TWI553534B - Capacitive touch panel, method of fabricating capacitive touch panel and touch display device - Google Patents

Description

Capacitive touch panel, manufacturing method thereof and touch display device

The invention relates to a capacitive touch panel and a manufacturing method thereof, in particular to a capacitive touch panel with simplified process and low cost and a manufacturing method thereof.

Touch panels have been widely used in the input interface of electronic devices because of their human-computer interaction characteristics. In recent years, as the application of consumer electronic products has become more and more widespread, more and more applications have been combined to form touch display devices by combining touch panels and displays, including mobile phones and satellite navigation. System (GPS navigator system), tablet PC (tablet PC), and laptop (laptop PC).

In today's touch panel technology, capacitive touch panels have become the mainstream touch technology used in consumer electronic products due to their multi-touch, high durability and high touch resolution. However, since the conventional capacitive touch panel is complicated to manufacture, for example, a capacitive touch panel applied to an on-cell touch display panel requires at least four mask processes, and a single glass type. (OGS) capacitive touch panels require at least five mask processes, so the manufacturing cost and process cycle cannot be reduced, and the development of capacitive touch panels cannot be further popularized.

One of the objectives of the present invention is to provide a capacitive touch panel having a simplified process and structure, a manufacturing method thereof, and a touch display device to reduce manufacturing cost and process cycle.

An embodiment of the present invention provides a capacitive touch panel including a substrate, a plurality of first sensing electrodes, a plurality of first bridge electrodes, a plurality of second sensing electrodes, a plurality of second bridge electrodes, and a first A patterned insulating layer and a second patterned insulating layer. The substrate has a touch area. The first sensing electrode is disposed on the substrate along a first direction and located in the touch area. The first bridge electrode is disposed on the substrate and located in the touch area, wherein the first bridge electrodes are electrically connected to the two adjacent first sensing electrodes. The second sensing electrode is disposed on the substrate in the second direction and located in the touch area. The second bridge electrode is disposed on the substrate and located in the touch area, wherein the second bridge electrode is electrically connected to the two adjacent second sensing electrodes, and the second bridge electrode is respectively perpendicular to the first bridge electrode Partially overlapping in the projection direction. The first patterned insulating layer is disposed between the first bridge electrode and the second bridge electrode for electrically isolating the first bridge electrode from the second bridge electrode. The second patterned insulating layer is disposed on the first patterned insulating layer, wherein the second patterned insulating layer includes a plurality of first insulating patterns respectively disposed on the second bridge electrodes, and the first insulating patterns are respectively associated with the second The bridge electrodes have the same pattern in the vertical projection direction and completely overlap.

Another embodiment of the present invention provides a touch display device including a display panel and the capacitive touch panel. The display panel has a display surface, and the capacitive touch panel is disposed on the display surface of the display panel.

Yet another embodiment of the present invention provides a method of fabricating a capacitive touch panel, comprising the following steps. A substrate is provided. Forming a first patterned conductive layer on the substrate, wherein the first patterned conductive layer comprises a plurality of first bridge electrodes located in a touch area of the substrate. Forming a first patterned insulating layer on the substrate and the first patterned conductive layer. Forming a conductive layer and an insulating layer on the first patterned insulating layer, and performing a patterning process on the insulating layer and the conductive layer by using the same mask, so that the insulating layer forms a second patterned insulating layer, and The conductive layer is formed into a second patterned conductive layer. The second patterned conductive layer includes a plurality of second bridge electrodes, and the second bridge electrode system The first bridging electrodes are partially overlapped in a vertical projection direction, respectively, and the second patterned insulating layer and the second patterned conductive layer have the same pattern in the vertical projection direction and completely overlap. Forming a plurality of first sensing electrodes and a plurality of second sensing electrodes on the substrate, wherein the first sensing electrodes are disposed on the substrate along a first direction and located in the touch area, and the second sensing electrodes are along the first The two directions are disposed on the substrate and located in the touch area, and the first bridge electrodes are electrically connected to the two adjacent first sensing electrodes.

