US20220170161A1 - Substrate plating apparatus including hybrid paddle that simultaneously circulates and stirs plating solution and removes air bubbles - Google Patents
Substrate plating apparatus including hybrid paddle that simultaneously circulates and stirs plating solution and removes air bubbles Download PDFInfo
- Publication number
- US20220170161A1 US20220170161A1 US17/454,403 US202117454403A US2022170161A1 US 20220170161 A1 US20220170161 A1 US 20220170161A1 US 202117454403 A US202117454403 A US 202117454403A US 2022170161 A1 US2022170161 A1 US 2022170161A1
- Authority
- US
- United States
- Prior art keywords
- substrate
- plating solution
- plating
- suction
- spray
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000007747 plating Methods 0.000 title claims abstract description 137
- 239000000758 substrate Substances 0.000 title claims abstract description 95
- 238000003756 stirring Methods 0.000 title claims abstract description 23
- 239000007921 spray Substances 0.000 claims abstract description 58
- 230000001133 acceleration Effects 0.000 claims description 7
- 238000005507 spraying Methods 0.000 abstract description 4
- 230000000694 effects Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 238000007772 electroless plating Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1619—Apparatus for electroless plating
- C23C18/1628—Specific elements or parts of the apparatus
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/10—Agitating of electrolytes; Moving of racks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1655—Process features
- C23C18/1664—Process features with additional means during the plating process
- C23C18/1669—Agitation, e.g. air introduction
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1675—Process conditions
- C23C18/1683—Control of electrolyte composition, e.g. measurement, adjustment
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/04—Removal of gases or vapours ; Gas or pressure control
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/16—Regeneration of process solutions
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/16—Regeneration of process solutions
- C25D21/18—Regeneration of process solutions of electrolytes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
Definitions
- the present invention relates to a substrate plating apparatus, and more particularly, to a substrate plating apparatus that simultaneously circulates and stirs a plating solution and removes air bubbles.
- a substrate plating apparatus necessarily has a force of stirring a plating solution to realize a constant plating quality.
- the related art discloses various stirring units for performing a reciprocating movement of a substrate, supplying the plating solution to the substrate through a spray device, or stirring the plating solution by using a paddle.
- a feature of effectively removing air bubbles generated from the substrate during plating is important to realize the constant plating quality.
- the typical stirring unit may not effectively remove air bubbles attached to the substrate although exhibiting an effect of distributing a portion of the air bubbles.
- a typical vertical-type plating apparatus attempts to apply an impact or a vibration to the substrate for removing the air bubbles, which causes damages or deviation of the substrate.
- the typical horizontal-type plating apparatus also attempts to incline or rotate the substrate for removing the air bubbles, which requires a separate driving device.
- the present invention provides a substrate plating apparatus capable of simultaneously circulating and stirring a plating solution and removing air bubbles.
- An embodiment of the present invention provides a plating apparatus for a substrate, which plates a substrate, including: a plating bath for accommodating a plating solution; and a hybrid paddle disposed in front of the substrate in the plating bath to stir the plating solution.
- the hybrid paddle includes a spray assembly for spraying the plating solution toward the substrate and a suction assembly for suctioning air bubbles formed on the substrate during plating, and the spray assembly and the suction assembly are coupled into one body and perform a reciprocating movement along a surface of the substrate to stir the plating solution.
- the spray assembly may include: a plurality of spray tubes spaced in parallel to each other to spray the plating solution; and a supply tube connected to one end of each of the plurality of spray tubes to transfer the plating solution
- the suction assembly may include: a plurality of suction tubes arranged alternately with the plurality of spray tubes to suction the air bubbles; and a discharge tube connected to one end of each of the plurality of suction tubes to transfer the air bubbles.
- each of the spray tubes may spray the plating solution through a plurality of spray nozzles formed toward the substrate, and each of the suction tubes may suction the air bubbles through a plurality of suction holes formed toward the substrate.
- the plating apparatus may further include a pump and a venturi tube, which circulate the plating solution and supply the plating solution to the hybrid paddle.
- the pump may collect the plating solution accommodated in the plating bath and discharge the collected plating solution to the venturi tube
- the venturi tube may supply the plating solution discharged from the pump to the spray assembly
- an acceleration section in which a flow velocity in the venturi tube is accelerated may be connected to the suction assembly through a circulation flow path to provide a suction force to the suction assembly.
