US20150190850A1 - System for cleaning photomasks - Google Patents
System for cleaning photomasks Download PDFInfo
- Publication number
- US20150190850A1 US20150190850A1 US14/664,818 US201514664818A US2015190850A1 US 20150190850 A1 US20150190850 A1 US 20150190850A1 US 201514664818 A US201514664818 A US 201514664818A US 2015190850 A1 US2015190850 A1 US 2015190850A1
- Authority
- US
- United States
- Prior art keywords
- photomask
- oblique
- unit
- recited
- scrubbing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools, brushes, or analogous members
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
Abstract
A system for cleaning a photomask with a target surface includes a retaining device for retaining the photomask, a cleansing device, an elevating platform and a drying device. The cleansing device has a fluid dispensing unit and a scrubbing unit. The scrubbing unit having a saturated scrubbing surface is used to clean photomasks with the obliquely dispensed fluids. In such a fashion, loosened contaminants are removed. At least one oblique surface is formed on the peripheries of the scrubbing surface to form a channeling region such that fluids can instantly flow away from photomasks after cleaning to prevent re-contamination.
Description
- This application is a Divisional patent application of co-pending application Ser. No. 13/762,499, filed on Feb. 8, 2013, now pending. The entire disclosure of the prior application Ser. No. 13/762,499, from which an oath or declaration is supplied, is considered a part of the disclosure of the accompanying Divisional application and is hereby incorporated by reference.
- 1. Field of the Invention
- The instant disclosure relates to a photomask cleaning system; in particular, to a photomask cleaning system that cleans photomasks through rinsing and wiping.
- 2. Description of Related Art
- IC chip is composed of highly precise integrated circuits, in which the manufacturing process requires the use of high precision machines on silicon wafer for high precision lamination in a clean room environment. The manufacturing cost for the associated machine and fabrication plant is high. Thus, in silicon wafer manufacturing process, product yield rate can determine if a semiconductor factory profits or not. Therefore, improving product yield is the one of the most important factor in the minds of every semiconductor factory owner.
- One of the major factors that affects yield rate of wafers is the cleanliness of the photomask. If contaminated photomasks are used to produce semiconductors during photolithography process, corresponding defects can develop on the wafer. In order to keep the photomask clean, photomasks are usually setup with a photomask protective film (Pellicle) to prevent dust particles from attaching to the mask. Since the photomask protective film is kept a certain distance away from the photomask through a frame structure, dust particles may collect on the photomask protective film such that focusing issues during development can be prevented.
- It is a common practice that, prior to photomask shipment or micro-film processing, a scan is conducted to confirm that the pattern on the photomask is accurate. If flaws are identified, they must be removed or the photomask protective film must be scrapped off the photomask, and then immersed into an acid bath for cleaning. For cleaning solutions, sulfuric acid along with hydrogen peroxide solution (H2SO4/H2O2, SPM), and the aqueous solution of ammonium hydroxide along with hydrogen peroxide (SCL) solution are commonly used. Sulfuric acid and hydrogen peroxide solution are used to remove large organic molecules while ammonium hydroxide and hydrogen peroxide aqueous solution are used to remove small organic molecules and particles. Successively, deionized water (DI water) is used to remove residual cleaning solution to complete the cleaning process. Thereafter, a new photomask protective film is disposed onto the photomask. However, the photomask protective film is quite expensive, thus scraping sheets of protective films will significantly increase the costs of photomasks application. Furthermore, the adhesive on the common photomask protective film is generally composed of ester structure (RCOOR) x such as poly-acrylic ester structure. Thus, when photomasks are immersed into a bath of sulfuric acid and hydrogen peroxide solution, (RCOOR) x will hydrolyze into a colloidal state of (RCOOH) x which may cause defects on the photomask pattern and lead to scrapping. In fact, each photomask can only be used to clean three times before scrapping while the price of photomasks can be as high as hundreds of thousands of dollars up to 2 million dollars, and rendering the cost of photomask application high.