10‧‧‧Substrate

10T‧‧‧ touch area

10P‧‧‧ surrounding area

12‧‧‧First patterned conductive layer

12B‧‧‧First bridge electrode

D1‧‧‧ first direction

12X‧‧‧First wire

12X1‧‧‧ first end

12X2‧‧‧ second end

14‧‧‧First patterned insulation

141‧‧‧ first opening

142‧‧‧ second opening

16‧‧‧ Conductive layer

18‧‧‧Insulation

20‧‧‧Second patterned insulation

22‧‧‧Second patterned conductive layer

24‧‧‧Photomask

24T‧‧‧Light transmission area

24B‧‧‧ shading area

Z‧‧‧Vertical projection direction

22B‧‧‧Second bridge electrode

221‧‧‧First sensing electrode

222‧‧‧Second sensing electrode

22X‧‧‧second wire

D2‧‧‧ second direction

201‧‧‧First insulation pattern

202‧‧‧Second insulation pattern

203‧‧‧ Third insulation pattern

1‧‧‧Capacitive touch panel

100‧‧‧Touch display device

110‧‧‧ display panel

11‧‧‧ Cover

110A‧‧‧ display surface

112‧‧‧Array substrate

114‧‧‧ opposite substrate

116‧‧‧Display media layer

30‧‧‧Substrate

30T‧‧‧ touch area

30P‧‧‧ surrounding area

32‧‧‧Decorative layer

34‧‧‧ Third patterned conductive layer

34X‧‧‧First wire

34X1‧‧‧ first end

34X2‧‧‧ second end

36‧‧‧First patterned conductive layer

36B‧‧‧First bridge electrode

38‧‧‧First patterned insulation

381‧‧‧ first opening

382‧‧‧ second opening

40‧‧‧Second patterned insulation

42‧‧‧Second patterned conductive layer

42B‧‧‧Second bridge electrode

421‧‧‧First sensing electrode

422‧‧‧Second sensing electrode

42X‧‧‧second wire

401‧‧‧first insulation pattern

402‧‧‧Second insulation pattern

403‧‧‧third insulation pattern

2‧‧‧Capacitive touch panel

200‧‧‧Touch display device

150‧‧‧Adhesive layer

50‧‧‧Substrate

50T‧‧‧ touch area

50P‧‧‧ surrounding area

52‧‧‧Decorative layer

54‧‧‧ Third patterned conductive layer

54X‧‧‧First wire

54X1‧‧‧ first end

54X2‧‧‧ second end

56‧‧‧First patterned conductive layer

56B‧‧‧First bridge electrode

561‧‧‧First sensing electrode

562‧‧‧Second sensing electrode

581‧‧‧ first opening

582‧‧‧ second opening

60‧‧‧Second patterned insulation

62‧‧‧Second patterned conductive layer

62B‧‧‧Second bridge electrode

62X‧‧‧second wire

601‧‧‧first insulation pattern

603‧‧‧ Third insulation pattern

3‧‧‧Capacitive touch panel

300‧‧‧Touch display device

1 to 6 are schematic views showing a method of fabricating a capacitive touch panel according to a first embodiment of the present invention.

FIG. 7 is a schematic diagram of a touch display device according to a first embodiment of the present invention.

8 to 13 are schematic views showing a method of fabricating a capacitive touch panel according to a second embodiment of the present invention.

FIG. 14 is a schematic view showing a touch display device according to a second embodiment of the present invention.

15 to 20 are schematic views showing a method of fabricating a capacitive touch panel according to a third embodiment of the present invention.

FIG. 21 is a schematic view showing a touch display device according to a third embodiment of the present invention.

The present invention will be further understood by the following detailed description of the preferred embodiments of the invention, .

Please refer to Figures 1 to 6. 1 to 6 are schematic views showing a method of fabricating a capacitive touch panel according to a first embodiment of the present invention, wherein FIG. 1, FIG. 3 and FIG. 5 are top views, and FIG. Figures 4 and 6 are along the first, third and fifth, respectively. Cross-sectional views of the cross-sectional lines A-A', B-B' and C-C' are shown. As shown in FIGS. 1 and 2, the substrate 10 is first provided. The substrate 10 may be a transparent substrate such as a glass substrate, a plastic substrate or a sapphire substrate, but is not limited thereto. The substrate 10 has a touch area 10T, and the peripheral area 10P is disposed on at least one side of the touch area 10T. For example, the peripheral area 10P of the present embodiment is located on both sides of the touch area 10T, such as the right side and the lower side of the first figure, but is not limited thereto. In other variant embodiments, the peripheral region 10P is located on either side of the touch region 10T, on either side, on any three sides, or around the touch region 10T. Next, a first patterned conductive layer 12 is formed on the substrate 10, wherein the first patterned conductive layer 12 includes a plurality of first bridge electrodes 12B located in the touch region 10T of the substrate 10. The first bridging electrode 12B has a long axis that is generally disposed along the first direction D1. For example, the first bridging electrode 12B of the embodiment is substantially rectangular, but not limited thereto, and the longitudinal direction thereof extends substantially in the first direction D1. In addition, the first patterned conductive layer 12 may further include a plurality of first wires 12X located in the peripheral region 10P of the substrate 10, wherein each of the first wires 12X has a first end 12X1 and a second end 12X2. In this embodiment, the material of the first patterned conductive layer 12 may be an opaque conductive material such as a single metal, a composite metal or an alloy, but is not limited thereto. The material of the first patterned conductive layer 12 may also be a transparent conductive material such as indium tin oxide, indium zinc oxide or other transparent conductive material. In addition, the first patterned conductive layer 12 may be a single layer structure or a composite layer structure. Subsequently, a first patterned insulating layer 14 is formed on the substrate 10 and the first patterned conductive layer 12, wherein the first patterned insulating layer 14 has a plurality of first openings 141 partially exposing the first bridging electrodes 12B, respectively. For example, the opposite sides of the first bridging electrode 12B in the first direction D1 are respectively exposed by the at least one first opening 141. In addition, the first patterned insulating layer 14 further includes a plurality of second openings 142 that partially expose the first ends 12X1 and the second ends 12X2 of the first wires 12X, respectively. The material of the first patterned insulating layer 14 may preferably include an organic insulating material such as an acrylic resin, but is not limited thereto. In addition, the material of the first patterned insulating layer 14 is preferably a photosensitive material, whereby patterning can be performed by an exposure and development process.

