TWI581468B - Light emitting diode, light emitting device and method of fabricating the same - Google Patents
Light emitting diode, light emitting device and method of fabricating the same Download PDFInfo
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Led Device Packages (AREA)
- Led Devices (AREA)
Description
本發明涉及一種提升散熱效率的發光二極體及其製造方法,特別是涉及一種具有包括散熱電極的結構而能夠有效散熱的發光二極體及其製造方法。 The present invention relates to a light-emitting diode that improves heat dissipation efficiency and a method of manufacturing the same, and more particularly to a light-emitting diode having a structure including a heat-dissipating electrode and capable of effectively dissipating heat, and a method of manufacturing the same.
發光二極體是一種無機半導體元件,能夠發出電子和電洞複合產生的光,按電極配置位置或所述電極與外部引線連接的方式不同,分為水平式發光二極體、直立式發光二極體或覆晶式(flip-chip)發光二極體等等。 The light-emitting diode is an inorganic semiconductor element capable of emitting light generated by recombination of electrons and holes, and is divided into a horizontal light-emitting diode and an upright light-emitting diode according to an electrode arrangement position or a manner in which the electrode is connected to an external lead. A polar body or a flip-chip light emitting diode or the like.
最近,隨著對高功率發光二極體的需求增加,對散熱效率高的大面積覆晶式發光二極體的需求也猛增。覆晶式發光二極體的電極直接黏接於次級基板,因其不使用導線,與水平式發光二極體相比,其散熱效率非常高。因此,即便接通高密度電流,也能有效地將熱量傳導至次級基板側,覆晶式發光二極體作為高 功率發光二極體最為合適不過。 Recently, as the demand for high-power light-emitting diodes has increased, the demand for large-area flip-chip light-emitting diodes having high heat dissipation efficiency has also soared. The electrode of the flip-chip light-emitting diode is directly bonded to the secondary substrate, and since it does not use a wire, the heat dissipation efficiency is very high compared with the horizontal light-emitting diode. Therefore, even if the high-density current is turned on, heat can be efficiently conducted to the secondary substrate side, and the flip-chip light-emitting diode is high. Power LEDs are the most suitable.
作為貼裝覆晶式發光二極體的次級基板,一般使用包含金屬的基板。圖1(a)及圖1(b)顯示貼裝以往覆晶式發光二極體的次級基板及包括其的發光裝置。 As the secondary substrate on which the flip-chip light-emitting diode is mounted, a substrate containing a metal is generally used. 1(a) and 1(b) show a secondary substrate on which a conventional flip-chip type light-emitting diode is mounted, and a light-emitting device including the same.
圖1(a)所示的發光裝置包括如下結構,即在包括被絕緣體21隔開並絕緣的第一基座23及第二基座25的次級基板20上貼裝覆晶式發光二極體。所述發光二極體包括發光結構體11及向發光結構體11下部延長形成的第一電極13和第二電極15。此時,第一電極13和第二電極15分別接觸第一基座23及第二基座25,使得發光二極體被貼裝到基板20上。 The light-emitting device shown in FIG. 1(a) includes a structure in which a flip-chip light-emitting diode is mounted on a secondary substrate 20 including a first pedestal 23 and a second pedestal 25 which are separated and insulated by an insulator 21. body. The light emitting diode includes a light emitting structure 11 and a first electrode 13 and a second electrode 15 which are formed to extend toward a lower portion of the light emitting structure 11. At this time, the first electrode 13 and the second electrode 15 contact the first pedestal 23 and the second pedestal 25, respectively, so that the light emitting diodes are mounted on the substrate 20.
根據圖1(a)的發光裝置,由於發光結構體11藉由第一電極13及第二電極15直接接觸次級基板20的第一基座23及第二基座25,使得發光結構體11產生的熱量能夠藉由第一電極13及第二電極15釋放到基座。但是,因為只能藉由第一電極13及第二電極15釋放發光結構體11產生的熱量,其散熱受到限制。而且,第一電極13及第二電極15還需要同時執行電氣功能,其與發光結構體11接觸的截面積存在限制,特別是,在以高電流驅動的發光裝置中,無法向外部充分散熱。 According to the light-emitting device of FIG. 1(a), since the light-emitting structure 11 directly contacts the first pedestal 23 and the second pedestal 25 of the secondary substrate 20 by the first electrode 13 and the second electrode 15, the light-emitting structure 11 is caused. The generated heat can be released to the susceptor by the first electrode 13 and the second electrode 15. However, since the heat generated by the light-emitting structure 11 can be released only by the first electrode 13 and the second electrode 15, the heat dissipation thereof is limited. Further, the first electrode 13 and the second electrode 15 also need to perform an electrical function at the same time, and there is a limitation in the cross-sectional area of the first electrode 13 and the second electrode 15 in contact with the light-emitting structure 11, and in particular, in a light-emitting device driven at a high current, it is not possible to sufficiently dissipate heat to the outside.
圖1(b)的發光裝置包括如下結構,即,在次級基板30上貼裝覆晶式發光二極體,所述次級基板30包括基座37上塗布的絕緣層31、所述絕緣層31上相互絕緣的第一導電性圖案33及第二導電性圖案35。根據圖1(b)的發光裝置,其在用於散熱的基座37上塗布絕緣層31,導致發光二極體產生的熱量因絕緣層31而不能有效地傳遞到基座37。因此,降低發光二極體的散熱效率。 The light-emitting device of FIG. 1(b) includes a structure in which a flip-chip light-emitting diode is mounted on a secondary substrate 30, the secondary substrate 30 including an insulating layer 31 coated on a susceptor 37, and the insulating layer The first conductive pattern 33 and the second conductive pattern 35 are insulated from each other on the layer 31. According to the light-emitting device of FIG. 1(b), the insulating layer 31 is coated on the susceptor 37 for heat dissipation, so that heat generated by the light-emitting diode is not efficiently transmitted to the susceptor 37 due to the insulating layer 31. Therefore, the heat dissipation efficiency of the light emitting diode is lowered.
另外,在以往的發光裝置中,為了提高發光二極體的散熱效率,採用相對增加電極面積的形成方法。但是,為了在次級基板上貼裝發光二極體的第一電極及第二電極,一般進行焊料接合,然而電極的面積越大,焊料接合過程中發生電路短路的機率越高。因此,有可能發生發光裝置不良,降低可靠性。 Further, in the conventional light-emitting device, in order to improve the heat dissipation efficiency of the light-emitting diode, a method of forming a relatively increased electrode area is employed. However, in order to mount the first electrode and the second electrode of the light-emitting diode on the secondary substrate, solder bonding is generally performed. However, the larger the area of the electrode, the higher the probability of occurrence of a circuit short circuit during solder bonding. Therefore, there is a possibility that the light-emitting device is defective and the reliability is lowered.
因此,需要一種具有能夠有效釋放覆晶式發光二極體所產生熱量的結構的發光二極體、次級基板及包括其的發光裝置,以及能夠防止電路短路的發光裝置製造方法。 Accordingly, there is a need for a light emitting diode having a structure capable of effectively releasing heat generated by a flip chip type light emitting diode, a secondary substrate, and a light emitting device including the same, and a light emitting device manufacturing method capable of preventing a short circuit of the circuit.
本發明所要解決的技術問題是,提供一種散熱效率提升的發光二極體及包括其的發光裝置。 The technical problem to be solved by the present invention is to provide a light-emitting diode with improved heat dissipation efficiency and a light-emitting device including the same.
本發明所要解決的另一技術問題是,提供一種方法,藉由簡化的製程製造提升散熱效率的發光裝置。 Another technical problem to be solved by the present invention is to provide a method for manufacturing a light-emitting device that improves heat dissipation efficiency by a simplified process.
根據本發明一個方面的發光裝置包括:發光二極體及基板,所述基板包括基座及位於所述基座上的導電性圖案,且所述基板貼裝到所述發光二極體,所述發光二極體包括:發光結構體,所述發光結構體包括第一導電型半導體層、位於所述第一導電型半導體層的下面的活性層以及位於所述活性層的下面的第二導電型半導體層;部分地去除所述活性層及第二導電型半導體層而使所述第一導電型半導體層的下表面部分地露出的區域;電極層,其位於所述第二導電型半導體層的下面而形成歐姆接觸;第一金 屬層,其通過所述第一導電型半導體層露出的區域而與所述第一導電型半導體層形成歐姆接觸;第一絕緣層,其部分地覆蓋所述第一金屬層和所述電極層;第一凸塊及第二凸塊,其位於所述發光結構體的下部而與所述導電性圖案接觸,所述第一凸塊及第二凸塊分別與所述第一金屬層及所述電極層電連接;及散熱電極,其位於所述發光結構體的下部且與所述基座接觸並與所述發光結構體電絕緣;其中,所述第一導電型半導體層部分地露出的區域包括所述第一導電型半導體層露出的多個孔以及連接所述孔的至少一個連接孔,而所述第一凸塊、第二凸塊及所述散熱電極相互隔開,所述散熱電極的熱傳導性高於所述第一凸塊及第二凸塊的熱傳導性。 A light emitting device according to an aspect of the present invention includes: a light emitting diode and a substrate, the substrate including a base and a conductive pattern on the base, and the substrate is attached to the light emitting diode, The light emitting diode includes: a light emitting structure including a first conductive type semiconductor layer, an active layer under the first conductive type semiconductor layer, and a second conductive layer under the active layer a semiconductor layer; a region partially removing the active layer and the second conductive semiconductor layer to partially expose a lower surface of the first conductive semiconductor layer; and an electrode layer located in the second conductive semiconductor layer Underside the ohmic contact; the first gold a genus layer that forms an ohmic contact with the first conductive type semiconductor layer through a region where the first conductive type semiconductor layer is exposed; a first insulating layer partially covering the first metal layer and the electrode layer a first bump and a second bump, which are located at a lower portion of the light emitting structure and are in contact with the conductive pattern, wherein the first bump and the second bump are respectively associated with the first metal layer and Electrically connecting the electrode layer; and a heat dissipating electrode located at a lower portion of the light emitting structure and in contact with the base and electrically insulated from the light emitting structure; wherein the first conductive type semiconductor layer is partially exposed The region includes a plurality of holes exposing the first conductive semiconductor layer and at least one connection hole connecting the holes, and the first bump, the second bump, and the heat dissipation electrode are spaced apart from each other, and the heat dissipation The thermal conductivity of the electrode is higher than the thermal conductivity of the first bump and the second bump.
