WO2015074319A1

WO2015074319A1 - Color film substrate, manufacturing method therefor, in-cell touch panel, and display apparatus

Info

Publication number: WO2015074319A1
Application number: PCT/CN2014/000563
Authority: WO
Inventors: 王灿; 陈宁; 刘英伟; 高浩然
Original assignee: 京东方科技集团股份有限公司
Priority date: 2013-11-21
Filing date: 2014-06-05
Publication date: 2015-05-28
Also published as: CN103558712A; CN103558712B

Abstract

A color film substrate, a manufacturing method therefor, an in-cell touch panel, and a display apparatus. A first positive photoresist layer (5) is added between a black matrix (2) and a touch electrode layer (3), so that the black matrix (2) is isolated from the touch electrode layer (3), and a developing solution used in a patterning process of the black matrix (2) is prevented from affecting the touch electrode layer (3); a second positive photoresist layer (6) is added between the touch electrode layer (3) and a color resin layer (4), so that the touch electrode layer (3) is isolated from the color resin layer (4), and a developing solution used in a patterning process of the color resin layer (4) is prevented from affecting the touch electrode layer (3). In this manner, the phenomenon that short circuit or open circuit occurs to the touch electrode layer (3) is avoided, and the touch quality is ensured.

Description

Color film substrate, manufacturing method thereof, in-cell touch screen and display device

The present invention relates to the field of display technologies, and in particular, to a color film substrate, a manufacturing method thereof, an in-cell touch panel, and a display device. Background technique

According to the composition of the touch screen, it can be divided into: an on-touch touch panel, an on-cell touch panel, and an in-cell touch panel (In Cell Touch Panel). The in-cell touch panel embeds the touch electrode layer of the touch screen inside the liquid crystal display, thereby reducing the overall thickness of the module and reducing the manufacturing cost of the touch screen.

At present, the in-cell touch panel has a touch electrode layer disposed on one side of the color filter substrate, and the color filter substrate as shown in FIG. 1 includes a base substrate 1 and a black matrix 2 (black shaded portion) on the base substrate 1. The touch electrode layer 3 (hatched portion) on the black matrix 2 and the colored resin layer 4 on the touch electrode layer 3, FIG. 1 is a cross-sectional view taken along line AA of FIG. In the process of patterning the black matrix 2 and the color resin layer 4, a negative photoresist is applied first, and then subjected to exposure, development, etching, lift-off, etc. to obtain a black matrix 2 and a color resin layer 4. a pattern, wherein the developer is inorganic potassium hydroxide (KOH); in the process of patterning the touch electrode layer 3, a positive photoresist such as DQN (DQ is diazonium) is applied. N is a phenolic resin), and then exposed, developed, 3⁄4 etched, and stripped to obtain a pattern of the touch electrode layer 3. Through actual testing, it is known that the developer used in patterning the black matrix 2 and the color resin layer 4 affects the touch electrode layer 3, which causes the touch electrode layer 3 to be prone to short circuit or open circuit, and ultimately affects Touch quality of the embedded touch screen. The specific test uses the PE probe test method, and two connection terminals are arbitrarily selected in each of the connection terminals (such as GND, R1-R12 in FIG. 11a) on the color film substrate and connected to the touch electrode. The resistance values between them are measured: Figure l ib and Figure 11c show the electrical matrix values obtained by performing the two tests on the above-mentioned terminals, and the resistance values between the terminals are less than 3 Ω, which proves that the touch electrodes are There is indeed a problem of short circuit between the connected terminals.

Therefore, how to avoid the influence of the developer used in the patterning process on the black matrix and the color resin layer on the touch electrode layer is a technology that is urgently needed to be solved by those skilled in the art. Question. Summary of the invention

In view of the above, the embodiment of the invention provides a color film substrate, a manufacturing method thereof, an in-cell touch panel and a display device, which are used to avoid the developer to touch used in the patterning process of the black matrix and the color resin layer. The electrode layer has an effect.

Therefore, an embodiment of the present invention provides a color filter substrate including a substrate, a black matrix on the substrate, a touch electrode layer on the black matrix, and the touch electrode layer. The colored resin layer on the top also includes:

a first isolation layer between the black matrix and the touch electrode layer; and/or a second isolation layer between the touch electrode layer and the colored resin layer.

