US20180202723A1 - Vapor chamber - Google Patents
Vapor chamber Download PDFInfo
- Publication number
- US20180202723A1 US20180202723A1 US15/699,726 US201715699726A US2018202723A1 US 20180202723 A1 US20180202723 A1 US 20180202723A1 US 201715699726 A US201715699726 A US 201715699726A US 2018202723 A1 US2018202723 A1 US 2018202723A1
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- United States
- Prior art keywords
- vapor chamber
- electronic element
- media layer
- members
- combined
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
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Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K7/00—Constructional details common to different types of electric apparatus
- H05K7/20—Modifications to facilitate cooling, ventilating, or heating
- H05K7/2039—Modifications to facilitate cooling, ventilating, or heating characterised by the heat transfer by conduction from the heat generating element to a dissipating body
- H05K7/20509—Multiple-component heat spreaders; Multi-component heat-conducting support plates; Multi-component non-closed heat-conducting structures
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28D—HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
- F28D15/00—Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies
- F28D15/02—Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies in which the medium condenses and evaporates, e.g. heat pipes
- F28D15/04—Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies in which the medium condenses and evaporates, e.g. heat pipes with tubes having a capillary structure
- F28D15/046—Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies in which the medium condenses and evaporates, e.g. heat pipes with tubes having a capillary structure characterised by the material or the construction of the capillary structure
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/42—Fillings or auxiliary members in containers or encapsulations selected or arranged to facilitate heating or cooling
- H01L23/427—Cooling by change of state, e.g. use of heat pipes
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K7/00—Constructional details common to different types of electric apparatus
- H05K7/20—Modifications to facilitate cooling, ventilating, or heating
- H05K7/2039—Modifications to facilitate cooling, ventilating, or heating characterised by the heat transfer by conduction from the heat generating element to a dissipating body
- H05K7/20518—Unevenly distributed heat load, e.g. different sectors at different temperatures, localised cooling, hot spots
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28D—HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
- F28D15/00—Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies
- F28D15/02—Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies in which the medium condenses and evaporates, e.g. heat pipes
- F28D15/0233—Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies in which the medium condenses and evaporates, e.g. heat pipes the conduits having a particular shape, e.g. non-circular cross-section, annular
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28D—HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
- F28D21/00—Heat-exchange apparatus not covered by any of the groups F28D1/00 - F28D20/00
- F28D2021/0019—Other heat exchangers for particular applications; Heat exchange systems not otherwise provided for
- F28D2021/0028—Other heat exchangers for particular applications; Heat exchange systems not otherwise provided for for cooling heat generating elements, e.g. for cooling electronic components or electric devices
Definitions
- the present invention relates to a vapor chamber, and in particular to a vapor chamber which is connected to an electronic element and that removes heat from the electronic element.
- Conventional vapor chambers are made of copper or copper alloy, and include a heat source contacting side (lower member) and a heat source non-contacting side (upper member).
- the lower member and the upper member have connection surfaces which are combined in a diffusion bonding process to seal the periphery of the vapor chamber.
- the specific gravity of the copper or copper alloy is high ( ⁇ 8.9 g/cm 3 ), and the strength of the copper or copper alloy decreases after a high-temperature process.
- a conventional vapor chamber made of copper or copper alloy therefore is thick, heavy, and low in strength.
- a vapor chamber is provided.
- the vapor chamber is adapted to be thermally connected to an electronic element.
- the vapor chamber includes a first member and a second member.
- the first member has a first heat transfer coefficient.
- the first member is connected to the electronic element.
- the second member has a second heat transfer coefficient.
- the second member is combined with the first member.
- the first member is located between the second member and the electronic element.
- the first heat transfer coefficient is greater than the second heat transfer coefficient.
- the first member is combined with the second member by welding.
- the first member is combined with the second member by laser welding, high-frequency welding, friction welding, or argon arc welding.
- materials of the first and second members are selected from a group consisting of copper, copper alloy, titanium, titanium alloy, aluminum, aluminum alloy, stainless steel, ceramic, graphite and polymeric fiber.
- the flatness of the first member is greater than the flatness of the second member.
- a vapor chamber is provided.
- the vapor chamber is adapted to be thermally connected to an electronic element.
