US3837896A - Sintered cemented carbide body coated with two layers - Google Patents
Sintered cemented carbide body coated with two layers Download PDFInfo
- Publication number
- US3837896A US3837896A US00303362A US30336272A US3837896A US 3837896 A US3837896 A US 3837896A US 00303362 A US00303362 A US 00303362A US 30336272 A US30336272 A US 30336272A US 3837896 A US3837896 A US 3837896A
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- United States
- Prior art keywords
- layer
- layers
- coating
- substratum
- hard metal
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 150000001247 metal acetylides Chemical class 0.000 claims description 9
- 150000001875 compounds Chemical class 0.000 claims description 5
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 claims description 3
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims 1
- 229910052593 corundum Inorganic materials 0.000 claims 1
- 229910001845 yogo sapphire Inorganic materials 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 abstract description 45
- 239000002184 metal Substances 0.000 abstract description 45
- 238000000576 coating method Methods 0.000 abstract description 30
- 239000011248 coating agent Substances 0.000 abstract description 25
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- 150000004767 nitrides Chemical class 0.000 abstract description 17
- 239000011230 binding agent Substances 0.000 abstract description 14
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- 230000015572 biosynthetic process Effects 0.000 description 5
- 229910002091 carbon monoxide Inorganic materials 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
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- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
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- 229910052710 silicon Inorganic materials 0.000 description 3
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- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
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- 229910010293 ceramic material Inorganic materials 0.000 description 2
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- 229910052735 hafnium Inorganic materials 0.000 description 2
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- 150000002739 metals Chemical class 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 229910052720 vanadium Inorganic materials 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- 229910000975 Carbon steel Inorganic materials 0.000 description 1
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 102000010029 Homer Scaffolding Proteins Human genes 0.000 description 1
- 108010077223 Homer Scaffolding Proteins Proteins 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 229910007926 ZrCl Inorganic materials 0.000 description 1
- 230000001464 adherent effect Effects 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 239000010962 carbon steel Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000004534 enameling Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- Y10T428/12056—Entirely inorganic
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12014—All metal or with adjacent metals having metal particles
- Y10T428/12028—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, etc.]
- Y10T428/12063—Nonparticulate metal component
- Y10T428/12069—Plural nonparticulate metal components
- Y10T428/12076—Next to each other
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12014—All metal or with adjacent metals having metal particles
- Y10T428/12028—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, etc.]
- Y10T428/12063—Nonparticulate metal component
- Y10T428/12104—Particles discontinuous
- Y10T428/12111—Separated by nonmetal matrix or binder [e.g., welding electrode, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
Definitions
- hard metal e.g., cutting inserts
- wear-resistant, extremely thin, ceramic layers which, in certain cases, have caused improved wear resistance, and in the case of cutting inserts particularly good cutting results and increased tool life were noted.
- the ceramic surface layer has principally consisted of A1 and/or ZrO
- the product may be regarded as a combination in which the known great wear resistance of ceramic inserts as well as the relatively good toughness of cemented carbide have been exploited.
- the coating layer has been produced by deposition from a gaseous phase. This method has meant extremely uniform and thin layers which has not been reached in earlier-used methods, as for instance enameling of hard metal.
- the coated hard metal body is thus characterized in that the thin surface coating consists of two successive layers containing no binder material.
- the outer layer consists of one or more extremely wear-resistant layers of aluminum oxide and/or zirconium oxide
- the intermediate layer situated next to the cutting body, consists of one or more layers of one or more carbides and/or nitrides of titanium, zirconium, hafnium, vanadium, niobium, tantalum, chromium, molybdenum, tungsten, silicon and/or boron, i.e. except silicon and boron, metals in the 4th 6th subgroups of the periodic system.
- the thickness of the abovedescribed intermediate layer, and also of the surface layer may be varied in certain limits whilst still maintaining the favorable properties.
- thinner carbide or nitride layers may be used than in known merely carbide-coated hard metal inserts, in which have been found optimum properties for example at 4 gm thick TiC layers.
- the thickness shall be at the least 0.5 pm.
- Optimum results have been found when the thickness of the inner layer has been 1-10 pm and preferably 2-6 am.
