US20200035953A1 - Display panel and method for manufacturing the same - Google Patents

Display panel and method for manufacturing the same Download PDF

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US20200035953A1
US20200035953A1 US16/393,879 US201916393879A US2020035953A1 US 20200035953 A1 US20200035953 A1 US 20200035953A1 US 201916393879 A US201916393879 A US 201916393879A US 2020035953 A1 US2020035953 A1 US 2020035953A1
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layer
mask
electrode layer
base substrate
display panel
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Zhuo Chen
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BOE Technology Group Co Ltd
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    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/85—Arrangements for extracting light from the devices
    • H10K50/854—Arrangements for extracting light from the devices comprising scattering means
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    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
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    • H10K59/805—Electrodes
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    • H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
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    • H01L25/04—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/075—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L33/00
    • H01L25/0753—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L33/00 the devices being arranged next to each other
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    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
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    • H01L33/06—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction within the light emitting region, e.g. quantum confinement structure or tunnel barrier
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    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
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    • H01L33/14—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a carrier transport control structure, e.g. highly-doped semiconductor layer or current-blocking structure
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    • H01L33/38—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
    • H01L33/382—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape the electrode extending partially in or entirely through the semiconductor body
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    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
    • H10K50/115—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers comprising active inorganic nanostructures, e.g. luminescent quantum dots
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    • H10K50/00—Organic light-emitting devices
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    • H10K50/14—Carrier transporting layers
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    • H10K2102/10—Transparent electrodes, e.g. using graphene
    • H10K2102/101—Transparent electrodes, e.g. using graphene comprising transparent conductive oxides [TCO]
    • H10K2102/103—Transparent electrodes, e.g. using graphene comprising transparent conductive oxides [TCO] comprising indium oxides, e.g. ITO
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    • H10K2102/301—Details of OLEDs
    • H10K2102/302—Details of OLEDs of OLED structures
    • H10K2102/3023—Direction of light emission
    • H10K2102/3026—Top emission

Definitions

  • the present disclosure relates to the field of display technologies, and more particularly to a display panel and a method for manufacturing the display panel.
  • QLED Quantum Dot Light Emitting Diode
  • stability and luminous efficiency of quantum dots increase continuously.
  • the QLED display apparatuses have become more and more important in the display field.
  • micro cavities will be adjusted in a narrow efficient range due to narrow spectrum of quantum dots. It often may cause luminous energy loss of quantum dot light emitting diodes to degrade quality of the QLED display apparatuses.
  • Embodiments of the present disclosure provide a display panel including: a base substrate; a first electrode layer on a side of the base substrate; a light emitting layer on a side of the first electrode layer facing away from the base substrate; and a second electrode layer on a side of the light emitting layer facing away from the first electrode layer, wherein the second electrode layer has a first surface which is a roughened surface.
  • the first surface is located on a side of the second electrode layer facing away from the light emitting layer.
  • a plurality of protrusions are distributed on the first surface.
  • the light emitting layer is a quantum dot layer.
  • the display panel further includes: a second transport layer between the second electrode layer and the light emitting layer, the second transport layer having a second surface which is a roughened surface.
  • the second surface is located on a side of the second transport layer facing towards the second electrode layer or on another side of the second transport layer facing towards the light emitting layer.
  • the display panel further includes: a first transport layer on a side of the light emitting layer facing towards the first electrode layer; and a first injection layer on a side of the first transport layer facing towards the first electrode layer, wherein at least one of the first transport layer and the first injection layer has a third surface which is a roughened surface.
  • the third surface is a surface of the at least one of the first transport layer and the first injection layer facing towards the second electrode layer, or a surface of the at least one of the first transport layer and the first injection layer facing towards the base substrate.
  • the first transport layer is a hole transport layer and the first injection layer is a hole injection layer.
  • the second electrode layer is an indium tin oxide layer or an indium zinc oxide layer.
  • Embodiments of the present disclosure provide a method for manufacturing a display panel, the method including: arranging a first mask on a side of a base substrate, the first mask comprising a first transmission portion and a first shielding portion; arranging a second mask on a side of the first mask facing away from the base substrate and locating an orthographic projection of a pattern of the second mask onto the first mask within the first transmission portion of the first mask; and forming a second electrode layer with a roughened surface of the display panel in a region of the base substrate exposed from the first transmission portion of the first mask, by means of sputtering through the second mask.