- To improve upon from the conventional method, one possible method to improve photomask cleanliness is to clamp and move the photomask towards cleaning and drying equipment for cleaning and drying.
- To address the above issues, the inventor strives via associated experience and research to present the instant disclosure, which can effectively improve the limitation described above.
- The instant disclosure provides a system for cleaning photomasks which allows the cleaning liquid to effectively and quickly divert away from photomasks and prevent re-contamination from backwashed fluids.
- Specifically, the instant disclosure provides a photomask cleaning system. The photomask includes a target surface to be cleaned. The photomask cleaning system comprises a retaining device for retaining the photomask, a cleansing device, an elevating platform, and a drying device. The cleansing device is arranged towards the target surface and includes a fluid dispensing unit, a scrubbing unit, a cover, a fixing unit and a stage. The fluid dispensing unit includes a direct dispenser and at least one oblique dispenser disposed proximate to the fluid dispensing unit and obliquely dispenses fluid onto the target surface for cleaning. The cover is disposed on the peripheries of the direct dispenser in order to secure the scrubbing unit thereon. The fixing unit secures the cover onto the fluid dispensing unit. The stage includes at least one fluid supplying conduit and a retaining plate. One end of the fluid supplying conduit pipe is connected to the retaining plate while the retaining plate is disposed on a side of the fluid dispensing unit opposite to the photomask. The aforementioned elevating platform is disposed on a side of the cleansing device opposite of the photomask for adjusting the corresponding positioning of the cleansing device and photomask. The drying device is arranged towards the target surface and proximate to the cleansing device. The instant disclosure obliquely dispenses fluid onto the area which requires scrubbing for facilitating water flow to divert away loosened contaminants.
- In order to further understand the instant disclosure, the following embodiments and illustrations are provided. However, the detailed description and drawings are merely illustrative of the disclosure, rather than limiting the scope being defined by the appended claims and equivalents thereof.
-
FIG. 1 is a schematic diagram of the photomask cleaning system according to the instant disclosure; -
FIG. 2 is a schematic diagram of the photomask cleaning system illustrating the cleansing device according to the instant disclosure; -
FIG. 3 is a schematic diagram of the assembled photomask cleaning system illustrating the cleansing device according to the instant disclosure; -
FIG. 4 is an exploded view of the photomask cleaning system illustrating the cleansing device according to the instant disclosure; -
FIG. 5 is a cross-sectional view of the photomask cleaning system illustrating the cleansing device according to the instant disclosure; -
FIG. 6 is a schematic diagram of the photomask cleaning system illustrating the assembled fixing unit according to the instant disclosure; -
FIG. 7 is a schematic diagram of the photomask cleaning system illustrating the stage and the guiding base according to the instant disclosure; -
FIG. 8 is a flow chart of the photomask cleaning method according to the instant disclosure. - Referring to
FIGS. 1 and 2 as the schematic diagram of a cleaning system and a cleansing device thereof, respectively, in accordance to the instant disclosure. The instant disclosure provides aphotomask cleaning system 1 for cleaning aphotomask 9 which includes aretaining device 10, acleansing device 20, an elevating platform, adrying device 40, aprocessing unit 50, and asensor element 60. Thephotomask 9 includes atarget surface 91 which may contain buildups of contaminants such as chemical residue, particles, dust, atomized particles or the like. Theretaining device 10 retains thephotomask 9 such that thetarget surface 91 faces towards thecleansing device 20 and thedrying device 40. Theelevating platform 30 is arranged on a side of thecleansing device 20 which is opposite from thephotomask 9 such that thesensor element 60 can sense the corresponding positioning of thecleansing device 20 andphotomask 9, and transfer the positioning data to theprocessing unit 50 for assessment. As a result, theprocessing unit 50 controls the height of theelevating platform 30 by determining and adjusting the corresponding positioning of thecleansing device 20 and thephotomask 9. - As illustrated in the instant embodiment according to