- FIG. 1 is a schematic longitudinal cross sectional view illustrating a substrate plating apparatus according to an embodiment of the present invention
- FIG. 2 is an exploded perspective view illustrating a state in which components of a hybrid paddle in FIG. 1 are functionally separated;
- FIG. 3 is a perspective view illustrating the hybrid paddle and a substrate in FIG. 1 ;
- FIG. 4 is a longitudinal cross-sectional view illustrating the hybrid paddle in FIG. 3 ;
- FIG. 5 is a transversal cross-sectional view illustrating the hybrid paddle and the substrate in FIG. 3 ;
- FIG. 6 is a longitudinal cross-sectional view illustrating the hybrid paddle and the substrate in FIG. 3 ;
- FIG. 7 is a cross-sectional view illustrating a venturi tube in FIG. 1 ;
- FIG. 8 is a schematic longitudinal cross sectional view illustrating a substrate plating apparatus according to another embodiment of the present invention.
- FIG. 9 is a transversal cross-sectional view illustrating a hybrid paddle and a substrate in FIG. 8 ;
- FIG. 10 is a longitudinal cross-sectional view illustrating the hybrid paddle and the substrate in FIG. 8 ;
- FIG. 11 is a schematic longitudinal cross sectional view illustrating a substrate plating apparatus according to another embodiment of the present invention.
- FIGS. 1 to 7 a substrate plating apparatus according to an embodiment of the present invention will be described with reference to FIGS. 1 to 7 .
- FIG. 1 is a schematic longitudinal cross sectional view illustrating the substrate plating apparatus according to an embodiment of the present invention.
- a plating apparatus 100 which is a substrate plating apparatus for plating a substrate W, includes: a plating bath 10 for accommodating a plating solution 15 therein; a substrate holder (not shown) for supporting the substrate W that is an object to be plated in a detachable manner; an anode 20 disposed at a position opposite to the substrate W in the plating bath 10 ; a hybrid paddle 50 disposed parallel to a surface of the substrate W between the substrate W and the anode 20 ; and a pump 30 and a venturi tube 40 for circulating the plating solution.
- the substrate W and the anode 20 are electrically connected through a power 25 .
- a current flows between the substrate W and the anode 20 so that a plated layer or a metal layer is formed on the surface of the substrate W.
- the plating apparatus 100 according to the present invention may process a circular substrate such as a wafer.
- the embodiment of the present invention is not limited thereto.
- the plating apparatus 100 according to the present invention may process substrates having various shapes such as a rectangular substrate.
- the plating apparatus 100 according to the embodiment is a vertical type plating apparatus, in which the substrate W and the anode 20 are submerged into the plating solution 15 in a vertical direction.
- FIG. 2 is an exploded perspective view illustrating a state in which components of the hybrid paddle in FIG. 1 are functionally separated.
- FIG. 3 is a perspective view illustrating the hybrid paddle and the substrate in FIG. 1 .
- FIG. 4 is a longitudinal cross-sectional view illustrating the hybrid paddle in FIG. 3 .
- FIG. 5 is a transversal cross-sectional view illustrating the hybrid paddle and the substrate in FIG. 3 .
- FIG. 6 is a longitudinal cross-sectional view illustrating the hybrid paddle and the substrate in FIG. 3 .
- the hybrid paddle 50 is disposed in front of the substrate W in the plating bath 10 to stir the plating solution 15 .
- the hybrid paddle 50 includes a spray assembly 52 a and 54 a for spraying the plating solution 15 toward the substrate W and a suction assembly 52 b and 54 b for suctioning air bubbles formed on the substrate W during plating.
- the spray assembly 52 a and 54 a and the suction assembly 52 b and 54 b are physically coupled into one body to perform a reciprocating movement along the surface of the substrate W and stir the plating solution 15 .
- a driving unit (not shown) for driving the reciprocating movement of the hybrid paddle 50 may be provided.
- the spray assembly 52 a and 54 a includes a plurality of spray tubes 54 a spaced in parallel to each other and a supply tube 52 a connected to one end of each of the plurality of spray tubes 54 a.
- the supply tube 52 a extends in a first direction
- each of the plurality of spray tubes 54 a is branched from the supply tube 52 a in a second direction that is substantially perpendicular to the first direction.
- the plurality of spray tubes 54 a are spaced a constant gap from each other.
- Each of the spray tubes 54 a sprays the plating solution through a plurality of spray nozzles 56 a formed toward the substrate W.
- the plurality of spray nozzles 56 a may be spaced a predetermined gap from each other along a longitudinal direction of the spray tube 54 a.
- the suction assembly 52 b and 54 b includes a plurality of suction tubes 54 b arranged alternately with the plurality of spray tubes 54 a and a discharge tube 52 b connected to one end of each of the plurality of suction tubes 54 b.
- the discharge tube 52 b extends in parallel to the supply tube 52 a in the first direction
- each of the plurality of suction tubes 54 b is branched from the discharge tube 52 b in the second direction to extend while the plurality of suction tubes 54 b are spaced in parallel to each other.
- Each of the suction tubes 54 b suctions the plating solution and air bubbles 2 around the substrate W through a plurality of suction holes 56 b formed toward the substrate W.