As shown in FIG. 3 and FIG. 4, sequentially formed on the first patterned insulating layer 14 Conductive layer 16 and insulating layer 18. The material of the conductive layer 16 may be a transparent conductive material such as indium tin oxide, and the conductive layer 16 may be a single layer structure or a composite layer structure. The material of the insulating layer 18 may preferably include an organic insulating material such as an acrylic resin, but is not limited thereto. Further, the material of the insulating layer 18 is preferably a photosensitive material, whereby patterning can be performed by an exposure and development process.

As shown in FIGS. 5 and 6, the insulating layer 18 and the conductive layer 16 are then patterned to form the insulating layer 18 to form the second patterned insulating layer 20, and the conductive layer 16 to form the second patterned conductive layer. Layer 22. In this embodiment, the insulating layer 18 and the conductive layer 16 are patterned by the same mask 24. For example, since the material of the insulating layer 18 is made of a photosensitive material, the second patterned insulating layer 20 can be formed by performing an exposure and development process on the insulating layer 18 by the photomask 24. Next, an etching process is performed to remove the conductive layer 16 exposed by the second patterned insulating layer 20 to form the second patterned conductive layer 22. In other variant embodiments, the material of the insulating layer 18 may be made of a non-photosensitive material. In this case, a photoresist pattern (not shown) may be formed by the photomask 24, and an insulating layer exposing the photoresist pattern by an etching process may be performed. 18 is removed to form the second patterned insulating layer 20, and the conductive layer 16 exposing the photoresist pattern is removed to form the second patterned conductive layer 22. In the present embodiment, the material of the insulating layer 18 may be a positive photoresist, the exposed portion of which may be removed after development, and the unexposed portion may be retained after development, and thus the light transmissive region of the photomask 24 24T is in the vertical projection direction Z corresponding to the portion of the insulating layer 18 that is intended to be removed, and the light-shielding region 24B of the reticle 24 is in the vertical projection direction Z corresponding to the portion of the insulating layer 18 that is intended to be retained. Since the second patterned insulating layer 20 and the second patterned conductive layer 22 are formed by the same patterning process, the second patterned insulating layer 20 and the second patterned conductive layer 22 have the same pattern and are vertical. The projection direction Z completely overlaps.

In this embodiment, the second patterned conductive layer 22 may include a plurality of second bridge electrodes 22B, a plurality of first sensing electrodes 221, a plurality of second sensing electrodes 222, and a plurality of second wires 22X. The second bridging electrode 22B is respectively in the vertical projection direction Z with the first bridging electrode 12B. Partial overlap. The second bridging electrode 22B has a long axis that is generally disposed along the second direction D2. For example, the second bridge electrode 22B of the present embodiment is substantially rectangular, and its longitudinal direction generally extends in the second direction D2. The first sensing electrode 221 is disposed on the substrate 10 in the first direction D1 and located in the touch area 10T. The second sensing electrode 222 is disposed on the substrate 10 along the second direction D2 and located in the touch area 10T. A bridge electrode 12B is electrically connected to two adjacent first sensing electrodes 221, respectively. The second wire 22X is disposed in the peripheral region 10P of the substrate 10, wherein the second wire 22X is electrically connected to the first wire 12X via the second opening 142, and the second wire 22X and the first sensing electrode 221 are respectively respectively The electrical connection is electrically connected to at least one of the second sensing electrodes 222. For example, each of the second wires 22X may be electrically connected to a corresponding first sensing electrode 221 located at an edge of the touch area 10T or a corresponding second sensing electrode 222 located at an edge of the touch area 10T. Sexual connection. In addition, each of the second wires 22X and the corresponding first wires 12X may be electrically connected to each other via the second openings 142 to form wires having low resistance.

In addition, since the second patterned insulating layer 20 and the second patterned conductive layer 22 are formed by the same patterning process, the second patterned insulating layer 20 includes a plurality of first insulating patterns 201 and a plurality of second insulating layers. a pattern 202 and a plurality of third insulation patterns 203, wherein the first insulation patterns 201 are respectively disposed on the second bridge electrodes 22B, and the first insulation patterns 201 and the second bridge electrodes 22B have the same pattern in the vertical projection direction Z and The second insulating patterns 202 are respectively disposed on the first sensing electrodes 221 and the second sensing electrodes 222, and the second insulating patterns 202 and the first sensing electrodes 221 and the second sensing electrodes 222 are vertically projected. Z has the same pattern and completely overlaps; the third insulating patterns 203 are respectively disposed on the second wires 22X, and the third insulating patterns 203 have the same pattern and completely overlap with the second wires 22X in the vertical projection direction Z.

