TWM522468U - Light emitting device - Google Patents

Light emitting device Download PDF

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Publication number
TWM522468U
TWM522468U TW104217957U TW104217957U TWM522468U TW M522468 U TWM522468 U TW M522468U TW 104217957 U TW104217957 U TW 104217957U TW 104217957 U TW104217957 U TW 104217957U TW M522468 U TWM522468 U TW M522468U
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Taiwan
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electrode
contact
light
emitting element
semiconductor layer
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TW104217957U
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Chinese (zh)
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金彰淵
孫成壽
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首爾偉傲世有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/64Heat extraction or cooling elements
    • H01L33/647Heat extraction or cooling elements the elements conducting electric current to or from the semiconductor body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/36Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
    • H01L33/38Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/62Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls

Description

發光元件Light-emitting element

本新型創作是有關於一種發光元件,且特別是有關於一種包含可提高發光元件的熱特性、電特性及發光特性的電極的發光元件。The present invention relates to a light-emitting element, and more particularly to a light-emitting element comprising an electrode which can improve the thermal, electrical and luminescent properties of the light-emitting element.

最近,隨著對小型且高功率的發光元件的要求增加,對散熱效率優異的大面積倒裝晶片(flip chip)型發光元件的需求增加。倒裝晶片型發光元件的電極直接接合到二次基板,另外,不在倒裝晶片型發光元件中利用用以供給外部電源的導線(wire),因此與水平式發光元件相比,散熱效率非常高。因此,即便施加高密度電流,也可有效地向二次基板側傳遞熱,故而倒裝晶片型發光元件適於用作高功率發光源。Recently, as the demand for small-sized and high-power light-emitting elements has increased, the demand for large-area flip chip type light-emitting elements having excellent heat dissipation efficiency has increased. The electrode of the flip chip type light-emitting element is directly bonded to the secondary substrate, and the wire for supplying the external power source is not used in the flip chip type light-emitting element, so that the heat dissipation efficiency is very high compared with the horizontal light-emitting element. . Therefore, even if a high-density current is applied, heat can be efficiently transferred to the secondary substrate side, so that the flip-chip type light-emitting element is suitable as a high-power light-emitting source.

另外,為了實現發光元件的小型化,對晶片級封裝體(Chip Scale Package)的需求增加,所述晶片級封裝體是省略將發光元件封裝(packaging)到格外的外殼(housing)等的製程而將發光元件本身用作封裝體(package)。倒裝晶片型發光元件的電極可發揮類似於封裝體的引線(lead)的功能,故而也可在這種晶片級封裝體中有用地應用倒裝晶片型發光元件。In addition, in order to achieve miniaturization of a light-emitting element, there is an increasing demand for a chip-scale package which omits a process of packaging a light-emitting element to an extra-housing housing. The light-emitting element itself is used as a package. The electrode of the flip chip type light-emitting element can function similarly to the lead of the package, and therefore, a flip-chip type light-emitting element can be usefully used in such a wafer-level package.

在將這種晶片級封裝體形態的元件用作高功率發光裝置的情況下,高密度的電流施加到所述晶片級封裝體。在此情況下,在驅動高功率晶片級封裝體時,發生電流向形成有N型電極的區域集中的現象。因此,所述晶片級封裝體的發光集中到形成有N型電極的區域,另外,這個部分的發熱也變嚴重。如上所述,在發光元件的特定區域集中性地發光及發熱,從而發光不均勻且發光元件的散熱效率下降而對發光元件的可靠性及壽命造成不良影響。In the case where such a wafer-level package-formed element is used as a high-power light-emitting device, a high-density current is applied to the wafer-level package. In this case, when the high-power wafer-level package is driven, a phenomenon in which current concentrates in the region where the N-type electrode is formed occurs. Therefore, the light emission of the wafer-level package is concentrated to the region where the N-type electrode is formed, and in addition, the heat generation of this portion is also severe. As described above, in a specific region of the light-emitting element, light is emitted and heat is concentrated, and the light emission is uneven, and the heat radiation efficiency of the light-emitting element is lowered to adversely affect the reliability and life of the light-emitting element.

[新型創作欲解決的課題][Questions to be solved by new creations]

本新型創作欲解決的課題在於提供一種在整體上具有均勻的發光特性且散熱效率優異的發光元件。 [解決課題的手段]An object of the present invention is to provide a light-emitting element which has uniform light-emitting characteristics as a whole and which is excellent in heat dissipation efficiency. [Means for solving the problem]

本新型創作的一方面的發光元件包含:發光結構體,其包含第一導電型半導體層、第二導電型半導體層、及位於所述第一導電型半導體層與第二導電型半導體層之間的活性層;第一接觸電極(contact electrode)及第二接觸電極,位於所述發光結構體上,分別與所述第一導電型半導體層及第二導電型半導體層歐姆接觸(ohmic contact);第一絕緣部及第二絕緣部,局部地覆蓋所述第一接觸電極及第二接觸電極;第一電極及第二電極,位於所述發光結構體上,分別電連接到所述第一接觸電極及第二接觸電極;第三絕緣部,其覆蓋所述第一電極及第二電極的側面;連接層,其位於所述第一電極、第二電極及第三絕緣部上;及第一焊墊電極(pad electrode)及第二焊墊電極,位於所述連接層上;且所述第一焊墊電極及第二焊墊電極通過所述連接層而分別電連接到所述第一電極及第二電極,所述第一焊墊電極的水平面積小於所述第一電極的水平面積,所述第二焊墊電極的水平面積大於所述第二電極的水平面積。The light-emitting element of one aspect of the present invention includes: a light-emitting structure including a first conductive semiconductor layer, a second conductive semiconductor layer, and between the first conductive semiconductor layer and the second conductive semiconductor layer The active layer; the first contact electrode and the second contact electrode are located on the light emitting structure, and are in ohmic contact with the first conductive type semiconductor layer and the second conductive type semiconductor layer; The first insulating portion and the second insulating portion partially cover the first contact electrode and the second contact electrode; the first electrode and the second electrode are located on the light emitting structure, and are electrically connected to the first contact respectively An electrode and a second contact electrode; a third insulating portion covering a side surface of the first electrode and the second electrode; a connection layer on the first electrode, the second electrode, and the third insulating portion; and the first a pad electrode and a second pad electrode are disposed on the connection layer; and the first pad electrode and the second pad electrode are electrically connected to the first through the connection layer The first electrode and the second electrode, the horizontal area of the first pad electrode is smaller than the horizontal area of the first electrode, and the horizontal area of the second pad electrode is larger than the horizontal area of the second electrode.

由此,發光元件的散熱效率提高,從而可提高可靠性及壽命,可提供具有均勻的發光特性的發光元件。Thereby, the heat dissipation efficiency of the light-emitting element is improved, reliability and life can be improved, and a light-emitting element having uniform light-emitting characteristics can be provided.

所述第一電極可位於所述第一接觸電極與所述第一導電型半導體層歐姆接觸的部分上。The first electrode may be located on a portion of the first contact electrode that is in ohmic contact with the first conductive type semiconductor layer.

另外,所述第一接觸電極與所述第一導電型半導體層歐姆接觸的部分可不位於所述第二電極的下方。In addition, a portion of the first contact electrode that is in ohmic contact with the first conductive type semiconductor layer may not be located below the second electrode.

所述第一接觸電極可包含與所述第一導電型半導體層接觸而實現歐姆接觸的多個歐姆接觸區域,所述第一電極可與所述第一接觸電極的所述多個歐姆接觸區域全部接觸。The first contact electrode may include a plurality of ohmic contact regions in contact with the first conductive type semiconductor layer to achieve ohmic contact, and the first electrode may be in contact with the plurality of ohmic contact regions of the first contact electrode All contact.

另外,所述第一接觸電極可包含與所述第一導電型半導體層接觸而實現歐姆接觸的多個歐姆接觸區域,所述多個歐姆接觸區域中僅一部分可與所述第一電極接觸。Additionally, the first contact electrode may include a plurality of ohmic contact regions in contact with the first conductive type semiconductor layer to achieve ohmic contact, and only a portion of the plurality of ohmic contact regions may be in contact with the first electrode.

進而,所述發光元件還可包含:第一配線層,其位於所述第一電極的下方;及第二配線層,其位於所述第二電極的下方;且所述第一配線層的一部分可與所述第一接觸電極接觸,所述第二配線層的一部分可與所述第二接觸電極接觸。Further, the light emitting element may further include: a first wiring layer located under the first electrode; and a second wiring layer located under the second electrode; and a portion of the first wiring layer A first contact electrode may be in contact, and a portion of the second wiring layer may be in contact with the second contact electrode.

所述第二絕緣部的一部分可位於所述第一配線層與所述第一接觸電極之間。A portion of the second insulating portion may be located between the first wiring layer and the first contact electrode.

所述第一電極的水平截面面積可為所述第一電極與第二電極各自的水平截面面積之和的0.8倍以上且小於1倍。The horizontal cross-sectional area of the first electrode may be 0.8 times or more and less than 1 time of a sum of horizontal cross-sectional areas of the first electrode and the second electrode.

另外,所述第一焊墊電極的水平面積與所述第二焊墊電極的水平面積可相同。In addition, the horizontal area of the first pad electrode and the horizontal area of the second pad electrode may be the same.

所述連接層可包含絕緣物質層;第一連接層,其將所述第一電極與所述第一焊墊電極電連接,且貫通所述絕緣物質層;及第二連接層,其將所述第二電極與所述第二焊墊電極電連接,且貫通所述絕緣物質層。The connection layer may include an insulating material layer; a first connection layer electrically connecting the first electrode to the first pad electrode and penetrating the insulating material layer; and a second connection layer The second electrode is electrically connected to the second pad electrode and penetrates the insulating material layer.

所述第二電極可形成為多個,所述第二電極可電連接至所述第二焊墊電極。The second electrode may be formed in plurality, and the second electrode may be electrically connected to the second pad electrode.

進而,所述第一接觸電極可包含與所述第一導電型半導體層接觸而實現歐姆接觸的多個歐姆接觸區域,所述多個歐姆接觸區域中的一部分可配置到所述第二電極之間。Further, the first contact electrode may include a plurality of ohmic contact regions in contact with the first conductive type semiconductor layer to achieve ohmic contact, and a portion of the plurality of ohmic contact regions may be disposed to the second electrode between.

所述第一電極及第二電極可分別包含金屬粒子及介置在所述金屬粒子之間的非金屬性物質。The first electrode and the second electrode may respectively include metal particles and a non-metallic substance interposed between the metal particles.

進而,所述金屬粒子與所述非金屬性物質可形成為金屬粒子燒結體形態。Further, the metal particles and the non-metallic substance may be formed into a sintered form of a metal particle.

所述第一電極及第二電極可分別包含傾斜側面,所述傾斜側面可包含第一電極及第二電極各自的垂直剖面的切線傾斜度發生變化的側面。The first electrode and the second electrode may each include an inclined side surface, and the inclined side surface may include a side surface in which a tangential inclination of each of the first electrode and the second electrode changes.

另外,所述第一電極及第二電極可分別包含80至98 wt%的金屬粒子。In addition, the first electrode and the second electrode may respectively contain 80 to 98 wt% of metal particles.

在若干實施例中,所述發光元件的所述發光結構體還可包含所述活性層及所述第二導電型半導體層被局部地去除而局部地露出所述第一導電型半導體層的區域,所述第一接觸電極可通過局部地露出所述第一導電型半導體層的區域而與所述第一導電型半導體層歐姆接觸。In some embodiments, the light emitting structure of the light emitting element may further include an area in which the active layer and the second conductive type semiconductor layer are partially removed to partially expose the first conductive type semiconductor layer The first contact electrode may be in ohmic contact with the first conductive type semiconductor layer by partially exposing a region of the first conductive type semiconductor layer.

另外,局部地露出所述第一導電型半導體層的區域可形成為多個孔(hole)形態。Further, a region where the first conductive semiconductor layer is partially exposed may be formed in a plurality of hole forms.