FIGS. 1 and 2 , thephotomask 9 of thephotomask cleaning system 1 is disposed in a receiving area A and retained by theretaining device 10. Theretaining device 10 then positions thephotomask 9 to a rinsing area B, and arranges thetarget surface 91 towards thecleansing device 20 which is located in the rinsing area B. Height of thecleansing device 20 is adjusted through theelevating platform 30 such that thecleansing device 20 and thephotomask 9 are mutually abutted. Once the cleaning is complete, thephotomask 9 is positioned to a drying area C containing the dryingdevice 40 and arranged to face the dryingdevice 40 for drying thetarget surface 91. Thereafter, positioning and depositing thephotomask 9 back to the receiving area A. - Referring to
FIG. 3 is the assembled schematic diagram of the cleaning system. The cleansingdevice 20 includes astage 25, afluid dispensing unit 21 disposed above thestage 25, a guidingbase 26 disposed between thefluid dispensing unit 21 and thestage 25, a scrubbingunit 22 disposed above thefluid dispensing unit 21, acover 23 which secures the scrubbingunit 22 onto thefluid dispensing unit 21, and a fixingunit 24 which couples thecover 23 and thefluid dispensing unit 21. - As illustrated in
FIG. 2 , when cleaning thephotomask 9, thephotomask 9 is retained above the cleansingdevice 20 while thetarget surface 91 faces thecleansing device 20 to facilitate loosening contaminants on thephotomask 9 and allowing water flow to remove contaminants. The water flow aforementioned is not limited to water, as cleaning fluids for cleaningphotomask 9 may also be applied. - As shown in
FIG. 3 , the guidingbase 26 is disposed on a side of the retainingplate 251 which is opposite to a plurality offluid supplying conduits 252. As shown inFIG. 7 , thestage 25 has a retainingplate 251 which is formed with adrain trough 2511 and adrain hole 2512. As illustrated inFIGS. 4 and 7 , the guidingbase 26 includes a plurality of guidingchannels 261 which are arranged in parallel with predetermined intervals therebetween, and correspondingly arranged withfluid conduit 252 such that fluids can supply therethrough. The guidingbase 26 includes anoblique surface 262 slanted from the center down towards the retaining plate 251 (as shown inFIG. 5 ) such that fluids (water or cleaning fluids) flow towards the retainingplate 251. The guidingbase 26 provides a predetermined distance between thefluid dispensing unit 21 and the retainingplate 251 which prevents thefluid dispensing unit 21 from being flooded with dispensed fluids, and fluids from post-cleaning process, thereby preventing contaminants from backwashing and re-contaminating thephotomask 9. - Moreover, a cross-sectional view of the
cleansing device 20 is illustrated inFIG. 5 . Thefluid dispensing unit 21 includes twooblique dispensers 211 arranged on two sides thereof, adirect dispenser 212 arranged between the twooblique dispensers 211, and tworidges 213. Theoblique dispensers 211 anddirect dispenser 212 are arranged correspondingly with the guidingchannels 261. Tworidges 213 are separately arranged on a side of theoblique dispensers 211 facing thedirect dispenser 212. In other words, tworidges 213 are disposed on two sides of thedirect dispenser 212. The quantity of theoblique dispensers 211 and thedirect dispenser 212 are not limited to the examples of the embodiment provided therein. Moreover, the scrubbingunit 22 is disposed on thedirect dispenser 212. The scrubbingunit 22 includes ascrubbing sheet 222 and aresilient member 221 which is disposed between the scrubbingsheet 222 and thedirect dispenser 212. Through the soft and compressible properties of theresilient member 221, the scrubbingsheet 222 can softly scrubs thephotomask 9, and prevent damages onphotomask 9 cause by harsh scrubbing. - The