As shown in FIGS. 5 and 6, the capacitive touch panel 1 of the present embodiment can be fabricated by the above method. In this embodiment, the first patterned conductive layer 12 is formed on the substrate 10 first. The first patterned insulating layer 14 is formed after the first patterned conductive layer 12, the second patterned conductive layer 22 is formed after the first patterned insulating layer 14, and the second patterned insulating layer 20 is stacked on the first The two patterned conductive layers 22 and the two are simultaneously patterned, that is, the first bridge electrode 12B is located between the substrate 10 and the first patterned insulating layer 14, and the first sensing electrode 221, the second sense The measuring electrode 222 and the second bridging electrode 22B are located between the first patterned insulating layer 14 and the second patterned insulating layer 20, but are not limited thereto. In a variant embodiment, the second patterned conductive layer 22 may be formed on the substrate 10 first, the first patterned insulating layer 14 may be formed after the second patterned conductive layer 22, and the first patterned conductive layer 12 may be formed. After the first patterned insulating layer 14 , the second patterned insulating layer 20 may be formed after the first patterned conductive layer 12 , and the second patterned insulating layer 20 may be stacked on the first patterned conductive layer 12 and two Simultaneously patterning, that is, the first sensing electrode 221, the second sensing electrode 222, and the second bridging electrode 22B are located between the substrate 10 and the first patterned insulating layer 14, and the first bridging electrode 12B It is between the first patterned insulating layer 14 and the second patterned insulating layer 20.

It can be seen from the above that the manufacturing method of the capacitive touch panel 1 of the present embodiment can be completed only by using three patterning processes, thereby having the advantages of reducing cost and shortening generation time.

Please refer to Figure 7. FIG. 7 is a schematic diagram of a touch display device according to a first embodiment of the present invention. As shown in FIG. 7 , the touch display device 100 of the present embodiment includes a display panel 110 and a capacitive touch panel 1 . The features of the capacitive touch panel 1 are as described in the above embodiments, and are not described herein again. The capacitive touch panel 1 may further include a cover 11 covering the second patterned insulating layer 20. The cover 11 includes a transparent substrate, which may be, for example, a glass substrate, a plastic substrate or a sapphire substrate, but is not limited thereto. The display panel 110 has a display surface 110A, and the capacitive touch panel 1 is disposed on the display surface 110A of the display panel 110. The display panel 110 can be various types of non-self-luminous display panels or self-luminous display panels, wherein the non-self-luminous display panel can include a liquid crystal display panel, an electrophoretic display panel, an electrowetting display panel, or other suitable display panel; The panel includes an organic electroluminescent display panel, a plasma display panel, a field emission display panel, or other suitable display panel. The display panel 110 may include an array substrate 112, a counter substrate 114, and a display medium layer 116. The touch display device 100 of the present embodiment is an example of an on-cell touch display panel. Therefore, the opposite substrate 114 and the substrate 10 of the capacitive touch panel 1 can be integrated into the same substrate.

The capacitive touch panel of the present invention, the manufacturing method thereof, and the touch display panel are not limited to the above embodiments. Hereinafter, the capacitive touch panel of the other preferred embodiments of the present invention, the manufacturing method thereof, and the touch display panel will be sequentially described, and in order to facilitate the comparison of the differences of the embodiments and simplify the description, the following embodiments are described. The same elements are denoted by the same reference numerals, and the differences between the embodiments are mainly described, and the repeated parts are not described again.

Please refer to Figures 8 to 13. 8 to 13 are schematic views showing a method of fabricating a capacitive touch panel according to a second embodiment of the present invention, wherein FIG. 8, FIG. 10 and FIG. 12 are top views, and FIG. 11 and 13 are cross-sectional views taken along lines D-D', E-E', and F-F' of Figs. 8, 10, and 12, respectively. As shown in Figs. 8 and 9, first, the substrate 30 is provided. The substrate 30 has a touch area 30T, and the peripheral area 30P is disposed on at least one side of the touch area 30T. Next, a decorative layer 32 is formed on the substrate 30. The decorative layer 32 substantially corresponds to the peripheral region 30T of the substrate 30, and the decorative layer 32 has a light blocking property, which may be a black light shielding layer, a white light shielding layer, or a colored light shielding layer. Further, the decorative layer 32 may be a single layer structure or a composite layer structure. Subsequently, a third patterned conductive layer 34 is formed on the decorative layer 32. The third patterned conductive layer 34 includes a plurality of first wires 34X disposed in the peripheral region 30P of the substrate 30, and each of the first wires 34X has a first end 34X1 and a second end 34X2. In this embodiment, the material of the third patterned conductive layer 34 may be an opaque conductive material such as a single metal, a composite metal or an alloy, but is not limited thereto. The material of the third patterned conductive layer 34 may also be a transparent conductive material such as indium tin oxide, indium zinc oxide or other transparent conductive material. In addition, the third patterned conductive layer 34 may be a single layer structure or a composite layer structure. this The first patterned conductive layer 36 is formed on the substrate 30. The first patterned conductive layer 36 includes a plurality of first bridge electrodes 36B located in the touch region 30T of the substrate 30. In this embodiment, the material of the first patterned conductive layer 36 may be a transparent conductive material such as indium tin oxide, indium zinc oxide or other transparent conductive materials, but not limited thereto. The material of the first patterned conductive layer 36 may also include an opaque conductive material such as a single metal, a composite metal or an alloy. In addition, the first patterned conductive layer 36 may be a single layer structure or a composite layer structure. The order in which the first patterned conductive layer 36 and the third patterned conductive layer 34 are formed is not limited. For example, the third patterned conductive layer 34 may be formed prior to the first patterned conductive layer 36, and vice versa.

