US2057638A - Process and bath for depositing ruthenium - Google Patents
Process and bath for depositing ruthenium Download PDFInfo
- Publication number
- US2057638A US2057638A US2050A US205035A US2057638A US 2057638 A US2057638 A US 2057638A US 2050 A US2050 A US 2050A US 205035 A US205035 A US 205035A US 2057638 A US2057638 A US 2057638A
- Authority
- US
- United States
- Prior art keywords
- ruthenium
- nitroso
- ammino
- gms
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- 229910052707 ruthenium Inorganic materials 0.000 title description 89
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 title description 70
- 238000000034 method Methods 0.000 title description 10
- 238000000151 deposition Methods 0.000 title description 4
- 239000000243 solution Substances 0.000 description 40
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 33
- 239000003792 electrolyte Substances 0.000 description 28
- 238000007747 plating Methods 0.000 description 21
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 16
- HOEHEVWKJPMNOD-UHFFFAOYSA-N nitroxyl anion;ruthenium(1+);trihydrate Chemical compound O.O.O.[Ru+].O=[N-] HOEHEVWKJPMNOD-UHFFFAOYSA-N 0.000 description 16
- 239000002253 acid Substances 0.000 description 15
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 15
- 238000009713 electroplating Methods 0.000 description 14
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 13
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 12
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- 125000000018 nitroso group Chemical group N(=O)* 0.000 description 12
- 150000001875 compounds Chemical class 0.000 description 11
- 229910052751 metal Inorganic materials 0.000 description 11
- 239000002184 metal Substances 0.000 description 11
- -1 platinum metals Chemical class 0.000 description 11
- 150000003839 salts Chemical class 0.000 description 11
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 9
- PQSDBPCEDVVCRA-UHFFFAOYSA-N nitrosyl chloride;ruthenium Chemical compound [Ru].ClN=O PQSDBPCEDVVCRA-UHFFFAOYSA-N 0.000 description 9
- 239000001117 sulphuric acid Substances 0.000 description 8
- 235000011149 sulphuric acid Nutrition 0.000 description 8
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 7
- 229910000929 Ru alloy Inorganic materials 0.000 description 7
- 235000011007 phosphoric acid Nutrition 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 6
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 6
- 150000007513 acids Chemical class 0.000 description 6
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 6
- 239000000908 ammonium hydroxide Substances 0.000 description 6
- 229910052697 platinum Inorganic materials 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 4
- 229910002651 NO3 Inorganic materials 0.000 description 4
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 4
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 4
- IOVCWXUNBOPUCH-UHFFFAOYSA-M Nitrite anion Chemical compound [O-]N=O IOVCWXUNBOPUCH-UHFFFAOYSA-M 0.000 description 4
- 230000001464 adherent effect Effects 0.000 description 4
- 230000007935 neutral effect Effects 0.000 description 4
- 229910017604 nitric acid Inorganic materials 0.000 description 4
- 229910052763 palladium Inorganic materials 0.000 description 4
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 4
- 150000003304 ruthenium compounds Chemical class 0.000 description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 3
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 3
- 150000003863 ammonium salts Chemical class 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000004927 fusion Effects 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 150000002832 nitroso derivatives Chemical class 0.000 description 3
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 3
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910001260 Pt alloy Inorganic materials 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000004070 electrodeposition Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910000069 nitrogen hydride Inorganic materials 0.000 description 2
- BLDHXLQFQBPBPY-UHFFFAOYSA-K nitroso sulfate;ruthenium(3+) Chemical compound [Ru+3].[O-]S(=O)(=O)ON=O.[O-]S(=O)(=O)ON=O.[O-]S(=O)(=O)ON=O BLDHXLQFQBPBPY-UHFFFAOYSA-K 0.000 description 2
