US20200329534A1 - Heater and method of manufacturing same - Google Patents

Heater and method of manufacturing same Download PDF

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Publication number
US20200329534A1
US20200329534A1 US16/754,026 US201816754026A US2020329534A1 US 20200329534 A1 US20200329534 A1 US 20200329534A1 US 201816754026 A US201816754026 A US 201816754026A US 2020329534 A1 US2020329534 A1 US 2020329534A1
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heater
terminals
terminal
parallel
segmental
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Yoshihiko Matsui
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Momentive Quartz Japan GK
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Momentive Quartz Japan GK
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
    • H05B3/22—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible
    • H05B3/28—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor embedded in insulating material
    • H05B3/283—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor embedded in insulating material the insulating material being an inorganic material, e.g. ceramic
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/02—Details
    • H05B3/06—Heater elements structurally combined with coupling elements or holders
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q3/00—Devices holding, supporting, or positioning work or tools, of a kind normally removable from the machine
    • B23Q3/15—Devices for holding work using magnetic or electric force acting directly on the work
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67103—Apparatus for thermal treatment mainly by conduction
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
    • H01L21/6833—Details of electrostatic chucks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/6875—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of individual support members, e.g. support posts or protrusions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68757—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a coating or a hardness or a material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68785—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N13/00—Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B1/00—Details of electric heating devices
    • H05B1/02—Automatic switching arrangements specially adapted to apparatus ; Control of heating devices
    • H05B1/0227—Applications
    • H05B1/023—Industrial applications
    • H05B1/0233—Industrial applications for semiconductors manufacturing
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/02—Details
    • H05B3/03—Electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/68—Heating arrangements specially adapted for cooking plates or analogous hot-plates
    • H05B3/74—Non-metallic plates, e.g. vitroceramic, ceramic or glassceramic hobs, also including power or control circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R4/00—Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation
    • H01R4/28—Clamped connections, spring connections
    • H01R4/30—Clamped connections, spring connections utilising a screw or nut clamping member
    • H01R4/34—Conductive members located under head of screw
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R4/00—Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation
    • H01R4/58—Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation characterised by the form or material of the contacting members
    • H01R4/64—Connections between or with conductive parts having primarily a non-electric function, e.g. frame, casing, rail
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/002—Heaters using a particular layout for the resistive material or resistive elements
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/017—Manufacturing methods or apparatus for heaters