As shown in FIGS. 10 and 11, subsequently, a first patterned insulating layer 38 is formed on the substrate 30, the first patterned conductive layer 36 and the third patterned conductive layer 34, wherein the first patterned insulating layer 38 There are a plurality of first openings 381 that partially expose the first bridging electrodes 36B, respectively. In addition, the first patterned insulating layer 38 may further include a plurality of second openings 382 partially exposing the first ends 34X1 and the second ends 34X2 of the first wires 34X, respectively. The material of the first patterned insulating layer 38 may preferably include an organic insulating material such as an acrylic resin, but is not limited thereto. In addition, the material of the first patterned insulating layer 38 is preferably a photosensitive material, whereby the patterning can be performed by an exposure and development process.

As shown in FIG. 12 and FIG. 13 , a conductive layer (not shown) and an insulating layer (not shown) are sequentially formed on the first patterned insulating layer 38, and the same photomask (not shown) is used. The insulating layer and the conductive layer are patterned to form the insulating layer to form the second patterned insulating layer 40, and the conductive layer to form the second patterned conductive layer 42. The patterning process of the insulating layer and the conductive layer is disclosed in the foregoing embodiments, and details are not described herein again. Since the second patterned insulating layer 40 and the second patterned conductive layer 42 are formed by the same patterning process, the second patterned insulating layer 40 and the second patterned conductive layer 42 have the same pattern and are vertical. The projection direction Z completely overlaps.

In this embodiment, the second patterned conductive layer 42 may include a plurality of second bridge electrodes 42B, a plurality of first sensing electrodes 421, a plurality of second sensing electrodes 422, and a plurality of second wires 42X. The second bridging electrode 42B partially overlaps the first bridging electrode 36B in the vertical projection direction Z, respectively. The first sensing electrode 421 is disposed on the substrate 30 along the first direction D1 and located in the touch area 30T. The second sensing electrode 422 is disposed on the substrate 30 along the second direction D2 and located in the touch area 30T. A bridge electrode 36B is electrically connected to the two adjacent first sensing electrodes 421, respectively. The second wire 42X is disposed in the peripheral region 30P of the substrate 30. The second wire 42X is electrically connected to the first wire 34X via the second opening 382, and the second wire 42X and the first sensing electrode 421 are respectively respectively. The electrical connection is electrically connected to at least one of the second sensing electrodes 422. For example, each of the second wires 42X can be electrically connected to a corresponding first sensing electrode 421 located at an edge of the touch area 30T or a corresponding second sensing electrode 422 located at an edge of the touch area 30T. Sexual connection. In addition, each of the second wires 42X and the corresponding first wires 34X may be electrically connected to each other via the second openings 382 to form wires having low resistance.

In addition, since the second patterned insulating layer 40 and the second patterned conductive layer 42 are formed by the same patterning process, the second patterned insulating layer 40 includes a plurality of first insulating patterns 401 and a plurality of second insulating layers. a pattern 402 and a plurality of third insulation patterns 403, wherein the first insulation patterns 401 are respectively disposed on the second bridge electrodes 42B, and the first insulation patterns 401 and the second bridge electrodes 42B have the same pattern in the vertical projection direction Z and The second insulating patterns 402 are respectively disposed on the first sensing electrodes 421 and the second sensing electrodes 422, and the second insulating patterns 402 are perpendicular to the first sensing electrodes 421 and the second sensing electrodes 422. The Z has the same pattern and completely overlaps; the third insulating patterns 403 are respectively disposed on the second wires 42X, and the third insulating patterns 403 have the same pattern and completely overlap with the second wires 42X in the vertical projection direction Z. The capacitive touch panel 2 of the present embodiment can be fabricated by the above method.

Please refer to Figure 14. FIG. 14 is a schematic view showing a touch display device according to a second embodiment of the present invention. As shown in FIG. 14, the touch display device 200 of the present embodiment includes a display surface. The board 110 and the capacitive touch panel 2 are provided. The features of the capacitive touch panel 2 are as described in the above embodiments, and are not described herein again. The capacitive touch panel 2 of the present embodiment can be a monolithic glass (OGS) capacitive touch panel, which can be attached to the display surface 110A of the display panel 110 by using an adhesive layer 150. The material of the adhesive layer 150 can be For example, liquid optical adhesive (LOCA), pressure sensitive adhesive (PSA) or other suitable adhesive material, and the adhesive layer 150 may cover the display surface 110A of the display panel 110 over the entire surface, or cover the periphery of the display panel 110 in a mouth shape. . The display panel 110 can be various types of non-self-luminous display panels or self-illuminating display panels, as described in the foregoing embodiments.

