US3799653A - Multi-layer anti-reflection coating - Google Patents

Multi-layer anti-reflection coating Download PDF

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Publication number
US3799653A
US3799653A US00354433A US35443373A US3799653A US 3799653 A US3799653 A US 3799653A US 00354433 A US00354433 A US 00354433A US 35443373 A US35443373 A US 35443373A US 3799653 A US3799653 A US 3799653A
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layer
index
thickness
coating
refractive index
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H Ikeda
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BIPPON KOGAKU KK
BIPPON KOGAKU KK JA
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BIPPON KOGAKU KK
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers

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  • a non-absorbing, substantially colorless, multi-layer anti-reflection coating for use on a substrate having an index of refraction of 1.43 to 2.00 comprises a first layer of a low-index filming material deposited on the substrate and having a thickness less than M4, a second layer of a high-index filming material deposited on the first layer and having a thickness of less than 1/4, a third layer of a low-index filming material deposited on the second layer and having a thickness approximately between 5 M16 and 7A/l6, a fourth layer of a high-index filming material deposited on the third layer and having a thickness of less than M4, a fifth layer of a low-index filming material deposited on the fourth layer and having a thickness of less than M4, a
  • A is a selected wavelength of near ultraviolet range to near infrared range.
  • Such a property may be applied to a three-layer coating of the construction substrate M4 M2 M4 medium. If the layer adjacent the substrate is replaced by a three-layer coating of equivalent refractive index and the refractive index of the substrate-adjacent layer of the new three-layer is selected to be the most suitable one for the substrate, then there may be provided an anti-reflection coating which will never be affected by the refractive index of the substrate. This is disclosed in US. Pat. No. 3,432,225 (1969) and U8. Pat. No. 3,565,509 (I971).
  • An anti-reflection coating will now be considered in terms of its properties as a multi-layer coating, with the construction of such coating regarded as a fundamental periodic layer.
  • the wavelength range from a non-transmissive band to the next non-transmissive band is referred to as the periodic width of the fundamental periodic layer.
  • the uppermost layer of the fundamental periodic layer which is adjacent the medium is composed of a filming material having a lowest possible refractive index, such as magnesium fluoride (MgF lithium fluoride (LiF) or cryolite (Na AlF and that an intermediate layer adjacent the uppermost layer is composed of a filming material such as zirconium oxide (ZrO titanium oxide (TiO or scandium oxide (sc,o,,).
  • a filming material having a lowest possible refractive index such as magnesium fluoride (MgF lithium fluoride (LiF) or cryolite (Na AlF
  • an intermediate layer adjacent the uppermost layer is composed of a filming material such as zirconium oxide (ZrO titanium oxide (TiO or scandium oxide (sc,o,,).
  • the periodic width of the fundamental periodic layer may be improved by increasing the thickness of such layer.
  • performance is superior for perpendicular incident rays but inferior for oblique incident rays. That is, the angular characteristic is deteriorated.
  • the periodic width of the fundamental periodic layer could be increased by slightly increasing the thickness of the layer if the refractive index whose wave number range (lo', I+0') is in the vicinity of 0- 0.3 035 could be greatly increased or decreased with respect to the refractive index in the center range (the center means that wave number equals I).
  • the present invention aims at improving the antireflection coating of the conventional type of the form substrate 4/4 M2 M4 medium to increase the periodic band width of the fundamental periodic layer.
  • a non-absorbing, substantially colorless, multi-layer anti-reflection coating for use on a substrate having an index of refraction of 1.43 to 2.00 which comprises a first layer of a low-index filming material deposited on the substrate and having a thickness of less than M4, a second layer ofa high-index filming material deposited on the first layer and having a thickness of less than M4,
  • the high-index filming material may be one of ZrO TIOZ, Nd203, C602, T803, TIzOa, PI gOu, Tazoa' rgou and lnO and the low-index filming material is one of MgF SiO,, Na;,AlF, and UP.
  • the low-index filming materials of the first, third, fifth and seventh layers are identical and the high-index filming materials of the second, fourth and sixth layers are identical.
  • the low-index filming material may preferably be MgF, and the high-index filming material may preferably be ZrO,.
