M430321 五、新型說明： 【新型所屬之技術領域】 本創作是有關於一種能對物體表面塗布流體（fluid ) 的設備，且特別是有關於此種設備所使用的液刀（n〇Zzle)。 【先前技術】 現有液晶顯示器（Liquid Crystal Display, LCD)的製 k過程會採用顯影機（developing equipment)來進行顯景〈， 其中顯影機可以對基板（例如玻璃基板）表面塗布顯影劑 (devel〇per)〇 —般而言，目前有些顯影機具有液刀，而顯 影劑會從液刀流出而塗布在基板上。如此，顯影劑能局部 去除基板上的光阻層，從而形成光阻圖案層。 ^ -般而言’當顯影劑從液刀流出時，液刀的吐出口通 常會設計成-條狹縫（slit)’促使顯影劑均句地流出，以 形成-道既錢紋，也無分岔的㈣簾幕（叫㈣。論⑷。 如此’顯影舰均勻地塗布在基板上，使光關案層能在 基板上暴露出正確區域，並減少出現顯影異常區域的機率。 在常見的液刀中，由於吐出口為一條狹縫，且 ::劑在液刀内的出口基本上只有吐出口，因此當液刀内 時’吐出σ容易遭到異物所阻塞。所以，現有液 刀吊會發生吐出口被阻塞的情 閒形一旦吐出口被異物阻塞 是體簾：從吐出口均勻地流出，從而發生分岔或 ==現波紋等異常狀况，造成顯影劑無法均勻地 4 M430321 這會增加顯影異常區域出現的機率，造成光阻圖案層 覆蓋到原本應該要被暴露的正確區域，導致良率（yield) 下降。此外，因為吐出口容易遭到異物所阻塞，所以維修 液刀的頻率會增加，造成工作人員須要經常拆卸液刀來清 除異物，以至於顯影機的工作時間減少而降低生產力。 【新型内容】 本創作提供一種液刀，其能減少發生吐出口遭異物阻 塞的機率。 鲁 本創作提出一種液刀，其包括一蓋板、一槽體以及一 分隔件。槽體具有一結合面、一出口面、一凹槽、至少一 注入口以及至少二排液通道，而結合面與出口面皆位在凹 槽的一槽口周圍。蓋板固定在結合面上，而蓋板與出口面 之間存有一吐出口。出口面位在這些排液通道之間，而分 隔件固定在凹槽内，並且與蓋板之間存有一縫隙。分隔件 將凹槽分割成一飽和槽與一緩衝槽，其中飽和槽位在分隔 φ 件與出口面之間，並且連通吐出口與這些排液通道，而注 • 入口與緩衝槽連通。 . 在本創作一實施例中，這些排液通道為多條溝渠，而 各條溝渠裸露在出口面與結合面之間。 在本創作一實施例中，各條溝渠具有一第一端口與一 第二端口，而出口面具有一外邊緣，其中外邊緣位於飽和 槽的相對處。這些第一端口裸露於飽和槽内，而各個第二 端口位於外邊緣旁，其中這些第一端口之間的距離小於這 5 M430321 1 > V * * » 些第二端口之間的距離。 在本創作一實施例中，這些排液通道之間的距離從這 些第一端口朝向這些第二端口漸增。 在本創作一實施例中，上述蓋板具有至少二個排出貫 孔，這些排出貫孔與飽和槽連通，並且分別位在這些第一 端口旁。 在本創作一實施例中，各個第二端口的孔徑小於各個 ' 排出貫孔的孔徑。 • 在本創作一實施例中，上述液刀更包括至少二個阻擋 件，而這些阻擋件分別配置在這些排出貫孔内。 在本創作一實施例中，上述槽體更具有一第一平面與 一斜面。第一平面與斜面皆位在飽和槽内，而第一平面連 接在分隔件與斜面之間。斜面從第一平面朝向出口面延伸。 在本創作一實施例中，上述槽體更具有一第二平面與 一對導流面，而出口面具有一對彼此相連的内邊緣。第二 φ 平面與這些導流面皆位在飽和槽内，而這些導流面位在出 • 口面與第二平面之間，並且彼此相連，其中第二平面鄰接 • 斜面，而各面導流面鄰接第二平面，並從第二平面延伸至 其中一内邊緣，出口面位在這些内邊緣交接處的角度小於 180 度。 在本創作一實施例中，各面導流面為一内凹弧面或平 M430321 在本創作一實施例中，上述液刀更包括多個擋塊，這 些擋塊固定在緩衝槽内，其中相鄰二個擋塊之間存有一緩 衝室，而注入口與緩衝室連通。 在本創作一實施例中，上述蓋板的厚度介於16 mm至 16.5 mm 之間。 利用上述排液通道，本創作的液刀能在不被拆卸的情 況下排出異物。如此，可以減少發生吐出口遭異物阻塞的 機率，並能減少液刀維修及拆卸的頻率。 鲁為讓本創作之上述特徵和優點能更明顯易懂，下文特 舉實施例，並配合所附圖式，作詳細說明如下。 【實施方式】 圖1A是本創作一實施例之液刀的立體示意圖。請參 閱圖1A，本實施例的液刀100可以應用於顯影機（未繪 示），即液刀100能裝設在顯影機上，其中此顯影機不僅可 以應用於製造液晶顯示器，且也可以應用於製造半導體元 φ 件（例如晶圓）或發光二極體（Light Emitting Diode，LED )。 除了顯影機之外，液刀100也可以應用於其他設備。 例如，液刀100也可應用於清洗設備或溼式蝕刻機（wet etching equipment)，所以液刀100也可以裝設在清洗設備 或溼式蝕刻機上。當然，上述清洗設備與溼式蝕刻機皆可 為製造液晶顯示器、半導體元件或發光二極體所使用的機 台，所以本實施例的液刀100並不局限在顯影機的應用上。 7 M430321 圖1B是圖1A中的液刀的分解示意圖。請參閱圖ία 與圖1Β’液刀100包括一槽體（tank )110、一分隔件（divider) 120與一蓋板（cover) 130，其中蓋板130能與槽體n〇結 合，而分隔件120與槽體110結合，並固定在槽體ho内。 槽體110可以是用鎖固的方式來與蓋板13〇結合。舉 例而言，在本實施例中，液刀100可以更包括多根螺絲 140’而槽體110與蓋板130可分別具有多個孔洞HhH3。 各根螺絲140能從孔洞H3貫穿蓋板130而鎖固在槽體11〇 • 之孔洞H1内。如此，槽體11〇得以與蓋板13〇鎖固而結合 在一起。 不過’除了鎖固之外，在其他實施例中，槽體11〇可 以利用其他方式來與蓋板130結合。舉例而言，槽體11〇 與蓋板130二者可利用卡合（buckling)或緊配（仏㈣^) 等方式來結合。因此，圖1A與圖1B所示的槽體11〇與蓋 板130二者結合方式僅為舉例說明，並非限定本創作。 • 槽體110更具有一結合面me、一出口面1Ue以及一 •凹槽R10。從圖1B來看，結合面112c與出口面U2e皆位 . 在凹槽R10的槽口 01周圍，其中結合面ll2c的形狀 略呈倒U字形，而出口面112e的形狀可為長條狀。蓋板 130固定在結合面112c上，而在本實施例中，這些孔洞反 可以位於結合面112c，如圖1B所示。 分隔件120固定在凹槽R1〇内。分隔件12〇與槽體 二者可以是-體成型，且構成二者的材料可為金屬:例如， 8 0321 分隔件12G與娜則二者可叹由—塊金祕材（metal b〇ck)經㈣加工而㈣形成，其中此顧加工可包括銑 床或研磨等，而此金屬塊材可㈣鏽鋼。此外，構成分隔 件⑶與槽㈣〇二者的材料也可以是木材、塑膠或陶究。 須說明的是’雖然分隔件120與槽冑11〇 ^者亦可以 是一體成型，但是分隔件120與槽體110二者可以是二個 镯立元件。舉例而言，分隔件120可以利用嵌入或焊接等 方式來與槽體110結合，從而固定在凹槽Rl〇内。因此， 分隔件120與槽體110二者不一定是一體成型，而本創作 不限定分隔件120與槽體110 一定是一體成型。 圖2A是圖1A中沿線A-A剖面所繪示的剖面示意圖。 請參閱圖1A、圖1B及圖2A，固定在凹槽R10内的分隔件 120能將凹槽R10分割成一緩衝槽Rll與一飽和槽Ri2， 所以分隔件120會位在緩衝槽R11與飽和槽R12之間，其 中飽和槽R12位在分隔件no與出口面112e之間，而在本 實施例中，出口面112e會緊鄰飽和槽R12，如圖2入所示。 在蓋板130與槽體110結合之後，分隔件12〇與蓋板 130之間存有一縫隙G1 ’所以分隔件12〇不會接觸到蓋板 130。此外，從圖2A來看，由於分隔件12〇與蓋板13〇之 間存有缝隙G1，因此緩衝槽R11與飽和槽R12二者可以 經由縫隙G1而彼此相通。 在圖1A與圖1B所示的實施例中，槽體11〇具有三個 注入口 114,而這些注入口 114與緩衝槽R11連通。然而， M430321 ί 1 · * 在其他實施例中，根據液刀100所應用的機台（例如顯影 機、清洗設備或溼式蝕刻機）及技術領域（例如液晶顯示 器的製造或半導體元件的製造），槽體110所具有的注入口 114的數量可以僅為一個，或是二個或三個以上。因此， 圖1Α與圖1Β中的注入口 114的數量僅為舉例說明，並非 限定本創作。 另外，槽體110可以具有一外平面112t，而外平面112t 位在出口面112e的相對處，並且鄰接結合面112c，所以結 # 合面112c會位在出口面112e與外平面112t之間。緩衝槽 R11位在分隔件120與外平面112t之間，而這些注入口 114 皆位於外平面112t。 蓋板130與出口面112e之間存有一吐出口 G2。詳細 而言，吐出口 G2為一條形成在蓋板130與出口面112e之 間的狹縫，因此在蓋板130與槽體110結合之後，蓋板130 不會接觸出口面112e。吐出口 G2的間距D1(如圖2A所示） φ 可介於20微米至25微米之間，較佳的間距D1可約為20 微米。此外，飽和槽R12與吐出口 G2連通，因此注入口 - 114可經由緩衝槽R11、縫隙G1及飽和槽R12而與吐出口 G2相通。 當液刀100應用於顯影機時，顯影劑可注入至注入口 114中，以流入槽體110内，其中顯影劑可經由插裝在吐出 口 G2内導管（未繪示）而進入槽體110内部。由於注入口 114可以經由缓衝槽R11、縫隙G1及飽和槽R12而與吐出 M430321 口 G2相通，因此在顯影劑注入至注入口 114中之後，顯影 劑會依序通過緩衝槽R11、縫隙G1以及飽和槽R12。之後， 顯影劑會從吐出口 G2流出而離開液刀1〇〇,從而塗布在基 板上’其中此基板可以是玻璃基板或矽晶圓。 一般而言，當顯影機運作時，這些注入口 114内的顯 影劑的流量並不相同，且有時候各個注入口 114内的顯影 劑的流量也會發生變動。此外，注入口 114内的顯影劑的 流量可以達到每分鐘75公升的流量，所以在注人口 ιι4内 籲流動的顯影劑具有相當程度的流速。