- the plurality of suction holes 56 b may be spaced a predetermined gap from each other along a longitudinal direction of the suction tube 54 b . Although the air bubbles 2 are formed around a via hole 3 of the substrate W, the air bubbles 2 may be effectively removed through the suction holes 56 b.
- the hybrid paddle 50 has a ladder shape. As described above, the spray assembly 52 a and 54 a and the suction assembly 52 b and 54 b are coupled into one body to perform a reciprocating movement, thereby stirring the plating solution.
- the hybrid paddle 50 performs a reciprocating movement in the first direction, i.e., the longitudinal direction of the supply tube 52 a or the discharge tube 52 b, or a direction perpendicular to the longitudinal direction of each of the plurality of spray tubes 54 a or each of the suction tubes 54 b. This reciprocating movement may effectively circulate and stir the plating solution around the substrate W.
- Plating solution flow paths respectively formed in the spray assembly 52 a and 54 a and the suction assembly 52 b and 54 b may be separated from each other.
- the supply tube 52 a of the spray assembly 52 a and 54 a is connected to the venturi tube 40 , the plating solution supplied from the venturi tube 40 passes the spray tube 54 a through the supply pipe 52 a and is sprayed toward the substrate W through the spray nozzles 56 a.
- the discharge tube 52 b of the suction assembly 52 b and 54 b is connected to the venturi tube 40 , the plating solution and the air bubbles 2 around the substrate W, which are suctioned through the suction holes 56 b, pass the discharge tube 52 b through the suction tubes 54 b and are transferred to the venturi tube 40 .
- FIG. 7 is a cross-sectional view illustrating the venturi tube in FIG. 1 .
- the pump 30 and the venturi tube 40 circulate and stir the plating solution and remove air bubbles in conjunction with the hybrid paddle 50 .
- the pump 30 is connected to the plating bath 10 and collects the plating solution 15 accommodated in the plating bath 10 to discharge the plating solution 15 to the venturi tube 40 .
- the venturi tube 40 supplies the plating solution 15 discharged from the pump 30 to the spray assembly 52 a and 54 a.
- An inlet 41 connected to the pump 30 is formed at one side of the venturi tube 40
- an outlet 42 connected to the spray assembly 52 a and 54 a or the supply tube 52 a is formed at the other side of the venturi tube 40 .
- An acceleration section 43 having an internal diameter less than that of each of the inlet 41 and the outlet 42 is formed between the inlet 41 and the outlet 42 .
- a circulation flow path 44 is formed in the acceleration section 43 and connected to the suction assembly 52 b and 54 b or the discharge tube 52 b.
- the plating solution introduced from the pump 30 to the inlet 41 by the venturi effect has a flow velocity that increases while passing through the acceleration section 43 by a pressure difference. That is, as a pressure is reduced in the acceleration section 43 , a suction force is generated in the suction assembly 52 b and 54 b connected through the circulation flow path 44 .
- FIG. 8 is a schematic longitudinal cross sectional view illustrating the substrate plating apparatus according to another embodiment of the present invention.
- FIG. 9 is a transversal cross-sectional view illustrating a hybrid paddle and a substrate in FIG. 8 .
- FIG. 10 is a longitudinal cross-sectional view illustrating the hybrid paddle and the substrate in FIG. 8 .
- a member having the same function as that shown in the drawings ( FIGS. 1 to 7 ) of the previous embodiment is designated by the same reference numeral, and a description thereof will be omitted.
- different points will be mainly described.
- a plating apparatus 200 is a vertical type plating apparatus, in which one pair of anodes 20 are disposed at both sides of a substrate W, and a hybrid paddle 50 is disposed between the substrate W and each of the anodes 20 .
- the hybrid paddles 50 are disposed at both the sides of the substrate W so that spray tubes 54 a and the suction tubes 54 b of the hybrid paddles 50 face each other with the substrate W disposed therebetween.
- a plating solution sprayed from a spray nozzle 56 a of the spray tube 54 a disposed at one side of the substrate W may pass through a through-hole 4 and be suctioned to a suction hole 56 b of the suction tube 54 b disposed at the other side of the substrate W together with the air bubbles 2 , so that the plating solution and the air bubbles 2 are removed.
- FIG. 11 is a schematic longitudinal cross sectional view illustrating the substrate plating apparatus according to another embodiment of the present invention.
- a member having the same function as that shown in the drawings ( FIGS. 1 to 7 ) of the previous embodiment is designated by the same reference numeral, and a description thereof will be omitted.
- different points will be mainly described.
- a substrate plating apparatus 300 is a vertical type plating apparatus, in which a hybrid paddle 50 is disposed below a substrate W.
- a pump 30 collects a plating solution accommodated in a plating bath 10 and discharges the collected plating solution to a venturi tube 40 , and the venturi tube 40 supplies the plating solution to a hybrid paddle 50 and an inner bath 12 .
