CN207051662U - Immersed photoetching machine base station system, immersed photoetching machine - Google Patents
Immersed photoetching machine base station system, immersed photoetching machine Download PDFInfo
- Publication number
- CN207051662U CN207051662U CN201720337572.8U CN201720337572U CN207051662U CN 207051662 U CN207051662 U CN 207051662U CN 201720337572 U CN201720337572 U CN 201720337572U CN 207051662 U CN207051662 U CN 207051662U
- Authority
- CN
- China
- Prior art keywords
- flexible
- base station
- biodge device
- station system
- machine base
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Abstract
Immersed photoetching machine base station system provided by the utility model and immersed photoetching machine, two transportable transfer platforms are set in immersed photoetching machine base station system, flexible Biodge device is set on the side of transfer platform, it can be engaged during the flexible Biodge device elongation with the side of another transfer platform, so when projection objective and immersion liquid are on a transfer platform after the completion of photoetching, flexible Biodge device that can be after elongation is moved to another transfer platform, that is the Biodge device that stretches is the vertical support of immersion liquid offer between two transfer platforms, and immersion liquid under projection objective itself by magnetic force can maintenance level direction shape, use the litho machine for including this immersed photoetching machine base station system, so that photoetching during photoetching on two transfer platforms can be with seamless connection, improve production efficiency.
Description
Technical field
Semiconductor applications are the utility model is related to, more particularly to a kind of immersed photoetching machine base station system, immersion light
Quarter machine.
Background technology
Immersion lithography needs the photoetching on the lower surface and silicon chip of last lens of projection lens of lithography machine
The immersion liquid of high index of refraction is full of between glue.The numerical aperture NA=nsin θ of projection objective, wherein, n is projection objective and silicon
The refractive index of medium between piece, θ are light maximum incident angle.In the case of maximum incident angle identical, immersion lithographic system
Numerical aperture increase n times than conventional lithography system.And play spatial frequency from the angle of Fourier Optics, numerical aperture
The role of low pass filter threshold value, injecting the immersion liquid of high index of refraction can make the light wave of more high spatial frequency incide photoetching
On glue, therefore imaging resolution is improved.
The use of double-workpiece-table litho machine so that " dry type measures, submergence exposure " is possibly realized：I.e. silicon chip is in measurement position
" dry type " measurement is completed, can using the distinctive focusing test algorithm of double-workpiece-table litho machine after the accurate three-dimensional pattern of silicon chip is obtained
To be previously obtained the defocusing amount of silicon chip, silicon chip then can be navigated to reason without carrying out leveling and focusing measurement again in exposure position
Think that focal plane completes submergence exposure, realize dual -stage technology with submerging the seamless connection of exposure technique.
But during using double-workpiece-table litho machine, it is urgent problem that immersion liquid field how is maintained when dual stage exchanges.
Utility model content
To solve the above problems, the utility model proposes a kind of immersed photoetching machine base station system, liquid immersion lithography
Machine, flexible Biodge device is set on one or more transfer platforms of base station system, it can connect with the side of another transfer platform
Close so that projection objective and immersion liquid can be moved on another transfer platform by flexible Biodge device.
To reach above-mentioned purpose, the utility model provides a kind of immersed photoetching machine base station system, positioned at immersion system
Lower section, the immersion fluid system maintain immersion liquid, and the immersed photoetching machine base station system is used including two or more
In the transfer platform of bearing basement, the side of one or more of the transfer platform is fixed with flexible Biodge device, when described flexible
When Biodge device stretches, the flexible Biodge device all engages the side of two transfer platforms, makes the immersion liquid from one
It is transferred on transfer platform on another transfer platform.
Preferably, during the flexible Biodge device stretching, extension, the surface of the flexible Biodge device and the table top of the transfer platform
Positioned at approximately the same plane.
Preferably, the flexible Biodge device is flexible harden structure, the flexible Biodge device is fixed on described by hinge
The side of transfer platform.
Preferably, it is provided with sealing between the side of each flexible Biodge device and its be hinged fixed transfer platform
Bar.
Formed preferably, the flexible Biodge device is hinged by several expansion plate main bodys.
Preferably, the flexible Biodge device is made up of two points of flexible Biodge devices, point flexible Biodge device point described in two
Two relative sides of the transfer platform are not arranged on.
Immersed photoetching machine base station system, preferably, being provided with sealing strip between the expansion plate main body.
Preferably, it is additionally provided with each transfer platform for driving the flexible driving dress of the flexible Biodge device
Put.
Preferably, the drive device includes actuating cylinder.