- the thickness of the outer, ceramic, layer should be 02-20 pm, preferably 0.55 pm. We have thus found that even very thin oxide layers, applied upon barrier layers of nitride and/or oxide, cause a considerable improvement in the wear resistance, at maintained toughness.
- the binder metal e.g., Co
- the binder metal seems to have a considerable influence on the rate of the coating operation on the formation of whiskers and the adherence of the layer to the substrate.
- the binder metal has probably an accelerating effect on the growth of the oxide layer, which will preferably be nucleated on the binder phase surfaces of the hard metal. Carbon also causes a similar behavior.
- the coating be uniform and finegrained, and also that the layer have good adherence.
- the speed of the coating process must be slow, which now has been made possible according to the invention by impeding the influence of the binder metal and carbon, i.e., eliminating their accelerating effect on the growth of the layer. Too high rate of formation of the layer means large grains and whiskers, which give porous layers and bad adherence.
- the surface of the substratum must be well-defined, uniform and homogeneous, so that the growth of the layer can be initiated at as many close points on the surface as possible. From the following it is realized that the surface of the hard metal substratum does not fulfill this demand. The adherence is thus acceptable only between the layer and the binder metal grains of the substratum, while it is less good between the layer and the carbide grains of the substratum.
- Binder metals e.g., Co
- Binder metals may also diffuse through the formed oxide layer at the temperature of the deposition.
- the diffusion rate of Co is thus very low in a layer of carbide and/or nitride.
- Another advantage of using an intermediate layer according to the invention is a favorable gradual transition between the extremely wear-resistant surface layer and the relatively tough substratum.
- Carbideor nitride layers. as of TiC or TiN, have namely toughness and wear-resistance properties placing them between aluminum oxide (ceramic cutting inserts) and cemented carbide.
- AlCl AlBr or AIF
- CO H O
- the intermediate layer prevents carburization of the hard metal substratum, which would lead to bad toughness.
- the intermediate layer of carbide and- /or nitride has a favorable influence as a barrier to carbon diffusion from the substratum.
- the binder metal phase of cemented carbides is always surface oxidized in air, and becomes it soon in the atmosphere of depositing oxide layers, even if the hard metal surface has been pre-reduced. Therefore. it is expected that this oxide (II state) would form stable spinel bindings with A1 (III state). Also bonds between IV-state oxides as ZrO and II-stage oxides as CoO are usually strong. It is therefore surprising that a stronger bond is obtained between for example TiC on the one hand and A1 0 or respectively ZrO on the other hand. The effect is probably connected with the slower depo sition rate in the presence of the TiC layer.
- the coating process is done in at least two separate steps and in separate facilities.
- the first step or partial process consists of forming a barrier layer, i.e., carbide and/or nitride layer, and the second step or partial process consists of possible oxidizing the surface of the barrier and formation of a surface layer of Al O the oxidation step possibly being done as a separate step in a separate apparatus; or
- the whole coating process i.e., the formation of a barrier layer, the possible oxidizing of the surface ofthe substratum or the barrier and the coating of the barrier with a surface layer of AI O is done in one and the 5 same operation by conducting gaseous reagents by turn and gradually adapting the temperature and pressure conditions in the coating reactor.
- oxide layers as for example first Al O and then ZrO can be applied upon mixed layers on successive layers of carbide and nitride.
- the barrier layers may also be applied to alternative methods as for example sputtering.
- FIG. 1 is a principle sketch of production apparatus useful in carrying out the invention.
- FIG. 2 is a principle sketch of alternative detail in the apparatus according to FIG. 1.
- the apparatus shown in FIG. 1 consists of gas sources, for example gas tubes 1, 2 for supplying hydrogen respectively methane and/or nitrogen.
- Conduits 3 and 4 from respective source units unite into a conduit 5, through which the gas mixture is brought to a vessel 6 in which a metal halide, for example TiCl, is heated to evaporation, after which the composite gas is conducted to a reactor 11 via a joint conduit 9.
- the gas mixture passes a heat exchanger 7 controlled by a thermostat 8 for adjusting the content of TiC], in the gas.
