.
- the electrode active component includes 1.3 g/m 2 of platinum metal in the underlayer and 3.0 g/m 2 of iridium oxide in the toplayer. According to the document the electrode has maximum life time of 80 hours under accelerated lifetime tests performed in an aqueous solution with 150 g/l of H 2 SO 4 as an electrolyte at 80° C. and current density of 25 kA/m 2 .
- An electrode with a titanium substrate and an electrocatalyst which preferably comprises up to 0.5 g/m 2 of iridium oxide and/or rhodium oxide per projected electrode surface has been disclosed in EP No. 0 046 447.
- the electrocatalyst is formed as an integral surface film of an oxide or another compound of titanium metal which is grown from the substrate which incorporates iridium oxide and/or rhodium oxide as electrocatalyst.
- the electrode is produced using a method in which a solution of thermally decomposable compound of iridium and/or rhodium and an agent which attacks the metal of the substrate are applied to the titanium substrate and the coated structure then heated in air at 500° C.
- the main aspects of the invention as set out in the accompanying claims are based on the finding that the lifetime of electrodes with a film-forming metal substrate and a platinum-group metal based electrocatalyst incorporated in an integral surface film of the film-forming metal oxide grown from the substrate is considerably increased when the electrocatalyst in the surface film comprises two superimposed layers, a first layer comprising platinum metal and a second layer comprising an oxide of iridium, rhodium, palladium or ruthenium, the first platinum containing layer being next to the substrate and the second iridium, rhodium, palladium or ruthenium oxide containing layer coforming the outer surface of the integral surface film with the film-forming metal oxide.
- the electrode base may be a sheet of any film-forming metal such as titanium, tantalum, zirconium, niobium, tungsten and silicon, and alloys containing one or more of these metals titanium being preferred for cost reasons.
- film-forming metal is meant a metal or alloy which has the property that when connected as an anode in the electrolyte in which the coated anode is subsequently to operate, there rapidly forms a passivating oxide film which protects the underlaying metal from corrosion by electrolyte, i.e. those metal and alloys which are frequently referred to as “valve metals", as well as alloys containing valve metal (e.g.
- Ti-Ni, Ti-Co, Ti-Fe and Ti-Cu but which in the same conditions form a non-passivating anodic surface oxide film.
- Rods, tubes, wires or knitted wires and expanded meshes of titanium or other film-forming metals can be used as the electrode base. Titanium or other film-forming metal clad on a conducting core can also be used. It is also possible to surface treat porous sintered titanium with the dilute paint solutions in the same manner.
- the base will be etched prior to the surface treatment, but in some instances the base may simply be cleaned, and this gives a very smooth electrode surface.
- the film-forming metal substrate can have a preapplied surface film of film-forming metal oxide which during application of the active coating is attacked by an agent in the coating solution (e.g. HCl) and reconstituted as a part of the integral surface film.
- the electrode of the invention has between 4 and 4.5 g/m 2 in total of the platinum metals and may achieve lifetimes of several thousand hours at current densities well above 10 kA/m 2 and in extremely corrosive environments.
- This total loading is considerably above the loadings of up to 2 g/m 2 obtained previously according to the teaching of EP No. 0 046 447.
- EP No. 0 046 447 For some unknown reason it appears that the provision of two superimposed layers with platinum underneath enables higher metal loadings to be incorporated in the surface film. Furthermore, this has been shown to produce an exponential increase of useful service lifetime as a function of a simple increase in the catalyst loading.
- the optimal amount of platinum in the first platinum containing layer is between 0.8 and 1.8 g/m 2 of the projected surface.
- the optimal amount is the amount in terms of the electrode performance vis-a-vis the cost of platinum metal.
- electrodes of the invention may be produced with even more platinum in the first layer, however, this amount should not exceed 5 g/m 2 .
- electrodes with a smaller amount of platinum metal may be produced However, it has been found that the lowest practical limit of platinum metal in the first layer is 0.5 g/m 2 . Difficulties of reproducibility of the electrode have been experienced with platinum concentrations below 0.5 g/m 2 .
- the amount of the platinum-group metal oxide in the second layer is preferably between 2 to 4 g/m 2 (calculated as metal) of the oxide of iridium, rhodium, palladium or ruthenium This range is regarded as optimal in cost-benefit terms, however, good results may be obtained with as low as 1 g/m 2 and up to 5 g/m 2 of IrO 2 , calculated as metal.