Preferably, the drive device, the hinge and the flexible Biodge device composition slider-crank mechanism.
Preferably, the width of the flexible Biodge device is more than the diameter for the immersion liquid field that the immersion liquid is formed.
Preferably, any transfer platform includes a coarse motion platform and follows the fine motion of the coarse motion platform motion from bottom to up
Platform, the flexible Biodge device are arranged on the micropositioner side, and the flexible Biodge device is extended to micro- with another transfer platform
During the side engagement of dynamic platform, the surface of the flexible Biodge device and the table top of the micropositioner are generally aligned in the same plane.
Preferably, it is magnetic suspension structure or air floating structure between the micropositioner and the coarse motion platform.
Preferably, anticollision module is provided with the coarse motion platform, for preventing the coarse motion platform phase with another transfer platform
Hit.
Preferably, the side of the micropositioner is further fixed on strip mirror, the height where the strip mirror is less than described
Height where flexible Biodge device.
The utility model also provides a kind of immersed photoetching machine, including immersed photoetching machine base station system as described above
System.
Immersed photoetching machine base station system provided by the utility model, immersed photoetching machine, in immersed photoetching machine base
Two transportable transfer platforms are set in base frame system, flexible Biodge device is set on the side of each transfer platform, this is flexible
Biodge device can engage when extending with the side of another transfer platform, so when projection objective and immersion liquid are in a transfer platform
After the completion of upper photoetching, flexible Biodge device that can be after elongation is moved to another transfer platform, that is to say, that flexible Biodge device
The vertical support provided between two transfer platforms for immersion liquid, and immersion liquid itself can by magnetic force under projection objective
The shape in maintenance level direction, use the litho machine for including this immersed photoetching machine base station system so that two during photoetching
Photoetching on transfer platform can improve production efficiency with seamless connection.
Brief description of the drawings
Fig. 1 be embodiment one provided by the utility model stretch Biodge device shrink when immersed photoetching machine structural representation；
Fig. 2 be embodiment one provided by the utility model stretch Biodge device elongation when immersed photoetching machine structural representation；
Fig. 3 be embodiment one provided by the utility model stretch Biodge device stretching, extension when immersed photoetching machine structural representation；
Fig. 4 is Fig. 3 top views；
Fig. 5 is the expansion plate agent structure schematic diagram of the utility model embodiment one；
Fig. 6 be the utility model embodiment two stretch Biodge device shrink when immersed photoetching machine structural representation；
Fig. 7 be the utility model embodiment two stretch Biodge device elongation when immersed photoetching machine structural representation；
Fig. 8 be the utility model embodiment two stretch Biodge device stretching, extension when immersed photoetching machine structural representation.
In figure：The first coarse motions of 1.1- platform, the second coarse motions of 1.2- platform, the Crashworthy plates of 2.1- first, the Crashworthy plates of 2.2- second, 3.1-
First micropositioner, 3.1.1- strips mirror, the micropositioners of 3.2- second, the silicon chips of 4.1- first, the silicon chips of 4.2- second, 5.1- power dress
Put, the flexible Biodge device of 5.2- first axles, 5.3- second hinges, 5.4-, 5.4.0- divide flexible Biodge device, 5.4.1- expansion plate masters
Body, 5.5- sealing strips, 6- projection objectives, 7- immersion liquids, 8- submergence heads.
Embodiment
To enable above-mentioned purpose of the present utility model, feature and advantage more obvious understandable, below in conjunction with the accompanying drawings to this
The embodiment of utility model is described in detail.
Embodiment one
Fig. 1 is refer to, the utility model provides a kind of immersed photoetching machine base station system, and the base station system is positioned at leaching
Do not have the lower section of liquid 7, the immersion liquid 7 is located at the lower section of projection objective 6, and the base station system includes several and is used to carry silicon chip
The transfer platform of (namely substrate), two transfer platforms is arranged in the present embodiment, in Fig. 1, from top to bottom by a micropositioner
A transfer platform is formed with a coarse motion platform, the coarse motion platform of two transfer platforms is in same level, the fine motion of two transfer platforms
Platform also in same level, be not physically contacted by both micropositioner and coarse motion platform, micropositioner typically by magnetic suspension or
Air floating structure is floated on above coarse motion platform so that micropositioner follows coarse motion platform to move.
In Fig. 1, positioned at left side transfer platform from top to bottom be respectively the first micropositioner 3.1 and the first coarse motion platform 1.1, position
Transfer platform in right side is respectively the second micropositioner 3.2 and the second coarse motion platform 1.2 from top to bottom.Each self-retaining on two coarse motion platforms
One anticollision module, respectively the first Crashworthy plate 2.1 and the second Crashworthy plate 2.2, two coarse motion platforms are in motion, the first Crashworthy plate
2.1 and second Crashworthy plate 2.2 prevent two coarse motion platform hypotelorisms, influence each other.