- the vapor chamber includes a first member and a second member.
- the first member has a first electronic shielding coefficient, wherein the first member is connected to the electronic element.
- the second member has a second electronic shielding coefficient, wherein the second member is combined with the first member, the first member is located between the second member and the electronic element, and the second electronic shielding coefficient is greater than the first electronic shielding coefficient.
- the first member is combined with the second member by welding.
- a plurality of capillary structures are formed on an inner surface of the second member, and the capillary structures extend toward the first member.
- the electronic element is disposed on a circuit board
- a holding unit is disposed on the circuit board and abuts and restricts the second member
- the holding unit is made of an electrically conductive material.
- a vapor chamber is provided.
- the vapor chamber is adapted to be thermally connected to an electronic element.
- the vapor chamber includes a first member, a second member and a media layer.
- the first member is connected to the electronic element.
- the second member is combined with the first member.
- the media layer is sandwiched between the first and second members, wherein the melting point of the first member and that of the second member are greater than that of the media layer.
- the hardness of the first member and that of the second member are greater than that of the media layer.
- the strength of the first member and that of the second member are greater than that of the media layer.
- the media layer is formed between the first and second members by plating or sputtering.
- the media layer is formed between the first and second members by hot pressing.
- the media layer has no adhesion in room temperature.
- the melting point of the first member and that of the second member are greater than 500° C.
- the wall thickness of the first member and that of the second member are less than 0.2 mm.
- materials of the first and second members are selected from a group consisting of copper, copper alloy, titanium, titanium alloy, aluminum, aluminum alloy, stainless steel, ceramic, graphite and polymeric fiber.
- the material of the media layer is selected from a group consisting of copper, copper alloy, titanium, titanium alloy, aluminum, aluminum alloy and stainless steel.
- the vapor chamber further comprises a porous material, and the porous material is disposed in a chamber formed by the first and second members.
- the vapor chamber of the embodiment of the invention has advantages such as being thin and lightweight and having high strength and high heat-dissipation efficiency.
- FIG. 1 is an exploded view of a vapor chamber of an embodiment of the invention
- FIG. 2 shows the assembled vapor chamber of the embodiment of FIG. 1 ;
- FIG. 3 shows a vapor chamber of another embodiment of the invention
- FIG. 4A is an exploded view of a vapor chamber of another embodiment of the invention.
- FIG. 4B shows the assembled vapor chamber of the embodiment of FIG. 4A .
- FIGS. 1 and 2 show a vapor chamber P of an embodiment of the invention.
- the vapor chamber P is adapted to be thermally connected to an electronic element E.
- the vapor chamber P includes a first member 1 and a second member 2 .
- the first member 1 has a first heat transfer coefficient.
- the first member 1 is connected to the electronic element E.
- the second member 2 has a second heat transfer coefficient.
- the second member 2 is combined with the first member 1 .
- the first member 1 is located between the second member 2 and the electronic element E.
- the first heat transfer coefficient is greater than the second heat transfer coefficient.
- the first member 1 provides a heat dissipation function with the first heat transfer coefficient (the higher heat transfer coefficient).
- the second member 2 has a decreased surface temperature, and is prevented from scalding the user.
- the first strength of the first member 1 is greater than the second strength of the second member 2 .
- the first member 1 provides a support function with the first strength (the higher strength).
- the first member 1 is combined with the second member 2 by welding.
- the first member 1 is combined with the second member 2 by laser welding, high-frequency welding, friction welding, or argon arc welding.
- materials of the first and second members 1 , 2 are selected from a group consisting of copper, copper alloy, titanium, titanium alloy, aluminum, aluminum alloy, stainless steel, ceramic, graphite and polymeric fiber.
- the flatness of the first member 1 is greater than that of the second member 2 . Therefore, the first member 1 can come into sufficiently close contact with the electronic element E to transmit heat.
- the second member 2 provides a heat dissipation function that is much improved due to the uneven surface.
- a vapor chamber P is provided.
- the vapor chamber P is adapted to be thermally connected to an electronic element E.
- the vapor chamber P is comprised by a first member 1 and a second member 2 .
- the first member 1 has a first electronic shielding coefficient, wherein the first member 1 is connected to the electronic element E.
- the second member 2 has a second electronic shielding coefficient.