Definitions

  • the present invention relates to a heater that is suitably used as a heater for heating a wafer in a semiconductor manufacturing process, and its production.
  • Heaters such as ceramic heaters have been widely used as heaters for heating wafer in manufacturing process of semiconductor and liquid crystal.
  • One heater design has been known (in Patent Document 1, for example), in which a heater element made from conductive material such as PG (pyrolytic graphite) is formed on a base between terminals in a predetermined heater pattern of helical, spiral or meandering shape, for example.
  • PG pyrolytic graphite
  • Such heater includes a serial-type heater 10 ( FIG. 7 ) in which a heater pattern 11 is formed between terminals A and B in series and a parallel-type heater 20 ( FIG. 8 ) in which heater patterns 21 and 22 are formed respectively between terminals A and B in parallel, either one of which may be selected to perform an optimal heating performance depending upon shape or outer diameter of a work to be heated, purpose of use of a device to which the heater is incorporated, power source to be applied, for example.
  • the heater pattern 11 in the serial-type heater 10 of FIG. 7 and the heater patterns 21 , 22 in the parallel-type heater 20 of FIG. 8 are shown as simplified patterns by way of examples, respectively.
  • a heater is usually designed such that the outer peripheral area is given a smaller electric resistance and the inner peripheral area is given a greater electric resistance in order that the outer and inner peripheral areas should be heated substantially uniformly.
  • the heater pattern 11 of the serial-type heater 10 shown in FIG. 7 comprises, in a radial direction, an outer peripheral section 11 a, an intermediate section 11 b and an inner peripheral section 11 c in each semicircle.
  • An example of adjustment for giving optimal resistances to the respective sections for uniform heating will be described in reference to FIG. 9 .
  • Measurement points P 1 to P 4 are plotted for measuring resistance values at the respective sections.
  • the element of the heater pattern 11 is formed at first a little bit thicker to provide a resistance value of a little bit smaller than the design resistance value, which should then be partly scraped depending upon the resistance values measured at the respective measurement points for the resistance adjustment.
  • the resistance values measured at the respective measurement points in the heater patterns 21 , 22 have two different current routs, one starting from the terminal A to the measurement point (A-Pn) and the other starting from the measurement point to the terminal A (Pn-A). Accordingly, when a man tries to adjust the resistance value by scraping the element in a measured section, this will influence and change the resistance values in other sections. The resistance adjustment should be carried out taking such influence into consideration, which should require a great deal of skill.
  • the design resistance value of the heater 20 is determined to be 1.6 ohms, and measurement points P 11 to P 14 are allotted in the heater patterns 21 , 22 between the terminals A and B.
  • a section between the terminal B and the measurement point P 13 (the outer peripheral section 22 a and the intermediate section 22 b of the heater pattern 22 ) should have a
  • Each sectional resistance value by design is shown in Table 1. It is so designed that the route A-B and the route B-A are in parallel and have the same resistance value (1.61 ohms), and the measurement sections in symmetric position in the respective routes (sections A-P 11 and B-P 14 , sections P 11 -P 12 and P 13 -P 14 , sections P 12 -B and P 12 -A) have the same resistance values.
  • the parallel patterns there are two parallel routs at the respective measurement points, one starting from the terminal A and the other ending at the terminal A.
  • the parallel pattern has two routes at the respective measurement points, one from the terminal A thereto and the other to the terminal A therefrom. Accordingly, contrary to the serial pattern, the resistance values at the respective measurement points do not consistent with the total sum.
  • the resistance value of other sections should also be changed, so that precise adjustment is extremely difficult. The adjustment is especially difficult when the section A-Pn and the section Pn-(B)-A forming the parallel routes have greatly different resistance values, which requires a skillful technique in machining the element.
  • the element of the heater patterns 21 , 22 of the parallel-type heater 20 was formed to have almost the prescribed thickness in its upper area, so that the sectional resistance values r 11 , r 12 and r 13 in the upper areas are all almost equal to the reference values shown in FIG. 10( b ) , which would not require cutting or machining of the element for the resistance adjustment.
  • the element was formed in its lower area somewhat thicker than the prescribed one, so that the sectional resistance values r 14 to r 16 in the lower areas are all lower than the reference values shown in FIG. 10( b ) by the order of 0.8 to 1.1 ohms, which makes it necessary to scrape and make thinner the element in these areas, so as to adjust these sectional resistance values to become substantially equal to the respective reference values.
  • the resistance value in one section should be related with the resistance values in other sections, which means that if the sectional resistance value r 14 should be changed, the resistance values in the preceding sections (any section originally having a resistance value nearly equal to the reference value requiring no resistance adjustment and/or any already resistance-adjusted sections).
  • Patent Document 1 Japan Patent Publication No. 1999(Hei11)-354260(A)
  • the problem to be solved by the present invention is to make it possible to easily perform pre-production resistance adjustment, with no need of a skill, for a parallel-type heater having parallel heater patterns between terminals, while not detracting from intended function of the heater.