因此,能夠提供散熱效率提升的發光裝置。 Therefore, it is possible to provide a light-emitting device with improved heat dissipation efficiency.
所述發光二極體還可以包括覆蓋所述第一凸塊、第二凸塊及所述散熱電極側面的絕緣物質部。 The light emitting diode may further include an insulating material portion covering the first bump, the second bump, and the side surface of the heat dissipation electrode.
所述絕緣物質部的下表面、所述第一凸塊的下表面、所述第二凸塊的下表面及所述散熱電極的下表面可以以相同高度並排形成。 The lower surface of the insulating material portion, the lower surface of the first bump, the lower surface of the second bump, and the lower surface of the heat dissipating electrode may be formed side by side at the same height.
所述基座可以包括突出部,所述突出部的上表面、所述金屬圖案的上表面可以以相同高度並排形成。 The pedestal may include a protrusion, and an upper surface of the protrusion, an upper surface of the metal pattern may be formed side by side at the same height.
所述第一凸塊、第二凸塊及散熱電極可以包含焊料。 The first bump, the second bump, and the heat dissipation electrode may include solder.
所述散熱電極可以位於所述第一凸塊和所述第二凸塊之間。 The heat dissipation electrode may be located between the first bump and the second bump.
另外,所述導電性圖案可以包括與所述第一凸塊接觸的第一導電性圖案及與所述第二凸塊接觸的第二導電性圖案,所述 基座可以包括位於所述第一及第二導電性圖案之間的突出部。 In addition, the conductive pattern may include a first conductive pattern in contact with the first bump and a second conductive pattern in contact with the second bump, The pedestal may include a protrusion between the first and second conductive patterns.
所述發光二極體還可以包括位於所述發光結構體和所述散熱電極之間的絕緣層。 The light emitting diode may further include an insulating layer between the light emitting structure and the heat dissipation electrode.
所述第一及第二凸塊可以與所述導電性圖案直接黏接。 The first and second bumps may be directly bonded to the conductive pattern.
在幾個實施例中,還可以包括位於所述基座和所述導電性圖案之間的絕緣圖案,所述基座及所述導電性圖案可以包含金屬。 In some embodiments, an insulating pattern between the susceptor and the conductive pattern may also be included, and the pedestal and the conductive pattern may comprise a metal.
所述電極層可以以單一體形成。 The electrode layer may be formed in a single body.
所述第一凸塊和第二凸塊可以分別與所述第一金屬層的一部分及所述電極層的一部分直接接觸。 The first bump and the second bump may be in direct contact with a portion of the first metal layer and a portion of the electrode layer, respectively.
根據本發明另一個方面的發光二極體包括:發光結構體,其包括第一導電型半導體層、位於所述第一導電型半導體層的下面的活性層及位於所述活性層的下面的第二導電型半導體層;部分地去除所述活性層及第二導電型半導體層而使所述第一導電型半導體層的下表面部分地露出的區域;電極層,其位於所述第二導電型半導體層的下面而形成歐姆接觸;第一金屬層,其通過所述第一導電型半導體層露出的區域而與所述第一導電型半導體層形成歐姆接觸;第一絕緣層,其部分地覆蓋所述第一金屬層和所述電極層;第一凸塊及第二凸塊,其位於所述發光結構體的下部且分別與所述第一金屬層及所述電極層電連接;及,散熱電極,其位於所述發光結構體的下部且與所述發光結構體電絕緣;其中,所述第一導電型半導體層部分地露出的區域包括所述第一導電型半導體層露出的多個孔以及連接所述孔的至少一個連接孔,而所述第一凸塊、第二凸塊及所述散熱電極相互隔開,所 述散熱電極的熱傳導性高於所述第一及第二凸塊的熱傳導性。 A light emitting diode according to another aspect of the present invention includes: a light emitting structure including a first conductive type semiconductor layer, an active layer under the first conductive type semiconductor layer, and a portion located under the active layer a second conductive type semiconductor layer; a region partially removing the active layer and the second conductive type semiconductor layer to partially expose a lower surface of the first conductive type semiconductor layer; and an electrode layer located at the second conductive type Forming an ohmic contact under the semiconductor layer; a first metal layer forming an ohmic contact with the first conductive type semiconductor layer through a region where the first conductive type semiconductor layer is exposed; the first insulating layer partially covering The first metal layer and the electrode layer; the first bump and the second bump are located at a lower portion of the light emitting structure and electrically connected to the first metal layer and the electrode layer, respectively; a heat dissipating electrode located at a lower portion of the light emitting structure and electrically insulated from the light emitting structure; wherein a region where the first conductive type semiconductor layer is partially exposed includes the first conductive A plurality of apertures and at least one connection hole connecting the holes of the semiconductor layer is exposed, and the first bump and the second bump electrodes spaced cooling, the The thermal conductivity of the heat dissipating electrode is higher than the thermal conductivity of the first and second bumps.
所述發光二極體還可以包括覆蓋所述第一凸塊、第二凸塊及所述散熱電極側面的絕緣物質部。 The light emitting diode may further include an insulating material portion covering the first bump, the second bump, and the side surface of the heat dissipation electrode.
所述第一凸塊、第二凸塊及散熱電極可以包含焊料。 The first bump, the second bump, and the heat dissipation electrode may include solder.
所述發光二極體還包括位於所述發光結構體和所述散熱電極之間的絕緣層。 The light emitting diode further includes an insulating layer between the light emitting structure and the heat dissipating electrode.
所述散熱電極可以位於所述第一凸塊和所述第二凸塊之間。 The heat dissipation electrode may be located between the first bump and the second bump.
根據本發明另一個方面的發光裝置製造方法包括:在基板上貼裝發光二極體,所述基板包括基座以及位於所述基座上的導電性圖案,其中,所述發光二極體包括:發光結構體,其包括第一導電型半導體層、位於所述第一導電型半導體層下面的活性層以及位於所述活性層下面的第二導電型半導體層;部分地去除所述活性層及第二導電型半導體層而使所述第一導電型半導體層的下表面部分地露出的區域;電極層,其位於所述第二導電型半導體層的下面且形成歐姆接觸;第一金屬層,其通過所述第一導電型半導體層露出的區域且與所述第一導電型半導體層形成歐姆接觸;第一絕緣層,其部分地覆蓋所述第一金屬層和所述電極層;第一凸塊及第二凸塊,其位於所述發光結構體的下部且與所述導電性圖案接觸,所述第一凸塊及所述第二凸塊分別與所述第一金屬層及所述電極層電連接;及,散熱電極,其位於所述發光結構體的下部且與所述基座接觸;其中,所述第一導電型半導體層部分地露出的區域包括所述第一導電型半導體層露出的多個孔以及連接所述孔的至少一個連接孔,而所述第一凸塊、第二凸塊及所 述散熱電極相互隔開,所述散熱電極的熱傳導性高於所述第一凸塊及第二凸塊的熱傳導性。 A method of fabricating a light emitting device according to another aspect of the present invention includes: mounting a light emitting diode on a substrate, the substrate including a base and a conductive pattern on the base, wherein the light emitting diode includes An illuminating structure comprising a first conductive semiconductor layer, an active layer under the first conductive semiconductor layer, and a second conductive semiconductor layer under the active layer; partially removing the active layer and a second conductive type semiconductor layer to partially expose a lower surface of the first conductive type semiconductor layer; an electrode layer located under the second conductive type semiconductor layer and forming an ohmic contact; the first metal layer, Passing through a region exposed by the first conductive type semiconductor layer and forming an ohmic contact with the first conductive type semiconductor layer; a first insulating layer partially covering the first metal layer and the electrode layer; a bump and a second bump located at a lower portion of the light emitting structure and in contact with the conductive pattern, wherein the first bump and the second bump respectively correspond to the first gold The layer and the electrode layer are electrically connected; and a heat dissipating electrode is located at a lower portion of the light emitting structure and in contact with the pedestal; wherein a region where the first conductive semiconductor layer is partially exposed includes the a plurality of holes exposed by a conductive semiconductor layer and at least one connection hole connecting the holes, and the first bumps, the second bumps, and the The heat dissipating electrodes are spaced apart from each other, and the heat dissipating electrode has higher thermal conductivity than the first bump and the second bump.
所述發光二極體還可以包括覆蓋所述第一凸塊、第二凸塊及所述散熱電極的側面的絕緣物質部。 The light emitting diode may further include an insulating material portion covering the first bump, the second bump, and a side surface of the heat dissipation electrode.
在所述基板上貼裝所述發光二極體包括:在基板的規定區域配置所述發光二極體,前提是所述第一凸塊、第二凸塊及散熱電極接觸到所述基板上;將所述第一凸塊、第二凸塊及散熱電極加熱至焊料的熔點以上;及冷卻所述焊料。 Mounting the light emitting diode on the substrate includes: arranging the light emitting diode in a predetermined area of the substrate, provided that the first bump, the second bump, and the heat dissipating electrode are in contact with the substrate Heating the first bump, the second bump, and the heat dissipation electrode to a temperature above the melting point of the solder; and cooling the solder.
所述基座可以包括突出部,所述第一凸塊及第二凸塊配置於所述導電性圖案上,所述散熱電極可以配置於所述突出部上。 The pedestal may include a protrusion, the first bump and the second bump are disposed on the conductive pattern, and the heat dissipation electrode may be disposed on the protrusion.
所述突出部的上表面和所述導電性圖案的上表面可以以相同高度並排形成。 The upper surface of the protrusion and the upper surface of the conductive pattern may be formed side by side at the same height.
所述基板還可以包括位於所述導電性圖案和所述基座之間的絕緣圖案,所述導電性圖案和所述基座可以包含金屬。 The substrate may further include an insulating pattern between the conductive pattern and the susceptor, and the conductive pattern and the pedestal may include a metal.