direct dispenser 212 can be selected from a fluid dispensing nozzle or a plurality of dispensing openings but not limited thereto. Thedirect dispenser 212 directly dispenses fluids from a top surface thereof in the general direction of thephotomask 9. The top surface of thedirect dispenser 212 is capped by the scrubbingunit 22 to allow fluids dispensed from thedirect dispenser 212 to completely saturate thescrubbing unit 22 in the duration of the cleaning process, as saturated scrubbingunit 22 is less prone to leave scratches on photomasks compared tounsaturated scrubbing unit 22. Thedirect dispenser 212 is disposed closer to thephotomask 9 compared to theoblique dispensers 211 so as to prevent theoblique dispensers 211 to make contact with and form scratches on thephotomask 9 during cleaning. The scrubbingunit 22 further includes in this embodiment ascrubbing surface 2221 which is defined as the portion making contact with thetarget surface 91. - The
oblique dispensers 211 dispense fluids in an oblique direction towards thephotomask 9 such that fluids are obliquely dispensed into a contact region between the scrubbingunit 22 and thephotomask 9, and towards the peripheries of thescrubbing surface 2221. When fluid flow is obliquely dispensed onto thephotomask 9, fluids can permeate between particles and thephotomask 9, thereby separating particles from thephotomask 9 and facilitating particle removal by fluid flow. With the configuration of the scrubbingunit 22 andoblique dispensers 211, particles are loosened by the scrubbingunit 22 and removed by the obliquely dispensed fluid flow. Theoblique dispensers 211 can be selected from a fluid dispensing nozzle or a plurality of dispensing openings but not limited thereto. - As illustrated in
FIGS. 3 and 5 , thecover 23 is disposed on thedirect dispenser 212 configured to allow exposure thereof. A portion of the scrubbingunit 22 is disposed between thefluid dispensing unit 21 and thecover 23 and substantially caps thedirect dispenser 212. Thecover 23 includes anoblique surface 232 formed thereon which slants towards the retainingplate 251 for fluids to flow therein. In other words, theoblique surface 232 is disposed proximate to the peripheries of thescrubbing surface 2221. Theoblique surface 232 is configured to form a channelingregion 234 to facilitate fluids after cleaning thephotomask 9 to smoothly flow through the channelingregion 234, theoblique surface 232, and into the retainingplate 251. Thecover 23 is disposed proximate to theoblique dispensers 211 with a predetermined distance therebetween to facilitate draining. As shown inFIG. 4 , thecover 23 further includes a fixingarm 233 extending along two ends thereof. The fixingarm 233 includes aslot 2332 and alip 2331 formed on an end of the fixingarm 233 and is arranged parallel to the retainingplate 251. - Referring to
FIG. 5 , thecover 23 further includes twogrooves 231 correspondingly conform to the tworidges 213 for securing portions of thescrubbing sheet 222 therebetween and thescrubbing sheet 222 on the direct dispenser 12. When thescrubbing sheet 222 is due for replacement, thecover 23 can be lifted for immediate replacement. - Referring to
FIG. 4 andFIG. 6 , the fixingunit 24 includes abase 243, a clippingmember 242, aframe 241, a firstelastic member 244 and a secondelastic member 245. Theframe 241 is disposed around thedirect dispenser 212 between thecover 23 and thefluid dispensing unit 21, includes ahandle 2411 formed on two ends thereof, and glides through theslot 2332. The secondelastic member 245 is disposed between theframe 241 and thecover 23 while being in a compression state. - The
base 243 is disposed on two ends of thefluid dispensing unit 21, and the clippingmember 242 is pivotally coupled to thebase 243. The firstelastic member 244 is disposed between the base 243 and the clippingmember 242. The firstelastic member 244 abuts the base 243 at one end while abutting the clippingmember 242 at the other end thereof. Moreover, the clippingmember 242 includes ashoulder 2421 which abuts thelip 2331 of the fixingarm 233. Since the second elastic member 45 is compressed between thecover 23 and theframe 241, the secondelastic member 245 provides an upward force against thecover 23. Due to the compression state of the firstelastic member 244, a reaction and opposing force therefrom is applied onto theshoulder 2421 of the clippingmember 242, thus rendering theshoulder 2421 to maintain the abutment between theshoulder 2421 and thelip 2331, and thereby securing thecover 23 to thefluid dispensing unit 21 while allowing thecover 23 to be released for facilitating the replacement of the scrubbingunit 22 when a force is applied on a top portion of theshoulder 2421. - As illustrated in
FIG. 8 , a flow chart of the method for thephotomask cleaning system 1 is provided, and the description as follow. - Initially, provide the
