UA71922C2 - Translated By PlajЭЛЕКТРОННО-ЛУЧЕВОЕ УСТРОЙСТВО ДЛЯ НАНЕСЕНИЯ ПОКРЫТИЯ КОНДЕНСАЦИЕЙ ИЗ ПАРОВОЙ ФАЗЫ, КОТОРАЯ СОДЕРЖИТ МАГАЗИН СО СЛИТКАМИ ПОКРОВНОГО МАТЕРИАЛА - Google Patents
Translated By PlajЭЛЕКТРОННО-ЛУЧЕВОЕ УСТРОЙСТВО ДЛЯ НАНЕСЕНИЯ ПОКРЫТИЯ КОНДЕНСАЦИЕЙ ИЗ ПАРОВОЙ ФАЗЫ, КОТОРАЯ СОДЕРЖИТ МАГАЗИН СО СЛИТКАМИ ПОКРОВНОГО МАТЕРИАЛА Download PDFInfo
- Publication number
- UA71922C2 UA71922C2 UA2001032042A UA2001032042A UA71922C2 UA 71922 C2 UA71922 C2 UA 71922C2 UA 2001032042 A UA2001032042 A UA 2001032042A UA 2001032042 A UA2001032042 A UA 2001032042A UA 71922 C2 UA71922 C2 UA 71922C2
- Authority
- UA
- Ukraine
- Prior art keywords
- coating
- chamber
- electron beam
- coating chamber
- coating material
- Prior art date
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 208
- 239000011248 coating agent Substances 0.000 title claims abstract description 190
- 239000000463 material Substances 0.000 title claims abstract description 56
- 238000009833 condensation Methods 0.000 title claims description 16
- 230000005494 condensation Effects 0.000 title claims description 16
- 239000012808 vapor phase Substances 0.000 title claims description 8
- 238000005328 electron beam physical vapour deposition Methods 0.000 title abstract 5
- 238000010894 electron beam technology Methods 0.000 claims abstract description 70
- 238000009792 diffusion process Methods 0.000 claims description 12
- 238000010438 heat treatment Methods 0.000 claims description 12
- 238000001816 cooling Methods 0.000 claims description 9
- 230000007246 mechanism Effects 0.000 claims description 9
- 238000012423 maintenance Methods 0.000 claims description 4
- 230000001105 regulatory effect Effects 0.000 claims description 4
- 230000007423 decrease Effects 0.000 claims description 3
- 239000006249 magnetic particle Substances 0.000 claims description 3
- 238000012876 topography Methods 0.000 claims 1
- 238000000151 deposition Methods 0.000 abstract description 10
- 230000008021 deposition Effects 0.000 abstract description 7
- 229910010293 ceramic material Inorganic materials 0.000 description 25
- 238000000034 method Methods 0.000 description 23
- 230000008569 process Effects 0.000 description 17
- 239000007789 gas Substances 0.000 description 13
- 239000000919 ceramic Substances 0.000 description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 8
- 238000005524 ceramic coating Methods 0.000 description 8
- 229910045601 alloy Inorganic materials 0.000 description 7
- 239000000956 alloy Substances 0.000 description 7
- 230000008901 benefit Effects 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 238000009826 distribution Methods 0.000 description 6
- 238000005755 formation reaction Methods 0.000 description 6
- 230000002829 reductive effect Effects 0.000 description 6
- 230000006872 improvement Effects 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 230000008016 vaporization Effects 0.000 description 4
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 3
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 230000001276 controlling effect Effects 0.000 description 3
- 238000012544 monitoring process Methods 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000002485 combustion reaction Methods 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000008187 granular material Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000005355 lead glass Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 238000004901 spalling Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 238000009423 ventilation Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910000951 Aluminide Inorganic materials 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- 241000283153 Cetacea Species 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 241000423732 Hephaestus Species 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 241000984293 Monoon Species 0.000 description 1
- 241000282320 Panthera leo Species 0.000 description 1
- 241001655798 Taku Species 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 230000002763 arrhythmic effect Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 1
- 230000000739 chaotic effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 210000005069 ears Anatomy 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 230000008447 perception Effects 0.000 description 1
- 238000007750 plasma spraying Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000002893 slag Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Электронно-лучевое устройство (10) для нанесения покрытия конденсацией из паровой фазы (ЭЛНПКПФ). Устройство (10) ЭЛНПКПФ вообще включает покровную камеру (12), которая функционирует в условиях повышенных температур и субатмосферных давлений. Электронно-лучевая пушка (30) проецирует электронный луч (28) в покровную камеру (12) и на расположенный в ней покровный материал (26), расплавляя и испаряя его при этом. Изделие (20) поддерживается в покровной камере (12) таким образом, чтобы пары покровного материала (26) осаждались на изделии (20). Эксплуатация устройства ЭЛНПКПФ облегчается встроенным вращающимся магазином (102), который поддерживает блок слитков (26) покровного материала (26) под покровной камерой (12). Магазин (102) индексируется таким образом, чтобы каждый блок из одного или больше слитков совпадал с апертурой (56) покровной камеры (12) для последовательной подачи слитков (26) в покровную камеру (12) без прерывания процесса осаждения покровного материала (26).
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14723499P | 1999-08-04 | 1999-08-04 | |
| PCT/US2000/021259 WO2001011105A1 (en) | 1999-08-04 | 2000-08-03 | Electron beam physical vapor deposition apparatus with ingot magazine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| UA71922C2 true UA71922C2 (ru) | 2005-01-17 |
Family
ID=22520768
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| UA2001032042A UA71922C2 (ru) | 1999-08-04 | 2000-03-08 | Translated By PlajЭЛЕКТРОННО-ЛУЧЕВОЕ УСТРОЙСТВО ДЛЯ НАНЕСЕНИЯ ПОКРЫТИЯ КОНДЕНСАЦИЕЙ ИЗ ПАРОВОЙ ФАЗЫ, КОТОРАЯ СОДЕРЖИТ МАГАЗИН СО СЛИТКАМИ ПОКРОВНОГО МАТЕРИАЛА |
Country Status (2)
| Country | Link |
|---|---|
| UA (1) | UA71922C2 (ru) |
| WO (1) | WO2001011105A1 (ru) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105908129B (zh) * | 2016-06-27 | 2019-08-27 | 京东方科技集团股份有限公司 | 一种有机材料蒸镀设备和方法 |
| CN106987810A (zh) * | 2017-05-24 | 2017-07-28 | 昆山国显光电有限公司 | 蒸镀坩埚热场控制装置及蒸镀系统 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0821394A1 (en) * | 1996-07-25 | 1998-01-28 | The Boc Group, Inc. | Electron beam evaporator |
| DE19743799C1 (de) * | 1997-10-02 | 1999-01-28 | Ardenne Anlagentech Gmbh | Vorrichtung zur Einführung von stangenförmigem Targetmaterial in Elektronenstrahlbedampfungsanlagen |
-
2000
- 2000-03-08 UA UA2001032042A patent/UA71922C2/ru unknown
- 2000-08-03 WO PCT/US2000/021259 patent/WO2001011105A1/en active IP Right Grant
Also Published As
| Publication number | Publication date |
|---|---|
| WO2001011105A1 (en) | 2001-02-15 |
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