- the second member 2 is combined with the first member 1 .
- the first member 1 is located between the second member 2 and the electronic element E.
- the second electronic shielding coefficient is greater than the first electronic shielding coefficient.
- the first member 1 is combined with the second member 2 by welding.
- the materials of the first member 1 and the second member 2 are selected from a group consisting of copper, copper alloy, titanium, titanium alloy, aluminum, aluminum alloy, stainless steel, ceramic, graphite and polymeric fiber.
- the first member 1 has a first heat transfer coefficient
- the second member 1 has a second heat transfer coefficient.
- the first heat transfer coefficient is greater than the second heat transfer coefficient.
- the first member 1 provides a heat dissipation function with the first heat transfer coefficient (the higher heat transfer coefficient).
- the second member 2 provides an electronic shielding function with the second electronic shielding coefficient (the higher electronic shielding coefficient). Similar to the first embodiment, the flatness of the first member 1 is greater than that of the second member 2 . Therefore, the first member 1 can come into sufficiently close contact with the electronic element E to transmit heat.
- the second member 2 provides better heat dissipation than the uneven surface.
- a surface processing is applied to the surface of the vapor chamber P to increase the heat dissipation area and the heat dissipation efficiency.
- a plurality of capillary structures 21 are formed on an inner surface of the second member 2 , and the capillary structures 21 extend toward the first member 1 .
- the fluid inside the vapor chamber P exchanges heat with the capillary structures 21 to improve the heat dissipation efficiency.
- the electronic element E is disposed on a circuit board C.
- a holding unit H is disposed on the circuit board C and abuts and restricts the second member 2 .
- the holding unit H is made of an electrically conductive material.
- the holding unit H is grounded to provide an improved electronic shielding function.
- the vapor chamber P further comprises a porous material 4 , and the porous material 4 is disposed in a chamber formed by the first and second members 1 , 2 .
- the porous material 4 can be fiber or metal net.
- a vapor chamber P is provided.
- the vapor chamber P is adapted to be thermally connected to an electronic element E.
- the vapor chamber P includes a first member 1 , a second member 2 and a media layer 3 .
- the first member 1 is connected to the electronic element E.
- the second member 2 is combined with the first member 1 .
- the media layer 3 is sandwiched between the first and second members 1 , 2 , wherein the melting point of the first member 1 and that of the second member 2 are greater than that of the media layer 3 .
- the hardness of the first member 1 and that of the second member 2 are greater than that of the media layer 3 .
- the media layer 3 is formed between the first and second members 1 , 2 by plating or sputtering. In one embodiment, the media layer 3 can also be formed between the first and second members 1 , 2 by hot pressing.
- the media layer 3 has no adhesion in room temperature.
- the melting point of the first member 1 and the that of the second member 2 are greater than 500° C.
- the melting point of the media layer 3 is greater than the operation temperature of the vapor chamber, but less than the melting point of the first member 1 and that of the second member 2 .
- the wall thickness of the first member 1 and that of the second member 2 are less than 0.2 mm.
- the material of the media layer 3 is selected from a group consisting of copper, copper alloy, titanium, titanium alloy, aluminum, aluminum alloy and stainless steel.
- the media layer 3 is preformed between the first and second members 1 , 2 by plating or sputtering to perform diffusion bonding between the first and second members, which are made of the same material or two different materials, and to seal the periphery of the vapor chamber.
- the vapor chamber of the embodiment of the invention has the advantages of being thin and lightweight, and having high strength and high heat dissipation efficiency.
- the vapor chamber P further comprises a porous material 4 , and the porous material 4 is disposed in a chamber formed by the first and second members 1 , 2 .
- the porous material 4 can be fiber or metal net.
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- Thermal Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Sustainable Development (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
- Manufacture Of Alloys Or Alloy Compounds (AREA)
- Cooling Or The Like Of Electrical Apparatus (AREA)
- Laminated Bodies (AREA)
Abstract
Description
- This Application claims priority of China Patent Application No. 201710037900.7, filed on Jan. 18, 2017, the entirety of which is incorporated by reference herein.
- The present invention relates to a vapor chamber, and in particular to a vapor chamber which is connected to an electronic element and that removes heat from the electronic element.