cleansing device 20 having the scrubbingunit 22 which includes theresilient member 212 and thescrubbing sheet 222. Thescrubbing sheet 222 is not limited to the examples of the instant embodiments provided therein (Refer toFIGS. 3 and 4 ). - In regards to securing the scrubbing
unit 22, as aforementioned inFIG. 5 , thecover 23 can be used to secure thescrubbing unit 22. Thecover 23 having a pair of correspondingly conforming concave and convex surface to retain two sides of the scrubbingunit 22 wherein the concave and convex surface retained in the instant embodiment is the scrubbingsheet 222 while not limited thereto (Refer toFIG. 5 ). - A
photomask 9 is retained then mobilized from the receiving area A to the rinsing area B which contains thecleansing device 20 while thetarget surface 91 is arranged towards the cleansing device 20 (Refer toFIGS. 1 and 2 ). As thephotomask 9 and the scrubbingunit 22 approach one another, a pre-pressed state is formed therebetween with a predetermined pressure. The pre-pressed state can be altered by adjusting the positioning of thecleansing device 20 or thephotomask 9. - The partially exposed portion of the scrubbing
unit 22 defined as thescrubbing surface 2221 in the instant embodiment is dampened. Thescrubbing surface 2221 then approaches and cleans the photomask 9 (Refer toFIG. 5 ). - The cleansing
device 20 then dispenses fluids obliquely towards two sides of thescrubbing surface 2221 to remove loosen contaminants so as to establish a non-orthogonal angle between thetarget surface 91 of thephotomask 9 and the obliquely dispensed fluids. - Moreover, the
oblique surface 232 is formed proximate to the peripheries of thescrubbing surface 2221 such that theoblique surface 232 is arranged towards the obliquely dispensed fluids to form a channelingregion 234 for channeling away fluids after cleaning from thephotomask 9 via theoblique surface 232, and thereby preventing contaminants to backwash (Refer toFIG. 5 ). - Furthermore, fluids before and after cleaning are then collected and drained. The cleansing
device 20 in the instant embodiment includes a retainingplate 251 for collecting such fluids. - Successively, the retaining
device 10 mobilizes thephotomask 9 to a drying area C for blow drying (Refer toFIG. 1 ), and subsequently returns thephotomask 9 to the receiving area A (Refer toFIG. 2 ). - In summary, with the configuration of the
oblique dispenser 211 and the scrubbingunit 22, particles on photomasks are obliquely rinsed and removed through fluid flow, thus providing relatively cleaned photomasks. Moreover, with the oblique surfaces 232, 262 of thecover 23 and guidingbase 26, clean or contaminated fluids can be smoothly drained and removed away from thephotomask 9 thereby preventing the photomask from re-contamination. - The figures and descriptions supra set forth illustrated the preferred embodiments of the instant disclosure; however, the characteristics of the instant disclosure are by no means restricted thereto. All changes, alternations, combinations or modifications conveniently considered by those skilled in the art are deemed to be encompassed within the scope of the instant disclosure delineated by the following claims.
Claims (10)
1. A photomask cleaning system for cleaning a photomask having a target surface, comprising:
a retaining device retaining the photomask;
a cleansing device arranged towards the target surface, including:
a fluid dispensing unit having at least one direct dispenser and at least one oblique dispenser arranged on a side thereof configured to obliquely dispense fluid towards the target surface,
a scrubbing unit disposed on the direct dispenser for cleaning the target surface,
a cover disposed on the peripheries of the direct dispenser for securing the scrubbing unit thereon,
a fixing unit securing the cover on the fluid dispensing unit, and
a stage including a retaining plate correspondingly arranged with the fluid dispensing unit and at least one fluid supplying conduit connected to the retaining plate on one side thereof for supplying fluids to the oblique dispenser and the direct dispenser;
an elevating platform arranged on a side of the cleansing device for adjusting a corresponding position of the cleansing device with respect to the photomask; and
a drying device arranged towards the target surface and proximate to the cleansing device.