- the hybrid paddle 50 may also spray the plating solution toward the substrate W and simultaneously suction the plating solution and air bubbles around the substrate W to circulate and stir the entire plating solution, thereby removing the air bubbles around the substrate W.
- the embodiment of the present invention is not limited thereto.
- the embodiments of the present invention may be applied to an electroless plating apparatus in the substantially same manner.
- the substrate plating apparatus according to the present invention may improve the plating quality through excellent effects stated below by using the hybrid paddle including the spray assembly and the suction assembly, which are coupled into one body.
- the spray assembly of the hybrid paddle may supply the constant plating solution or metal ions to the surrounding of the substrate through the circulation of the plating solution by collecting the plating solution accommodated in the plating bath and re-supplying the plating solution to the substrate. Furthermore, the force of stirring the plating solution may be improved by the spraying force of the spray assembly.
- the suction assembly of the hybrid paddle may maintain the constant state of the plating solution or the metal ions at the surrounding of the substrate by collecting the plating solution remained around the substrate after the plating. Also, the suction assembly may effectively remove the air bubbles generated during the plating while the plating solution is collected. Furthermore, the force of stirring the plating solution may be improved by the suction force of the suction assembly.
- the spray assembly and the suction assembly which are alternately arranged, may be coupled into one body to perform the reciprocating movement along the surface of the substrate, and this physical movement may improve the force of stirring the plating solution.
- the pump may collect the plating solution accommodated in the plating bath and then supply the plating solution to the spray assembly of the hybrid paddle through the venturi tube.
- the circulation flow path is formed in the acceleration section in which the pressure in the venturi tube increases and connected to the suction assembly of the hybrid paddle.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrochemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Chemically Coating (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Description
- This U.S. non-provisional patent application claims priority under 35 U.S.C. § 119 of Korean Patent Application No. 10-2020-0163612, filed on Nov. 30, 2020, the entire contents of which are hereby incorporated by reference.
- The present invention relates to a substrate plating apparatus, and more particularly, to a substrate plating apparatus that simultaneously circulates and stirs a plating solution and removes air bubbles.
- A substrate plating apparatus necessarily has a force of stirring a plating solution to realize a constant plating quality. To this end, the related art discloses various stirring units for performing a reciprocating movement of a substrate, supplying the plating solution to the substrate through a spray device, or stirring the plating solution by using a paddle.
- Here, a feature of effectively removing air bubbles generated from the substrate during plating is important to realize the constant plating quality. However, the typical stirring unit may not effectively remove air bubbles attached to the substrate although exhibiting an effect of distributing a portion of the air bubbles. Also, a typical vertical-type plating apparatus attempts to apply an impact or a vibration to the substrate for removing the air bubbles, which causes damages or deviation of the substrate. The typical horizontal-type plating apparatus also attempts to incline or rotate the substrate for removing the air bubbles, which requires a separate driving device.
- The present invention provides a substrate plating apparatus capable of simultaneously circulating and stirring a plating solution and removing air bubbles.
- The object of the present invention is not limited to the aforesaid, but other objects not described herein will be clearly understood by those skilled in the art from descriptions below.
- An embodiment of the present invention provides a plating apparatus for a substrate, which plates a substrate, including: a plating bath for accommodating a plating solution; and a hybrid paddle disposed in front of the substrate in the plating bath to stir the plating solution. Here, the hybrid paddle includes a spray assembly for spraying the plating solution toward the substrate and a suction assembly for suctioning air bubbles formed on the substrate during plating, and the spray assembly and the suction assembly are coupled into one body and perform a reciprocating movement along a surface of the substrate to stir the plating solution.
- In an embodiment, the spray assembly may include: a plurality of spray tubes spaced in parallel to each other to spray the plating solution; and a supply tube connected to one end of each of the plurality of spray tubes to transfer the plating solution, and the suction assembly may include: a plurality of suction tubes arranged alternately with the plurality of spray tubes to suction the air bubbles; and a discharge tube connected to one end of each of the plurality of suction tubes to transfer the air bubbles.
- In an embodiment, each of the spray tubes may spray the plating solution through a plurality of spray nozzles formed toward the substrate, and each of the suction tubes may suction the air bubbles through a plurality of suction holes formed toward the substrate.
- In an embodiment, the plating apparatus may further include a pump and a venturi tube, which circulate the plating solution and supply the plating solution to the hybrid paddle. Here, the pump may collect the plating solution accommodated in the plating bath and discharge the collected plating solution to the venturi tube, the venturi tube may supply the plating solution discharged from the pump to the spray assembly, and an acceleration section in which a flow velocity in the venturi tube is accelerated may be connected to the suction assembly through a circulation flow path to provide a suction force to the suction assembly.
- Particularities of other embodiments are included in the detailed description and drawings.