In Fig. 1, now the second silicon chip 4.2 is carry on the second micropositioner 3.2, second silicon on the transfer platform on right side
Piece 4.2 is located at the lower section of immersion liquid 7, and immersion liquid 7 is in submergence first 8, and submergence first 8 is positioned at the lower section of projection objective 6, and now the
Two silicon chips 4.2 carry out liquid immersion lithography.On the transfer platform in left side, the first silicon chip 4.1 is carry on the first micropositioner 3.1,
It is transferred to after projection objective 6 and immersion liquid 7 are waited to the photoetching of the second silicon chip 4.2 on the first micropositioner 3.1, to the first silicon
Piece 4.1 carries out photoetching, at this point it is possible to carry out focusing and leveling to the first silicon chip 4.1.
In the present embodiment, each micropositioner and coarse motion platform is all square to set one in the side edge of the first micropositioner 3.1
Flexible Biodge device 5.4, refer to Fig. 1 to Fig. 4, when the flexible Biodge device 5.4 in contraction state stretches, can with it is second micro-
The upper edge engagement of the side of dynamic platform 3.2, forms bridge floor therebetween, when two work stage synchronizing movings, the bridge floor
The vertical support to immersion liquid 7 is formed between two micropositioners so that projection objective 6 and immersion liquid 7 can be smooth
It is moved on the first micropositioner 3.1.
Specifically, when flexible Biodge device 5.4 is in contraction state, the expansion plate master close to the side of the first micropositioner 3.1
Body 5.4.1 plate face is contracted in the side of the first micropositioner 3.1, in the flexible stretching process of Biodge device 5.4, expansion plate main body
5.4.1 plate face is gradually parallel to the table top of the first micropositioner 3.1, after stretching, extension, expansion plate main body 5.4.1 and first axle 5.2
Two fine motion table tops are connected with the flexible Biodge device 5.4 that second hinge 5.3 collectively constitutes.
In order to ensure that the ground of immersion liquid 7 smoothly moves, the width for the Biodge device 5.4 that stretches is outer at least above immersion liquid 7
Diameter.
Flexible Biodge device 5.4 can be provided between polylith expansion plate main body 5.4.1, each expansion plate main body 5.4.1 by hinge phase
Even, the succession between expansion plate main body 5.4.1 is the same as above-mentioned expansion plate main body 5.4.1 and first axle 5.2 and second hinge
5.3 connected mode.
Each expansion plate main body 5.4.1 is all fixed with sealing strip 5.5 on the side that it is used to link, and refer to Fig. 5, this
Sample is when flexible Biodge device 5.4 stretches, between two expansion plate main body 5.4.1 side, expansion plate main body 5.4.1 and two it is micro-
Squeezed between dynamic platform side due to the interference of sealing strip 5.5 and all form sealing structure, such immersion liquid 7 is passing through retractile bridge
During the bridge floor of device 5.4, sealing structure can ensure immersion liquid 7 will not enter expansion plate main body 5.4.1 between or expansion plate
In gap between main body 5.4.1 and two micropositioners.In addition the sealing strip 5.5 is flexible sealing strip, can also reduce by first
Coarse motion platform 1.1 coupled with the first micropositioner 2.1 with the second micropositioner 2.2 after dynamic disturbances, play a part of buffer shock-absorbing.
In order to drive flexible Biodge device 5.4 flexible, drive module is set on transfer platform, in the present embodiment, drives mould
Block is specially to be fixed on power set 5.1 on the first coarse motion platform 1.1, and using drive cylinder, the power set 5.1 extend to the
On one micropositioner 3.1, and be hinged by first axle 5.2 and flexible Biodge device 5.4, power set 5.1, first axle 5.2 with
And flexible Biodge device 5.4 forms a kind of slider-crank mechanism, when power set 5.1 give power, first axle 5.2 occurs
Rotate so that flexible expansion plate main body 5.4.1 of the Biodge device 5.4 near the side of the first micropositioner 3.1 starts to gradually rotate, and stretches
It is be hinged by second hinge 5.3 between contracting plate main body 5.4.1, as the above-mentioned expansion plate master near the side of the first micropositioner 3.1
When body 5.4.1 starts to gradually rotate, other expansion plate main body 5.4.1 are also gradually rotated, until flexible Biodge device 5.4 stretches,
Now flexible Biodge device 5.4 all engages with the side of two micropositioners, and the table top of bridge floor and two micropositioners is positioned at same
Horizontal plane, so that immersion liquid 7 can be smoothly through flexible Biodge device 5.4.
