WO2018228098A1

WO2018228098A1 - Surface covering touch screen, manufacturing method therefor, and display device

Info

Publication number: WO2018228098A1
Application number: PCT/CN2018/086383
Authority: WO
Inventors: 刘典新; 马晓峰; 祝培涛
Original assignee: 京东方科技集团股份有限公司; 重庆京东方光电科技有限公司
Priority date: 2017-06-14
Filing date: 2018-05-10
Publication date: 2018-12-20
Also published as: CN107272950A

Abstract

Disclosed are a surface covering touch screen, a manufacturing method therefor, and a display device. The manufacturing method comprises: forming, on a base substrate, a pattern of a touch electrode layer; before or after the pattern of the touch electrode layer is formed, using a mask plate forming the touch electrode layer to form, in a region other than the pattern of the touch electrode layer on the base substrate, a pattern of a protective layer. The manufacturing method provided in the embodiments of the present invention forms, in the region other than the pattern of the touch electrode layer on the base substrate, the pattern of the protective layer by means of the mask plate forming the touch electrode layer, thereby decreasing segment errors caused by a touch electrode without increasing the cost of the mask plate, furthermore, a certain attraction exists between the protective layer and the touch electrode and base substrate, increasing the attraction between the touch electrode and the base substrate, thereby being able to prevent the touch electrode from falling, and also solving the problem that the touch electrode is easily scratched or particles are left during the technological processes such as cleaning, cutting and pressure testing.

Description

Cover surface touch screen, manufacturing method thereof and display device

This application claims priority to Chinese Patent Application No. 201010447737.1, entitled "A Cover Surface Touch Screen, Its Manufacturing Method and Display Device", filed on June 14, 2017, the entire contents of which are hereby incorporated by reference. The manner of introduction is incorporated into the present application.

Technical field

The present invention relates to the field of touch display technologies, and more particularly to a cover surface touch screen, a method for fabricating the same, and a display device.

Background technique

In the field of liquid crystal displays, the On Cell touch screen is organically combined by the touch module and the display panel, and the touch sensitivity, impact resistance and drop resistance are relatively high, and the touch screen has no smear and The advantages of jitter and so on have become the main competitors of today's touch displays.

At present, the On Cell Touch mode is mainly used to form a touch film made of indium tin oxide (ITO) on a color film substrate after the array substrate and the color film substrate are formed into a box. 1a is a cross-sectional view of a cover-type touch screen, and FIG. 1b is a top view of a cover-type touch screen. In actual production, a touch electrode 102 (Touch Electrode) formed on the color filter substrate 101 is exposed outside the color filter substrate 101. As shown in FIG. 1a, a large step is formed after the touch electrodes 102 are formed. As can be seen from FIG. 1b, the color filter substrate 101 can be directly seen at the gap of each touch electrode 102. Due to the large step difference and the limited adhesion between the touch electrode and the color filter substrate, the touch electrode is easily scratched or peeled off in subsequent processes such as cleaning, cutting, and pressure testing (Grinder). Lead to poor display, affect product yield, and increase costs.

Therefore, how to prevent the touch electrode covering the surface touch panel from being easily scratched or peeled off is a technical problem that needs to be solved urgently.

Summary of the invention

The embodiment of the invention provides a cover-type touch screen, a manufacturing method thereof and a display device, which are used to solve the problem that the touch electrode covering the surface touch screen in the prior art is prone to scratching or falling off.

Embodiments of the present invention provide a method for fabricating a cover type touch screen, including:

Forming a pattern of the touch electrode layer on the base substrate;

Before or after forming the pattern of the touch electrode layer, a mask layer forming the touch electrode layer is used to form a protective layer on a region other than the pattern of the touch electrode layer on the base substrate. Graphics.

In a possible implementation manner, in the method for fabricating the touch surface type touch panel provided by the embodiment of the present invention, the forming a pattern of the touch electrode layer on the base substrate includes:

Forming a touch electrode layer on the base substrate, and forming a first photoresist layer on the touch electrode layer;

Photolithography is performed on the first photoresist layer using a mask to obtain a pattern of the first photoresist layer;

After the touch electrode layer is processed by an etching process, the pattern of the first photoresist layer is removed to obtain a pattern of the touch electrode layer.