- The accompanying drawings are included to provide a further understanding of the inventive concept, and are incorporated in and constitute a part of this specification. The drawings illustrate embodiments of the inventive concept and, together with the description, serve to explain principles of the inventive concept. In the drawings:
-
FIG. 1 is a schematic longitudinal cross sectional view illustrating a substrate plating apparatus according to an embodiment of the present invention; -
FIG. 2 is an exploded perspective view illustrating a state in which components of a hybrid paddle inFIG. 1 are functionally separated; -
FIG. 3 is a perspective view illustrating the hybrid paddle and a substrate inFIG. 1 ; -
FIG. 4 is a longitudinal cross-sectional view illustrating the hybrid paddle inFIG. 3 ; -
FIG. 5 is a transversal cross-sectional view illustrating the hybrid paddle and the substrate inFIG. 3 ; -
FIG. 6 is a longitudinal cross-sectional view illustrating the hybrid paddle and the substrate inFIG. 3 ; -
FIG. 7 is a cross-sectional view illustrating a venturi tube inFIG. 1 ; -
FIG. 8 is a schematic longitudinal cross sectional view illustrating a substrate plating apparatus according to another embodiment of the present invention; -
FIG. 9 is a transversal cross-sectional view illustrating a hybrid paddle and a substrate inFIG. 8 ; -
FIG. 10 is a longitudinal cross-sectional view illustrating the hybrid paddle and the substrate inFIG. 8 ; and -
FIG. 11 is a schematic longitudinal cross sectional view illustrating a substrate plating apparatus according to another embodiment of the present invention. - Advantages and features of the present disclosure, and implementation methods thereof will be clarified through following embodiments described with reference to the accompanying drawings. The present invention may, however, be embodied in different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the present disclosure to those skilled in the art. Further, the present disclosure is only defined by scopes of claims. Like reference numerals refer to like elements throughout.
- Hereinafter, a substrate plating apparatus according to an embodiment of the present invention will be described with reference to
FIGS. 1 to 7 . -
FIG. 1 is a schematic longitudinal cross sectional view illustrating the substrate plating apparatus according to an embodiment of the present invention. - Referring to
FIG. 1 , aplating apparatus 100 according to the present invention, which is a substrate plating apparatus for plating a substrate W, includes: aplating bath 10 for accommodating aplating solution 15 therein; a substrate holder (not shown) for supporting the substrate W that is an object to be plated in a detachable manner; ananode 20 disposed at a position opposite to the substrate W in theplating bath 10; ahybrid paddle 50 disposed parallel to a surface of the substrate W between the substrate W and theanode 20; and apump 30 and aventuri tube 40 for circulating the plating solution. - The substrate W and the
anode 20 are electrically connected through apower 25. A current flows between the substrate W and theanode 20 so that a plated layer or a metal layer is formed on the surface of the substrate W. Theplating apparatus 100 according to the present invention may process a circular substrate such as a wafer. However, the embodiment of the present invention is not limited thereto. For example, theplating apparatus 100 according to the present invention may process substrates having various shapes such as a rectangular substrate. Theplating apparatus 100 according to the embodiment is a vertical type plating apparatus, in which the substrate W and theanode 20 are submerged into theplating solution 15 in a vertical direction. -
FIG. 2 is an exploded perspective view illustrating a state in which components of the hybrid paddle inFIG. 1 are functionally separated.FIG. 3 is a perspective view illustrating the hybrid paddle and the substrate inFIG. 1 .FIG. 4 is a longitudinal cross-sectional view illustrating the hybrid paddle inFIG. 3 .FIG. 5 is a transversal cross-sectional view illustrating the hybrid paddle and the substrate inFIG. 3 .FIG. 6 is a longitudinal cross-sectional view illustrating the hybrid paddle and the substrate inFIG. 3 . - Referring to
FIGS. 2 to 6 , thehybrid paddle 50 is disposed in front of the substrate W in theplating bath 10 to stir theplating solution 15. Thehybrid paddle 50 includes aspray assembly plating solution 15 toward the substrate W and asuction assembly spray assembly suction assembly plating solution 15. A driving unit (not shown) for driving the reciprocating movement of thehybrid paddle 50 may be provided. - The
spray assembly spray tubes 54 a spaced in parallel to each other and asupply tube 52 a connected to one end of each of the plurality ofspray tubes 54 a. In other words, thesupply tube 52 a extends in a first direction, and each of the plurality ofspray tubes 54 a is branched from thesupply tube 52 a in a second direction that is substantially perpendicular to the first direction. The plurality ofspray tubes 54 a are spaced a constant gap from each other. Each of thespray tubes 54 a sprays the plating solution through a plurality ofspray nozzles 56 a formed toward the substrate W. The plurality ofspray nozzles 56 a may be spaced a predetermined gap from each other along a longitudinal direction of thespray tube 54 a. - The
