TWM589360U - Semiconductor photomask box storage device - Google Patents

Abstract

This creation provides a semiconductor photomask box storage device, including a base, a lifting member, a motor, and a vertical displacement platform. The base has a fixed seat and a bearing member, and the fixed seat is locked on the bearing member; the lifting member is connected to the base by two fixing members, the lifting member has a connecting block, a slide rail and a slider, and the connecting block has a groove , The sliding rail is locked on the groove, the slider is respectively fixed on the first displacement member and the second displacement member, and the slider is slidingly arranged on the sliding rails; the motor and the lifting member are electrically connected to output power, And the up and down displacement platform is connected with the lifting member, and slides on the slide rail through the slider to drive the up and down displacement platform to move up and down. Therefore, when the storage device of the original semiconductor photomask box is ascending and descending, the problem of damage caused by the imbalance of the device can be avoided.

Description

Semiconductor photomask box storage equipment

This creation relates to a semiconductor mask storage device, in particular to a semiconductor mask storage device that can avoid damage caused by device imbalance or misalignment when the device is ascending and descending.

In the semiconductor manufacturing process, a photomask is commonly used in the lithography process. Generally, the photomask is made of a flat quartz or glass plate, and a layer of chromium is deposited on one side of the quartz or glass plate. In the yellow light lithography process, the pattern on the photomask is transferred into an image on a wafer. At this stage, in order to manufacture smaller electronic components to increase the density of integrated circuits, the line width must be smaller and smaller. However, when the line width is gradually reduced, the contamination on the optical path is more likely to be transferred to the wafer, resulting in a decrease in wafer yield. As mentioned above, high-precision photomasks are particularly susceptible to defects and defects. Therefore, keeping the photomask clean and stored at this stage is an important issue.

In the yellow light lithography process, the mask plays an important role, and the haze defect of the mask is the main factor that causes the yield to decline. The main component of photomask fog pollution is ammonium sulfate. In addition to the photomask protective film, other types of pollution include residual substances in the photomask cleaning process, photomask storage environment and time, process environment or exposure dose and defects The relationship between quantity, etc. Secondly, in addition to keeping the reticle clean, the storage of the reticle is also an important issue. The traditional reticle storage box can reduce the problem of damage to the reticle due to collision or shaking.

At present, general semiconductor factories also use semiconductor mask storage equipment to The photomask is stored to maintain the integrity of the photomask. However, the equipment currently used can store a small number of photomasks, and after a period of use of the equipment, the height of the slide rail is easy to change because the equipment often needs to rise and fall. Tight, making the motor shaft easy to break. In addition, the traditional photomask storage device only has a single-sided slide rail, so it is easy to cause the problem of device imbalance.

In view of this, the creator has invested a lot of research and development energy and spirit, constantly breaking through and innovating in this field, hoping to solve the shortcomings of practice with novel technical means, in addition to bringing better products to the society and promoting industrial development.

The main purpose of this creation is to provide a semiconductor photomask storage device. This creation has a symmetrical slide rail and slider design, which can achieve the purpose of equipment balance during operation. In addition, the slide rail of the present invention is fixed on the displacement member, which can avoid the problem of the position of the slide rail caused by the equipment during the ascent and descent process, and thus can overcome the problem of the motor shaft breaking.

To achieve the above purpose, the present invention provides a semiconductor photomask storage device, which includes a base, a lifting member, a motor, and a vertical displacement platform. First, the base has a fixing seat and a bearing member, and the fixing seat is fixed on the bearing member. Secondly, the lifting member has a connecting block, a plurality of sliding rails and a plurality of sliders, the connecting block has a plurality of grooves, the sliding rails are locked on the grooves, and the sliders are locked respectively On a first displacement member and a second displacement member, the sliders are slidably disposed on the slide rails, and the first displacement member is locked to the base. Furthermore, the motor is electrically connected to the lifting member to output power to move the lifting member up and down. In addition, the up and down displacement platform is connected with the lifting member, and slides on the slide rails through the sliders to drive the up and down displacement platform to move up and down.

In the semiconductor photomask storage device of this creation, the grooves are opposite to The base is vertically arranged on both sides of the connecting block, and is arranged on both sides of the connecting block, so as to form the grooves arranged symmetrically with each other.

In the semiconductor photomask storage device of the present invention, the upper and lower top ends of the grooves have a symmetrical bump, so that the sliders are displaced up and down within the range of the length of the slide rails.

In the semiconductor photomask storage device of the present invention, the bump is vertically disposed on the slide rails relative to the connecting block, so that the sliders can abut on the bump to stop the up and down displacement.