In a possible implementation manner, in the manufacturing method of the above-mentioned cover surface type touch screen provided by the embodiment of the present invention, the mask formed by the touch electrode layer is used, and the touch is performed on the base substrate. A region other than the pattern of the control electrode layer forms a pattern of the protective layer, including:

Forming an insulating layer on the base substrate, and forming a second photoresist layer on the insulating layer opposite to the photosensitive property of the first photoresist layer;

Performing photolithography on the second photoresist layer by using the mask to obtain a pattern of the second photoresist layer;

After the insulating layer is processed by an etching process, the pattern of the second photoresist layer is removed, and the obtained pattern of the insulating layer is used as a pattern of the protective layer.

Forming a second photoresist layer opposite to the photosensitive property of the first photoresist layer on the base substrate;

The second photoresist layer is photolithographically patterned using the mask, and the obtained pattern of the second photoresist layer is used as a pattern of the protective layer.

In a possible implementation manner, in the method for fabricating the overlay surface touch panel provided by the embodiment of the present invention, when the pattern of the mask is consistent with the pattern of the touch electrode layer, the first photolithography The adhesive layer uses a positive photoresist;

When the pattern of the mask is complementary to the pattern of the touch electrode layer, the first photoresist layer is made of a negative photoresist.

The embodiment of the invention further provides a cover-surface touch screen, comprising: a base substrate, a touch electrode layer on the base substrate, and a graphic on the touch electrode layer on the base substrate The protective layer of the outer area.

In a possible implementation manner, in the above-mentioned cover surface type touch screen provided by the embodiment of the invention, the protective layer is composed of a transparent material.

In a possible implementation manner, in the above-mentioned cover surface type touch screen provided by the embodiment of the invention, the protective layer is composed of a polydimethylsiloxane material.

In a possible implementation manner, in the above-mentioned cover surface type touch screen provided by the embodiment of the present invention, the thickness of the protective layer is less than or equal to the thickness of the touch electrode layer.

The embodiment of the invention further provides a display device comprising: the above-mentioned cover surface type touch screen.

The beneficial effects of the present invention are as follows:

The cover surface touch screen provided by the embodiment of the invention, the manufacturing method thereof and the display device, the method for manufacturing the cover surface touch screen comprises: forming a pattern of the touch electrode layer on the base substrate; before forming the pattern of the touch electrode layer Or afterwards, a mask of the touch electrode layer is formed, and a pattern of the protective layer is formed on a region other than the pattern of the touch electrode layer on the base substrate. The method for fabricating a cover-type touch screen provided by the embodiment of the present invention forms a pattern of a protective layer on a substrate other than a pattern of a touch electrode layer on the base substrate by using a mask formed with a touch electrode layer, without increasing On the basis of the cost of the reticle, the step difference caused by the touch electrode is reduced, and the protective layer has a certain viscosity between the touch electrode and the substrate, which increases the viscosity between the touch electrode and the substrate. It can prevent the touch electrode from falling off, and also improves the problem that the touch electrode is easily scratched or remains in the process of cleaning, cutting and stress testing.

DRAWINGS

1a and 1b are respectively a cross-sectional view and a top view of a cover surface type touch screen in the prior art;

2 is a flowchart of a method for fabricating a cover surface touch screen according to an embodiment of the present invention;

3a and 3b are respectively a cross-sectional view and a top view of a cover surface type touch screen provided by an embodiment of the present invention;

4a is a flowchart of a method for fabricating a pattern for forming a touch electrode layer according to an embodiment of the present invention;

4b and 4c are respectively a flowchart of a method for fabricating a pattern for forming a protective layer in an embodiment of the present invention;

5a to 5f are respectively schematic structural views of a preparation method according to some embodiments of the present invention;

5d' and 5e' are schematic structural views of a preparation method according to the second embodiment;

6a-6e are schematic structural views of a preparation method according to another embodiment of the present invention;

6a' to 6e' are schematic structural views respectively showing a preparation method according to another embodiment of the present invention.