suction assembly suction tubes 54 b arranged alternately with the plurality ofspray tubes 54 a and adischarge tube 52 b connected to one end of each of the plurality ofsuction tubes 54 b. In other words, thedischarge tube 52 b extends in parallel to thesupply tube 52 a in the first direction, and each of the plurality ofsuction tubes 54 b is branched from thedischarge tube 52 b in the second direction to extend while the plurality ofsuction tubes 54 b are spaced in parallel to each other. Each of thesuction tubes 54 b suctions the plating solution and air bubbles 2 around the substrate W through a plurality of suction holes 56 b formed toward the substrate W. The plurality of suction holes 56 b may be spaced a predetermined gap from each other along a longitudinal direction of thesuction tube 54 b. Although the air bubbles 2 are formed around a viahole 3 of the substrate W, the air bubbles 2 may be effectively removed through the suction holes 56 b. - Since the plurality of
spray tubes 54 a and the plurality ofsuction tubes 54 b are alternately arranged, thehybrid paddle 50 has a ladder shape. As described above, thespray assembly suction assembly hybrid paddle 50 performs a reciprocating movement in the first direction, i.e., the longitudinal direction of thesupply tube 52 a or thedischarge tube 52 b, or a direction perpendicular to the longitudinal direction of each of the plurality ofspray tubes 54 a or each of thesuction tubes 54 b. This reciprocating movement may effectively circulate and stir the plating solution around the substrate W. - Plating solution flow paths respectively formed in the
spray assembly suction assembly supply tube 52 a of thespray assembly venturi tube 40, the plating solution supplied from theventuri tube 40 passes thespray tube 54 a through thesupply pipe 52 a and is sprayed toward the substrate W through thespray nozzles 56 a. Also, since thedischarge tube 52 b of thesuction assembly venturi tube 40, the plating solution and the air bubbles 2 around the substrate W, which are suctioned through the suction holes 56 b, pass thedischarge tube 52 b through thesuction tubes 54 b and are transferred to theventuri tube 40. -
FIG. 7 is a cross-sectional view illustrating the venturi tube inFIG. 1 . - Referring to
FIGS. 1 and 7 , thepump 30 and theventuri tube 40 circulate and stir the plating solution and remove air bubbles in conjunction with thehybrid paddle 50. Specifically, thepump 30 is connected to theplating bath 10 and collects theplating solution 15 accommodated in theplating bath 10 to discharge theplating solution 15 to theventuri tube 40. - The
venturi tube 40 supplies theplating solution 15 discharged from thepump 30 to thespray assembly inlet 41 connected to thepump 30 is formed at one side of theventuri tube 40, and anoutlet 42 connected to thespray assembly supply tube 52 a is formed at the other side of theventuri tube 40. Anacceleration section 43 having an internal diameter less than that of each of theinlet 41 and theoutlet 42 is formed between theinlet 41 and theoutlet 42. Acirculation flow path 44 is formed in theacceleration section 43 and connected to thesuction assembly discharge tube 52 b. - The plating solution introduced from the
pump 30 to theinlet 41 by the venturi effect has a flow velocity that increases while passing through theacceleration section 43 by a pressure difference. That is, as a pressure is reduced in theacceleration section 43, a suction force is generated in thesuction assembly circulation flow path 44. - Hereinafter, a substrate plating apparatus according to another embodiment of the present invention will be described with reference to
FIGS. 8 to 10 .FIG. 8 is a schematic longitudinal cross sectional view illustrating the substrate plating apparatus according to another embodiment of the present invention.FIG. 9 is a transversal cross-sectional view illustrating a hybrid paddle and a substrate inFIG. 8 .FIG. 10 is a longitudinal cross-sectional view illustrating the hybrid paddle and the substrate inFIG. 8 . For convenience of description, a member having the same function as that shown in the drawings (FIGS. 1 to 7 ) of the previous embodiment is designated by the same reference numeral, and a description thereof will be omitted. Hereinafter, different points will be mainly described. - Referring to
FIG. 8 , aplating apparatus 200 according to the embodiment is a vertical type plating apparatus, in which one pair ofanodes 20 are disposed at both sides of a substrate W, and ahybrid paddle 50 is disposed between the substrate W and each of theanodes 20. - Referring to
FIGS. 9 and 10 , the hybrid paddles 50 are disposed at both the sides of the substrate W so thatspray tubes 54 a and thesuction tubes 54 b of thehybrid paddles 50 face each other with the substrate W disposed therebetween. When air bubbles 2 are formed around a throughhole 4 of the substrate W, a plating solution sprayed from aspray nozzle 56 a of thespray tube 54 a disposed at one side of the substrate W may pass through a through-hole 4 and be suctioned to asuction hole 56 b of thesuction tube 54 b disposed at the other side of the substrate W together with the air bubbles 2, so that the plating solution and the air bubbles 2 are removed. - Hereinafter, a substrate plating apparatus according to another embodiment of the present invention will be described with reference to