- the electrode disclosed may be used directly as an oxygen evolving anode or may serve as a substrate for various types of known coatings in which case the two superimposed platinum metal/oxide containing layers serve as an underlayer for another electrochemically active catalytic coating applied by known methods including chemideposition, electroplating and plasma spraying.
- the coatings which may be used as a topcoatings are well known.
- RuO 2 /TiO 2 or modified RuO 2 /TiO 2 coatings including SnO 2 /RuO 2 /TiO 2 , Sb 2 O 3 /RuO 2 /TiO 2 , SnO 2 /Sb 2 O 3 /RuO 2 /TiO 2 , IrO 2 /RuO 2 /TiO 2 and CoO 3 /SnO 2 /RuO 2 /TiO 2 .
- Non-precious metal oxide coatings including MnO 2 , PbO 2 , Sb 2 O 3 , and Co 3 O 4 depending on the intended application. Further details of such coatings are for example described in U.S. Pat. Nos. 3,632,498, 3,776,834, 3,711,385, 3,875,043 3,878,083, and GB No. 964 913.
- An example of a non-precious metal oxide topcoating is the lead dioxide topcoating as described in GB No. 2 096 173A applied to the improved substrate described herein.
- the electrode disclosed is excellently suited for use as an oxygen evolving anode in electrochemical processes at high current densitites (i.e. over 3.5 kA/m 2 ) for prolonged periods of time.
- An example of such a process is high speed electroplating (electrogalvanizing).
- the electrode according to the invention is further illustrated in the following examples:
- Coupons measuring 7.5 ⁇ 2 cm of titanium were decreased and etched for 1/2 hour in a 10% aqueous solution of oxalic acid at 85° to 95° C.
- Two paint solutions were prepared: one paint solution (a) consisting of 10 g/l of platinum metal and 10% of HCl (concentrated) in isopropanol, and a second paint solution (b) consisting of IrCl 3 in 10% of HCl (concentrated) in isopropanol.
- the concentration of iridium metal present in the paint was 50 g/l.
- First three coatings of the platinum containing paint solution (a) were applied, and then a further three layers of the iridium containing paint (b) were painted on, the coupons were heated in air to 500° C. for 10 minutes after each coating and the samples produced heated in air at 500° C. for 30 minutes after the final coating.
- the electrodes obtained having a loading of 1.3 g/m 2 of platinum metal and 3.0 g/m 2 of iridium oxide, were tested as anodes in 150 g/l of H at 80° C. and in 12N NaOH at 95° C. with a current density of 25 kA/m 2 .
- Outstanding lifetimes of 760 and 114 hours in the respective solutions were obtained under these severe conditions (sample A 2 in Table 2).
- Titanium coupons were degreased, rinsed in water dried ad etched, and then surface treated as in Example I with subsequent application of paint solutions containing (a) 0.1 g of chloroplatinic acid (H 2 PtCl 6 .6H 2 O) and (b) rhodium chloride and solutions containing (a) 0.1 g of chloroplatinic acid (H 2 PtCl 6 .6H 2 O) and (b) palladium chloride.
- the amount of catalyst in the surface treated electrodes after application of twice four coatings was calculated to be 1.3 g/m 2 of Pt, as metal, and 3.0 g/m 2 , as metal, of rhodium oxide or palladium oxide. When such electrodes are tested as anodes in 150 g/l H 2 SO 4 at 80° C. and in 12N NaOH at 95° C. with a current density of 25 kA/m 2 excellent lifetimes are obtained.
- a titanium coupon was degreased, rinsed in water, dried and etched for 1/2 hour in a 10% aqueous solution of oxalic acid.
- a paint solution consisting of 0.5 g IrCl 3 .H 2 O, 3 ml isopropanol and 0.2 ml HCl (concentrated) was then applied by brush to both sides of the coupon.
- the coupon was then dried and heated in air at 480° C. for ten minutes.
- the coating procedure was repeated twice, and the resulting IrO 2 coating had a loading of approximately 2.1 g/m 2 of iridium.
- the coating solution and procedure used are considered to be conventional.
- the resulting electrode was subjected to an accelerated lifetime test in 150 g/l sulphuric acid at a current density of 15 kA/m 2 ; its lifetime was 150 hours.