  • a parallel-type heater wherein a plurality of heater patterns are formed in parallel between a pair of terminals to which power supply bolts are fitted respectively, characterized in that each terminals is divided into a plurality of spaced segmental terminals of the same number as said heater patterns, said plural segmental terminals being electrically connected with each other by said power supply bolt, wherein a plurality of imaginary serial heater patterns are formed between one of said segmental terminals divided from one of said terminals and one of said segmental terminals divided from the other terminal when said power supply bolt are not yet fitted, whereas said plural imaginary serial heater patters are electrically connected with each other to form parallel circuits when said power supply bolts are fitted.
  • a head of said power supply bolt is in contact with a heater element forming said heater pattern directly or via a washer made by conductive material.
  • first and second heater patterns are formed in parallel between a pair of said terminals, each terminal being divided into a first segmental terminal to be electrically connected only with said first heater pattern and a second segmental terminal to be electrically connected only with said second heater pattern.
  • each of said first and second segmental terminals is formed in substantially a semicircular ring shape, said first and second heater patterns being insulated with each other by a gap extending in a radial direction between said segmental terminals.
  • first to fourth heater patterns are formed in parallel between a pair of said terminals, each terminal being divided into a first segmental terminal to be electrically connected only with said first heater pattern, a second segmental terminal to be electrically connected with said second heater pattern, a third segmental terminal to be electrically connected with said third heater pattern and a fourth segmental terminal to be electrically connected only with said fourth heater pattern.
  • each of said first to fourth segmental terminals is formed in substantially a quadrant ring shape, said first to fourth heater patterns being insulated with each other by gaps extending in radial and circumferential directions between said segmental terminals.
  • a production of the parallel-type heater of one of claims 1 to 6 characterized by steps of producing a heater body having a plurality of heater patterns in parallel between a pair of terminals, performing resistance adjustment for each of said imaginary serial heater patterns formed between one segmental terminal of one terminal and one segmental terminal of the other terminal before fitting said power supply bolts to said terminals, and then fitting said power supply bolts to said terminals so that said plural imaginary serial heater patterns become electrically connected with each other to form a parallel circuit.
  • a plurality of imaginary serial heater patterns are formed between one of the segmental terminals divided from one terminal and one of the segmental terminals divided from the other terminal. Accordingly, it is possible to relatively easily perform the resistance adjustment for the imaginary serial heater patterns, in the same way as for the conventional serial-type heaters. Thereafter, the power supply bolts are fitted to the terminals so that the plural imaginary serial heater patterns become in contact with each other to form a parallel circuit, which means that the final product will be the same as the conventional parallel-type heaters. Thus, it is possible to stably and efficiently provide a product having a small individual difference.
  • FIG. 1 is an overall plan view of a parallel-type heater (in a complete state where the power supply bolts are fitted) according to an embodiment (Embodiment 1) of the present invention.
  • FIG. 2( a ) is an enlarged plan view showing a part around the terminal of FIG. 1 and ( b ) is a cross-section taken along the section line I-I in ( a ).
  • FIG. 3 is an overall plan view of the heater in a state where the power supply bolts are removed.
  • FIG. 4( a ) is an enlarged plan view showing a part around the terminal of FIG. 3 and ( b ) is a cross-section taken along the section line II-II in ( a ).
  • FIG. 5 is an explanatory view showing the manner of resistance adjustment for the heater of FIG. 3 and FIG. 4 .
  • FIG. 6 is an overall plan view of a parallel-type heater according to another embodiment (Embodiment 2) of the present invention, which is shown in a state where the power supply bolts are removed as in FIG. 3
  • FIG. 7 is an overall plan view of a serial-type heater according to the prior art.
  • FIG. 8 is an overall plan view of a parallel-type heater according to the prior art.
  • FIG. 9( a ) is an overall plan view showing the serial-type heater of FIG. 7 in which resistance measurement points are plotted and ( b ) is an explanatory view showing the manner of resistance adjustment for this heater.
  • FIG. 10( a ) is an overall plan view showing the parallel-type heater of FIG. 8 in which resistance measurement points are plotted and ( b ) is an explanatory view showing the manner of resistance adjustment for this heater.
  • FIG. 11 is an explanatory view showing, by way of example, that it is difficult to conduct resistance adjustment for the parallel-type heater of FIG. 8 .
  • FIG. 1 and FIG. 2 show a parallel-type heater 30 according to one embodiment (Embodiment 1) of the present invention.
  • this heater 30 symmetrically designed heater patterns 31 , 32 are formed between terminals A, B.
  • This heater 30 comprises a heater body 36 of a triple-layered structure comprising a disc-shaped heater base 33 , at least its front and back surfaces being made from insulating material such as PBN (pyrolytic boron nitride, including one into which a small amount of carbon is incorporated), heater element 34 made from conductive material such as PG (pyrolytic graphite) forming the heater patterns 31 , 32 (their center lines being shown by dashed lines), and an overcoat 35 made from insulating material such as PBN.
  • insulating material such as PBN (pyrolytic boron nitride, including one into which a small amount of carbon is incorporated)
  • heater element 34 made from conductive material such as PG (pyrolytic graphite) forming the heater patterns 31 , 32 (their center lines being shown by dashed lines)