Wherein, 101, color film substrate; 102, touch electrode; 301, substrate; 302, touch electrode layer; 303, protective layer; 304, first photoresist layer; 305, mask; 306, insulating layer ; 307, a second photoresist layer.

detailed description

The present invention provides a cover-surface touch screen, a manufacturing method thereof, and a display device, in view of the problem that the touch electrodes of the surface touch panel are easily scratched or peeled off.

The specific embodiments of the cover surface touch screen, the manufacturing method thereof and the display device provided by the embodiments of the present invention are described in detail below with reference to the accompanying drawings. The thickness and shape of each film layer in the drawings do not reflect the true scale, and are merely intended to illustrate the present invention.

Embodiments of the present invention provide a method for fabricating a cover type touch screen, as shown in FIG. 2, including:

S201, forming a pattern of the touch electrode layer on the base substrate;

S202, before or after forming the pattern of the touch electrode layer, using a mask formed by the touch electrode layer, forming a pattern of the protective layer on a region other than the pattern of the touch electrode layer on the base substrate.

The method for fabricating a cover-type touch screen provided by the embodiment of the present invention forms a pattern of a protective layer on a substrate other than a pattern of a touch electrode layer on the base substrate by using a mask formed with a touch electrode layer, without increasing On the basis of the cost of the reticle, the step difference caused by the touch electrode is reduced, and the protective layer has a certain viscosity between the touch electrode and the substrate, which increases the viscosity between the touch electrode and the substrate. It can prevent the touch electrode from falling off, and also improves the problem that the touch electrode is easily scratched or remains in the process of cleaning, cutting and stress testing.

In the above step S201, the pattern of the touch electrode layer is formed on the base substrate. Since the touch electrode layer covering the surface touch screen is generally formed on the color filter substrate behind the box, the base substrate may be referred to as a color film. The substrate and the touch electrode layer are formed on a side of the color filter substrate facing away from the array substrate.

In the above step S202, a pattern of the protective layer is formed by using a mask formed by the touch electrode layer, that is, the touch electrode layer and the protective layer can be formed by using the same mask, and different masks are used compared with the two, thereby saving The cost of making a reticle. As shown in FIG. 3a and FIG. 3b, a pattern other than the pattern of the touch electrode layer 302 on the base substrate 301 forms a pattern of the protective layer 303, and the obtained pattern of the protective layer 303 is substantially complementary to the pattern of the touch electrode layer 302. It can also be understood that the pattern of the protective layer 303 is embedded in the gap of each touch electrode. As is apparent from FIG. 3a, since the protective layer 303 is formed at the gap of each touch electrode, the touch electrode is greatly reduced. The difference between the layer 302 and the substrate 301. In FIG. 3b, the substrate 301 cannot be directly seen at the gap of each touch electrode. It can be clearly seen that the gap between the touch electrodes is the protective layer 303. Graphics. In addition, since the protective layer 303 has a certain viscosity with the touch electrode and the base substrate 301, the adhesion between the touch electrode layer 302 and the base substrate 301 is improved, and the touch electrode can be prevented from falling off and improved. In the processes of cleaning, cutting, and pressure testing, the touch electrodes are easily scratched or residual particles.

In the above step S202, the pattern of the protective layer may be formed, and before the pattern of the touch electrode layer is formed, after the pattern of the touch electrode layer is formed, the order of making the protective layer and the touch electrode layer is not limited herein. The method for fabricating the cover surface type touch screen provided by the embodiment of the present invention will be described in detail below with reference to the accompanying drawings.