所述發光二極體還包括位於所述發光結構體和所述散熱電極之間的絕緣層。 The light emitting diode further includes an insulating layer between the light emitting structure and the heat dissipating electrode.
根據本發明,提供一種因包括熱傳導性相對高的散熱電極而提升散熱效率的發光二極體及包括其的發光裝置。另外,因為包括多個凸塊及散熱電極焊料,因此能夠簡化發光裝置製造製程,提高製造出的發光裝置的可靠性。 According to the present invention, there is provided a light-emitting diode which improves heat dissipation efficiency by including a heat-dissipating electrode having a relatively high thermal conductivity, and a light-emitting device including the same. In addition, since the plurality of bumps and the heat-dissipating electrode solder are included, the manufacturing process of the light-emitting device can be simplified, and the reliability of the manufactured light-emitting device can be improved.
11‧‧‧發光結構體 11‧‧‧Lighting structure
13‧‧‧第一電極 13‧‧‧First electrode
15‧‧‧第二電極 15‧‧‧second electrode
20‧‧‧基板 20‧‧‧Substrate
21‧‧‧絕緣體 21‧‧‧Insulator
23‧‧‧第一基座 23‧‧‧First base
25‧‧‧第二基座 25‧‧‧Second base
30‧‧‧基板 30‧‧‧Substrate
31‧‧‧絕緣層 31‧‧‧Insulation
33‧‧‧第一導電性圖案 33‧‧‧First conductive pattern
35‧‧‧第二導電性圖案 35‧‧‧Second conductive pattern
37‧‧‧基座 37‧‧‧Base
100‧‧‧發光二極體 100‧‧‧Lighting diode
100a‧‧‧發光二極體 100a‧‧‧Lighting diode
100b‧‧‧發光二極體 100b‧‧‧Lighting diode
120‧‧‧發光結構體 120‧‧‧Lighted structure
120a‧‧‧孔 120a‧‧ hole
120b‧‧‧連接孔 120b‧‧‧connection hole
121‧‧‧第一導電型半導體層 121‧‧‧First Conductive Semiconductor Layer
123‧‧‧活性層 123‧‧‧Active layer
125‧‧‧第二導電型半導體層 125‧‧‧Second conductive semiconductor layer
130‧‧‧電極層 130‧‧‧electrode layer
131‧‧‧第二電極片 131‧‧‧Second electrode
140‧‧‧第一金屬層 140‧‧‧First metal layer
141‧‧‧第一電極片 141‧‧‧First electrode
150‧‧‧絕緣層 150‧‧‧Insulation
150'‧‧‧絕緣層 150'‧‧‧Insulation
151‧‧‧第一絕緣層 151‧‧‧First insulation
151a‧‧‧第一開口部 151a‧‧‧First opening
151b‧‧‧第二開口部 151b‧‧‧second opening
153‧‧‧第二絕緣層 153‧‧‧Second insulation
153a‧‧‧第三開口部 153a‧‧‧3rd opening
153b‧‧‧第四開口部 153b‧‧‧fourth opening
161‧‧‧第一凸塊 161‧‧‧First bump
163‧‧‧第二凸塊 163‧‧‧second bump
170‧‧‧散熱電極 170‧‧‧heating electrode
180‧‧‧絕緣物質部 180‧‧‧Inserts Division
200‧‧‧基板 200‧‧‧Substrate
210‧‧‧基座 210‧‧‧Base
220‧‧‧絕緣圖案 220‧‧‧Insulation pattern
230‧‧‧導電性圖案 230‧‧‧Electrical pattern
A-A、B-B‧‧‧線 A-A, B-B‧‧ lines
R‧‧‧粗糙面 R‧‧‧Rough surface
圖1(a)與圖1(b)是用於說明以往發光裝置的剖面圖。 1(a) and 1(b) are cross-sectional views for explaining a conventional light-emitting device.
圖2是用於說明本發明一個實施例的發光裝置的剖面圖。 Figure 2 is a cross-sectional view for explaining a light-emitting device according to an embodiment of the present invention.
圖3是用於說明本發明另一實施例的發光裝置製造方法的剖面圖。 Figure 3 is a cross-sectional view for explaining a method of manufacturing a light-emitting device according to another embodiment of the present invention.
圖4是用於說明本發明另一實施例的發光二極體的剖面圖。 Figure 4 is a cross-sectional view for explaining a light-emitting diode according to another embodiment of the present invention.
圖5(a)與圖5(b)至圖7是用於說明本發明另一實施例的發光二極體的俯視圖及剖面圖。 5(a) and 5(b) to 7 are a plan view and a cross-sectional view for explaining a light-emitting diode according to another embodiment of the present invention.
下面參照附圖,詳細說明本發明的實施例。下面介紹的實施例是為了能夠向本發明所屬領域的技術人員充分傳達本發明的思想而作為示例提供的。因此,本發明不限定於以下說明的實施例,也可以以其它形態而具體化。而且,在附圖中,為了便利,結構要素的寬度、長度、厚度等也可以誇張表現。另外,當記載為一個結構要素在其它結構要素的“上部”或“上面”時,不僅包括各部分在其它部分的“緊上部”或“緊上面”的情形,也包括在各結構要素與其它結構要素之間還有另外結構要素的情形。在通篇說明書中,相同參照符號代表相同的結構要素。 Embodiments of the present invention will be described in detail below with reference to the accompanying drawings. The embodiments described below are provided as examples in order to fully convey the idea of the present invention to those skilled in the art to which the invention pertains. Therefore, the present invention is not limited to the embodiments described below, and may be embodied in other forms. Moreover, in the drawings, the width, length, thickness, and the like of the structural elements may be exaggerated for convenience. In addition, when it is described that one structural element is "upper" or "above" other structural elements, it includes not only the "tight upper portion" or "tightly" portion of the other portions, but also the various structural elements and others. There are also other structural elements between structural elements. Throughout the specification, the same reference symbols represent the same structural elements.
圖2是用於說明本發明一個實施例的發光裝置的剖面圖。另外,圖4是用於說明本發明另一實施例的發光二極體的剖面圖。圖5(a)與圖5(b)至圖7是用於說明本發明另一實施例的發光二極體的俯視圖及剖面圖。 Figure 2 is a cross-sectional view for explaining a light-emitting device according to an embodiment of the present invention. 4 is a cross-sectional view for explaining a light-emitting diode according to another embodiment of the present invention. 5(a) and 5(b) to 7 are a plan view and a cross-sectional view for explaining a light-emitting diode according to another embodiment of the present invention.
如圖2所示,所述發光裝置包括發光二極體100及基板 200。發光二極體100可以位於基板200上。 As shown in FIG. 2, the light emitting device includes a light emitting diode 100 and a substrate 200. The light emitting diode 100 may be located on the substrate 200.
發光二極體100包括發光結構體120、第一凸塊161、第二凸塊163及散熱電極170。進而,發光二極體100還可以包括絕緣層150及絕緣物質部180。另一方面,基板200可以包括基座210、導電性圖案230,另外,還可以包括位於基座210和導電性圖案230之間至少一部分區域的絕緣圖案220。 The light emitting diode 100 includes a light emitting structure 120, a first bump 161, a second bump 163, and a heat dissipation electrode 170. Further, the light emitting diode 100 may further include an insulating layer 150 and an insulating material portion 180. On the other hand, the substrate 200 may include a susceptor 210, a conductive pattern 230, and may further include an insulation pattern 220 at least a portion of the area between the susceptor 210 and the conductive pattern 230.
首先,關於發光二極體100進行說明。 First, the light-emitting diode 100 will be described.
發光結構體120包括第一導電型半導體層、第二導電型半導體層及位於第一導電型半導體層和第二導電型半導體層之間的活性層,包括能夠發光的結構。發光結構體120的結構只要是能夠向其下部方向電連接第一凸塊161和第二凸塊163即可,不進行特別限定。關於發光二極體100及發光結構體120的具體結構,將在後文中參考圖4至圖7進行說明。 The light emitting structure 120 includes a first conductive type semiconductor layer, a second conductive type semiconductor layer, and an active layer between the first conductive type semiconductor layer and the second conductive type semiconductor layer, and includes a structure capable of emitting light. The structure of the light-emitting structure 120 is not particularly limited as long as it can electrically connect the first bump 161 and the second bump 163 in the lower direction. The specific structure of the light-emitting diode 100 and the light-emitting structure 120 will be described later with reference to FIGS. 4 to 7.
第一凸塊161及第二凸塊163可以位於發光結構體120的下部。第一凸塊161及第二凸塊163相互隔開絕緣,能夠以不同的極性電連接。例如,第一凸塊161可以與發光結構體120的N型半導體層電連接,第二凸塊163可以與發光結構體120的P型半導體層電連接。 The first bump 161 and the second bump 163 may be located at a lower portion of the light emitting structure 120. The first bump 161 and the second bump 163 are insulated from each other and can be electrically connected with different polarities. For example, the first bump 161 may be electrically connected to the N-type semiconductor layer of the light emitting structure 120, and the second bump 163 may be electrically connected to the P-type semiconductor layer of the light emitting structure 120.
第一凸塊161可以鄰接發光結構體120下表面的一側進行配置,與此對應,第二凸塊163可以鄰接發光結構體120下表面的另一側進行配置。此時,如圖所示,可以在第一凸塊161和第二凸塊163之間的區域提供規定的空間。所述規定的空間上可以配置散熱電極170。因此,散熱電極170可以配置在第一凸塊161和第二凸塊163之間。但是,本發明並不限定於此,可以根據 需要,多樣地變更第一凸塊161及第二凸塊163和散熱電極170的配置形態。 The first bump 161 may be disposed adjacent to a side of the lower surface of the light emitting structure 120. Correspondingly, the second bump 163 may be disposed adjacent to the other side of the lower surface of the light emitting structure 120. At this time, as shown in the drawing, a prescribed space may be provided in a region between the first bump 161 and the second bump 163. The predetermined heat dissipation electrode 170 may be disposed in the space. Therefore, the heat dissipation electrode 170 may be disposed between the first bump 161 and the second bump 163. However, the present invention is not limited to this and can be It is necessary to variously change the arrangement of the first bump 161 and the second bump 163 and the heat dissipation electrode 170.
另一方面,第一凸塊161和第二凸塊163可以包含金屬等導電性物質,特別是可以包含焊料。焊料可以是通常的技術人員公知的焊料,可以包含錫、銅、銀、鉍、銦(In)、鋅、銻、鉛等。例如,所述焊料可以是錫-銀-銅系焊料。 On the other hand, the first bump 161 and the second bump 163 may contain a conductive substance such as metal, and particularly may include solder. The solder may be a solder known to those skilled in the art and may contain tin, copper, silver, antimony, indium (In), zinc, antimony, lead, and the like. For example, the solder may be a tin-silver-copper based solder.
另外,第一凸塊161和第二凸塊163可以分別以單層或多層形成。第一凸塊161和第二凸塊163以單層形成時,第一凸塊161和第二凸塊163可以分別以焊料形成。不同於此,第一凸塊161和第二凸塊163以多層形成時,可在最下部配置焊料層。此時,所述焊料層可以與基板200的導電性圖案230接觸和接合。 In addition, the first bump 161 and the second bump 163 may be formed in a single layer or a plurality of layers, respectively. When the first bump 161 and the second bump 163 are formed in a single layer, the first bump 161 and the second bump 163 may be formed of solder, respectively. Unlike this, when the first bump 161 and the second bump 163 are formed in a plurality of layers, the solder layer may be disposed at the lowermost portion. At this time, the solder layer may be in contact with and bonded to the conductive pattern 230 of the substrate 200.
散熱電極170可以位於發光結構體120的下部,與發光結構體120物理連接。散熱電極170起到將發光結構體120產生的熱量從發光結構體120向外散熱的作用。 The heat dissipation electrode 170 may be located at a lower portion of the light emitting structure 120 and physically connected to the light emitting structure 120. The heat dissipation electrode 170 functions to dissipate heat generated by the light emitting structure 120 from the light emitting structure 120 to the outside.
散熱電極170可以包含熱傳導性相對高的物質,尤其,散熱電極170的熱傳導性可以高於第一凸塊161及第二凸塊163的熱傳導性。散熱電極170可以包含金屬,另外,可以包含焊料。焊料可以是通常的技術人員公知的焊料,可以包含錫、銅、銀、鉍、銦、鋅、銻、鉛等。例如,所述焊料可以是錫-銀-銅系焊料,但是,本發明並非限定於此。尤其,散熱電極170的焊料可以形成為比第一凸塊161及第二凸塊163具有更高的熱傳導性。 The heat dissipation electrode 170 may include a material having relatively high thermal conductivity. In particular, the thermal conductivity of the heat dissipation electrode 170 may be higher than the thermal conductivity of the first bump 161 and the second bump 163. The heat dissipation electrode 170 may contain metal and, in addition, may include solder. The solder may be a solder known to those skilled in the art and may contain tin, copper, silver, antimony, indium, zinc, antimony, lead, and the like. For example, the solder may be tin-silver-copper based solder, but the invention is not limited thereto. In particular, the solder of the heat dissipation electrode 170 may be formed to have higher thermal conductivity than the first bump 161 and the second bump 163.
另外,散熱電極170可以以單層或多層形成。散熱電極170以多層形成時,可在最下部配置焊料層。此時,所述焊料層可以與基板200的基座210接觸和接合。 In addition, the heat dissipation electrode 170 may be formed in a single layer or a plurality of layers. When the heat dissipation electrode 170 is formed in a plurality of layers, the solder layer can be disposed at the lowermost portion. At this time, the solder layer may be in contact with and bonded to the susceptor 210 of the substrate 200.
散熱電極170以物理方式與發光結構體120連接,散熱電極170的面積越大,散熱效率越高。因此,散熱電極170與發光結構體120接觸的面積可以大於第一凸塊161及/或第二凸塊163與發光結構體120接觸的面積。另外,散熱電極170的熱傳導性可以大於第一凸塊161及第二凸塊163的熱傳導性,所以能夠進一步提高發光裝置的散熱效率。另外,散熱電極170可以位於第一凸塊161和第二凸塊163之間,進而位於發光結構體120中心部位下側。但是,本發明並非限定於此,散熱電極170、第一凸塊161及第二凸塊163的配置可以進行多樣的變更。 The heat dissipation electrode 170 is physically connected to the light emitting structure 120, and the larger the area of the heat dissipation electrode 170, the higher the heat dissipation efficiency. Therefore, the area of the heat dissipation electrode 170 in contact with the light emitting structure 120 may be larger than the area in which the first bump 161 and/or the second bump 163 are in contact with the light emitting structure 120. In addition, the thermal conductivity of the heat dissipation electrode 170 can be greater than the thermal conductivity of the first bump 161 and the second bump 163, so that the heat dissipation efficiency of the light emitting device can be further improved. In addition, the heat dissipation electrode 170 may be located between the first bump 161 and the second bump 163 and further located on the lower side of the central portion of the light emitting structure 120. However, the present invention is not limited thereto, and the arrangement of the heat dissipation electrode 170, the first bump 161, and the second bump 163 can be variously changed.
進而,發光二極體100還可以包括絕緣層150,發光結構體120和散熱電極170可以由絕緣層150絕緣。絕緣層150可以包含SiOx、SiNx等矽類絕緣物質,另外,還可以包含熱傳導性優秀的其他絕緣物質。另外,還可以包括折射率不同的電介質層交替層疊地分佈布拉格反射器。 Further, the light emitting diode 100 may further include an insulating layer 150, and the light emitting structure 120 and the heat dissipation electrode 170 may be insulated by the insulating layer 150. The insulating layer 150 may contain an anthracene insulating material such as SiO x or SiN x , and may further contain another insulating material excellent in thermal conductivity. In addition, it is also possible to include a Bragg reflector in which the dielectric layers having different refractive indices are alternately stacked.
如上所述,散熱電極170藉由絕緣層150與發光結構體120絕緣,能夠盡可能地防止所述發光裝置運轉時因散熱電極170而發生短路等電路故障。同時,散熱電極170和發光結構體120隔著絕緣層150以物理方式連接,使得發光結構體120產生的熱量能夠有效地傳導至散熱電極170,提升發光二極體100的散熱效率。 As described above, the heat dissipation electrode 170 is insulated from the light emitting structure 120 by the insulating layer 150, and it is possible to prevent circuit failure such as short circuit due to the heat radiation electrode 170 during operation of the light emitting device as much as possible. At the same time, the heat dissipating electrode 170 and the light emitting structure 120 are physically connected via the insulating layer 150, so that the heat generated by the light emitting structure 120 can be effectively conducted to the heat dissipating electrode 170, thereby improving the heat dissipating efficiency of the light emitting diode 100.
如上所述,根據本發明,第一凸塊161、第二凸塊163及散熱電極170包含焊料。因此,在基板200上貼裝發光二極體100的製程中,僅以在基板200的規定區域配置發光二極體100並加熱至焊料熔點以上溫度後冷卻的製程,即可在基板200上接 合發光二極體100。 As described above, according to the present invention, the first bump 161, the second bump 163, and the heat dissipation electrode 170 contain solder. Therefore, in the process of mounting the light-emitting diode 100 on the substrate 200, the substrate 200 can be connected only by the process of arranging the light-emitting diode 100 in a predetermined region of the substrate 200 and heating it to a temperature equal to or higher than the melting point of the solder. The light emitting diode 100 is combined.
具體地,參考圖3,對根據本發明另一實施例的發光裝置製造方法進行說明。 Specifically, a method of manufacturing a light-emitting device according to another embodiment of the present invention will be described with reference to FIG. 3.
如圖3所示,在包括基座210及導電性圖案230的基板200上配置發光二極體100。此時,可以在對應於基座210的突出部的位置配置發光二極體100。正因為基座210包括突出部,所述突出部起到標示發光二極體100貼裝區域的作用。因此,在貼裝發光二極體100的製程中,使得配置發光二極體100的製程變得簡單。 As shown in FIG. 3, the light-emitting diode 100 is disposed on the substrate 200 including the susceptor 210 and the conductive pattern 230. At this time, the light emitting diode 100 can be disposed at a position corresponding to the protruding portion of the susceptor 210. Just because the susceptor 210 includes a protrusion, the protrusion functions to mark the mounting area of the light-emitting diode 100. Therefore, in the process of mounting the light-emitting diode 100, the process of disposing the light-emitting diode 100 is simplified.
然後,將溫度加熱至焊料的熔點以上後冷卻時,第一凸塊161、第二凸塊163及散熱電極170中包含的焊料會熔化後冷卻,使發光二極體100接合到基板200上。尤其,在形成絕緣物質部180的情況下,第一凸塊161、第二凸塊163及散熱電極170不會流向側面或其形態發生變形,能夠提高可靠性。 Then, when the temperature is heated to the melting point of the solder or more and then cooled, the solder contained in the first bump 161, the second bump 163, and the heat dissipation electrode 170 is melted and then cooled, and the light emitting diode 100 is bonded to the substrate 200. In particular, in the case where the insulating material portion 180 is formed, the first bump 161, the second bump 163, and the heat dissipation electrode 170 do not flow to the side surface or the shape thereof is deformed, and reliability can be improved.
如上所述,根據本發明,可以省略對發光二極體100和基板200進行接合所需的其他製程。例如,無需在發光二極體100和基板200之間添加焊料或黏接劑進行接合。因此,可以避免焊接製程中可能發生的電路短路等問題,使得基板200上貼裝發光二極體100的製程變得非常簡單。另外,能夠防止焊接等接合製程中可能發生的不良,提高製造出的發光裝置的可靠性。 As described above, according to the present invention, other processes required for bonding the light-emitting diode 100 and the substrate 200 can be omitted. For example, it is not necessary to add solder or an adhesive between the light-emitting diode 100 and the substrate 200 for bonding. Therefore, problems such as short circuit of the circuit which may occur in the soldering process can be avoided, and the process of mounting the light emitting diode 100 on the substrate 200 becomes very simple. In addition, it is possible to prevent defects that may occur in the bonding process such as soldering, and to improve the reliability of the manufactured light-emitting device.
再次參考圖2可知,發光二極體100還可以包括包裹第一凸塊161、第二凸塊163及散熱電極170側面的絕緣物質部180。 Referring to FIG. 2 again, the LED assembly 100 may further include an insulating material portion 180 that surrounds the first bump 161, the second bump 163, and the side surface of the heat dissipation electrode 170.
絕緣物質部180具有電絕緣性,覆蓋第一凸塊161、第二凸塊163及散熱電極170的側面,對其進行有效絕緣。與此同時, 絕緣物質部180起到對第一凸塊161、第二凸塊163及散熱電極170進行支撐的作用。因此,在基板200上貼裝發光二極體100的過程中,能夠防止第一凸塊161、第二凸塊163及散熱電極170中包含的焊料熔化而相互接觸。 The insulating material portion 180 has electrical insulation and covers the side surfaces of the first bump 161, the second bump 163, and the heat dissipation electrode 170, and is effectively insulated. at the same time, The insulating material portion 180 functions to support the first bump 161, the second bump 163, and the heat dissipation electrode 170. Therefore, in the process of attaching the light-emitting diode 100 to the substrate 200, it is possible to prevent the solder contained in the first bump 161, the second bump 163, and the heat dissipation electrode 170 from being melted and coming into contact with each other.
絕緣物質部180的下表面可以與第一凸塊161、第二凸塊163及散熱電極170的下表面大致以相同高度並排形成。因此,能夠使發光二極體100更穩定地貼裝到基板200上。 The lower surface of the insulating material portion 180 may be formed side by side at substantially the same height as the lower surfaces of the first bump 161, the second bump 163, and the heat dissipation electrode 170. Therefore, the light emitting diode 100 can be attached to the substrate 200 more stably.
絕緣物質部180可以包含樹脂。所述樹脂可以包含矽或各種高分子物質。另外,絕緣物質部180可以具有反光性,絕緣物質部180包含樹脂時,所述樹脂可以是包含矽的反射性樹脂。或者,所述樹脂也可以包含二氧化鈦粒子等反光性及散光粒子。正因為絕緣物質部180具有反射性,從發光結構體120釋放的光被反射到上部,提高發光裝置的光效率。 The insulating material portion 180 may contain a resin. The resin may contain hydrazine or various high molecular substances. Further, the insulating material portion 180 may have a light reflecting property, and when the insulating material portion 180 contains a resin, the resin may be a reflective resin containing ruthenium. Alternatively, the resin may contain a light-reflecting property such as titanium dioxide particles and astigmatism particles. Just because the insulating material portion 180 is reflective, light emitted from the light emitting structure 120 is reflected to the upper portion, improving the light efficiency of the light emitting device.
另外,絕緣物質部180可以還覆蓋發光結構體120的側面,此時,發光二極體100的發光角度可能會發生變化。即,絕緣物質部180還覆蓋發光結構體120的側面時,從發光二極體100的側面釋放的部分光被反射到上部。因此,如果發光結構體120的側面也形成絕緣物質部180,射向發光二極體100上部的光的比率會變高。如上所述,藉由調整絕緣物質部180的配置區域,即可調節發光二極體100的發光角度。 In addition, the insulating material portion 180 may further cover the side surface of the light emitting structure 120. At this time, the light emitting angle of the light emitting diode 100 may change. That is, when the insulating material portion 180 also covers the side surface of the light emitting structure 120, part of the light emitted from the side surface of the light emitting diode 100 is reflected to the upper portion. Therefore, if the insulating material portion 180 is also formed on the side surface of the light emitting structure 120, the ratio of light incident on the upper portion of the light emitting diode 100 becomes high. As described above, by adjusting the arrangement area of the insulating material portion 180, the light-emitting angle of the light-emitting diode 100 can be adjusted.
基板200包括基座210、導電性圖案230,進而,還可以包括絕緣圖案220。 The substrate 200 includes a susceptor 210, a conductive pattern 230, and further, an insulating pattern 220.
基座210可以起到基板200的支撐體的作用,尤其,可以包含熱傳導性優秀的物質。例如,基座210可以包含熱傳導性 優秀的金屬物質,可以包含銀、銅、金、鋁、鉬等。另外,基座210可以以單層或多層形成。不同於此,基座210也可以包含熱傳導性優秀的陶瓷物質或高分子物質。 The susceptor 210 can function as a support of the substrate 200, and in particular, can contain a substance excellent in thermal conductivity. For example, the susceptor 210 can include thermal conductivity Excellent metal materials, including silver, copper, gold, aluminum, molybdenum, etc. In addition, the susceptor 210 may be formed in a single layer or a plurality of layers. Unlike the susceptor 210, the susceptor 210 may contain a ceramic material or a polymer material having excellent thermal conductivity.
另外,基座210可以與散熱電極170直接接觸。進而,基座210可以包括突出部,所述突出部與發光二極體100的散熱電極170接觸。所述突出部的上表面可以以與導電性圖案230的上表面大致相同的高度配置。因此,在基板200上貼裝發光二極體100時,基座210和散熱電極170能夠穩定地接觸。 In addition, the susceptor 210 may be in direct contact with the heat dissipation electrode 170. Further, the susceptor 210 may include a protrusion that is in contact with the heat dissipation electrode 170 of the light emitting diode 100. The upper surface of the protruding portion may be disposed at substantially the same height as the upper surface of the conductive pattern 230. Therefore, when the light-emitting diode 100 is mounted on the substrate 200, the susceptor 210 and the heat-dissipating electrode 170 can be stably contacted.
正因為散熱電極170直接與包含高熱傳導性的物質的基座210接觸,發光二極體100發光時產生的熱量能夠有效地傳導到基座210。因此,能夠提高發光裝置的散熱效率。 Just because the heat radiating electrode 170 is directly in contact with the susceptor 210 containing a substance having high thermal conductivity, heat generated when the light emitting diode 100 emits light can be efficiently conducted to the susceptor 210. Therefore, the heat dissipation efficiency of the light-emitting device can be improved.
根據本發明,發光結構體120和散熱電極170以及基板200的基座210均以物理方式連接,所以發光時產生的熱量能夠有效地散熱。即,能夠解決以往存在的基板基座和發光二極體之間熱傳導性低的問題。 According to the present invention, the light-emitting structure 120 and the heat-dissipating electrode 170 and the susceptor 210 of the substrate 200 are physically connected, so that heat generated during light-emitting can be efficiently radiated. In other words, it is possible to solve the problem of low thermal conductivity between the substrate pedestal and the light-emitting diode which have existed in the past.
導電性圖案230可以位於基座210上並與基座210絕緣。導電性圖案230可以與第一凸塊161及第二凸塊163電連接。因此,導電性圖案230可以包括與第一凸塊161電連接的第一導電性圖案以及與第二凸塊163電連接的第二導電性圖案,第一及第二導電性圖案可以相互絕緣。如圖所示,第一凸塊161及第二凸塊163位於導電性圖案230上,它們能夠相互電連接。 The conductive pattern 230 may be located on the susceptor 210 and insulated from the susceptor 210. The conductive pattern 230 may be electrically connected to the first bump 161 and the second bump 163. Therefore, the conductive pattern 230 may include a first conductive pattern electrically connected to the first bump 161 and a second conductive pattern electrically connected to the second bump 163, and the first and second conductive patterns may be insulated from each other. As shown, the first bumps 161 and the second bumps 163 are located on the conductive pattern 230, and they can be electrically connected to each other.
基座210包含金屬等具有導電性的物質時,絕緣圖案220可以位於基座210和導電性圖案230之間,對基座210和導電性圖案230進行絕緣。另外,基座210包括突出部時,導電性圖案 230和突出部可以隔開絕緣。進而,基座210的突出部和導電性圖案230之間可以夾設絕緣性物質(圖中未示出)。 When the susceptor 210 includes a conductive material such as metal, the insulating pattern 220 may be located between the susceptor 210 and the conductive pattern 230 to insulate the susceptor 210 and the conductive pattern 230. In addition, when the susceptor 210 includes a protrusion, the conductive pattern The 230 and the projections can be insulated from each other. Further, an insulating substance (not shown) may be interposed between the protruding portion of the susceptor 210 and the conductive pattern 230.
不同於此,在基座210包含陶瓷物質或高分子物質而具有電絕緣性時,可以省略絕緣圖案220。 Unlike this, when the susceptor 210 contains a ceramic substance or a polymer substance and has electrical insulation, the insulation pattern 220 can be omitted.
但是,本發明並非限定於此,導電性圖案230可以形成多個。導電性圖案230可以根據發光二極體100的凸塊數量及形態進行多樣地變更。導電性圖案230可以起到電路的作用,也可以起到發光裝置的引線的作用。 However, the present invention is not limited thereto, and the conductive pattern 230 may be formed in plurality. The conductive pattern 230 can be variously changed in accordance with the number and shape of the bumps of the light-emitting diode 100. The conductive pattern 230 may function as a circuit or as a lead of the light-emitting device.
另一方面,導電性圖案230可以配置在與第一凸塊161及第二凸塊163對應的位置,基座210的突出部可以配置在與散熱電極170對應的位置。進而,導電性圖案230的上表面和所述突出部的上表面可以以相同高度並排形成。因此,發光二極體100能夠被穩定地貼裝到基板200上表面。導電性圖案230可以包含金屬。 On the other hand, the conductive pattern 230 may be disposed at a position corresponding to the first bump 161 and the second bump 163, and the protruding portion of the susceptor 210 may be disposed at a position corresponding to the heat dissipation electrode 170. Further, the upper surface of the conductive pattern 230 and the upper surface of the protruding portion may be formed side by side at the same height. Therefore, the light emitting diode 100 can be stably attached to the upper surface of the substrate 200. The conductive pattern 230 may include a metal.
根據本發明實施例的基板200具有基座210上配置絕緣圖案220及導電性圖案230的形態。因此,可以省略以往基座之間進行絕緣層圖案化的製程,能夠降低發光裝置的製造成本。另外,基座210包括突出部,能夠與發光二極體100的散熱電極170直接接觸,增加基座210和發光二極體100之間的接觸面積,顯著提升散熱效率。 The substrate 200 according to the embodiment of the present invention has a configuration in which the insulating pattern 220 and the conductive pattern 230 are disposed on the susceptor 210. Therefore, the process of patterning the insulating layer between the susceptors can be omitted, and the manufacturing cost of the light-emitting device can be reduced. In addition, the susceptor 210 includes a protruding portion that can directly contact the heat dissipating electrode 170 of the illuminating diode 100, increasing the contact area between the pedestal 210 and the illuminating diode 100, and significantly improving the heat dissipation efficiency.
另一方面,在本實施例中示例說明了基板200上貼裝一個發光二極體100的情形,但本發明並非限定於此。本發明的發光裝置還可以包括基板200上貼裝多個發光二極體100的結構。多個發光二極體100可以藉由串聯、並聯、反並聯等方式組成電 連接。多個發光二極體100之間的電連接可由導電性圖案230提供,此時,導電性圖案230起到與電路相同的作用。 On the other hand, in the present embodiment, the case where one light-emitting diode 100 is mounted on the substrate 200 is exemplified, but the present invention is not limited thereto. The light-emitting device of the present invention may further include a structure in which a plurality of light-emitting diodes 100 are mounted on the substrate 200. The plurality of light emitting diodes 100 can be electrically connected by series, parallel, anti-parallel, and the like. connection. The electrical connection between the plurality of light emitting diodes 100 may be provided by the conductive pattern 230, at which time the conductive pattern 230 functions the same as the circuit.
如上所述,本發明的發光裝置可以包括多種形態的發光二極體。首先,圖4是用於說明本發明另一實施例的發光二極體的剖面圖。圖4的實施例中,對於與參考圖2說明的結構具有相同參照符號的結構將省略其詳細說明。 As described above, the light-emitting device of the present invention may include a plurality of forms of light-emitting diodes. First, Fig. 4 is a cross-sectional view for explaining a light-emitting diode according to another embodiment of the present invention. In the embodiment of FIG. 4, the detailed description of the structure having the same reference numerals as those of the structure explained with reference to FIG. 2 will be omitted.
如圖4所示,根據本發明另一實施例的發光二極體100a可以是覆晶式發光二極體。所述發光二極體100a可以包括發光結構體120、第一凸塊161、第二凸塊163及散熱電極170,進而,還可以包括第一電極片141、第二電極片131及絕緣層150'。 As shown in FIG. 4, the light emitting diode 100a according to another embodiment of the present invention may be a flip chip type light emitting diode. The light emitting diode 100a may include a light emitting structure 120, a first bump 161, a second bump 163, and a heat dissipation electrode 170. Further, the light emitting diode 100 may further include a first electrode sheet 141, a second electrode sheet 131, and an insulating layer 150. '.
發光結構體120可以包括第一導電型半導體層121、第二導電型半導體層125及位於第一導電型半導體層121和第二導電型半導體層125之間的活性層123。發光結構體120可以包括台面,所述台面包括第二導電型半導體層125及活性層123,而在沒有形成所述台面的部分可以露出部分的第一導電型半導體層121。 The light emitting structure 120 may include a first conductive type semiconductor layer 121, a second conductive type semiconductor layer 125, and an active layer 123 between the first conductive type semiconductor layer 121 and the second conductive type semiconductor layer 125. The light emitting structure 120 may include a mesa including a second conductive type semiconductor layer 125 and an active layer 123, and a portion of the first conductive type semiconductor layer 121 may be exposed at a portion where the mesa is not formed.
第一導電型半導體層121、活性層123及第二導電型半導體層125可以包括第三族-第五族系化合物半導體,例如,可以包括(鋁,鎵,銦)氮等氮化物系半導體。第一導電型半導體層121可以包含n型雜質(例如,矽),第二導電型半導體層125可以包含p型雜質(例如,鎂)。另外,還可以與此相反。活性層123可以包括多量子阱結構(MQW)。 The first conductive semiconductor layer 121, the active layer 123, and the second conductive semiconductor layer 125 may include a Group III-Group 5 compound semiconductor, and for example, may include a nitride-based semiconductor such as (aluminum, gallium, indium) nitrogen. The first conductive type semiconductor layer 121 may include an n-type impurity (for example, germanium), and the second conductive type semiconductor layer 125 may include a p-type impurity (for example, magnesium). In addition, it can be the opposite. The active layer 123 may include a multiple quantum well structure (MQW).
第一電極片141位於第一導電型半導體層121露出的區域,其可以位於第一凸塊161和第一導電型半導體層121之間。類似地,第二電極片131位於第二導電型半導體層125上,其可 以位於第二凸塊163和第二導電型半導體層125之間。第一電極片141和第二電極片131可以分別與第一導電型半導體層121及第二導電型半導體層125形成歐姆接觸。 The first electrode sheet 141 is located at a region where the first conductive type semiconductor layer 121 is exposed, and may be located between the first bump 161 and the first conductive type semiconductor layer 121. Similarly, the second electrode sheet 131 is located on the second conductive type semiconductor layer 125, which can It is located between the second bump 163 and the second conductive type semiconductor layer 125. The first electrode sheet 141 and the second electrode sheet 131 may be in ohmic contact with the first conductive type semiconductor layer 121 and the second conductive type semiconductor layer 125, respectively.
另外,發光二極體100a還可以包括絕緣層150',絕緣層150'可以配置在發光結構體120和散熱電極170之間。進而,絕緣層150'覆蓋發光結構體120的下表面及第一電極片141和第二電極片131的側面,從外部保護發光結構體120。絕緣層150'可以包含與圖2實施例所示的絕緣層150相類似的物質。 In addition, the light emitting diode 100a may further include an insulating layer 150', and the insulating layer 150' may be disposed between the light emitting structure 120 and the heat radiating electrode 170. Further, the insulating layer 150' covers the lower surface of the light emitting structure 120 and the side faces of the first electrode sheet 141 and the second electrode sheet 131, and protects the light emitting structure 120 from the outside. The insulating layer 150' may comprise a substance similar to the insulating layer 150 shown in the embodiment of FIG.
另一方面,圖4顯示去除生長基板的發光二極體100a,另一方面,發光二極體100a還可以包括位於第一導電型半導體層121上的生長基板。此時,生長基板只要是能夠使發光結構體120生長的基板則不進行限定,例如,可以是藍寶石基板、碳化矽基板、矽基板、氮化鎵基板、氮化鋁基板等。 On the other hand, FIG. 4 shows the light-emitting diode 100a from which the growth substrate is removed, and on the other hand, the light-emitting diode 100a may further include a growth substrate on the first conductive type semiconductor layer 121. In this case, the growth substrate is not limited as long as it can grow the light-emitting structure 120, and may be, for example, a sapphire substrate, a tantalum carbide substrate, a tantalum substrate, a gallium nitride substrate, or an aluminum nitride substrate.
如圖4所示,一般的覆晶式發光二極體100a的發光結構體120下部形成第一凸塊161、第二凸塊163及散熱電極170,不改變以往覆晶式發光二極體的結構,也能提供提升散熱效率的發光二極體。進而,可以在基板200上配置所述圖4所示的發光二極體100a以提供散熱效率優秀的發光裝置。 As shown in FIG. 4, the lower portion of the light-emitting structure 120 of the general flip-chip type light-emitting diode 100a is formed with a first bump 161, a second bump 163, and a heat-dissipating electrode 170, without changing the conventional flip-chip light-emitting diode. The structure also provides a light-emitting diode that improves heat dissipation efficiency. Further, the light-emitting diode 100a shown in FIG. 4 can be disposed on the substrate 200 to provide a light-emitting device excellent in heat dissipation efficiency.
圖5(a)與圖5(b)至圖7是用於說明本發明另一實施例的發光二極體的俯視圖及剖面圖。圖5(a)是用於示出多個孔120a及連接孔120b位置的俯視圖,圖5(b)是顯示發光二極體100b的下表面的俯視圖。圖6及圖7是分別顯示圖5(a)與圖5(b)俯視圖中根據線A-A及線B-B的剖面圖。 5(a) and 5(b) to 7 are a plan view and a cross-sectional view for explaining a light-emitting diode according to another embodiment of the present invention. Fig. 5(a) is a plan view showing the positions of the plurality of holes 120a and the connection holes 120b, and Fig. 5(b) is a plan view showing the lower surface of the light-emitting diode 100b. 6 and 7 are cross-sectional views showing the line A-A and the line B-B in a plan view of Figs. 5(a) and 5(b), respectively.
如圖5(a)與圖5(b)至圖7所示,發光二極體100b包括: 發光結構體120,其包括第一導電型半導體層121、活性層123及第二導電型半導體層125;電極層130;第一金屬層140;第一絕緣層151;第一凸塊161;第二凸塊163及散熱電極170。進而,發光二極體100b還可以包括第二絕緣層153、絕緣物質部180。 As shown in FIG. 5(a) and FIG. 5(b) to FIG. 7, the light emitting diode 100b includes: The light emitting structure 120 includes a first conductive semiconductor layer 121, an active layer 123 and a second conductive semiconductor layer 125; an electrode layer 130; a first metal layer 140; a first insulating layer 151; a first bump 161; The second bump 163 and the heat dissipation electrode 170. Further, the light emitting diode 100b may further include a second insulating layer 153 and an insulating material portion 180.
發光結構體120可以包括第一導電型半導體層121、位於第一導電型半導體層121上的活性層123及位於活性層123上的第二導電型半導體層125。另外,發光結構體120可以包括多個孔120a,所述多個孔120a貫通第二導電型半導體層125及活性層123而露出部分的第一導電型半導體層121,進而,發光結構體120還可以包括連接多個孔120a的至少一個連接孔120b。 The light emitting structure 120 may include a first conductive type semiconductor layer 121, an active layer 123 on the first conductive type semiconductor layer 121, and a second conductive type semiconductor layer 125 on the active layer 123. In addition, the light emitting structure 120 may include a plurality of holes 120a penetrating through the second conductive type semiconductor layer 125 and the active layer 123 to expose a portion of the first conductive type semiconductor layer 121, and further, the light emitting structure 120 is further At least one connection hole 120b connecting the plurality of holes 120a may be included.
第一導電型半導體層121、活性層123及第二導電型半導體層125可以包括第三族-第五族系化合物半導體,例如,可以包括(鋁,鎵,銦)氮等氮化物系半導體。第一導電型半導體層121可以包含n型雜質(例如,矽),第二導電型半導體層125可以包含p型雜質(例如,鎂)。另外,還可以與此相反。活性層123可以包括多量子阱結構(MQW)。 The first conductive semiconductor layer 121, the active layer 123, and the second conductive semiconductor layer 125 may include a Group III-Group 5 compound semiconductor, and for example, may include a nitride-based semiconductor such as (aluminum, gallium, indium) nitrogen. The first conductive type semiconductor layer 121 may include an n-type impurity (for example, germanium), and the second conductive type semiconductor layer 125 may include a p-type impurity (for example, magnesium). In addition, it can be the opposite. The active layer 123 may include a multiple quantum well structure (MQW).
多個孔120a可以部分地去除活性層123和第二導電型半導體層125,使第一導電型半導體層121的上表面部分地露出而形成。多個孔120a的數量及配置位置不限定。例如,如圖所示,可以在整個發光結構體120上配置多個孔120a。 The plurality of holes 120a may partially remove the active layer 123 and the second conductive type semiconductor layer 125, and partially expose the upper surface of the first conductive type semiconductor layer 121. The number and arrangement positions of the plurality of holes 120a are not limited. For example, as shown, a plurality of holes 120a may be disposed on the entire light emitting structure 120.
另外,多個孔120a可以由至少一個連接孔120b相互連接,所述連接孔120b部分地去除活性層123和第二導電型半導體層125而使第一導電型半導體層121的上表面部分地露出。例如,如圖5(a)所示,多個孔120a可以由多個連接孔120b相互連接, 特別是,所有孔120a都可以連接。 In addition, the plurality of holes 120a may be connected to each other by at least one connection hole 120b, which partially removes the active layer 123 and the second conductive type semiconductor layer 125 to partially expose the upper surface of the first conductive type semiconductor layer 121. . For example, as shown in FIG. 5(a), the plurality of holes 120a may be connected to each other by a plurality of connection holes 120b. In particular, all of the holes 120a can be connected.
如後所述,第一金屬層140可以藉由孔120a與第一導電型半導體層121形成歐姆接觸。因此,在整個發光結構體120上配置多個孔120a,使電流能夠大致均勻地分散於整個發光結構體120。進而,多個孔120a由連接孔120b相互連接,電流不會集中於特定的孔120a,而是在整個發光結構體120上大致均勻地分散。 As will be described later, the first metal layer 140 may form an ohmic contact with the first conductive type semiconductor layer 121 through the holes 120a. Therefore, a plurality of holes 120a are disposed on the entire light emitting structure 120, so that current can be distributed substantially uniformly over the entire light emitting structure 120. Further, the plurality of holes 120a are connected to each other by the connection holes 120b, and the current is not concentrated on the specific holes 120a, but is substantially uniformly dispersed over the entire light-emitting structure 120.
另外,可以包括發光結構體120上表面的粗糙度增加而形成的粗糙面R。粗糙面R可以利用乾蝕刻及/或濕蝕刻形成。例如,利用氫氧化鉀及氫氧化鈉中的至少一種溶液,對發光結構體120的上表面進行濕蝕刻,形成粗糙面R,或者也可以利用光電化學(PEC)蝕刻。另外,還可以組合乾蝕刻和濕蝕刻形成粗糙面R。如上所述的粗糙面R形成方法僅為示例而已,可以利用通常的技術人員公知的各種方法,在發光結構體120表面形成粗糙面R。在發光結構體120表面形成粗糙面R,可以提高發光二極體100b的光提取效率。 In addition, a rough surface R formed by increasing the roughness of the upper surface of the light-emitting structure 120 may be included. The rough surface R can be formed by dry etching and/or wet etching. For example, the upper surface of the light-emitting structure 120 is wet-etched using at least one of potassium hydroxide and sodium hydroxide to form a rough surface R, or photoelectrochemical (PEC) etching may be used. In addition, dry etching and wet etching may be combined to form a rough surface R. The rough surface R forming method as described above is merely an example, and the rough surface R may be formed on the surface of the light emitting structure 120 by various methods known to those skilled in the art. Forming a rough surface R on the surface of the light-emitting structure 120 can improve the light extraction efficiency of the light-emitting diode 100b.
另外,第一金屬層140藉由孔120a與第一導電型半導體層121形成歐姆接觸,為了形成與第一導電型半導體層121連接的電極等,活性層123被去除的區域與對應於多個孔120a的區域相同。因此,使第一導電型半導體層121和金屬層形成歐姆接觸的區域最小化,可以提供相對於整個發光結構體的水平面積而言發光區域面積比率更大的發光二極體。 In addition, the first metal layer 140 is in ohmic contact with the first conductive semiconductor layer 121 through the hole 120a, and the active layer 123 is removed from the region corresponding to the plurality of electrodes or the like connected to the first conductive semiconductor layer 121. The area of the hole 120a is the same. Therefore, the region where the first conductive type semiconductor layer 121 and the metal layer form an ohmic contact is minimized, and a light emitting diode having a larger ratio of the light emitting region area with respect to the horizontal area of the entire light emitting structure can be provided.
電極層130位於第二導電型半導體層125上。電極層130部分地覆蓋第二導電型半導體層125的下表面且可以形成歐姆接觸。另外,電極層130可以配置為全面覆蓋第二導電型半導體層 125的下表面且可以形成為一體。即,電極層130可以形成為全面覆蓋除了多個孔120a及連接孔120b形成的區域以外的其他區域。因此,對整個發光結構體120均一地供給電流,提高電流分散效應。 The electrode layer 130 is on the second conductive type semiconductor layer 125. The electrode layer 130 partially covers the lower surface of the second conductive type semiconductor layer 125 and may form an ohmic contact. In addition, the electrode layer 130 may be configured to cover the second conductive type semiconductor layer in an entire manner. The lower surface of 125 may be formed in one piece. That is, the electrode layer 130 may be formed to entirely cover other regions than the regions formed by the plurality of holes 120a and the connection holes 120b. Therefore, current is uniformly supplied to the entire light-emitting structure 120, and the current dispersion effect is improved.
但是,本發明並非限定於此,電極層130可以不以單一體形成,並將多個單元電極層配置在第二導電型半導體層125的下表面。 However, the present invention is not limited thereto, and the electrode layer 130 may not be formed in a single body, and a plurality of unit electrode layers may be disposed on the lower surface of the second conductive type semiconductor layer 125.
電極層130可以包括反射層及覆蓋所述反射層的覆蓋層。 The electrode layer 130 may include a reflective layer and a cover layer covering the reflective layer.
如上所述,電極層130與第二導電型半導體層125形成歐姆接觸,且可以發揮光反射作用。因此,所述反射層可以包含反射率高並能夠與第二導電型半導體層125形成歐姆接觸的金屬。例如,所述反射層可以包含鎳、鉑、鈀、銠、鎢、鈦、鋁、銀及金中的至少一種。另外,所述反射層可以包括單層或多層。 As described above, the electrode layer 130 forms an ohmic contact with the second conductive type semiconductor layer 125, and can exert a light reflecting effect. Therefore, the reflective layer may include a metal having a high reflectance and capable of forming an ohmic contact with the second conductive type semiconductor layer 125. For example, the reflective layer may include at least one of nickel, platinum, palladium, rhodium, tungsten, titanium, aluminum, silver, and gold. In addition, the reflective layer may include a single layer or multiple layers.
所述覆蓋層能夠防止所述反射層與不同物質間的相互擴散,能夠防止外部的其它物質擴散到所述反射層而導致所述反射層損傷。因此,所述覆蓋層可以以覆蓋所述反射層的底部及側面形成。所述覆蓋層能夠與所述反射層一起與第二導電型半導體層125電連接,其能夠與所述反射層一起起到電極的作用。所述覆蓋層可以包含諸如金、鎳、鈦、鉻中的至少一種,還可以包括單層或多層。 The cover layer can prevent mutual diffusion between the reflective layer and different substances, and can prevent other external substances from diffusing to the reflective layer to cause damage to the reflective layer. Therefore, the cover layer may be formed to cover the bottom and sides of the reflective layer. The cover layer can be electrically connected to the second conductive type semiconductor layer 125 together with the reflective layer, which can function as an electrode together with the reflective layer. The cover layer may comprise at least one of gold, nickel, titanium, chromium, and may also comprise a single layer or multiple layers.
不同於此,電極層130可以包含其他導電性物質,可以包括透明電極。所述透明電極可以包含諸如氧化銦錫(ITO)、氧化鋅(ZnO)、氧化鋅鋁(AZO)及銦鋅氧化物(IZO)中的至少一種。 Unlike this, the electrode layer 130 may contain other conductive materials and may include a transparent electrode. The transparent electrode may include at least one of indium tin oxide (ITO), zinc oxide (ZnO), zinc aluminum oxide (AZO), and indium zinc oxide (IZO).
