TWI579742B - Touch panels and fabrication methods thereof - Google Patents

Description

Touch panel and method of manufacturing same

The present invention relates to touch technology, and particularly relates to a touch icon structure located in a non-visible area of a touch panel, and a method of manufacturing the touch panel.

In recent years, touch panels have gradually become the most important input interface, and are widely used in various electronic products, such as mobile phones, personal digital assistants (PDAs) or palm-sized personal computers. The touch sensing component of the touch panel may include a plurality of sensing electrodes arranged in a row and insulated with a plurality of sensing electrodes arranged in a row, and the sensing electrodes arranged in rows and columns may detect a touch position. And located in the visible area of the touch panel.

The sensing electrodes arranged in rows and columns may be formed by the same transparent conductive layer or by two transparent conductive layers, respectively, when the sensing electrodes are formed on one glass substrate and another protective glass is covered thereon. This touch panel is called a touch panel of a glass-glass (GG) structure. In another structure of the touch panel, the sensing electrodes arranged in rows and columns are formed by the same transparent conductive layer and formed on the protective glass. The touch panel is called a single glass solution. OGS) structure or touch panel that is touched on a touch on lens (TOL) structure.

In addition, a touch icon (icon) may be formed in the non-visible area of the touch panel. When the touch panel is attached to the display panel, the touch icon area is located on the sticker. In addition to the area, in detail, due to the structural design requirements, when the touch panel is attached to the display panel, the glue is not applied in the area corresponding to the touch icon, so that the touch icon is not in the bonding area. Therefore, the sensing electrodes corresponding to the touch icon area are affected and interfered by the outside, and problems such as electrostatic discharge (ESD) damage and scratching are apt to occur.

In view of the above problems in the prior art, the present disclosure provides a touch panel and a manufacturing method thereof, and improves the laminated structure of the non-visible area without increasing the manufacturing process of the touch panel, so that the non-visible area corresponds to The sensing electrodes in the touch icon area are well protected, thereby preventing the sensing electrodes from being destroyed by electrostatic discharge, and also avoiding the sensing electrodes being scratched.

According to some embodiments of the present disclosure, a touch panel includes: a first sensing electrode disposed in a non-visible area, a second sensing electrode disposed in the visible area, and a second sensing electrode including a first axial electrode and a first The two axial electrodes are insulatively staggered, wherein the first axial electrode comprises a plurality of first conductive units, the second axial electrode comprises a plurality of second conductive units, the wires are electrically connected to the first sensing electrodes, and the insulating layer covers a first sensing electrode, wherein the first sensing electrode is formed by a first transparent conductive layer, and the first conductive unit and the second conductive unit are formed by a second transparent conductive layer.

According to some embodiments of the present disclosure, a method for manufacturing a touch panel is provided. The method includes: forming a first transparent conductive layer on a substrate, and patterning the first transparent conductive layer to form a first sensing electrode in the non-visible area; Forming a second transparent conductive layer on the substrate, patterning the second transparent conductive layer to form a second sensing electrode in the visible region; forming a wire electrically connected to the first sensing electrode; and forming The insulating layer covers the first sensing electrode.