- 150000007530 organic bases Chemical class 0.000 description 2
- 235000006408 oxalic acid Nutrition 0.000 description 2
- OYJSZRRJQJAOFK-UHFFFAOYSA-N palladium ruthenium Chemical compound [Ru].[Pd] OYJSZRRJQJAOFK-UHFFFAOYSA-N 0.000 description 2
- CFQCIHVMOFOCGH-UHFFFAOYSA-N platinum ruthenium Chemical compound [Ru].[Pt] CFQCIHVMOFOCGH-UHFFFAOYSA-N 0.000 description 2
- 239000004323 potassium nitrate Substances 0.000 description 2
- 235000010333 potassium nitrate Nutrition 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 2
- PAWQVTBBRAZDMG-UHFFFAOYSA-N 2-(3-bromo-2-fluorophenyl)acetic acid Chemical compound OC(=O)CC1=CC=CC(Br)=C1F PAWQVTBBRAZDMG-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- XVMSFILGAMDHEY-UHFFFAOYSA-N 6-(4-aminophenyl)sulfonylpyridin-3-amine Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=N1 XVMSFILGAMDHEY-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- USFZMSVCRYTOJT-UHFFFAOYSA-N Ammonium acetate Chemical compound N.CC(O)=O USFZMSVCRYTOJT-UHFFFAOYSA-N 0.000 description 1
- 239000005695 Ammonium acetate Substances 0.000 description 1
- 239000004251 Ammonium lactate Substances 0.000 description 1
- 241001303000 Amperea Species 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- JVTAAEKCZFNVCJ-UHFFFAOYSA-M Lactate Chemical compound CC(O)C([O-])=O JVTAAEKCZFNVCJ-UHFFFAOYSA-M 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 229910001252 Pd alloy Inorganic materials 0.000 description 1
- 229910000629 Rh alloy Inorganic materials 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- DAJRVWNOOXLJFZ-UHFFFAOYSA-M [OH-].[K+].[K+].[O-][N+]([O-])=O Chemical compound [OH-].[K+].[K+].[O-][N+]([O-])=O DAJRVWNOOXLJFZ-UHFFFAOYSA-M 0.000 description 1
- YPPQDPIIWDQYRY-UHFFFAOYSA-N [Ru].[Rh] Chemical compound [Ru].[Rh] YPPQDPIIWDQYRY-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 235000019257 ammonium acetate Nutrition 0.000 description 1
- 229940043376 ammonium acetate Drugs 0.000 description 1
- SWLVFNYSXGMGBS-UHFFFAOYSA-N ammonium bromide Chemical compound [NH4+].[Br-] SWLVFNYSXGMGBS-UHFFFAOYSA-N 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 229940059265 ammonium lactate Drugs 0.000 description 1
- 235000019286 ammonium lactate Nutrition 0.000 description 1
- VBIXEXWLHSRNKB-UHFFFAOYSA-N ammonium oxalate Chemical compound [NH4+].[NH4+].[O-]C(=O)C([O-])=O VBIXEXWLHSRNKB-UHFFFAOYSA-N 0.000 description 1
- ZRIUUUJAJJNDSS-UHFFFAOYSA-N ammonium phosphates Chemical compound [NH4+].[NH4+].[NH4+].[O-]P([O-])([O-])=O ZRIUUUJAJJNDSS-UHFFFAOYSA-N 0.000 description 1
- RZOBLYBZQXQGFY-HSHFZTNMSA-N azanium;(2r)-2-hydroxypropanoate Chemical compound [NH4+].C[C@@H](O)C([O-])=O RZOBLYBZQXQGFY-HSHFZTNMSA-N 0.000 description 1
- NGPGDYLVALNKEG-UHFFFAOYSA-N azanium;azane;2,3,4-trihydroxy-4-oxobutanoate Chemical compound [NH4+].[NH4+].[O-]C(=O)C(O)C(O)C([O-])=O NGPGDYLVALNKEG-UHFFFAOYSA-N 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 229940001447 lactate Drugs 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- MEMIGISGUUDFSL-UHFFFAOYSA-N nitroxyl anion ruthenium(1+) Chemical class [Ru]N=O MEMIGISGUUDFSL-UHFFFAOYSA-N 0.000 description 1
- ICSRHFHFSPRLNA-UHFFFAOYSA-H nitroxyl anion ruthenium(4+) trisulfate Chemical compound S(=O)(=O)([O-])[O-].N(=O)[Ru+3].S(=O)(=O)([O-])[O-].S(=O)(=O)([O-])[O-].N(=O)[Ru+3] ICSRHFHFSPRLNA-UHFFFAOYSA-H 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- WMFZVLIHQVUVGO-UHFFFAOYSA-N phenyl-(4-phenylphenyl)methanol Chemical compound C=1C=C(C=2C=CC=CC=2)C=CC=1C(O)C1=CC=CC=C1 WMFZVLIHQVUVGO-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 125000002924 primary amino group Chemical class [H]N([H])* 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 150000003284 rhodium compounds Chemical class 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910021653 sulphate ion Inorganic materials 0.000 description 1
- 238000005494 tarnishing Methods 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 229940095064 tartrate Drugs 0.000 description 1
- YWYZEGXAUVWDED-UHFFFAOYSA-N triammonium citrate Chemical compound [NH4+].[NH4+].[NH4+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O YWYZEGXAUVWDED-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
Definitions
- This invention relates to methods of and baths for electroplating ruthenium.