- Conventional vapor chambers are made of copper or copper alloy, and include a heat source contacting side (lower member) and a heat source non-contacting side (upper member). The lower member and the upper member have connection surfaces which are combined in a diffusion bonding process to seal the periphery of the vapor chamber. However, the specific gravity of the copper or copper alloy is high (˜8.9 g/cm3), and the strength of the copper or copper alloy decreases after a high-temperature process. A conventional vapor chamber made of copper or copper alloy therefore is thick, heavy, and low in strength.
- In one embodiment, a vapor chamber is provided. The vapor chamber is adapted to be thermally connected to an electronic element. The vapor chamber includes a first member and a second member. The first member has a first heat transfer coefficient. The first member is connected to the electronic element. The second member has a second heat transfer coefficient. The second member is combined with the first member. The first member is located between the second member and the electronic element. The first heat transfer coefficient is greater than the second heat transfer coefficient.
- In one embodiment, the first member is combined with the second member by welding.
- In one embodiment, the first member is combined with the second member by laser welding, high-frequency welding, friction welding, or argon arc welding.
- In one embodiment, materials of the first and second members are selected from a group consisting of copper, copper alloy, titanium, titanium alloy, aluminum, aluminum alloy, stainless steel, ceramic, graphite and polymeric fiber.
- In one embodiment, the flatness of the first member is greater than the flatness of the second member.
- In one embodiment, a vapor chamber is provided. The vapor chamber is adapted to be thermally connected to an electronic element. The vapor chamber includes a first member and a second member. The first member has a first electronic shielding coefficient, wherein the first member is connected to the electronic element. The second member has a second electronic shielding coefficient, wherein the second member is combined with the first member, the first member is located between the second member and the electronic element, and the second electronic shielding coefficient is greater than the first electronic shielding coefficient.
- In one embodiment, the first member is combined with the second member by welding.
- In one embodiment, a plurality of capillary structures are formed on an inner surface of the second member, and the capillary structures extend toward the first member.
- In one embodiment, the electronic element is disposed on a circuit board, a holding unit is disposed on the circuit board and abuts and restricts the second member, and the holding unit is made of an electrically conductive material.
- In one embodiment, a vapor chamber is provided. The vapor chamber is adapted to be thermally connected to an electronic element. The vapor chamber includes a first member, a second member and a media layer. The first member is connected to the electronic element. The second member is combined with the first member. The media layer is sandwiched between the first and second members, wherein the melting point of the first member and that of the second member are greater than that of the media layer.
- In one embodiment, the hardness of the first member and that of the second member are greater than that of the media layer.
- In one embodiment, the strength of the first member and that of the second member are greater than that of the media layer.
- In one embodiment, the media layer is formed between the first and second members by plating or sputtering.
- In one embodiment, the media layer is formed between the first and second members by hot pressing.
- In one embodiment, the media layer has no adhesion in room temperature.
- In one embodiment, the melting point of the first member and that of the second member are greater than 500° C.
- In one embodiment, the wall thickness of the first member and that of the second member are less than 0.2 mm.
- In one embodiment, materials of the first and second members are selected from a group consisting of copper, copper alloy, titanium, titanium alloy, aluminum, aluminum alloy, stainless steel, ceramic, graphite and polymeric fiber.
- In one embodiment, the material of the media layer is selected from a group consisting of copper, copper alloy, titanium, titanium alloy, aluminum, aluminum alloy and stainless steel.
- In one embodiment, the vapor chamber further comprises a porous material, and the porous material is disposed in a chamber formed by the first and second members.
- The vapor chamber of the embodiment of the invention has advantages such as being thin and lightweight and having high strength and high heat-dissipation efficiency.
- A detailed description is given in the following embodiments with reference to the accompanying drawings.
- The present invention can be more fully understood by reading the subsequent detailed description and examples with references made to the accompanying drawings, wherein:
-
FIG. 1 is an exploded view of a vapor chamber of an embodiment of the invention; -
FIG. 2 shows the assembled vapor chamber of the embodiment ofFIG. 1 ; -
FIG. 3 shows a vapor chamber of another embodiment of the invention; -
FIG. 4A is an exploded view of a vapor chamber of another embodiment of the invention; and -
FIG. 4B shows the assembled vapor chamber of the embodiment ofFIG. 4A . - The following description is of the best-contemplated mode of carrying out the invention. This description is made for the purpose of illustrating the general principles of the invention and should not be taken in a limiting sense. The scope of the invention is best determined by reference to the appended claims.