2. The system as recited in claim 1 , wherein a pair of oblique dispensers is disposed on two sides of the fluid dispensing unit and the direct dispenser is disposed between the pair of oblique dispensers.
3. The system as recited in claim 1 , wherein the direct dispenser is disposed closer to the photomask compared to the oblique dispensers.
4. The system as recited in claim 1 , wherein the fluid dispensing unit further includes a ridge arranged on two sides of the direct dispenser and correspondingly conforms to a groove arranged on the cover.
5. The system as recited in claim 4 , wherein the scrubbing unit is partially bent such that the ridge retains the scrubbing unit inside the groove.
6. The system as recited in claim 1 , wherein the cover is integrally formed with an oblique surface correspondingly arranged with the photomask and slanted towards the retaining plate.
7. The system as recited in claim 1 , wherein the cleansing device further includes a guiding base having a plurality of guiding channels and disposed between the fluid dispensing unit and the retaining plate, the guiding channels are correspondingly arranged with the oblique dispensers and the direct dispenser.
8. The system as recited in claim 7 , wherein the guiding base includes an oblique surface slanted towards the retaining plate.
9. The system as recited in claim 1 , further includes a processing unit for adjusting the position of the elevating platform.
10. The system as recited in claim 9 , further includes a sensor element for determining the position of photomask and scrubbing unit and transferring the positioning data to the processing unit.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14/664,818 US20150190850A1 (en) | 2012-11-19 | 2015-03-21 | System for cleaning photomasks |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW101143121 | 2012-11-19 | ||
TW101143121A TWI452423B (en) | 2012-11-19 | 2012-11-19 | Method and system for cleaning photomask |
US13/762,499 US9517494B2 (en) | 2012-11-19 | 2013-02-08 | Method and system for cleaning photomasks |
US14/664,818 US20150190850A1 (en) | 2012-11-19 | 2015-03-21 | System for cleaning photomasks |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US13/762,499 Division US9517494B2 (en) | 2012-11-19 | 2013-02-08 | Method and system for cleaning photomasks |
Publications (1)
Publication Number | Publication Date |
---|---|
US20150190850A1 true US20150190850A1 (en) | 2015-07-09 |
Family
ID=50726748
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US13/762,499 Active 2034-06-29 US9517494B2 (en) | 2012-11-19 | 2013-02-08 | Method and system for cleaning photomasks |
US14/664,818 Abandoned US20150190850A1 (en) | 2012-11-19 | 2015-03-21 | System for cleaning photomasks |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US13/762,499 Active 2034-06-29 US9517494B2 (en) | 2012-11-19 | 2013-02-08 | Method and system for cleaning photomasks |
Country Status (4)
Country | Link |
---|---|
US (2) | US9517494B2 (en) |
KR (1) | KR101436125B1 (en) |
SG (1) | SG2013028105A (en) |
TW (1) | TWI452423B (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9857680B2 (en) * | 2014-01-14 | 2018-01-02 | Taiwan Semiconductor Manufacturing Company, Ltd. | Cleaning module, cleaning apparatus and method of cleaning photomask |
TWI544973B (en) * | 2015-03-20 | 2016-08-11 | 家登精密工業股份有限公司 | A method for operating a semiconductor container washing machine |
US10416575B2 (en) * | 2016-11-16 | 2019-09-17 | Suss Microtec Photomask Equipment Gmbh & Co. Kg | Apparatus and method for cleaning a partial area of a substrate |