- An object of this invention is to deposit smooth and adherent coatings of ruthenium.
- Ruthenium is a metal of the platinum group. It is white in color and very resistant to oxidation and atmospheric conditions. The metal is unaffected by mineral acids.
- the electrodeposited ruthenium closely resembles the color of rhodium and in many instances may be substituted therefor. Also within the contemplation of our invention is the use of baths or electrolytes for depositing alloys of ruthenium with any of the other platinum metals or with other metals.
- the ruthenium coatings or deposits may be used to protect tarnishable metal surfaces, such as silver or the like, which results in tarnishproofing the cheaper metals.
- ruthenium may be deposited on non-tarnishing surfaces, such as jewelry, watch cases and similar articles, where a durable white surface is desired.
- non-metallic articles such as, carbon and graphite, may be plated with ruthenium according to our invention. In some instances, also, it may be advisable to plate the metal with some other covering metal such as nickel or copper before plating with ruthenium to form an underplating of such metal or metals.
- aqueous solutions of ruthenium compounds containing the nitroso (NO) group form valuable electroplating solutions. These compounds may be used in acid, alkaline or neutral baths for plating. More particularly we have found that aqueous solutions of ruthenium compounds containing the nitroso (N0) group and also the ammino (NHs) group may be used in acidic, alkaline or neutral condition to electroplate ruthenium. Instead of the ammino group we may substitute the radicals of organic bases, such as pyridine, or the like. The pH range of the baths is from 1 to 14. All of these plating solutions or baths are very stable and the plating efliciency stays substantially the same for several months. Other examples given in the specification broadly show ruthenium electroplating solutions and also additional examples show ruthenium electroplating solutions containing substituted ammino compounds.
- Ruthenium nitroso hydroxide [RuNO(OH)3.- H2O] was dissolved in hydrochloric acid to form ruthenium nitroso chloride [RllNOClsl-IzO] This compound was dissolved in several acids and electroplating baths were made up as set forth below. Ruthenium was deposited from these baths under the following conditions using brass sheet cathodes of 1" x 3 and good platings were obtained. In the examples, amperes per square decimeter are given.
- ruthenium nitroso chloride was prepared by dissolving 2.0i gms..
- ruthenium as ruthenium nitroso hydroxide were dissolved in 20 cc. of acetic acid and evaporated to dryness to remove excess acetic acid. The residue was dissolved in 500 cc. of water containing cc. of sulphuric acid. The resulting bath was electrolyzed at 75 C. at 2.2 volts, 2.21 amperes per square decimeter for 5 minutes and a bright and smooth deposit of ruthenium was obtained.
- Ruthenium-platinum alloy deposits may be obtained from the following alkaline and acid baths:
- Ruthenium-palladium alloy deposits may be obtained from the following alkaline and acid baths: I
- the simple ammonium salts are formed when the acid solutions of the ruthenium nitroso compounds are made ammoniacal. These ammonium salts act as conducting salts or agents. Of course, we are not to be restricted to ammonium salts as the conducting agents as other salts or compounds may be used. It is not absolutely necessary to have conducting salts present in the solutions and we may use the ammino nitroso compounds alone in ammoniacal solution without conducting salts. In general when conducting salts are added lower voltages and amperages may be used.
- Tables III and IV do not contain all the compounds set forth in Table II.
