UA74057C2 - A control circuit of the system for electromagnetic etching-out the coating - Google Patents
A control circuit of the system for electromagnetic etching-out the coating Download PDFInfo
- Publication number
- UA74057C2 UA74057C2 UA2003098789A UA2003098789A UA74057C2 UA 74057 C2 UA74057 C2 UA 74057C2 UA 2003098789 A UA2003098789 A UA 2003098789A UA 2003098789 A UA2003098789 A UA 2003098789A UA 74057 C2 UA74057 C2 UA 74057C2
- Authority
- UA
- Ukraine
- Prior art keywords
- control circuit
- voltage
- circuit according
- aforementioned
- control
- Prior art date
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 13
- 239000011248 coating agent Substances 0.000 title claims abstract description 12
- 238000005530 etching Methods 0.000 claims description 16
- 238000005259 measurement Methods 0.000 claims description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 239000001257 hydrogen Substances 0.000 claims description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000007664 blowing Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R17/00—Measuring arrangements involving comparison with a reference value, e.g. bridge
- G01R17/02—Arrangements in which the value to be measured is automatically compared with a reference value
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F5/00—Electrolytic stripping of metallic layers or coatings
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Water Treatment By Electricity Or Magnetism (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
- Electrostatic Spraying Apparatus (AREA)
- ing And Chemical Polishing (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Measurement Of Current Or Voltage (AREA)
- Control Of Non-Electrical Variables (AREA)
- Electrostatic Separation (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/260,055 US7033466B2 (en) | 2002-09-27 | 2002-09-27 | Electrochemical stripping using single loop control |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| UA74057C2 true UA74057C2 (en) | 2005-10-17 |
Family
ID=31993524
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| UA2003098789A UA74057C2 (en) | 2002-09-27 | 2003-09-26 | A control circuit of the system for electromagnetic etching-out the coating |
Country Status (13)
| Country | Link |
|---|---|
| US (1) | US7033466B2 (zh) |
| EP (1) | EP1405935A3 (zh) |
| JP (1) | JP2004115918A (zh) |
| KR (1) | KR100533899B1 (zh) |
| CN (1) | CN1497068A (zh) |
| BR (1) | BR0304233A (zh) |
| CA (1) | CA2442228C (zh) |
| MX (1) | MXPA03008708A (zh) |
| PL (1) | PL362242A1 (zh) |
| RU (1) | RU2257427C2 (zh) |
| SG (1) | SG123566A1 (zh) |
| TW (1) | TW200406512A (zh) |
| UA (1) | UA74057C2 (zh) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1473387A1 (de) * | 2003-05-02 | 2004-11-03 | Siemens Aktiengesellschaft | Verfahren zur Entschichtung eines Bauteils |
| DE102004002763A1 (de) * | 2004-01-20 | 2005-08-04 | Mtu Aero Engines Gmbh | Verfahren zum elektrochemischen Entschichten von Bauteilen |
| WO2012095672A2 (en) * | 2011-01-14 | 2012-07-19 | Accentus Medical Plc | Metal treatment |
| US8859479B2 (en) | 2011-08-26 | 2014-10-14 | United Technologies Corporation | Chemical stripping composition and method |
| CN103088398B (zh) * | 2011-10-31 | 2016-05-11 | 通用电气公司 | 多通道电化学去金属涂层系统及其控制电路 |
| CN104040417B (zh) | 2011-11-15 | 2017-07-18 | 阿什温-乌沙斯公司 | 互补聚合物电致变色装置 |
| US9207515B2 (en) | 2013-03-15 | 2015-12-08 | Ashwin-Ushas Corporation, Inc. | Variable-emittance electrochromic devices and methods of preparing the same |
| CN103336452A (zh) * | 2013-06-17 | 2013-10-02 | 成都荣耀科技有限公司 | 用于放大变电站中水泵智能控制系统采集信号的模块 |
| US9632059B2 (en) | 2015-09-03 | 2017-04-25 | Ashwin-Ushas Corporation, Inc. | Potentiostat/galvanostat with digital interface |
| US9482880B1 (en) | 2015-09-15 | 2016-11-01 | Ashwin-Ushas Corporation, Inc. | Electrochromic eyewear |
| MY180984A (en) * | 2017-10-12 | 2020-12-15 | Matsuda Sangyo Company Ltd | Method for removing adhered metals from metal plate |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3886055A (en) * | 1973-12-12 | 1975-05-27 | Texas Instruments Inc | Electrolytic separation of metals |
| US4227988A (en) * | 1979-03-30 | 1980-10-14 | International Business Machines Corporation | Potentiostat for use with electrochemical cells |
| US4261804A (en) * | 1979-11-13 | 1981-04-14 | United Technologies Corporation | Selective removal of nickel-based alloys from ferrous-based metals |
| US4642172A (en) * | 1985-02-19 | 1987-02-10 | Bacharach, Inc. | Controlled-potential bias circuit for electrochemical cells |
| DE68925727T2 (de) * | 1989-09-15 | 1996-07-04 | Hewlett Packard Gmbh | Methode zur Bestimmung der optimalen Arbeitsbedingungen in einem elektrochemischen Detektor und elektrochemischer Detektor, diese Methode benutzend |