100‧‧‧ touch panel

100VA‧‧·visible area

100NVA‧‧‧Invisible area

101‧‧‧Substrate

102‧‧‧First axial electrode

102C‧‧‧Connecting Department

102U‧‧‧First Conductive Unit

103, 110-3‧‧‧Dummy design

104‧‧‧Second axial electrode

104U‧‧‧second conductive unit

104C‧‧‧Connecting Department

104P‧‧‧Protruding

106‧‧‧ Jumper

108‧‧‧Insulation block

110‧‧‧First sensing electrode

110-1‧‧‧First electrode section

110-2‧‧‧Second electrode section

112, 114‧‧‧ wires

116‧‧‧Optical matching layer

118‧‧‧Insulation

119-1, 119-2‧‧‧ openings

120‧‧‧Second sensing electrode

124‧‧‧Shielding layer

126‧‧‧ touch icon

128‧‧‧Touch icon area

200, 300‧‧‧How to manufacture touch panels

S201-S215, S301-S315‧‧‧ steps of the manufacturing method

In order to make the above objects, features, and advantages of the present invention more comprehensible, the following detailed description is made with reference to the accompanying drawings: FIG. 1 is a schematic plan view of a touch panel; FIG. 2A is a view of some of the present disclosure. Embodiments, a partial plan enlarged view of a region A of the touch panel of FIG. 1; FIG. 2B is a partial cross-section of the touch panel along section line 2-2' of FIG. 2A according to some embodiments of the present disclosure. 3A is a partial plan enlarged view of a region A of the touch panel of FIG. 1 according to other embodiments of the present disclosure; FIG. 3B is a view along the third embodiment according to another embodiment of the present disclosure. Sectional view 3-3', a partial cross-sectional view of the touch panel; FIG. 4A is a partial plan view of the sensing electrode of the visible area of the touch panel according to some embodiments of the present disclosure; FIG. 4B is a schematic view of the sensing electrode according to the present disclosure Other embodiments, a partial plan view of a sensing electrode of a visible area of the touch panel; FIG. 5 is a flow chart showing a method of manufacturing the touch panel of FIGS. 2A and 2B according to some embodiments of the present disclosure; Figure 6 shows A flowchart of a method for manufacturing the touch panel 3A and 3B of FIG other embodiments disclosed.

1 is a schematic plan view of a touch panel 100, and the touch panel 100 Having a viewable area 100VA and a non-viewable area 100NVA, the non-visible area 100NVA is located at the periphery of the touch panel 100, and surrounds the visible area 100VA, and a plurality of first lines are formed in the visible area 100VA. An axial electrode and a plurality of second axial electrodes, the first axial electrode and the second axial electrode are insulated and staggered, and the touch position can be detected via the first axial electrode and the second axial electrode. In addition, a plurality of touch icons can be formed in the non-visible area 100NVA, and the touch icons are designed to have a button function, and the touch icon area corresponding to the touch icon can be touched to obtain touch. The operation instruction represented by the icon.

The embodiment of the present disclosure provides a touch panel 100 and a method of fabricating the same, and the sensing of the non-visible area 100NVA corresponding to the touch icon area is formed by using the first transparent conductive layer without increasing the manufacturing process of the touch panel 100. Electrode, and covering the non-visible area 100NVA sensing electrode with an insulating layer to achieve protection, thereby saving a process step of forming a protective layer in the non-visible area 100NVA, and at the same time avoiding the 100NVA corresponding to the touch in the non-visible area The sensing electrode of the icon area is destroyed by electrostatic discharge and scratched.

2A is a partial plan enlarged view of a region A of the touch panel 100 of FIG. 1 according to some embodiments of the present disclosure, and the layered relationship of the plan view shown in FIG. 2A is from the protective cover of the touch panel. The outer surface (ie, the touch surface) is viewed. As shown in FIG. 2A, the non-visible area 100NVA of the touch panel 100 has a first sensing electrode 110, and the visible area 100VA of the touch panel 100 has a second sensing electrode 120, although FIG. 2A only depicts a first The sensing electrode 110, in fact, the non-visible area 100NVA may have a plurality of first sensing electrodes 110, each first sense The measuring electrode 110 corresponds to a touch icon area 128, and each of the touch icon areas 128 has a touch icon 126. The touch icons 126 are correspondingly designed with a button function, and are detected by the first sensing electrode 110. Whether the control icon area 128 is touched or not can be determined whether the operation instruction represented by the touch icon 126 needs to be executed. In some embodiments, the first sensing electrode 110 may include a plurality of first electrode portions 110-1 and a plurality of second electrode portions 110-2. The first electrode portion 110-1 is electrically connected to the wires 114. The wire 114 can transmit the touch signal sensed by the first sensing electrode 110 to an external circuit. In addition, the second electrode portion 110-2 may be electrically connected to the second sensing electrode 120 located in the visible region 100VA via another wire 112, such as the second axial electrode 104 electrically connected to the second sensing electrode 120. In some embodiments, the touch signal sensed by the second sensing electrode 120 can be transmitted to an external circuit by the wire 112.