In a first aspect, after the pattern of the touch electrode layer is formed, a pattern of the protective layer is formed;

In a specific implementation, in the foregoing manufacturing method provided by the embodiment of the present invention, as shown in FIG. 4a, the foregoing step S201 may include:

S201a, forming a touch electrode layer 302 on the base substrate 301, and forming a first photoresist layer 304 on the touch electrode layer 302, as shown in FIG. 5a;

S201b, using a mask 305 to lithography the first photoresist layer 304 to obtain a pattern of the first photoresist layer 304, as shown in FIG. 5b; in FIG. 5b, the first photoresist layer 304 is positive. The photoresist is taken as an example. In the specific implementation, the first photoresist layer 304 may also be a negative photoresist. When the first photoresist layer 304 is a negative photoresist, the mask 305 is The pattern is substantially complementary to the pattern of the mask 305 shown in FIG. 5b, that is, substantially complementary to the pattern of the touch electrode layer 302 to be formed; the photolithography process in the embodiment of the present invention may include processes such as exposure and development;

S201c, after the touch electrode layer 302 is processed by an etching process, the pattern of the first photoresist layer 304 is removed to obtain a pattern of the touch electrode layer 302, as shown in FIG. 5c; A photoresist layer 304 is, for example, dry etched.

In a specific implementation manner, in the above manufacturing method provided by the embodiment of the present invention, in the step S202, a mask layer forming a touch electrode layer is used, and a protective layer is formed on a region other than the pattern of the touch electrode layer on the base substrate. The graphics can include at least the following two implementations:

Implementation 1: As shown in Figure 4b, including:

S202a, forming an insulating layer 306 on the base substrate 301, and forming a second photoresist layer 307 on the insulating layer 306 opposite to the photosensitive property of the first photoresist layer 304, as shown in FIG. 5d. Since the pattern of the protective layer 303 and the pattern of the touch electrode layer 302 are the same mask 305, the second photoresist layer 307 used for the pattern of the protective layer 303 and the pattern for the touch electrode layer 302 are used. The first photoresist layer 304 needs to be opposite in sensitivity, so that the pattern of the protective layer 303 is substantially complementary to the pattern of the touch electrode layer 302. Since the step S202a in the first embodiment is after the pattern of the touch electrode layer 302 is formed, Executing, in step S202a of Embodiment 1, the base substrate 301 may refer to the base substrate 301 on which the pattern of the touch electrode layer 302 is formed;

S202b, using the mask 305 to photolithography the second photoresist layer 307 to obtain a pattern of the second photoresist layer 307, as shown in FIG. 5e; since the first photoresist layer 304 is positive in FIG. 5b The photoresist is taken as an example. In FIG. 5d, the second photoresist layer 307 is exemplified by a negative photoresist. Thus, in FIG. 5e, the obtained second photoresist layer 307 is patterned. The patterns of the mask 305 are complementary;

S202c, after the insulating layer 306 is processed by an etching process, the pattern of the second photoresist layer 307 is removed, and the pattern of the insulating layer 306 is obtained as a pattern of the protective layer 303. As shown in FIG. 5f, the etching process may be used to remove the first layer. The second photoresist layer 307 is, for example, dry etched.

Implementation 2: As shown in Figure 4c, including:

S202a' forms a second photoresist layer 307 opposite to the photosensitive property of the first photoresist layer 304 on the base substrate 301, as shown in FIG. 5d'; and is the same as the above step S202a, since the protective layer 303 is formed. The pattern and the touch electrode layer 302 are patterned using the same mask 305. Therefore, the second photoresist layer 307 used for the pattern of the protective layer 303 and the first photoresist layer used for the pattern of the touch electrode layer 302 are formed. The pattern of the protective layer 303 is substantially complementary to the pattern of the touch electrode layer 302; since the step S202a' in the second embodiment is performed after the pattern of the touch electrode layer 302 is formed, the implementation is performed. In step S202a' of the second method, the base substrate 301 may refer to the base substrate 301 on which the pattern of the touch electrode layer 302 is formed;

S202b' lithography of the second photoresist layer 307 by using the mask 305, and the pattern of the second photoresist layer 307 is obtained as a pattern of the protective layer 303, as shown in FIG. 5e'.

In the above implementation manner 1, the pattern of the obtained insulating layer is used as the pattern of the protective layer, and the material of the insulating layer can be selected according to actual needs, and a polymer organic film which is non-conductive, corrosion-resistant, good in light transmittance, and stable in performance can be selected as the polymer layer. The insulating layer is preferably a transparent material. For example, a material such as polydimethylsiloxane (PDMS) or polycarbonate (PC) may be used. In the second embodiment, the second photoresist is obtained. As a pattern of the protective layer, the pattern of the layer can only be made of a photoresist material as a protective layer, preferably a photoresist material having a high light transmittance. In the second embodiment, although the material selected is limited, the fabrication process is relatively simple.

In a second aspect, a pattern of the protective layer is formed before the pattern of the touch electrode layer is formed;

Implementation 3: as shown in Figure 4b, including:

S202a, forming an insulating layer 306 on the base substrate 301, and forming a second photoresist layer 307 on the insulating layer 306 opposite to the photosensitive property of the first photoresist layer 304, as shown in FIG. 6a. ;

S202b, lithography is performed on the second photoresist layer 307 by using the mask 305 to obtain a pattern of the second photoresist layer 307, as shown in FIG. 6b; and the second photoresist layer 307 is negative in FIG. 6b. The photoresist is exemplified. In the specific implementation, the second photoresist may also be a positive photoresist. When the second photoresist layer 307 is a positive photoresist, the pattern and pattern of the mask 305 are used. The pattern of mask 305 shown in 6b is substantially complementary, i.e., substantially coincident with the pattern of insulating layer 306 to be formed.

S202c, after the insulating layer 306 is processed by an etching process, the pattern of the second photoresist layer 307 is removed, and the pattern of the insulating layer 306 is obtained as a pattern of the protective layer 303, as shown in FIG. 6c.

Implementation 4: as shown in Figure 4c, including:

S202a' forms a second photoresist layer 307 on the base substrate 301 opposite to the photosensitive property of the first photoresist layer 304, as shown in FIG. 6a';

S202b' uses a mask 305 to lithography the second photoresist layer 307, and the pattern of the second photoresist layer 307 is used as a pattern of the protective layer 303, as shown in FIG. 6b'.

In the above implementation manner 3, the pattern of the obtained insulating layer is used as the pattern of the protective layer, and the material of the insulating layer can be selected according to actual needs, and a polymer organic film which is non-conductive, corrosion-resistant, good in light transmittance, and stable in performance can be selected as the polymer layer. The insulating layer is preferably a transparent material, such as a material such as polydimethylsiloxane or polycarbonate. In the fourth embodiment, the pattern of the obtained second photoresist layer is used as a pattern of the protective layer, and only light can be used. As the protective layer, the engraved material is preferably a photoresist material having a high light transmittance. In the fourth embodiment, although the selected material is limited, the manufacturing process is relatively simple.

In a specific implementation, in the above manufacturing method provided by the embodiment of the present invention, after the pattern of the protective layer is formed by using the third embodiment or the fourth embodiment, the pattern of the touch electrode layer is formed in the following manner, as shown in FIG. 4a. The above step S201 may include:

S201a, forming a touch electrode layer 302 on the base substrate 301, and forming a first photoresist layer 304 on the touch electrode layer 302, as shown in FIG. 6d and FIG. 6c'; step S201a in this embodiment Is performed after forming the pattern of the protective layer 303, therefore, the base substrate 301 herein may refer to the base substrate 301 formed with the protective layer 303;

S201b, using a mask 305 to lithography the first photoresist layer 304 to obtain a pattern of the first photoresist layer 304, as shown in FIG. 6e and FIG. 6d';

S201c, after the touch electrode layer 302 is processed by an etching process, the pattern of the first photoresist layer 304 is removed to obtain a pattern of the touch electrode layer 302, as shown in FIG. 5f and FIG. 6e'.

6d to 6e are schematic views showing the structure of the pattern of the insulating layer 306 as the protective layer 303, and FIGS. 6c' to 6e' are structural diagrams of the pattern of the second photoresist layer 307 as the protective layer 303.

In a specific implementation manner, in the above manufacturing method provided by the embodiment of the present invention, when the pattern of the mask is consistent with the pattern of the touch electrode layer, the first photoresist layer is a positive photoresist;

The principle of patterning of positive photoresist and negative photoresist is as follows:

After the positive photoresist is exposed, the positive photoresist corresponding to the transparent region of the mask is irradiated with light to form a substance soluble in the developer, and the non-transparent region of the mask corresponds to positive lithography. The glue is not irradiated with light, its solubility does not change, it is insoluble in the developer, and after exposure, the exposed positive photoresist is treated with a developing solution to dissolve the positive photoresist corresponding to the transparent region. For the liquid, the pattern of the obtained positive photoresist layer coincides with the pattern of the non-transmissive region of the mask, that is, substantially conforms to the pattern of the mask.

After the negative photoresist is exposed, the negative photoresist corresponding to the light-transmitting region of the mask is irradiated with light, and then solidified to form a substance insoluble in the developer, and the negative light corresponding to the non-transparent region of the mask The engraved glue is not irradiated with light, its solubility does not change, and it can be dissolved in the developing solution. After exposure, the negative photoresist is treated with a developer corresponding to the negative photoresist to make the corresponding non-transparent region negative. The photoresist is dissolved in the developer, and the pattern of the negative photoresist layer obtained is identical to the pattern of the light-transmissive region of the mask, that is, substantially complementary to the pattern of the mask.

In a specific implementation, when the pattern of the mask is consistent with the pattern of the touch electrode layer, the first photoresist layer is a positive photoresist; when the pattern of the mask is consistent with the pattern of the touch electrode layer, the first light The positive photoresist is used to obtain the pattern of the touch electrode layer in accordance with the pattern of the mask. When the pattern of the protective layer is subsequently formed, the second photoresist layer can be obtained by using a negative photoresist. A patterned complementary protective layer of the control electrode layer.

When the pattern of the mask is complementary to the pattern of the touch electrode layer, the first photoresist layer is made of a negative photoresist. When the pattern of the mask is complementary to the pattern of the touch electrode layer, the first photoresist layer is made of a negative photoresist to obtain a pattern of the touch electrode layer complementary to the pattern of the mask, and the pattern of the protective layer is subsequently formed. The second photoresist layer uses a positive photoresist to obtain a protective layer complementary to the pattern of the touch electrode layer.

Based on the same inventive concept, the embodiment of the present invention further provides a cover-surface touch screen. Since the principle of solving the problem by the cover-surface touch screen is similar to the method for fabricating the cover-surface touch screen, the implementation of the cover-surface touch screen can be seen. The implementation of the method for fabricating the above-mentioned cover surface type touch screen will not be repeated here.

The embodiment of the present invention further provides a cover type touch screen, as shown in FIG. 3a, comprising: a base substrate 301, a touch electrode layer 302 on the base substrate 301, and a touch on the base substrate 301. A protective layer 303 of a region outside the pattern of the electrode layer 302.

In the cover surface type touch screen provided by the embodiment of the present invention, a protective layer 303 is disposed on a region other than the pattern of the touch electrode layer 302 on the base substrate 301, the step difference caused by the touch electrode is reduced, and the protective layer 303 is touched. There is a certain viscosity between the control electrode and the base substrate 301, which increases the viscosity between the touch electrode and the base substrate 301, thereby preventing the touch electrode from falling off, and improving the processes of cleaning, cutting, and stress testing. In the process, the touch electrode is easily scratched or remains of particles.

In practical applications, in order to prevent the protective layer 303 from affecting the normal display, the protective layer 303 is preferably made of a transparent material. Specifically, the protective layer 303 may be composed of a polydimethylsiloxane material or may be composed of other materials, and the material of the protective layer 303 is not limited herein.

Further, in the above touch screen provided by the embodiment of the present invention, the thickness of the protective layer 303 is less than or equal to the thickness of the touch electrode layer 302.