進而,所述第二接觸電極可位於所述第二導電型半導體層上,所述第一絕緣部覆蓋所述第二接觸電極及發光結構體,可包含第一開口部及第二開口部,所述第一開口部及第二開口部分別使露出所述第一導電型半導體層的區域的一部分及所述第二接觸電極的一部分露出,所述第一接觸電極至少局部地覆蓋所述第一絕緣部,可通過所述第一開口部而與所述第一導電型半導體層接觸,所述第二絕緣部局部地覆蓋所述第一接觸電極,可包含第三開口部及第四開口部,所述第三開口部使所述第一接觸電極局部地露出,所述第四開口部與所述第二開口部的位置對應地配置而使所述第二接觸電極的一部分露出。Furthermore, the second contact electrode may be located on the second conductive semiconductor layer, and the first insulating portion may cover the second contact electrode and the light emitting structure, and may include a first opening portion and a second opening portion. The first opening portion and the second opening portion respectively expose a portion of the region where the first conductive type semiconductor layer is exposed and a portion of the second contact electrode, and the first contact electrode at least partially covers the first portion An insulating portion may be in contact with the first conductive type semiconductor layer through the first opening portion, the second insulating portion partially covering the first contact electrode, and may include a third opening portion and a fourth opening The third opening portion partially exposes the first contact electrode, and the fourth opening portion is disposed corresponding to a position of the second opening portion to expose a portion of the second contact electrode.

所述第一電極可通過所述第三開口部而與所述第一接觸電極接觸,所述第二電極可通過所述第四開口部而與所述第二接觸電極接觸,所述多個孔均可位於所述第三開口部區域的下方。 [新型創作效果]The first electrode may be in contact with the first contact electrode through the third opening portion, and the second electrode may be in contact with the second contact electrode through the fourth opening portion, the plurality of The holes may be located below the third opening portion area. [New creative effect]

根據本新型創作,包含具有相對大於第二電極的水平截面面積的第一電極,由此發光元件的散熱效率提高,從而可提高可靠性及壽命。另外,可提供一種第一電極在發光元件中所佔據的區域的比率增加而發光元件在整體上具有均勻的發光特性的發光元件。According to the novel creation, the first electrode having a horizontal cross-sectional area larger than that of the second electrode is included, whereby the heat dissipation efficiency of the light-emitting element is improved, thereby improving reliability and life. In addition, it is possible to provide a light-emitting element in which the ratio of the area occupied by the first electrode in the light-emitting element is increased and the light-emitting element has uniform light-emitting characteristics as a whole.

以下,參照附圖,詳細地對本新型創作的實施例進行說明。以下所介紹的實施例是為了可向本新型創作所屬技術領域的普通技術人員充分地傳達本新型創作的思想而提供作示例的實施例。因此,本新型創作並不限定於以下所說明的實施例,也可具體化成其他形態。並且,在圖中,為了便於說明,也可誇張表示構成要素的寬度、長度、厚度等。另外,在記載為一個構成要素處於另一構成要素的「上部」或「上」的情況下,不僅包含各部分處於另一部分的「正上部」或「正上方」的情況,而且還包含在各構成要素與另一構成要素之間介置有又一構成要素的情況。在整篇說明書中,相同的標號表示相同的構成要素。Hereinafter, an embodiment of the present novel creation will be described in detail with reference to the accompanying drawings. The embodiments described below are provided to provide exemplary embodiments for the purpose of fully conveying the inventive concept to those of ordinary skill in the art. Therefore, the present invention is not limited to the embodiments described below, and may be embodied in other forms. Further, in the drawings, the width, length, thickness, and the like of the constituent elements may be exaggerated for convenience of explanation. In addition, when it is described that one component is "upper" or "upper" of another component, not only the case where each part is "directly above" or "directly above" but also included A case where another component is interposed between the component and the other component. Throughout the specification, the same reference numerals denote the same constituent elements.

圖1(a)、圖1(b)及圖2是用以說明本新型創作的一實施例的發光元件的俯視圖及剖面圖。1(a), 1(b) and 2 are a plan view and a cross-sectional view for explaining a light-emitting element of an embodiment of the present invention.

圖1(a)是發光元件100a的俯視圖,圖1(b)是用以說明孔120h的位置及第三開口部153a與第四開口部153b的位置的俯視圖,圖2是表示與圖1(a)及圖1(b)的A-A線對應的區域的剖面的剖面圖。1(a) is a plan view of the light-emitting element 100a, and FIG. 1(b) is a plan view for explaining the position of the hole 120h and the positions of the third opening 153a and the fourth opening 153b, and FIG. 2 is a view similar to FIG. a) A cross-sectional view of a cross section of a region corresponding to the AA line of Fig. 1(b).

參照圖1(a)、圖1(b)及圖2,發光元件100a可包含:發光結構體120,其包含第一導電型半導體層121、活性層123及第二導電型半導體層125;第一接觸電極130;第二接觸電極140;第一絕緣部151及第二絕緣部153;第一電極161;第二電極163;及第三絕緣部170。進而,發光元件100a還可包含第一焊墊電極及第二焊墊電極(未圖示)、成長基板(未圖示)及波長轉換部(未圖示)。1(a), 1(b) and 2, the light emitting device 100a may include a light emitting structure 120 including a first conductive semiconductor layer 121, an active layer 123, and a second conductive semiconductor layer 125; a contact electrode 130; a second contact electrode 140; a first insulating portion 151 and a second insulating portion 153; a first electrode 161; a second electrode 163; and a third insulating portion 170. Further, the light-emitting element 100a may further include a first pad electrode and a second pad electrode (not shown), a growth substrate (not shown), and a wavelength conversion portion (not shown).

發光結構體120可包含:第一導電型半導體層121;活性層123,其位於第一導電型半導體層121上;及第二導電型半導體層125,其位於活性層123上。第一導電型半導體層121、活性層123及第二導電型半導體層125可包含Ⅲ-Ⅴ族化合物半導體,例如可包含如(Al、Ga、In)N的氮化物類半導體。第一導電型半導體層121可包含n型雜質(例如,Si),第二導電型半導體層125可包含p型雜質(例如,Mg)。另外,也可相反。活性層123可包含多量子阱結構(MQW)。The light emitting structure 120 may include: a first conductive type semiconductor layer 121; an active layer 123 on the first conductive type semiconductor layer 121; and a second conductive type semiconductor layer 125 on the active layer 123. The first conductive semiconductor layer 121, the active layer 123, and the second conductive semiconductor layer 125 may include a group III-V compound semiconductor, and for example, may include a nitride-based semiconductor such as (Al, Ga, In)N. The first conductive type semiconductor layer 121 may include an n-type impurity (for example, Si), and the second conductive type semiconductor layer 125 may include a p-type impurity (for example, Mg). Alternatively, it can be reversed. The active layer 123 may comprise a multiple quantum well structure (MQW).

另外,發光結構體120可包含第二導電型半導體層125及活性層123被局部地去除而局部地露出第一導電型半導體層121的區域。例如,如圖所示,發光結構體120可包含至少一個孔120h,所述孔120h貫通第二導電型半導體層125及活性層123而使第一導電型半導體層121露出。In addition, the light emitting structure 120 may include a region in which the second conductive semiconductor layer 125 and the active layer 123 are partially removed to partially expose the first conductive semiconductor layer 121. For example, as shown in the figure, the light emitting structure 120 may include at least one hole 120h that penetrates the second conductive semiconductor layer 125 and the active layer 123 to expose the first conductive semiconductor layer 121.

孔120h可形成為多個,多個孔120h可大致規則性地配置。例如,如圖1(a)、圖1(b)所示,孔120h能夠以按照固定間隔呈固定圖案(pattern)的方式配置。跨及發光結構體整體而規則性地配置孔120h,由此在驅動發光元件100a時,電流可沿水平方向均勻地分散。然而,本新型創作並不限定於此,孔120h的配置形態及個數可實現多種變形。The holes 120h may be formed in plurality, and the plurality of holes 120h may be arranged substantially regularly. For example, as shown in FIG. 1(a) and FIG. 1(b), the holes 120h can be arranged in a fixed pattern at regular intervals. The holes 120h are regularly arranged across the entire light-emitting structure, whereby the current can be uniformly dispersed in the horizontal direction when the light-emitting element 100a is driven. However, the present invention is not limited to this, and the configuration and the number of the holes 120h can be variously modified.

另外,露出第一導電型半導體層121的形態並不限定於孔120h形態。例如,露出第一導電型半導體層121的區域可形成為線(line)形態、孔與線複合而成的形態等。在露出第一導電型半導體層121的區域形成為多個線形態的情況下,發光結構體120還可包含一個以上的檯面(mesa),所述檯面沿所述線形成,且包含活性層123及第二導電型半導體層125。因此,在本實施例中,以包含多個孔120h的發光結構體120為基準對本新型創作進行說明,但本新型創作並不限定於此。Further, the form in which the first conductive semiconductor layer 121 is exposed is not limited to the form of the hole 120h. For example, a region in which the first conductive semiconductor layer 121 is exposed may be formed in a line form, a form in which a hole and a line are combined, and the like. In a case where a region in which the first conductive semiconductor layer 121 is exposed is formed in a plurality of line forms, the light emitting structure 120 may further include one or more mesa formed along the line and including the active layer 123 And a second conductive semiconductor layer 125. Therefore, in the present embodiment, the novel creation is described on the basis of the light-emitting structure 120 including the plurality of holes 120h, but the present invention is not limited thereto.

發光結構體120還可包含形成在其下表面的粗糙表面120R。粗糙表面120R可利用濕式蝕刻、乾式蝕刻、電化學蝕刻中的至少一個方法形成,例如可利用光電化學(Photoelectrochemical,PEC)蝕刻或利用包含KOH及NaOH的蝕刻溶液的蝕刻方法等形成粗糙表面120R。因形成粗糙表面120R而可包含形成在第一導電型半導體層121的表面的μm至nm級的凸出部及/或凹陷部。通過在發光結構體120的表面形成粗糙表面,可提高發光元件的提取效率。The light emitting structure 120 may further include a rough surface 120R formed on a lower surface thereof. The rough surface 120R may be formed by at least one of wet etching, dry etching, and electrochemical etching. For example, a rough surface 120R may be formed by photoelectrochemical (PEC) etching or an etching method using an etching solution containing KOH and NaOH. . The protrusions and/or depressions of the μm to nm level formed on the surface of the first conductive type semiconductor layer 121 may be included due to the formation of the rough surface 120R. By forming a rough surface on the surface of the light-emitting structure 120, the extraction efficiency of the light-emitting element can be improved.

另外,發光結構體120還可包含位於第一導電型半導體層121的下方的成長基板(未圖示)。成長基板只要為可使發光結構體120成長的基板,則無限定。例如,所述成長基板可為藍寶石(sapphire)基板、碳化矽(silicon carbide)基板、矽(silicon)基板、氮化鎵(gallium nitride)基板、氮化鋁(aluminium nitride)基板等。這種成長基板可利用公知的技術從發光結構體120分離去除。In addition, the light emitting structure 120 may further include a growth substrate (not shown) located below the first conductive semiconductor layer 121. The growth substrate is not limited as long as it is a substrate that can grow the light-emitting structure 120. For example, the growth substrate may be a sapphire substrate, a silicon carbide substrate, a silicon substrate, a gallium nitride substrate, an aluminum nitride substrate, or the like. Such a growth substrate can be separated and removed from the light-emitting structure 120 by a known technique.

第二接觸電極140位於第二導電型半導體層125上。第二接觸電極140至少局部地覆蓋第二導電型半導體層125的上表面,可與第二導電型半導體層125歐姆接觸。另外,第二接觸電極140能夠以覆蓋第二導電型半導體層125的上表面整體的方式配置。即,能夠以如下方式形成:在除發光結構體120的形成有孔120h的位置以外的剩餘區域,以單體覆蓋第二導電型半導體層125的上表面。由此,可對發光結構體120整體均勻地供給電流而提高電流分散效率。The second contact electrode 140 is located on the second conductive type semiconductor layer 125. The second contact electrode 140 at least partially covers the upper surface of the second conductive type semiconductor layer 125 and is in ohmic contact with the second conductive type semiconductor layer 125. Further, the second contact electrode 140 can be disposed to cover the entire upper surface of the second conductive semiconductor layer 125. In other words, it is possible to cover the upper surface of the second conductive semiconductor layer 125 with a single body except for the remaining region except the position where the hole 120h is formed in the light emitting structure 120. Thereby, a current can be uniformly supplied to the entire light-emitting structure 120 to improve the current dispersion efficiency.