  • FIG. 1 is a diagram showing the manner in which may be provided for the wave number 0.7 by substituting for the substrate-adjacent layer in a conventional threelayer coating of the form substrate M4 k/Z M4 medium;
  • FIG. 2 is a similar diagram for the wave number 1.3;
  • FIG. 3 is a diagram showing the manner in which improvement may be provided for the wave number 0.7 by substituting for the intermediate layer in said threelayer coating;
  • FIG. 4 is a similar diagram for the wave number 1.3;
  • FIG. 5 is a graph illustrating the spectral characteristics provided by a five-layer coating of the form substrate A/4 M4 M4 M2 M4 medium and having the numerical data as given in Table I;
  • FIG. 6 is a graph illustrating the spectral characteristics provided by a seven-layer coating of the present invention having the numerical data as given in Table II.
  • the intermediate layer has nothing to do with the overall reflection factor in the center wavelength range, that is, the intermediate layer becomes an absent-layer, and therefore the refractive index of the substrate-adjacent layer can be determined by determining the residual reflection factor to be left in the center wavelength range and by determining the refractive index of the substrate.
  • the refractive index of the intermediate layer which has so far been irrelevant, can be readily obtained by determining the refractive index of the substrate-adjacent layer determined by the center wavelength range; by determining the refractive index of the uppermost layer adjacent the medium; and by determining the residual reflection factor allowed in the marginal wavelength range. This is disclosed in detail by French Pat. No. 1,005,866 (1952).
  • the coating employs the basic form substrate )t/4 M2 M4 medium in which the refractive indices are 1.4, 2.0 and 1.52 for the uppermost layer, the intermediate layer and the substrate, respectively.
  • the refractive index of the substrate is herein assumed to be 1.52 but the refractive index may be less than 1.52.
  • FIG. 1 shows the implementation of the method (2) for the wave number 0.7
  • FIG. 2 shows the implementation of the method (2) for the wave number 1.3
  • FIG. 3 shows the implementation of the method (1) for the wave number 0.7
  • FIG. 4 shows the implementation of the method (1) for the wave number 1.3.
  • reflection is represented according to the vector expression.
  • the circle centered at the base point 0 of the vector represents the range within which the reflection factor R is within 0.3%. In other words, if the end of the composite vector lies within such circle, the overall reflection is within 0.3%.
  • the vectors designated by a show a case where the refractive index of the substrate-adjacent layer in the three-layer coating is varied, and the ends of those vectors are passed by a dashed line p.
  • the vector designated by B shows a case where improvements have been made by assuming 3 M2 and order of 1.5 (1.50 1.59) for the thickness and refractive index of the intermediate layer, respectively. Similarly, in FIG.
  • the solid line vectors commencing at 0 represent the conventional antireflection coating of the form substrate M4 1 ⁇ /2 M4 medium.
  • the dashed line p shows a case where the refractive index of the substrate-adjacent layer is varied, and it is seen in this case that the residual reflection factor R is much greater than 0.3%.
  • the vector designated by B shows a case where the refractive index of the intermediate layer is varied, and in this case the residual reflection factor R is approximately 0.3%.
  • the dotted line i shows a case where the substrate-adjacent layer has a refractive index of approximately 2.5 and a thickness of 3 M4. This is also the case with FIG. 4. In both of FIGS. 3 and 4, the residual reflection factor R can be made approximately 0.3%.
  • the improvement provided by the method (1) is preferable in view of the possible deterioration of the angular characteristic resulting from the increase in the thickness of the coating.
  • n is the refractive index of the uppermost layer
  • n is that of the substrate-adjacent layer
  • n is that of the substrate.
  • the refractive index of the substrateadjacent layer in the center range determines the refractive index of the substrateadjacent layer in the center range. If, for example, the refractive indices of the substrate, the uppermost layer and the intermediate layer are 1.52, 1.39 and 20, respectively, then it will be seen that the lowermost layer has a refractive index of 2.5 and a thickness of 3M4 in the marginal range of wave number (0.7, 1.3) and has a refractive index of 1.67 and a thickness of 3M4 in the center range.
  • this means that the M4 layer adjacentthe substrate may be replaced by a layer of the abovedescribed refractive index and a thickness of 3M4.
  • the fact that the refractive indices in the visible marginal range and in the near ultraviolet and near infrared ranges are variable with respect to the refractive index in the center wavelength range must be taken into account, and it is desirable that the spectral characteristics represented by the equivalent thickness and the equivalent refractive index should have a symmetrical property about the center wavelength in the wavelength range.