The second sensing electrode 120 of the visible area 100VA of the touch panel 100 includes a plurality of first axial electrodes 102 and a plurality of second axial electrodes 104 that are insulatively staggered, such as the first axial electrode 102 and the second axial direction. The directions of the electrodes 104 may be perpendicular to each other, but are not limited thereto. The first axial electrode 102 includes a plurality of first conductive units 102U that are separated from each other and electrically connected via a jumper 106. The second axial electrode 104 includes a plurality of second conductive units 104U. The second conductive units 104U are connected to each other at the jumper 106 via the connecting portion 104C. An insulating block 108 is disposed between the jumper 106 and the connecting portion 104C to insulate. The arrangement of the block 108 can avoid shorting of the intersection of the first axial electrode 102 and the second axial electrode 104.

According to some embodiments of the present disclosure, the first sensing electrode 110 of the non-visible area 100NVA and the jumper 106 of the visible area 100VA are made of the first transparent conductive The layers are formed, and the first conductive unit 102U, the second conductive unit 104U, and the connection portion 104C of the second sensing electrode 120 of the visible region 100VA are formed by the second transparent conductive layer. In addition, as shown in FIG. 2A, in some embodiments, a dummy pattern 103 may also be formed between the first conductive unit 102U and the second conductive unit 104U, and the dummy pattern 103 is also formed by the second transparent conductive layer. And the dummy pattern 103 is electrically isolated from the first conductive unit 102U and the second conductive unit 104U.

In addition, in some embodiments, a dummy pattern 110-3 may be formed between the first electrode portion 110-1 and the second electrode portion 110-2 of the first sensing electrode 110, and the dummy pattern 110-3 is A transparent conductive layer is formed, and the dummy pattern 110-3 is electrically isolated from the first electrode portion 110-1 and the second electrode portion 110-2. The shape of the first conductive unit 102U, the second conductive unit 104U, and the dummy pattern 103 of the second sensing electrode 120 illustrated in FIG. 2A, and the first electrode portion 110-1, the second of the first sensing electrode 110 The shapes of the electrode portion 110-2 and the dummy pattern 110-3 are merely exemplary, and other shapes of the first sensing electrode 110 and other shapes of the second sensing electrode 120 are also applicable to the embodiments of the present disclosure.

In accordance with some embodiments of the present disclosure, an insulating layer 118 is formed over the non-visible region 100NVA to cover the first sensing electrode 110 and the wires 112 and 114. The insulating layer 118 has a thickness of about 1 μm to 1.5 μm, and in some embodiments, is insulated. The thickness of the layer 118 is about 1.25 μm. Since the insulating layer 118 can provide good protection to the first sensing electrode 110 of the non-visible area 100NVA, an optical matching layer is formed in the visible area 100VA and the non-visible area 100NVA (Fig. 2A After the drawing), it is not necessary to additionally form a protective layer in the non-visible area 100NVA to protect the first sensing electrode 110 corresponding to the touch icon area 128, thereby saving one step to form a protective layer process. Step. In addition, in some embodiments, the insulating layer 118 of the non-visible area 100NVA and the insulating block 108 of the visible area 100VA may be formed synchronously by the same layer of insulating material, that is, the insulating layer 118 and the insulating block 108 may be the same insulating material layer. Different parts.

As shown in FIG. 2A, a shielding layer 124 is disposed on the non-visible area 100NVA of the touch panel 100. The material of the shielding layer 124 is an opaque material such as black ink, black photoresist or other color opaque ink or light. The shielding layer 124 can serve as a frame of the touch panel 100 and can shield the lines formed in the non-visible area 100NVA, and the shielding layer 124 can also be used to define the visible area 100VA and the non-visible area 100NVA of the touch panel 100. In some embodiments, the shielding layer 124 is disposed on the four sides of the touch panel 100 around the visible area 100VA; in some other embodiments, the shielding layer 124 is disposed only on one side or two of the touch panel 100. side.

In addition, as shown in FIG. 2A, a touch icon 126 is disposed in the non-visible area 100NVA, and the touch icon 126 is formed by forming a hollow area in the shielding layer 124. In some embodiments, the touch icon 126 can be a button graphic, such as a generally common arrow pattern on the previous page or a house pattern back to the main screen. In some other embodiments, the touch icon 126 can be a logo pattern. For example, the logo of the brand is indicated. In addition, in some embodiments, the opaque or translucent material of the shielding layer 124 may be filled with an opaque or translucent material different from the color of the shielding layer, so that the touch icon 126 has a color display effect, so that the user can distinguish from the touch device. The touch pattern or trademark formed by the hollow region of the shielding layer 124, the material filled in the hollow region of the shielding layer 124 is, for example, a color ink, a color photoresist or a light guiding ink, wherein the color ink may be a mirror silver ink.