  • an overcoat 35 made from insulating material such as PBN.
  • the heater body 36 may be manufactured by a routine procedure comprising the steps of vapor-depositing heater element 34 onto the heater base 33 , partly removing the heater element to form the heater patterns 31 , 32 , forming the overcoat 35 thereon, and then removing opposite end portions of the overcoat 35 to expose the heater element 34 to thereby form the terminals A, B.
  • the overcoat 35 is shown in FIG. 2( b ) but omitted in FIG. 1 and FIG. 2( a ) .
  • Each terminal A, B is divided into two segmental terminals 37 , 38 each having a semicircular ring shape, and includes a power supply bolt 40 inserted into a bolt hole 39 extending through the heater base 33 , a nut 41 for fastening the power supply bolt 40 with the heater body 36 being interposed therebetween, and washers 42 , 43 .
  • the segmental terminal 37 is electrically connected only with the heater pattern 31
  • the segmental terminal 38 is electrically connected only with the heater pattern 32 .
  • the segmental terminals 37 , 38 are separated and insulated from each other by a gap 44 extending in a radial direction, but once the power supply bolt 40 is fitted, a head 40 a of the power supply bolt 40 becomes in contact with both of the segmental terminals 37 , 38 via the washer 42 so that the heater patterns 31 , 32 becomes electrically connected with each other to form the parallel-type heater 30 .
  • the power supply bolt 40 and the washer 42 are made from insulating material such as PBN.
  • the washer 43 may be of insulating or non-insulating material.
  • FIG. 3 and FIG. 4 show the above-constructed parallel-type heater 30 in a state where the power supply bolt 40 is removed (or a halfway state during production of the heater 30 where the heater body 36 has been obtained but the power supply bolt 40 is not yet fitted).
  • the segmental terminal 37 and the segmental terminal 38 are insulated from each other by the gap 44 , so that the heater pattern 31 is formed between the segmental terminals 37 , 37 of the terminals A, B, and the heater pattern 32 is formed between the segmental terminals 38 , 38 of the terminals A, B, each forming a serial heater route 45 , 46 . Accordingly, in this state, the resistance adjustment can be performed easily in the same way as for the aforementioned serial-type heaters 10 ( FIG. 7 ).
  • the measurement points P 21 to P 24 are plotted along the heater patterns 31 , 32 in the same way as in the aforementioned conventional parallel-type heater 20 ( FIG. 8 ), and the resistance adjustment can be performed in the following manner, which will now be described in reference to FIG. 5 .
  • the route 45 is a serial route from the terminal A to the terminal B. Accordingly, in the same way as in the resistance adjustment for the serial-type heater 10 ( FIG. 7 ) which has been described in reference to FIG. 9 , it is possible to measure the resistance values between the terminal A and the measurement points P 21 , P 22 and the terminal B and then adjust them sequentially to become equal to the respective reference values. Likewise, the resistance adjustment may be performed for the route 46 as well. Thus, the resistance adjustment may be carried out relatively easily.
  • the element of the heater patterns 31 , 32 is formed at first a little bit thicker to provide a resistance value of a little bit smaller than the design resistance value, which should then be partly scraped depending upon the resistance values measured at the respective measurement points for the resistance adjustment.
  • the power supply bolt 40 , the nut 41 and the washers 42 , 43 are fitted to each terminal A, B.
  • a head 40 a of the power supply bolt 40 becomes in contact with both of the segmental terminals 67 , 38 via the washer 42 so that the heater patterns 31 , 32 becomes electrically connected with each other to thereby form the parallel-type heater 30 .
  • the above-described parallel-type heater 30 according to Embodiment 1 has two heater patterns 31 , 32 in parallel between a pair of terminals A, B and therefore is designed such that each terminal A, B is divided into two segmental terminals 37 , 38 separated by the radially-extending gap 44 .
  • it may be designed such that a greater number of heater patterns, for example four heater patterns are formed in parallel between a pair of terminals A, B.
  • This parallel-type heater 50 has four heater patterns 51 - 54 formed between terminals A, B, and each terminal A, B is divided into four segmental terminals 55 - 58 .
  • the heater pattern 51 (its center line being shown by a dashed line) is formed between the segmental terminals 55 , 55 of the terminals A, B
  • the heater pattern 52 (its center line being shown by a broken line) is formed between the segmental terminals 56 , 56 of the terminals A, B
  • the heater patterns 53 (its center line being shown by a dashed line) is formed between the segmental terminals 57 , 57 of the terminals A, B
  • the heater patterns 54 (its center line being shown by a broken line) is formed between the segmental terminals 58 , 58 of the terminals A, B.
  • Each segmental terminal 55 - 58 is formed in a quarter-circular ringed shape, which is separated from each other by gaps 59 extending in radial and peripheral directions.
  • the present invention has been described in detail in reference to the embodiments thereof, it is not limited thereto and may be implemented in various modified applications.
  • the heater patterns 31 , 32 (the routes 45 , 46 ) becomes electrically connected with each other via the washer 42 when the power supply bolt 40 is fitted in Embodiment 1, it may also be designed that the bottom of the power supply bolt head 40 a be in contact with the heater patterns 31 , 32 directly, which will require no washer 42 .
  • each terminal of each pair is divided into a plural numbers of, for example, two (Embodiment 1) or four (Embodiment 2) segmental terminals, the number thereof being corresponding to the number of the heater patterns formed in parallel between the terminals, so that imaginary serial patterns can be formed until the power supply bolts are fitted.