- Coupons measuring 7.5 ⁇ 2 cm of titanium were degreased and etched for 1/2 hour in a 10% aqueous solution of oxalic acid at 85° to 95° C.
- Three paint solutions were prepared.
- One solution consisted of 0.1 g iridium chloride, 5 ml isopropanol and 0.4 ml HCl (concentrated), the second containing 0.1 g of chloroplatinic acid (H 2 PtCl 6 .6H 2 O) and the third solution containing a mixture of 0.1 g of chloroplatinic acid (H 2 PtCl 6 .6H 2 O) and iridium chloride.
- the coupons were then coated in an oxidizing atmosphere in the known way and electrodes with iridium oxide, platinum metal and codedeposited platinum/iridium oxide coatings produced.
- the electrodes obtained were subsequently tested as oxygen anodes in 150 g/l sulphuric acid at a current density of 15 kA/m 2 .
- the lifetimes of IrO 2 (sample B 2 in Table 1), Pt, (sample C 1 in Table 1) and codedeposited Pt/IrO 2 (sample D1 in Table 1) obtained for these electrodes is compared with the electrode prepared in accordance with Example I (sample A 1 in Table 1).
- the electrodes B 1 and C 1 had a loading of the respective active component of 1 g/m 2 (as metal) and electrodes A 1 and D 1 of 2 g/m 2 of the respective active components (as metal).
- sample A 1 the electrode with 1 g/m 2 and 1 g/m 2 IrO 2 prepared according to the invention
- sample B 1 the electrode with 1 g/m 2 IrO 2
- sample C 1 the electrode with 1 g/m 2 Pt
- sample D 1 the electrode with 2 g/m 2 of codeposited PtIrO 2 70/30 mol %).
- the lifetime of the electrode with platinum metal coating (C 1 ) is only 4 hours and the lifetime of the electrode with iridium oxide is 110 hours (B 1 ).
- the two coatings are combined and applied in the known way i.e. when they are codeposited (D 1 )
- the lifetime is only 60 hours.
- the platinum metal/iridium oxide electrode is prepared according to the invention (A.sub. 1) its lifetime increases more than six fold in relation to D 1 and more than 3.5 fold in relation of B 1 .
- Example II of U.S. Pat. No. 4,481,097 was faithfully repeated following the described procedure.
- the platinum was codepositioned with the film-forming metal oxides as an underlayer with IrO 2 as a separate layer on top.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
Abstract
Description
TABLE 1 ______________________________________ Sample A.sub.1 B.sub.1 C.sub.1 D.sub.1 ______________________________________ Lifetime 380 110 4 60 (hours) ______________________________________
TABLE 2 ______________________________________ H.sub.2 SO.sub.4 NaOH Volts (NHE) 150 g/l 12 N 10% H.sub.2 SO.sub.4 25 kA/m.sup.2 25 kA/m.sup.2 5 kA/m.sup.2 80° C. 95° C. 80° C. SAMPLE (hr) (hr) (mV) ______________________________________ A.sub.2 760 114 1590 B.sub.2 75 13 1890 C.sub.2 80 15 1630 D.sub.2 65 46 1630 ______________________________________
Claims (9)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP86105300.7 | 1986-04-17 | ||
EP86105300 | 1986-04-17 |
Publications (1)
Publication Number | Publication Date |
---|---|
US4797182A true US4797182A (en) | 1989-01-10 |
Family
ID=8195068
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US07/037,661 Expired - Lifetime US4797182A (en) | 1986-04-17 | 1987-04-13 | Electrode with a platinum metal catalyst in surface film and its use |
Country Status (6)
Country | Link |
---|---|
US (1) | US4797182A (en) |
EP (1) | EP0243302B1 (en) |
CA (1) | CA1305448C (en) |
DE (1) | DE3776187D1 (en) |
ES (1) | ES2029851T3 (en) |
GR (1) | GR3003867T3 (en) |
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US5098546A (en) * | 1989-12-22 | 1992-03-24 | Tdk Corporation | Oxygen-generating electrode |
WO1993018854A1 (en) * | 1992-03-26 | 1993-09-30 | Los Alamos Technical Associates, Inc. | Electrolytic cell for generating sterilization solutions having increased ozone content |
US5314601A (en) * | 1989-06-30 | 1994-05-24 | Eltech Systems Corporation | Electrodes of improved service life |
US5324407A (en) * | 1989-06-30 | 1994-06-28 | Eltech Systems Corporation | Substrate of improved plasma sprayed surface morphology and its use as an electrode in an electrolytic cell |