FIG. 2B is a partial cross-sectional view of the touch panel along the section line 2-2 ′ of FIG. 2A . In the embodiment in which the touch panel 100 is an OGS structure and a TOL structure, the glass substrate 101 is the touch panel 100 . The protective cover, the first electrode portion 110-1 and the second electrode portion 110-2 of the first sensing electrode 110 are formed on the inner side surface of the glass substrate 101, and the outer surface of the glass substrate 101 serves as a contact surface. In addition, a first electrode portion 110-1 electrically connected to the first sensing electrode 110 is further formed on the inner surface of the glass substrate 101.

In the lower orientation of the glass substrate 101 of FIG. 2B, according to some embodiments of the present disclosure, a shielding layer 124 is formed in the non-visible area 100NVA of the glass substrate 101, and the hollowed-out area formed in the shielding layer 124 constitutes a touch. Icon 126, and as shown in Figure 2B, may be filled with opaque or translucent material in the hollowed out area. A first sensing electrode 110 corresponding to the touch icon area 128 (as shown in FIG. 2A) and a wire 112 electrically connected to the first sensing electrode 110 are formed on the shielding layer 124 and the touch icon 126 (eg, Figure 2A shows) and 114. Further, the non-visible area 100NVA has an insulating layer 118 covering the wires 114 and the first sensing electrode 110, and an optical matching layer 116 above the insulating layer 118. Since the first sensing electrode 110 can be protected by the insulating layer 118, in some embodiments of the present disclosure, no additional protective layers need to be formed over the optical matching layer 116, and the process step of forming a protective layer can be reduced.

In some embodiments, when the touch panel 100 is attached to the display panel, the touch icon area 128 is located outside the bonding area, so that the sensing electrodes corresponding to the touch icon area are affected by the outside if they are not protected. And interference, and problems such as electrostatic discharge damage and scratching are prone to occur. According to some embodiments of the present disclosure, the arrangement of the insulating layer 118 can avoid the first of the touch icon area 128. The sensing electrode 110 is damaged by electrostatic discharge, and may also prevent the first sensing electrode 110 from being scratched.

FIG. 3A is a partially enlarged plan view showing a region A of the touch panel 100 of FIG. 1 according to some embodiments of the present disclosure. The laminated relationship of the plan view shown in FIG. 3A is from the protective cover of the touch panel. The outer surface (ie, the touch surface) is viewed. As shown in FIG. 3A, the non-visible area 100NVA of the touch panel 100 has a first sensing electrode 110 corresponding to the touch icon area 128, and the visible area 100VA of the touch panel 100 has the second sensing electrode 120 as a touch position. The detailed structure of the sensing electrodes, the first sensing electrode 110 and the second sensing electrode 120 is as described above, and the description thereof will not be repeated here.

According to some embodiments of the present disclosure, the first sensing electrode 110 of the non-visible area 100NVA and the jumper 106 of the visible area 100VA are formed by the first transparent conductive layer, and the first of the second sensing electrodes 120 of the visible area 100VA The conductive unit 102U, the second conductive unit 104U, and the connection portion 104C are formed of a second transparent conductive layer.

Additionally, in accordance with some embodiments of the present disclosure, the non-viewable region 100NVA is formed with an insulating layer 118 overlying the first sensing electrode 110, as shown in FIG. 3A, in some embodiments of the present disclosure, the insulating layer 118 has a plurality of openings 119-1 and 119-2 expose a portion of the first sensing electrode 110, wherein the opening 119-1 exposes a portion of the first electrode portion 110-1, and the opening 119-2 exposes the second electrode portion 110-2 A portion of the wire 114 is electrically connected to the first electrode portion 110-1 via the opening 119-1, and the wire 112 is electrically connected to the second electrode portion 110-2 via the opening 119-2, and the wire 112 is also electrically connected to The second axial electrode 104 of the second sensing electrode 120, in the embodiment of FIG. 3A, the wires 112 and 114 are formed in the On the surface of the edge layer 118.