然而,本新型創作並不限定於此,也可為第二接觸電極140不形成為一體,而在第二導電型半導體層125的上表面上配置彼此隔開的多個單位反射電極層。在此情況下,所述單位反射電極層可通過特定的連接部而彼此電連接。However, the present invention is not limited thereto, and the second contact electrode 140 may not be integrally formed, and a plurality of unit reflective electrode layers spaced apart from each other may be disposed on the upper surface of the second conductive semiconductor layer 125. In this case, the unit reflective electrode layers may be electrically connected to each other through a specific connection portion.

第二接觸電極140可包含可與第二導電型半導體層125歐姆接觸的物質,例如可包含金屬物質及/或導電性氧化物。The second contact electrode 140 may include a substance that can be in ohmic contact with the second conductive type semiconductor layer 125, and may include, for example, a metal substance and/or a conductive oxide.

在第二接觸電極140包含金屬物質的情況下,第二接觸電極140可包含反射層及覆蓋所述反射層的覆蓋層(cover layer)。如上所述,第二接觸電極140與第二導電型半導體層125歐姆接觸,同時可發揮反射光的功能。因此,所述反射層具有較高的反射度,並且可包含可與第二導電型半導體層125形成歐姆接觸的金屬。例如,所述反射層可包含Ni、Pt、Pd、Rh、W、Ti、Al、Mg、Ag及Au中的至少一種。另外,所述反射層可包含單層或多層。In the case where the second contact electrode 140 includes a metal substance, the second contact electrode 140 may include a reflective layer and a cover layer covering the reflective layer. As described above, the second contact electrode 140 is in ohmic contact with the second conductive type semiconductor layer 125, and at the same time functions as a reflected light. Therefore, the reflective layer has a higher reflectance and may include a metal that can form an ohmic contact with the second conductive type semiconductor layer 125. For example, the reflective layer may include at least one of Ni, Pt, Pd, Rh, W, Ti, Al, Mg, Ag, and Au. Additionally, the reflective layer may comprise a single layer or multiple layers.

所述覆蓋層可防止所述反射層與其他物質間的相互擴散,可防止外部的其他物質擴散到所述反射層而破壞所述反射層。因此,所述覆蓋層能夠以覆蓋所述反射層的下表面及側面的方式形成。所述覆蓋層可與所述反射層一同與第二導電型半導體層125電連接,故而可與所述反射層一同發揮電極作用。所述覆蓋層例如可包含Au、Ni、Ti、Cr等,也可包含單層或多層。The cover layer prevents interdiffusion between the reflective layer and other substances, and prevents other external substances from diffusing to the reflective layer to destroy the reflective layer. Therefore, the cover layer can be formed to cover the lower surface and the side surface of the reflective layer. The cover layer may be electrically connected to the second conductive type semiconductor layer 125 together with the reflective layer, and thus may function as an electrode together with the reflective layer. The cover layer may, for example, comprise Au, Ni, Ti, Cr, etc., and may also comprise a single layer or multiple layers.

另一方面,在第二接觸電極140包含導電性氧化物的情況下,所述導電性氧化物可為氧化銦錫(Indium Tin Oxides,ITO)、氧化鋅(Zinc Oxid,ZnO)、氧化鋁鋅(Aluminum Zinc Oxide,AZO)、氧化銦鋅(Indium Zinc Oxide,IZO)等。在第二接觸電極140包含導電性氧化物的情況下,與包含金屬的情況相比,可覆蓋更廣區域的第二導電型半導體層125的上表面。即,在第二接觸電極140由導電性氧化物形成的情況下,可相對更短地形成從孔120h的上部邊緣到第二接觸電極140為止的隔開距離。在此情況下,從第二接觸電極140與第二導電型半導體層125接觸的部分到第一接觸電極130與第一導電型半導體層121接觸的部分為止的最短距離可相對變得更短,故而可減少發光元件100a的正向電壓(Vf)。On the other hand, in the case where the second contact electrode 140 includes a conductive oxide, the conductive oxide may be indium tin oxide (ITO), zinc oxide (Zinc Oxid, ZnO), or aluminum zinc oxide. (Aluminum Zinc Oxide, AZO), Indium Zinc Oxide (IZO), and the like. In the case where the second contact electrode 140 includes a conductive oxide, the upper surface of the second conductive type semiconductor layer 125 in a wider area can be covered than in the case of containing a metal. That is, in the case where the second contact electrode 140 is formed of a conductive oxide, the separation distance from the upper edge of the hole 120h to the second contact electrode 140 can be formed relatively shorter. In this case, the shortest distance from the portion where the second contact electrode 140 is in contact with the second conductive type semiconductor layer 125 to the portion where the first contact electrode 130 is in contact with the first conductive type semiconductor layer 121 can be relatively shorter. Therefore, the forward voltage (Vf) of the light-emitting element 100a can be reduced.

第一絕緣部151及第二絕緣部153可局部地覆蓋第一接觸電極130及第二接觸電極140。以下,首先對第一絕緣部151進行說明,之後對與第二絕緣部153相關的內容進行說明。The first insulating portion 151 and the second insulating portion 153 may partially cover the first contact electrode 130 and the second contact electrode 140. Hereinafter, the first insulating portion 151 will be described first, and then the content related to the second insulating portion 153 will be described.

第一絕緣部151可局部地覆蓋發光結構體120的上表面及第二接觸電極140。另外,第一絕緣部151覆蓋多個孔120h的側面,但可使孔120h露出的第一導電型半導體層121局部地露出。The first insulating portion 151 may partially cover the upper surface of the light emitting structure 120 and the second contact electrode 140. Further, the first insulating portion 151 covers the side faces of the plurality of holes 120h, but the first conductive type semiconductor layer 121 exposed by the holes 120h may be partially exposed.

進而,第一絕緣部151還可覆蓋發光結構體120的至少一部分的側面。第一絕緣部151覆蓋發光結構體120的側面的程度可根據在發光元件的製造過程中有無晶片單位單體化(isolation)而不同。即,如本實施例,第一絕緣部151還能夠以僅覆蓋發光結構體120的上表面的方式形成,在發光元件100a的製造過程中,在將晶圓(wafer)單體化成晶片單位後形成第一絕緣部151的情況下,可將第一絕緣部151覆蓋至發光結構體120的側面為止。Further, the first insulating portion 151 may also cover a side surface of at least a portion of the light emitting structure 120. The extent to which the first insulating portion 151 covers the side surface of the light emitting structure 120 may differ depending on whether or not wafer unit singulation occurs in the manufacturing process of the light emitting element. That is, as in the present embodiment, the first insulating portion 151 can also be formed to cover only the upper surface of the light emitting structure 120, and in the manufacturing process of the light emitting element 100a, after the wafer is singulated into wafer units In the case where the first insulating portion 151 is formed, the first insulating portion 151 may be covered to the side surface of the light emitting structure 120.

第一絕緣部151可包含:第一開口部,其位於與多個孔120h對應的部分;及第二開口部,其使第二接觸電極140的一部分露出。可通過第一開口部及孔120h局部地露出第一導電型半導體層121,可通過第二開口部局部地露出第二接觸電極140。The first insulating portion 151 may include a first opening portion located at a portion corresponding to the plurality of holes 120h, and a second opening portion exposing a portion of the second contact electrode 140. The first conductive semiconductor layer 121 may be partially exposed through the first opening and the hole 120h, and the second contact electrode 140 may be partially exposed through the second opening.

此時,第一開口部與第二開口部能夠以呈固定圖案的方式配置。例如,如圖1(a)、圖1(b)所示,第二開口部能夠以與發光元件100a的一側面鄰接的方式配置,第一開口部可規則性地配置到未配置所述第二開口部的區域。At this time, the first opening portion and the second opening portion can be arranged in a fixed pattern. For example, as shown in FIG. 1(a) and FIG. 1(b), the second opening portion may be disposed adjacent to one side surface of the light-emitting element 100a, and the first opening portion may be regularly arranged to be unconfigured. The area of the two openings.

第一絕緣部151可包含絕緣性物質,例如可包含SiO 2、SiN x、MgF 2等。進而,第一絕緣部151可包含多層,還可包含折射率不同的物質交替地積層而成的分佈布拉格反射器(distributed bragg reflector)。特別是,在第二接觸電極140包含導電性氧化物的情況下,第一絕緣部151包含分佈布拉格反射器而可提高發光元件100a的發光效率。 The first insulating portion 151 may include an insulating substance, and may include, for example, SiO 2 , SiN x , MgF 2 , or the like. Further, the first insulating portion 151 may include a plurality of layers, and may further include a distributed bragg reflector in which substances having different refractive indices are alternately laminated. In particular, in the case where the second contact electrode 140 includes a conductive oxide, the first insulating portion 151 includes a distributed Bragg reflector to improve the light-emitting efficiency of the light-emitting element 100a.

第一接觸電極130可局部地覆蓋發光結構體120,可通過多個孔120h及第一開口部而與第一導電型半導體層121歐姆接觸。因此,第一接觸電極130可包含與第一導電型半導體層121直接接觸而實現歐姆接觸的歐姆接觸區域131。在發光結構體120包含多個孔120h的情況下,所述歐姆接觸區域131也能夠以與孔120h的個數對應的個數形成為多個。The first contact electrode 130 may partially cover the light emitting structure 120 and may be in ohmic contact with the first conductive type semiconductor layer 121 through the plurality of holes 120h and the first opening. Therefore, the first contact electrode 130 may include an ohmic contact region 131 that is in direct contact with the first conductive type semiconductor layer 121 to achieve ohmic contact. When the light-emitting structure 120 includes a plurality of holes 120h, the ohmic contact regions 131 may be formed in plural numbers corresponding to the number of the holes 120h.

第一接觸電極130能夠以覆蓋第一絕緣部151的除一部分區域以外的其他部分整體的方式形成。另外,第一接觸電極130還能夠以覆蓋至發光結構體120的側面為止的方式形成。在第一接觸電極130也形成到發光結構體120的側面的情況下,可向上部反射從活性層123向側面發出的光而增加從發光元件100a的上表面發出的光的比率。另一方面,第一接觸電極130不形成到第一絕緣部151的與第二開口部對應的區域,與第二接觸電極140隔開而絕緣。The first contact electrode 130 can be formed to cover the entire portion of the first insulating portion 151 excluding a part of the region. In addition, the first contact electrode 130 can also be formed to cover the side surface of the light emitting structure 120. In the case where the first contact electrode 130 is also formed to the side surface of the light emitting structure 120, light emitted from the active layer 123 to the side surface can be reflected upward to increase the ratio of light emitted from the upper surface of the light emitting element 100a. On the other hand, the first contact electrode 130 is not formed in a region corresponding to the second opening portion of the first insulating portion 151, and is insulated from the second contact electrode 140.

第一接觸電極130以除一部分區域以外覆蓋發光結構體120的上表面整體的方式形成,由此可進一步提高電流分散效率。另外,可由第一接觸電極130覆蓋未由第二接觸電極140覆蓋的部分,因此可更有效地反射光而提高發光元件100a的發光效率。The first contact electrode 130 is formed to cover the entire upper surface of the light emitting structure 120 except for a part of the region, whereby the current dispersion efficiency can be further improved. In addition, the portion not covered by the second contact electrode 140 may be covered by the first contact electrode 130, so that light can be more efficiently reflected to improve the light-emitting efficiency of the light-emitting element 100a.