- reactor 11 which is heated by a furnace 10, the substratum is placed for coating.
- From the reactor vessel 11 the gas is sucked out via a valved conduit 12 and a cooling trap 13. Evacuation of gas from the system is effected via a conduit 14 by the help of a vacuum pump 15 having an outlet conduit 16.
- the apparatus sketched in FIG. 2 shows the use of a chlorination reactor 25 for chlorination of Al respectively Zr, for example in the form of grains or chips 26.
- a chlorination reactor 25 for chlorination of Al respectively Zr, for example in the form of grains or chips 26.
- hydrogen from a gas source 1 is mixed via conduits 19, with chlorine, alternatively hydrochloric acid gas, from a chlorine gas alternatively hydrochloric acid source 17, and the mixture is brought to chlorination reactor via a conduit 21.
- the gas mixture from chlorination reactor 25 is then mixed with hydrogen and carbon monoxide (not necessary) and carbon dioxide from gas sources 18 respectively 28.
- the resulting mixture is brought to coating reactor 11 via valved conduit 27.
- Example 1 sisted of a mixture containing TiCh, 8% CH and 82% H manufactured in a normal way, was brought to the reactor in one single conduit.
- the pressure in the reactor was maintained at torr (mm Hg) by sucking out the gas from the reaction vessel by means of a vacuum pump protected from corrosive reaction products (for instance l-lCl) by the help of a cooling trap with liquid nitrogen situated ahead of the pump. In this way a linear gas flow rate of l m/sec was obtained in the charge.
- the treatment went on for 2 hours.
- the 3,000 inserts were treated in an apparatus nearly identical to the one described, the gas supply system being modified, however, so that a gas with the composition 70% H 5% CO CO and 5% AlCl could be dosed.
- the temperature of the substratum was l,l00 C. and the pressure 15 torr.
- a linear gas flow rate of 3 m/sec was used.
- the binding between the A1 0 layer and TiC layer was good and no embrittling n-phase had been formed in the boundary layer, cemented carbide-TiC.
- Example 2 Also barrier layers of TiN have been manufactured in a way analogous to Example 1.
- the gas composition was changed, however, to 10% TiCl 30% N and 60% H
- As a result of the treatment a fine-grained, tight, layer of about 3 um was obtained (essentially TiN but with some amount of TiC because of a slight carbon diffusion from the substratum).
- the amount of embrittling *q-phase because of decarburizing was very small, however.
- a second step the 3,000 inserts were treated in an apparatus identical to the pre-treating equipment, the gas supply system being modified, however, so that a gas composed of 70% H 5% CO 20% CO and 5% ZrCl could be dosed at l,000C.
- the pressure was 15 torr and the linear gas flow rate 5 m/sec.
- Example 3 Having the same process conditions as in Example 1, the whole coating was done in one apparatus without intermediate cooling of the inserts. Double gas supply systems were used, one for TiCl (connected during the first period of the coating) and the other for AlCl Between the two coating periods there was used only one vacuum pumping with a view to change gas atmosphere. (A gradual transition, i.e., an intermediate simultaneous deposition is also possible. The simultaneous deposition may possibly go on all the second coating period. Also titanium oxide, possibly dissolved in TiC, will then be obtained in the M 0 layer). The result corresponded to the result of Example 1.
- Example 4 The process was performed in accordance with Example 3 with the exception that an oxidation step was interposed between the two periods. After a first vacuum pumping in order to remove TiCL, and CH an oxidizing gas was introduced, for example hydrogen saturated with water vapor at 30C. After renewed vacuum pumping the aluminum oxide was deposited.
- Example 5 The deposition process for A1 0 was done as in Example l but upon hard metal inserts coated with a 2 pm thick layer of TiC on one or more faces by means of sputtering.
- Example 6 there are results from cutting tests, in which cutting inserts according to the invention have been compared with earlier known inserts.
- Example 6 The cutting test was done in the form of turning on a workpiece of a carbon steel having a C content of l% and a hardness of about HB 300, under the following cutting conditions:
- the hard metal grade according to ISO P30 had the composition (in by weight): 9.5% Co, 12% TiC, 6% TaC, 4% NbC and the balance being WC.