  • an assembly must be formed by a symmetrical coating having a thickness substantially equivalent to p )t/4 where p is an integer.
  • the electric field in the multi-layer coating may be expressed by the product of the characteristic matrices in the respective layers forming the coating.
  • the nature of such characteristic matrices makes the refractive index symmetrical to some extent, but a multi-layer coating which is symmetrical about its thickness can be replaced by a certain equivalent singlelayer coating within a range which satisfies the relation given below.
  • suffixes a, b and c are used to represent the substrate-adjacent layer, the intermediate layer and the medium-adjacent layer in an ordinary threelayer coating, then cos g. m 5111 g.) cos g nb sln jn. sin 9. cos 9. jn sin g cos g.,
  • n is the refractive index
  • d is the thickness of the coating
  • v' is the imaginary number unit
  • N is the equivalent refractive index of the symmetrical three-layer coating
  • N* is referred to as the pseudo-equivalent refractive index of a pseudo-symmetrical three-layer coating.
  • N*D* be the pseudoequivalent thickness of the pseudo-symmetrical threelayer coating.
  • the degree of freedom can be increased in the combination of the limited existing filming materials which are physico-chemically stable. It will thus be seen that, even in one and the same filming material, the degree of freedom of the expression of the equivalent refractive index can be increased by utilizing the difference in refractive index arising from the control of such factors as the degree of vacuum and temperature. As is apparent especially from formula (4) above, it can be uniformly increased or decreased by An/n X l00(%) for the respective wavelengths. in the marginal wavelength range as shown in FIGS.
  • the refractive index greatly different from that in the center wavelength range can determine the construction of a three-layer coating which satisfies the required conditions by relating it with the non-transmissive band in such marginal wavelength range.
  • n, and n be the refractive indices of the substrateadjacent layer and the next layer and d and d, be the thickness of three layers, respectively. Then, under the condition that "u u "a v there is obtained and equation:
  • g shows the relation between n, and n, by equation (6).
  • the value of the ideal refractive index of the substrate-adjacent layer is obtained by the equation (1'), considering the residual reflective index R within the center wavelength range.
  • n,, and n are determined from the A five-layer coating of the form substrate M4,n above two relations (6) and (6) or from the relation M4,n M411 M2,n M4,n medium may be made (6), (6) and (4).
  • a five-layer into a nine-layer coating by substituting a symmetrical anti-reflection cbating of the form substrate M4 M4 three-layer coating for the substrate-adjacent layer M4 M2 M4 medium, which is a wide-band anti- (M4,n layer) and the third layer (M4,n layer), respecreflection coating effective for a wider range than the tively.
  • substrate M4 M2 M4 medium expressed as: substrate -n,, -n,, -n,;, --n, -n;,, n n
  • the nine-layer coating may be tive index of the substrate. made into a seven-layer coating.
  • Such seven-layer coating can be realized by employa ing a low-index material such as magnesium fluoride f j ,33 7 3g (MgF lithium fluoride (LiF), silicon oxide $10, or x/2 n, 2.0 r, 2.1 cryolite and a high-index material such as titanium in H :3; oxide (TiO zirconium, tantalum oxide (TaO inx/4 R; 1264 ii; 1:53 dium oxide (lnO or the like. subsrae Jl iL-fi. flfillL According to the present invention, each thickness of The Spectral characteristics Provided thereby are the first to seventh successive layers beginning with the trated in FIG.
  • a low-index material such as magnesium fluoride f j ,33 7 3g (MgF lithium fluoride (LiF), silicon oxide $10, or x/2 n, 2.0 r, 2.1 cryolite
  • a high-index material such as titanium in H :3;
  • the lent refractive index and equivalent thickness of the thicknesses of the respective layers for the various symmetrical coating are determined by the theory of types of substrate shown in Table II are linearly correequivalent coating, the thickness of the respective thin lated with one another, it will be apparent that the layers are primarily determined by that equivalent same result can be achieved not only for a substrate of thickness so that no more room is left to consider the optical glass but also for a substrate of single crystal dispersion of the refractive index.
  • the variasuch as CaF MgO or the like or for a substrate of any tion in the refractive index can be brought into considother refractive index.