第一接觸電極130與第一導電型半導體層121歐姆接觸,同時可發揮反射光的作用。因此,第一接觸電極130可由單層或多層構成,可包含如Al層的高反射金屬層。所述高反射金屬層可形成到Ti、Cr或Ni等接著層上。然而,本新型創作並不限定於此,第一接觸電極130還可包含Ni、Pt、Pd、Rh、W、Ti、Al、Mg、Ag及Au中的至少一種。The first contact electrode 130 is in ohmic contact with the first conductive semiconductor layer 121 and functions as a reflected light. Therefore, the first contact electrode 130 may be composed of a single layer or a plurality of layers, and may include a highly reflective metal layer such as an Al layer. The highly reflective metal layer may be formed on an adhesion layer such as Ti, Cr or Ni. However, the novel creation is not limited thereto, and the first contact electrode 130 may further include at least one of Ni, Pt, Pd, Rh, W, Ti, Al, Mg, Ag, and Au.

第一接觸電極130通過孔120h而與第一導電型半導體層121歐姆接觸,因此為了形成與第一導電型半導體層121連接的電極等而被去除活性層123的區域與對應於多個孔120h的區域相同。因此,可將用以實現第一導電型半導體層121與金屬層的歐姆接觸的區域最小化,可提供發光區域的面積相對於整個發光結構體的水平面積的比率相對較大的發光元件。The first contact electrode 130 is in ohmic contact with the first conductive type semiconductor layer 121 through the hole 120h, and thus the region where the active layer 123 is removed in order to form an electrode or the like connected to the first conductive type semiconductor layer 121 corresponds to the plurality of holes 120h. The area is the same. Therefore, a region for achieving ohmic contact of the first conductive type semiconductor layer 121 with the metal layer can be minimized, and a light emitting element having a relatively large ratio of the area of the light emitting region to the horizontal area of the entire light emitting structure can be provided.

第二絕緣部153可局部地覆蓋第一接觸電極130。另外,第二絕緣部153可包含:第三開口部153a,其使第一接觸電極130局部地露出;及第四開口部153b,其使第二接觸電極140局部地露出。此時,第四開口部153b可形成到與第二開口部對應的位置。The second insulating portion 153 may partially cover the first contact electrode 130. In addition, the second insulating portion 153 may include a third opening portion 153a that partially exposes the first contact electrode 130, and a fourth opening portion 153b that partially exposes the second contact electrode 140. At this time, the fourth opening portion 153b can be formed to a position corresponding to the second opening portion.

第三開口部153a及第四開口部153b可分別形成一個以上。另外,如圖1(b)所示,第四開口部153b能夠以與發光元件100a的一側角隅鄰接的方式定位,第三開口部153a能夠以使形成有至少一部分的多個孔120h的位置露出的方式形成。進而,第三開口部153a能夠以使形成有所有孔120h的位置露出的方式形成。由此,歐姆接觸區域131可通過第三開口部153a露出。One or more of the third opening portion 153a and the fourth opening portion 153b may be formed separately. Further, as shown in FIG. 1(b), the fourth opening portion 153b can be positioned adjacent to one corner of the light-emitting element 100a, and the third opening portion 153a can be formed such that at least a part of the holes 120h are formed. The position is exposed in a way that is formed. Further, the third opening portion 153a can be formed to expose a position where all the holes 120h are formed. Thereby, the ohmic contact region 131 can be exposed through the third opening portion 153a.

第二絕緣部153可包含絕緣性物質,例如可包含SiO 2、SiN x、MgF 2。進而,第二絕緣部153可包含多層,還可包含折射率不同的物質交替地積層而成的分佈布拉格反射器。 The second insulating portion 153 may include an insulating substance, and may include, for example, SiO 2 , SiN x , MgF 2 . Further, the second insulating portion 153 may include a plurality of layers, and may further include a distributed Bragg reflector in which substances having different refractive indices are alternately laminated.

第一電極161及第二電極163可位於發光結構體120上,第一電極161及第二電極163可分別電連接到第一接觸電極130及第二接觸電極140。特別是,第一電極161及第二電極163可分別與第一接觸電極130及第二接觸電極140直接接觸而實現電連接。The first electrode 161 and the second electrode 163 may be located on the light emitting structure 120, and the first electrode 161 and the second electrode 163 may be electrically connected to the first contact electrode 130 and the second contact electrode 140, respectively. In particular, the first electrode 161 and the second electrode 163 can be in direct contact with the first contact electrode 130 and the second contact electrode 140 to achieve electrical connection.

另外,至少一部分孔120h可位於第一電極161的下方,進而,所有孔120h可位於第一電極161的下方。因此,第一接觸電極130的歐姆接觸區域131可介置到第一電極161與第一導電型半導體層121之間,另外,所有歐姆接觸區域131可與第一電極161直接接觸。In addition, at least a portion of the holes 120h may be located below the first electrode 161, and further, all of the holes 120h may be located below the first electrode 161. Therefore, the ohmic contact region 131 of the first contact electrode 130 may be interposed between the first electrode 161 and the first conductive type semiconductor layer 121, and in addition, all the ohmic contact regions 131 may be in direct contact with the first electrode 161.

另一方面,孔120h可不位於第二電極163的下方。即,第一接觸電極130與第一導電型半導體層121歐姆接觸的部分可不位於形成第二電極163的區域的下方。因此,如圖1(a)、圖1(b)所示,發光結構體120的孔120h可僅形成到發光元件100a的除與一側面鄰接的區域以外的剩餘部分。On the other hand, the hole 120h may not be located below the second electrode 163. That is, a portion where the first contact electrode 130 is in ohmic contact with the first conductive type semiconductor layer 121 may not be located below a region where the second electrode 163 is formed. Therefore, as shown in FIGS. 1(a) and 1(b), the hole 120h of the light-emitting structure 120 can be formed only to the remaining portion of the light-emitting element 100a except for a region adjacent to one side.

第一電極161及第二電極163可具有彼此不同的體積,第一電極161的體積可大於第二電極163的體積。另外,第一電極161及第二電極163的厚度可形成為約70 μm至80 μm以上,且可形成為大致相同的厚度。因此,第一電極161的水平截面面積可大於第二電極163的水平截面面積,例如第一電極161的水平截面面積可具有將第一電極161及第二電極163的水平截面面積相加所得的值的0.8倍以上且小於1倍的大小。The first electrode 161 and the second electrode 163 may have different volumes from each other, and the volume of the first electrode 161 may be larger than the volume of the second electrode 163. In addition, the thickness of the first electrode 161 and the second electrode 163 may be formed to be about 70 μm to 80 μm or more, and may be formed to be substantially the same thickness. Therefore, the horizontal cross-sectional area of the first electrode 161 may be greater than the horizontal cross-sectional area of the second electrode 163. For example, the horizontal cross-sectional area of the first electrode 161 may have a horizontal cross-sectional area of the first electrode 161 and the second electrode 163. The value is 0.8 times or more and less than 1 time.

即,所述發光元件100a包含水平截面面積與第二電極163的水平截面面積的相比非常大的第一電極161。在第一導電型半導體層121為N型半導體層的情況下,第一電極161也可作為N型電極而發揮功能,如上所述,在驅動發光元件100a時,發光及發熱集中在定位有第一電極161的區域。因此,通過像本實施例一樣以明顯大於第二電極163的水平截面面積的方式形成第一電極161的水平截面面積,可在發光元件100a的整個發光區域內使發光變均勻而提高發光特性,可通過第一電極161有效地散熱而提高發光元件100a的散熱效率。That is, the light-emitting element 100a includes the first electrode 161 having a horizontal cross-sectional area that is very large compared to the horizontal cross-sectional area of the second electrode 163. When the first conductive semiconductor layer 121 is an N-type semiconductor layer, the first electrode 161 can function as an N-type electrode. As described above, when the light-emitting element 100a is driven, light emission and heat generation are concentrated in positioning. The area of an electrode 161. Therefore, by forming the horizontal cross-sectional area of the first electrode 161 in a manner significantly larger than the horizontal cross-sectional area of the second electrode 163 as in the present embodiment, the light emission can be made uniform in the entire light-emitting region of the light-emitting element 100a to improve the light-emitting characteristics. The heat dissipation efficiency of the light-emitting element 100a can be improved by effectively dissipating heat through the first electrode 161.

而且,第一電極161與第一接觸電極130直接接觸,進而還可與第一接觸電極130的歐姆接觸區域131直接接觸。此時,歐姆接觸區域131與多個孔120h的位置對應,孔120h大致規則性地配置到發光結構體120整體。由此,可使電流沿水平方向均勻地分散而提高發光元件100a的電特性,可通過歐姆接觸區域131及第一電極161有效地向外部釋放發光結構體120所產生的熱。Moreover, the first electrode 161 is in direct contact with the first contact electrode 130, and thus may also be in direct contact with the ohmic contact region 131 of the first contact electrode 130. At this time, the ohmic contact region 131 corresponds to the position of the plurality of holes 120h, and the holes 120h are substantially regularly arranged to the entire light-emitting structure 120. Thereby, the current can be uniformly dispersed in the horizontal direction to improve the electrical characteristics of the light-emitting element 100a, and the heat generated by the light-emitting structure 120 can be effectively released to the outside through the ohmic contact region 131 and the first electrode 161.

而且,不使第一接觸電極130與第一導電型半導體層121歐姆接觸的部分位於形成第二電極163的區域的下方,從而可使在第一導電型半導體層121與第一接觸電極130歐姆接觸的部分產生的熱全部通過第一電極161釋放。因此,可進一步提高發光元件100a的散熱效率。Moreover, a portion where the first contact electrode 130 is not in ohmic contact with the first conductive type semiconductor layer 121 is located below a region where the second electrode 163 is formed, so that the first conductive type semiconductor layer 121 and the first contact electrode 130 can be made ohmic. The heat generated by the contact portion is all released through the first electrode 161. Therefore, the heat dissipation efficiency of the light emitting element 100a can be further improved.

如上所述,根據本新型創作,發光元件100a的發光效率及散熱效率提高,從而可提高可靠性及壽命。As described above, according to the present invention, the light-emitting efficiency and the heat-dissipation efficiency of the light-emitting element 100a are improved, and reliability and life can be improved.

另一方面,第一電極161及第二電極163可包含金屬粒子及介置在所述金屬粒子之間的非金屬性物質。另外,第一電極161及第二電極163可分別包含金屬粒子燒結體,所述金屬粒子燒結體包含所述金屬粒子及非金屬性物質。在所述金屬粒子燒結體內,可形成為金屬粒子被燒結而配置有多個顆粒(grain)的形態,可在金屬粒子之間的至少一部分區域介置非金屬性物質。這種非金屬性物質可發揮緩和可產生在第一電極161及第二電極163的應力(stress)的緩衝(buffer)作用。由此,第一電極161及第二電極163的機械穩定性提高,可減少可從第一電極161及第二電極163施加到發光結構體120的應力。On the other hand, the first electrode 161 and the second electrode 163 may include metal particles and a non-metallic substance interposed between the metal particles. Further, each of the first electrode 161 and the second electrode 163 may include a sintered metal particle, and the sintered metal particle includes the metal particle and a non-metallic substance. In the sintered body of the metal particles, a form in which a plurality of particles are arranged by sintering the metal particles can be formed, and a non-metallic substance can be interposed in at least a part of the regions between the metal particles. Such a non-metallic substance acts to buffer the buffer which can generate stress in the first electrode 161 and the second electrode 163. Thereby, the mechanical stability of the first electrode 161 and the second electrode 163 is improved, and the stress that can be applied from the first electrode 161 and the second electrode 163 to the light-emitting structure 120 can be reduced.