FIG. 11 .FIG. 11 is a schematic longitudinal cross sectional view illustrating the substrate plating apparatus according to another embodiment of the present invention. For convenience of description, a member having the same function as that shown in the drawings (FIGS. 1 to 7 ) of the previous embodiment is designated by the same reference numeral, and a description thereof will be omitted. Hereinafter, different points will be mainly described. - Referring to
FIG. 11 , asubstrate plating apparatus 300 according to the embodiment is a vertical type plating apparatus, in which ahybrid paddle 50 is disposed below a substrateW. A pump 30 collects a plating solution accommodated in aplating bath 10 and discharges the collected plating solution to aventuri tube 40, and theventuri tube 40 supplies the plating solution to ahybrid paddle 50 and aninner bath 12. - In this embodiment, the
hybrid paddle 50 may also spray the plating solution toward the substrate W and simultaneously suction the plating solution and air bubbles around the substrate W to circulate and stir the entire plating solution, thereby removing the air bubbles around the substrate W. - Although the technical idea of the hybrid paddle and/or the venturi tube is applied to the electroplating apparatus as an example in the above-described embodiments of the present invention, the embodiment of the present invention is not limited thereto. The embodiments of the present invention may be applied to an electroless plating apparatus in the substantially same manner.
- As described above, the substrate plating apparatus according to the present invention may improve the plating quality through excellent effects stated below by using the hybrid paddle including the spray assembly and the suction assembly, which are coupled into one body.
- First, the spray assembly of the hybrid paddle may supply the constant plating solution or metal ions to the surrounding of the substrate through the circulation of the plating solution by collecting the plating solution accommodated in the plating bath and re-supplying the plating solution to the substrate. Furthermore, the force of stirring the plating solution may be improved by the spraying force of the spray assembly.
- Second, the suction assembly of the hybrid paddle may maintain the constant state of the plating solution or the metal ions at the surrounding of the substrate by collecting the plating solution remained around the substrate after the plating. Also, the suction assembly may effectively remove the air bubbles generated during the plating while the plating solution is collected. Furthermore, the force of stirring the plating solution may be improved by the suction force of the suction assembly.
- Third, the spray assembly and the suction assembly, which are alternately arranged, may be coupled into one body to perform the reciprocating movement along the surface of the substrate, and this physical movement may improve the force of stirring the plating solution.
- Fourth, the pump may collect the plating solution accommodated in the plating bath and then supply the plating solution to the spray assembly of the hybrid paddle through the venturi tube. The circulation flow path is formed in the acceleration section in which the pressure in the venturi tube increases and connected to the suction assembly of the hybrid paddle. Thus, when the plating solution discharged from the pump is sprayed through the spray assembly, the suction force of the suction assembly connected to the circulation flow path increases by the pressure difference in the venturi tube, and the overall force of circulating the plating solution in the plating bath increases.
- The description of the present invention is intended to be illustrative, and those with ordinary skill in the technical field of the present invention will be understood that the present invention can be carried out in other specific forms without changing the technical idea or essential features. Thus, the above-disclosed embodiments are to be considered illustrative and not restrictive.
Claims (4)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020200163612A KR102528900B1 (en) | 2020-11-30 | 2020-11-30 | Plating apparatus including hybrid paddle that simultaneously circulates and stirs plating solution and removes air bubbles |
KR10-2020-0163612 | 2020-11-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
US20220170161A1 true US20220170161A1 (en) | 2022-06-02 |
Family
ID=81752234
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US17/454,403 Abandoned US20220170161A1 (en) | 2020-11-30 | 2021-11-10 | Substrate plating apparatus including hybrid paddle that simultaneously circulates and stirs plating solution and removes air bubbles |
Country Status (2)
Country | Link |
---|---|
US (1) | US20220170161A1 (en) |
KR (1) | KR102528900B1 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2023178853A1 (en) * | 2022-03-25 | 2023-09-28 | 生益电子股份有限公司 | Blind hole bubble elimination apparatus and method |