US5364509A (en) * | 1993-01-21 | 1994-11-15 | Eltech Systems Corporation | Wastewater treatment |
US5545262A (en) * | 1989-06-30 | 1996-08-13 | Eltech Systems Corporation | Method of preparing a metal substrate of improved surface morphology |
US5728287A (en) * | 1996-10-31 | 1998-03-17 | H2 O Technologies, Ltd. | Method and apparatus for generating oxygenated water |
US5911870A (en) * | 1997-04-11 | 1999-06-15 | H20 Technologies, Ltd. | Housing and method that provide extended resident time for dissolving generated oxygen into water |
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US6171469B1 (en) | 1996-10-31 | 2001-01-09 | H2O Technologies, Ltd. | Method and apparatus for increasing the oxygen content of water |
US6217729B1 (en) | 1999-04-08 | 2001-04-17 | United States Filter Corporation | Anode formulation and methods of manufacture |
US6296756B1 (en) | 1999-09-09 | 2001-10-02 | H20 Technologies, Ltd. | Hand portable water purification system |
US6358395B1 (en) | 2000-08-11 | 2002-03-19 | H20 Technologies Ltd. | Under the counter water treatment system |
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US20090068505A1 (en) * | 2007-09-11 | 2009-03-12 | Brookhaven Science Associates, Llc | Electrocatalyst for Alcohol Oxidation at Fuel Cell Anodes |
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US20100055494A1 (en) * | 2006-07-14 | 2010-03-04 | Danfoss A/S | Method for treating titanium objects with a surface layer of mixed tantalum and titanium oxides |
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JPS63235493A (en) * | 1987-03-24 | 1988-09-30 | Tdk Corp | Electrode for generating oxygen and production thereof |
JP2514032B2 (en) * | 1987-05-08 | 1996-07-10 | ペルメレック電極 株式会社 | Metal electrolytic treatment method |
JPH0660427B2 (en) * | 1988-05-31 | 1994-08-10 | ティーディーケイ株式会社 | Oxygen generating electrode and method for manufacturing the same |
GB9018953D0 (en) * | 1990-08-31 | 1990-10-17 | Ici Plc | Electrode |
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JP3188361B2 (en) * | 1994-06-27 | 2001-07-16 | ペルメレック電極株式会社 | Chrome plating method |
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- 1987-03-30 EP EP87810180A patent/EP0243302B1/en not_active Expired
- 1987-03-30 ES ES198787810180T patent/ES2029851T3/en not_active Expired - Lifetime
- 1987-03-30 DE DE8787810180T patent/DE3776187D1/en not_active Revoked
- 1987-04-02 CA CA000533710A patent/CA1305448C/en not_active Expired - Fee Related
- 1987-04-13 US US07/037,661 patent/US4797182A/en not_active Expired - Lifetime
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US5545262A (en) * | 1989-06-30 | 1996-08-13 | Eltech Systems Corporation | Method of preparing a metal substrate of improved surface morphology |
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US5672394A (en) * | 1989-06-30 | 1997-09-30 | Eltech Systems Corporation | Electrodes of improved service life |
US5435896A (en) * | 1989-06-30 | 1995-07-25 | Eltech Systems Corporation | Cell having electrodes of improved service life |
US5578176A (en) * | 1989-06-30 | 1996-11-26 | Eltech Systems Corporation | Method of preparing electrodes of improved service life |
US5098546A (en) * | 1989-12-22 | 1992-03-24 | Tdk Corporation | Oxygen-generating electrode |
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US6500325B2 (en) | 1997-04-28 | 2002-12-31 | Mitsubishi Denki Kabushiki Kaisha | Method of plating semiconductor wafer and plated semiconductor wafer |
US6210554B1 (en) | 1997-04-28 | 2001-04-03 | Mitsubishi Denki Kabushiki Kaisha | Method of plating semiconductor wafer and plated semiconductor wafer |
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Also Published As
Publication number | Publication date |
---|---|
CA1305448C (en) | 1992-07-21 |
EP0243302B1 (en) | 1992-01-22 |
EP0243302A1 (en) | 1987-10-28 |
ES2029851T3 (en) | 1992-10-01 |
GR3003867T3 (en) | 1993-03-16 |
DE3776187D1 (en) | 1992-03-05 |
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