第一電極161及第二電極163可分別按照相對於第一電極161及第二電極163各自的質量為80 wt%至98 wt%的比率包含金屬粒子。第一電極161及第二電極163包含上述比率的金屬粒子,由此可具有優異的導熱性及導電性,可有效地緩衝可產生在第一電極161及第二電極163的應力而提高第一電極161及第二電極163的機械穩定性。The first electrode 161 and the second electrode 163 may respectively contain metal particles in a ratio of 80 wt% to 98 wt% with respect to the mass of each of the first electrode 161 and the second electrode 163, respectively. The first electrode 161 and the second electrode 163 include the metal particles of the above ratio, thereby having excellent thermal conductivity and electrical conductivity, and can effectively buffer stress generated in the first electrode 161 and the second electrode 163 to improve the first Mechanical stability of the electrode 161 and the second electrode 163.

金屬粒子只要為具有導熱性及導電性的物質,則並無限定,例如可包含Cu、Au、Ag、Pt等。非金屬性物質可源自成為用以形成電極的燒結對象的物質,例如可為包含C的聚合物(polymer)物質。The metal particles are not particularly limited as long as they have thermal conductivity and electrical conductivity, and may include, for example, Cu, Au, Ag, Pt, or the like. The non-metallic substance may be derived from a substance to be a sintered object for forming an electrode, and may be, for example, a polymer material containing C.

在上述實施例中,金屬粒子說明為呈金屬粒子燒結體形態且包含在第一電極161及第二電極163中,但本新型創作並不限定於此。與此不同地,第一電極161及第二電極163也可通過金屬的蒸鍍及/或鍍敷而形成。在此情況下,第一電極161及第二電極163可由多層構成。In the above embodiment, the metal particles are described as being in the form of a sintered metal particle and are included in the first electrode 161 and the second electrode 163. However, the present invention is not limited thereto. Unlike this, the first electrode 161 and the second electrode 163 can also be formed by vapor deposition and/or plating of a metal. In this case, the first electrode 161 and the second electrode 163 may be composed of a plurality of layers.

在本實施例中,第一電極161及第二電極163可具有相對於第二絕緣部153的上表面大致垂直的側面。然而,本新型創作並不限定於此,如圖3所示,第一電極261及第二電極263也可分別具有傾斜側面。In the present embodiment, the first electrode 161 and the second electrode 163 may have side faces that are substantially perpendicular to the upper surface of the second insulating portion 153. However, the creation of the present invention is not limited thereto, and as shown in FIG. 3, the first electrode 261 and the second electrode 263 may each have an inclined side surface.

圖3是用以說明本新型創作的另一實施例的發光元件100b的剖面圖,與圖1(a)、圖1(b)及圖2的發光元件100a相比,第一電極261及第二電極263具有傾斜側面。3 is a cross-sectional view showing a light-emitting element 100b according to another embodiment of the present invention, and the first electrode 261 and the first electrode 261 are compared with the light-emitting element 100a of FIGS. 1(a), 1(b) and 2; The two electrodes 263 have inclined sides.

參照圖3,第一電極261及第二電極263可分別包含傾斜側面。特別是,如圖3所示,第一電極261及第二電極263可分別包含對其垂直剖面的側面的切線TL的傾斜度發生變化的傾斜側面。具體而言,對第一電極261及第二電極263各自的垂直剖面的側面的切線TL的傾斜度沿從下部向上部的方向增加,之後經由特定的反曲點而可再次增加。因此,第一電極261及第二電極263各自的傾斜側面可包含所述切線TL的傾斜度增加的區域、及所述切線TL的傾斜度減少的區域。Referring to FIG. 3, the first electrode 261 and the second electrode 263 may respectively include inclined sides. In particular, as shown in FIG. 3, the first electrode 261 and the second electrode 263 may respectively include inclined side faces whose inclination of the tangent TL of the side surface of the vertical cross section changes. Specifically, the inclination of the tangent TL of the side surface of the vertical cross section of each of the first electrode 261 and the second electrode 263 increases in the direction from the lower portion to the upper portion, and then increases again via the specific inflection point. Therefore, the inclined side faces of the first electrode 261 and the second electrode 263 may include a region where the inclination of the tangent TL increases and a region where the inclination of the tangent TL decreases.

第一電極261及第二電極263分別包含對其垂直剖面的側面的切線TL的傾斜度發生變化的傾斜側面,由此第一電極261及第二電極263各自的水平截面面積可沿上下方向發生變化。例如,如圖所示,第一電極261及第二電極263各自的水平截面面積可向遠離發光結構體120的上表面的方向變小。Each of the first electrode 261 and the second electrode 263 includes an inclined side surface whose inclination of the tangent TL of the side surface of the vertical cross section changes, whereby the horizontal cross-sectional area of each of the first electrode 261 and the second electrode 263 can occur in the up and down direction Variety. For example, as shown in the drawing, the horizontal cross-sectional area of each of the first electrode 261 and the second electrode 263 may become smaller toward the upper surface of the light emitting structure 120.

因此,第一電極261及第二電極263可分別以具有上述形態的側面的方式決定其形狀,例如可形成為類似於截頭拱形的形態。第一電極261及第二電極263包含對其垂直剖面的側面的切線TL的傾斜度發生變化的傾斜側面,從而可提高第一電極261及第二電極263與第三絕緣部170的介面的機械穩定性。Therefore, the first electrode 261 and the second electrode 263 can each have a shape that has the side surface of the above-described configuration, and can be formed, for example, in a form similar to a truncated arch. The first electrode 261 and the second electrode 263 include a slanted side surface whose inclination of the tangential line TL of the side surface of the vertical cross section is changed, so that the interface between the first electrode 261 and the second electrode 263 and the third insulating portion 170 can be improved. stability.

再次參照圖1(a)、圖1(b)及圖2,第一電極161及第二電極163可分別與第一接觸電極130及第二接觸電極140直接接觸。即,第一電極161及第二電極163可分別以直接接觸到第一接觸電極及第二接觸電極上的方式形成,從而在利用鍍敷法的情況下,可省略如必要的晶種層(seed layer)的格外追加的構成,或在利用焊接(solder)的情況下,可省略如必要的潤濕層(wetting)的格外追加的構成。然而,本新型創作並不限定於此。Referring again to FIGS. 1(a), 1(b) and 2, the first electrode 161 and the second electrode 163 may be in direct contact with the first contact electrode 130 and the second contact electrode 140, respectively. That is, the first electrode 161 and the second electrode 163 may be formed to directly contact the first contact electrode and the second contact electrode, respectively, so that in the case of using the plating method, the necessary seed layer may be omitted ( In the case of additionally adding a seed layer or in the case of using a solder, it is possible to omit an extra structure which is added as necessary for wetting. However, the novel creation is not limited to this.

另一方面,第一電極161與第二電極163間的間隔中的最短距離可約為10 μm至80 μm。由此,可防止電極間的間隔變寬而發光元件100a的正向電壓(Vf)增加,另外,可按照減少電極間的間隔的程度增大第一電極161及第二電極163的水平截面面積,從而可提高發光元件100a的散熱效率。On the other hand, the shortest distance among the spaces between the first electrode 161 and the second electrode 163 may be about 10 μm to 80 μm. Thereby, it is possible to prevent the interval between the electrodes from being widened, and the forward voltage (Vf) of the light-emitting element 100a is increased, and the horizontal cross-sectional area of the first electrode 161 and the second electrode 163 can be increased to reduce the interval between the electrodes. Thereby, the heat dissipation efficiency of the light emitting element 100a can be improved.

第三絕緣部170能夠以至少局部地覆蓋第一電極161及第二電極163的側面的方式形成到發光結構體120上。在第三絕緣部170的上表面,可露出第一電極161及第二電極163。The third insulating portion 170 can be formed on the light emitting structure 120 so as to at least partially cover the side surfaces of the first electrode 161 and the second electrode 163. The first electrode 161 and the second electrode 163 are exposed on the upper surface of the third insulating portion 170.

第三絕緣部170具有電絕緣性,覆蓋第一電極161及第二電極163的側面而使其彼此有效地絕緣。同時,第三絕緣部170可發揮支撐第一電極161及第二電極163的作用。第三絕緣部170的上表面可按照與第一電極161及第二電極163的上表面大致相同的高度並列形成。The third insulating portion 170 is electrically insulating and covers the side faces of the first electrode 161 and the second electrode 163 to effectively insulate each other. At the same time, the third insulating portion 170 can function to support the first electrode 161 and the second electrode 163. The upper surface of the third insulating portion 170 may be formed in parallel at substantially the same height as the upper surfaces of the first electrode 161 and the second electrode 163.

第三絕緣部170可包含絕緣性聚合物及/或絕緣性陶瓷(ceramic),例如可包含如環氧模塑膠(Epoxy Molding Compound,EMC)、Si樹脂的物質。另外,第三絕緣部170還可包含如TiO 2粒子的光反射性及光散射粒子。 The third insulating portion 170 may include an insulating polymer and/or an insulating ceramic, and may include, for example, an Epoxy Molding Compound (EMC) or a Si resin. In addition, the third insulating portion 170 may further contain light reflectivity and light scattering particles such as TiO 2 particles.

另外,不同於圖中所示,第三絕緣部170也可覆蓋至發光結構體120側面為止,在此情況下,從發光結構體120發出的光的發光角度會不同。例如,在第三絕緣部170進一步覆蓋至發光結構體120側面的至少一部分為止的情況下,向發光結構體120的側面發出的光中的一部分可向發光結構體120的下表面反射。如上所述,通過調節配置第三絕緣部170的區域,可調節發光元件100a的發光角度。Further, unlike the drawing, the third insulating portion 170 may cover the side surface of the light emitting structure 120. In this case, the light emission angle of the light emitted from the light emitting structure 120 may be different. For example, when the third insulating portion 170 further covers at least a part of the side surface of the light emitting structure 120, a part of the light emitted to the side surface of the light emitting structure 120 can be reflected to the lower surface of the light emitting structure 120. As described above, by adjusting the area in which the third insulating portion 170 is disposed, the light-emitting angle of the light-emitting element 100a can be adjusted.

另外,發光元件100a還可包含第一焊墊電極(未圖示)及第二焊墊電極(未圖示)。所述第一焊墊電極及第二焊墊電極可位於第三絕緣部170上,可分別與第一電極161及第二電極163電接觸。Further, the light emitting element 100a may further include a first pad electrode (not shown) and a second pad electrode (not shown). The first pad electrode and the second pad electrode may be located on the third insulating portion 170 and may be in electrical contact with the first electrode 161 and the second electrode 163, respectively.

在將發光元件100a應用在模組(module)等中的情況下,第一焊墊電極及第二焊墊電極可使發光元件100a穩定地安裝到格外追加的基板等。例如,在第一電極161及第二電極163包含Cu或Ag粒子燒結體的情況下,第一電極161及第二電極163對焊接等的潤濕性欠佳。因此,通過進而將第一焊墊電極及第二焊墊電極配置到第三絕緣部170上,可穩定地安裝發光元件100a。When the light-emitting element 100a is applied to a module or the like, the first pad electrode and the second pad electrode can stably mount the light-emitting element 100a to an extra-added substrate or the like. For example, when the first electrode 161 and the second electrode 163 include a sintered body of Cu or Ag particles, the wettability of the first electrode 161 and the second electrode 163 to solder or the like is not good. Therefore, by arranging the first pad electrode and the second pad electrode on the third insulating portion 170, the light-emitting element 100a can be stably mounted.

第一電極墊及第二電極墊可包含如金屬的導電性物質,例如可包含Ni、Pt、Pd、Rh、W、Ti、Al、Ag、Sn、Cu、Ag、Bi、In、Zn、Sb、Mg、Pb等。另外,第一電極墊及第二電極墊可分別由單層或多層構成。The first electrode pad and the second electrode pad may comprise a conductive substance such as a metal, and may include, for example, Ni, Pt, Pd, Rh, W, Ti, Al, Ag, Sn, Cu, Ag, Bi, In, Zn, Sb. , Mg, Pb, etc. In addition, the first electrode pad and the second electrode pad may be composed of a single layer or a plurality of layers, respectively.

波長轉換部可位於發光結構體120的下表面上。The wavelength conversion portion may be located on a lower surface of the light emitting structure 120.