Please refer to Figures 15 to 20. 15 to 20 are schematic views showing a method of fabricating a capacitive touch panel according to a third embodiment of the present invention, wherein FIG. 15, FIG. 17, and FIG. 19 are top views, and FIG. Fig. 18 and Fig. 20 are cross-sectional views taken along lines G-G', H-H' and I-I' of Figs. 15, 17 and 19, respectively. As shown in Figs. 15 and 16, the substrate 50 is first provided. The substrate 50 has a touch area 50T, and the peripheral area 50P is disposed on at least one side of the touch area 50T. Next, a decorative layer 52 is formed on the substrate 50. The decorative layer 52 generally corresponds to the peripheral region 50T of the substrate 50. Subsequently, a third patterned conductive layer 54 is formed on the decorative layer 52. The third patterned conductive layer 54 includes a plurality of first conductive lines 54X disposed in the peripheral region 50P of the substrate 50, and each of the first conductive lines 54X has a first end 54X1 and a second end 54X2. In this embodiment, the material of the third patterned conductive layer 54 may be an opaque conductive material such as a single metal, a composite metal or an alloy, but is not limited thereto. The material of the third patterned conductive layer 54 may also be a transparent conductive material such as indium tin oxide, indium zinc oxide or other transparent conductive material. In addition, the third patterned conductive layer 54 may be a single layer structure or a composite layer structure. In addition, a first patterned conductive layer 56 is formed on the substrate 50 , wherein the first patterned conductive layer 56 includes a plurality of first bridge electrodes 56B , a plurality of first sensing electrodes 561 and a plurality of second sensing electrodes 562 . The first bridge electrode 56B has a long axis, which is generally disposed along the first direction D1 (for example, the direction of the row of FIG. 15); the first sensing electrode 561 is disposed on the substrate 50 along the first direction D1 and located in the touch area. In the 50T, the second sensing electrode 562 is disposed on the substrate 50 in the second direction D2 (for example, the direction of the 15th row) and is located in the touch area 50T, and A bridge electrode 56B is electrically connected to two adjacent first sensing electrodes 561, respectively. In this embodiment, the material of the first patterned conductive layer 56 may be a transparent conductive material such as indium tin oxide, indium zinc oxide or other transparent conductive material, but not limited thereto. In addition, the first patterned conductive layer 56 may be a single layer structure or a composite layer structure. In this embodiment, the order in which the first patterned conductive layer 56 and the third patterned conductive layer 54 are formed is not limited. For example, the third patterned conductive layer 54 may be formed before the first patterned conductive layer 56, and vice versa. Of course.

As shown in FIGS. 17 and 18, a first patterned insulating layer 58 is formed on the substrate 50, the first patterned conductive layer 56 and the third patterned conductive layer 54, wherein the first patterned insulating layer 58 is formed. There are a plurality of first openings 581 that partially expose the second sensing electrodes 562, respectively. In addition, the first patterned insulating layer 58 may further include a plurality of second openings 582 partially exposing the first ends 54X1 and the second ends 54X2 of the first wires 54X, respectively. The material of the first patterned insulating layer 58 may preferably include an organic insulating material such as an acrylic resin, but is not limited thereto. In addition, the material of the first patterned insulating layer 58 is preferably a photosensitive material, whereby patterning can be performed by an exposure and development process.

As shown in FIG. 19 and FIG. 20, a conductive layer (not shown) and an insulating layer (not shown) are sequentially formed on the first patterned insulating layer 58, and the same mask is used. The insulating layer and the conductive layer are patterned to form the insulating layer to form the second patterned insulating layer 60, and the conductive layer to form the second patterned conductive layer 62. The patterning process of the insulating layer and the conductive layer is disclosed in the foregoing embodiments, and details are not described herein again. Since the second patterned insulating layer 60 and the second patterned conductive layer 62 are formed by the same patterning process, the second patterned insulating layer 60 and the second patterned conductive layer 62 have the same pattern and are vertical. The projection direction Z completely overlaps.

In the embodiment, the second patterned conductive layer 62 may include a plurality of second bridge electrodes 62B and a plurality of second wires 62X. The second bridging electrode 62B partially overlaps the first bridging electrode 56B in the vertical projection direction Z, respectively. The second wire 62X is disposed in the peripheral region 50P of the substrate 50 The second wire 62X is electrically connected to the first wire 54X via the second opening 582, and the second wire 62X is electrically connected to at least one of the first sensing electrodes 561 and the second sensing electrode 562, respectively. At least one of them is electrically connected. For example, each second wire 62X can be electrically connected to a corresponding first sensing electrode 561 located at the edge of the touch area 50T or a corresponding second sensing electrode 562 located at the edge of the touch area 50T. Sexual connection. In addition, each of the second wires 62X and the corresponding first wires 54X may be electrically connected to each other via the second openings 582 to form wires having low resistance.

In addition, since the second patterned insulating layer 60 and the second patterned conductive layer 62 are formed by the same patterning process, the second patterned insulating layer 40 includes a plurality of first insulating patterns 601 and a plurality of third insulating layers. a pattern 603, wherein the first insulation patterns 601 are respectively disposed on the second bridge electrodes 62B, and the first insulation patterns 601 and the second bridge electrodes 62B have the same pattern in the vertical projection direction Z and completely overlap; the third insulation patterns 603 They are respectively disposed on the second wire 62X, and the third insulation pattern 603 has the same pattern and completely overlaps with the second wire 62X in the vertical projection direction Z. The capacitive touch panel 3 of the present embodiment can be fabricated by the above method.

Please refer to Figure 21. FIG. 21 is a schematic view showing a touch display device according to a third embodiment of the present invention. As shown in FIG. 21 , the touch display device 300 of the present embodiment includes a display panel 110 and a capacitive touch panel 3 . The features of the capacitive touch panel 3 are as described in the above embodiments, and are not described herein again. The capacitive touch panel 3 of the present embodiment can be a monolithic glass (OGS) capacitive touch panel that can be attached to the display surface 110A of the display panel 110 by using an adhesive layer 150. The display panel 110 can be various types of non-self-luminous display panels or self-illuminating display panels, as described in the foregoing embodiments.