- the other compounds given in Table II may also be treated in the way set forth in connection with Tables 1121 and IV and electrolytes obtained from which ruthenium may be deposited.
- Conducting salts may be used if desired but are not absolutely necessary.
- ethylenediamine we may use other amine compounds such as triethanolamine. Also derivatives and homologs of pyridine and the amine compounds maybe used.
- a process for electroplating bright and lustrous ruthenium for decorative or protective purposes which comprises passing a direct current of about 1 to 3 volts and about 2 to 4.5 ampjdm. through an electrolyte which maintains its stability and plating efliciency over an extended pe'- riod of time, said electrolyte containing about 4 gm. of ruthenium per liter as a ruthenium nitroso compound.
- a process for electroplating ruthenium which comprises passing a current through an electrolyte containing a ruthenium nitroso compound, the pH of the electrolyte ranging from about 1 to about 14.
- a process for electroplating ruthenium which comprises passing a current through an electrolyte containing a ruthenium nitroso amino compound, the pH of the electrolyte ranging from a about 1 to about 14.
- a process for electrodepositing ruthenium which comprises passing a current of about 3 volts and about 2 amperes per square decimeter through an electrolyte containing ruthenium nitroso sulphate, and maintaining the temperature of the electrolyte at about 60 C.
- a process for electrodepositing ruthenium which comprises passing a current of about 2 volts and about 2 amperes per square decimeter through an electrolyte containingruthenium nitroso ammino chloridepand maintaining the temperature of the electrolyte at about 75 C.
- An electrolyte for plating a rutheniumrhodium alloy which contains a ruthenium nitroso compound and a rhodium compound.
- An electrolyte for plating ruthenium which includes a solution of a ruthenium compound containing a nitroso group.
- An electrolyte for plating ruthenium which comprises a solution containing an amino or organic base derivative of a ruthenium compound containing a nitroso group.
- An electrolyte for electroplating ruthenium which contains a productformed by fusing ruthenium metal with an alkali and an alkali nitrate.
- An electrolyte for electroplating ruthenium which is formed by fusing ruthenium metal with potassium hydroxide and potassium nitrate and dissolving the fusion in water.
- a process for plating an alloy of ruthenium and one or more platinum metals which comprises passing a current through an electrolyte FRITZ ZIMMERMANN. HERBERT EMIL ZSCHIEGNER.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL43163D NL43163C (en)) | 1935-01-16 | ||
| BE412665D BE412665A (en)) | 1935-01-16 | ||
| US2050A US2057638A (en) | 1935-01-16 | 1935-01-16 | Process and bath for depositing ruthenium |
| GB31870/35A GB466126A (en) | 1935-01-16 | 1935-11-18 | Electro-deposition of ruthenium |
| FR799251D FR799251A (fr) | 1935-01-16 | 1935-12-05 | Procédé de galvanoplastie et produits en résultant |
| DEB172245D DE647334C (de) | 1935-01-16 | 1935-12-20 | Elektrolyt zur Erzeugung elektrolytischer Niederschlaege von Ruthenium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US2050A US2057638A (en) | 1935-01-16 | 1935-01-16 | Process and bath for depositing ruthenium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US2057638A true US2057638A (en) | 1936-10-13 |
Family
ID=21699025
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US2050A Expired - Lifetime US2057638A (en) | 1935-01-16 | 1935-01-16 | Process and bath for depositing ruthenium |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US2057638A (en)) |
| BE (1) | BE412665A (en)) |
| DE (1) | DE647334C (en)) |
| FR (1) | FR799251A (en)) |
| GB (1) | GB466126A (en)) |
| NL (1) | NL43163C (en)) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2600175A (en) * | 1946-09-11 | 1952-06-10 | Metals & Controls Corp | Electrical contact |
| US3480523A (en) * | 1964-03-04 | 1969-11-25 | Int Nickel Co | Deposition of platinum-group metals |
| US3625840A (en) * | 1970-01-19 | 1971-12-07 | Engelhard Ind Ltd | Electrodeposition of ruthenium |
| US3793162A (en) * | 1971-12-17 | 1974-02-19 | Int Nickel Co | Electrodeposition of ruthenium |
| US3892638A (en) * | 1973-06-21 | 1975-07-01 | Oxy Metal Industries Corp | Electrolyte and method for electrodepositing rhodium-ruthenium alloys |
| US4082625A (en) * | 1976-06-08 | 1978-04-04 | The International Nickel Company, Inc. | Electrodeposition of ruthenium |
| US4297178A (en) * | 1979-04-10 | 1981-10-27 | The International Nickel Company, Inc. | Ruthenium electroplating and baths and compositions therefor |
| WO2010057573A1 (en) * | 2008-11-21 | 2010-05-27 | Umicore Galvanotechnik Gmbh | Noble metal-containing layer sequence for decorative articles |
| CN115369461A (zh) * | 2022-07-12 | 2022-11-22 | 永星化工(上海)有限公司 | 用于医疗、电子穿戴设备的铂族金属电镀液络合剂组合物 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3123544A (en) * | 1961-04-18 | 1964-03-03 | Electrodeposition of ruthenium | |
| CH512590A (fr) * | 1970-03-20 | 1971-09-15 | Sel Rex Corp | Procédé pour le dépôt électrolytique d'alliages de ruthénium, bain aqueux pour la mise en oeuvre de ce procédé, et article revêtu d'un alliage de ruthénium obtenu par ce procédé |
-
0
- BE BE412665D patent/BE412665A/xx unknown
- NL NL43163D patent/NL43163C/xx active
-
1935
- 1935-01-16 US US2050A patent/US2057638A/en not_active Expired - Lifetime
- 1935-11-18 GB GB31870/35A patent/GB466126A/en not_active Expired
- 1935-12-05 FR FR799251D patent/FR799251A/fr not_active Expired
- 1935-12-20 DE DEB172245D patent/DE647334C/de not_active Expired
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2600175A (en) * | 1946-09-11 | 1952-06-10 | Metals & Controls Corp | Electrical contact |
| US3480523A (en) * | 1964-03-04 | 1969-11-25 | Int Nickel Co | Deposition of platinum-group metals |
| US3625840A (en) * | 1970-01-19 | 1971-12-07 | Engelhard Ind Ltd | Electrodeposition of ruthenium |
| US3793162A (en) * | 1971-12-17 | 1974-02-19 | Int Nickel Co | Electrodeposition of ruthenium |
| US3892638A (en) * | 1973-06-21 | 1975-07-01 | Oxy Metal Industries Corp | Electrolyte and method for electrodepositing rhodium-ruthenium alloys |
| US4082625A (en) * | 1976-06-08 | 1978-04-04 | The International Nickel Company, Inc. | Electrodeposition of ruthenium |
| US4297178A (en) * | 1979-04-10 | 1981-10-27 | The International Nickel Company, Inc. | Ruthenium electroplating and baths and compositions therefor |
| WO2010057573A1 (en) * | 2008-11-21 | 2010-05-27 | Umicore Galvanotechnik Gmbh | Noble metal-containing layer sequence for decorative articles |
| EP2192210A1 (de) * | 2008-11-21 | 2010-06-02 | Umicore Galvanotechnik GmbH | Edelmetallhaltige Schichtfolge für dekorative Artikel |
| US20110236720A1 (en) * | 2008-11-21 | 2011-09-29 | Joachim Grimm | Noble metal-containing layer sequence for decorative articles |
| CN102224280A (zh) * | 2008-11-21 | 2011-10-19 | 尤米科尔电镀技术有限公司 | 用于装饰制品的含贵金属的序列层 |
| CN102224280B (zh) * | 2008-11-21 | 2013-10-23 | 尤米科尔电镀技术有限公司 | 用于装饰制品的含贵金属的序列层 |
| CN115369461A (zh) * | 2022-07-12 | 2022-11-22 | 永星化工(上海)有限公司 | 用于医疗、电子穿戴设备的铂族金属电镀液络合剂组合物 |
Also Published As
| Publication number | Publication date |
|---|---|
| GB466126A (en) | 1937-05-18 |
| NL43163C (en)) | |
| FR799251A (fr) | 1936-06-10 |
| BE412665A (en)) | |
| DE647334C (de) | 1937-07-12 |
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