波長轉換部可轉換從發光結構體120發出的光的波長而發出發光元件所需的波段的光。波長轉換部可包含螢光體及載持所述螢光體的載持體。所述螢光體可包含本領域技術人員所熟知的各種螢光體,可包含石榴石(garnet)型螢光體、鋁酸鹽(aluminate)螢光體、硫化物螢光體、氮氧化物螢光體、氮化物螢光體、氟化物類螢光體、矽酸鹽螢光體中的至少一種。載持體也可使用本領域技術人員所熟知的物質,例如可包含如環氧(epoxy)樹脂或丙烯酸系(acrylic)樹脂的聚合物樹脂、或矽樹脂。另外,波長轉換部可由單層或多層構成。The wavelength converting portion converts the wavelength of the light emitted from the light emitting structure 120 to emit light of a wavelength band required for the light emitting element. The wavelength conversion unit may include a phosphor and a carrier that carries the phosphor. The phosphor may comprise various phosphors well known to those skilled in the art, and may comprise a garnet type phosphor, an aluminate phosphor, a sulfide phosphor, an oxynitride. At least one of a phosphor, a nitride phosphor, a fluoride-based phosphor, and a phthalate phosphor. The carrier may also be a material well known to those skilled in the art, for example, a polymer resin such as an epoxy resin or an acrylic resin, or a ruthenium resin. Further, the wavelength converting portion may be composed of a single layer or a plurality of layers.

所述波長轉換部可覆蓋發光結構體120的下表面,進而可覆蓋至發光結構體120的側面為止,進而還能夠以覆蓋至第三絕緣部170的側面為止的方式形成。The wavelength conversion portion may cover the lower surface of the light emitting structure 120, and may cover the side surface of the light emitting structure 120, and may be formed to cover the side surface of the third insulating portion 170.

在本實施例中,對具有包含多個孔120h的發光結構體120的發光元件100a進行了說明,但本新型創作並不限定於此。發光結構體120、第一接觸電極130及第二接觸電極140、第一絕緣部151及第二絕緣部153的相互結合配置關係可實現各種變形,這種經變形的形態的發光元件也包含在本新型創作的範圍內。In the present embodiment, the light-emitting element 100a having the light-emitting structure 120 including the plurality of holes 120h has been described, but the present invention is not limited thereto. The light-emitting structure 120, the first contact electrode 130 and the second contact electrode 140, the first insulating portion 151, and the second insulating portion 153 can be variously combined with each other, and the deformed light-emitting element is also included in Within the scope of this new creation.

圖4(a)、圖4(b)及圖5是用以說明本新型創作的另一實施例的發光元件的俯視圖及剖面圖。4(a), 4(b) and 5 are a plan view and a cross-sectional view for explaining a light-emitting element of another embodiment of the present invention.

圖4(a)、圖4(b)及圖5的實施例的發光元件100c大致類似於圖1(a)、圖1(b)及圖2的發光元件100a,但在第三開口部153a存在差異,另外,在還包含第一配線層181及第二配線層183的方面存在差異。以下,以差異點為中心對本實施例的發光元件100c進行說明,對相同的構成省略詳細說明。The light-emitting element 100c of the embodiment of FIGS. 4(a), 4(b) and 5 is substantially similar to the light-emitting element 100a of FIGS. 1(a), 1(b) and 2, but at the third opening portion 153a. There is a difference, and there is a difference in that the first wiring layer 181 and the second wiring layer 183 are further included. Hereinafter, the light-emitting element 100c of the present embodiment will be described focusing on the difference point, and the same configuration will not be described in detail.

圖4(a)是發光元件100c的俯視圖,圖4(b)是用以說明孔120h的位置及第三開口部153a與第四開口部153b的位置的俯視圖,圖5是表示與圖4(a)及圖4(b)的B-B線對應的區域的剖面的剖面圖。4(a) is a plan view of the light-emitting element 100c, and FIG. 4(b) is a plan view for explaining the position of the hole 120h and the positions of the third opening 153a and the fourth opening 153b, and FIG. 5 is a view similar to FIG. a) A cross-sectional view of a cross section of a region corresponding to the BB line of Fig. 4(b).

參照圖4(a)、圖4(b)及圖5,發光元件100c可包含:發光結構體120,其包含第一導電型半導體層121、活性層123及第二導電型半導體層125;第一接觸電極130;第二接觸電極140;第一絕緣部151及第二絕緣部153;第一電極161;第二電極163;第三絕緣部170;第一配線層181;及第二配線層183。進而,發光元件100c還可包含第一焊墊電極及第二焊墊電極(未圖示)、成長基板(未圖示)及波長轉換部(未圖示)。4(a), 4(b) and 5, the light emitting device 100c may include a light emitting structure 120 including a first conductive semiconductor layer 121, an active layer 123, and a second conductive semiconductor layer 125; a contact electrode 130; a second contact electrode 140; a first insulating portion 151 and a second insulating portion 153; a first electrode 161; a second electrode 163; a third insulating portion 170; a first wiring layer 181; and a second wiring layer 183. Further, the light-emitting element 100c may further include a first pad electrode and a second pad electrode (not shown), a growth substrate (not shown), and a wavelength conversion portion (not shown).

第二絕緣部153的第三開口部153a覆蓋第一接觸電極130,但可局部地露出第一接觸電極130。此時,第三開口部153a可僅形成到定位有所有孔120h中的一部分孔120h的區域上。因此,僅一部分歐姆接觸區域131露出在第三開口部153a,剩餘歐姆接觸區域131可由第二絕緣部153覆蓋。The third opening portion 153a of the second insulating portion 153 covers the first contact electrode 130, but the first contact electrode 130 may be partially exposed. At this time, the third opening portion 153a may be formed only to a region where a part of the holes 120h of all the holes 120h are positioned. Therefore, only a part of the ohmic contact region 131 is exposed at the third opening portion 153a, and the remaining ohmic contact region 131 may be covered by the second insulating portion 153.

第三開口部153a可與第四開口部153b的位置相反地定位,具體而言,在第四開口部153b以與發光元件100c的一側面鄰接的方式定位的情況下,第三開口部153a能夠以與另一側面鄰接的方式定位,所述另一側面與所述一側面相反地定位。The third opening portion 153a can be positioned opposite to the position of the fourth opening portion 153b. Specifically, when the fourth opening portion 153b is positioned adjacent to one side surface of the light emitting element 100c, the third opening portion 153a can Positioned adjacent to the other side, the other side being positioned opposite the one side.

另一方面,本實施例的發光元件100c還可包含位於第一電極161及第二電極163各自的下方的第一配線層181及第二配線層183。On the other hand, the light-emitting element 100c of the present embodiment may further include a first wiring layer 181 and a second wiring layer 183 located under each of the first electrode 161 and the second electrode 163.

第一配線層181可將第一接觸電極130與第一電極161電連接,第二配線層183可將第二接觸電極140與第二電極163電連接。The first wiring layer 181 may electrically connect the first contact electrode 130 with the first electrode 161, and the second wiring layer 183 may electrically connect the second contact electrode 140 with the second electrode 163.

進而,在通過蒸鍍或鍍敷方式形成第一電極161及第二電極163的情況下,第一配線層181及第二配線層183可發揮晶種層的作用。不僅如此,在通過燒結方式形成第一電極161及第二電極163的情況下,也可發揮潤濕層的作用而有助於穩定地形成第一電極161及第二電極163。因此,第一電極161及第二電極163可通過第一配線層181及第二配線層183而穩定地接著到發光結構體120。Further, when the first electrode 161 and the second electrode 163 are formed by vapor deposition or plating, the first wiring layer 181 and the second wiring layer 183 can function as a seed layer. In addition, when the first electrode 161 and the second electrode 163 are formed by sintering, the action of the wetting layer can be exerted to contribute to the stable formation of the first electrode 161 and the second electrode 163. Therefore, the first electrode 161 and the second electrode 163 can be stably followed by the first wiring layer 181 and the second wiring layer 183 to the light emitting structure 120.

因此,第一配線層181及第二配線層183可包含金屬物質,以便可發揮晶種層或潤濕層的作用。例如,第一配線層181及第二配線層183可包含Cu、Au、Ag、Ni、Pt等。Therefore, the first wiring layer 181 and the second wiring layer 183 may contain a metal substance so as to function as a seed layer or a wetting layer. For example, the first wiring layer 181 and the second wiring layer 183 may include Cu, Au, Ag, Ni, Pt, or the like.

第一配線層181及第二配線層183並不限定應用在本實施例,也可對其他實施例應用。The first wiring layer 181 and the second wiring layer 183 are not limited to the application of the present embodiment, and may be applied to other embodiments.

圖6(a)、圖6(b)及圖7是用以說明本新型創作的另一實施例的發光元件的俯視圖及剖面圖。6(a), 6(b) and 7 are a plan view and a cross-sectional view for explaining a light-emitting element of another embodiment of the present invention.

圖6(a)、圖6(b)及圖7的實施例的發光元件100d大致類似於圖1(a)、圖1(b)及圖2的發光元件100a,但在還包含連接層210及第一焊墊電極231及第二焊墊電極233的方面存在差異。以下,以差異點為中心對本實施例的發光元件100d進行說明,對相同的構成省略詳細說明。The light-emitting element 100d of the embodiment of FIGS. 6(a), 6(b) and 7 is substantially similar to the light-emitting element 100a of FIGS. 1(a), 1(b) and 2, but further includes a connection layer 210. There are differences in aspects of the first pad electrode 231 and the second pad electrode 233. Hereinafter, the light-emitting element 100d of the present embodiment will be described focusing on the difference point, and the same configuration will not be described in detail.

圖6(a)是發光元件100d的俯視圖,圖6(b)是用以說明孔120h的位置及第三開口部153a與第四開口部153b的位置的俯視圖,圖7是表示與圖6(a)及圖6(b)的C-C線對應的區域的剖面的剖面圖。6(a) is a plan view of the light-emitting element 100d, and FIG. 6(b) is a plan view for explaining the position of the hole 120h and the positions of the third opening 153a and the fourth opening 153b, and FIG. 7 is a view similar to FIG. a) A cross-sectional view of a cross section of a region corresponding to the CC line of Fig. 6(b).

參照圖6(a)、圖6(b)及圖7,發光元件100d可包含:發光結構體120,其包含第一導電型半導體層121、活性層123及第二導電型半導體層125;第一接觸電極130;第二接觸電極140;第一絕緣部151及第二絕緣部153;第一電極161;第二電極163;第三絕緣部170;連接層210;及第一焊墊電極231及第二焊墊電極233。進而,發光元件100d還可包含成長基板(未圖示)及波長轉換部(未圖示)。6(a), 6(b) and 7 , the light emitting device 100d may include a light emitting structure 120 including a first conductive semiconductor layer 121, an active layer 123, and a second conductive semiconductor layer 125; a contact electrode 130; a second contact electrode 140; a first insulating portion 151 and a second insulating portion 153; a first electrode 161; a second electrode 163; a third insulating portion 170; a connection layer 210; and a first pad electrode 231 And a second pad electrode 233. Further, the light-emitting element 100d may further include a growth substrate (not shown) and a wavelength conversion portion (not shown).

連接層210可位於第一電極161、第二電極163及第三絕緣部170上。The connection layer 210 may be located on the first electrode 161, the second electrode 163, and the third insulating portion 170.

連接層210可包含第一連接層211、第二連接層213及絕緣物質層215。第一連接層211及第二連接層213分別位於第一電極161及第二電極163上,可與所述第一電極161及第二電極163電連接。絕緣物質層215使第一連接層211與第二連接層213絕緣。絕緣物質層215、第一連接層211及第二連接層213的上表面能夠以構成大致同一平面的方式並列形成。The connection layer 210 may include a first connection layer 211, a second connection layer 213, and an insulating material layer 215. The first connection layer 211 and the second connection layer 213 are respectively disposed on the first electrode 161 and the second electrode 163, and are electrically connected to the first electrode 161 and the second electrode 163. The insulating material layer 215 insulates the first connection layer 211 from the second connection layer 213. The upper surfaces of the insulating material layer 215, the first connection layer 211, and the second connection layer 213 can be formed in parallel so as to form substantially the same plane.