In the semiconductor photomask storage device of the present invention, when the sliders locked on the first displacement member slide on the slide rails, the lifting member forms a first vertical displacement; when locked on the first When the sliders on the two displacement members slide on the slide rails, the lifting member forms a second vertical displacement; wherein, the second vertical displacement is greater than the first vertical displacement.

The semiconductor photomask storage device of the present invention further includes a fixing member, one end of the fixing member is locked on the carrying member of the base, and the other end is locked on the surface of the first displacement member.

In the semiconductor photomask storage device of the present invention, the surface of the first displacement member has a plurality of clamping slots, and the clamping slots are fixed on one side of the first displacement member at a fixed interval distance, and the plurality of clamping slots can be used The photomask box is stored in the card slots.

In the semiconductor photomask storage device of the present invention, the first displacement member has an abutment, and the abutment is fixed on the other side of the first displacement member relative to the clamping slots.

In the semiconductor photomask storage device of the present invention, the connecting block and the carrying member have a plurality of through holes.

1‧‧‧ Semiconductor mask box equipment

10‧‧‧Base

101‧‧‧Fixed seat

102‧‧‧Bearing member

20‧‧‧Lifting member

201‧‧‧Connecting block

202‧‧‧slide

203‧‧‧slider

204‧‧‧groove

205‧‧‧ First displacement member

2051‧‧‧Card slot

2052‧‧‧Abutment

206‧‧‧Second displacement member

207‧‧‧Bump

208‧‧‧Through hole

30‧‧‧Motor

40‧‧‧Up and down displacement platform

50‧‧‧Fixed parts

FIG. 1 is a perspective rear side view of the semiconductor photomask device created for this.

FIG. 2 is a perspective front view of the semiconductor mask box device created for this.

FIG. 3 is a three-dimensional schematic diagram of the semiconductor mask box device created for this.

Fig. 4 is a three-dimensional schematic diagram of the lifting member of this creation.

FIG. 5 is a perspective schematic view of the first vertical displacement of the lifting member of the creation.

FIG. 6 is a perspective schematic view of the creation of the lifting member at the second vertical displacement.

The following describes the implementation of the creation by specific examples. Those skilled in the art can easily understand other advantages and effects of the creation by the contents disclosed in this specification. In addition, this creation can also be implemented or applied by other specific embodiments, and various modifications and changes can be made without departing from the spirit of this creation.

Please refer to FIG. 1, FIG. 2 and FIG. 5, FIG. 1 is a perspective rear side view of the semiconductor mask box equipment created; FIG. 2 is a perspective front side view of the semiconductor mask box equipment created; and FIG. 5 is a three-dimensional schematic view of the first vertical displacement of the lifting member of this creation.

As shown in FIGS. 1, 2 and 5, a semiconductor photomask device 1 of the present invention includes a base 10, a lifting member 20, a motor 30 and a vertical displacement platform 40. First, the base 10 has a fixing base 101 and a supporting member 102, and the fixing base 101 is fixed on the supporting member 102. Secondly, the lifting member 20 has a connecting block 201, a plurality of sliding rails 202 and a plurality of sliding blocks 203, the connecting block 201 has a plurality of grooves 204, and the sliding rails 202 are locked on the grooves 204 The sliders 203 are respectively fixed to a first displacement member 205 and a second displacement member 206, so that the sliders 203 are slidably disposed on the slide rails 202, and the first displacement member 205 is locked to The base 10. Furthermore, the motor 30 is electrically connected to the lifting member 20 to output power, The lifting member 20 is moved up and down. Next, the vertical displacement platform 40 is connected to the top of the lifting member 20, and slides on the slide rails 202 through the sliders 203 to drive the vertical displacement platform 40 to move up and down. In addition, the semiconductor photomask device 1 further includes a fixing member 50. One end of the fixing member 50 is locked to the carrying member 102 of the base 10, and the other end is locked to the surface of the first displacement member 205.

Please refer to FIG. 3 and FIG. 4, FIG. 3 is a perspective schematic view of the semiconductor photomask device of the creation; and FIG. 4 is a perspective schematic view of the lifting member of the creation.

As shown in FIGS. 3 and 4, the grooves 204 are vertically disposed on both sides of the connecting block 201 relative to the base 10, and are disposed on both sides of the connecting block 201 to form the symmetrically arranged槽204。 The groove 204. Secondly, the upper and lower top ends of the grooves 204 have a symmetrical convex block 207, so that the sliders 203 are displaced up and down in a range smaller than the length of the slide rails 202. The convex block 207 is vertically disposed on the sliding rails 202 relative to the connecting block 201, so that the sliders 203 can abut against the convex block 207 to stop up and down displacement. In addition, as shown in FIG. 3, the connecting block 201 and the supporting member 102 have a plurality of through holes 208 to reduce the total weight of the semiconductor photomask device 1; wherein, the shapes and sizes of the through holes 208 can be used according to The needs of the authors change arbitrarily, but this creation is not limited to this.