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FIGS. 1 and 2 show a vapor chamber P of an embodiment of the invention. The vapor chamber P is adapted to be thermally connected to an electronic element E. In this embodiment, the vapor chamber P includes afirst member 1 and asecond member 2. Thefirst member 1 has a first heat transfer coefficient. Thefirst member 1 is connected to the electronic element E. Thesecond member 2 has a second heat transfer coefficient. Thesecond member 2 is combined with thefirst member 1. Thefirst member 1 is located between thesecond member 2 and the electronic element E. The first heat transfer coefficient is greater than the second heat transfer coefficient. Thefirst member 1 provides a heat dissipation function with the first heat transfer coefficient (the higher heat transfer coefficient). Thesecond member 2 has a decreased surface temperature, and is prevented from scalding the user. - In one embodiment, the first strength of the
first member 1 is greater than the second strength of thesecond member 2. Thefirst member 1 provides a support function with the first strength (the higher strength). - With reference to
FIGS. 1 and 2 , in one embodiment, thefirst member 1 is combined with thesecond member 2 by welding. For example, thefirst member 1 is combined with thesecond member 2 by laser welding, high-frequency welding, friction welding, or argon arc welding. In one embodiment, materials of the first andsecond members - In one embodiment, the flatness of the
first member 1 is greater than that of thesecond member 2. Therefore, thefirst member 1 can come into sufficiently close contact with the electronic element E to transmit heat. Thesecond member 2 provides a heat dissipation function that is much improved due to the uneven surface. - With reference to
FIGS. 1 and 3 , in a second embodiment, a vapor chamber P is provided. The vapor chamber P is adapted to be thermally connected to an electronic element E. The vapor chamber P is comprised by afirst member 1 and asecond member 2. Thefirst member 1 has a first electronic shielding coefficient, wherein thefirst member 1 is connected to the electronic element E. Thesecond member 2 has a second electronic shielding coefficient. Thesecond member 2 is combined with thefirst member 1. Thefirst member 1 is located between thesecond member 2 and the electronic element E. The second electronic shielding coefficient is greater than the first electronic shielding coefficient. Similar to the first embodiment, thefirst member 1 is combined with thesecond member 2 by welding. The materials of thefirst member 1 and thesecond member 2 are selected from a group consisting of copper, copper alloy, titanium, titanium alloy, aluminum, aluminum alloy, stainless steel, ceramic, graphite and polymeric fiber. - In the second embodiment, the
first member 1 has a first heat transfer coefficient, and thesecond member 1 has a second heat transfer coefficient. The first heat transfer coefficient is greater than the second heat transfer coefficient. Thefirst member 1 provides a heat dissipation function with the first heat transfer coefficient (the higher heat transfer coefficient). Thesecond member 2 provides an electronic shielding function with the second electronic shielding coefficient (the higher electronic shielding coefficient). Similar to the first embodiment, the flatness of thefirst member 1 is greater than that of thesecond member 2. Therefore, thefirst member 1 can come into sufficiently close contact with the electronic element E to transmit heat. Thesecond member 2 provides better heat dissipation than the uneven surface. In a modified example, a surface processing is applied to the surface of the vapor chamber P to increase the heat dissipation area and the heat dissipation efficiency. - With reference to
FIGS. 1 and 3 , in one embodiment, a plurality ofcapillary structures 21 are formed on an inner surface of thesecond member 2, and thecapillary structures 21 extend toward thefirst member 1. The fluid inside the vapor chamber P exchanges heat with thecapillary structures 21 to improve the heat dissipation efficiency. - With reference to
FIG. 3 , in one embodiment, the electronic element E is disposed on a circuit board C. A holding unit H is disposed on the circuit board C and abuts and restricts thesecond member 2. The holding unit H is made of an electrically conductive material. In one embodiment, the holding unit H is grounded to provide an improved electronic shielding function. - With reference to
FIG. 1 , in one embodiment, the vapor chamber P further comprises aporous material 4, and theporous material 4 is disposed in a chamber formed by the first andsecond members porous material 4 can be fiber or metal net. - With reference to