第一連接層211及第二連接層213可包含具有導電性的金屬或導電性氧化物、導電性氮化物等,特別是可由包含導電率較高的Au、Ag、Cu、Ni、Pt等的金屬形成。絕緣物質層215可包含SiO 2、SiN x、或絕緣性高分子等。 The first connection layer 211 and the second connection layer 213 may include a conductive metal or a conductive oxide, a conductive nitride, or the like, and in particular, may include Au, Ag, Cu, Ni, Pt, or the like having a high conductivity. Metal formation. The insulating material layer 215 may include SiO 2 , SiN x , an insulating polymer, or the like.

第一焊墊電極231及第二焊墊電極233位於連接層210上,可通過連接層210而與第一電極161及第二電極163電連接。具體而言,第一焊墊電極231及第二焊墊電極233可分別通過第一連接層211及第二連接層213而與第一電極161及第二電極163電連接。The first pad electrode 231 and the second pad electrode 233 are located on the connection layer 210 and can be electrically connected to the first electrode 161 and the second electrode 163 through the connection layer 210. Specifically, the first pad electrode 231 and the second pad electrode 233 are electrically connected to the first electrode 161 and the second electrode 163 through the first connection layer 211 and the second connection layer 213, respectively.

第一焊墊電極231及第二焊墊電極233可使發光元件100d更穩定地安裝到格外追加的基板等。例如,在第一電極161及第二電極163包含Cu或Ag粒子燒結體的情況下,第一電極161及第二電極163對焊接等的潤濕性欠佳。因此,可通過進而將第一焊墊電極及第二焊墊電極配置到第三絕緣部170上而穩定地安裝發光元件100d。The first pad electrode 231 and the second pad electrode 233 can more stably mount the light-emitting element 100d to an extra-added substrate or the like. For example, when the first electrode 161 and the second electrode 163 include a sintered body of Cu or Ag particles, the wettability of the first electrode 161 and the second electrode 163 to solder or the like is not good. Therefore, the light-emitting element 100d can be stably mounted by disposing the first pad electrode and the second pad electrode on the third insulating portion 170.

進而,第一焊墊電極231的水平截面面積可小於第一電極161的水平截面面積,第二焊墊電極233的水平截面面積可大於第二電極163的水平截面面積。特別是,第一焊墊電極231的水平截面面積與第二焊墊電極233的水平截面面積可大致相同。Further, the horizontal cross-sectional area of the first pad electrode 231 may be smaller than the horizontal cross-sectional area of the first electrode 161, and the horizontal cross-sectional area of the second pad electrode 233 may be larger than the horizontal cross-sectional area of the second electrode 163. In particular, the horizontal cross-sectional area of the first pad electrode 231 and the horizontal cross-sectional area of the second pad electrode 233 may be substantially the same.

在第一電極161的水平截面面積遠遠大於第二電極163的水平截面面積的情況下,當將發光元件安裝到如印刷電路板(Printed Circuit Board,PCB)的二次基板時還會發生不良。另外,為了將這種發光元件穩定地安裝到二次基板,需變更在所述二次基板安裝發光元件的部分的導電圖案。然而,本實施例的發光元件100d還包含第一焊墊電極231及第二焊墊電極233,由此可與通常的發光元件100d類似地形成安裝發光元件100d的二次基板的面的電極。因此,可不追加或變更製程而通過通常的發光元件安裝方法將本新型創作的發光元件100d應用到各種應用程式中,還可減少安裝製程中的不良率。In the case where the horizontal cross-sectional area of the first electrode 161 is much larger than the horizontal cross-sectional area of the second electrode 163, a defect may occur when the light-emitting element is mounted to a secondary substrate such as a Printed Circuit Board (PCB). . Further, in order to stably mount such a light-emitting element to the secondary substrate, it is necessary to change the conductive pattern of the portion where the light-emitting element is mounted on the secondary substrate. However, the light-emitting element 100d of the present embodiment further includes the first pad electrode 231 and the second pad electrode 233, whereby the electrode on the surface on which the secondary substrate of the light-emitting element 100d is mounted can be formed similarly to the normal light-emitting element 100d. Therefore, the light-emitting element 100d of the present invention can be applied to various applications by a usual light-emitting element mounting method without adding or changing a process, and the defective rate in the mounting process can be reduced.

第一焊墊電極231及第二焊墊電極233可包含如金屬的導電性物質,例如可包含Ni、Pt、Pd、Rh、W、Ti、Al、Ag、Sn、Cu、Ag、Bi、In、Zn、Sb、Mg、Pb等。The first pad electrode 231 and the second pad electrode 233 may include a conductive material such as a metal, and may include, for example, Ni, Pt, Pd, Rh, W, Ti, Al, Ag, Sn, Cu, Ag, Bi, In. , Zn, Sb, Mg, Pb, and the like.

另一方面,絕緣物質層215可具有約10 μm以下的厚度,由此可通過絕緣物質層215防止向外部釋放從第一電極161及第二電極163釋放的熱的效率下降的情況。On the other hand, the insulating material layer 215 may have a thickness of about 10 μm or less, whereby the efficiency of releasing heat released from the first electrode 161 and the second electrode 163 to the outside can be prevented from being lowered by the insulating material layer 215.

圖8(a)、圖8(b)及圖9是用以說明本新型創作的另一實施例的發光元件的俯視圖及剖面圖。8(a), 8(b) and 9 are a plan view and a cross-sectional view for explaining a light-emitting element of another embodiment of the present invention.

圖8(a)、圖8(b)及圖9的實施例的發光元件100e大致類似於圖6(a)、圖6(b)及圖7的發光元件100d,但在包含多個第二電極163的方面存在差異。以下,以差異點為中心對本實施例的發光元件100e進行說明,對相同的構成省略詳細說明。The light-emitting element 100e of the embodiment of FIGS. 8(a), 8(b) and 9 is substantially similar to the light-emitting element 100d of FIGS. 6(a), 6(b) and 7, but includes a plurality of second There are differences in aspects of the electrode 163. Hereinafter, the light-emitting element 100e of the present embodiment will be described focusing on the difference point, and the same configuration will not be described in detail.

圖8(a)是發光元件100e的俯視圖,圖8(b)是用以說明孔120h的位置及第三開口部153a與第四開口153b的位置的俯視圖,圖9是表示與圖8(a)及圖8(b)的D-D線對應的區域的剖面的剖面圖。8(a) is a plan view of the light-emitting element 100e, and FIG. 8(b) is a plan view for explaining the position of the hole 120h and the positions of the third opening 153a and the fourth opening 153b, and FIG. 9 is a view showing FIG. And a cross-sectional view of a cross section of a region corresponding to the DD line of Fig. 8(b).

參照圖8(a)、圖8(b)及圖9,發光元件100e可包含:發光結構體120,其包含第一導電型半導體層121、活性層123及第二導電型半導體層125;第一接觸電極130;第二接觸電極140;第一絕緣部151及第二絕緣部153;第一電極161;第二電極163;第三絕緣部170;連接層210;及第一焊墊電極231及第二焊墊電極233。進而,發光元件100e還可包含成長基板(未圖示)及波長轉換部(未圖示)。8(a), 8(b) and 9 , the light emitting device 100e may include a light emitting structure 120 including a first conductive semiconductor layer 121, an active layer 123, and a second conductive semiconductor layer 125; a contact electrode 130; a second contact electrode 140; a first insulating portion 151 and a second insulating portion 153; a first electrode 161; a second electrode 163; a third insulating portion 170; a connection layer 210; and a first pad electrode 231 And a second pad electrode 233. Further, the light-emitting element 100e may further include a growth substrate (not shown) and a wavelength conversion portion (not shown).

第二電極163可形成為多個。由此,與圖6(a)、圖6(b)及圖7的發光元件100d相比,可使孔120h的個數增加,可使第三開口部153a的面積變更大,還可使第一電極161的水平截面面積增加。第二電極163可彼此隔開,一部分孔120h可配置到第二電極163之間。The second electrode 163 may be formed in plurality. Thereby, the number of the holes 120h can be increased as compared with the light-emitting elements 100d of FIGS. 6(a), 6(b) and 7 , and the area of the third opening 153a can be changed greatly. The horizontal cross-sectional area of one electrode 161 is increased. The second electrodes 163 may be spaced apart from each other, and a portion of the holes 120h may be disposed between the second electrodes 163.

根據本實施例,第一電極161的水平截面面積進一步增加,從而可進一步增加發光元件100e的散熱效率,還可提高發光特性。According to the present embodiment, the horizontal cross-sectional area of the first electrode 161 is further increased, so that the heat dissipation efficiency of the light-emitting element 100e can be further increased, and the light-emitting characteristics can also be improved.

另一方面,還可省略第一焊墊電極231及第二焊墊電極233。On the other hand, the first pad electrode 231 and the second pad electrode 233 may be omitted.

以上,對本新型創作的多個實施例進行了說明,但本新型創作並不限定於上述各實施例及特徵。通過結合及置換在實施例中說明的技術特徵而變更的發明也均包含在本新型創作的範圍內,可在不脫離本新型創作的權利要求書範圍的技術思想範圍內實現各種變形及變更。Although various embodiments of the novel creation have been described above, the present invention is not limited to the above embodiments and features. It is to be understood that various modifications and changes can be made without departing from the spirit and scope of the invention.

100a、100b、100c、100d、100e‧‧‧發光元件
120‧‧‧發光結構體
120h‧‧‧孔
120R‧‧‧粗糙表面
121‧‧‧第一導電型半導體層
123‧‧‧活性層
125‧‧‧第二導電型半導體層
130‧‧‧第一接觸電極
131‧‧‧歐姆接觸區域
140‧‧‧第二接觸電極
151‧‧‧第一絕緣部
153‧‧‧第二絕緣部
153a‧‧‧第三開口部
153b‧‧‧第四開口部
161、261‧‧‧第一電極
163、263‧‧‧第二電極
170‧‧‧第三絕緣部
181‧‧‧第一配線層
183‧‧‧第二配線層
210‧‧‧連接層
211‧‧‧第一連接層
213‧‧‧第二連接層
215‧‧‧絕緣物質層
231‧‧‧第一焊墊電極
233‧‧‧第二焊墊電極
TL‧‧‧切線
100a, 100b, 100c, 100d, 100e‧‧‧ light-emitting elements
120‧‧‧Lighted structure
120h‧‧‧ hole
120R‧‧‧Rough surface
121‧‧‧First Conductive Semiconductor Layer
123‧‧‧Active layer
125‧‧‧Second conductive semiconductor layer
130‧‧‧First contact electrode
131‧‧‧ Ohmic contact area
140‧‧‧Second contact electrode
151‧‧‧First insulation
153‧‧‧Second insulation
153a‧‧‧3rd opening
153b‧‧‧fourth opening
161, ‧ ‧ ‧ first electrode
163, 263‧‧‧ second electrode
170‧‧‧ Third insulation
181‧‧‧First wiring layer
183‧‧‧Second wiring layer
210‧‧‧Connection layer
211‧‧‧ first connection layer
213‧‧‧Second connection layer
215‧‧‧Insulation layer
231‧‧‧First pad electrode
233‧‧‧Second pad electrode
TL‧‧‧ tangent

圖1(a)、圖1(b)及圖2是用以說明本新型創作的一實施例的發光元件的俯視圖及剖面圖。 圖3是用以說明本新型創作的另一實施例的發光元件的剖面圖。 圖4(a)、圖4(b)及圖5是用以說明本新型創作的另一實施例的發光元件的俯視圖及剖面圖。 圖6(a)、圖6(b)及圖7是用以說明本新型創作的另一實施例的發光元件的俯視圖及剖面圖。 圖8(a)、圖8(b)及圖9是用以說明本新型創作的另一實施例的發光元件的俯視圖及剖面圖。1(a), 1(b) and 2 are a plan view and a cross-sectional view for explaining a light-emitting element of an embodiment of the present invention. Fig. 3 is a cross-sectional view showing a light-emitting element of another embodiment of the present invention. 4(a), 4(b) and 5 are a plan view and a cross-sectional view for explaining a light-emitting element of another embodiment of the present invention. 6(a), 6(b) and 7 are a plan view and a cross-sectional view for explaining a light-emitting element of another embodiment of the present invention. 8(a), 8(b) and 9 are a plan view and a cross-sectional view for explaining a light-emitting element of another embodiment of the present invention.