M430321 V. New description: [New technical field] This creation is about a device that can apply a fluid to the surface of an object, and in particular to a liquid knife (n〇Zzle) used in such a device. [Prior Art] The process of the liquid crystal display (LCD) of the existing liquid crystal display (LCD) is performed by using developing equipment, wherein the developing machine can coat the surface of the substrate (for example, a glass substrate) with a developer (devel〇). Per) In general, some developing machines currently have a liquid knife, and the developer flows out of the liquid knife and is coated on the substrate. Thus, the developer can partially remove the photoresist layer on the substrate, thereby forming a photoresist pattern layer. ^ Generally speaking, when the developer flows out of the liquid knife, the discharge port of the liquid knife is usually designed as a slit to urge the developer to flow out evenly to form a road with no money, nor The bifurcated (four) curtain (called (four). On (4). So the 'developer ship is evenly coated on the substrate, so that the light close layer can expose the correct area on the substrate, and reduce the probability of developing abnormal areas. In the liquid knife, since the discharge port is a slit, and the outlet of the agent in the liquid knife is basically only the discharge port, when the liquid knife is inside, the discharge σ is easily blocked by the foreign matter. Therefore, the existing liquid knife hanger If the spout is blocked by foreign matter, it is a body curtain: it flows out evenly from the spout, causing abnormal conditions such as tillering or == corrugation, causing the developer to be unable to be evenly 4 M430321 Increasing the probability of occurrence of an abnormal development area, causing the photoresist pattern layer to cover the correct area that should be exposed, resulting in a decrease in yield. In addition, since the discharge port is easily blocked by foreign matter, the frequency of repairing the liquid knife It will increase, causing the staff to frequently remove the liquid knife to remove foreign matter, so that the working time of the developing machine is reduced and the productivity is reduced. [New content] This creation provides a liquid knife which can reduce the probability of foreign matter blocking at the spout. Luben creates a liquid knife comprising a cover plate, a trough body and a partition member. The trough body has a joint surface, an outlet surface, a groove, at least one injection port and at least two liquid discharge channels, and the combination The surface and the outlet surface are located around a notch of the groove. The cover plate is fixed on the joint surface, and a discharge port exists between the cover plate and the outlet surface. The outlet surface is located between the drainage channels, and the partition member Fixed in the groove and having a gap with the cover plate. The partition divides the groove into a saturated groove and a buffer groove, wherein the saturated groove is located between the partition φ piece and the outlet face, and connects the discharge port with these a drain passage, and the inlet is connected to the buffer tank. In an embodiment of the present invention, the drain passages are a plurality of ditches, and each of the ditches is exposed at the outlet surface and the joint surface. In an embodiment of the present invention, each of the trenches has a first port and a second port, and the exit mask has an outer edge, wherein the outer edge is located at the opposite side of the saturation slot. The first ports are exposed in the saturated slot. And each of the second ports is located beside the outer edge, wherein the distance between the first ports is less than the distance between the 5 M430321 1 > V * * » the second ports. In an embodiment of the present creation, the rows The distance between the liquid passages is gradually increased from the first ports toward the second ports. In an embodiment of the present invention, the cover plate has at least two discharge through holes, and the discharge through holes communicate with the saturation grooves and are respectively located In the embodiment of the present invention, the aperture of each of the second ports is smaller than the aperture of each of the 'discharge through holes. · In an embodiment of the present invention, the liquid knife further includes at least two blocking members. These blocking members are respectively disposed in the discharge through holes. In an embodiment of the present invention, the groove body further has a first plane and a slope. The first plane and the slope are both located in the saturated tank, and the first plane is connected between the partition and the slope. The ramp extends from the first plane toward the exit face. In an embodiment of the present invention, the groove body further has a second plane and a pair of flow guiding surfaces, and the outlet surface has a pair of inner edges connected to each other. The second φ plane and the flow guiding surfaces are all located in the saturated grooves, and the guiding surfaces are located between the outlet surface and the second plane, and are connected to each other, wherein the second plane is adjacent to the inclined surface, and the surface guides The flow surface abuts the second plane and extends from the second plane to one of the inner edges, the exit face being at an angle of less than 180 degrees at the intersection of the inner edges. In an embodiment of the present invention, each surface guide surface is a concave curved surface or a flat M430321. In an embodiment of the present invention, the liquid knife further includes a plurality of stoppers, and the stoppers are fixed in the buffer tank, wherein A buffer chamber is disposed between the adjacent two stoppers, and the injection port is in communication with the buffer chamber. In an embodiment of the present invention, the cover has a thickness of between 16 mm and 16.5 mm. With the above discharge passage, the liquid knife of the present invention can discharge foreign matter without being disassembled. In this way, it is possible to reduce the probability of occurrence of foreign matter clogging at the discharge port, and to reduce the frequency of maintenance and disassembly of the liquid knife. The above features and advantages of the present invention are more apparent and easy to understand. The following detailed description of the embodiments and the accompanying drawings are set forth below. [Embodiment] FIG. 1A is a perspective view of a liquid knife according to an embodiment of the present invention. Referring to FIG. 1A, the liquid knife 100 of the embodiment can be applied to a developing machine (not shown), that is, the liquid knife 100 can be installed on a developing machine, wherein the developing machine can be applied not only to manufacturing a liquid crystal display, but also It is used to manufacture semiconductor elements such as wafers or Light Emitting Diodes (LEDs). In addition to the developing machine, the liquid knife 100 can also be applied to other devices. For example, the liquid knife 100 can also be applied to a cleaning apparatus or a wet etching apparatus, so that the liquid knife 100 can also be mounted on a cleaning apparatus or a wet etching machine. Of course, both the above cleaning apparatus and the wet etching machine can be used for manufacturing liquid crystal displays, semiconductor elements or light-emitting diodes, so the liquid knife 100 of the present embodiment is not limited to the application of the developing machine. 7 M430321 Figure 1B is an exploded perspective view of the liquid knife of Figure 1A. Referring to FIG. 1A and FIG. 1 'the liquid knife 100 includes a tank 110, a divider 120 and a cover 130, wherein the cover 130 can be combined with the tank n〇 The member 120 is coupled to the tank 110 and fixed in the tank ho. The trough body 110 may be locked to the cover 13A in a locking manner. For example, in the present embodiment, the liquid knife 100 may further include a plurality of screws 140' and the tank body 110 and the cover plate 130 may have a plurality of holes HhH3, respectively. Each of the screws 140 can be inserted into the hole H1 of the groove 11 from the hole H3 through the cover plate 130. Thus, the groove body 11 is bonded to the cover plate 13 〇. However, in addition to locking, in other embodiments, the trough 11 can be joined to the cover 130 by other means. For example, both the trough 11 〇 and the cover 130 can be joined by means of buckling or tight fitting (仏). Therefore, the manner in which the groove body 11A and the cover plate 130 shown in FIG. 1A and FIG. 1B are combined is merely an example and is not intended to limit the creation. • The tank body 110 further has a joint surface me, an outlet surface 1Ue, and a groove R10. As seen from Fig. 1B, the joint surface 112c and the outlet surface U2e are both positioned. Around the notch 01 of the groove R10, the shape of the joint surface 11c is slightly inverted U-shape, and the shape of the outlet surface 112e may be elongated. The cover plate 130 is fixed to the joint surface 112c, and in the present embodiment, these holes may be located opposite to the joint surface 112c as shown in Fig. 1B. The spacer 120 is fixed in the recess R1〇. The partition member 12〇 and the trough body may be formed in a body shape, and the material constituting the two may be metal: for example, 8 0321 partition member 12G and Naru are both sighable - metal b〇ck It is formed by (4) processing and (4), wherein the processing may include milling or grinding, and the metal block may be (4) stainless steel. Further, the material constituting both the partition member (3) and the groove (four) 也 may be wood, plastic or ceramic. It should be noted that although the spacer 120 and the slot 11 may be integrally formed, the spacer 120 and the slot 110 may be two bracelet members. For example, the spacer 120 may be bonded to the groove body 110 by means of embedding or welding or the like to be fixed in the groove R1. Therefore, the partition member 120 and the groove body 110 are not necessarily integrally formed, and the present invention does not limit that the partition member 120 and the groove body 110 must be integrally formed. 2A is a schematic cross-sectional view taken along line A-A of FIG. 1A. Referring to FIG. 1A, FIG. 1B and FIG. 2A, the spacer 120 fixed in the recess R10 can divide the recess R10 into a buffer slot R11 and a saturation slot Ri2, so that the spacer 120 is located in the buffer slot R11 and the saturation slot. Between R12, wherein the saturated tank R12 is located between the partition no and the outlet surface 112e, and in the present embodiment, the outlet surface 112e is adjacent to the saturated tank R12, as shown in FIG. After the cover plate 130 is combined with the groove body 110, a gap G1' exists between the partition member 12A and the cover plate 130 so that the partition member 12 does not contact the cover plate 130. Further, as seen from Fig. 2A, since the gap G1 exists between the partition member 12A and the cover plate 13, both the buffer groove R11 and the saturated groove R12 can communicate with each other via the slit G1. In the embodiment shown in Figs. 1A and 1B, the tank body 11 has three injection ports 114, and these injection ports 114 communicate with the buffer tank R11. However, in other embodiments, depending on the machine to which the liquid knife 100 is applied (for example, a developing machine, a cleaning device, or a wet etching machine) and the technical field (for example, manufacturing of a liquid crystal display or manufacturing of a semiconductor element) The number of the injection ports 114 of the tank body 110 may be only one, or two or more. Therefore, the number of the injection ports 114 in Figs. 1A and 1B is merely illustrative and does not limit the creation. In addition, the trough body 110 may have an outer plane 112t, and the outer plane 112t is located at the opposite side of the outlet face 112e, and abuts the joint face 112c, so that the junction face 112c will be positioned between the exit face 112e and the outer face 112t. The buffer groove R11 is located between the partition 120 and the outer plane 112t, and these injection ports 114 are located on the outer plane 112t. A discharge port G2 is provided between the cover plate 130 and the outlet surface 112e. In detail, the discharge port G2 is a slit formed between the cover plate 130 and the outlet face 112e, so that the cover plate 130 does not contact the outlet face 112e after the cover plate 130 is combined with the groove body 110. The pitch D1 of the discharge port G2 (as shown in Fig. 2A) φ may be between 20 μm and 25 μm, and the preferred pitch D1 may be about 20 μm. Further, since the saturated tank R12 communicates with the discharge port G2, the injection port - 114 can communicate with the discharge port G2 via the buffer tank R11, the slit G1, and the saturation tank R12. When the liquid knife 100 is applied to the developing machine, the developer can be injected into the injection port 114 to flow into the tank body 110, wherein the developer can enter the tank body 110 via a conduit (not shown) inserted in the discharge port G2. internal. Since the injection port 114 can communicate with the discharge M430321 port G2 via the buffer groove R11, the slit G1, and the saturation groove R12, after the developer is injected into the injection port 114, the developer sequentially passes through the buffer groove R11, the gap G1, and Saturated tank R12. Thereafter, the developer flows out of the discharge port G2 and leaves the liquid knife 1'', thereby being coated on the substrate', wherein the substrate may be a glass substrate or a tantalum wafer. In general, when the developing device is operated, the flow rates of the developers in the injection ports 114 are not the same, and sometimes the flow rate of the developer in the respective injection ports 114 also fluctuates. Further, the flow rate of the developer in the injection port 114 can reach a flow rate of 75 liters per minute, so that the developer flowing in the population is required to have a considerable flow rate.
顯影劑會從這些注人口 114直接進入至緩衝槽RU 内。接著’顯影劑會從緩衝槽R11經縫隙G1而流入飽和 槽R12中。分隔件120能抵擋顯影劑，以減緩顯影劑的流 速，因此緩衝槽RU可以緩衝顯影劑衝入的力量，以降低 顯影劑通過縫隙G1的流速。 承上述飽和槽R12可以暫時匯聚從縫隙⑴而來的 #顯影劑，以使顯影劑在飽和槽Rl2内的流動變為穩定。如 此’飽和槽R12能讓顯影劑穩定地流入吐出口⑺中。由 此可知’利用緩衝槽R11與飽和槽R12，液刀1〇〇可以讓 顯影劑從液刀1〇〇均勻地流出，以減少注入口 114内的顯 影劑的流量對液體簾幕的不良影響。 另外β蓋板130疋由質地堅硬的材料所製成，例如 是由金屬（如料鋼）或喊所製成時，蓋板i3G可以具 有偏厚的厚度T1(如目2A所示），其可以介於16麵至16 5 M430321 mm之間。如此，在液刀100運作的過程中，可以減少蓋 板130發生形變的情形，以維持吐出口 G2的間距D1，促 使液體簾幕不產生波紋以及不發生分岔的情形。 須說明的是，由於液刀100也可以應用於清洗設備或 溼式蝕刻機，所以注入口 114不僅可以供顯影劑注入，且 注入口 114也可以供清潔液、去離子水（Deionized water, DI water )或触刻液（etchant)所注入。因此，本創作並不限 定只有顯影劑才能注入至這些注入口 114。 • 圖2B是圖1A中沿線B_B剖面所繪示的剖面示意圖。 請參閱圖1A、圖1B與圖2B，在本實施例中，蓋板130可 以具有至少二個排出貫孔132，而這些排出貫孔132與飽 和槽R12連通，因此飽和槽R12内的液體（例如顯影劑、 清潔液、去離子水或蝕刻液）可以從排出貫孔132流出。 排出貫孔132的功能主要是排出液刀100内的異物。 當液刀100内存有異物時，異物可以從排出貫孔132隨著 φ 液體而排出。此外，這些排出貫孔132可以分別位在蓋板 130的相對二端，如圖1B所示。排出貫孔132的孔徑132r(如 -圖2B所示）大於100微米，且孔徑132r可以介於2.9 mm 至3.1 mm之間，例如孔徑132r可約為3 mm。因此，排出 貫孔132可以排出粒徑大於100微米的異物。 然而，液刀100可以更包括至少二個阻擋件150，而 這些阻擋件150分別配置在這些排出貫孔132内，以封閉 排出貫孔132，讓液刀100内的液體不會從排出貫孔132 12 M4JU321 ^出。阻揚件150可為具有外徑5 mm之手動閥式接頭， 其為3 mm’而這些阻擋件15()能分別鎖固在這些排 出貝孔132内。具有外徑5 mm之手動閥式接頭可安裳一 •轉接頭（圖未示），然後轉接頭再連接 一實際排出之外徑3 mm的導水管。ιΐμ & , β . 此外’必須強調的是，本創作並不限定阻 擋件150僅為手動閥式接頭。 由於排出貝孔132的孔徑132r可介於2.9 mm至3.1 mm之間，甚至可約為3咖因此當液刀削運作時排 出貝孔132須被阻擋件15〇封閉，以避免凹槽R1〇内的液 體的整體流動受到影響’防止吐出口 G2不能均勻地流出 液體。 虽液刀100須進行檢修或出現異常運作時，工作人員 可以將阻擋件150從排出貫孔132取出，讓異物自排出貫 孔132排出。所以，即使蓋板13〇與槽體n〇沒有拆開， 工作人員也能清除液刀100内的異物。如此，可以方便工 # 作人員維修液刀1〇〇，以縮短維修液刀1〇〇的時間。 圖3A是圖1A中的槽體與分隔件的立體示意圖，而圖 3B是圖3A的局部放大示意圖。請參閱圖1B、圖3A與圖 3B ’槽體110更具有至少二條排液通道116。這些排液通 道116位在出口面ll2e的相對二側，所以出口面112e位 在這些排液通道116之間。這些排液通道116與飽和槽R12 連通，因此液刀1〇0内的液體可以從排液通道116流出。 13 ΟπΓΓ)實施例中，這些排液通道116可以是多條溝渠 C ’並且完全裸露在槽體110的外表面上，其中各 '渠（即排液通道U6)可以裸露在出口面112e與結合 面112c之門 , 曰1 ’如圖1B、圖3A與圖3B所示。不過，在其 他實施例中，出t %又 那瑕通道116可以是位在槽體11〇内的貫孔， 因此圖1B、圇Λ 圓與圖3Β所示的排液通道116僅為舉例 說明’並非限定本創作。 條棑液通道116具有一第一端口 116a以及一第二端 口 110b，ψ 、 ® 口面112e具有一外邊緣E1，其中外邊緣E1 ^於飽和槽1112的相對處。這些第-端o 116a裸露於飽和 槽R12内，而欠加姑 谷個第二端口 116b位於外邊緣E1旁。此外， 從圖1B可 乂宅無疑問地得知，這些排出貫孔132分別位在 這些第一端口 U6a旁。 _閱圖3A’這些第一端口 116a之間的距離L1小於 這些第二端口 ll6b之間的距離L2,且這些排液通道116 之間的距離從這些第—端口 n6a朝向這些第二端口祕 漸增因此’料觀而言，排液通道116的走向並不垂直 於水平線。此外，各個第二端口 U6b的孔徑小於各 個排出貫孔132的孔徑132r (請參考圖2B)，而孔徑邮 可約為100微米（請參考圖3B)。 排液通道116的功能主要也是排出液力100内的異 物’且排液通道116能排出粒徑在1〇〇微米以下的小尺寸 異物。一般而言’習知液刀内常見的異物通常約在100微 M430321 . * * » 米以下。所以，在實際情況中，液刀100内的異物大多數 為100微米以下的小尺寸異物。 當液刀100内存有這類小尺寸的異物時，異物可以從 排液通道116隨著液體而排出，以避免吐出口 G2遭到異物 阻塞。由於孔徑116r可為100微米，因此在液刀100運作 的過程中，即使未將排液通道116封閉，仍不影響凹槽R10 内的液體的整體流動，整體上不會干擾從吐出口 G2流出 的液體流動。 鲁 此外，由於距離L1小於距離L2，且排液通道116之 間的距離從第一端口 116a朝向第二端口 116b漸增，因此 當液刀100運作時，排液通道116會將異物往外排出，讓 排出去的異物盡量不落在液刀100正下方的基板上。如 此，可以避免排出的異物影響到基板的品質。 請再次參閱圖1B、圖3A與圖3B，出口面112e更具 有一對内邊緣E2 ^而這些内邊緣E2位在外邊緣E1的相對 ^ 處，並且彼此相連。這些内邊緣E2並非連成一條直線，而 - 是連成一條外凸曲線。這些内邊緣E2緊鄰飽和槽R12。出 口面112e和導流面118d在這些内邊緣E2交接處的角度 A1小於180度，如圖2A所示。此外，導流面118d之剖面 可具有導圓角半徑R為3 mm之曲線。 請參閱圖2A、圖3A與圖3B，液刀100可更包括多個 擋塊160，而擋塊160固定在緩衝槽R11内，其中相鄰二 個擋塊160之間存有一緩衝室R112。詳細而言，這些擋塊 15 M430321 • · • / * » 160可連接分隔件！2〇,且彼此沒有接觸，所以相鄰二個撐 塊160之間會存有一間隔，而此間隔即為緩衝室Rip。: 外，這些注入口 114分別與這些緩衝室RU2連通所以從 注入口 114而來的液體會進入到緩衝室Rll2内。 請參閱圖2A、圖2B、圖3A與圖3B，槽體11〇可以 更具有-第-平面118a、一第二平面⑽、一斜面腿 以及一對導流面118d，而第一平面118a、第二平面u8b、 斜面118c以及這些導流面118d皆位在飽和槽Ri2内。此 •外，從圖2A與圖2B來看，第一平面118a與第二平面ii8b 皆為垂直於水平面的平面。 第一平面118a連接在分隔件120與斜面U8c之間， 而斜面118c從第一平面118a朝向出口面U2e延伸。第二 平面118b鄰接斜面118c，而這些導流面U8d彼此相連， 並且鄰接第二平面118b，其中這些導流面U8d位在出口面 112e與第二平面118b之間。 Φ 各面導流面H8d可以是一内凹弧面，並且從第二平面 118b延伸至其中一條内邊緣拉。由於出口面n2e位在這 些内邊緣E2父接處的角度a 1小於1度，因此這些導流 面118d之間會呈現一夾角。飽和槽R12内的第一平面 118a、第二平面118b、斜面U8c以及這些導流面丨丨⑸能 形成一導流結構，而此導流結構能幫助飽和槽R12.内的液 體流動，促使液體能從吐出口 均勻流出。 M430321 此外，由於出口面112e位在内邊緣E2交接處的角度 A1小於180度，且各面導流面118d從第二平面118b延伸 至其中一條内邊緣E2,因此外邊緣m與這些内邊緣£2之 •間的距離會由外向内遞增，以至於在液刀100運作期間， 這些導流面118d會驅使液體朝向排液通道116流動，以利 於液刀1〇〇内的異物從排液通道116或排出貫孔132排出。 圖4是本創作另一實施例之液刀的剖面示意圖。讀參 閱圖4’本實施例的液刀200與圖2A所示的液刀1〇〇相似， • 例如液刀200也包括分隔件丨2〇及蓋板130。惟液刀1〇〇、 200二者之間的差異在於：液刀200所包括的槽體21〇,其 飽和槽R22的構造與飽和槽R12的構造有所不同。 詳細而言，槽體210具有一出口面U2e、一第一平面 118a、一第二平面118b、一斜面118C與一對導流面218d。 出口面112e、第〆平面118a、第二平面118b、斜面n8c 及導流面2l8d之間的相對位置與連接關係皆相同於前述 φ實施例（請參考圖2A)。然而，在本實施例中，導流面218d - 卻是平面’而非如同導流面118d —樣為弧面。也就是說， 導流面218d為從第二平面118b延伸至出口面η2e内邊緣 E2的斜面，如圖4所示。 綜上所述，利用上述排液通道與排出貫孔，本創作的 液刀能在不被拆卸的情況下排出異物，以使工作人員方便 維修液刀。此外，在本創作液刀的運作過程中，排液通道 可以保持開啟而不封閉’以隨時排出異物。如此，可以減 17 M430321 少發生吐出口遭異物阻塞的機率，並且能減少液刀維修及 拆卸的頻率，以保持或增加機台（例如顯影機、清洗設備 或溼式蝕刻機）的工作時間，從而增加生產力。 雖然本創作以前述實施例揭露如上，然其並非用以限 定本創作，任何熟習相像技藝者，在不脫離本創作之精神 和範圍内，所作更動與潤飾之等效替換，仍為本創作之專 利保護範圍内。 【圖式簡單說明】 圖1 A是本創作一實施例之液刀的立體示意圖。 圖1B是圖1A中的液刀的分解示意圖。 圖2A是圖1A中沿線A_A剖面所繪示的剖面示意圖 圖2B是圖1A中沿線B_B剖面所繪示的剖面示意圖 圖3A是圖1A中的槽體與分隔件的立體示意圖。 圖3B疋圖3a的局部放大示意圖。 圖4是本創作£ 下另一實施例之液刀的剖面示意圖。 M430321 【主要元件符號說明】 100 、 200 液刀 110 、 210 槽體 112c 結合面 112e 出口面 112t 外平面 114 注入口 116 排液通道 116a 第一端口 116b 第二端口 116r、132r 孔徑 118a 第一平面 118b 第二平面 118c 斜面 118d、218d 導流面 120 分隔件 130 蓋板 132 排出貫孔 140 螺絲 150 阻擋件 160 擋塊 A1 角度 D1 間距 20 M430321Developers will pass directly from these populations 114 into the buffer tank RU. Then, the developer flows into the saturation tank R12 from the buffer tank R11 through the slit G1. The partitioning member 120 is capable of resisting the developer to slow the flow rate of the developer, so that the buffering groove RU can buffer the force of the developer to be rushed to lower the flow rate of the developer through the slit G1. The above-mentioned saturated tank R12 can temporarily converge the #developer from the slit (1) to stabilize the flow of the developer in the saturated tank R12. Thus, the "saturated tank R12" allows the developer to stably flow into the discharge port (7). It can be seen that 'with the buffer tank R11 and the saturated tank R12, the liquid knife 1〇〇 can uniformly discharge the developer from the liquid knife 1〇〇 to reduce the adverse effect of the flow rate of the developer in the injection port 114 on the liquid curtain. . In addition, the β cover plate 130 is made of a hard material, for example, made of metal (such as steel) or shouting, the cover plate i3G may have a thick thickness T1 (as shown in item 2A), It can be between 16 faces and 16 5 M430321 mm. Thus, during the operation of the liquid knife 100, the deformation of the cover plate 130 can be reduced to maintain the spacing D1 of the discharge port G2, so that the liquid curtain does not generate ripples and does not cause branching. It should be noted that since the liquid knife 100 can also be applied to a cleaning device or a wet etching machine, the injection port 114 can be used not only for the injection of the developer, but also the injection port 114 can also be used for cleaning liquid, deionized water (DI). Water ) or etchant is injected. Therefore, this creation does not limit that only the developer can be injected into these injection ports 114. • Fig. 2B is a schematic cross-sectional view taken along line B_B of Fig. 1A. Referring to FIG. 1A, FIG. 1B and FIG. 2B, in the embodiment, the cover plate 130 may have at least two discharge through holes 132, and the discharge through holes 132 communicate with the saturation groove R12, thereby saturating the liquid in the groove R12 ( For example, a developer, a cleaning solution, deionized water or an etchant may flow out from the discharge through hole 132. The function of discharging the through holes 132 is mainly to discharge foreign matter in the liquid knife 100. When foreign matter is present in the liquid knife 100, foreign matter can be discharged from the discharge through hole 132 along with the φ liquid. In addition, the discharge through holes 132 may be respectively located at opposite ends of the cover plate 130 as shown in Fig. 1B. The aperture 132r of the discharge through-hole 132 (as shown in FIG. 2B) is greater than 100 microns, and the aperture 132r can be between 2.9 mm and 3.1 mm, for example the aperture 132r can be approximately 3 mm. Therefore, the discharge through hole 132 can discharge foreign matter having a particle diameter larger than 100 μm. However, the liquid knife 100 may further include at least two blocking members 150 disposed in the discharge through holes 132 to close the discharge through holes 132 so that the liquid in the liquid knife 100 does not escape from the through holes. 132 12 M4JU321 ^Out. The blocking member 150 can be a manual valve joint having an outer diameter of 5 mm which is 3 mm' and these blocking members 15 can be locked in the discharge holes 132, respectively. A manual valve joint with an outer diameter of 5 mm can be used to connect a connector (not shown), and then the adapter is connected to a 3 mm outer diameter water conduit. Ϊ́μμ & , β. In addition, it must be emphasized that the present invention does not limit the stopper 150 to only a manual valve joint. Since the aperture 132r of the discharge hole 132 can be between 2.9 mm and 3.1 mm, or even about 3 coffee, the discharge hole 132 must be closed by the blocking member 15 when the liquid cutting operation is performed to avoid the groove R1〇. The overall flow of the liquid inside is affected 'preventing the spout G2 from flowing out of the liquid evenly. Although the liquid knife 100 is to be inspected or abnormally operated, the worker can take out the blocking member 150 from the discharge through hole 132 to allow the foreign matter to be discharged from the discharge through hole 132. Therefore, even if the cover 13 and the groove n are not disassembled, the worker can remove the foreign matter in the liquid knife 100. In this way, it is convenient for the worker to repair the liquid knife 1 〇〇 to shorten the time for repairing the liquid knife. Fig. 3A is a perspective view of the trough body and the partition member of Fig. 1A, and Fig. 3B is a partially enlarged schematic view of Fig. 3A. Referring to FIG. 1B, FIG. 3A and FIG. 3B, the trough body 110 further has at least two drainage channels 116. These drain passages 116 are located on opposite sides of the outlet face 11e, so the outlet face 112e is located between these drain passages 116. These drain passages 116 communicate with the saturation tank R12, so that the liquid in the liquid knife 1〇0 can flow out from the drain passage 116. 13 ΟπΓΓ) In the embodiment, the drain passages 116 may be a plurality of trenches C′ and are completely exposed on the outer surface of the tank body 110, wherein each of the drains (ie, the drain passage U6) may be exposed on the outlet face 112e and combined The gate of the face 112c, 曰1' is shown in Fig. 1B, Fig. 3A and Fig. 3B. However, in other embodiments, the channel 116 may be a through hole in the cavity 11〇, so that the drainage channel 116 shown in FIG. 1B and the circle and FIG. 3B is merely an example. 'Not limited to this creation. The sputum channel 116 has a first port 116a and a second port 110b. The 、, ® mouth 112e has an outer edge E1, wherein the outer edge E1 is opposite the saturation slot 1112. These first ends 116a are exposed in the saturation tank R12, while the second ports 116b are located next to the outer edge E1. Further, it can be seen from Fig. 1B that the discharge through holes 132 are located beside the first ports U6a, respectively. 3A' the distance L1 between the first ports 116a is smaller than the distance L2 between the second ports 11bb, and the distance between the drain channels 116 is from these first ports n6a toward these second ports. Therefore, the direction of the drain passage 116 is not perpendicular to the horizontal line. Further, the aperture of each of the second ports U6b is smaller than the aperture 132r of each of the discharge through holes 132 (refer to Fig. 2B), and the aperture is approximately 100 micrometers (refer to Fig. 3B). The function of the drain passage 116 is mainly to discharge the foreign matter in the hydraulic force 100, and the drain passage 116 can discharge small-sized foreign matter having a particle diameter of 1 μm or less. In general, the foreign matter commonly found in conventional liquid knives is usually around 100 micro M430321. * * » meters below. Therefore, in the actual case, most of the foreign matter in the liquid knife 100 is a small-sized foreign matter of 100 μm or less. When such a small-sized foreign matter is stored in the liquid knife 100, the foreign matter can be discharged from the liquid discharge passage 116 with the liquid to prevent the discharge port G2 from being blocked by the foreign matter. Since the aperture 116r can be 100 micrometers, even if the liquid discharge channel 116 is not closed during the operation of the liquid knife 100, the overall flow of the liquid in the groove R10 is not affected, and the whole flow does not interfere with the discharge from the discharge port G2. The flow of liquid. In addition, since the distance L1 is smaller than the distance L2, and the distance between the liquid discharge passages 116 is gradually increased from the first port 116a toward the second port 116b, when the liquid knife 100 operates, the liquid discharge passage 116 discharges the foreign matter outward. Let the discharged foreign matter fall as far as possible on the substrate directly below the liquid knife 100. Thus, it is possible to prevent the discharged foreign matter from affecting the quality of the substrate. Referring again to Figures 1B, 3A and 3B, the exit face 112e has a pair of inner edges E2^ and the inner edges E2 are located at opposite sides of the outer edge E1 and are connected to each other. These inner edges E2 are not connected in a straight line, and - is connected to a convex curve. These inner edges E2 are adjacent to the saturation groove R12. The angle A1 at which the exit face 112e and the flow guiding surface 118d meet at the inner edge E2 is less than 180 degrees as shown in Fig. 2A. Further, the profile of the flow guiding surface 118d may have a curve having a radius F of 3 mm. Referring to FIG. 2A, FIG. 3A and FIG. 3B, the liquid knife 100 may further include a plurality of stoppers 160, and the stoppers 160 are fixed in the buffer groove R11, and a buffer chamber R112 is disposed between the adjacent two stoppers 160. In detail, these stops 15 M430321 • · • / * » 160 can be connected to the divider! 2〇, and there is no contact with each other, so there will be a space between the adjacent two struts 160, and the interval is the buffer chamber Rip. Further, these injection ports 114 communicate with the buffer chambers RU2, respectively, so that the liquid from the injection port 114 enters the buffer chamber R11. Referring to FIG. 2A, FIG. 2B, FIG. 3A and FIG. 3B, the trough body 11A may further have a --plane 114a, a second plane (10), a bevel leg and a pair of flow guiding surfaces 118d, and the first plane 118a, The second plane u8b, the slope 118c, and the flow guiding surfaces 118d are all located in the saturation tank Ri2. In addition, as seen from FIG. 2A and FIG. 2B, the first plane 118a and the second plane ii8b are both planes perpendicular to the horizontal plane. The first plane 118a is coupled between the divider 120 and the ramp U8c, and the ramp 118c extends from the first plane 118a toward the exit face U2e. The second plane 118b abuts the ramp 118c, and the flow planes U8d are connected to each other and abut the second plane 118b, wherein the flow planes U8d are located between the exit face 112e and the second plane 118b. Φ The surface guide faces H8d may be a concave curved surface and extend from the second plane 118b to one of the inner edges. Since the angle a 1 of the exit face n2e at the inner edge of the inner edge E2 is less than 1 degree, an angle is formed between the guide faces 118d. The first plane 118a, the second plane 118b, the slope U8c and the flow guiding surface 5(5) in the saturated tank R12 can form a flow guiding structure, and the guiding structure can help the liquid in the saturated tank R12. It can flow out evenly from the spout. M430321 Furthermore, since the angle A1 of the exit face 112e at the intersection of the inner edge E2 is less than 180 degrees, and the face guide faces 118d extend from the second plane 118b to one of the inner edges E2, the outer edge m and the inner edges are The distance between the two will increase from the outside to the inside, so that during the operation of the liquid knife 100, the flow guiding surfaces 118d will drive the liquid to flow toward the liquid discharging passage 116, so as to facilitate the foreign matter in the liquid knife 1 from the liquid discharging passage. 116 or the discharge through hole 132 is discharged. Figure 4 is a cross-sectional view showing a liquid knife of another embodiment of the present invention. Referring to Fig. 4', the liquid knife 200 of the present embodiment is similar to the liquid knife 1A shown in Fig. 2A. • For example, the liquid knife 200 also includes a partition member 丨2〇 and a cover plate 130. However, the difference between the liquid knives 1 and 200 is that the groove 21 of the liquid knife 200 has a configuration in which the configuration of the saturated groove R22 is different from that of the saturated groove R12. In detail, the tank body 210 has an outlet surface U2e, a first plane 118a, a second plane 118b, a slope 118C and a pair of flow guiding surfaces 218d. The relative position and connection relationship between the exit surface 112e, the second plane 118a, the second plane 118b, the slope n8c, and the deflector surface 21d are the same as those of the aforementioned φ embodiment (please refer to Fig. 2A). However, in the present embodiment, the flow guiding surface 218d- is a flat surface instead of the curved surface as the flow guiding surface 118d. That is, the flow guiding surface 218d is a slope extending from the second plane 118b to the inner edge E2 of the outlet surface η2e as shown in FIG. In summary, by using the above-mentioned liquid discharge passage and the discharge through hole, the liquid knife of the present invention can discharge foreign matter without being disassembled, so that the worker can conveniently repair the liquid knife. In addition, during the operation of the present liquid lance, the drain passage can be kept open without being closed to discharge foreign matter at any time. In this way, the loss of 17 M430321 can be reduced, and the frequency of liquid knife repair and disassembly can be reduced to maintain or increase the working time of the machine (such as developing machine, cleaning device or wet etching machine). Thereby increasing productivity. Although the present invention is disclosed above in the foregoing embodiments, it is not intended to limit the present invention. Any skilled person skilled in the art, without departing from the spirit and scope of the present invention, is equivalent to the replacement of the modifiers and retouchings. Within the scope of patent protection. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1A is a perspective view of a liquid knife according to an embodiment of the present invention. Fig. 1B is an exploded perspective view of the liquid knife of Fig. 1A. 2A is a schematic cross-sectional view taken along line A_A of FIG. 1A. FIG. 2B is a schematic cross-sectional view taken along line B_B of FIG. 1A. FIG. 3A is a perspective view of the groove body and the spacer of FIG. 1A. Fig. 3B is a partially enlarged schematic view of Fig. 3a. Fig. 4 is a schematic cross-sectional view showing a liquid knife of another embodiment of the present invention. M430321 [Main component symbol description] 100, 200 liquid knife 110, 210 tank 112c joint surface 112e outlet surface 112t outer plane 114 injection inlet 116 drain passage 116a first port 116b second port 116r, 132r aperture 118a first plane 118b Second plane 118c inclined surface 118d, 218d flow guiding surface 120 partition 130 cover 132 discharge through hole 140 screw 150 blocking member 160 stopper A1 angle D1 spacing 20 M430321
El 外邊緣 E2 内邊緣 G1 縫隙 G2 吐出口 HI、H3 孔洞 LI、L2 距離 01 槽口 R 導圓角半徑 RIO 凹槽 Rll 緩衝槽 R12 ' R22 飽和槽 R112 緩衝室 T1 厚度El outer edge E2 inner edge G1 slit G2 spout HI, H3 hole LI, L2 distance 01 slot R round corner radius RIO groove Rll buffer groove R12 ' R22 saturated tank R112 buffer chamber T1 thickness
21twenty one