In two relative side walls of two micropositioners, strip mirror 3.1.1, one of strip mirror are further fixed on
3.1.1 it is located at flexible Biodge device 5.4 in the same face side wall, strip mirror 3.1.1 height is less than flexible Biodge device 5.4, strip
The acting as of mirror 3.1.1 is used for reflection laser interferometer laser, realizes the control to micropositioner precise motion.Using articulated manner
Flexible Biodge device 5.4 after, can be greatly reduced and strip mirror 3.1.1 is blocked.
The utility model also provides a kind of litho machine, uses above-mentioned immersed photoetching machine workpiece table system.
Embodiment two
Fig. 6 to Fig. 8 is refer to, the present embodiment and the difference of embodiment one are, the Biodge device 5.4 that stretches is flexible by two points
Biodge device 5.4.0 is formed, and is each divided to flexible Biodge device 5.4.0 to be fixed in two relative side walls of two micropositioners, Mei Gefen
Flexible Biodge device 5.4.0 is identical with the structure of the flexible Biodge device 5.4 in embodiment one, only its length or expansion plate main body
5.4.1 number is less than the flexible Biodge device 5.4 in embodiment one.
Power set 5.1 are also all set on each transfer platform, each divides flexible Biodge device 5.4.0 for driving, works as power
Device 5.1 drives when each dividing the flexible Biodge device 5.4.0 to stretch, and two points of flexible Biodge device 5.4.0 can be bonded with each other, and two
Individual point of flexible Biodge device 5.4.0 also engages with the micropositioner side at respective place, is so erected between two micropositioners for leaching
Do not have the bridge floor that liquid 7 passes through, identical with embodiment one, two are divided to the bridge floor and two micropositioners that flexible Biodge device 5.4.0 is formed
Table top is all in approximately the same plane.
Above-described embodiment is described the utility model, but the utility model is not limited only to above-described embodiment.Obviously
Those skilled in the art can carry out various changes and modification without departing from spirit of the present utility model and model to utility model
Enclose.So, if these modifications and variations of the present utility model belong to the model of the utility model claims and its equivalent technologies
Within enclosing, then the utility model is also intended to including these changes and modification.
Claims (16)
1. a kind of immersed photoetching machine base station system, below immersion fluid system, the immersion fluid system maintains immersion liquid, its
It is characterised by, the immersed photoetching machine base station system includes two or more transfer platforms for being used for bearing basement, institute
The side for stating one or more of transfer platform is fixed with flexible Biodge device, described flexible when the flexible Biodge device stretching, extension
Biodge device all engages the side of two transfer platforms, the immersion liquid is transferred to another point from a transfer platform
On dynamic platform.
2. immersed photoetching machine base station system as claimed in claim 1, it is characterised in that the flexible Biodge device stretching, extension
When, the surface of the flexible Biodge device and the table top of the transfer platform are located at approximately the same plane.
3. immersed photoetching machine base station system as claimed in claim 2, it is characterised in that the flexible Biodge device is flexible
Harden structure, the flexible Biodge device are fixed on the side of the transfer platform by hinge.
4. immersed photoetching machine base station system as claimed in claim 3, it is characterised in that each flexible Biodge device with
It is provided with sealing strip between being hinged the side of fixed transfer platform.
5. immersed photoetching machine base station system as claimed in claim 2, it is characterised in that the flexible Biodge device is by some
Individual expansion plate main body is hinged to be formed.
6. immersed photoetching machine base station system as claimed in claim 2, it is characterised in that the flexible Biodge device is by two
Divide flexible Biodge device composition, be divided to flexible Biodge device to be separately positioned on two relative sides of the transfer platform described in two.
7. immersed photoetching machine base station system as claimed in claim 5, it is characterised in that set between the expansion plate main body
There is sealing strip.
8. immersed photoetching machine base station system as claimed in claim 3, it is characterised in that also set on each transfer platform
It is equipped with for driving the flexible drive device of the flexible Biodge device.
9. immersed photoetching machine base station system as claimed in claim 8, it is characterised in that the drive device includes power
Cylinder.
10. immersed photoetching machine base station system as claimed in claim 8, it is characterised in that the drive device, the hinge
Chain and the flexible Biodge device composition slider-crank mechanism.