  • a non-absorbing, substantially colorless, multilayer anti-reflection coating for use on a substrate having an index of refraction of 1.43 to 2.00 comprising:
  • a third layer of a low-index filming material deposited on said second layer and having a thickness approximately between 5 k/l6 and 7 M16;
  • a fourth layer of a high-index filming material deposited on said third layer and having a thickness of less than M4;
  • a fifth layer of a lowindex filming material deposited on said fourth layer and having a thickness of less than M4;
  • a sixth layer of a high-index filming material deposited on said fifth layer and having a thickness of more than M2;
  • a seventh layer of a low-index filming material deposited on said sixth layer and having a thickness of approximate 1V4;
  • A is a selected wavelength of near ultraviolet range to near infrared range.

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
US00354433A 1972-04-26 1973-04-25 Multi-layer anti-reflection coating Expired - Lifetime US3799653A (en)

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Cited By (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3922068A (en) * 1973-06-18 1975-11-25 Minolta Camera Kk Multi-layer anti-reflection coating with high and low index material
US4196246A (en) * 1976-06-23 1980-04-01 Nippon Kogaku K.K. Anti-reflection film for synthetic resin base
US4313647A (en) * 1975-12-23 1982-02-02 Mamiya Koki Kabushiki Kaisha Nonreflective coating
US4988164A (en) * 1988-04-25 1991-01-29 Olympus Optical Co., Ltd. Anti-reflection film for synthetic resin optical elements
US5362552A (en) * 1993-09-23 1994-11-08 Austin R Russel Visible-spectrum anti-reflection coating including electrically-conductive metal oxide layers
US5662395A (en) * 1995-06-07 1997-09-02 Nova Solutions, Inc. Underdesk computer desk structure with antireflecting viewing window
US6157042A (en) * 1998-11-03 2000-12-05 Lockheed Martin Corporation Optical cavity enhancement infrared photodetector
US20040062507A1 (en) * 2002-09-27 2004-04-01 Mitsubish Denki Kabushiki Kaisha Semiconductor optical device
US20040108461A1 (en) * 2002-12-05 2004-06-10 Lockheed Martin Corporation Bias controlled multi-spectral infrared photodetector and imager
US20040108564A1 (en) * 2002-12-05 2004-06-10 Lockheed Martin Corporation Multi-spectral infrared super-pixel photodetector and imager
EP1542044A1 (en) 2003-12-11 2005-06-15 JDS Uniphase Corporation Trim retarders incorporating negative birefringence
US20060024509A1 (en) * 2004-07-30 2006-02-02 Eurokera S.N.C. Plate made of a glass material for a device of the fireplace insert or stove type
US20060268207A1 (en) * 2005-05-25 2006-11-30 Jds Uniphase Corporation Tilted C-Plate Retarder Compensator And Display Systems Incorporating The Same
US20070064163A1 (en) * 2005-09-09 2007-03-22 Jds Uniphase Corporation Optimally Clocked Trim Retarders
US20070070276A1 (en) * 2003-12-11 2007-03-29 Jds Uniphase Corporation Grating trim retarders
US20070085972A1 (en) * 2005-10-18 2007-04-19 Jds Uniphase Corporation Electronically Compensated LCD Assembly
US20070146868A1 (en) * 2005-12-26 2007-06-28 Epson Toyocom Corporation Broadband antireflection coating
US20080084535A1 (en) * 2006-01-12 2008-04-10 Essilor International (Compagnie Generale D'optiqu Collection Of Ophthalmic Lens Pairs And Ophthalmic Lenses Having Residual Reflections Exhibiting Colors Of Different Intensity
US20080192335A1 (en) * 2005-06-14 2008-08-14 Carl Zeiss Smt Ag Optical Element with an Antireflection Coating, Projection Objective, and Exposure Apparatus Comprising Such an Element
US20080252800A1 (en) * 2007-04-10 2008-10-16 Jds Uniphase Corporation Twisted Nematic xLCD Contrast Compensation With Tilted-Plate Retarders
US20100134910A1 (en) * 2007-08-14 2010-06-03 Seung Hun Chae Optical film and method of manufacturing the same