In the color film substrate provided by the embodiment of the present invention, a new isolation layer is added between the black matrix and the touch electrode layer, so that the black matrix can be separated from the touch electrode layer, thereby avoiding black The developer used in the patterning process affects the touch electrode layer; a second isolation layer is added between the touch electrode layer and the colored resin layer, so that the touch electrode layer and the color resin layer can be performed. The isolation can avoid the influence of the developer used in the patterning process on the color resin layer on the touch electrode layer, thereby avoiding the problem of short circuit or open circuit of the touch electrode layer and ensuring the touch quality.

For example, the isolation layer is a positive photoresist layer, that is, the first isolation layer is a first positive photoresist layer, and the second isolation layer is a second positive photoresist layer. A material capable of protecting the black matrix and the touch electrode layer from the developer in the patterning art can be used as the spacer layer. In addition to the positive photoresist layer, the spacer layer may also employ an inorganic layer such as a dielectric layer. Or use a suitable organic layer.

For example, the touch electrode layer has a pattern projected on the substrate substrate in a region where the pattern of the black matrix is located.

Further, the first positive photoresist layer has a pattern that is zero with respect to the pattern of the black matrix; or, the first positive photoresist layer has the same pattern as the touch electrode layer File.

Further, the second positive photoresist layer has the same pattern as the pattern of the black matrix; or

The second positive photoresist layer has the same pattern as the pattern of the touch electrode layer Case.

The embodiment of the invention further provides an in-cell touch panel comprising the above color film substrate provided by the embodiment of the invention. The embodiment of the present invention further provides a display device, which is provided by the embodiment of the present invention; the above-mentioned embedded touch screen.

The embodiment of the present invention further provides a method for fabricating a color filter substrate, comprising: forming a pattern including a black matrix on the base substrate, Forming a pattern including a touch electrode layer on the base substrate of the black matrix, forming a pattern including the color resin layer on the base substrate on which the touch electrode layer is formed, further comprising:

Forming a first positive photoresist layer after forming the pattern of the black matrix and before forming the pattern of the touch electrode layer; and/or,

A second positive photoresist layer is formed after the pattern of the touch electrode layer is formed and before the pattern of the colored resin layer is formed.

In the above manufacturing method provided by the embodiment of the present invention, the forming a pattern including a black matrix on the substrate comprises: forming a pattern including a black matrix by a patterning process using a negative photoresist;

Forming the pattern including the touch electrode layer on the base substrate on which the black matrix is formed, specifically includes:

Forming a pattern including a touch electrode layer by using a positive photoresist; forming a pattern including a color resin layer on the base substrate on which the touch electrode layer is formed, specifically comprising:

A pattern including a colored resin layer is formed by a patterning process using a negative photoresist.

Further, the first positive photoresist layer has the same pattern as the pattern of the black matrix, or the first positive photoresist layer has the same pattern as the pattern of the touch electrode layer; i The second positive photoresist layer has the same pattern as the pattern of the black matrix, or the second positive photoresist layer has the same pattern as the pattern of the touch electrode layer. DRAWINGS 1 is a schematic structural view of a color film substrate in the prior art;

2 is a second schematic structural view of a color filter substrate in the prior art;

3 is a schematic structural diagram of a color filter substrate according to an embodiment of the present invention;

4 is a second schematic structural diagram of a color filter substrate according to an embodiment of the present invention;

FIG. 5 is a third schematic structural diagram of a color filter substrate according to an embodiment of the present invention; FIG.

6 is a fourth schematic structural diagram of a color filter substrate according to an embodiment of the present invention;

FIG. 7 is a fifth structural diagram of a color filter substrate according to an embodiment of the present invention; FIG.

8 is a flow chart of a method for fabricating a color filter substrate according to Example 1 of the present invention;

9 is a flow chart of a method for fabricating a color filter substrate according to Example 2 of the present invention;

10 is a flow chart of a method for fabricating a color filter substrate according to Example 3 of the present invention; FIG. 1 1a is a schematic view of each of the connection terminals connected to the touch electrode on the color filter substrate in the prior art; _3⁄4 FIG. 1 ib and FIG. The resistance value between each terminal connected to the touch electrode on the color film substrate in the prior art;

FIG. 1 id is a resistance value between each of the terminal terminals connected to the touch electrode on the color filter substrate provided by the embodiment of the present invention. detailed description

The specific embodiments of the color filter substrate, the manufacturing method thereof, the in-cell touch panel and the display device provided by the embodiments of the present invention are described in detail below with reference to the accompanying drawings.