100a‧‧‧發光元件 100a‧‧‧Lighting elements

120‧‧‧發光結構體 120‧‧‧Lighted structure

120h‧‧‧孔 120h‧‧‧ hole

120R‧‧‧粗糙表面 120R‧‧‧Rough surface

121‧‧‧第一導電型半導體層 121‧‧‧First Conductive Semiconductor Layer

123‧‧‧活性層 123‧‧‧Active layer

125‧‧‧第二導電型半導體層 125‧‧‧Second conductive semiconductor layer

130‧‧‧第一接觸電極 130‧‧‧First contact electrode

131‧‧‧歐姆接觸區域 131‧‧‧ Ohmic contact area

140‧‧‧第二接觸電極 140‧‧‧Second contact electrode

151‧‧‧第一絕緣部 151‧‧‧First insulation

153‧‧‧第二絕緣部 153‧‧‧Second insulation

153a‧‧‧第三開口部 153a‧‧‧3rd opening

153b‧‧‧第四開口部 153b‧‧‧fourth opening

161‧‧‧第一電極 161‧‧‧First electrode

163‧‧‧第二電極 163‧‧‧second electrode

170‧‧‧第三絕緣部 170‧‧‧ Third insulation

Claims (20)

一種發光元件,其包含:發光結構體,其包含第一導電型半導體層、第二導電型半導體層、及位於所述第一導電型半導體層與所述第二導電型半導體層之間的活性層;第一接觸電極及第二接觸電極,位於所述發光結構體上,分別與所述第一導電型半導體層及所述第二導電型半導體層歐姆接觸;以及第一電極及第二電極,位於所述發光結構體上,分別電連接到所述第一接觸電極及所述第二接觸電極,其中所述第一電極的水平面積大於所述第二電極的水平面積。 A light-emitting element comprising: a light-emitting structure comprising a first conductive type semiconductor layer, a second conductive type semiconductor layer, and an activity between the first conductive type semiconductor layer and the second conductive type semiconductor layer a first contact electrode and a second contact electrode are disposed on the light emitting structure, and are in ohmic contact with the first conductive type semiconductor layer and the second conductive type semiconductor layer, respectively; and the first electrode and the second electrode On the light emitting structure, electrically connected to the first contact electrode and the second contact electrode, respectively, wherein a horizontal area of the first electrode is larger than a horizontal area of the second electrode. 如申請專利範圍第1項所述的發光元件,其中所述第一電極位於所述第一接觸電極與所述第一導電型半導體層歐姆接觸的部分上。 The light-emitting element according to claim 1, wherein the first electrode is located on a portion where the first contact electrode is in ohmic contact with the first conductive type semiconductor layer. 如申請專利範圍第2項所述的發光元件,其中所述第一接觸電極與所述第一導電型半導體層歐姆接觸的部分不位於所述第二電極的下方。 The light-emitting element according to claim 2, wherein a portion of the first contact electrode that is in ohmic contact with the first conductive type semiconductor layer is not located below the second electrode. 如申請專利範圍第2項所述的發光元件,其中所述第一接觸電極包含與所述第一導電型半導體層接觸而實現歐姆接觸的多個歐姆接觸區域,所述第一電極與所述第一接觸電極的所述多個歐姆接觸區域全部接觸。 The illuminating element of claim 2, wherein the first contact electrode comprises a plurality of ohmic contact regions in contact with the first conductive type semiconductor layer to achieve ohmic contact, the first electrode and the first electrode The plurality of ohmic contact regions of the first contact electrode are all in contact. 如申請專利範圍第2項所述的發光元件,其中所述第一接觸電極包含與所述第一導電型半導體層接觸而實現歐姆接觸的 多個歐姆接觸區域,所述多個歐姆接觸區域中僅一部分與所述第一電極接觸。 The light-emitting element of claim 2, wherein the first contact electrode comprises a contact with the first conductive type semiconductor layer to achieve ohmic contact a plurality of ohmic contact regions, only a portion of the plurality of ohmic contact regions are in contact with the first electrode. 如申請專利範圍第5項所述的發光元件,還包含:第一配線層,其位於所述第一電極的下方;及第二配線層,其位於所述第二電極的下方;且所述第一配線層的一部分與所述第一接觸電極接觸,所述第二配線層的一部分與所述第二接觸電極接觸。 The light-emitting element according to claim 5, further comprising: a first wiring layer located under the first electrode; and a second wiring layer located under the second electrode; A portion of the first wiring layer is in contact with the first contact electrode, and a portion of the second wiring layer is in contact with the second contact electrode. 如申請專利範圍第6項所述的發光元件,還包含局部地覆蓋所述第一接觸電極及所述第二接觸電極的第一絕緣部及第二絕緣部,其中所述第二絕緣部的一部分位於所述第一配線層與所述第一接觸電極之間。 The light-emitting element according to claim 6, further comprising a first insulating portion and a second insulating portion partially covering the first contact electrode and the second contact electrode, wherein the second insulating portion A portion is located between the first wiring layer and the first contact electrode. 如申請專利範圍第1項所述的發光元件,其中所述第一電極的水平截面面積為所述第一電極與所述第二電極各自的水平截面面積之和的0.8倍以上且小於1倍。 The light-emitting element according to claim 1, wherein a horizontal cross-sectional area of the first electrode is 0.8 times or more and less than 1 times a sum of horizontal cross-sectional areas of the first electrode and the second electrode. . 如申請專利範圍第1項所述的發光元件,還包含分別電連接到所述第一電極及所述第二電極的第一焊墊電極及第二焊墊電極,其中所述第一焊墊電極的水平面積小於所述第一電極的水平面積,所述第二焊墊電極的水平面積大於所述第二電極的水平面積。 The illuminating device of claim 1, further comprising a first pad electrode and a second pad electrode electrically connected to the first electrode and the second electrode, respectively, wherein the first pad The horizontal area of the electrode is smaller than the horizontal area of the first electrode, and the horizontal area of the second pad electrode is larger than the horizontal area of the second electrode. 如申請專利範圍第9項所述的發光元件,其中所述第一焊墊電極的水平面積與所述第二焊墊電極的水平面積相同。 The light-emitting element according to claim 9, wherein a horizontal area of the first pad electrode is the same as a horizontal area of the second pad electrode. 如申請專利範圍第9項所述的發光元件,還包含其位於所述第一電極及所述第二電極上的連接層,其中所述連接層包含:絕緣物質層; 第一連接層,其將所述第一電極與所述第一焊墊電極電連接,且貫通所述絕緣物質層;及第二連接層,其將所述第二電極與所述第二焊墊電極電連接,且貫通所述絕緣物質層。 The light-emitting element of claim 9, further comprising a connection layer on the first electrode and the second electrode, wherein the connection layer comprises: an insulating material layer; a first connection layer electrically connecting the first electrode to the first pad electrode and penetrating the insulating material layer; and a second connection layer connecting the second electrode and the second electrode The pad electrode is electrically connected and penetrates the insulating material layer. 如申請專利範圍第9項所述的發光元件,其中所述第二電極形成為多個,所述第二電極與所述第二焊墊電極電連接。 The light-emitting element according to claim 9, wherein the second electrode is formed in plurality, and the second electrode is electrically connected to the second pad electrode. 如申請專利範圍第12項所述的發光元件,其中所述第一接觸電極包含與所述第一導電型半導體層接觸而實現歐姆接觸的多個歐姆接觸區域,所述多個歐姆接觸區域中的一部分配置在所述第二電極之間。 The illuminating element of claim 12, wherein the first contact electrode comprises a plurality of ohmic contact regions in contact with the first conductive semiconductor layer to achieve ohmic contact, wherein the plurality of ohmic contact regions are A portion of the portion is disposed between the second electrodes. 如申請專利範圍第1項所述的發光元件,其中所述第一電極及所述第二電極分別包含金屬粒子及介置在所述金屬粒子之間的非金屬性物質。 The light-emitting element according to claim 1, wherein the first electrode and the second electrode respectively comprise metal particles and a non-metallic substance interposed between the metal particles. 如申請專利範圍第14項所述的發光元件,其中所述第一電極及所述第二電極分別包含傾斜側面,所述傾斜側面包含所述第一電極及所述第二電極各自的垂直剖面的切線傾斜度發生變化的側面。 The light-emitting element according to claim 14, wherein the first electrode and the second electrode respectively comprise inclined sides, and the inclined side surface comprises a vertical cross section of each of the first electrode and the second electrode The side of the tangential inclination changes. 如申請專利範圍第1項所述的發光元件,其中所述發光結構體還包含所述活性層及所述第二導電型半導體層被局部地去除而局部地露出所述第一導電型半導體層的區域,所述第一接觸電極通過局部地露出所述第一導電型半導體層的區域而與所述第一導電型半導體層歐姆接觸。 The light-emitting element according to claim 1, wherein the light-emitting structure further comprises the active layer and the second conductive type semiconductor layer being partially removed to partially expose the first conductive type semiconductor layer The first contact electrode is in ohmic contact with the first conductive type semiconductor layer by partially exposing a region of the first conductive type semiconductor layer. 如申請專利範圍第16項所述的發光元件,其中局部地露出所述第一導電型半導體層的區域形成為多個孔的形態。 The light-emitting element according to claim 16, wherein a region where the first conductive semiconductor layer is partially exposed is formed in a form of a plurality of holes. 如申請專利範圍第17項所述的發光元件,其中所述第二接觸電極位於所述第二導電型半導體層上,第一絕緣部覆蓋所述第二接觸電極及所述發光結構體,所述第一絕緣部包含第一開口部及第二開口部,所述第一開口部及所述第二開口部分別使局部地露出所述第一導電型半導體層的區域的一部分及所述第二接觸電極的一部分露出,所述第一接觸電極至少局部地覆蓋所述第一絕緣部,所述第一接觸電極通過所述第一開口部而與所述第一導電型半導體層接觸,第二絕緣部局部地覆蓋所述第一接觸電極,所述第二絕緣部包含第三開口部及第四開口部,所述第三開口部使所述第一接觸電極局部地露出,所述第四開口部與所述第二開口部的位置對應地配置而使所述第二接觸電極的一部分露出。 The light-emitting element according to claim 17, wherein the second contact electrode is located on the second conductive type semiconductor layer, and the first insulating portion covers the second contact electrode and the light-emitting structure. The first insulating portion includes a first opening portion and a second opening portion, and the first opening portion and the second opening portion respectively partially expose a portion of the first conductive type semiconductor layer and the first portion a portion of the two contact electrodes are exposed, the first contact electrode at least partially covering the first insulating portion, and the first contact electrode is in contact with the first conductive semiconductor layer through the first opening portion, The second insulating portion partially covers the first contact electrode, and the second insulating portion includes a third opening portion and a fourth opening portion, the third opening portion partially exposing the first contact electrode The four openings are arranged corresponding to the positions of the second openings, and a part of the second contact electrodes are exposed. 如申請專利範圍第18項所述的發光元件,其中所述第一電極通過所述第三開口部而與所述第一接觸電極接觸,所述第二電極通過所述第四開口部而與所述第二接觸電極接觸,所述多個孔均位於所述第三開口部的區域的下方。 The light-emitting element according to claim 18, wherein the first electrode is in contact with the first contact electrode through the third opening portion, and the second electrode is passed through the fourth opening portion The second contact electrode is in contact, and the plurality of holes are located below a region of the third opening. 如申請專利範圍第1項所述的發光元件,還包含第三絕緣部,其覆蓋所述第一電極及所述第二電極的側面。 The light-emitting element according to claim 1, further comprising a third insulating portion covering a side surface of the first electrode and the second electrode.
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