| US5096550A (en) * | 1990-10-15 | 1992-03-17 | The United States Of America As Represented By The United States Department Of Energy | Method and apparatus for spatially uniform electropolishing and electrolytic etching |
| FR2685780B1 (fr) * | 1991-12-27 | 1996-06-14 | Alsthom Cge Alcatel | Procede de mesure de l'etat de charge d'un generateur electro-chimique et dispositif mettant en óoeuvre ce procede. |
| US5502370A (en) * | 1994-09-06 | 1996-03-26 | Motorola, Inc. | Power factor control circuit having a boost current for increasing a speed of a voltage control loop and method therefor |
| US6176999B1 (en) | 1998-12-18 | 2001-01-23 | United Technologies Corporation | Feedback controlled stripping of airfoils |
| US6413389B1 (en) * | 1999-12-17 | 2002-07-02 | Applied Materials, Inc. | Method for recovering metal from etch by-products |
| KR100373185B1 (ko) * | 2000-11-28 | 2003-02-25 | 한국과학기술연구원 | 와이어 에칭장치 및 그 방법 |
| US6440291B1 (en) * | 2000-11-30 | 2002-08-27 | Novellus Systems, Inc. | Controlled induction by use of power supply trigger in electrochemical processing |
| US6428683B1 (en) | 2000-12-15 | 2002-08-06 | United Technologies Corporation | Feedback controlled airfoil stripping system with integrated water management and acid recycling system |
| US20030029726A1 (en) * | 2001-08-07 | 2003-02-13 | Applied Materials, Inc. | Apparatus and method of evaluating electroplating solutions and conditions |
-
2002
- 2002-09-27 US US10/260,055 patent/US7033466B2/en not_active Expired - Lifetime
-
2003
- 2003-09-16 TW TW092125448A patent/TW200406512A/zh unknown
- 2003-09-17 PL PL03362242A patent/PL362242A1/xx not_active Application Discontinuation
- 2003-09-19 EP EP03255884A patent/EP1405935A3/en not_active Withdrawn
- 2003-09-22 SG SG200305625A patent/SG123566A1/en unknown
- 2003-09-22 KR KR10-2003-0065476A patent/KR100533899B1/ko not_active IP Right Cessation
- 2003-09-24 BR BR0304233-2A patent/BR0304233A/pt not_active IP Right Cessation
- 2003-09-24 CA CA002442228A patent/CA2442228C/en not_active Expired - Fee Related
- 2003-09-25 MX MXPA03008708A patent/MXPA03008708A/es unknown
- 2003-09-26 UA UA2003098789A patent/UA74057C2/uk unknown
- 2003-09-26 CN CNA03127210XA patent/CN1497068A/zh active Pending
- 2003-09-29 RU RU2003129015/02A patent/RU2257427C2/ru not_active IP Right Cessation
- 2003-09-29 JP JP2003338119A patent/JP2004115918A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| CA2442228C (en) | 2007-02-13 |
| KR100533899B1 (ko) | 2005-12-07 |
| US7033466B2 (en) | 2006-04-25 |
| JP2004115918A (ja) | 2004-04-15 |
| MXPA03008708A (es) | 2004-12-03 |
| US20040060827A1 (en) | 2004-04-01 |
| BR0304233A (pt) | 2004-08-31 |
| RU2003129015A (ru) | 2005-04-10 |
| PL362242A1 (en) | 2004-04-05 |
| RU2257427C2 (ru) | 2005-07-27 |
| CN1497068A (zh) | 2004-05-19 |
| CA2442228A1 (en) | 2004-03-27 |
| KR20040027356A (ko) | 2004-04-01 |
| EP1405935A3 (en) | 2004-04-28 |
| SG123566A1 (en) | 2006-07-26 |
| TW200406512A (en) | 2004-05-01 |
| EP1405935A2 (en) | 2004-04-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| UA74057C2 (en) | A control circuit of the system for electromagnetic etching-out the coating | |
| US8149562B2 (en) | System for decharging a wafer or substrate after dechucking from an electrostatic chuck | |
| KR100586430B1 (ko) | 플라스마 처리실에서 웨이퍼의 바이어스를 보상하는방법과 장치 | |
| US11398369B2 (en) | Method and apparatus for actively tuning a plasma power source | |
| MY127183A (en) | Feedback controlled airfoil stripping system with integrated water management and acid recycling system | |
| JP6749749B2 (ja) | 銅バリア膜をエッチングするための新規方法 | |
| US8366833B2 (en) | Plasma processing apparatus and plasma processing method | |
| JP4276245B2 (ja) | エアフォイルを支持するための治具 | |
| KR20070085010A (ko) | 플라즈마처리장치 및 플라즈마처리방법 | |
| MY109058A (en) | Method for the electrolytic removal of plastic mold flash or bleed from the surfaces of semiconductor devices or similar electronic components and the solution composition to be used with this method | |
| CN111048317B (zh) | 一种低压软态腐蚀铝箔的方法 | |
| TW202046827A (zh) | 電漿處理方法及電漿處理裝置 | |
| KR20020029978A (ko) | 반도체 제조용 플라즈마 식각장치 | |
| US11901164B2 (en) | Micro-surface morphological matching for reactor components | |
| GB2201968A (en) | Volatile anodizing electrolytes for tantalum | |
| JP4866347B2 (ja) | プラズマ点火圧の低減 | |
| KR101922015B1 (ko) | 고주파 전력 발생장치의 컨버터 제어장치 | |
| JP2656511B2 (ja) | プラズマエッチング装置 | |
| JP7516657B2 (ja) | プラズマ処理用途のためのパルス電圧源 | |
| KR100491190B1 (ko) | 웨이퍼처리시스템에서반도체웨이퍼를클램핑하고디클램핑하는방법과장치 | |
| KR20100102910A (ko) | 금속 제품의 표면 도장 방법 | |
| JPH0827297B2 (ja) | プローブカード用プローブの洗浄液及びそれを用いた洗浄装置 | |
| KR101790522B1 (ko) | 국부화 아노다이징 공정을 이용한 미세패턴 가공 시스템 및 이를 이용한 미세패턴 가공 방법 | |
| JP2002305182A (ja) | プラズマ処理方法及び装置 | |
| CN116265960A (zh) | 等离子体工艺设备的电缆长度选定方法及装置 |