The thickness of the protective layer 303 is set to be less than or equal to the thickness of the touch electrode layer 302, preferably slightly lower than the thickness of the touch electrode layer 302, so that the thickness of the protective layer 303 is prevented from being too thick to increase the thickness of the display screen. Avoid affecting the display effect of the display screen because the protective layer 303 is too thick.

Based on the same inventive concept, an embodiment of the present invention further provides a display device, including the above-mentioned cover surface type touch screen, which can be applied to any mobile phone, tablet computer, television, display, notebook computer, digital photo frame, navigation device, and the like. A product or part that has a display function. Since the principle of solving the problem of the display device is similar to that of the above-mentioned cover surface type touch screen, the implementation of the display device can be referred to the implementation of the above-mentioned cover surface type touch screen, and the repeated description is omitted.

The cover surface type touch screen provided by the embodiment of the invention, the manufacturing method thereof and the display device form a pattern of the protective layer by using a mask plate forming the touch electrode layer on a region other than the pattern of the touch electrode layer on the base substrate On the basis of not increasing the cost of the mask, the step difference caused by the touch electrodes is reduced, and there is a certain viscosity between the protective layer and the touch electrodes and the substrate, which increases the gap between the touch electrodes and the substrate. The stickiness prevents the touch electrodes from falling off, and also improves the problem that the touch electrodes are easily scratched or left in the process of cleaning, cutting, and stress testing.

It is apparent that those skilled in the art can make various modifications and variations to the invention without departing from the spirit and scope of the invention. Thus, it is intended that the present invention cover the modifications and modifications of the invention

Claims

A method for manufacturing a cover type touch screen, comprising:

Forming a pattern of the touch electrode layer on the base substrate;

Before or after forming the pattern of the touch electrode layer, a mask layer forming the touch electrode layer is used to form a protective layer on a region other than the pattern of the touch electrode layer on the base substrate. Graphics.
The method of claim 1 , wherein the forming a pattern of the touch electrode layer on the substrate comprises:

Forming a touch electrode layer on the base substrate, and forming a first photoresist layer on the touch electrode layer;

Photolithography is performed on the first photoresist layer using a mask to obtain a pattern of the first photoresist layer;

After the touch electrode layer is processed by an etching process, the pattern of the first photoresist layer is removed to obtain a pattern of the touch electrode layer.
The manufacturing method according to claim 2, wherein the mask formed by the touch electrode layer is formed on the substrate substrate in a region other than the pattern of the touch electrode layer Layer graphics, including:

Forming an insulating layer on the base substrate, and forming a second photoresist layer on the insulating layer opposite to the photosensitive property of the first photoresist layer;

Performing photolithography on the second photoresist layer by using the mask to obtain a pattern of the second photoresist layer;

After the insulating layer is processed by an etching process, the pattern of the second photoresist layer is removed, and the obtained pattern of the insulating layer is used as a pattern of the protective layer.
The manufacturing method according to claim 2, wherein the mask formed by the touch electrode layer is formed on the substrate substrate in a region other than the pattern of the touch electrode layer Layer graphics, including:

Forming a second photoresist layer opposite to the photosensitive property of the first photoresist layer on the base substrate;

The second photoresist layer is photolithographically patterned using the mask, and the obtained pattern of the second photoresist layer is used as a pattern of the protective layer.
The manufacturing method according to any one of claims 1 to 4, wherein when the pattern of the mask is consistent with the pattern of the touch electrode layer, the first photoresist layer is positively patterned. gum;

When the pattern of the mask is complementary to the pattern of the touch electrode layer, the first photoresist layer is made of a negative photoresist.
A cover-type touch screen, comprising: a base substrate, a touch electrode layer on the base substrate, and a region outside the graphic of the touch electrode layer on the base substrate Protective layer.
The touch screen of claim 6 wherein said protective layer is comprised of a transparent material.
The touch screen of claim 7 wherein said protective layer is comprised of a polydimethylsiloxane material.
The touch screen according to any one of claims 6 to 8, wherein the thickness of the protective layer is less than or equal to the thickness of the touch electrode layer.
A display device comprising: the cover surface type touch screen according to any one of claims 6 to 9.