US3544756A - Apparatus for vaporising high melting materials such as quartz or the like - Google Patents

Apparatus for vaporising high melting materials such as quartz or the like Download PDF

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Publication number
US3544756A
US3544756A US632984A US3544756DA US3544756A US 3544756 A US3544756 A US 3544756A US 632984 A US632984 A US 632984A US 3544756D A US3544756D A US 3544756DA US 3544756 A US3544756 A US 3544756A
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US
United States
Prior art keywords
quartz
high melting
vaporising
gap
melting materials
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US632984A
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English (en)
Inventor
Karl Dietzel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bayer AG
Original Assignee
Bayer AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bayer AG filed Critical Bayer AG
Application granted granted Critical
Publication of US3544756A publication Critical patent/US3544756A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
    • C03C17/09—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/213—SiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/25—Metals
    • C03C2217/263—Metals other than noble metals, Cu or Hg
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/151—Deposition methods from the vapour phase by vacuum evaporation

Definitions

  • the invention relates to an apparatus for vaporizing high melting materials such as quartz or the like, in which a source of electrons for an electron beam is focused by means of a horseshoe permanent magnet.
  • Apparatuses of this type are used for vapor deposition of quartz or metals on surfaces of, for example, lenses, mirrors or plastic articles.
  • electromagnets in the form of horseshoe magnets for focusing the electron beam.
  • the focus was adjusted by regulating the magnetic field by electrical means.
  • Electromagnets have the disadvantage that they require a large amount of space and moreover, the winding is exposed to high temperatures during vaporization by radiation and conduction of heat, and tends to decompose and vaporize.
  • the gases so produced cause flashover and hence switching off of the high voltage, thus interrupting the vaporization process and necessitating constant recommencement of vaporization of the quartz, so that a constant rate of vaporization, which is essential for uniform vapor deposition is not always obtained.
  • the web of the permanent magnet is provided with a gap the width of which can be adjusted by using a horizontal sliding means.
  • this sliding means it is possible to influence the magnetic field by which the focusing of the electron beam is adjusted.
  • the need for space in the ap paratus is thus reduced by the elimination of the electric energizing coil, the otherwise necessary electrical connections and the means for performing the difficult task of sealing the coils against the high vacuum, and the undesirable production of gas is eliminated.
  • a support for the material to be evaporated, together with a feed device can be passed through the gap of the magnet, which space in the arrangements previously known was taken up by the energizing coil, and the material had to be stored on a carrier plate above the coil. It has been found that focusing by means of the magnetic field is particularly advantageous when cylindrical magnets with axial magnetization are used. These cylindrical magnets are situated between the arms of the horseshoe magnet and the jaws which are directed towards the electron beam. lt has become possible owing to the control tongue to keep the cathode-heating or cathode temperature very low and yet obtain a maximum output of electrons to achieve the required energy density.
  • the apparatus comprises a symmetrical horseshoe magnet which consists of a discontinuous web 1, the arms 2, cylindrical, axially magnetized disks 3 and the jaws 4. Electrons from a cathode (not shown) of a source of the electron beam leave through a gap 5 which is formed by an auxiliary anode 6, a shield 7 and a discharge shield 8. They enter the magnetic field which deflects them and focuses them on to a body 9 of the material which is to be vaporized. The focusing may be adjusted by alteration of the magnetic field by horizontal sliding means 10 which vary the gap 11 of the magnet. A support 12 with feed drive 13 for the body 9 which is to be vaporized extends through the gap 11.
  • the whole apparatus including the article on w tch the vapor 15 to be deposited, is, of course, ar-
  • Apparatus for vaporization of high melting materials such as quartz, comprising an electron beam source, said beam being magnetically focused by a horseshoe permanent magnet, the web joining the arms of said permanent magnet being interrupted by a gap, means for adjusting the width of the gap for regulation of the magnetic conductivity, and, a support for the material which is to be vaporized disposed in the gap.
  • Apparatus as claimed in claim 1 comprising a support for the material which is to be vaporized disposed in the gap.
  • Apparatus according to claim 1 including means for feeding the material to be vaporized through the gap to said support.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacture And Refinement Of Metals (AREA)
US632984A 1966-05-03 1967-04-24 Apparatus for vaporising high melting materials such as quartz or the like Expired - Lifetime US3544756A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEF0049093 1966-05-03

Publications (1)

Publication Number Publication Date
US3544756A true US3544756A (en) 1970-12-01

Family

ID=7102724

Family Applications (1)

Application Number Title Priority Date Filing Date
US632984A Expired - Lifetime US3544756A (en) 1966-05-03 1967-04-24 Apparatus for vaporising high melting materials such as quartz or the like

Country Status (7)

Country Link
US (1) US3544756A (ca)
BE (1) BE697975A (ca)
BR (1) BR6788829D0 (ca)
CH (1) CH488026A (ca)
DE (1) DE1521252B2 (ca)
GB (1) GB1155656A (ca)
SE (1) SE306461B (ca)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH624435A5 (ca) * 1977-11-22 1981-07-31 Balzers Hochvakuum
HU177326B (en) * 1978-11-22 1981-09-28 Hiradastech Ipari Kutato Magnetic deflection system for electron beam steaming source

Also Published As

Publication number Publication date
DE1521252B2 (de) 1969-10-30
BE697975A (ca) 1967-10-16
CH488026A (de) 1970-03-31
SE306461B (ca) 1968-11-25
GB1155656A (en) 1969-06-18
BR6788829D0 (pt) 1973-03-13
DE1521252A1 (de) 1969-05-08

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