In summary, the capacitive touch panel of the present invention defines a conductive layer and an insulating layer by using the same patterning process, which can reduce one mask, thereby reducing cost and shortening production time.

The above are only the preferred embodiments of the present invention, and all changes and modifications made to the scope of the present invention should be within the scope of the present invention.

10‧‧‧Substrate

12‧‧‧First patterned conductive layer

12B‧‧‧First bridge electrode

Z‧‧‧Vertical projection direction

12X‧‧‧First wire

12X1‧‧‧ first end

12X2‧‧‧ second end

14‧‧‧First patterned insulation

141‧‧‧ first opening

142‧‧‧ second opening

20‧‧‧Second patterned insulation

22‧‧‧Second patterned conductive layer

24‧‧‧Photomask

24T‧‧‧Light transmission area

24B‧‧‧ shading area

22X‧‧‧second wire

22B‧‧‧Second bridge electrode

221‧‧‧First sensing electrode

201‧‧‧First insulation pattern

202‧‧‧Second insulation pattern

203‧‧‧ Third insulation pattern

1‧‧‧Capacitive touch panel

Claims (17)

A capacitive touch panel includes: a substrate having a touch area; a plurality of first sensing electrodes disposed on the substrate along a first direction and located in the touch area; and a plurality of first bridge electrodes And disposed on the substrate and located in the touch area, wherein the first bridge electrodes are electrically connected to the two adjacent first sensing electrodes respectively; and the plurality of second sensing electrodes are along a second The second bridge electrode is disposed on the substrate and located in the touch area; the plurality of second bridge electrodes are disposed on the substrate and located in the touch area, wherein the second bridge electrodes are adjacent to the two adjacent electrodes The second sensing electrodes are electrically connected, and the second bridging electrodes are partially overlapped with the first bridging electrodes in a vertical projection direction; a first patterned insulating layer is disposed on the first bridging electrodes and The second bridging electrodes are electrically isolated from the first bridging electrodes and the second bridging electrodes; and a second patterned insulating layer is disposed on the first patterned insulating layer, wherein the The second patterned insulating layer includes a plurality A first insulating pattern, are provided on the second bridge these electrodes, a first insulating patterns and such lines are those of the second bridge electrodes have the same pattern in the vertical direction and projected completely overlap. The capacitive touch panel of claim 1, wherein the first bridge electrodes are located between the substrate and the first patterned insulating layer, and the first sensing electrodes, the second sensing electrodes The electrodes and the second bridge electrodes are between the first patterned insulating layer and the second patterned insulating layer. The capacitive touch panel of claim 2, wherein the second patterned insulating layer further comprises a plurality of second insulating patterns respectively disposed on the first sensing electrodes and the second sensing electrodes, And the second insulating patterns are respectively associated with the first sensing electrodes and the second sensing electrodes The same pattern is present in the vertical projection direction and completely overlaps. The capacitive touch panel of claim 3, wherein the first bridge electrodes are formed by a first patterned conductive layer, and the first sensing electrodes, the second sensing electrodes, and the The second bridge electrode is formed by a second patterned conductive layer. The capacitive touch panel of claim 4, wherein the first patterned insulating layer has a plurality of first openings, respectively exposing the first bridge electrodes, and the first sensing electrodes are via the first sensing electrodes The first openings are electrically connected to the first bridge electrodes, respectively. The capacitive touch panel of claim 5, wherein the substrate further has a peripheral region on at least one side of the touch region; the first patterned conductive layer further includes a plurality of first wires disposed on the substrate In the peripheral region, each of the first wires has a first end and a second end; the first patterned insulating layer further has a plurality of second openings respectively exposing the first wires a first end and the second end; the second patterned conductive layer further includes a plurality of second wires disposed in the peripheral region of the substrate, wherein the second wires respectively pass through the second openings The first ends of the first wires are electrically connected to the second ends, and the second wires are electrically connected to at least one of the first sensing electrodes and the second sensing electrodes At least one of the electrical connections; and the second patterned insulating layer further includes a plurality of third insulating patterns respectively disposed on the second conductive lines, and the third insulating patterns are associated with the second conductive lines The same pattern and complete in the vertical projection direction overlapping. The capacitive touch panel of claim 5, wherein The substrate further has a peripheral region on at least one side of the touch region; a decorative layer is disposed on the substrate and located in the peripheral region; the capacitive touch panel further includes a third patterned conductive layer, Between the substrate and the first patterned insulating layer, wherein the third patterned conductive layer comprises a plurality of first wires disposed in the peripheral region of the substrate, and each of the first wires has a first end And a second end; the first patterned insulating layer further has a plurality of second openings respectively exposing the first ends of the first wires and the second ends; the second patterned conductive layer Further comprising a plurality of second wires disposed in the peripheral region of the substrate, wherein the second wires are respectively electrically connected to the first ends and the second ends of the first wires via the second openings And electrically connected to at least one of the first sensing electrodes and at least one of the second sensing electrodes; and the second patterned insulating layer Including a plurality of third insulation patterns, respectively disposed on Wait a second conductor, the third insulating pattern and such and such a second conductor having the same pattern on the vertical projection direction and completely overlapped. The capacitive touch panel of claim 1, wherein the first bridge electrodes, the first sensing electrodes, and the second sensing electrodes are located between the substrate and the first patterned insulating layer And the second bridge electrodes are located between the first patterned insulating layer and the second patterned insulating layer. The capacitive touch panel of claim 8, wherein the first bridge electrodes, the first sensing electrodes, and the second sensing electrodes are formed by a first patterned conductive layer, and The second bridge electrode is formed by a second patterned conductive layer. The capacitive touch panel of claim 9, wherein the substrate further has a peripheral area on at least one side of the touch area; a decorative layer disposed on the substrate and located in the peripheral area; the capacitive type The touch panel further includes a third patterned conductive layer disposed between the substrate and the first patterned insulating layer, wherein the third patterned conductive layer includes a plurality of first conductive lines disposed on the periphery of the substrate Each of the first wires has a first end and a second end, and the first ends of the first wires are electrically connected to at least one of the first sensing electrodes respectively At least one of the second sensing electrodes is electrically connected; the first patterned insulating layer further has a plurality of second openings respectively exposing the first ends of the first wires and the second portions The second patterned conductive layer further includes a plurality of second wires disposed in the peripheral region of the substrate, wherein the second wires respectively pass through the second openings and the first wires One end is electrically connected to the second ends; and the second The patterned insulating layer further includes a plurality of third insulating patterns respectively disposed on the second conductive lines, and the third insulating patterns and the second conductive lines have the same pattern in the vertical projection direction and completely overlap . A touch display device includes: a display panel having a display surface; and a capacitive touch panel as claimed in claim 1, disposed on the display surface of the display panel. A method for fabricating a capacitive touch panel, comprising: providing a substrate; forming a first patterned conductive layer on the substrate, wherein the first patterned conductive layer comprises a plurality of first bridge electrodes, one of the substrates a first patterned insulating layer is formed on the substrate and the first patterned conductive layer; Forming a conductive layer and an insulating layer on the first patterned insulating layer, and performing a patterning process on the insulating layer and the conductive layer by using the same mask to form a second patterning of the insulating layer. An insulating layer, and the conductive layer is formed into a second patterned conductive layer, wherein the second patterned conductive layer comprises a plurality of second bridge electrodes, and the second bridge electrodes are respectively associated with the first bridge electrodes Partially overlapping in a vertical projection direction, and the second patterned insulating layer and the second patterned conductive layer have the same pattern in the vertical projection direction and completely overlap; and forming a plurality of first sensing electrodes on the substrate And the plurality of second sensing electrodes, wherein the first sensing electrodes are disposed on the substrate in a first direction and located in the touch area, and the second sensing electrodes are disposed in the second direction The first bridge electrodes are electrically connected to the two adjacent first sensing electrodes. The method of fabricating a capacitive touch panel of claim 12, wherein the second patterned conductive layer comprises the first sensing electrodes and the second sensing electrodes. The method of fabricating a capacitive touch panel according to claim 13, wherein the first patterned conductive layer further comprises a plurality of first wires located in a peripheral region of the substrate, wherein each of the first wires has a first a first end and a second end; the first patterned insulating layer exposing the first ends and the second ends of the first wires; and the second patterned conductive layer further comprises a plurality of second wires Provided in the peripheral region of the substrate, wherein the second wires are electrically connected to the first ends of the first wires exposed by the first patterned insulating layer and the second ends, respectively. The second wires are electrically connected to at least one of the first sensing electrodes and at least one of the second sensing electrodes. The method for fabricating a capacitive touch panel according to claim 13, further comprising: forming a decorative layer on the substrate before forming the first patterned insulating layer; and forming a third layer on the decorative layer The patterned conductive layer, wherein the third patterned conductive layer comprises a plurality of first conductive lines disposed in a peripheral region of the substrate, each of the first conductive lines having a first end and a second end, the first patterning The insulating layer exposes the first ends of the first wires and the second ends, the second patterned conductive layer further includes a plurality of second wires disposed in the peripheral region of the substrate, wherein the The first ends of the first wires and the first ends of the first wires exposed by the first patterned insulating layer are electrically connected to the second ends, and the second wires are respectively connected to the first sensing At least one of the electrodes is electrically connected to at least one of the second sensing electrodes. The method of fabricating a capacitive touch panel of claim 12, wherein the first patterned conductive layer comprises the first sensing electrodes and the second sensing electrodes. The method for fabricating a capacitive touch panel according to claim 16, further comprising: forming a decorative layer on the substrate before forming the first patterned insulating layer; and forming a third layer on the decorative layer The patterned conductive layer, wherein the third patterned conductive layer comprises a plurality of first wires disposed in a peripheral region of the substrate, each of the first wires having a first end and a second end, and the first The first end of the wire is electrically connected to at least one of the first sensing electrodes and at least one of the second sensing electrodes; the first patterned insulating layer is exposed The first ends of the first wires and the second ends and portions of the second sensing electrodes are exposed; and the second patterned conductive layer further includes a plurality of second wires disposed on the substrate The first ends of the first wires and the second ends of the first wires exposed by the first patterned insulating layer are electrically connected to the second ends, and the second bridges are The electrode system is exposed to the first patterned insulating layer Other second sensing electrodes are electrically connected.