Please refer to FIGS. 5 and 6. FIG. 6 is a schematic perspective view of the creation of the lifting member located in the second vertical displacement member.

As shown in FIGS. 5 and 6, the surface of the first displacement member 205 has a plurality of clamping grooves 2051. The clamping grooves 2051 are fixed to one side of the first displacement member 205 at a fixed interval distance. A plurality of photomask boxes are stored in the card slots 2051. In addition, the first displacement member 205 has an abutting member 2052 fixed to the first displacement member 205 relative to the card slots On the other side of 2051, the mask boxes are placed in the semiconductor mask box device 1, when the lifting member 20 rises down When descending, there will be no shaking of the photomask boxes due to the up and down vibration. Secondly, as shown in FIG. 5, wherein when the sliders 203 locked on the first displacement member 205 slide on the slide rails 202, the lifting member 20 forms a first vertical displacement; As shown in FIG. 6, when the sliders 203 locked on the second displacement member 206 slide on the slide rails 202, the lifting member 20 forms a second vertical displacement; wherein, the second vertical displacement is greater than the The first vertical displacement. Compared with the existing semiconductor photomask storage device, the existing semiconductor photomask storage device only has a slide rail and a slider on one side, therefore, when the device is moved up and down, an imbalance problem will occur, however, this creation Both sides of the connecting block 201 have symmetrical slide rails 202 and sliders 203, which can avoid the problem of unbalance of the semiconductor mask device 1 when the lifting member 20 rises and falls.

However, the above is only a preferred embodiment of this creation, and is not intended to limit the scope of patent protection of this creation, so any equivalent changes in the use of this creation description and the content of the drawings are all included in the right of this creation. Within the scope of protection, Chen Ming.

1‧‧‧ Semiconductor mask box equipment

10‧‧‧Base

101‧‧‧Fixed seat

102‧‧‧Bearing member

20‧‧‧Lifting member

201‧‧‧Connecting block

202‧‧‧slide

203‧‧‧slider

208‧‧‧Through hole

30‧‧‧Motor

40‧‧‧Up and down displacement platform

50‧‧‧Fixed parts

Claims (9)

A semiconductor photomask device includes: a base with a fixed seat and a bearing member, the fixed seat is fixed on the bearing member; a lifting member with a connecting block, a plurality of slide rails and a plurality of sliders, The connecting block has a plurality of grooves, and the sliding rails are locked on the grooves, and the sliders are respectively locked to a first displacement member and a second displacement member to make the sliders slide On the slide rails, and the first displacement member is locked to the base; a motor, electrically connected to the lifting member to output power to move the lifting member up and down; and a vertical displacement platform, and the lifting member The top of the is connected, and slides on the slide rails through the sliders to drive the up and down displacement platform to move up and down. For example, the semiconductor photomask device of claim 1, wherein the grooves are vertically arranged on both sides of the connecting block with respect to the base, and are arranged on both sides of the connecting block to form a symmetrical arrangement The grooves. For example, in the semiconductor photomask device of claim 2, the upper and lower top ends of the grooves have a symmetrical bump, so that the sliders are displaced up and down within the range of the length of the slide rails. For example, the semiconductor photomask device of claim 3, wherein the bump is vertically arranged on the slide rails relative to the connecting block, so that the sliders can abut on the bump and stop up and down displacement . For example, the semiconductor photomask device of claim 1, wherein when the sliders locked on the first displacement member slide on the slide rails, the lifting member forms a first vertical displacement; When the sliders locked on the second displacement member slide on the slide rails, the lifting member forms a second vertical displacement; wherein, the second vertical displacement is greater than the first vertical displacement. For example, the semiconductor photomask device of item 1 of the patent application scope further includes a fixing member, one end of the fixing member is locked to the carrying member of the base, and the other end is locked to the surface of the first displacement member. For example, the semiconductor photomask device of claim 1, wherein the surface of the first displacement member has a plurality of clamping slots, and the clamping slots are fixed on one side of the first displacement member at a fixed interval On the side, a plurality of photomask boxes can be stored in the card slots. For example, in the semiconductor mask device of claim 7, the first displacement member has an abutment, and the abutment is fixed on the other side of the first displacement member relative to the clamping slots . For example, in the semiconductor mask device of claim 1, the connecting block and the supporting member have a plurality of through holes.

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