  • the arranging the first mask on the side of the base substrate comprises: keeping the first mask in contact with the base substrate.
  • the arranging the second mask on the side of the first mask facing away from the base substrate and locating the orthographic projection of the pattern of the second mask onto the first mask within the first transmission portion of the first mask comprises: keeping a gap between the first mask and the second mask.
  • the second mask comprises: a second shielding portion; and a plurality of second transmission portions separated from one another by the second shielding portion.
  • the method before arranging the first mask on the side of the base substrate, the method further comprises: forming a first electrode layer on the base substrate; forming a light emitting layer on the first electrode layer; and forming a second transmission layer on the light emitting layer.
  • the method further comprises: forming a first injection layer and a first transport layer in sequence on the first electrode layer.
  • FIG. 1 is a schematic view showing a structure of a display panel in accordance with embodiments of the present disclosure
  • FIG. 2 is a schematic view showing a structure of a second electrode layer shown in FIG. 1 ;
  • FIG. 3 schematically illustrates structures obtained in steps of a method for manufacturing a display panel in accordance with embodiments of the present disclosure
  • FIG. 4 is a front view of a first mask shown in FIG. 3 ;
  • FIG. 5 is a flow chart of a method for manufacturing a display panel in accordance with embodiments of the present disclosure
  • FIG. 6 is a schematic view showing a structure of another display panel in accordance with embodiments of the present disclosure.
  • FIG. 7 is a schematic view showing a structure of a further display panel in accordance with embodiments of the present disclosure.
  • FIG. 8A and FIG. 8B show examples of a first transport layer or a first injection layer having a third surface.
  • the display panel includes: a base substrate 1 , a first electrode layer 2 , a light emitting layer 3 and a second electrode layer 4 .
  • the first electrode layer 2 may be arranged on a side of the base substrate 1 (in FIG. 1 , it is the upper side of the base substrate 1 ).
  • the light emitting layer 3 may be arranged on a side of the first electrode layer 2 facing away from the base substrate 1 (in FIG. 1 , it is the upper side of the first electrode layer 2 ).
  • the second electrode layer 4 may be arranged on a side of the light emitting layer 3 facing away from the first electrode layer 2 (in FIG. 1 , it is the upper side of the light emitting layer 3 ).
  • the second electrode layer 4 has a first surface 11 which is a roughened surface.
  • the term “roughened surface” means a surface that is not smooth and has a height difference between the highest point and the lowest point on the surface greater than a predetermined threshold.
  • the roughened surface may be provided with a plurality of protrusions 111 thereon, as shown in FIG. 1 .
  • Regular or irregular patterns in a form of such as recesses or grains may be formed on the roughened surface.
  • the above predetermined threshold may for example be greater than or equal to 50 nanometers, such as in a range between 50 nanometers and 100 micrometers, even several millimeters.
  • the base substrate 1 is used to provide a fundamental support for the display panel and may carry other functional layers in the display panel.
  • the base substrate 1 may be a glass substrate.
  • the first electrode layer 2 may be formed on a side of the glass substrate. In practical operation of the display panel, the first electrode layer 2 may be electrically connected to an anode of a power supply and used as an anode layer.
  • the first electrode layer 2 may be a metal electrode film. The metal electrode film not only can be used as the anode of the power supply, but also can reflect a light.
  • the light emitting layer 3 may be formed on a side of the first electrode layer 2 facing away from the base substrate 1 .
  • the light emitting layer 3 may be made from luminescent materials.
  • the light emitting layer 3 may be made from quantum dot materials.
  • the quantum dot is a semiconductor in order of nanometer. The quantum dot may emit a light with a special frequency when it is applied by a certain electrical field or light pressure, so as to be used as a light source of the display panel.
  • the second electrode layer 4 is formed on a side of the light emitting layer 3 facing away from the first electrode layer 2 .
  • the second electrode layer 4 may be electrically connected to a cathode of power supply and thus be used as a cathode layer.
  • the second electrode layer 4 may be an indium tin oxide (ITO) layer or an indium zinc oxide (IZO) layer.
  • ITO indium tin oxide
  • IZO indium zinc oxide
  • the light emitted from the light emitting layer 3 may be transmitted through the second electrode layer 4 to exit.