11. immersed photoetching machine base station system as claimed in claim 2, it is characterised in that the width of the flexible Biodge device
Degree is more than the diameter for the immersion liquid field that the immersion liquid is formed.
12. immersed photoetching machine base station system as claimed in claim 2, it is characterised in that any transfer platform is under
It is supreme to be arranged on the micropositioner side including a coarse motion platform and the micropositioner for following the coarse motion platform to move, the flexible Biodge device
Face, the flexible Biodge device extend to the side of the micropositioner with another transfer platform engage when, the table of the flexible Biodge device
Face and the table top of the micropositioner are generally aligned in the same plane.
13. immersed photoetching machine base station system as claimed in claim 12, it is characterised in that the micropositioner with it is described thick
It is magnetic suspension structure or air floating structure between dynamic platform.
14. immersed photoetching machine base station system as claimed in claim 12, it is characterised in that be provided with the coarse motion platform
Anticollision module, for preventing from bumping against with the coarse motion platform of another transfer platform.
15. immersed photoetching machine base station system as claimed in claim 12, it is characterised in that the side of the micropositioner is also
Strip mirror is fixed with, the height where the strip mirror is less than the height where the flexible Biodge device.
16. a kind of immersed photoetching machine, it is characterised in that including the immersion as described in any one in claim 1~15
Litho machine base station system.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720337572.8U CN207051662U (en) | 2017-03-31 | 2017-03-31 | Immersed photoetching machine base station system, immersed photoetching machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720337572.8U CN207051662U (en) | 2017-03-31 | 2017-03-31 | Immersed photoetching machine base station system, immersed photoetching machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207051662U true CN207051662U (en) | 2018-02-27 |
Family
ID=61489811
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201720337572.8U Active CN207051662U (en) | 2017-03-31 | 2017-03-31 | Immersed photoetching machine base station system, immersed photoetching machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN207051662U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108663906A (en) * | 2017-03-31 | 2018-10-16 | 上海微电子装备（集团）股份有限公司 | Immersed photoetching machine base station system, immersed photoetching machine |
-
2017
- 2017-03-31 CN CN201720337572.8U patent/CN207051662U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108663906A (en) * | 2017-03-31 | 2018-10-16 | 上海微电子装备（集团）股份有限公司 | Immersed photoetching machine base station system, immersed photoetching machine |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN104155851A (en) | Femtosecond-laser and two-photon polymerization micro-nano machining system and method | |
| KR100858980B1 (en) | Dual Stage Lithographic Apparatus and Device Manufacturing method | |
| TWI301565B (en) | Lithographic apparatus and lithographic product produced thereby | |
| CN101164015B (en) | Liquid immersion lithography system comprising a tilted showerhead | |
| CN101038446A (en) | Lithographic apparatus and device manufacturing method | |
| KR20190069306A (en) | Imprint system and imprinting process with spatially nonuniform illumination | |
| CN207051662U (en) | Immersed photoetching machine base station system, immersed photoetching machine | |
| CN1758143A (en) | Lithographic apparatus and device manufacturing method | |
| CN107443731A (en) | Photocuring 3 D-printing device and its Method of printing based on ultraviolet LED micro display technology | |
| CN100399194C (en) | Polar coordinate directly writing-in method and device based on micro optical array multiple spot exposure | |
| CN1797208A (en) | Lithographic apparatus and device manufacturing method | |
| CN105690754A (en) | Photo-curing 3D printing method, equipment and image exposure system thereof | |
| WO2015165336A1 (en) | Integrated coarse and fine moving mask table driven by planar motor | |
| CN101672804A (en) | Detection device and defect detection method for liquid crystal display substrate | |
| CN107561866B (en) | Double workpiece platform device and immersed photoetching machine for immersed photoetching machine | |
| CN108062003A (en) | A kind of write-through screen printing system and method for platemaking | |
| CN108062006A (en) | The write-through screen printing system and method for platemaking of a kind of automatic top and bottom plate | |
| CN108663906A (en) | Immersed photoetching machine base station system, immersed photoetching machine | |
| CN101038442A (en) | Lithographic apparatus and device manufacturing method | |
| CN203101813U (en) | Exposure machine | |
| CN206523740U (en) | A kind of write-through screen printing equipment | |
| US8130365B2 (en) | Immersion flow field maintenance system for an immersion lithography machine | |
| CN103472689A (en) | Photoetching image device and method for realizing super-resolution imaging through enhancing illumination numerical aperture | |
| CN106873314A (en) | The digitlization made for high accuracy half tone is two-sided while direct write exposure sources | |
| CN108170007B (en) | High-precision 3D printing device and printing method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |