M382582 五、新型說明： 【新型所屬之技術領域】 本創作係涉及透光基板之標示結構，尤指一種可應用 於觸控面板或平面顯示器等相關產品中之標示結構。 【先前技術】 - 按，平面顯示器（FPD)種類包括場發射顯示器（FED)、 . 液晶顯示器（TFT-LCD)、電漿顯示器（PDP)、有機發光二極 • 體顯示器（OLED)、液晶投影式顯示器等等，輕、薄是該等 平面顯示器的共同特點，依照各該平面顯示器之不同特 質，有些可應用於小尺寸面板如手機；有些則可應用於中、 大型尺寸如電腦螢幕、電視螢幕；或應用於超大型尺寸如 室外數位式看板。上述平板顯示器係藉由對由玻璃等物質 所構成之透光基板進行加工所製成，而進行不同加工製程 時常需要對該透光基板表面進行標示圖案之設置，例如可 方便進行對位等作用，如何要於該透光基板上形成有標示 結構又不影響該透光率或後續製程，是現今廠商急欲解決 - 之問題。 【新型内容】 有鑑於此，本創作之主要目的係在於解決上述之缺 失，本創作係為一種可應用於觸控面板或平面顯示器等相 關產品中之標示結構。 為達上述目的，本創作之透光基板其中一表面上係設 有一感光光阻層，該感光光阻層係形成有圖案化顏色區 3 M382582 域，藉由該圖案化顏色區域可供辨識，可達到標示作用， :可更進-步應用於觸控面板或平面顯示器等相關產品 ，而不會影響其透光率亦可具有顏色職之功用。 【實施方式】 為驗；f審查委員清楚本創作之結構組成，以及整 體運作方式，茲配合圖式說明如下： 本創作透光基板之標示結構」，如第一圖（A)所示， 該透光基板1(可以為玻璃基板）其中一第一表面u上係 盍設有-感光光阻層2，該感光光阻層2中含有樹脂【可 以為㈣樹脂（N(m)lak，_laG resin)或環氧樹脂 Epoxy resin)】、感光化合物【可以為重氮萘醌碏酸醋 (Diazonaphthoquinone sulfonate ester Derivatives) 何生化合物】、界面活性劑、溶劑以及染料【可以為二#其 二烷系衍生化合物（DiarylmethaneDerivative幻、或=二 ，土甲烷系何生化合物（Triarylme让紙M382582 V. New description: [New technical field] This creation relates to the marking structure of transparent substrate, especially a marking structure that can be applied to related products such as touch panel or flat panel display. [Prior Art] - Press, flat panel display (FPD) types include field emission display (FED), liquid crystal display (TFT-LCD), plasma display (PDP), organic light emitting diode (OLED), liquid crystal display, liquid crystal projection Lightweight and thin are the common features of these flat-panel displays. According to the different characteristics of each flat-panel display, some can be applied to small-sized panels such as mobile phones; some can be applied to medium and large sizes such as computer screens and televisions. Screen; or for very large sizes such as outdoor digital signage. The flat panel display is made by processing a light-transmitting substrate made of a material such as glass, and it is often necessary to perform a marking pattern on the surface of the transparent substrate during different processing processes, for example, it is convenient to perform alignment. How to form the marking structure on the transparent substrate without affecting the light transmittance or the subsequent process is a problem that manufacturers are eager to solve. [New content] In view of this, the main purpose of this creation is to solve the above-mentioned defects. This creation is a labeling structure that can be applied to related products such as touch panels or flat panel displays. In order to achieve the above object, a photosensitive resist layer is formed on one surface of the transparent substrate of the present invention, and the photosensitive photoresist layer is formed with a patterned color region 3 M382582 region, and the patterned color region is available for identification. It can achieve the marking function: It can be further applied to related products such as touch panel or flat panel display without affecting its light transmittance and also having the function of color. [Embodiment] For the examination; the review committee clearly understands the structure of the creation, and the overall operation mode, as explained in the following diagram: The marking structure of the transparent substrate is as shown in the first figure (A), The light-transmitting substrate 1 (which may be a glass substrate) is provided with a photosensitive photoresist layer 2 on the first surface u, and the photosensitive photoresist layer 2 contains a resin [may be (4) resin (N(m)lak, _laG Epoxy resin), sensitizing compound [may be Diazonaphthoquinone sulfonate ester Derivatives], surfactant, solvent and dye [can be diazide derived Compound (Diarylmethane Derivative, or = 2, methane-based compound (Triarylme paper)
Derivatives)】’而該感光光阻層2之厚度可 該感光光阻層2係形成有圖案化齡區域21，該圖案= 色區域21與感光光阻層2之其他未曝光區域22間係 顏色之辨識性，藉由該圖案化顏色區域21可具有標示^作 用；其中當其中一表面11完成後，可以翻面於相= 一第 二表面12再進行以上重複的步驟，可於第二表面12上嗖 有一感光光阻層2,如第一圖（B)所示，該感光光阻層2 ^ 形成有圖案化顏色區域21，即可完成雙面製程標示^構'。、 如第二圖所示，係為本創作用於製造標示結構之製造 裝置，其至少包含有： M382582 用以幹31 ’該輸送平台31上放置有透光基板1， 用以輪送该透光基板1進行不同加工區域； 狹縫32可以為旋轉塗佈方式、 置於透光基板將感光光阻層2塗佈設 什表 請同時參閱第三圖所示， 使该透先基㈣表面11上覆蓋有感絲阻層2 ; 美板T = t 33，設置於塗佈組件32 *，用以將透光 二進仃（烤’使該感光光阻層2得以固定於該透光基 =上’其中該烘烤時間為卜5分鐘（以2分鐘為佳），供 烤/皿度為90〜140°C (以11〇。〇為佳）； 二曝光組件34，設置於烘烤組件33後，該曝光組件 34係提供化鮮35㈣縣基板丨上進行曝光（可 1用於500⑽以下之曝光波長製程）’請同時參閲第四圖 斤不’邊感光光阻層2經過圖案化光罩35之曝光後，而形 成與該光罩35相對應之圖案化顏色區域21，則完成標^ 結構。Derivatives]] and the thickness of the photosensitive resist layer 2 may be formed by the photosensitive photoresist layer 2 with a patterning age region 21, which is a color between the color region 21 and the other unexposed regions 22 of the photosensitive photoresist layer 2. The identification can be performed by the patterned color region 21; wherein when one of the surfaces 11 is completed, the surface can be turned over to the second surface 12 and the above repeated steps can be performed on the second surface. There is a photosensitive photoresist layer 2 on the upper surface of the substrate 12. As shown in the first figure (B), the photosensitive photoresist layer 2^ is formed with a patterned color region 21, so that the double-sided process marking structure can be completed. As shown in the second figure, it is a manufacturing device for creating a marking structure, which at least includes: M382582 for drying 31'. The conveying platform 31 is provided with a transparent substrate 1 for transmitting the through-transparent The light substrate 1 is subjected to different processing regions; the slit 32 may be a spin coating method, and the photosensitive photoresist layer 2 is disposed on the light-transmitting substrate. Please also refer to the third figure to make the surface of the transparent substrate. 11 is covered with a photosensitive layer 2; the US plate T = t 33, is disposed on the coating assembly 32*, for dimming the light-transmissive (bake) to fix the photosensitive resist layer 2 to the transparent substrate =上' where the baking time is 5 minutes (2 minutes is preferred), for baking / dish degree is 90~140 ° C (11 〇. 〇 is preferred); 2 exposure assembly 34, set for baking After the component 33, the exposure component 34 is provided on the substrate of the 35th (four) county for exposure (1 can be used for the exposure wavelength process of 500 (10) or less) 'Please also refer to the fourth figure, the photosensitive photoresist layer 2 is patterned. After the exposure of the mask 35, the patterned color region 21 corresponding to the mask 35 is formed, and the label is completed. Structure.
而本創作之標示結構應用於觸控面板或平面顯示哭等The marking structure of the creation is applied to a touch panel or a flat display crying, etc.
相關產品巾’而不會影㈣透光㈣可具有顏色辨:功 用。 J 如上所述，本創作提供透光基板一種較佳可行之標示 結構，爰依法提呈新型專利之申請；惟，以上之實施說明 及圖式所示，係本創作較佳實施例者，並非以此侷限本創 作，是以，舉凡與本創作之構造、裝置 '特徵等近似或相 雷同者，均應屬本創作之創設目的及申請專利範圍之内。 【圖式簡單說明】 第-圖（A)、⑻係為Related product towel ' does not shadow (4) light transmission (4) can have color discrimination: function. J As mentioned above, the present invention provides a preferred and feasible marking structure for a light-transmitting substrate, and an application for a new patent is filed according to law; however, the above embodiments and drawings show that the preferred embodiment of the present invention is not This limitation of the creation is that the similarity or similarity with the structure and device 's characteristics of the creation should be within the creation purpose and patent application scope of the creation. [Simple description of the diagram] The first figure (A), (8) is
f Μ ., 作中標示結構I結椹A 弟一圖係為本創作φ拇1立體圖 结一 中示不結構之製造裝置結構示咅岡 之結構示意 二圖係為本創作中4光基板s置感光光阻層〜θ 圖。 第四圖係為本創作中透光基板進行曝光之結構示意圖 【主要元件符號說明】 透光基板1 弟—表面11 第二表面12 感光光阻層2 圖案化顏色區域21 未曝光區域22 輸送平台31 塗佈組件3 2 烘烤組件33 曝光組件34 光罩35f Μ ., in the middle of the structure I knot 椹 A brother is a picture of the creation of the φ thumb 1 stereoscopic diagram, the structure of the manufacturing device, the structure of the 咅 之 示意 二 二 二 二 二 二 二 二 二Place the photosensitive photoresist layer ~θ diagram. The fourth figure is a schematic structural view of the light-transmissive substrate exposed in the present invention. [Main component symbol description] Transmissive substrate 1 - surface 11 second surface 12 photosensitive photoresist layer 2 patterned color region 21 unexposed region 22 transport platform 31 Coating assembly 3 2 Baking assembly 33 Exposure assembly 34 Photomask 35