  • the second electrode layer 4 may include a transparent electrode.
  • an electrical field will be generated between the first electrode layer 2 and the second electrode layer 4 . Under the electrical field, the light emitting layer 3 can emit a light.
  • the first surface 11 of the second electrode layer 4 may be the roughened surface. When the light is irradiated on the first surface 11 , it may be reflected diffusely.
  • the first surface 11 of the second electrode layer 4 is the roughened surface, when a light beam emitted from the light emitting layer 3 enters the second electrode layer 4 , an incident angle of the light beam onto the first surface 11 can be changed such that most of the light beam emitted from the light emitting layer 3 can be transmitted through the second electrode layer 4 to exit. In this way, it can enhance luminous efficiency of the display panel to ensure quality of the display device.
  • Embodiments of the present disclosure provide a display panel having an increased luminous efficiency.
  • surfaces on both sides of an electrode layer (such as ITO layer) in a conventional display panel are planar.
  • an electrode layer such as ITO layer
  • a part of the light beam may be reflected totally within the electrode layer due to its incident angle greater than the critical angle of total reflection such that the part of the light beam cannot exit from the electrode layer. It may reduce the luminous efficiency of the display device and degrade quality of the display device.
  • the display panel provided by embodiments of the present disclosure includes: the base substrate 1 , the first electrode layer 2 , the light emitting layer 3 and the second electrode layer 4 .
  • the first electrode layer 2 is arranged on a side of the base substrate 1 .
  • the light emitting layer 3 is arranged on a side of the first electrode layer 2 facing away from the base substrate 1 .
  • the second electrode layer 4 is arranged on a side of the light emitting layer 3 facing away from the first electrode layer 2 .
  • the second electrode layer 4 has a first surface 11 which is a roughened surface.
  • the first surface 11 of the second electrode layer 4 is the roughened surface, thus when the light beam emitted from the light emitting layer 3 enters the second electrode layer 4 , an incident angle of the light beam onto the first surface 11 can be diversified (in various kinds) such that the light beam emitted from the light emitting layer 3 can be transmitted through the second electrode layer 4 to exit. In this way, it can increase luminous efficiency of the display panel to ensure quality of the display device.
  • the second electrode layer 4 When the second electrode layer 4 is produced, it is typically formed by sputtering.
  • the first surface 11 may be located on the side of the second electrode layer 4 facing away from the light emitting layer 3 .
  • the light emitting layer 3 is formed, then, the second electrode layer 4 is formed on a side of the light emitting layer 3 .
  • the second electrode 4 may be formed by sputtering through a mask.
  • the roughened surface may be formed on the side of the second electrode layer 4 facing away from the light emitting layer 3 .
  • the above light emitting layer 3 can emit a light under the effect of the electrical field.
  • the light emitting layer 3 may be a quantum dot layer.
  • the quantum dot is a semiconductor in order of nanometer.
  • the quantum dot may emit a colored light beam when it is applied by a certain electrical field or light pressure.
  • the color of the light beam depends on compositions, size and shape of the quantum dot.
  • the form of the quantum dot can be changed such that the quantum dot can emit a pure light with peak value of intensity, so as to provide a better display color. It can improve quality of the display device.
  • a second transport layer 5 is provided between the second electrode layer 4 and the light emitting layer 3 .
  • the second transport layer 5 has a second surface 12 which is a roughened surface.
  • the second transport layer 5 may be made from transparent materials such as ZnO (Zinc Oxide) nano-particles.
  • the second transport layer 5 is configured to transport electrons from the second electrode layer 4 into the light emitting layer 3 .
  • the electrons from the second electrode layer 4 meet holes in the light emitting layer 3 to achieve luminous effects.
  • the second surface 12 of the second transport layer 5 is the roughened surface, thus, when the light beam enters the second transport layer 5 , the second surface 12 will reflect the light beam diffusely such that the part of light beam cannot be reflected totally all along in the second transport layer 5 . In this way, entirety of the light beam can exit from the second transport layer 5 , so as to enhance luminous efficiency and ensure quality of the display device.
  • the second surface 12 may be located on a side of the second transport layer 5 facing towards the second electrode layer 4 (for example, as shown in FIG. 6 ) or on another side of the second transport layer facing towards the light emitting layer 3 (for example, as shown in FIG. 7 ).
  • a plurality of protrusions 121 may be provided on the second surface 12 .
  • the first electrode layer 2 may be an anode layer.
  • the first electrode layer 2 can transport holes to the light emitting layer 3 and allow the holes to meet the electrons in the light emitting layer 3 to emit a light.
  • a first transport layer for example a hole transport layer
  • a first injection layer for example a hole injection layer
  • One or more of the first transport layer 6 , the first injection layer 7 and the first electrode layer 2 has a third surface 13 which is a roughened surface. In the embodiments, the roughened surface can reflect the light beam diffusely.
  • the third surface 13 is a surface of the at least one of the first transport layer 6 , the first injection layer 7 or the first electrode layer 2 facing towards the base substrate 1 , or a surface of the first transport layer 6 or the first injection layer 7 facing towards the second electrode layer 4 .
  • FIGS. 8B show an example in which the third surface 13 is located on an upper side (first side) of the first transport layer 6 or the first injection layer 7 and another example in which the third surface 13 is located on a lower side (second side) of the first transport layer 6 or the first injection layer 7 , respectively.
  • a plurality of protrusions 131 may be provided on the third surface 13 .
  • the first transport layer 6 and the first injection layer 7 are arranged between the light emitting layer 3 and the first electrode layer 1 , instead of being arranged between the light emitting layer 3 and the second electrode layer 4 . It is helpful to prevent the process for producing the second electrode layer 4 from destroying the first transport layer 6 and the first injection layer 7 . It is in particular advantageous if the second electrode layer 4 is produced by high temperature evaporation.
  • the roughened second surface 12 and the roughened third surface 13 for example may be produced by any known processes (such as controlling parameters in a coating process to make uneven thickness of layers) or other known surface treatment processes in the art.
  • embodiments of the present disclosure also provide a method 100 for manufacturing a display panel. As illustrated in FIG. 5 , the method 100 may include:
  • the first mask 41 is arranged on a side of the base substrate 1 , so as to cover and shield some functional areas on the base substrate 1 .
  • the functional areas may include structures such as driving circuits, traces.
  • the second electrode layer 4 does not need to be formed in these functional areas, thus these functional areas may be shielded by the first mask 41 to prevent materials for producing the second electrode layer 4 from being sputtered to the functional areas when the second electrode layer 4 is formed.
  • the first mask 41 may include a first transmission portion 411 and a first shielding portion 412 .
  • the first transmission portion 411 is a portion through which a sputtering beam can pass in a sputtering process, for example, is an opening area.
  • the first transmission portion 411 cover the area on which the second electrode layer 4 may be formed, and the first shielding portion 412 is configured to shield the above functional areas to prevent the sputtering process from affecting the above functional areas.
  • the second mask 42 is arranged on a side of the first mask 41 facing away from the base substrate.
  • the second mask 42 is configured to form the second electrode layer 4 with a predetermined pattern through the first transmission portion 411 of the first mask 41 .
  • the second electrode layer 4 may be formed in the predetermined area on the base substrate 1 , to improve quality of the display panel.
  • the second mask 42 may include a second shielding portion 421 and a plurality of second transmission portions 422 separated by the second shielding portion 421 .
  • the second transmission portion 422 is a portion through which a sputtering beam can pass in a sputtering process, for example, is an opening area.
  • the plurality of second transmission portions 422 may be arranged in an array, as shown in FIG. 3 .
  • two adjacent second transmission portions 422 may have a pitch or interval between 100 micrometers and 500 micrometers.
  • a gap between the first mask 41 and the second mask 42 may be kept. The gap may for example be in a range from 1 millimeter to 20 millimeters.
  • the sputtering beam will not pass through the second transmission portion 422 of the second mask 42 straightly, but diffuses to some extent (for example, due to large incident divergence angle of the sputtering beam or the diffraction effects of the second transmission portion 422 to the sputtering beam). More materials will be sputtered at a position within the area of the base substrate 1 directly facing the second transmission portion 422 (for example, the area defined by the orthographic projection of the second transmission portion 422 on the base substrate 1 ), thus a portion of larger thickness of the second electrode layer 4 is formed at the position.
  • the second electrode layer 4 having convex-concave roughened surface may be formed in the region on the base substrate 1 exposed from the transmission portion 411 of the first mask 41 .