According to an embodiment of the present disclosure, since the first sensing electrode 110 of the non-visible area 100NVA has been protected by the insulating layer 118, after the visible area 100VA and the non-visible area 100NVA form an optical matching layer (not shown in FIG. 3A) There is no need to additionally form a protective layer on the optical matching layer to protect the first sensing electrode 110 of the non-visible area 100NVA, thereby saving a process step of forming a protective layer.

FIG. 3B is a partial cross-sectional view of the touch panel along the section line 3-3 ′ of FIG. 3A . In the embodiment in which the touch panel 100 is an OGS structure and a TOL structure, the glass substrate 101 is used as the touch panel 100 . The protective cover is viewed from the lower side of the glass substrate 101 in FIG. 3B. In some embodiments of the present disclosure, a shielding layer 124 is formed on the invisible region 100NVA of the inner surface of the glass substrate 101, in the shielding layer. The hollowed out area formed in 124 constitutes a touch icon 126, and may be filled with an opaque or translucent material in the hollowed out area, and formed on the shielding layer 124 and the touch icon 126 corresponding to the touch icon area 128 (as shown in FIG. 3A) The first sensing electrode 110 of the first sensing electrode 110, the first electrode portion 110-1 and the second electrode portion 110-2 of the first sensing electrode 110 are formed on the inner side surface of the glass substrate 101, and the outer surface of the glass substrate 101 serves as The touch surface of the touch panel 100. Next, an insulating layer 118 is formed on the non-visible area 100NVA to cover the first sensing electrode 110, and an opening 119-1 is formed in the insulating layer 118 to expose a portion of the first electrode portion 110-1, and the wire 114 is formed on the insulating layer 118. The surface is filled in the opening 119-1 such that the wire 114 is electrically connected to the first electrode portion 110-1 via the opening 119-1. Additionally, an optical matching layer 116 is provided over the insulating layer 118 and the wires 114.

In some embodiments of the present disclosure, corresponding to a touch icon area The first sensing electrode 110 of the 128 is located on a region other than the bonding area of the touch panel 100 and the display panel, and the first sensing electrode 110 can be covered and protected by the insulating layer 118, so the first sensing electrode 110 does not The problem of electrostatic discharge damage and scratching has occurred.

FIG. 4A is a partial plan view of the second sensing electrode 120 located in the visible region 100VA of the touch panel 100 in accordance with some embodiments of the present disclosure. As shown in FIG. 4A, the second sensing electrode 120 includes a plurality of first axial electrodes 102 and a plurality of second axial electrodes 104 in an insulating manner, for example, the first axial electrode 102 and the second axial electrode 104. The directions can be perpendicular to each other, but not limited to this. The first axial electrode 102 includes a plurality of strip-shaped first conductive units 102U that are separated from each other and electrically connected via a jumper 106. The second axial electrode 104 includes a plurality of second conductive units 104U having a block shape with protrusions 104P. The second conductive units 104U are connected to each other at the jumper 106 via the connection portion 104C, at the jumper 106 and the connection portion 104C. An insulating block 108 is disposed therebetween, and the insulating block 108 is disposed to avoid short-circuiting at the intersection of the first axial electrode 102 and the second axial electrode 104.

FIG. 4B is a partial plan view of the second sensing electrode 120 located in the visible region 100VA of the touch panel 100 according to other embodiments of the present disclosure. As shown in FIG. 4B, the second sensing electrode 120 includes a plurality of first axial electrodes 102 and a plurality of second axial electrodes 104 in an insulating manner, for example, the first axial electrode 102 and the second axial electrode 104. The directions can be perpendicular to each other, but not limited to this. The first axial electrode 102 includes a plurality of diamond-shaped first conductive units 102U. The first conductive units 102U are connected to each other via a connecting portion 102C, and the second axial electrode 104 includes a plurality of diamond-shaped second conductive units 104U. The two conductive units 104U are separated from each other, and are connected to each other via the jumper 106 at the connecting portion 102C. An insulating block 108 is disposed between the jumper 106 and the connecting portion 102C, and the insulating block 108 is disposed to avoid the first axial electrode 102 and A short circuit occurs at the intersection of the second axial electrodes 104.