CN118028943A (en) * | 2024-04-09 | 2024-05-14 | 苏州太阳井新能源有限公司 | Electroplating spray head and electrochemical 3D printing device |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5516412A (en) * | 1995-05-16 | 1996-05-14 | International Business Machines Corporation | Vertical paddle plating cell |
JPH1112785A (en) * | 1997-06-24 | 1999-01-19 | Canon Inc | Electroplating device |
DE10341998A1 (en) * | 2003-09-04 | 2005-03-31 | Gramm Gmbh & Co. Kg | Galvanizing or coating applicator has non-self priming pump with secondary self priming pump between process chamber and discharge tank |
US20060113185A1 (en) * | 2003-03-11 | 2006-06-01 | Fumio Kuriyama | Plating apparatus |
US20160068988A1 (en) * | 2014-09-10 | 2016-03-10 | Invensas Corporation | Paddle for Materials Processing |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100743017B1 (en) * | 2006-10-27 | 2007-07-26 | 삼성전기주식회사 | Wet process apparatus |
JP2010037618A (en) * | 2008-08-07 | 2010-02-18 | Hitachi Cable Ltd | Plating equipment for tab tape, and method for manufacturing tab tape |
-
2020
- 2020-11-30 KR KR1020200163612A patent/KR102528900B1/en active IP Right Grant
-
2021
- 2021-11-10 US US17/454,403 patent/US20220170161A1/en not_active Abandoned
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5516412A (en) * | 1995-05-16 | 1996-05-14 | International Business Machines Corporation | Vertical paddle plating cell |
JPH1112785A (en) * | 1997-06-24 | 1999-01-19 | Canon Inc | Electroplating device |
US20060113185A1 (en) * | 2003-03-11 | 2006-06-01 | Fumio Kuriyama | Plating apparatus |
DE10341998A1 (en) * | 2003-09-04 | 2005-03-31 | Gramm Gmbh & Co. Kg | Galvanizing or coating applicator has non-self priming pump with secondary self priming pump between process chamber and discharge tank |
US20160068988A1 (en) * | 2014-09-10 | 2016-03-10 | Invensas Corporation | Paddle for Materials Processing |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2023178853A1 (en) * | 2022-03-25 | 2023-09-28 | 生益电子股份有限公司 | Blind hole bubble elimination apparatus and method |
CN118028943A (en) * | 2024-04-09 | 2024-05-14 | 苏州太阳井新能源有限公司 | Electroplating spray head and electrochemical 3D printing device |
Also Published As
Publication number | Publication date |
---|---|
KR20220075493A (en) | 2022-06-08 |
KR102528900B1 (en) | 2023-05-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US20220170161A1 (en) | Substrate plating apparatus including hybrid paddle that simultaneously circulates and stirs plating solution and removes air bubbles | |
US11447885B2 (en) | Plating method and plating apparatus | |
CN112680760B (en) | Electroplating device and electroplating method for printed circuit board | |
US6746590B2 (en) | Ultrasonically-enhanced electroplating apparatus and methods | |
JP4947282B2 (en) | Plating method and apparatus | |
JP4365143B2 (en) | Method for stirring plating treatment liquid and plating treatment apparatus | |
CN112501664B (en) | PCB electroplating method and PCB electroplating equipment | |
JP2018126696A (en) | Laminar flow ultrasonic cleaning apparatus | |
KR101693223B1 (en) | Electroplating apparatus | |
TWM468525U (en) | Electroplating apparatus | |
JP4920365B2 (en) | Treatment tank | |
JPS62297495A (en) | Method for plating semiconductor wafer | |
CN115233277A (en) | Electroplating bath body jet device | |
CN114727491A (en) | Blind hole bubble eliminating equipment and method | |
KR102288907B1 (en) | An apparatus for plating microhole | |
JP4156086B2 (en) | Electrodeposition processing equipment | |
TWM572376U (en) | Stirrer for electroplating system | |
KR102575905B1 (en) | plating apparatus | |
TW202235696A (en) | Distribution system for a process fluid for chemical and/or electrolytic surface treatment of a substrate | |
JPS6210293A (en) | High-speed plating method | |
JP2003088789A (en) | Wet treatment device | |
CN211689275U (en) | Electroplating apparatus | |
CN219951254U (en) | Jet flow device of semiconductor wafer electroplating bath | |
JP7105673B2 (en) | Plating equipment | |
TW201410926A (en) | Spray and suction type electroplating tank |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
STPP | Information on status: patent application and granting procedure in general |
Free format text: DOCKETED NEW CASE - READY FOR EXAMINATION |
|
AS | Assignment |
Owner name: HOJIN PLATECH CO., LTD., KOREA, REPUBLIC OF Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:IM, JIN GYU;JUNG, WOON SUK;KIM, JONG UK;AND OTHERS;REEL/FRAME:061737/0332 Effective date: 20211102 |
|
STPP | Information on status: patent application and granting procedure in general |
Free format text: RESPONSE TO NON-FINAL OFFICE ACTION ENTERED AND FORWARDED TO EXAMINER |
|
STPP | Information on status: patent application and granting procedure in general |
Free format text: FINAL REJECTION MAILED |
|
STPP | Information on status: patent application and granting procedure in general |
Free format text: RESPONSE AFTER FINAL ACTION FORWARDED TO EXAMINER |
|
STPP | Information on status: patent application and granting procedure in general |
Free format text: ADVISORY ACTION MAILED |
|
STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |