TW201332155A - Electrode coplanar light-emitting diode device, flip-chip light-emitting diode package structure and optical reflection structure - Google Patents

Electrode coplanar light-emitting diode device, flip-chip light-emitting diode package structure and optical reflection structure Download PDF

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TW201332155A
TW201332155A TW101101530A TW101101530A TW201332155A TW 201332155 A TW201332155 A TW 201332155A TW 101101530 A TW101101530 A TW 101101530A TW 101101530 A TW101101530 A TW 101101530A TW 201332155 A TW201332155 A TW 201332155A
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electrode
layer
emitting diode
light
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TWI456800B (en
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dong-sheng Lai
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Mao Bang Electronic Co Ltd
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Abstract

An electrode coplanar light-emitting diode device, a flip-chip light-emitting diode package structure and an optical reflection structure are disclosed. The light-emitting diode device comprises: an element substrate, a first type doping layer, a luminous layer, a second type doping layer, a transparent conductive metal oxide layer, at least two electrode first parts with different polarity, a first transparent insulating layer, a second insulating layer, and at least two electrode second parts with different polarity, wherein the second insulating layer is formed on and covers the first insulating layer and the at least two electrode first parts with different polarity. The upper surface is a plane with a uniform height with at least two separated grooves formed thereon for corresponding to the at least two electrode first parts with different polarity respectively; wherein the at least two electrode second parts form an integral electrode of at least two different polarities by utilizing at least an conductive metal to be fully arranged in the at least two separated grooves and electrically connected to the at least two electrode first parts with different polarity respectively; the upper surfaces of the at least two electrode second parts are coplanar; in addition, the range of the at least two separated grooves can correspondingly expand to cover most surface of the luminous layer so that the at least two electrode second parts formed thereby can both serve as reflective layers for light emitted by the luminous layer. Accordingly, effects of raising assembly yield, simplifying manufacturing process and reducing manufacturing costs can be achieved.

Description

電極共平面之發光二極體元件、覆晶式發光二極體封裝結構及光反射結構Electrode coplanar light-emitting diode component, flip-chip light-emitting diode package structure and light-reflecting structure

本發明係有關一種發光二極體元件,尤指一種電極為共平面之覆晶式發光二極體元件之結構、覆晶式發光二極體封裝結構,及適用於覆晶式發光二極體元件之光反射結構。The invention relates to a light-emitting diode component, in particular to a structure of a coplanar flip-chip light-emitting diode component, a flip-chip light-emitting diode package structure, and a flip-chip light-emitting diode. The light reflecting structure of the component.

在有關覆晶式發光二極體元件(flip-chip light emitting diode)或覆晶式發光二極體封裝結構或適用於覆晶式發光二極體之反射結構等技術領域中,目前已存在多種先前技術,如:中華民國專利公告第573330號、新型第M350824號;美國專利US6,914,268、US8,049,230、US7,985,979、US7,939,832、US7,713,353、US7,642,121、US7,462,861、US7,393,411、US7,335,519、US7,294,866、US7,087,526、US5,557,115、US6,514,782、US6,497,944、US6,791,119;及美國專利公開號US2002/0163302、US2004/0113156等。而上述該些先前技術大都是針對一發光二極體(LED)元件結構或其封裝(package)結構,在發光效率、散熱功能、使用壽命、製造成本、組裝良率、製程簡化、光衰等方面所產生之問題與缺失,而提出可解決該些問題與缺失之不同的技術手段。In the technical fields of a flip-chip light emitting diode or a flip-chip light emitting diode package structure or a reflective structure suitable for a flip-chip light-emitting diode, various types exist. Prior art, such as: Republic of China Patent Publication No. 573330, New Type M350824; US Patent Nos. 6,914,268, US 8,049,230, US 7,985,979, US 7,939,832, US 7,713,353, US 7,642,121, US 7,462,861, US 7, 393, 411, US 7, 335, 519, US 7,294, 866, US 7, 087, 526, US 5, 557, 115, US 6, 514, 782, US 6, 497, 944, US 6, 791, 119; and U.S. Patent Publication No. US 2002/0163302, US 2004/0113156, and the like. The above prior art is mostly directed to a light emitting diode (LED) component structure or a package structure thereof, in terms of luminous efficiency, heat dissipation function, service life, manufacturing cost, assembly yield, process simplification, light decay, etc. The problems and shortcomings arising from the aspects, and the different technical means to solve these problems and defects.

以US6,914,268為例說明,US6,914,268係揭示一種發光二極體(LED)元件、覆晶式發光二極體之封裝結構及一適用於覆晶式發光二極體元件之反射結構(LED DEVICE,FLIP-CHIP LED PACKAGE AND LIGHT REFLECTING STRUCTURE),但其LED結構仍然存在下列缺點:US 6,914,268 for example, US 6,914,268 discloses a light-emitting diode (LED) component, a flip-chip light-emitting diode package structure, and a reflective structure suitable for a flip-chip light-emitting diode component (LED) DEVICE, FLIP-CHIP LED PACKAGE AND LIGHT REFLECTING STRUCTURE), but its LED structure still has the following disadvantages:

(1)US6,914,268所揭示之二電極連接墊,如其圖1-3中所示之正極(anode,160/260)及負極(cathode,170/270),均非共平面,致造成後續製程如覆晶式發光二極體封裝結構(如圖3所示)之組裝良率無法有效提升,且相對無法簡化製程及有效降低製作成本。(1) The two-electrode connection pads disclosed in US Pat. No. 6,914,268, such as the anode (anode, 160/260) and the cathode (cathode, 170/270) shown in Figures 1-3, are not coplanar, resulting in a subsequent process. For example, the assembly yield of the flip-chip LED package structure (as shown in FIG. 3) cannot be effectively improved, and the process cannot be simplified and the manufacturing cost can be effectively reduced.

(2)US6,914,268所揭示之一電極連接墊,如其圖1-3中所示之正極(anode,160/260),係形成並位於一反射層(reflecting layer,150/250)上,而該反射層(reflecting layer,150/250)又係形成並位於一透明導電金屬氧化物層(transparent conductive oxide layer,140/240)上,因此製程中,該正極(anode,160/260)須穿過該反射層(150/250)及該透明導電金屬氧化物層(140/240)以能與一P型摻雜層(P-type doped layer,130/230)電性連接,如此相對造成製程之複雜化,無法簡化製程及有效降低製作成本。(2) An electrode connection pad disclosed in US 6,914,268, such as the anode (160/260) shown in Figures 1-3, is formed and located on a reflective layer (150/250), and The reflective layer (150/250) is formed and disposed on a transparent conductive oxide layer (140/240). Therefore, the anode (anode, 160/260) must be worn during the process. The reflective layer (150/250) and the transparent conductive metal oxide layer (140/240) are electrically connected to a P-type doped layer (130/230), thus causing a process The complexity is complicated, and the process cannot be simplified and the production cost can be effectively reduced.

由上可知,上述該些先前技術之結構及製程實難以符合實際使用時之需求,因此在發光二極體元件、覆晶式發光二極體封裝結構及光反射結構等結構設計方面,尤其針對一覆晶式發光二極體元件之電極連接墊(如US6,914,268之正極160/260)及反射層(如US6,914,268之150/250),仍存在進一步改進之需要性。本發明之發光二極體元件乃係在此技術發展空間有限之領域中,提出一種發光二極體元件之發明,藉以達成有效提升組裝良率、簡化製程及有效降低製作成本之功效。As can be seen from the above, the structures and processes of the prior art described above are difficult to meet the requirements of actual use. Therefore, in the structural design of the light-emitting diode element, the flip-chip light-emitting diode package structure, and the light-reflecting structure, The electrode connection pads of a flip-chip light-emitting diode element (such as the positive electrode 160/260 of US 6,914,268) and the reflective layer (such as 150/250 of US 6,914,268) still have the need for further improvement. The light-emitting diode element of the present invention is an invention of a light-emitting diode element in the field of limited development of the technology, thereby achieving an effect of effectively improving the assembly yield, simplifying the process, and effectively reducing the manufacturing cost.

本發明主要目的係在於提供一種發光二極體元件,其具有至少二分開且不同極之電極第二部,且該至少二不同極之電極第二部之上表面設計為共平面,藉以能有效提升覆晶式發光二極體封裝結構之組裝良率。The main object of the present invention is to provide a light emitting diode element having at least two electrode portions of different electrodes and different poles, and the upper surface of the second electrode of the at least two different electrodes is designed to be coplanar, thereby being effective Improve the assembly yield of the flip-chip LED package structure.

本發明再一目的係在於提供一種發光二極體元件,其具有至少二分開且不同極之電極第二部,且該至少二不同極之電極第二部之範圍係相對地擴大至涵蓋該發光二極體元件之發光層之大部分表面,以使該二分開之電極第二部能作為該發光層發出之光的反射層,藉以達成簡化製程及有效降低製作成本之功效。Still another object of the present invention is to provide a light emitting diode element having at least two electrode portions of different electrodes and different poles, and the range of the second portion of the electrode of the at least two different poles is relatively enlarged to cover the light emission The majority of the surface of the light-emitting layer of the diode element is such that the second portion of the second electrode can serve as a reflective layer for the light emitted by the light-emitting layer, thereby achieving a simplified process and an effective reduction in manufacturing cost.

為達成上述目的,本發明之發光二極體元件之一優選實施例包含:一元件基板、一第一型摻雜層、一第二型摻雜層、一透明導電金屬氧化物層、至少二不同極之電極第一部、一第一透明絕緣層、一第二絕緣層及至少二分開且且不同極之電極第二部。其中,該第一型摻雜層係形成且設置在該元件基板上;該第二型摻雜層係形成且設置在部分之該第一型摻雜層上,其中該第二型摻雜層與該第一型摻雜層之交界面形成一發光層以發出光;該透明導電金屬氧化物層係形成且設置在該第二型摻雜層上供作為歐姆接觸層;該至少二不同極之電極第一部係包含至少一第一電極第一部其穿過該透明導電金屬氧化物層而形成且設置在該第一型摻雜層上以與該第一型摻雜層電性導通,及至少一第二電極第一部其形成且設置在該第二型摻雜層上以與該第二型摻雜層電性導通,其中該至少一第一電極第一部及該至少一第二電極第一部之頂面分別位於不同之高度位置而形成非共平面狀態;該第一透明絕緣層係形成且覆蓋在該元件基板、該第一型摻雜層、該第二型摻雜層及該透明導電金屬氧化物層之表面上,以使該至少一第一電極第一部及該至少一第二電極第一部能由該第一絕緣層向外顯露;該第二絕緣層係形成且覆蓋在該第一絕緣層及該至少二不同極之電極第一部上,該第二絕緣層之上表面為一均勻高度之平面,且該上表面上開設有至少二分開之凹槽以分別對應於該至少一第一及第二電極第一部以使該些第一及第二電極第一部可分別透過該至少二分開之凹槽而向外顯露,其中該至少二分開之凹槽之凹槽口為共平面;該至少二分開且不同極之電極第二部係包含一第一電極第二部及一第二電極第二部,其係利用至少一導電金屬形成且分別填滿在該至少二分開之凹槽內供分別對應電性連結於該些第一電極第一部及第二電極第一部,且該二分開且不同極之電極第二部之上表面為共平面。In order to achieve the above object, a preferred embodiment of the LED component of the present invention comprises: an element substrate, a first doped layer, a second doped layer, a transparent conductive metal oxide layer, at least two a first portion of the electrode of the different poles, a first transparent insulating layer, a second insulating layer and at least two second portions of the electrodes which are separated and different in polarity. Wherein the first type doping layer is formed on the element substrate; the second type doping layer is formed and disposed on a portion of the first type doping layer, wherein the second type doping layer Forming a light emitting layer at the interface with the first type doped layer to emit light; the transparent conductive metal oxide layer is formed on the second type doped layer to serve as an ohmic contact layer; the at least two different poles The first portion of the electrode includes at least one first electrode, the first portion is formed through the transparent conductive metal oxide layer, and is disposed on the first type doped layer to be electrically connected to the first type doped layer And the at least one second electrode is formed on the second type doping layer to be electrically connected to the second type doping layer, wherein the at least one first electrode first portion and the at least one The top surfaces of the first portions of the second electrodes are respectively located at different height positions to form a non-coplanar state; the first transparent insulating layer is formed and covers the element substrate, the first type doping layer, and the second type doping a layer of the impurity layer and the transparent conductive metal oxide layer to make the at least The first portion of the first electrode and the first portion of the at least one second electrode can be exposed outwardly from the first insulating layer; the second insulating layer is formed and covers the electrode of the first insulating layer and the at least two different electrodes The upper surface of the second insulating layer is a plane of uniform height, and the upper surface is provided with at least two separate grooves to respectively correspond to the first portions of the at least one first and second electrodes. The first portions of the first and second electrodes are respectively exposed through the at least two separate grooves, wherein the groove openings of the at least two separate grooves are coplanar; the at least two separate and different poles The second portion of the electrode includes a first electrode second portion and a second electrode second portion, which are formed by at least one conductive metal and are respectively filled in the at least two separate grooves for respectively corresponding electrical connections The first portion of the first electrode and the first portion of the second electrode, and the upper surfaces of the second portions of the electrodes of the two separate and different poles are coplanar.

進一步,該至少二分開之凹槽之範圍是相對地擴大至涵蓋該發光層之大部分表面,以使在該至少二分開之凹槽內所形成之該至少二分開且不同極之電極第二部能同時作為該發光層發出之光的反射層,供可反射由該發光層發出並射向該反射層之光線。Further, the range of the at least two separate grooves is relatively enlarged to cover a majority of the surface of the luminescent layer such that the at least two separate and different pole electrodes formed in the at least two separate grooves are second The portion can simultaneously serve as a reflective layer of light emitted by the luminescent layer for reflecting light emitted by the luminescent layer and directed toward the reflective layer.

本發明之覆晶式發光二極體封裝結構係利用一封裝基板(package substrate)以與前述之發光二極體元件組裝形成,該覆晶式發光二極體封裝結構之一優選實施例,包含一封裝基板及一發光二極體元件;其中該發光二極體元件係倒覆在該封裝基板上而與其電性連接。其中該發光二極體元件係藉由至少二導電金屬凸塊以與該封裝基板電性連接,該至少二導電金屬凸塊係分別設於該發光二極體元件之至少二分開且不同極之電極第二部上。The flip-chip light-emitting diode package structure of the present invention is formed by assembling a package substrate with the above-mentioned light-emitting diode element, and a preferred embodiment of the flip-chip light-emitting diode package structure includes a package substrate and a light emitting diode element; wherein the light emitting diode element is overlaid on the package substrate and electrically connected thereto. The light emitting diode component is electrically connected to the package substrate by at least two conductive metal bumps respectively disposed on at least two separate and different poles of the light emitting diode component. On the second part of the electrode.

其中該封裝基板(package substrate)係一具有散熱功能之印刷電路(PCB)基板,其一優選實施例包含一絕緣基板、二線路層及至少二散熱孔;其中,該絕緣基板具有上、下二表面;該二線路層係分別形成並設置在基板之二表面上,其中一表面上之線路層係藉由至少二導電金屬凸塊以使該發光二極體元件藉由該至少二分開且不同極之電極第二部以電性連接在該封裝基板上;該至少二散熱孔係穿設在該絕緣基板之二表面之間,各散熱孔內設具導熱材料以將電性連接在該絕緣基板一表面上之該發光二極體元件在操作中所產生之熱源由該絕緣基板之一表面傳導至另一表面而向外散熱。The package substrate is a printed circuit (PCB) substrate having a heat dissipation function, and a preferred embodiment includes an insulating substrate, two circuit layers, and at least two heat dissipation holes; wherein the insulation substrate has upper and lower layers. The two circuit layers are respectively formed and disposed on two surfaces of the substrate, wherein the circuit layer on one surface is separated by at least two conductive metal bumps so that the light emitting diode elements are separated and different by the at least two The second electrode of the electrode is electrically connected to the package substrate; the at least two heat dissipation holes are disposed between the two surfaces of the insulating substrate, and each of the heat dissipation holes is provided with a heat conductive material to electrically connect the insulation The heat source generated by the light emitting diode element on one surface of the substrate is conducted from one surface of the insulating substrate to the other surface to dissipate heat outward.

為使本發明更加明確詳實,將本發明之結構、製程及技術特徵,配合下列圖示詳述如後:In order to make the present invention more clear and detailed, the structure, process and technical features of the present invention are detailed as follows:

參考圖1、2、3所示,其分別係本發明之電極共平面之發光二極體元件一實施例之結構剖面示意圖、上視示意圖及製程中結構剖面示意圖。本實施例之發光二極體元件1包含一元件基板(device substrate)10、一第一型摻雜層(1st-type doped layer)20、一第二型摻雜層(2nd-type doped layer)30、一透明導電金屬氧化物層(transparent conductive oxide layer)50、至少二不同極之電極第一部(first portion of electrode)60、70、一第一透明絕緣層(transparent insulating passivation layer)80、一第二絕緣層90及至少二分開之電極第二部(second portion of electrode)100、110。Referring to FIGS. 1, 2, and 3, which are respectively a schematic cross-sectional view, a top view, and a cross-sectional view of a structure of an embodiment of an electrode coplanar light-emitting diode of the present invention. The LED device 1 of the present embodiment includes a device substrate 10, a 1st-type doped layer 20, and a 2nd-type doped layer. 30. A transparent conductive oxide layer 50, at least two different first electrode of electrodes 60, 70, a first transparent insulating layer (transparent insulating passivation layer) 80, A second insulating layer 90 and at least two second portions of electrodes 100, 110.

本實施例之該元件基板10可利用一藍寶石(sapphire)基板構成但不限制,如可利用一玻璃基板構成。The element substrate 10 of the present embodiment can be constituted by a sapphire substrate, but is not limited, and can be formed by using a glass substrate.

本實施例之該第一型摻雜層20係形成且設置在該元件基板10上,該第二型摻雜層30係形成且設置在部分之該第一型摻雜層20上,其中該第二型摻雜層30與該第一型摻雜層20之交界面形成一發光層40以發出光。該第一型摻雜層20可為一P型摻雜層(P-type doped layer)或一N型摻雜層(N-type doped layer),而該第二型摻雜層30係為該第一型摻雜層20之相對型摻雜層,即當該第一型摻雜層20為一P型摻雜層時,該第二型摻雜層30即為一N型摻雜層,反之,當該第一型摻雜層20為一N型摻雜層時,則該第二型摻雜層30為一P型摻雜層;該第一、二型摻雜層20、30係利用一Ⅲ-Ⅴ族化合物半導體材料所構成,例如氮化鎵(gallium nitride,GaN)、磷化鎵(gallium phosphide,GaP)或磷砷化鎵(gallium phosphide arsenide,GaAsP)等。The first type doping layer 20 of the embodiment is formed and disposed on the element substrate 10, and the second type doping layer 30 is formed and disposed on a portion of the first type doping layer 20, wherein the The interface between the second doped layer 30 and the first doped layer 20 forms a light emitting layer 40 to emit light. The first doped layer 20 can be a P-type doped layer or an N-type doped layer, and the second doped layer 30 is The opposite type doping layer of the first type doping layer 20, that is, when the first type doping layer 20 is a P type doping layer, the second type doping layer 30 is an N type doping layer. On the other hand, when the first doped layer 20 is an N-type doped layer, the second doped layer 30 is a P-type doped layer; the first and second doped layers 20 and 30 are It is composed of a group III-V compound semiconductor material, such as gallium nitride (GaN), gallium phosphide (GaP) or gallium phosphide arsenide (GaAsP).

本實施例之該透明導電金屬氧化物層50係形成且設置在該第二型摻雜層30上供作為歐姆接觸層;該透明導電金屬氧化物層50之材質以係氧化銦錫(ITO,indium tin oxide)為較佳但不限制,例如亦可選用氧化鈰錫(CTO,cerium tin oxide)、氧化銻錫(AT O,antimony tin oxide)、氧化鋁鋅(AZO,aluminum zinc oxide)、氧化銦鋅(IZO,indium zinc oxide)、氧化鋅(ZO,zinc oxide)或其他類似之透明導電金屬氧化物材科。The transparent conductive metal oxide layer 50 of the present embodiment is formed and disposed on the second type doped layer 30 as an ohmic contact layer; the transparent conductive metal oxide layer 50 is made of indium tin oxide (ITO, Indium tin oxide is preferred but not limited. For example, CTO (cerium tin oxide), arsenic tin oxide (AT O), aluminum zinc oxide (AZO), oxidation may be used. Indium zinc oxide (IZO), zinc oxide (ZO, zinc oxide) or other similar transparent conductive metal oxide materials.

本實施例之該至少二不同極之電極第一部係包含至少一第二電極第一部60及至少一第一電極第一部70,其中該至少一第二電極第一部60係穿過該透明導電金屬氧化物層50而形成且設置在該第二型摻雜層30上以與該第二型摻雜層30電性導通,為方便說明,因此將圖1中與該第二型摻雜層30電性導通之電極第一部60定義為第二電極第一部60;其中該至少一第一電極第一部70係形成且設置在該第一型摻雜層20上以與該第一型摻雜層20電性導通,為方便說明,因此將圖1中與該第一型摻雜層20電性導通之電極第一部70定義為第一電極第一部70。該第二電極第一部60及該第一電極第一部70之頂面分別位於不同之高度位置而形成非共平面之二電極第一部。請再參考圖2所示,該至少一第二電極第一部60及該第一電極第一部70之數目不限制,可視導電性能之需要如電流量之大小要求或電流之分佈均勻性要求或散熱性能等,而分別設置複數個第二電極第一部60及複數個第一電極第一部70,如圖2所示分別設有四個第二電極第一部60及四個第一電極第一部70但不限制,且分別均勻佈設並電性導通在該第二型摻雜層30及該第一型摻雜層20上。又該第二電極第一部60及第一電極第一部70在此被定義為“電極第一部”,乃是該“電極第一部(60、70)”將再與一“電極第二部”(容後述)以結合組成一完整之電極。The first portion of the electrode of the at least two different poles of the embodiment includes at least one second electrode first portion 60 and at least one first electrode first portion 70, wherein the at least one second electrode first portion 60 passes through The transparent conductive metal oxide layer 50 is formed on the second type doped layer 30 to be electrically connected to the second type doped layer 30. For convenience of description, the first type and the second type are The electrode first portion 60 electrically connected to the doped layer 30 is defined as a second electrode first portion 60; wherein the at least one first electrode first portion 70 is formed and disposed on the first type doped layer 20 to The first doped layer 20 is electrically conductive. For convenience of description, the electrode first portion 70 electrically connected to the first doped layer 20 in FIG. 1 is defined as the first electrode first portion 70. The second electrode first portion 60 and the top surface of the first electrode first portion 70 are respectively located at different height positions to form a non-coplanar two electrode first portion. Referring to FIG. 2 again, the number of the at least one second electrode first portion 60 and the first electrode first portion 70 is not limited, and the visible conductive performance needs, such as the magnitude of the current amount or the uniformity of the current distribution. Or a plurality of second electrode first portions 60 and a plurality of first electrode first portions 70 respectively, as shown in FIG. 2, respectively, four second electrodes first portion 60 and four first portions are respectively provided as shown in FIG. The first portion 70 of the electrode is not limited, and is uniformly disposed and electrically connected to the second doped layer 30 and the first doped layer 20, respectively. Further, the second electrode first portion 60 and the first electrode first portion 70 are herein defined as "electrode first portion", that is, the "electrode first portion (60, 70)" will be replaced with an "electrode first" The second part (described later) combines to form a complete electrode.

本實施例之該第一透明絕緣層80係形成且覆蓋在該元件基板10、該第一型摻雜層20、該第二型摻雜層30及該透明導電金屬氧化物層50之表面上,以使該至少一第一電極第一部70及該至少一第二電極第一部60能穿過該第一絕緣層80而向外顯露。在本發明之發光二極體元件1中,該第一透明絕緣層80可視為一透明絕緣鈍化層(transparent insulating passivation layer)。The first transparent insulating layer 80 of the embodiment is formed on the surface of the element substrate 10, the first doping layer 20, the second doping layer 30, and the transparent conductive metal oxide layer 50. So that the at least one first electrode first portion 70 and the at least one second electrode first portion 60 can pass outward through the first insulating layer 80. In the light-emitting diode element 1 of the present invention, the first transparent insulating layer 80 can be regarded as a transparent insulating passivation layer.

本實施例之該第二絕緣層90係形成且覆蓋在該第一絕緣層80及該至少一第一及第二電極第一部70、60上。該第二絕緣層90之上表面91為一均勻高度或近乎均勻高度之平面,且該上表面91上開設有至少二分開之凹槽92、93(如圖3所示)以分別對應於該至少一第一及第二電極第一部70、60,以使該至少一第一及第二電極第一部70、60得分別透過該至少二分開之凹槽92、93而向外顯露如圖3所示,其中該至少二分開之凹槽92、93之凹槽口為共平面或近乎共平面,也就是,當凹槽92、93之凹槽口之高度或斜度在加工裕度容許之範圍內以致仍能達成本發明設計成“共平面”所預期之相同或近似之功效及目的,則在此皆視為本發明所稱之“共平面”。The second insulating layer 90 of the embodiment is formed and covers the first insulating layer 80 and the at least one first and second electrode first portions 70, 60. The upper surface 91 of the second insulating layer 90 is a plane of uniform height or nearly uniform height, and the upper surface 91 is provided with at least two separate grooves 92, 93 (shown in FIG. 3) to respectively correspond to the At least one first and second electrode first portions 70, 60 such that the at least one first and second electrode first portions 70, 60 are respectively exposed through the at least two separate grooves 92, 93, such as 3, wherein the groove openings of the at least two separate grooves 92, 93 are coplanar or nearly coplanar, that is, when the height or slope of the groove openings of the grooves 92, 93 are at a processing margin Within the scope of the tolerances, such that the same or similar functions and objectives contemplated by the present invention to be designed as "coplanar" are still achieved, and are referred to herein as "coplanar".

本實施例之該至少二分開且不同極之電極第二部100、110係包含至少一第二電極第二部100及至少一第一電極第二部110,其係利用至少一導電金屬以分別填滿在該至少二分開之凹槽92、93內而形成,以使該至少一第二電極第二部100及至少一第一電極第二部110分別對應電性連結於該至少一第二電極第一部60及該至少一第二電極第一部70,且該二分開且不同極之電極第二部100、110之上表面101、111為共平面或近乎共平面。該至少一第二電極第二部100及第一電極第二部110在此被定義為“電極第二部”,乃是該“電極第二部(100、110)”係用以分別與前述之該“電極第一部(60、70)”結合組成一完整且一體之電極。又其中該至少一第二電極第二部100及至少一第一電極第二部110,係表示該第二電極第二部100及該第一電極第二部110並不限制為一個,也就是本發明可利用一第二電極第二部100以對應電性連結於四個第二電極第一部60如圖2所示,亦可利用兩個(至少一)第二電極第二部100但不限制以分別對應電性連結於各兩個第二電極第一部60(圖未示)。The at least two separate and different pole electrode portions 100, 110 of the embodiment comprise at least one second electrode second portion 100 and at least one first electrode second portion 110, which utilize at least one conductive metal to respectively Formed in the at least two separate recesses 92, 93, such that the at least one second electrode second portion 100 and the at least one first electrode second portion 110 are electrically coupled to the at least one second The electrode first portion 60 and the at least one second electrode first portion 70, and the upper surfaces 101, 111 of the second and different electrode second portions 100, 110 are coplanar or nearly coplanar. The at least one second electrode second portion 100 and the first electrode second portion 110 are herein defined as "electrode second portion", that is, the "electrode second portion (100, 110)" is used to respectively The "electrode first portion (60, 70)" combines to form a complete and integral electrode. In addition, the at least one second electrode second portion 100 and the at least one first electrode second portion 110 indicate that the second electrode second portion 100 and the first electrode second portion 110 are not limited to one, that is, The second electrode 100 of the second electrode 100 can be electrically connected to the first electrode 60 of the second electrode. As shown in FIG. 2, two (at least one) second electrode and the second portion 100 can be utilized. The first portion 60 (not shown) is electrically connected to each of the two second electrodes.

參考圖1-3所示,本實施例之該至少二分開之凹槽92、93之範圍進一步可相對地擴大至涵蓋該發光層40之大部分表面,因此在該至少二分開之凹槽92、93內所形成之該至少二分開之電極第二部100、110也相對地擴大至涵蓋該發光層40之大部分表面,故該至少二分開之電極第二部100、110能進一步作為該發光層40發出之光的反射層,供可反射由該發光層40發出並射向該反射層之光線。如此在製作本實施例之發光二極體元件1時,至少能減少一反射層(如US6,914,268所揭示之反射層150/250)之製程。Referring to Figures 1-3, the range of the at least two spaced apart grooves 92, 93 of the present embodiment is further expandable to cover a substantial portion of the surface of the luminescent layer 40, thus the at least two spaced grooves 92 The at least two separate electrode second portions 100, 110 formed in the 93 are also relatively enlarged to cover a majority of the surface of the luminescent layer 40, so the at least two separate electrode second portions 100, 110 can further serve as the A reflective layer of light emitted by the luminescent layer 40 for reflecting light emitted by the luminescent layer 40 and directed toward the reflective layer. Thus, in the fabrication of the light-emitting diode element 1 of the present embodiment, at least the process of a reflective layer (such as the reflective layer 150/250 disclosed in US 6,914,268) can be reduced.

本實施例之該至少二分開且不同極之電極第二部100、110可利用濺鍍方法、電鍍方法、化鍍(無電解金屬)方法中一種形成方法以沈積形成在該至少二分開之凹槽92、93中。又該至少二分開且不同極之電極第二部100、110在沈積形成之後,可進一步藉磨平作業以使該電極第二部100、110之上表面101、111成為共平面或近乎共平面,如此可藉以有效提升覆晶式發光二極體封裝結構之組裝良率。The electrode second portions 100, 110 of the at least two separate and different poles of this embodiment may be formed by deposition in the at least two separate recesses by a sputtering method, a plating method, or a plating (electroless metal) method. In the slots 92, 93. Further, after the deposition of the at least two separate and different electrode second portions 100, 110, the surface of the second portion 100, 110 of the electrode may be coplanar or nearly coplanar. Therefore, the assembly yield of the flip-chip light-emitting diode package structure can be effectively improved.

為發光二極體元件之結構上需要,本發明之發光二極體元件1可進一步在該第二型摻雜層30上形成且設置一應力超晶格層(trained-layer superlattice contact layer)(圖未示),以使該應力超晶格層設在該第二型摻雜層30與該透明導電金屬氧化物層50之間。該應力超晶格層為一習知技術如US6,914,268B2所揭示之應力超晶格層(strained-layer superlattice(SLS)contact layer 135/235)。For the structural requirements of the light-emitting diode element, the light-emitting diode element 1 of the present invention can be further formed on the second-type doped layer 30 and provided with a trained-layer superlattice contact layer ( The figure is not shown) such that the stress superlattice layer is disposed between the second type doped layer 30 and the transparent conductive metal oxide layer 50. The stress superlattice layer is a well-known technique such as the strained-layer superlattice (SLS) contact layer 135/235 disclosed in US 6,914,268 B2.

以本實施例之發光二極體元件1而言,當該至少二不同極之電極第一部,即包含該至少一第二電極第一部60及該至少一第一電極第一部70,係以金構成時,則該至少二分開且不同極之電極第二部100、110,即包含該至少一第二電極第二部100及該至少一第一電極第二部110,係利用錫為導電金屬以分別填滿在該至少二分開之凹槽92、93而形成以供分別對應電性連結於該至少二不同極之電極第一部60、70。In the light-emitting diode element 1 of the embodiment, when the first portion of the electrode of the at least two different poles includes the at least one second electrode first portion 60 and the at least one first electrode first portion 70, When the gold is composed of gold, the electrode second portions 100 and 110 having at least two separate and different poles, that is, the at least one second electrode second portion 100 and the at least one first electrode second portion 110 are made of tin. The conductive metal is respectively filled in the at least two separate grooves 92, 93 to be electrically connected to the electrode first portions 60, 70 respectively electrically connected to the at least two different electrodes.

參考圖4、5、6,所示,其分別係本發明之電極共平面之發光二極體元件另一實施例之結構剖面示意圖及電極分別以不同導電金屬構成之結構剖面示意圖。本實施例之發光二極體元件1a之結構大部分相同於圖1-3所示之發光二極體元件1,亦包含一元件基板10、一第一型摻雜層20、一第二型摻雜層30、一透明導電金屬氧化物層50、至少二不同極之電極第一部60、70、一第一透明絕緣層80、一第二絕緣層90及至少二分開之電極第二部100、110。本實施例之發光二極體元件1a進一步與圖1-3所示發光二極體元件1比較,可知本實施例之該第二絕緣層90之上表面91亦為一均勻高度或近乎均勻高度之平面如圖4所示,且該上表面91上開設有至少二分開之凹槽92a、93a(如圖4所示)以分別對應於該至少一第一及第二電極第一部70、60,以使該至少一第一及第二電極第一部70、60得分別透過該至少二分開之凹槽92a、93a而向外顯露如圖4所示,其中該至少二分開之凹槽92a、93a之凹槽口亦為共平面或近乎共平面。4, 5, and 6, which are respectively a schematic cross-sectional view showing another embodiment of the electrode coplanar light-emitting diode device of the present invention, and a structural cross-sectional view of the electrodes respectively formed of different conductive metals. The structure of the light-emitting diode element 1a of the present embodiment is mostly the same as that of the light-emitting diode element 1 shown in FIG. 1-3, and also includes an element substrate 10, a first type doped layer 20, and a second type. a doped layer 30, a transparent conductive metal oxide layer 50, at least two different electrode first portions 60, 70, a first transparent insulating layer 80, a second insulating layer 90, and at least two separate electrodes second portion 100, 110. The light-emitting diode element 1a of the present embodiment is further compared with the light-emitting diode element 1 shown in FIG. 1-3. It can be seen that the upper surface 91 of the second insulating layer 90 of the embodiment is also a uniform height or a nearly uniform height. The plane is as shown in FIG. 4, and the upper surface 91 is provided with at least two separate grooves 92a, 93a (as shown in FIG. 4) corresponding to the at least one first and second electrode first portions 70, respectively. 60, such that the at least one first and second electrode first portions 70, 60 are respectively exposed through the at least two separate grooves 92a, 93a as shown in FIG. 4, wherein the at least two separate grooves The notches of 92a, 93a are also coplanar or nearly coplanar.

上述二實施例1、1a之間的最大不同點在於:本實施例之該至少二分開之凹槽92a、93a之範圍並未如圖1-3所示之發光二極體元件1擴大至涵蓋該發光層40之大部分表面,也就是本實施例之該至少二分開之凹槽92a、93a係呈現一圓孔造型,因此在該至少二分開之凹槽92a、93a內所形成之該至少二分開之電極第二部100、110也侷限在該圓孔狀之凹槽92a、93a內。The maximum difference between the above two embodiments 1 and 1a is that the range of the at least two separate grooves 92a, 93a of the present embodiment is not expanded to cover the light-emitting diode element 1 as shown in FIGS. The majority of the surface of the luminescent layer 40, that is, the at least two separate grooves 92a, 93a of the present embodiment, exhibit a circular hole shape, so that at least two of the at least two separate grooves 92a, 93a are formed. The separate electrode second portions 100, 110 are also confined within the circular hole-shaped recesses 92a, 93a.

再以發光二極體元件1或圖4、5所示之發光二極體元件1a而言,當該至少二不同極之電極第一部,即包含至少一第二電極第一部60及至少一第一電極第一部70,係以金構成時,則該至少二分開且不同極之電極第二部100、110,即包含至少一第二電極第二部100及至少一第一電極第二部110,係利用錫為導電金屬以分別填滿在該至少二分開之凹槽92a、93a而形成以供分別對應電性連結於該至少二電極第一部60、70。Further, in the case of the light-emitting diode element 1 or the light-emitting diode element 1a shown in FIGS. 4 and 5, the first portion of the electrode of the at least two different poles, that is, the at least one second electrode first portion 60 and at least When the first portion of the first electrode 70 is made of gold, the second portion 100, 110 of the at least two separate and different poles includes at least a second electrode portion 100 and at least a first electrode portion. The two portions 110 are formed by using tin as a conductive metal to fill the at least two separate grooves 92a, 93a, respectively, for electrically connecting to the at least two electrode first portions 60, 70, respectively.

另以發光二極體元件1或圖4、6所示之發光二極體元件1a而言,當該至少二不同極之電極第一部,即包含至少一第二電極第一部60及至少一第一電極第一部70,係以鋁構成時,則該至少二分開且不同極之電極第二部100、110,即包含至少一第二電極第二部100及至少一第一電極第二部110,係先利用化鎳(無電解金屬)為導電金屬以在該至少二分開之凹槽92/92a、93/93a內先形成一化鎳層102、112(如圖6所示)供分別對應電性連結於該至少二電極第一部60、70,再利用化金(無電解金屬)為導電金屬以分別在該化鎳層102、112上各形成一化金層103、113(如圖6所示),則該化鎳層102、112分別與化金層103、113結合形成該至少二分開且不同極之電極第二部100、110,且仍維持共平面狀態。In addition, in the light-emitting diode element 1 or the light-emitting diode element 1a shown in FIGS. 4 and 6, when the first portion of the electrode of the at least two different poles, that is, the at least one second electrode, the first portion 60 and at least When the first portion of the first electrode 70 is made of aluminum, the second portion 100, 110 of the at least two separate and different poles includes at least a second electrode portion 100 and at least a first electrode portion. The second portion 110 is a first use of nickel (electroless metal) as a conductive metal to form a nickel layer 102, 112 in the at least two separate grooves 92/92a, 93/93a (as shown in FIG. 6). Correspondingly electrically connected to the at least two electrode first portions 60, 70, and then using gold (electroless metal) as a conductive metal to form a gold layer 103, 113 on each of the nickel layers 102, 112, respectively. (As shown in FIG. 6), the nickel layers 102, 112 are combined with the gold layer 103, 113, respectively, to form the electrode second portions 100, 110 of at least two separate and different poles, and remain in a coplanar state.

參考圖7-9所示,其分別係本發明之發光二極體元件1、1a經覆晶封裝所得之覆晶式發光二極體封裝結構之三個實施例之結構剖面示意圖。本發明之覆晶式發光二極體封裝結構2係利用一封裝基板(package substrate)120以與至少一前述之發光二極體元件1或1a組裝形成。該覆晶式發光二極體封裝結構2主要係包含一封裝基板120以及至少一發光二極體元件1如圖7所示或至少一發光二極體元件1a如圖8、9所示。在圖7中,該覆晶式發光二極體封裝結構2係以一封裝基板120與兩個如圖1所示之發光二極體元件1組裝為例說明但不限制;在圖8中,該覆晶式發光二極體封裝結構2係以一封裝基板120與兩個如圖5所示之發光二極體元件1a組裝為例說明但不限制;在圖9中,該覆晶式發光二極體封裝結構2係以一封裝基板120與兩個如圖6所示之發光二極體元件1a組裝為例說明但不限制。Referring to FIG. 7-9, FIG. 7 is a schematic cross-sectional view showing three embodiments of a flip-chip LED package structure obtained by flip chip mounting of the LED device 1 and 1a of the present invention. The flip-chip type LED package structure 2 of the present invention is formed by assembling a package substrate 120 with at least one of the foregoing light-emitting diode elements 1 or 1a. The flip-chip LED package structure 2 mainly comprises a package substrate 120 and at least one light-emitting diode element 1 as shown in FIG. 7 or at least one light-emitting diode element 1a as shown in FIGS. In FIG. 7 , the flip-chip LED package structure 2 is illustrated by a package substrate 120 and two LED components 1 as shown in FIG. 1 as an example; but in FIG. 8 , The flip-chip LED package structure 2 is illustrated by a package substrate 120 and two LED components 1a as shown in FIG. 5, but is not limited; in FIG. 9, the flip-chip illumination The diode package structure 2 is illustrated by way of example, but not limited to, a package substrate 120 and two light-emitting diode elements 1a as shown in FIG.

該至少一發光二極體元件1或1a係倒覆在該封裝基板120上並藉由至少二導電金屬凸塊130以與該封裝基板120電性連接,其中該至少二導電金屬凸塊130係分別設於該發光二極體元件1或1a之該至少二分開之電極第二部100、110上。The at least one light-emitting diode element 1 or 1a is overlaid on the package substrate 120 and electrically connected to the package substrate 120 by at least two conductive metal bumps 130, wherein the at least two conductive metal bumps 130 are They are respectively disposed on the at least two separated electrode second portions 100, 110 of the light emitting diode element 1 or 1a.

該封裝基板120可選用一具有散熱功能之印刷電路(PCB,printed circuit board)作為基板,用以取代先前技術在封裝時採用矽基板(submount)並加上鋁基板。該封裝基板120包含:一絕緣基板121、至少二線路層122、123及至少二散熱孔124、125如圖7-9所示;其中,該絕緣基板121具有上、下二側表面;該至少二線路層122、123係分別形成並設置在該基板121之二側表面上,其中一側表面上之線路層122係藉由該至少二導電金屬凸塊130以使該至少一發光二極體元件1或1a能藉由該至少二分開之電極第二部100、110以電性連接在該封裝基板120上;該至少二散熱孔124、125係穿設在該絕緣基板121之上、下二側表面之間,各散熱孔124、125內設具導熱材料,如樹脂、銀膏、導熱膏等,以將電性連接在該封裝基板120一側表面(122)上之該至少一發光二極體元件1或1a在操作中所產生之熱源由該封裝基板120之一側表面(122)傳導至另一側表面(123)而向外散熱。The package substrate 120 may be provided with a printed circuit board having a heat dissipation function as a substrate, instead of using a submount and an aluminum substrate in the package. The package substrate 120 includes: an insulating substrate 121, at least two circuit layers 122, 123, and at least two heat dissipation holes 124, 125 as shown in FIGS. 7-9; wherein the insulating substrate 121 has upper and lower two side surfaces; The two circuit layers 122 and 123 are respectively formed on the two side surfaces of the substrate 121, wherein the circuit layer 122 on one side surface is formed by the at least two conductive metal bumps 130 to make the at least one light emitting diode The component 1 or 1a can be electrically connected to the package substrate 120 by the at least two separated electrode portions 100 and 110. The at least two heat dissipation holes 124 and 125 are disposed above and below the insulating substrate 121. Between the two side surfaces, the heat dissipation holes 124 and 125 are provided with a heat conductive material, such as a resin, a silver paste, a thermal paste, or the like, to electrically connect the at least one light on the surface (122) of the package substrate 120. The heat source generated by the diode element 1 or 1a in operation is conducted by one side surface (122) of the package substrate 120 to the other side surface (123) to dissipate heat outward.

參考圖8、9所示,在該封裝基板120面向該至少一發光二極體元件1a之一側表面(122)上,進一步可對應設置至少一反射層140,用以作為該至少一發光二極體元件1a之發光層40所發出之光的反射層,供可反射由該至少一發光二極體元件1a所發出並射向該反射層140之光線。該反射層140可利用濺鍍方法或噴錫方法形成在該封裝基板120面向該發光二極體元件之側表面(122)上,即該反射層140可視為一形成且覆蓋在該線路層122上之噴錫層,除具有反射層140之作用功效外,對該線路層122亦具有防氧化之保護層之作用功效。Referring to FIG. 8 and FIG. 9 , at least one reflective layer 140 is further disposed on the side surface (122) of the at least one LED component 1a of the package substrate 120 as the at least one light emitting diode. A reflective layer of light emitted by the light-emitting layer 40 of the polar body element 1a is configured to reflect light emitted by the at least one light-emitting diode element 1a and directed toward the reflective layer 140. The reflective layer 140 can be formed on the side surface (122) of the package substrate 120 facing the LED component by a sputtering method or a tin-spraying method, that is, the reflective layer 140 can be formed as a layer and covered on the circuit layer 122. In addition to the function of the reflective layer 140, the solder layer has an effect of protecting the circuit layer 122 from oxidation.

參考圖10、11所示,針對如圖1或圖6所示之發光二極體元件1或1a,本發明進一步提供一種適用於覆晶式發光二極體元件之光反射結構(a light reflecting structure for flip-chip light emitting diode device with coplanar pads)3或3a,其包含:一透明導電金屬氧化物層50,其形成且設置在一發光二極體元件1之半導體層上;一第一透明絕緣層80,其形成且覆蓋在該透明導電金屬氧化物層50上;以及至少二分開之電極第二部100、110,其包含至少一第二電極第二部100及至少一第一電極第二部110,其係利用至少一導電金屬形成,並分別對應電性連結於該發光二極體元件1之該至少一第二電極第一部60及該至少一第二電極第一部70。Referring to FIGS. 10 and 11, the present invention further provides a light reflecting structure (a light reflecting) suitable for a flip-chip light emitting diode element for the light emitting diode element 1 or 1a as shown in FIG. 1 or FIG. The structure for flip-chip light emitting diode device with coplanar pads 3 or 3a, comprising: a transparent conductive metal oxide layer 50 formed and disposed on a semiconductor layer of the light emitting diode element 1; An insulating layer 80 formed on and overlying the transparent conductive metal oxide layer 50; and at least two separate electrode second portions 100, 110 including at least one second electrode second portion 100 and at least one first electrode The two portions 110 are formed by using at least one conductive metal and corresponding to the at least one second electrode first portion 60 and the at least one second electrode first portion 70 electrically connected to the light emitting diode element 1 respectively.

本發明之反射結構3或3a與先前技術如US6,914,268比較,其主要區別特徵在於:該至少二分開且不同極之電極第二部100、110之上表面101、111為共平面,故本發明之反射結構3與先前技術如US6,914,268比較,具有提升覆晶式發光二極體封裝結構之組裝良率的功效。The reflective structure 3 or 3a of the present invention is compared with the prior art, such as US Pat. No. 6,914,268. The main distinguishing feature is that the upper surfaces 101, 111 of the electrode second portions 100, 110 of the at least two separate and different poles are coplanar, The reflective structure 3 of the invention has the effect of improving the assembly yield of the flip-chip light-emitting diode package structure as compared with the prior art, such as US 6,914,268.

本發明之光反射結構3如圖10所示之再一區別特徵在於:該至少二分開之電極第二部100、110之範圍係相對地擴大至涵蓋該發光二極體元件1之半導體層如發光層40之大部分表面,以使該二分開之電極第二部100、110可作為該發光二極體元件1之發光層40發出之光,如圖10中所示之發出光線A,的反射層,供反射由該發光二極體元件1之發光層40所發出並射向該反射層之光線,如圖10中所示之反射光線B。故本發明之反射結構3與先前技術如US6,914,268比較,具有簡化製程及有效降低製作成本之功效。A further distinguishing feature of the light reflecting structure 3 of the present invention as shown in FIG. 10 is that the range of the at least two separate electrode portions 100, 110 is relatively enlarged to cover the semiconductor layer of the light emitting diode element 1 such as The majority of the surface of the light-emitting layer 40 is such that the second electrode 100, 110 can be used as the light emitted by the light-emitting layer 40 of the light-emitting diode element 1, as shown in FIG. a reflective layer for reflecting light emitted by the light-emitting layer 40 of the light-emitting diode element 1 and directed toward the reflective layer, as shown in FIG. Therefore, the reflective structure 3 of the present invention has the advantages of simplifying the process and effectively reducing the manufacturing cost as compared with the prior art, such as US 6,914,268.

本發明之光反射結構3a如圖11所示之再一區別特徵在於:同時參考圖8、9所示,在與該發光二極體元件1a組裝之一封裝基板120面向該至少一發光二極體元件1a之一側表面上,進一步可對應設置至少一反射層140供作為該至少一發光二極體元件1a之發光層40所發出之光,如圖11中所示之發出光線A,的反射層,供可反射由該至少一發光二極體元件1a發出並射向該反射層140之光線,如圖11中所示之反射光線B。該反射層140可利用濺鍍方法或噴錫方法形成在該封裝基板120面向該發光二極體元件1a之側表面上,故本發明之反射結構3a與先前技術如US6,914,268比較,具有簡化製程及有效降低製作成本之功效。A further distinguishing feature of the light reflecting structure 3a of the present invention as shown in FIG. 11 is that, as shown in FIGS. 8 and 9, a package substrate 120 is assembled with the light emitting diode element 1a facing the at least one light emitting diode. On one side surface of the body element 1a, at least one reflective layer 140 may be correspondingly provided for the light emitted by the light-emitting layer 40 of the at least one light-emitting diode element 1a, as shown in FIG. a reflective layer for reflecting light emitted by the at least one light emitting diode element 1a and directed toward the reflective layer 140, as shown in FIG. The reflective layer 140 can be formed on the side surface of the package substrate 120 facing the light-emitting diode element 1a by a sputtering method or a tin-spraying method, so that the reflective structure 3a of the present invention is simplified compared with the prior art such as US 6,914,268. Process and effective reduction of production costs.

以上所示僅為本發明之優選實施例,對本發明而言僅是說明性的,而非限制性的。在本專業技術領域具通常知識人員理解,在本發明權利要求所限定的精神和範圍內可對其進行許多改變,修改,甚至等效的變更,但都將落入本發明的保護範圍內。The above are only the preferred embodiments of the present invention, and are merely illustrative and not restrictive. It will be apparent to those skilled in the art that many changes, modifications, and equivalents may be made without departing from the spirit and scope of the invention.

1、1a...發光二極體元件1, 1a. . . Light-emitting diode component

10...元件基板10. . . Component substrate

20...第一型摻雜層20. . . First doped layer

30...第二型摻雜層30. . . Second type doping layer

40...發光層40. . . Luminous layer

50...透明導電金屬氧化物層50. . . Transparent conductive metal oxide layer

60、70...電極第一部60, 70. . . First part of the electrode

80...第一透明絕緣層80. . . First transparent insulating layer

90...第二絕緣層90. . . Second insulating layer

91...上表面91. . . Upper surface

92、93、92a、93a...凹槽92, 93, 92a, 93a. . . Groove

100、110、100a、110a...電極第二部100, 110, 100a, 110a. . . Electrode second

101、111...上表面101, 111. . . Upper surface

102、112...化鎳層102, 112. . . Nickel layer

103、113...化金層103, 113. . . Gold layer

120...封裝基板120. . . Package substrate

121...絕緣基板121. . . Insulating substrate

122、123...線路層122, 123. . . Circuit layer

124、125...散熱孔124, 125. . . Vents

130...金屬凸塊130. . . Metal bump

140...反射層140. . . Reflective layer

A...發出光線A. . . Ray out

B...反射光線B. . . Reflected light

圖1係本發明之電極共平面之發光二極體元件一實施例之結構剖面示意圖。BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a cross-sectional view showing the structure of an embodiment of an electrode coplanar light-emitting diode of the present invention.

圖2係本發明之電極共平面之發光二極體元件一實施例之上視示意圖。2 is a top plan view of an embodiment of an electrode coplanar light emitting diode device of the present invention.

圖3係本發明之電極共平面之發光二極體元件一實施例之製程中一結構剖面示意圖。3 is a cross-sectional view showing a structure in an embodiment of an embodiment of an electrode coplanar light-emitting diode of the present invention.

參考圖4、5、6,所示,其分別係本發明之電極共平面之發光二極體元件另一實施例之結構剖面示意圖及電極分別以不同導電金屬構成之結構剖面示意圖。4, 5, and 6, which are respectively a schematic cross-sectional view showing another embodiment of the electrode coplanar light-emitting diode device of the present invention, and a structural cross-sectional view of the electrodes respectively formed of different conductive metals.

圖4係本發明之電極共平面之發光二極體元件另一實施例之結構剖面示意圖。4 is a cross-sectional view showing the structure of another embodiment of the electrode coplanar light-emitting diode of the present invention.

圖5係本發明之電極共平面之發光二極體元件另一實施例(電極分別以不同導電金屬構成)之結構剖面示意圖。FIG. 5 is a schematic cross-sectional view showing another embodiment of the electrode coplanar light-emitting diode element of the present invention (the electrodes are respectively formed of different conductive metals).

圖6係本發明之電極共平面之發光二極體元件另一實施例(電極分別以不同導電金屬構成)之結構剖面示意圖。Figure 6 is a schematic cross-sectional view showing another embodiment of the electrode coplanar light-emitting diode element of the present invention (the electrodes are respectively formed of different conductive metals).

圖7-9分別係本發明之覆晶式發光二極體封裝結構之三個實施例之結構剖面示意圖。7-9 are schematic cross-sectional views showing the structure of three embodiments of the flip-chip light emitting diode package structure of the present invention.

圖10係本發明之光反射結構一實施例之結構剖面及光程示意圖。Figure 10 is a schematic cross-sectional view showing the structure and optical path of an embodiment of the light-reflecting structure of the present invention.

圖11係本發明之光反射結構另一實施例之結構剖面及光程示意圖。Figure 11 is a cross-sectional view showing the structure and optical path of another embodiment of the light-reflecting structure of the present invention.

1...發光二極體元件1. . . Light-emitting diode component

10...元件基板10. . . Component substrate

20...第一型摻雜層20. . . First doped layer

30...第二型摻雜層30. . . Second type doping layer

40...發光層40. . . Luminous layer

50...透明導電金屬氧化物層50. . . Transparent conductive metal oxide layer

60、70...電極第一部60, 70. . . First part of the electrode

80...第一透明絕緣層80. . . First transparent insulating layer

90...第二絕緣層90. . . Second insulating layer

91...上表面91. . . Upper surface

92、93...凹槽92, 93. . . Groove

100、110...電極第二部100, 110. . . Electrode second

101、111...上表面101, 111. . . Upper surface

Claims (18)

一種電極共平面之發光二極體元件,包含:一元件基板;一第一型摻雜層,其形成且設置在該元件基板上;一第二型摻雜層,其形成且設置在部分之該第一型摻雜層上,其中該第二型摻雜層與該第一型摻雜層之交界面形成一發光層以發出光;一透明導電金屬氧化物層,其形成且設置在該第二型摻雜層上供作為歐姆接觸層;至少二不同極之電極第一部,其包含:至少一第一電極第一部其形成且設置在該第一型摻雜層上以與該第一型摻雜層電性導通;及至少一第二電極第一部其穿過該透明導電金屬氧化物層而形成且設置在該第二型摻雜層上以與該第二型摻雜層電性導通,其中該至少一第一電極第一部及該至少一第二電極第一部之頂面分別位於不同之高度位置;一第一透明絕緣層,其形成且覆蓋在該元件基板、該第一型摻雜層、該第二型摻雜層及該透明導電金屬氧化物層之表面上,以使該至少一第一電極第一部及該至少一第二電極第一部能由該第一絕緣層向外顯露;一第二絕緣層,其形成且覆蓋在該第一絕緣層及該至少一第一、第二電極第一部上,該第二絕緣層之上表面為一均勻高度之平面,且該上表面上開設有至少二分開之凹槽以分別對應於該至少一第一及第二電極第一部以使該至少一第一及第二電極第一部可分別透過該至少二分開之凹槽而向外顯露,其中該至少二分開之凹槽之凹槽口為共平面;及至少二分開且不同極之電極第二部,包含至少一第一電極第二部及至少一第二電極第二部,其係利用至少一導電金屬以形成且分別填滿在該至少二分開之凹槽內供分別對應電性連結於該至少一第一電極第一部及該至少一第二電極第一部以形成至少二分開之一體式電極,且該至少二分開之電極第二部之上表面為共平面。An electrode coplanar light emitting diode element comprising: an element substrate; a first type doped layer formed on the element substrate; and a second type doped layer formed and disposed in the portion The first type doped layer, wherein an interface between the second type doped layer and the first type doped layer forms a light emitting layer to emit light; a transparent conductive metal oxide layer formed and disposed on the layer The second type doped layer is provided as an ohmic contact layer; the first part of the electrode of at least two different poles comprises: at least one first electrode, the first portion is formed and disposed on the first type doped layer to The first type doping layer is electrically conductive; and the at least one second electrode first portion is formed through the transparent conductive metal oxide layer and disposed on the second type doped layer to be doped with the second type The layer is electrically conductive, wherein the at least one first electrode first portion and the top surface of the at least one second electrode first portion are respectively located at different height positions; a first transparent insulating layer is formed and covered on the element substrate The first type doping layer, the second type doping layer, and the transparent a surface of the electrical metal oxide layer such that the at least one first electrode first portion and the at least one second electrode first portion can be exposed outwardly from the first insulating layer; a second insulating layer is formed and Covering the first insulating layer and the first portion of the at least one first and second electrodes, the upper surface of the second insulating layer is a plane of uniform height, and the upper surface is provided with at least two separate grooves Corresponding to the at least one first and second electrode first portions respectively, such that the at least one first and second electrode first portions are respectively exposed through the at least two separate grooves, wherein the at least two separate The groove of the groove is coplanar; and the second portion of the electrode of at least two separate and different poles includes at least a first electrode second portion and at least a second electrode second portion, which utilize at least one conductive metal Forming and filling respectively in the at least two separate grooves for electrically connecting to the at least one first electrode first portion and the at least one second electrode first portion respectively to form at least two separate one-piece electrodes And the at least two separate electrodes of the second part Upper surface coplanar. 如請求項1所述之發光二極體元件,其中該至少二分開之凹槽之範圍是相對地擴大至涵蓋該發光層之大部分表面,以使形成在該至少二分開之凹槽內之該至少二分開且不同極之電極第二部作為該發光層發出之光的反射層,供可反射由該發光層發出並射向該反射層之光線。The illuminating diode component of claim 1, wherein the at least two spaced apart grooves are relatively enlarged to cover a majority of the surface of the luminescent layer so as to be formed in the at least two separate grooves The second electrode of the at least two separate and different poles serves as a reflective layer of light emitted by the luminescent layer for reflecting light emitted by the luminescent layer and directed toward the reflective layer. 如請求項1所述之發光二極體元件,其中該至少二分開且不同極之電極第二部係利用濺鍍方法、電鍍方法、化鍍(無電解金屬)方法中一種形成方法以沈積形成。The light-emitting diode element according to claim 1, wherein the second electrode of the at least two separate and different poles is formed by deposition using a sputtering method, a plating method, a plating method (electroless metal) method. . 如請求項3所述之發光二極體元件,其中該至少二分開且不同極之電極第二部在沈積形成之後,可進一步藉磨平作業以使該至少二分開且不同極之電極第二部之上表面成為共平面。The illuminating diode component of claim 3, wherein the second electrode of the at least two separate and different poles is further formed by deposition after the deposition is formed to make the at least two separate electrodes of different poles second The upper surface of the part becomes coplanar. 如請求項1所述之發光二極體元件,其中該元件基板包含藍寶石基板及玻璃基板。The light-emitting diode element according to claim 1, wherein the element substrate comprises a sapphire substrate and a glass substrate. 如請求項1所述之發光二極體元件,其中該第一型摻雜層及第二型摻雜層皆係由一Ⅲ-Ⅴ族化合物半導體材料所構成。The light-emitting diode device of claim 1, wherein the first-type doped layer and the second-type doped layer are composed of a III-V compound semiconductor material. 如請求項6所述之發光二極體元件,其中該Ⅲ-Ⅴ族化合物半導體材料包含氮化鎵(gallium nitride,GaN)、磷化鎵(gallium phosphide,GaP)及磷砷化鎵(gallium phosphide arsenide,GaAsP)。The luminescent diode component according to claim 6, wherein the III-V compound semiconductor material comprises gallium nitride (GaN), gallium phosphide (GaP), and gallium phosphide (gallium phosphide). Arsenide, GaAsP). 如請求項1所述之發光二極體元件,其中該透明導電金屬氧化物層之材質係選自由氧化銦錫(ITO,indium tin oxide)、氧化鈰錫(CTO,cerium tin oxide)、氧化銻錫(ATO,antimony tin oxide)、氧化鋁鋅(AZO,aluminum zinc oxide)、氧化銦鋅(IZO,indium zinc oxide)、氧化鋅(ZO,zinc oxide)所組成之族群。The light-emitting diode element according to claim 1, wherein the transparent conductive metal oxide layer is made of a material selected from the group consisting of indium tin oxide (ITO), cerium tin oxide (CTO), and cerium oxide. A group of tin (ATO, antimony tin oxide), aluminum zinc oxide (AZO), indium zinc oxide (IZO), zinc oxide (ZO, zinc oxide). 如請求項1所述之發光二極體元件,其中當該第一型摻雜層為一N型摻雜層時,該第二型摻雜層為一P型摻雜層;其中當該第一型摻雜層為一P型摻雜層,該第二型摻雜層為一N型摻雜層。The light emitting diode device of claim 1, wherein when the first type doped layer is an N type doped layer, the second type doped layer is a P type doped layer; The doped layer is a P-type doped layer, and the second doped layer is an N-type doped layer. 如請求項1所述之發光二極體元件,其中當該至少二不同極之電極第一部以金構成時,該至少二分開且不同極之電極第二部係利用錫為導電金屬以形成且分別填滿在該至少二分開之凹槽內供分別對應電性連結於該至少二不同極之電極第一部。The illuminating diode device of claim 1, wherein when the first portion of the electrode of the at least two different poles is made of gold, the second portion of the electrode of the at least two separate and different poles is formed by using tin as a conductive metal. And filling the at least two separate grooves for respectively electrically connecting to the first portion of the electrode of the at least two different poles. 如請求項1所述之發光二極體元件,其中當該該至少二不同極之電極第一部以鋁構成時,該至少二分開且不同極之電極第二部係先利用化鎳為導電金屬以在該至少二分開之凹槽內先形成一化鎳層供分別對應電性連結於該至少二電極第一部,再利用化金為導電金屬以在該化鎳層上形成一化金層。The illuminating diode component of claim 1, wherein when the first portion of the electrode of the at least two different poles is made of aluminum, the second portion of the electrode of the at least two separate and different poles is first made of nickel. Forming a nickel layer in the at least two separate grooves for electrically connecting to the first portion of the at least two electrodes, respectively, and using the gold as a conductive metal to form a gold on the nickel layer. Floor. 一種電極共平面之覆晶式發光二極體封裝結構,包含:一封裝基板;及至少一發光二極體元件,該發光二極體元件係申請專利範圍請求項1至請求項11中任一項所述之發光二極體元件,其係倒覆在該封裝基板上而與其電性連接。An electrode-coplanar flip-chip light-emitting diode package structure comprising: a package substrate; and at least one light-emitting diode element, which is claimed in any one of claims 1 to 11 The light-emitting diode element according to the item is electrically over-connected to the package substrate. 如請求項12所述之覆晶式發光二極體封裝結構,其中該發光二極體元件係藉由至少二導電金屬凸塊以與該封裝基板電性連接,該至少二導電金屬凸塊係分別設於該發光二極體元件之該至少二分開且不同極之電極第二部上。The flip-chip LED package of claim 12, wherein the LED component is electrically connected to the package substrate by at least two conductive metal bumps, the at least two conductive metal bumps And respectively disposed on the second portion of the electrode of the at least two separate and different poles of the LED component. 如請求項12所述之覆晶式發光二極體封裝結構,其中該封裝基板係一具有散熱功能之印刷電路(PCB)基板,包含:一絕緣基板,具有上、下二側表面;二線路層,分別形成並設置在該絕緣基板之二侧表面上,其中一側表面上之線路層係藉由至少二導電金屬凸塊分別設於該至少一發光二極體元件之至少二分開且不同極之電極第二部上,以使該至少一發光二極體元件藉由該至少二分開且不同極之電極第二部以電性連接在該封裝基板上;及至少二散熱孔,其穿設在該絕緣基板之二侧表面之間,該些散熱孔內設具導熱材料以將電性連接在該絕緣基板一側表面上之該發光二極體元件在操作中所產生之熱源由該絕緣基板之一側表面傳導至另一側表面而向外散熱。The flip-chip LED package structure of claim 12, wherein the package substrate is a printed circuit (PCB) substrate having a heat dissipation function, comprising: an insulating substrate having upper and lower surface surfaces; The layers are respectively formed and disposed on the two side surfaces of the insulating substrate, wherein the circuit layer on one side surface is separated and different by at least two conductive metal bumps respectively disposed on the at least one light emitting diode element a second electrode of the electrode, such that the at least one light emitting diode element is electrically connected to the package substrate by the at least two separated and different electrode second portions; and at least two heat dissipation holes are worn through Provided between the two side surfaces of the insulating substrate, wherein the heat dissipation holes are provided with a heat conductive material to electrically connect the light emitting diode element electrically connected to the surface of the insulating substrate to the heat source generated by the operation. One side surface of the insulating substrate is conducted to the other side surface to dissipate heat outward. 如請求項14所述之覆晶式發光二極體封裝結構,其中該封裝基板面向該發光二極體元件之一側表面上進一步設置一反射層,用以作為該發光二極體元件之發光層發出之光的反射層,供可反射由該發光二極體元件發出並射向該反射層之光線。The flip-chip LED package structure of claim 14, wherein a reflective layer is further disposed on a side surface of the package substrate facing the light emitting diode element for emitting the light emitting diode component a reflective layer of light emitted by the layer for reflecting light emitted by the light emitting diode element and directed toward the reflective layer. 如請求項15所述之覆晶式發光二極體封裝結構,其中該反射層係利用濺鍍方法、噴錫方法中一種方法以形成在該封裝基板面向該發光二極體元件之表面上。The flip-chip LED package structure of claim 15, wherein the reflective layer is formed on the surface of the package substrate facing the light-emitting diode element by a method of a sputtering method or a tin-spraying method. 如請求項14所述之覆晶式發光二極體封裝結構,其中該些散熱孔內所設具之導熱材料包含樹脂、銀膏及導熱膏。The flip-chip LED package structure of claim 14, wherein the heat conductive material disposed in the heat dissipation holes comprises a resin, a silver paste, and a thermal paste. 一種光反射結構,其適用於覆晶式發光二極體元件,包含:一透明導電金屬氧化物層,其形成且設置在一發光二極體元件之半導體層上;一第一透明絕緣層,其形成且覆蓋在該透明導電金屬氧化物層上;及至少二分開且不同極之電極第二部,其包含至少一第一電極第二部及至少一第二電極第二部,其係利用至少一導電金屬形成而分別對應電性連結於該發光二極體元件之二分開之電極上;其中該至少二分開且不同極之電極第二部之上表面為共平面;其中該至少二分開且不同極之電極第二部之範圍是相對地擴大至涵蓋該發光二極體元件之半導體層之大部分表面,以使該至少二分開且不同極之電極第二部作為該發光二極體元件所發出光之反射層供反射由該發光二極體元件所發出並射向該反射層之光線。A light-reflecting structure suitable for a flip-chip light-emitting diode element, comprising: a transparent conductive metal oxide layer formed on a semiconductor layer of a light-emitting diode element; a first transparent insulating layer, Forming and covering the transparent conductive metal oxide layer; and at least two separate and different electrode second portions including at least one first electrode second portion and at least one second electrode second portion, which utilize Forming at least one conductive metal correspondingly electrically connected to the two separate electrodes of the light emitting diode element; wherein the upper surface of the second portion of the electrode and the different poles are coplanar; wherein the at least two are separated And the second portion of the electrode of the different poles is relatively enlarged to cover a majority of the surface of the semiconductor layer of the light emitting diode element, so that the second portion of the electrode of the at least two separate and different poles is used as the light emitting diode The reflective layer of light emitted by the element reflects light emitted by the light emitting diode element and directed toward the reflective layer.
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