另一方面,發光二極體100b還可以包括第一絕緣層 151。第一絕緣層151可以部分地覆蓋發光結構體120的底部及電極層131。另外,第一絕緣層151可以部分地填充連接孔120b,夾設在暴露於連接孔120b的第一導電型半導體層121和第一金屬層140之間,其可以在除了多個孔120a以外的區域夾設於第一金屬層140和電極層130之間。另外,第一絕緣層151可以覆蓋多個孔120a的側面的同時,其使孔120a的上表面露出,進而使第一導電型半導體層121部分地露出。進而,第一絕緣層151可以覆蓋發光結構體120的側面。 On the other hand, the light emitting diode 100b may further include a first insulating layer 151. The first insulating layer 151 may partially cover the bottom of the light emitting structure 120 and the electrode layer 131. In addition, the first insulating layer 151 may partially fill the connection hole 120b sandwiched between the first conductive type semiconductor layer 121 and the first metal layer 140 exposed to the connection hole 120b, which may be other than the plurality of holes 120a The region is sandwiched between the first metal layer 140 and the electrode layer 130. Further, the first insulating layer 151 may cover the side faces of the plurality of holes 120a while exposing the upper surface of the holes 120a, thereby partially exposing the first conductive semiconductor layer 121. Further, the first insulating layer 151 may cover the side surface of the light emitting structure 120.
第一絕緣層151可以包括位於與多個孔120a所處位置相對應位置的第一開口部151a,以及使電極層130部分地露出的第二開口部151b。可以藉由第一開口部151a及孔120a使第一導電型半導體層121部分地露出,可以藉由第二開口部151b使電極層130部分地露出。 The first insulating layer 151 may include a first opening portion 151a located at a position corresponding to a position where the plurality of holes 120a are located, and a second opening portion 151b partially exposing the electrode layer 130. The first conductive semiconductor layer 121 may be partially exposed by the first opening 151a and the hole 120a, and the electrode layer 130 may be partially exposed by the second opening 151b.
第一絕緣層151可以包含絕緣性的物質,例如,可以包含SiO2或SiNx。進而,第一絕緣層151可以包括多層,也可以包括折射率不同的物質交替層疊的分布式布拉格反射器。 The first insulating layer 151 may contain an insulating substance, and for example, may include SiO 2 or SiN x . Further, the first insulating layer 151 may include a plurality of layers, and may also include a distributed Bragg reflector in which substances having different refractive indices are alternately stacked.
第一金屬層140可以位於發光結構體120的下面,第一金屬層可以填充多個孔120a及/或第一開口部151a,其與第一導電型半導體層121形成歐姆接觸。第一金屬層140可以形成為全面覆蓋除了第一絕緣層151下表面的部分區域以外的其他部分。另外,不同於圖中所示,第一金屬層可以形成為覆蓋至發光結構體120的側面。第一金屬層140也形成在發光結構體120的側面時,能夠向上部反射從活性層123向側面釋放的光,提高發光二極體100b向上部反射的光的比率。另一方面,第一金屬層140可 以不位於與第一絕緣層151的第二開口部151b對應的區域,與電極層130隔開絕緣。 The first metal layer 140 may be located under the light emitting structure 120, and the first metal layer may fill the plurality of holes 120a and/or the first opening portion 151a, which form an ohmic contact with the first conductive type semiconductor layer 121. The first metal layer 140 may be formed to entirely cover portions other than a partial region of the lower surface of the first insulating layer 151. In addition, unlike the drawing, the first metal layer may be formed to cover the side surface of the light emitting structure 120. When the first metal layer 140 is also formed on the side surface of the light-emitting structure 120, the light emitted from the active layer 123 to the side surface can be reflected upward, and the ratio of the light reflected from the upper portion of the light-emitting diode 100b can be increased. On the other hand, the first metal layer 140 can The electrode layer 130 is insulated from the region not corresponding to the second opening portion 151b of the first insulating layer 151.
第一金屬層140形成為除部分區域以外全面覆蓋發光結構體120的下表面,能夠進一步提高電流分散效應。另外,未被電極層130覆蓋的部位則由第一金屬層140覆蓋,更有效地進行光反射,提高發光二極體100b的發光效率。 The first metal layer 140 is formed to cover the lower surface of the light emitting structure 120 in all but a part of the region, and the current dispersion effect can be further improved. Further, the portion not covered by the electrode layer 130 is covered by the first metal layer 140, and light reflection is performed more efficiently, thereby improving the luminous efficiency of the light-emitting diode 100b.
第一金屬層140與第一導電型半導體層121形成歐姆接觸,而且發揮光反射作用。因此,第一金屬層140可以包含鋁層等高反射金屬層,所述高反射金屬層可以形成在鈦、鉻或鎳等的黏合層上面。 The first metal layer 140 forms an ohmic contact with the first conductive semiconductor layer 121 and functions as a light reflection. Therefore, the first metal layer 140 may include a highly reflective metal layer such as an aluminum layer, and the highly reflective metal layer may be formed on an adhesion layer of titanium, chromium, or nickel.
發光二極體100b還可以包括第二絕緣層153,第二絕緣層153可以覆蓋第一金屬層140。第二絕緣層153可以包括使第一金屬層140部分地露出的第三開口部153a,以及使電極層130部分地露出的第四開口部153b。此時,第四開口部153b可以在對應於第二開口部151b的位置形成。 The light emitting diode 100b may further include a second insulating layer 153, and the second insulating layer 153 may cover the first metal layer 140. The second insulating layer 153 may include a third opening portion 153a that partially exposes the first metal layer 140, and a fourth opening portion 153b that partially exposes the electrode layer 130. At this time, the fourth opening portion 153b may be formed at a position corresponding to the second opening portion 151b.
第三開口部153a及第四開口部153b可以形成一個以上。另外,第三開口部153a位於鄰接發光二極體100b的一角時,第四開口部153b可以位於鄰接的另一角。 One or more of the third opening portion 153a and the fourth opening portion 153b may be formed. Further, when the third opening portion 153a is located adjacent to a corner of the light emitting diode 100b, the fourth opening portion 153b may be located at the other adjacent corner.
第二絕緣層153可以包含絕緣性的物質,例如,可以包含二氧化矽(SiO2)或SiNx。進而,第二絕緣層153可以包括多層,也可以包括折射率不同的物質交替層疊的分布式布拉格反射器。 The second insulating layer 153 may contain an insulating substance, and for example, may include cerium oxide (SiO 2 ) or SiN x . Further, the second insulating layer 153 may include a plurality of layers, and may also include a distributed Bragg reflector in which substances having different refractive indices are alternately stacked.
第一凸塊161可以位於第二絕緣層153的下面,藉由第三開口部153a與第一金屬層140電連接。第二凸塊163可以位於第二絕緣層153的下面,藉由第四開口部153b與電極層130電連 接。因此,第一凸塊161及第二凸塊163分別與第一導電型半導體層121及第二導電型半導體層125電連接。因此,第一凸塊161及第二凸塊163可以發揮從外部向發光二極體供給電源的電極作用。 The first bump 161 may be located under the second insulating layer 153 and electrically connected to the first metal layer 140 through the third opening portion 153a. The second bump 163 may be located under the second insulating layer 153 and electrically connected to the electrode layer 130 by the fourth opening portion 153b. Pick up. Therefore, the first bump 161 and the second bump 163 are electrically connected to the first conductive semiconductor layer 121 and the second conductive semiconductor layer 125, respectively. Therefore, the first bump 161 and the second bump 163 can function as electrodes that supply power from the outside to the light emitting diode.
散熱電極170可以位於第二絕緣層153的下面,可以位於發光結構體120的下部。散熱電極170以物理方式與發光結構體120連接,起到將發光結構體120產生的熱量從發光結構體120向外散熱的作用。另外,散熱電極170可以位於第一凸塊161和第二凸塊163之間,進而位於發光結構體120中心部位下側。但是,本發明並非限定於此,散熱電極170、第一凸塊161及第二凸塊163的配置可進行多樣的變更。 The heat dissipation electrode 170 may be located under the second insulation layer 153 and may be located at a lower portion of the light emitting structure 120. The heat dissipating electrode 170 is physically connected to the light emitting structure 120 to function to dissipate heat generated by the light emitting structure 120 from the light emitting structure 120 to the outside. In addition, the heat dissipation electrode 170 may be located between the first bump 161 and the second bump 163 and further located on the lower side of the central portion of the light emitting structure 120. However, the present invention is not limited thereto, and the arrangement of the heat dissipation electrode 170, the first bump 161, and the second bump 163 can be variously changed.
另外,如圖2實施例中說明,第一凸塊161及第二凸塊163和散熱電極170可以包含焊料。 In addition, as illustrated in the embodiment of FIG. 2, the first bump 161 and the second bump 163 and the heat dissipation electrode 170 may include solder.
根據本發明,能夠提供包括圖5(a)與圖5(b)至圖7的實施例中說明的發光二極體100b的發光裝置。本實施例的發光二極體100b,其電流分散效應高,能夠接通高電流,另外,即便接通高電流,其散熱效率仍然高。因此,本實施例的發光二極體結構非常適合用於高功率發光裝置。 According to the present invention, it is possible to provide a light-emitting device including the light-emitting diode 100b explained in the embodiment of FIGS. 5(a) and 5(b) to 7. The light-emitting diode 100b of the present embodiment has a high current dispersion effect and can be turned on with a high current, and the heat dissipation efficiency is high even when a high current is turned on. Therefore, the light emitting diode structure of the present embodiment is very suitable for use in a high power light emitting device.
以上對本發明的多種實施例進行了說明,但本發明並非限定於所述的多種實施例,在不超出本發明申請專利範圍的技術思想的範圍內,可以多樣地變形和變更。 The various embodiments of the present invention have been described above, but the present invention is not limited to the various embodiments described above, and various modifications and changes can be made without departing from the spirit and scope of the invention.
100‧‧‧發光二極體 100‧‧‧Lighting diode
120‧‧‧發光結構體 120‧‧‧Lighted structure
150‧‧‧絕緣層 150‧‧‧Insulation
161‧‧‧第一凸塊 161‧‧‧First bump
163‧‧‧第二凸塊 163‧‧‧second bump
170‧‧‧散熱電極 170‧‧‧heating electrode
180‧‧‧絕緣物質部 180‧‧‧Inserts Division
200‧‧‧基板 200‧‧‧Substrate
210‧‧‧基座 210‧‧‧Base
220‧‧‧絕緣圖案 220‧‧‧Insulation pattern
230‧‧‧導電性圖案 230‧‧‧Electrical pattern
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