The shape and thickness of each film layer in the drawings do not reflect the true proportion of the color filter substrate, and the purpose is only to illustrate the contents of the present invention.

Hereinafter, the present invention will be described by taking a positive photoresist layer as an isolation layer as an example. Then, within the inventive concept, in addition to the positive photoresist layer, the spacer layer may also employ an inorganic layer such as a dielectric layer, or a suitable organic layer.

A color film substrate provided by an embodiment of the present invention, as shown in FIG. 3, includes a substrate 1 , a black matrix 2 on the substrate 1 , a touch electrode layer 3 on the black matrix 2 , and a touch The color resin layer 4 on the control electrode layer 3 further includes:

a first positive photoresist layer 5 between the black matrix 2 and the touch electrode layer 3; and/or a second positive photoresist layer 6 between the touch electrode layer 3 and the colored resin layer 4. .

3 is a first positive photoresist layer 5 disposed between the black matrix 2 and the touch electrode layer 3, and a second positive light is disposed between the touch electrode layer 3 and the color resin layer 4 Engraved The glue layer 6 is explained as an example. The color film substrate provided by the embodiment of the present invention may be provided with a first positive photoresist layer 5 only between the black matrix 2 and the touch electrode layer 3 during a specific cold application; or only in the touch electrode layer A second positive photoresist layer 6 is disposed between the black matrix 2 and the touch electrode layer 3; and a first positive photoresist layer 5 is disposed between the black matrix 2 and the touch electrode layer 3. The second positive photoresist layer 6 is disposed between the touch electrode layer 3 and the color resin layer 4, which is not limited herein.

In the color film substrate provided by the embodiment of the present invention, a first positive photoresist layer is added between the black matrix and the touch electrode layer, so that the black matrix and the touch electrode layer can be separated, thereby Avoiding the influence of the developer used in the patterning process on the black matrix on the touch electrode layer; adding a second positive photoresist layer between the touch electrode layer and the colored resin layer, so that the touch can be touched The control electrode layer is separated from the colored resin layer, so that the developer used in the patterning process of the colored resin layer can be prevented from affecting the touch electric layer. The actual test shows that the touch electrode layer is actually avoided. The problem of short circuit breaking circuit ensures the quality of touch. Among them, the specific test uses the PE probe method, and arbitrarily selects two terminals (the GND, R1-R12 shown in FIG. 1 la) on the color film substrate and connected to the touch electrode. Terminals, measure the resistance between them, Figure l id shows the resistance value obtained by testing the above terminals, the resistance between each terminal is greater than 3 M Ω, which proves to be connected with the touch electrode There is no problem of short circuit between the terminals. In the above color film substrate provided by the embodiment of the present invention, the material of the touch electrode layer 3 may be metal, for example, aluminum, silver, etc.; or may be a transparent conductive oxide, for example, indium tin Oxides. Indium Zinc Oxides, etc., are not limited herein. The positive electrode projection of the pattern of the touch electrode layer 3 of the metal material on the substrate substrate 1 may be in the region of the pattern of the black matrix 2; the contact electrode layer 3 of the transparent conductive oxide material has a pattern on the substrate substrate 1 The orthographic projection on the black matrix 2 may be in the area where the picture of the black matrix 2 is located, or may not be limited to the area where the pattern of the black matrix 2 is located, for example, a diamond pattern, and the touch area of the touch electrode layer 3 of the pattern is larger. , has good touch accuracy and sensitivity, and is not limited here. Moreover, the pattern of the touch electrode layer 3 may cover the pattern of all the black matrixes 2, and may also cover the pattern of the partial black matrix 2, which is not limited herein. The following embodiments of the present invention are described by taking the material of the touch electrode layer 3 as a metal.

In the specific implementation of the above color film substrate provided by the embodiment of the present invention, the first positive light ^ The material of the adhesive layer 5 and/or the second positive photoresist layer 6 may be a thermosetting photoresist, such as an olefinic resin, or a photo-curable photoresist, such as DQN, which is not limited herein. . In φ, the thermosetting photoresist can only be coated on the entire surface, and can be cured by post-baking treatment. The cured thermosetting photoresist is no longer affected by the developer; the photo-curable photoresist can be The whole surface coating may be carried out after being coated on the entire surface, subjected to a patterning process by exposure and development treatment, and finally cured by post-baking treatment, and the cured photo-curable photoresist is no longer affected by the developing solution. , there is no specific limit here.

In the specific implementation of the color film substrate provided by the embodiment of the present invention, the material of the first positive photoresist layer 5 is used as a photo-curable photoresist as an example, as shown in FIG. The photo-solid photoresist is used as the first positive photoresist 5; the first positive photoresist layer 5 can also be patterned, and the pattern of the first positive photoresist layer 5 can be obtained after the patterning process. As shown in FIG. 3, the pattern of the first positive photoresist layer 5 may be the same as the pattern of the black matrix 2, as shown in FIG. 5, or may be the same as the pattern of the touch electrode layer 3, and is not used here. limited. In addition, when the first positive photoresist layer 5 is subjected to an exposure process, the same mask pattern as that of the touch electrode layer 3 can be formed, and thus, compared with the prior art, the embodiment of the present invention provides In the specific implementation of the above color film substrate, a new mask is not added, so that the production cost is not increased.

In the specific implementation of the color film substrate provided by the embodiment of the present invention, the material of the second positive photoresist layer 6 is used as a photo-curable photoresist as an example, as shown in FIG. The photo-solid photoresist is used as the second positive photoresist 6; the second positive photoresist layer 6 ′ can also be patterned, and the second positive photoresist layer 60 0 pattern can be obtained after the patterning process. As shown in FIG. 3, the pattern of the second positive photoresist layer 6 may be the same as the pattern of the black matrix 2, as shown in FIG. 7, or may be the same as the pattern of the touch electrode layer 3, Make a limit. In addition, when the second positive photoresist layer 6 is subjected to an exposure process, the same mask pattern as that of the touch electrode layer 3 can be used, which is provided by the embodiment of the present invention. In the specific implementation of the above color film substrate, the new mask is not added, so that the production cost is not increased. Specifically, the pattern of the first positive photoresist layer 5 and the second positive photoresist layer 6 may be the same or different, and will not be determined here.

The embodiment of the present invention further provides a method for fabricating a color filter substrate, comprising: forming a pattern including a black matrix on a base substrate, and forming a black matrix on the substrate Forming a touch electrode layer on the bottom substrate of the village a pattern, forming a pattern including a color resin layer on the base substrate on which the touch electrode layer is formed, further comprising:

Forming a first positive photoresist layer after forming a pattern of the black matrix and before forming a pattern of the touch electrode layer; and/or,

A second positive photoresist layer is formed after the pattern of the touch electrode layer is formed and before the pattern of the colored resin layer is formed. The specific implementation is described in detail.

Example 1: A first positive photoresist layer is formed only between the black matrix and the touch electrode layer, as shown in FIG.

The method for fabricating the color filter substrate in the first embodiment of the present invention includes:

5101. Form a pattern including a black matrix on the base substrate;

Specifically, a pattern including a black matrix is formed by a patterning process using a negative photoresist;

5102, forming a first positive photoresist layer on the base substrate formed with the black matrix; S103, forming a pattern including the touch special layer on the base substrate on which the first positive photoresist layer is formed ;

Specifically, using a positive photoresist to form a touch electrode layer by using a patterning process

case;

S104, forming a pattern including a color resin layer on the base substrate on which the touch electrode layer is formed;

Specifically, a pattern including a color resin layer is formed by a patterning process using a negative photoresist.

The patterning process specifically includes: first coating a layer of positive photoresist or negative photoresist, and then exposing and developing the positive photoresist or the negative photoresist by using a mask, and then etching After treatment, the positive photoresist or the negative photoresist is finally stripped to obtain a pattern.

In the above manufacturing method provided by the embodiment of the invention, the touch electrode layer can be made of metal, for example, aluminum, silver, etc.; the transparent conductive oxide can also be used to make the touch electric layer, for example, indium tin (Indium Tin) Oxides ) , Indium Ζΐ Oxides , etc., are not limited herein. The touch electrode layer made of metal has a pattern projection. The orthographic projection on the substrate can be in the region of the pattern of the black matrix; the touch electrode layer made of transparent conductive oxide has a pattern on the substrate. The projection may be in the region where the pattern of the black matrix is located, or may not be limited to the region where the pattern of the black matrix 2 is located. For example, the touch-shaped electrode layer 3 of the pattern has a large touch area, and has good touch precision and sensitivity, which is not limited herein. Moreover, the pattern of the touch electrode layer 3 may cover the pattern of all the black matrixes 2, and may also cover the pattern of the partial black matrix 2, which is not limited herein.

In the specific implementation method provided by the embodiment of the present invention, a thermal If] type photoresist may be used, for example, an acrylic resin is used to form a first positive photoresist layer, and a reference solid photoresist such as DQN may also be used. The first positive photoresist layer is formed, which is not limited herein. The first positive photoresist layer is formed by using a photo-curable photoresist as an example. In step S102, a first positive photoresist layer is formed on the substrate on which the black matrix is formed, and The surface-coated photoresist is used as the first positive photoresist; the first positive photoresist layer can also be patterned to obtain the same pattern as the black matrix, and can also be obtained and touched. The pattern of the same pattern of the electrode layers is not limited herein. In addition, when the first positive photoresist layer is subjected to the exposure process, the same mask as the pattern of the touch electrode layer can be used, so that the above-mentioned color provided by the embodiment of the present invention is compared with the prior art. In the specific implementation of the film substrate, a new mask is not added, so that the production cost is not increased.

In step 104 of the above method provided by the embodiment of the present invention, after the pattern including the color resin layer is formed on the substrate substrate on which the touch electrode layer is formed, the color may be formed! A protective layer and a spacer are formed on the base substrate of the resin layer, and the protective layer is subjected to dry etching to expose the terminal region of the touch electrode layer.

Example 2: A second positive photoresist layer is formed only between the touch electrode layer and the colored resin layer, as shown in FIG.

The method for fabricating the color filter substrate in the second embodiment of the present invention includes:

S201, forming a pattern including a black matrix on the base substrate;

Specifically, a pattern including a black matrix is formed by a patterning process using a negative photoresist; S202, forming a pattern including a touch electrode layer on the base substrate on which the black matrix is formed:; specifically, using a positive photoresist Forming a pattern including a touch electrode layer by a patterning process;

5203, forming a second positive photoresist layer on the substrate formed with the touch electrode layer;

5204. Form a pattern including a color lipid layer on the base substrate on which the second positive photoresist layer is formed.

Specifically, a pattern including a color resin layer is formed using a patterning process using a negative photoresist. ': The patterning process specifically includes first coating a positive photoresist or a negative photoresist, and then exposing, developing, and etching the positive photoresist or the negative photoresist by using a mask. After treatment, the positive photoresist or the negative photoresist is finally stripped to obtain a pattern.

In the above manufacturing method provided by the embodiment of the present invention, the touch electrode layer can be made of metal, for example, aluminum, silver, etc.; the touch electrode layer can also be formed by using a transparent conductive oxide, for example, indium tin oxide (Indium Tin Oxides) Indium Zinc Oxides, etc., are not limited herein. The touch electrode layer made of metal has an orthographic projection on the patterned substrate, which can be in the region of the pattern of the black matrix; the touch electrode layer made of transparent conductive oxide has a pattern on the substrate. The orthographic projection may be in the region where the pattern of the matrix is located, or may not be limited to the region where the pattern of the black matrix 2 is located, such as a diamond pattern. The touch electrode layer 3 of the pattern has a larger touch area and has good touch. Accuracy and sensitivity are not limited here. Moreover, the pattern of the touch electrode layer 3 may cover the pattern of all the black matrixes 2, and may also cover the pattern of the partial black matrix 2, which is not limited herein.

In the specific implementation of the color film substrate provided by the embodiment of the present invention, a second positive photoresist layer may be formed by using a thermosetting photoresist such as an acrylic resin, or a photo-curable photoresist such as DQN may be used. A second positive photoresist layer is formed, which is not limited herein. The second positive photoresist layer is formed by using a photo-curable photoresist as an example. In step S203, a second positive photoresist layer is formed on the substrate substrate on which the touch electrode layer is formed. If the photo-curable photoresist is applied as the second positive photoresist; the second positive photoresist can also be patterned specifically, and the same pattern as that of the black matrix can be obtained, and the touch can also be obtained. The pattern of the control electrode layer having the same pattern is not limited herein. In addition, when the second positive photoresist layer is subjected to the exposure process, the same mask pattern as that of the touch electrode layer can be used, so that the above-mentioned color provided by the embodiment of the present invention is compared with the prior art. In the specific implementation of the film substrate, a new mask is not added, so that the production cost is not increased.

After step S203 in the above method provided by the embodiment of the present invention, after the second positive photoresist layer is formed on the substrate substrate on which the touch electrode layer is formed, the second positive photoresist layer needs to be dry-etched. The etched hole is processed to expose the terminal area of the touch electrode layer. Step S204 in the above method provided by the embodiment of the present invention may be performed on a base substrate on which a color resin layer is formed after forming a pattern including a color resin layer on a base substrate on which the second positive photoresist layer is formed. A protective layer and a spacer are formed, and the protective layer is dry etched to expose the terminal area of the touch electrode layer. And, in step S203 and 蚤 The dry etching and puncturing treatments after the step S204 may be performed separately or simultaneously, and are not limited herein.

Example 3: forming a first positive photoresist layer between the black matrix and the touch electrode layer, and forming a second positive photoresist layer between the touch electrode layer and the colored resin layer. 10 is shown.

The method for fabricating the color filter substrate in the third embodiment of the present invention includes:

5301. Form a pattern including a black matrix on the base substrate;

5302, forming a first positive photoresist layer on the base substrate on which the black matrix is formed; S303, forming a pattern including the touch electrode layer on the base substrate on which the first positive photoresist layer is formed;

Specifically, a pattern including a touch electrode layer is formed by a patterning process using a positive photoresist;

S304, forming a second positive photoresist layer on the base substrate on which the touch electrode layer is formed; S305 forming a pattern including a color grease layer on the base substrate on which the second positive photoresist layer is formed.

Wherein, the patterning process specifically includes first coating a layer of positive photoresist or negative lithography

The electrode layer, for example, aluminum, silver, or the like; the touch electrode layer may be formed of a transparent conductive oxide, for example, Indium Tin Oxides, Indium Zinc Oxides, or the like, which is not limited herein. The touch electrode layer made of metal has an orthographic projection of the pattern on the substrate substrate in the region of the pattern of the black matrix; the touch electrode layer made of the transparent conductive oxide has a pattern on the substrate The projection may be in the region where the pattern of the black matrix is located, or may not be limited to the region where the pattern of the black matrix 2 is located, such as a diamond pattern. The touch electrode layer 3 of the pattern has a larger touch area and has good touch. Accuracy and sensitivity are not limited here. Moreover, the pattern of the touch electrode layer 3 may cover the pattern of all the black matrixes 2, and may also cover the pattern of the partial black matrix 2, which is not limited herein. In the specific implementation of the above-mentioned fabrication method provided by the embodiments of the present invention, a first positive photoresist layer may be formed by using a thermosetting photoresist such as an acrylic resin, or a photo-curable photoresist such as DQN may be used. The first positive photoresist layer is not limited herein. The first positive photoresist layer is formed by using a photo-curable photoresist as an example. In the step S302, a first positive photoresist layer is formed on the base substrate on which the black matrix is formed, and the entire surface can be coated. The light-shielding photoresist is used as the first positive photoresist; the first positive photoresist layer may be patterned to obtain the same pattern as the black matrix pattern, and the touch electrode layer may also be obtained. The same pattern of patterns is not limited here. In addition, when the first positive photoresist layer is subjected to the exposure process, the same mask as the pattern of the touch electrode layer can be used, so that the above-mentioned color provided by the embodiment of the present invention is compared with the prior art. In the specific implementation of the film substrate, a new mask is not added, so that the production cost is not increased.

In the specific implementation of the color film substrate provided by the embodiment of the present invention, a second positive photoresist layer may be formed by using a thermal photoresist, or a second positive photoresist may be formed by using a photo-curable photoresist. Layer, not limited here. The second positive photoresist layer is formed by using a photo-curable photoresist as an example. In step S304, a second positive photoresist layer is formed on the substrate substrate on which the touch electrode layer is formed. The surface-coated photo-curable photoresist is used as the second positive photoresist; the second positive photoresist layer can also be patterned to obtain the same pattern as the black matrix pattern, and can also be obtained and touched. The pattern of the same pattern of the electrode layers is not limited herein. In addition, when the second positive photoresist layer is subjected to the exposure process, the same mask pattern as that of the touch electrode layer can be used, so that the above-mentioned color provided by the embodiment of the present invention is compared with the prior art. In the specific implementation of the film substrate, a new mask is not added, so that the production cost is not increased. Specifically, the pattern of the first positive photoresist layer and the pattern of the second positive photoresist layer may be the same or different, and are not limited herein. After the step 304 of the above method provided by the embodiment of the present invention forms a second positive photoresist layer on the substrate substrate on which the touch electrode layer is formed, the second positive photoresist layer needs to be dry. Etching and puncturing to expose the terminal area of the touch electrode layer. Step 305 in the above method provided by the embodiment of the present invention may be formed on the substrate substrate on which the color resin layer is formed after forming the pattern including the color resin layer on the substrate substrate on which the second positive photoresist layer is formed. A protective layer and a spacer are formed, and the protective layer is subjected to dry etching nail hole treatment to expose a terminal region of the touch electrode layer. Further, the dry etching and puncturing processes after the step S304 and the step S305 may be performed separately or simultaneously, and are not limited herein. The embodiment of the present invention further provides an in-cell touch panel, which includes the color film substrate provided by the embodiment of the present invention. The implementation of the in-cell touch panel can be referred to the embodiment of the color film substrate described above. It will not be repeated here.