US20100149642A1 (en) * 2008-12-15 2010-06-17 Hon Hai Precision Industry Co., Ltd. Antireflection film and optical element having same
CN105378511A (zh) * 2013-07-05 2016-03-02 埃西勒国际通用光学公司 具有红色残余反射颜色的光学物品
US9391700B1 (en) 2015-06-16 2016-07-12 Sunlight Photonics Inc. Integrated optical receiver skin
US9841616B1 (en) 2014-08-22 2017-12-12 Sunlight Photonics Inc. Mobile system incorporating flexible and tunable anti-reflective skin and method of use
US11042047B1 (en) 2014-08-22 2021-06-22 Sunlight Aerospace Inc. Mobile system incorporating flexible and tunable optically reflective skin and method of use

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US5173368A (en) * 1988-09-14 1992-12-22 Pilkington Visioncare Holdings, Inc. Solution-applied antireflective coatings
US5104692A (en) * 1990-04-20 1992-04-14 Pilkington Visioncare Holdings, Inc. Two-layer antireflective coating applied in solution
US5407733A (en) * 1990-08-10 1995-04-18 Viratec Thin Films, Inc. Electrically-conductive, light-attenuating antireflection coating
US5091244A (en) * 1990-08-10 1992-02-25 Viratec Thin Films, Inc. Electrically-conductive, light-attenuating antireflection coating
JP2005274527A (ja) * 2004-03-26 2005-10-06 Cimeo Precision Co Ltd 時計用カバーガラス

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US3737210A (en) * 1972-03-31 1973-06-05 Bausch & Lomb Multilayer filter based on substitution of herpin equivalent layers in a antireflection coating formula

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Cited By (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3922068A (en) * 1973-06-18 1975-11-25 Minolta Camera Kk Multi-layer anti-reflection coating with high and low index material
US4313647A (en) * 1975-12-23 1982-02-02 Mamiya Koki Kabushiki Kaisha Nonreflective coating
US4196246A (en) * 1976-06-23 1980-04-01 Nippon Kogaku K.K. Anti-reflection film for synthetic resin base
US4988164A (en) * 1988-04-25 1991-01-29 Olympus Optical Co., Ltd. Anti-reflection film for synthetic resin optical elements
US5362552A (en) * 1993-09-23 1994-11-08 Austin R Russel Visible-spectrum anti-reflection coating including electrically-conductive metal oxide layers
US5662395A (en) * 1995-06-07 1997-09-02 Nova Solutions, Inc. Underdesk computer desk structure with antireflecting viewing window
US6157042A (en) * 1998-11-03 2000-12-05 Lockheed Martin Corporation Optical cavity enhancement infrared photodetector
US6970633B2 (en) * 2002-09-27 2005-11-29 Mitsubishi Denki Kabushiki Kaisha Semiconductor optical device
US20040062507A1 (en) * 2002-09-27 2004-04-01 Mitsubish Denki Kabushiki Kaisha Semiconductor optical device
US20040108461A1 (en) * 2002-12-05 2004-06-10 Lockheed Martin Corporation Bias controlled multi-spectral infrared photodetector and imager
US6897447B2 (en) 2002-12-05 2005-05-24 Lockheed Martin Corporation Bias controlled multi-spectral infrared photodetector and imager
US20040108564A1 (en) * 2002-12-05 2004-06-10 Lockheed Martin Corporation Multi-spectral infrared super-pixel photodetector and imager
US7135698B2 (en) 2002-12-05 2006-11-14 Lockheed Martin Corporation Multi-spectral infrared super-pixel photodetector and imager
EP1542044A1 (en) 2003-12-11 2005-06-15 JDS Uniphase Corporation Trim retarders incorporating negative birefringence
US20050128391A1 (en) * 2003-12-11 2005-06-16 Jds Uniphase Corporation Trim retarders incorporating negative birefringence
US8164721B2 (en) 2003-12-11 2012-04-24 Tan Kim L Grating trim retarders
US20070070276A1 (en) * 2003-12-11 2007-03-29 Jds Uniphase Corporation Grating trim retarders
US7170574B2 (en) 2003-12-11 2007-01-30 Jds Uniphase Corporation Trim retarders incorporating negative birefringence
US20060024509A1 (en) * 2004-07-30 2006-02-02 Eurokera S.N.C. Plate made of a glass material for a device of the fireplace insert or stove type