FIGS. 4A and 4B , in a third embodiment, a vapor chamber P is provided. The vapor chamber P is adapted to be thermally connected to an electronic element E. The vapor chamber P includes afirst member 1, asecond member 2 and amedia layer 3. Thefirst member 1 is connected to the electronic element E. Thesecond member 2 is combined with thefirst member 1. Themedia layer 3 is sandwiched between the first andsecond members first member 1 and that of thesecond member 2 are greater than that of themedia layer 3. - In one embodiment, the hardness of the
first member 1 and that of thesecond member 2 are greater than that of themedia layer 3. Themedia layer 3 is formed between the first andsecond members media layer 3 can also be formed between the first andsecond members - In one embodiment, the
media layer 3 has no adhesion in room temperature. The melting point of thefirst member 1 and the that of thesecond member 2 are greater than 500° C. The melting point of themedia layer 3 is greater than the operation temperature of the vapor chamber, but less than the melting point of thefirst member 1 and that of thesecond member 2. In one embodiment, the wall thickness of thefirst member 1 and that of thesecond member 2 are less than 0.2 mm. - In one embodiment, the material of the
media layer 3 is selected from a group consisting of copper, copper alloy, titanium, titanium alloy, aluminum, aluminum alloy and stainless steel. In the third embodiment, themedia layer 3 is preformed between the first andsecond members - With reference to
FIGS. 4A and 4B , in one embodiment, the vapor chamber P further comprises aporous material 4, and theporous material 4 is disposed in a chamber formed by the first andsecond members porous material 4 can be fiber or metal net. - Use of ordinal terms such as “first”, “second” “third”, etc., in the claims to modify a claim element does not by itself connote any priority, precedence, or order of one claim element over another or the temporal order in which acts of a method are performed, but are used merely as labels to distinguish one claim element having a certain name from another element having the same name (but for use of the ordinal term).
- While the invention has been described by way of example and in terms of the preferred embodiments, it should be understood that the invention is not limited to the disclosed embodiments. On the contrary, it is intended to cover various modifications and similar arrangements (as would be apparent to those skilled in the an). Therefore, the scope of the appended claims should be accorded the broadest interpretation so as to encompass all such modifications and similar arrangements.
Claims (20)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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US17/111,077 US20210088289A1 (en) | 2017-01-18 | 2020-12-03 | Vapor chamber |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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CN201710037900.7 | 2017-01-18 | ||
CN201710037900.7A CN108323137A (en) | 2017-01-18 | 2017-01-18 | Soaking plate |
Related Child Applications (1)
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US17/111,077 Continuation US20210088289A1 (en) | 2017-01-18 | 2020-12-03 | Vapor chamber |
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US20180202723A1 true US20180202723A1 (en) | 2018-07-19 |
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US15/699,726 Abandoned US20180202723A1 (en) | 2017-01-18 | 2017-09-08 | Vapor chamber |
US17/111,077 Pending US20210088289A1 (en) | 2017-01-18 | 2020-12-03 | Vapor chamber |
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US17/111,077 Pending US20210088289A1 (en) | 2017-01-18 | 2020-12-03 | Vapor chamber |
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WO2020068224A1 (en) * | 2018-09-28 | 2020-04-02 | Microsoft Technology Licensing, Llc | Two-phase thermodynamic system having a porous microstructure sheet to increase an aggregate thin-film evaporation area of a working fluid |
US10935325B2 (en) | 2018-09-28 | 2021-03-02 | Microsoft Technology Licensing, Llc | Two-phase thermodynamic system having a porous microstructure sheet with varying surface energy to optimize utilization of a working fluid |
WO2022050686A1 (en) * | 2020-09-02 | 2022-03-10 | 삼성전자 주식회사 | Heat dissipation structure and electronic device comprising same |
US20230251044A1 (en) * | 2019-06-18 | 2023-08-10 | Cooler Master Co., Ltd. | Method for fabricating vapor chamber |
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Also Published As
Publication number | Publication date |
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US20210088289A1 (en) | 2021-03-25 |
CN114760824A (en) | 2022-07-15 |
CN108323137A (en) | 2018-07-24 |
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