CN114433570B (en) * | 2022-04-06 | 2022-06-21 | 深圳市龙图光电有限公司 | Method and equipment for cleaning foreign matters under mask for semiconductor chip |
Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3892006A (en) * | 1974-09-16 | 1975-07-01 | Michio Yasumoto | Multi-bladed wiper for windshield-wiper assembly |
US4218801A (en) * | 1979-06-28 | 1980-08-26 | Pako Corporation | Film guide for use with film cleaning apparatus |
US5737846A (en) * | 1996-11-22 | 1998-04-14 | Mitsubishi Semiconductor America, Inc. | Lead frame dryer |
US6167583B1 (en) * | 1997-05-15 | 2001-01-02 | Kabushiki Kaisha Toshiba | Double side cleaning apparatus for semiconductor substrate |
US6261377B1 (en) * | 1997-09-24 | 2001-07-17 | Interuniversitair Microelektronica Centrum (Imec) | Method of removing particles and a liquid from a surface of substrate |
US6523210B1 (en) * | 2000-04-05 | 2003-02-25 | Nicholas Andros | Surface charge controlling apparatus for wafer cleaning |
US20040064906A1 (en) * | 2002-10-04 | 2004-04-08 | Jerry Behar | Scrubber and method of using scrubber |
US20040065540A1 (en) * | 2002-06-28 | 2004-04-08 | Novellus Systems, Inc. | Liquid treatment using thin liquid layer |
US20050260090A1 (en) * | 2004-05-21 | 2005-11-24 | Roland Stark | Pumps for fluid dispensers |
US7353560B2 (en) * | 2003-12-18 | 2008-04-08 | Lam Research Corporation | Proximity brush unit apparatus and method |
US8585826B2 (en) * | 2008-11-25 | 2013-11-19 | 3M Innovative Properties Company | Apparatus and method for cleaning flexible webs |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07169732A (en) * | 1993-12-13 | 1995-07-04 | Ebara Corp | Wafer cleaning device |
JPH10260522A (en) * | 1997-03-19 | 1998-09-29 | Toray Ind Inc | Method and device for washing photomask |
US5938860A (en) * | 1997-08-28 | 1999-08-17 | Micron Technology, Inc. | Reticle cleaning without damaging pellicle |
JP3654779B2 (en) * | 1998-01-06 | 2005-06-02 | 東京エレクトロン株式会社 | Substrate cleaning tool and substrate cleaning method |
JP3333733B2 (en) * | 1998-02-20 | 2002-10-15 | 東京エレクトロン株式会社 | Cleaning equipment |
JP3865602B2 (en) * | 2001-06-18 | 2007-01-10 | 大日本スクリーン製造株式会社 | Substrate cleaning device |
KR20060001020A (en) * | 2004-06-30 | 2006-01-06 | 엘지.필립스 엘시디 주식회사 | Cleaning system for photo-mask using liquid crystal display device |
KR20060004308A (en) * | 2004-07-09 | 2006-01-12 | 태화일렉트론(주) | Cleaning equipment and the method for photo mask |
JP2006091667A (en) * | 2004-09-27 | 2006-04-06 | Renesas Technology Corp | Photomask, and method and device for cleaning the same |
TW200809943A (en) * | 2006-08-15 | 2008-02-16 | Gudeng Prec Ind Co Ltd | Cleaning device for photo mask |
CN101497178A (en) * | 2008-02-01 | 2009-08-05 | 鸿富锦精密工业(深圳)有限公司 | Sanding device |
JP5136103B2 (en) * | 2008-02-12 | 2013-02-06 | 東京エレクトロン株式会社 | Cleaning device and method, coating and developing device and method, and storage medium |
-
2012
- 2012-11-19 TW TW101143121A patent/TWI452423B/en active
-
2013
- 2013-02-08 US US13/762,499 patent/US9517494B2/en active Active
- 2013-04-12 SG SG2013028105A patent/SG2013028105A/en unknown
- 2013-04-16 KR KR1020130041688A patent/KR101436125B1/en active IP Right Grant
-
2015
- 2015-03-21 US US14/664,818 patent/US20150190850A1/en not_active Abandoned
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3892006A (en) * | 1974-09-16 | 1975-07-01 | Michio Yasumoto | Multi-bladed wiper for windshield-wiper assembly |
US4218801A (en) * | 1979-06-28 | 1980-08-26 | Pako Corporation | Film guide for use with film cleaning apparatus |