- Example 7 Coating of 3,000 sintered hard metal cutting inserts was performed in a similar manner as described in Example 1 except some differences mentioned in the following.
- the hard metal grade consisted of 75% WC, 9.5% Co and 15.5% (all 7( by volume) cubic carbides in the form of TiC, TaC and NbC.
- the first treatment involving coating with a barrier layer of TiC, went on for 8 hours and resulted in a layer of about am thickness.
- the pressure was 10 torr and a linear gas flow rate of 4 m/sec was used. After a coating time of 5 hours, a well adherent layer of A1 0 with a thickness of 0.8 nm had been formed.
- Compound body consisting of a core or substratum of sintered cemented carbide containing a small quantity of a binder metal, on which core or substratum is a very thin and extremely uniform surface coating with higher wear resistance than that of the core or substratum, in which said thin coating consists of two layers applied one above the other by chemical vapor deposition, neither of the layers containing binder metal, the outer layer having a thickness of 02-20 am and consisting of at least one extremely wear resistant deposit consisting essentially of ceramic material selected from the group consisting of aluminum oxide and zirconium oxide and the inner layer lying next to the core or substratum having a thickness of 1-10 am and consisting of at least one coat of at least one member selected from the group consisting of the carbides and nitrides of Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Si and B.
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Electrochemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
- Polishing Bodies And Polishing Tools (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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US05/562,013 USRE29420E (en) | 1971-11-12 | 1975-03-26 | Sintered cemented carbide body coated with two layers |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE14479/71A SE357984B (enrdf_load_stackoverflow) | 1971-11-12 | 1971-11-12 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US05/562,013 Reissue USRE29420E (en) | 1971-11-12 | 1975-03-26 | Sintered cemented carbide body coated with two layers |
Publications (1)
Publication Number | Publication Date |
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US3837896A true US3837896A (en) | 1974-09-24 |
Family
ID=20299184
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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US00303362A Expired - Lifetime US3837896A (en) | 1971-11-12 | 1972-11-03 | Sintered cemented carbide body coated with two layers |
Country Status (12)
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US4019873A (en) * | 1975-06-06 | 1977-04-26 | Fried. Krupp Gesellschaft Mit Beschrankter Haftung | Coated hard metal body |
DE2727250A1 (de) * | 1976-06-18 | 1977-12-29 | Sumitomo Electric Industries | Oberflaechenbeschichtete sinterhartmetallgegenstaende und ein verfahren zu deren herstellung |
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1972
- 1972-10-24 IT IT30858/72A patent/IT969848B/it active
- 1972-11-02 DE DE2253745A patent/DE2253745C3/de not_active Expired
- 1972-11-03 US US00303362A patent/US3837896A/en not_active Expired - Lifetime
- 1972-11-07 JP JP47111560A patent/JPS5213201B2/ja not_active Expired
- 1972-11-10 GB GB5208472A patent/GB1394108A/en not_active Expired
- 1972-11-10 SU SU721848420A patent/SU963450A3/ru active
- 1972-11-10 CA CA156,174A patent/CA972233A/en not_active Expired
- 1972-11-10 BR BR007922/72A patent/BR7207922D0/pt unknown
- 1972-11-10 FR FR7239859A patent/FR2170383A5/fr not_active Expired
- 1972-11-10 PL PL1972158798A patent/PL79682B1/pl unknown
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Publication number | Priority date | Publication date | Assignee | Title |
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DE3303291A1 (de) * | 1946-07-17 | 1984-08-02 | Vsesojuznyj naučno-issledovatel'skij instrumental'nyj institut, Moskva | Verfahren zur verfestigung von schneidwerkzeugen |
US3977061A (en) * | 1973-09-17 | 1976-08-31 | Sandvik Aktiebolag | Cutting insert and method of making the same |
US4019873A (en) * | 1975-06-06 | 1977-04-26 | Fried. Krupp Gesellschaft Mit Beschrankter Haftung | Coated hard metal body |
JPS51144389A (en) * | 1975-06-09 | 1976-12-11 | Sumitomo Electric Ind Ltd | Process for producing hard alloy parts coated with oxygen-containing f ilm |
JPS51144388A (en) * | 1975-06-09 | 1976-12-11 | Sumitomo Electric Ind Ltd | Hard alloy parts coated with multiple layer film |
DE2625940A1 (de) * | 1975-06-12 | 1976-12-23 | Gen Electric | Verfahren zum ueberziehen von hartmetall-produkten |
DE2725874A1 (de) * | 1976-06-16 | 1977-12-29 | Lucas Industries Ltd | Spitze fuer einpunkt-drehwerkzeug sowie verfahren zum einpunktdrehen |
DE2727250A1 (de) * | 1976-06-18 | 1977-12-29 | Sumitomo Electric Industries | Oberflaechenbeschichtete sinterhartmetallgegenstaende und ein verfahren zu deren herstellung |
US4284687A (en) * | 1978-11-29 | 1981-08-18 | Fried Krupp Gesellschaft Mit Beschrankter Haftung | Compound body |
US4268569A (en) * | 1979-02-07 | 1981-05-19 | General Electric Company | Coating underlayers |
US4430386A (en) | 1979-02-09 | 1984-02-07 | Toyo Kohan Co., Ltd. | Composite metal sintered article and method of making same |
US4399168A (en) * | 1980-01-21 | 1983-08-16 | Santrade Ltd. | Method of preparing coated cemented carbide product |
US4282289A (en) * | 1980-04-16 | 1981-08-04 | Sandvik Aktiebolag | Method of preparing coated cemented carbide product and resulting product |
US4357382A (en) * | 1980-11-06 | 1982-11-02 | Fansteel Inc. | Coated cemented carbide bodies |
USRE32111E (en) * | 1980-11-06 | 1986-04-15 | Fansteel Inc. | Coated cemented carbide bodies |
US4525415A (en) * | 1981-09-11 | 1985-06-25 | Iscar Limited | Sintered hard metal products having a multi-layer wear-resistant coating |
US5073411A (en) * | 1981-12-16 | 1991-12-17 | Carboloy, Inc. | Process for forming a surface oxidized binding layer on hard substrates |
US4490191A (en) * | 1981-12-16 | 1984-12-25 | General Electric Company | Coated product and process |
US4599281A (en) * | 1981-12-24 | 1986-07-08 | Schwartzkopf Development Corporation | Wearing part |
US4442169A (en) * | 1982-01-28 | 1984-04-10 | General Electric Company | Multiple coated cutting tool and method for producing same |
US4440547A (en) * | 1982-05-20 | 1984-04-03 | Gte Laboratories Incorporated | Alumina coated silicon nitride cutting tools |
US4749630A (en) * | 1983-09-07 | 1988-06-07 | Fried. Krupp Gesellschaft Mit Beschrankter Haftung | Coated hardmetal body |
US4696352A (en) * | 1986-03-17 | 1987-09-29 | Gte Laboratories Incorporated | Insert for a drilling tool bit and a method of drilling therewith |
EP0403461A1 (en) * | 1989-06-16 | 1990-12-19 | Sandvik Aktiebolag | Coated cutting insert |
US5427843A (en) * | 1989-09-08 | 1995-06-27 | Nippon Steel Corporation | Ceramic-coated metal sheet |
US5674564A (en) * | 1991-06-25 | 1997-10-07 | Sandvik Ab | Alumina-coated sintered body |
US5654035A (en) * | 1992-12-18 | 1997-08-05 | Sandvik Ab | Method of coating a body with an α-alumina coating |
US5487625A (en) * | 1992-12-18 | 1996-01-30 | Sandvik Ab | Oxide coated cutting tool |
US5851687A (en) * | 1993-12-23 | 1998-12-22 | Sandvik Ab | Alumina coated cutting tool |
USRE44870E1 (en) | 1994-01-14 | 2014-04-29 | Sandvik Intellectual Property Ab | Aluminum oxide coated cutting tool and method of manufacturing thereof |
US5713133A (en) * | 1994-06-27 | 1998-02-03 | Valenite Inc. | Methods of preparing cemented metal carbide substrates for deposition of adherent diamond coatings and products made therefrom |
US5702808A (en) * | 1994-11-15 | 1997-12-30 | Sandvik Ab | Al2 O2 -coated cutting tool preferably for near net shape machining |
US5834061A (en) * | 1994-11-15 | 1998-11-10 | Sandvik Ab | Al2 O3 coated cutting tool preferably for near net shape machining |
US6354008B1 (en) * | 1997-09-22 | 2002-03-12 | Sanyo Electric Co., Inc. | Sliding member, inner and outer blades of an electric shaver and film-forming method |
US6389699B1 (en) * | 1998-05-26 | 2002-05-21 | Globix Technologies, Inc. | Self sharpening blades and method for making same |
US6105261A (en) * | 1998-05-26 | 2000-08-22 | Globix Technologies, Inc. | Self sharpening blades and method for making same |
WO1999061211A1 (en) * | 1998-05-26 | 1999-12-02 | Ecer Gunes M | Self-sharpening blades and method for making same |
US6333103B1 (en) | 1998-11-05 | 2001-12-25 | Hitachi Metals, Ltd. | Aluminum oxide-coated article |
EP0999293A1 (en) * | 1998-11-05 | 2000-05-10 | Hitachi Metals, Ltd. | Aluminium oxide-coated article |
US6866894B2 (en) | 2000-02-29 | 2005-03-15 | The Gillette Company | Razor blade technology |
US6684513B1 (en) * | 2000-02-29 | 2004-02-03 | The Gillette Company | Razor blade technology |
US20030121158A1 (en) * | 2000-02-29 | 2003-07-03 | The Gillette Company, A Delaware Corporation | Razor blade technology |
US20040172832A1 (en) * | 2003-03-04 | 2004-09-09 | Colin Clipstone | Razor blade |
US20060265885A1 (en) * | 2003-03-04 | 2006-11-30 | The Gillette Company, A Delaware Corporation | Razor blade |
US20080044242A1 (en) * | 2004-08-02 | 2008-02-21 | Boehlerit Gmbh & Co. Kg. | Indexable Insert with a Multi-Layer Coating |
US8105702B2 (en) * | 2004-08-02 | 2012-01-31 | Boehlerit Gmbh & Co. Kg. | Indexable insert with a multi-layer coating |
EP2446988A1 (en) | 2010-10-29 | 2012-05-02 | Seco Tools AB | Cutting tool insert with an alpha-alumina layer having a multi-components texture |
WO2012055906A2 (en) | 2010-10-29 | 2012-05-03 | Seco Tools Ab | Alumina layer with multitexture components |
US9149871B2 (en) | 2010-10-29 | 2015-10-06 | Seco Tools Ab | Alumina layer with multitexture components |
US11371150B2 (en) | 2020-01-04 | 2022-06-28 | Kennametal Inc. | Coating and coated cutting tool comprising the coating |
Also Published As
Publication number | Publication date |
---|---|
GB1394108A (en) | 1975-05-14 |
FR2170383A5 (enrdf_load_stackoverflow) | 1973-09-14 |
BR7207922D0 (pt) | 1973-12-13 |
JPS4859106A (enrdf_load_stackoverflow) | 1973-08-18 |
PL79682B1 (enrdf_load_stackoverflow) | 1975-06-30 |
CA972233A (en) | 1975-08-05 |
DE2253745C3 (de) | 1982-01-21 |
ES408523A1 (es) | 1976-02-16 |
DE2253745A1 (de) | 1973-05-17 |
DE2253745B2 (de) | 1975-07-31 |
JPS5213201B2 (enrdf_load_stackoverflow) | 1977-04-13 |
IT969848B (it) | 1974-04-10 |
SU963450A3 (ru) | 1982-09-30 |
SE357984B (enrdf_load_stackoverflow) | 1973-07-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: SANTRADE LTD., ALPENQUAI 12, CH-6002, LUCERNE, SWI Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNOR:SANDVIK AKTIEBOLAG, A CORP. OF SWEDEN;REEL/FRAME:004085/0132 Effective date: 19820908 |
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PS | Patent suit(s) filed |