Based on the same inventive concept, an embodiment of the present invention further provides a display device, including the above-mentioned embedded touch screen provided by the embodiment of the present invention, which may be: a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital device. Any product or component that has a display function, such as a photo frame or a navigator. _f present invention provides a color filter substrate provided in the embodiment, its production method, in-cell touch ^ and a display device, since the positive photoresist layer of a first additional layer between the touch electrode layer and the black matrix, This can isolate the black matrix from the touch electrode layer, thereby avoiding the influence of the developer used in the patterning process on the black matrix on the touch electrode layer; adding between the touch electrode layer and the color resin layer a layer of a second positive photoresist layer, which can isolate the touch electrode layer from the color resin layer, thereby avoiding the influence of the developer used in the patterning process on the color resin layer on the touch electrode layer Therefore, the problem of short circuit or open circuit of the touch electrode layer is avoided, and the touch quality is ensured. It is out of the scope of the invention. It is intended that the present invention include such modifications and variations as those of the present invention are intended to be included within the scope of the appended claims.

Claims

Rights request

A color film substrate comprising a substrate, a black matrix on the substrate, a touch electrode layer on the black matrix, and a colored resin layer on the touch electrode layer, It is characterized in that it further comprises:

2. The color filter substrate according to claim 1, wherein the first isolation layer is a first positive photoresist layer, and the second isolation layer is a second positive photoresist layer.

3. The color filter substrate according to claim 2, wherein the touch electrode layer has a pattern projected on the base substrate in a region where the pattern of the black matrix is located.

The color film substrate according to claim 3, wherein the first positive photoresist layer has the same pattern as the pattern of the black matrix; or, the first positive lithography The glue layer has the same pattern as the touch electrode layer.

5. The color filter substrate according to claim 3, wherein the second positive photoresist layer has the same pattern as the pattern of the black matrix; or

The second positive photoresist layer has the same pattern as the pattern of the touch electrode layer.

An in-cell touch panel, comprising the color filter substrate according to any one of claims 1 to 5.

A display device comprising the in-cell touch panel of claim 6.

A method of fabricating a color filter substrate according to any one of claims 1 to 5, comprising: forming a pattern including a black matrix on a base substrate, formed on a base substrate on which the black matrix is formed a pattern including a touch electrode layer, a pattern including a color resin layer formed on the base substrate on which the touch electrode layer is formed, further comprising: 'after forming the pattern of the black matrix and at the formation Forming a first isolation layer before the pattern of the touch electrode layer; and/or,

A second isolation layer is formed after the pattern of the touch electrode layer is formed and before the pattern of the color resin layer is formed.

9. The method according to claim 8, wherein the first isolation layer is formed using a first positive photoresist layer, and the second isolation layer is formed using a second positive photoresist layer .

The method according to claim 9, wherein the forming a pattern including a black matrix on the base substrate comprises: forming a pattern including a black matrix by a patterning process using a negative photoresist; The forming a touch electrode layer on the base substrate on which the black matrix is formed, specifically includes:

The method according to claim 9, wherein the touch electrode layer has an orthographic projection of the pattern on the substrate in a region of the pattern of the black matrix.

12. The method according to claim 1, wherein the first positive photoresist layer has the same pattern as the pattern of the black matrix, or the first positive photoresist layer Having the same pattern as the pattern of the touch electrode layer;

The second positive photoresist layer has the same pattern as the pattern of the black matrix, or "the second positive photoresist layer has the same pattern as the pattern of the touch electrode layer.