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Resistance Heating (AREA)
US16/754,026 2017-10-30 2018-10-01 Heater and method of manufacturing same Abandoned US20200329534A1 (en)

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JP2017209520A JP6927851B2 (ja) 2017-10-30 2017-10-30 ヒータおよびその製造方法
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US6242719B1 (en) * 1998-06-11 2001-06-05 Shin-Etsu Handotai Co., Ltd. Multiple-layered ceramic heater
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EP1758436A1 (en) * 2005-08-26 2007-02-28 Delphi Technologies, Inc. Electronic package and circuit board having segmented contact pads
US10679873B2 (en) * 2016-09-30 2020-06-09 Ngk Spark Plug Co., Ltd. Ceramic heater

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JPH10233436A (ja) * 1997-02-18 1998-09-02 Toto Ltd 静電チャック
JPH11317284A (ja) * 1998-04-30 1999-11-16 Komatsu Ltd 温度制御装置
EP1191002A4 (en) * 2000-02-24 2005-01-26 Ibiden Co Ltd SINTERED ALUMINUM NITRIDE PIECE, CERAMIC SUBSTRATE, CERAMIC HEATING BODY, AND ELECTROSTATIC CHUCK
EP1345472A1 (en) * 2000-11-24 2003-09-17 Ibiden Co., Ltd. Ceramic heater, and production method for ceramic heater
JP2004087476A (ja) * 2002-06-26 2004-03-18 Okazaki Mfg Co Ltd ウェハ加熱用熱盤の構造および熱盤の電極固定方法
JP2004296254A (ja) * 2003-03-27 2004-10-21 Sumitomo Electric Ind Ltd セラミックスヒータおよびそれを搭載した半導体あるいは液晶製造装置
JP4570345B2 (ja) * 2003-09-18 2010-10-27 株式会社三幸 熱処理炉
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JP2013004247A (ja) * 2011-06-15 2013-01-07 Shin Etsu Chem Co Ltd セラミックスヒーター
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JPH09102665A (ja) * 1995-10-04 1997-04-15 Omron Corp 回路基板
US6242719B1 (en) * 1998-06-11 2001-06-05 Shin-Etsu Handotai Co., Ltd. Multiple-layered ceramic heater
US20050252903A1 (en) * 2003-08-27 2005-11-17 Kyocera Corporation Heater for heating a wafer and method for fabricating the same
EP1758436A1 (en) * 2005-08-26 2007-02-28 Delphi Technologies, Inc. Electronic package and circuit board having segmented contact pads
US10679873B2 (en) * 2016-09-30 2020-06-09 Ngk Spark Plug Co., Ltd. Ceramic heater

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EP3706507B1 (en) 2022-06-22
TW201935996A (zh) 2019-09-01
CN111279790A (zh) 2020-06-12
KR20200078511A (ko) 2020-07-01
KR102586537B1 (ko) 2023-10-10
EP3706507A4 (en) 2021-09-08
JP2019083115A (ja) 2019-05-30
EP3706507A1 (en) 2020-09-09
WO2019087645A1 (ja) 2019-05-09
JP6927851B2 (ja) 2021-09-01
CN111279790B (zh) 2022-10-14
TWI787310B (zh) 2022-12-21
US20240215116A1 (en) 2024-06-27

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