The electrode shape and configuration of the second sensing electrode 120 located in the visible area 100VA of the touch panel 100 shown in FIGS. 4A and 4B are for exemplary purposes only, and the sensing electrodes of the present disclosure are located in the visible area 100VA of the touch panel 100. The shape is not limited to this.

5 is a flow chart showing a method 200 of fabricating a touch panel of FIGS. 2A and 2B in accordance with some embodiments of the present disclosure. Referring to FIGS. 2A and 2B at the same time, in step S201, the substrate 101 is provided. In some embodiments, the touch panel 100 can be a touch panel of an OGS structure or a TOL structure. Therefore, the substrate 101 in FIG. 2B can be used as both a protective cover and a glass substrate carrying the touch sensing component. In some embodiments, the touch panel 100 can be a GG-structured touch panel. Therefore, the substrate 101 in FIG. 2B can be a glass substrate carrying a touch sensing component.

In step S203, a first transparent conductive layer is formed on the substrate 101. The material of the first transparent conductive layer is, for example, indium tin oxide (ITO), indium zinc oxide (IZO), aluminum zinc oxide (AZO) or other suitable transparent conductive material. In addition, in the embodiment in which the substrate 101 is used as the protective cover of the touch panel 100, before the first transparent conductive layer is formed, the shielding layer 124 and the touch icon 126 are formed on the inner surface of the substrate 101.

In step S205, the first transparent conductive layer is patterned to form a non- The first sensing electrode 110 of the visible region 100 NVA. In addition, the jumper 106 of the visible region 100VA can be synchronously formed in step S205, and the patterning step of the first transparent conductive layer can be achieved using a lithography and etching process.

At step S207, the wires 112 and 114 of the non-visible area 100NVA are formed. In some embodiments, the wires 112 and 114 are made of a metallic material or a conductive metal oxide, and the wires 112 and 114 can be formed using a printing process.

In step S209, the insulating layer 118 of the non-visible area 100NVA and the insulating block 108 of the visible area 100VA are formed. In some embodiments, the material of the insulating layer 118 and the insulating block 108 is, for example, a photosensitive photosensitive polyimide (PI), and the insulating layer 118 and the insulating block 108 may be formed using a lithography process.

In step S211, a second transparent conductive layer is formed on the visible region 100VA of the substrate 101. The material of the second transparent conductive layer is, for example, indium tin oxide (ITO), indium zinc oxide (IZO), aluminum zinc oxide (AZO) or other suitable transparent conductive material. In some embodiments, the material of the second transparent conductive layer may be the same as the material of the first transparent conductive layer.

In step S213, the second transparent conductive layer is patterned to form the second sensing electrode 120 of the visible region 100VA, and the patterning step of the second transparent conductive layer can be achieved by using a lithography and etching process.

In step S215, an optical matching layer 116 is formed, the optical matching layer 116 is formed in the visible region 100VA and the non-visible region 100NVA of the touch panel 100, and the optical matching layer 116 covers the insulating layer 118. The refractive index of the optical matching layer 116 is similar to that of the first sensing electrode 110 and the second sensing electrode 120. In some embodiments, the material of the optical matching layer 116 may be an inorganic material and using sputtering. (sputter) process formation. In other embodiments, the material of the optical matching layer 116 can be an organic material and formed using a printing process.

FIG. 6 shows a flow chart of a method 300 of fabricating a touch panel of FIGS. 3A and 3B in accordance with some embodiments of the present disclosure. Referring to FIGS. 3A and 3B simultaneously, in step S301, the substrate 101 is provided. In some embodiments, the touch panel 100 can be an OGS structure or a TOL structure touch panel. Therefore, the substrate 101 shown in FIG. 3B can be used as both a protective cover and a glass substrate carrying the touch sensing component. In other embodiments, the touch panel 100 can be a GG-structured touch panel. Therefore, the substrate 101 shown in FIG. 3B can be a glass substrate carrying a touch sensing component.

In step S303, a first transparent conductive layer is formed on the substrate 101. The material of the first transparent conductive layer is, for example, indium tin oxide (ITO), indium zinc oxide (IZO), aluminum zinc oxide (AZO) or other suitable transparent conductive material. In addition, in some embodiments of the substrate 101 as the protective cover of the touch panel 100, before the first transparent conductive layer is formed, the shielding layer 124 and the touch icon 126 are formed on the inner surface of the substrate 101.

In step S305, the first transparent conductive layer is patterned to form a first sensing electrode 110 of the non-visible area 100NVA. In addition, the jumper 106 of the visible region 100VA can be synchronously formed in step S305, and the patterning step of the first transparent conductive layer can be achieved using a lithography and etching process.

In step S307, the insulating layer 118 of the non-visible area 100NVA and the insulating block 108 of the visible area 100VA are formed, wherein the insulating layer 118 has openings 119-1 and 119-2 exposing a portion of the first sensing electrode 110. In some embodiments, The material of the insulating layer 118 and the insulating block 108 is, for example, a photosensitive photosensitive polyimide (PI), and the insulating layer 118 and the insulating block 108 can be formed using a lithography process, and the opening 119-1 in the insulating layer 118. And 119-2.

In step S309, a second transparent conductive layer is formed on the visible region 100VA of the substrate 101. The material of the second transparent conductive layer is, for example, indium tin oxide (ITO), indium zinc oxide (IZO), aluminum zinc oxide (AZO) or other suitable transparent conductive material. In some embodiments, the material of the second transparent conductive layer may be the same as the material of the first transparent conductive layer.

In step S311, the second transparent conductive layer is patterned to form the second sensing electrode 120 of the visible region 100VA, and the patterning step of the second transparent conductive layer may be achieved using a lithography and etching process.

In step S313, the wires 112 and 114 of the non-visible area 100NVA are formed, and the wires 114 and 112 are electrically connected to the first electrode portion 110 of the first sensing electrode 110 via the openings 119-1 and 119-2 of the insulating layer 118, respectively. 1 and the second electrode portion 110-2. In some embodiments, the wires 112 and 114 are made of a metal material, and the wires 112 and 114 may be formed on the surface of the insulating layer 118 using a printing process, and the wires 114 and 112 are filled in the opening 119-1 of the insulating layer 118, respectively. In 119-2.

In step S315, the optical matching layer 116 is formed. The refractive index of the optical matching layer 116 is similar to that of the first sensing electrode 110 and the second sensing electrode 120, and the optical matching layer 116 can be formed in the visible area of the touch panel 100. 100 VA and non-visible zone 100 NVA, and optical matching layer 116 covers wires 112 and 114 and insulating layer 118.

First sensing in a non-visible area, in accordance with an embodiment of the present disclosure The electrode can be covered by the insulating layer, so that it is not necessary to additionally form a protective layer over the optical matching layer of the non-visible area, so as to avoid the first sensing electrode located as the touch icon in the non-visible area being destroyed by the electrostatic discharge and being scraped. The problem of injury occurred. In addition, the touch panel of the present disclosure can save a process step of forming a protective layer, thereby reducing the manufacturing cost of the touch panel.

While the present invention has been described in its preferred embodiments, it is not intended to limit the invention, and it is understood by those of ordinary skill in the art that Retouching. Accordingly, the scope of the invention is defined by the scope of the appended claims.

100VA‧‧·visible area

100NVA‧‧‧Invisible area

102‧‧‧First axial electrode

102U‧‧‧First Conductive Unit

103, 110-3‧‧‧Dummy design

104‧‧‧Second axial electrode

104U‧‧‧second conductive unit

104C‧‧‧Connecting Department

106‧‧‧ Jumper

108‧‧‧Insulation block

110‧‧‧First sensing electrode

110-1‧‧‧First electrode section

110-2‧‧‧Second electrode section

112, 114‧‧‧ wires

118‧‧‧Insulation

120‧‧‧Second sensing electrode

124‧‧‧Shielding layer

126‧‧‧ touch icon

128‧‧‧Touch icon area

Claims (17)

A touch panel includes: a first sensing electrode disposed in a non-visible area; a second sensing electrode disposed in a visible area, including a first axial electrode and a second axial electrode insulated Interlaced, the first axial electrode comprises a plurality of first conductive units, the second axial electrode comprises a plurality of second conductive units; a wire electrically connected to the first sensing electrode; and an insulating layer covering The first sensing electrode is formed by a first transparent conductive layer, and the first conductive unit and the second conductive unit are formed by a second transparent conductive layer, the first The conductive units are separated from each other and electrically connected via a jumper, the second conductive units are connected to each other via a connection at the jumper, and the jumper is formed by the first transparent conductive layer. The touch panel of claim 1, further comprising an insulating block disposed between the jumper and the connecting portion, the insulating block and the insulating layer being different portions of an insulating material layer, wherein the insulating layer A block is located in the viewable area and the insulating layer is located in the non-visible area. The touch panel of claim 1, further comprising a substrate, wherein the first sensing electrode and the second sensing electrode are formed on the substrate. The touch panel of claim 3, wherein the substrate is a protective cover of the touch panel. The touch panel of claim 1, wherein the insulating layer Covering the wire, the touch panel further includes an optical matching layer disposed between the visible area and the non-visible area, wherein the insulating layer is interposed between the wire and the optical matching layer, and the insulating layer is between the A sensing electrode is interposed between the optical matching layer. The touch panel of claim 1, wherein the insulating layer has an opening exposing a portion of the first sensing electrode, and the wire is electrically connected to the first sensing electrode via the opening. The touch panel of claim 6, further comprising an optical matching layer disposed in the visible area and the non-visible area, wherein the wire is interposed between the insulating layer and the optical matching layer, and the insulating layer Between the first sensing electrode and the optical matching layer. The touch panel of claim 1, wherein the first sensing electrode is disposed in the non-visible area and corresponds to a touch icon area, and the touch icon area is obtained through the first sensing electrode. An operation command of a touch icon. The touch panel of claim 1, wherein the first sensing electrode comprises a first electrode portion and a second electrode portion, the first electrode portion is electrically connected to the wire, and the second The electrode portion is electrically connected to the second sensing electrode via another wire. A method for manufacturing a touch panel, comprising: forming a first transparent conductive layer on a substrate, patterning the first transparent conductive layer, forming a first sensing electrode in a non-visible area; forming a second transparent Conducting a layer on the substrate, patterning the second transparent conductive layer to form a second sensing electrode in a visible region; Forming a wire electrically connected to the first sensing electrode; and forming an insulating layer covering the first sensing electrode, wherein the second sensing electrode comprises a first axial electrode and a second axial electrode Insulatingly staggered, the first axial electrode comprises a plurality of first conductive units separated from each other, the second axial electrode comprises a plurality of second conductive units connected to each other via a connecting portion, and the first transparent conductive layer is patterned The step further includes forming a jumper wire in the visible area, and the jumper is electrically connected to the first conductive units separated from each other. The method for manufacturing a touch panel according to claim 10, further comprising forming an insulating block between the jumper and the connecting portion, and the insulating block and the insulating layer are formed by a layer of insulating material. . The method of manufacturing a touch panel according to claim 10, wherein the wire is formed before the step of forming the insulating layer, and the insulating layer covers the wire. The method for manufacturing a touch panel according to claim 12, further comprising forming an optical matching layer between the visible region and the non-visible region, wherein the insulating layer is interposed between the wire and the optical matching layer, and The insulating layer is interposed between the first sensing electrode and the optical matching layer. The method of manufacturing a touch panel according to claim 10, wherein the wire is formed after the step of forming the insulating layer, and the step of forming the insulating layer includes forming an opening in the insulating layer to expose the first A portion of the sensing electrode. The method of manufacturing the touch panel of claim 14, wherein the wire is filled in the opening of the insulating layer to be electrically connected to the A first sensing electrode, and the wire is formed on a surface of the insulating layer. The method of manufacturing the touch panel of claim 14, further comprising forming an optical matching layer between the visible region and the non-visible region, wherein the wire is interposed between the insulating layer and the optical matching layer, and The insulating layer is interposed between the first sensing electrode and the optical matching layer. The method of manufacturing the touch panel of claim 10, wherein the first sensing electrode comprises a first electrode portion and a second electrode portion, the first electrode portion being electrically connected to the wire, and The method further includes forming another wire to electrically connect the second electrode portion to the second sensing electrode.