US7449244B2 (en) * 2004-07-30 2008-11-11 Eurokera S.N.C. Plate made of a glass material for a device of the fireplace insert or stove type
US20060268207A1 (en) * 2005-05-25 2006-11-30 Jds Uniphase Corporation Tilted C-Plate Retarder Compensator And Display Systems Incorporating The Same
US8237876B2 (en) 2005-05-25 2012-08-07 Kim Leong Tan Tilted C-plate retarder compensator and display systems incorporating the same
US20080192335A1 (en) * 2005-06-14 2008-08-14 Carl Zeiss Smt Ag Optical Element with an Antireflection Coating, Projection Objective, and Exposure Apparatus Comprising Such an Element
US9684252B2 (en) 2005-06-14 2017-06-20 Carl Zeiss Smt Gmbh Optical element with an antireflection coating, projection objective, and exposure apparatus comprising such an element
US8049964B2 (en) * 2005-06-14 2011-11-01 Carl Zeiss Smt Gmbh Optical element with an antireflection coating, projection objective, and exposure apparatus comprising such an element
US20070064163A1 (en) * 2005-09-09 2007-03-22 Jds Uniphase Corporation Optimally Clocked Trim Retarders
US7714945B2 (en) 2005-09-09 2010-05-11 Jds Uniphase Corporation Optimally clocked trim retarders
US20070085972A1 (en) * 2005-10-18 2007-04-19 Jds Uniphase Corporation Electronically Compensated LCD Assembly
US7671946B2 (en) 2005-10-18 2010-03-02 Jds Uniphase Corporation Electronically compensated LCD assembly
US20070146868A1 (en) * 2005-12-26 2007-06-28 Epson Toyocom Corporation Broadband antireflection coating
US20080084535A1 (en) * 2006-01-12 2008-04-10 Essilor International (Compagnie Generale D'optiqu Collection Of Ophthalmic Lens Pairs And Ophthalmic Lenses Having Residual Reflections Exhibiting Colors Of Different Intensity
US7452076B2 (en) 2006-01-12 2008-11-18 Essilor International (Compagnie Generale D'optique) Collection of ophthalmic lens pairs and ophthalmic lenses having residual reflections exhibiting colors of different intensity
US20080252800A1 (en) * 2007-04-10 2008-10-16 Jds Uniphase Corporation Twisted Nematic xLCD Contrast Compensation With Tilted-Plate Retarders
US8072561B2 (en) 2007-04-10 2011-12-06 Jds Uniphase Corporation Twisted nematic xLCD contrast compensation with tilted-plate retarders
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US20100134910A1 (en) * 2007-08-14 2010-06-03 Seung Hun Chae Optical film and method of manufacturing the same
US8767297B2 (en) 2007-08-14 2014-07-01 Lg Chem, Ltd. Optical film and method of adjusting wavelength dispersion characteristics of the same
US9448349B2 (en) 2007-08-14 2016-09-20 Lg Chem, Ltd. Optical film and method of adjusting wavelength dispersion characteristics of the same
US7924501B2 (en) * 2008-12-15 2011-04-12 Hon Hai Precision Industry Co., Ltd. Antireflection film and optical element having same
US20100149642A1 (en) * 2008-12-15 2010-06-17 Hon Hai Precision Industry Co., Ltd. Antireflection film and optical element having same
CN105378511A (zh) * 2013-07-05 2016-03-02 埃西勒国际通用光学公司 具有红色残余反射颜色的光学物品
CN105378511B (zh) * 2013-07-05 2018-07-06 依视路国际公司 具有红色残余反射颜色的光学物品
US9841616B1 (en) 2014-08-22 2017-12-12 Sunlight Photonics Inc. Mobile system incorporating flexible and tunable anti-reflective skin and method of use
US11042047B1 (en) 2014-08-22 2021-06-22 Sunlight Aerospace Inc. Mobile system incorporating flexible and tunable optically reflective skin and method of use
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DE2321159A1 (de) 1973-10-31
FR2182079A1 (enrdf_load_stackoverflow) 1973-12-07
CH593494A5 (enrdf_load_stackoverflow) 1977-12-15
DE2321159B2 (de) 1976-11-18
GB1417779A (en) 1975-12-17
JPS495051A (enrdf_load_stackoverflow) 1974-01-17
JPS5310861B2 (enrdf_load_stackoverflow) 1978-04-17

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