  • Embodiments of the present disclosure provide a method for manufacturing the display panel. It may improve luminous efficiency of the display panel. Customarily, surfaces on both sides of an electrode layer (such as ITO layer) in a conventional display panel are planar. When a light beam emitted from a light emitting layer passes through the electrode layer, a part of the light beam may be reflected totally within the electrode layer due to its incident angle greater than the critical angle of total reflection such that the part of the light beam cannot exit from the electrode layer. It may reduce the luminous efficiency of the display device and degrade quality of the display device.
  • an electrode layer such as ITO layer
  • the method for manufacturing the display panel includes: arranging a first mask on a side of a base substrate; arranging a second mask on a side of the first mask facing away from the base substrate and making an orthographic projection of a pattern of the second mask onto the first mask fall within a first transmission portion of the first mask; and by means of sputtering through the second mask, forming the second electrode layer with a roughened surface of the display panel in a region of the base substrate exposed from the first transmission portion of the first mask.
  • the first surface 11 of the second electrode layer 4 is the roughened surface, when the light beam enters the second electrode layer 4 , an incident angle of the light beam onto the first surface 11 can be diversified such that the light beam emitted from the light emitting layer 3 can be transmitted through the second electrode layer 4 to exit. In this way, it can increase luminous efficiency of the display panel to ensure quality of the display device.
  • the method may further include:
  • Step 105 of forming a light emitting layer on the first electrode layer Step 105 of forming a light emitting layer on the first electrode layer
  • Step 106 of forming a second transmission layer on the light emitting layer is Step 106 of forming a second transmission layer on the light emitting layer.
  • the method may further include:
  • a first injection layer such as a hole injection layer
  • a first transport layer such as a hole transport layer
  • the above steps 104 to 107 may be configured to form some structures of a light emitting diode, and are indicated by dashed boxes in FIG. 5 .
  • the step 101 further includes: keeping the first mask in contact with the base substrate (the base substrate 1 may include previously formed layers such as the first electrode layer 2 , the first injection layer 7 , the first transport layer 6 , the light emitting layer 3 or the second transport layer 5 ). If there is a gap between the first mask 41 and the base substrate 1 , part of the materials will be sputtered to the area of the base substrate 1 shielded by the shielding portion 412 of the first mask 41 in the sputtering process, so as to degrade quality of the display panel.
  • the base substrate 1 may include previously formed layers such as the first electrode layer 2 , the first injection layer 7 , the first transport layer 6 , the light emitting layer 3 or the second transport layer 5 . If there is a gap between the first mask 41 and the base substrate 1 , part of the materials will be sputtered to the area of the base substrate 1 shielded by the shielding portion 412 of the first mask 41 in the sputtering process, so as to degrade quality of the display panel.
  • the first mask 41 is kept in contact with the base substrate 1 such that there are no gap between the first mask 41 and the base substrate 1 . In this way, the materials will not be sputtered to the area of the base substrate 1 shielded by the shielding portion 412 of the first mask 41 . It may improve quality of the display panel.
  • the step 102 further includes: keeping a gap between the first mask and the second mask. If there are no gap between the base substrate 1 and the second mask, materials for producing the second electrode layer 4 will not be sputtered to the area of the base substrate 1 facing the second shielding portion 421 . In this way, a complete second electrode layer 4 cannot be formed in the region of the base substrate 1 exposed from the transmission portion 411 of the first mask 41 , and the second electrode layer 4 with the roughened surface will not be formed. In contrast, in the embodiments, the gap between the second mask 42 and the base substrate 1 is kept.
  • the materials for producing the second electrode layer 4 are sputtered to the base substrate 1 through the transmission portion 422 of the second mask 42 , the materials can be sputtered to the area of the base substrate 1 facing the second shielding portion 421 such that the thickness of the materials on the area of the base substrate 1 facing the second shielding portion 421 is less than the thickness of the materials on the area of the base substrate 1 facing the second transmission portion 422 , so as to form the roughened surface.
  • embodiments of the present disclosure also provide a display device including the display panel as described in any of the above embodiments.
  • the display device may also be used to enhance luminous efficiency of the display device. The details will be omitted herein.

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US20210193876A1 (en) 2021-06-24

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