US5737846A (en) * | 1996-11-22 | 1998-04-14 | Mitsubishi Semiconductor America, Inc. | Lead frame dryer |
US6167583B1 (en) * | 1997-05-15 | 2001-01-02 | Kabushiki Kaisha Toshiba | Double side cleaning apparatus for semiconductor substrate |
US6261377B1 (en) * | 1997-09-24 | 2001-07-17 | Interuniversitair Microelektronica Centrum (Imec) | Method of removing particles and a liquid from a surface of substrate |
US6523210B1 (en) * | 2000-04-05 | 2003-02-25 | Nicholas Andros | Surface charge controlling apparatus for wafer cleaning |
US20040065540A1 (en) * | 2002-06-28 | 2004-04-08 | Novellus Systems, Inc. | Liquid treatment using thin liquid layer |
US20040064906A1 (en) * | 2002-10-04 | 2004-04-08 | Jerry Behar | Scrubber and method of using scrubber |
US7353560B2 (en) * | 2003-12-18 | 2008-04-08 | Lam Research Corporation | Proximity brush unit apparatus and method |
US20050260090A1 (en) * | 2004-05-21 | 2005-11-24 | Roland Stark | Pumps for fluid dispensers |
US8585826B2 (en) * | 2008-11-25 | 2013-11-19 | 3M Innovative Properties Company | Apparatus and method for cleaning flexible webs |
Also Published As
Publication number | Publication date |
---|---|
TWI452423B (en) | 2014-09-11 |
SG2013028105A (en) | 2014-06-27 |
TW201421149A (en) | 2014-06-01 |
KR20140064594A (en) | 2014-05-28 |
US9517494B2 (en) | 2016-12-13 |
KR101436125B1 (en) | 2014-09-01 |
US20140137890A1 (en) | 2014-05-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US20150190850A1 (en) | System for cleaning photomasks | |
US10618140B2 (en) | Substrate processing system and substrate processing method | |
KR100335450B1 (en) | A semiconductor device washing apparatus and a method of washing a semiconductor device | |
US7682457B2 (en) | Frontside structure damage protected megasonics clean | |
US6921494B2 (en) | Backside etching in a scrubber | |
JP2009543344A (en) | Post-etch wafer surface cleaning with liquid meniscus | |
US8973199B2 (en) | Photomask cleaning device | |
US9211568B2 (en) | Clean function for semiconductor wafer scrubber | |
US6762135B2 (en) | Method of cleaning a polishing pad conditioner | |
CN105983546A (en) | Wafer cleaning method | |
JP4628623B2 (en) | Method for performing pre-treatment adjustment of a wafer cleaning system | |
CN105080892A (en) | Washing device and method for wafer supporting pieces | |
US20120289128A1 (en) | Chemical mechanical polishing system | |
US20110114125A1 (en) | Method for cleaning a wafer stage | |
CN205289078U (en) | Wafer -cleaning device | |
KR20100052831A (en) | Post-lapping cleaning process and apparatus for semiconductor wafer | |
JP2767165B2 (en) | Wafer cleaning tank | |
CN212461606U (en) | Anti-dripping device | |
KR20230075151A (en) | Restoration apparatus and method of elastic thin membrane for chemical mechanical polishing | |
JPS649618B2 (en) | ||
CN201603713U (en) | Wet cleaner | |
KR20080062920A (en) | Apparatus for cleaning substrate and method for cleaning substrate using fabricating the same | |
KR100633997B1 (en) | Method for cleaning brush of CMP apparatus | |
JP2000315672A (en) | Method and apparatus for cleaning semiconductor substrate | |
JP2022127160A (en) | Article attachment mechanism, substrate processing apparatus, and article attachment method |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: GUDENG PRECISION INDUSTRIAL CO, LTD., TAIWAN Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:PAN, YUNG-CHIN;REEL/FRAME:035224/0101 Effective date: 20150224 |
|
STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |