CN106155387B - Touch panel and manufacturing method thereof - Google Patents

Touch panel and manufacturing method thereof Download PDF

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Publication number
CN106155387B
CN106155387B CN201510166232.9A CN201510166232A CN106155387B CN 106155387 B CN106155387 B CN 106155387B CN 201510166232 A CN201510166232 A CN 201510166232A CN 106155387 B CN106155387 B CN 106155387B
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China
Prior art keywords
sensing electrode
layer
electrode
touch panel
conductive
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CN201510166232.9A
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Chinese (zh)
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CN106155387A (en
Inventor
谢燕俊
吴成志
余晶
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TPK Touch Solutions Xiamen Inc
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TPK Touch Solutions Xiamen Inc
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Priority to CN201510166232.9A priority Critical patent/CN106155387B/en
Priority to TW104212577U priority patent/TWM514048U/en
Priority to TW104125357A priority patent/TWI579742B/en
Publication of CN106155387A publication Critical patent/CN106155387A/en
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Abstract

The invention discloses a touch panel and a manufacturing method thereof, wherein the touch panel comprises a first sensing electrode arranged in a non-visible area and a second sensing electrode arranged in a visible area, the second sensing electrode comprises a first axial electrode and a second axial electrode which are in insulating stagger, the first axial electrode comprises a plurality of first conductive units, the second axial electrode comprises a plurality of second conductive units, the touch panel further comprises a wire which is electrically connected to the first sensing electrode, and an insulating layer covers the first sensing electrode, wherein the first sensing electrode is formed by a first transparent conductive layer, and the first conductive unit and the second conductive unit are formed by a second transparent conductive layer.

Description

Touch panel and manufacturing method thereof
Technical Field
The present invention relates to touch technology, and more particularly, to a touch icon structure located in a non-visual area of a touch panel and a method for manufacturing the touch panel.
Background
In recent years, touch panels have gradually become the most dominant input interface, and are widely used in various electronic products, such as mobile phones, personal Digital Assistants (PDAs), or palm-sized personal computers. The touch sensing component of the touch panel can comprise a plurality of sensing electrodes arranged in rows and a plurality of sensing electrodes arranged in columns in an insulating and staggered manner, and the sensing electrodes arranged in the rows and the columns can detect touch positions and are positioned in a visible area of the touch panel.
The sensing electrodes arranged in rows and columns may be formed of the same transparent conductive layer or two transparent conductive layers, respectively, and when the sensing electrodes are formed on one glass substrate and another protective glass is coated thereon, such a touch panel is called a double glass (GG) structured touch panel. In another structure of a touch panel, in which the sensing electrodes arranged in rows and columns are formed of the same transparent conductive layer and formed on a cover glass, the touch panel is called a monolithic glass solution (on glass solution; OGS) structure or a touch panel of a touch on cover glass (TOL) structure.
In addition, a touch icon (icon) can be formed in the non-visual area of the touch panel, when the touch panel is attached to the display panel, the touch icon area is located outside the attaching area, in detail, due to the requirement of structural design, when the touch panel is attached to the display panel, attaching glue is not coated in the area corresponding to the touch icon, so that the touch icon is not in the attaching area, and therefore, the sensing electrode corresponding to the touch icon area is affected and disturbed by the outside, and problems such as electrostatic discharge (electrostatic discharge; ESD) damage and scratch are easy to occur.
Disclosure of Invention
In view of the above-mentioned problems of the prior art, the present invention provides a touch panel and a manufacturing method thereof, which can improve the lamination structure of the non-visible region without increasing the manufacturing process steps of the touch panel, so that the sensing electrode located in the non-visible region corresponding to the touch icon region is well protected, thereby preventing the sensing electrode from being damaged by electrostatic discharge and also preventing the sensing electrode from being scratched.
According to some embodiments of the present invention, there is provided a touch panel including: the first sensing electrode is arranged in the invisible area, the second sensing electrode is arranged in the visible area, the second sensing electrode comprises a first axial electrode and a second axial electrode which are in insulating stagger, the first axial electrode comprises a plurality of first conductive units, the second axial electrode comprises a plurality of second conductive units, the conducting wire is electrically connected to the first sensing electrode, and the insulating layer covers the first sensing electrode, wherein the first sensing electrode is formed by a first transparent conductive layer, and the first conductive units and the second conductive units are formed by a second transparent conductive layer.
According to some embodiments of the present invention, there is provided a method for manufacturing a touch panel, the method including: forming a first transparent conductive layer on a substrate, patterning the first transparent conductive layer, and forming a first sensing electrode in a non-visible area; forming a second transparent conductive layer on the substrate, patterning the second transparent conductive layer, and forming a second sensing electrode in the visible area; forming a wire electrically connected to the first sensing electrode; an insulating layer is formed to cover the first sensing electrode.
Drawings
FIG. 1 is a schematic plan view of a touch panel;
FIG. 2A is an enlarged schematic view of a portion of a region A of the touch panel of FIG. 1 according to some embodiments of the present invention;
FIG. 2B is a schematic partial cross-sectional view of the touch panel along the section line 2-2' of FIG. 2A according to some embodiments of the present invention;
FIG. 3A is an enlarged schematic view of a portion of a region A of the touch panel of FIG. 1 according to other embodiments of the present invention;
FIG. 3B is a schematic partial cross-sectional view of the touch panel along the section line 3-3' of FIG. 3A according to other embodiments of the present invention;
FIG. 4A is a schematic partial plan view of a sensing electrode of a touch panel according to some embodiments of the present invention;
FIG. 4B is a schematic partial plan view of a sensing electrode in a visible region of a touch panel according to other embodiments of the present invention;
FIG. 5 is a flowchart illustrating a method for manufacturing the touch panel of FIGS. 2A and 2B according to some embodiments of the present invention; and
fig. 6 is a flowchart illustrating a method for manufacturing the touch panel of fig. 3A and 3B according to other embodiments of the present invention.
Symbol description
100-touch panel;
100 VA-visible area;
100NVA to non-visible area;
101 to a substrate;
102 to a first axial electrode;
102C to a connecting part;
102U to a first conductive unit;
103. 110-3 to dummy pattern;
104 to a second axial electrode;
104U-second conductive units;
104C to a connecting part;
104P to the protruding portion;
106-jumper wires;
108-insulating blocks;
110-a first sensing electrode;
110-1 to a first electrode portion;
110-2 to a second electrode portion;
112. 114-conducting wires;
116-an optical matching layer;
118 to an insulating layer;
119-1 and 119-2 to an opening;
120-second sensing electrodes;
124 to a shielding layer;
126-touch icons;
128-touch icon area;
200. 300-touch panel manufacturing method;
S201-S215, S301-S315 to each step of the manufacturing method
Detailed Description
Fig. 1 is a schematic plan view of a touch panel 100, where the touch panel 100 has a visual area (view area) 100VA and a non-visual area (non-visual area) 100NVA, the non-visual area 100NVA is located around the periphery of the touch panel 100, and a plurality of first axial electrodes and a plurality of second axial electrodes are formed around the visual area 100VA in the visual area 100VA, and the first axial electrodes and the second axial electrodes are staggered in an insulating manner, and touch positions can be detected through the first axial electrodes and the second axial electrodes. In addition, a plurality of touch icons may be formed in the non-visual area 100NVA, and these touch icons (icon) are correspondingly designed with key functions, and by detecting whether the touch icon area corresponding to the touch icon is touched, the operation instruction represented by the touch map object may be obtained.
The embodiment of the invention provides a touch panel 100 and a manufacturing method thereof, wherein under the condition that the manufacturing process steps of the touch panel 100 are not increased, a first transparent conductive layer is utilized to form a sensing electrode positioned in a non-visual area 100NVA corresponding to a touch icon area, and an insulating layer is utilized to cover the sensing electrode of the non-visual area 100NVA to achieve a protection effect, so that the manufacturing process steps of forming a protection layer in the non-visual area 100NVA can be saved, and meanwhile, the effects of preventing the sensing electrode positioned in the non-visual area 100NVA corresponding to the touch icon area from being damaged by electrostatic discharge and from being scratched can be achieved.
Fig. 2A is a schematic enlarged partial plan view of an area a of the touch panel 100 of fig. 1, and the stacked relationship of the plan views shown in fig. 2A is seen from an outer side surface (i.e., a touch surface) of a protective cover of the touch panel according to some embodiments of the present invention. As shown in fig. 2A, the non-visual area 100NVA of the touch panel 100 has the first sensing electrode 110, the visual area 100VA of the touch panel 100 has the second sensing electrode 120, although fig. 2A only depicts one first sensing electrode 110, in fact, the non-visual area 100NVA may have a plurality of first sensing electrodes 110, each first sensing electrode 110 corresponds to one touch icon area 128, and each touch icon area 128 has a touch icon (icon) 126, and these touch icons 126 are correspondingly designed with a key function, and whether the touch icon area 128 is touched is detected by the first sensing electrode 110, so as to determine whether the operation command represented by the touch icon 126 needs to be executed. In some embodiments, the first sensing electrode 110 may include a plurality of first electrode portions 110-1 and a plurality of second electrode portions 110-2, the first electrode portions 110-1 are electrically connected with the conductive wires 114, and the touch signal sensed by the first sensing electrode 110 may be transmitted to an external circuit through the conductive wires 114. In addition, the second electrode portion 110-2 may be electrically connected to the second sensing electrode 120 located at the viewing area 100VA via another wire 112, for example, electrically connected to the second axial electrode 104 of the second sensing electrode 120. In some embodiments, the touch signal sensed by the second sensing electrode 120 can be transmitted to an external circuit through the conductive wire 112.
The second sensing electrode 120 of the visual area 100VA of the touch panel 100 includes a plurality of first axial electrodes 102 and a plurality of second axial electrodes 104, which are arranged in an insulating and staggered manner, for example, the directions of the first axial electrodes 102 and the second axial electrodes 104 may be perpendicular to each other, but not limited thereto. The first axial electrode 102 includes a plurality of first conductive units 102U, which are separated from each other and electrically connected via a jumper 106. The second axial electrode 104 includes a plurality of second conductive units 104U, the second conductive units 104U are connected to each other at the jumper wire 106 via a connection portion 104C, and an insulating block 108 is disposed between the jumper wire 106 and the connection portion 104C, and the insulating block 108 is disposed to avoid a short circuit at the intersection of the first axial electrode 102 and the second axial electrode 104.
According to some embodiments of the present invention, the first sensing electrode 110 of the non-visual area 100NVA and the jumper 106 of the visual area 100VA are formed of a first transparent conductive layer, and the first conductive unit 102U, the second conductive unit 104U and the connection portion 104C of the second sensing electrode 120 of the visual area 100VA are formed of a second transparent conductive layer. In addition, as shown in fig. 2A, in some embodiments, a dummy pattern 103 may be further formed between the first conductive unit 102U and the second conductive unit 104U, the dummy pattern 103 is also formed by the second transparent conductive layer, and the dummy pattern 103 is electrically isolated from the first conductive unit 102U and the second conductive unit 104U.
Furthermore, in some embodiments, a dummy pattern 110-3 may also be formed between the first electrode portion 110-1 and the second electrode portion 110-2 of the first sensing electrode 110, the dummy pattern 110-3 is formed of the first transparent conductive layer, and the dummy pattern 110-3 is electrically isolated from the first electrode portion 110-1 and the second electrode portion 110-2. The shapes of the first conductive unit 102U, the second conductive unit 104U, and the dummy pattern 103 of the second sensing electrode 120, and the shapes of the first electrode portion 110-1, the second electrode portion 110-2, and the dummy pattern 110-3 of the first sensing electrode 110 are shown in fig. 2A for exemplary purposes only, and the first sensing electrode 110 and the second sensing electrode 120 of other shapes are also suitable for embodiments of the present invention.
According to some embodiments of the present invention, after the non-visible region 100NVA is formed with the insulating layer 118 covering the first sensing electrode 110 and the conductive lines 112 and 114, the thickness of the insulating layer 118 is about 1 μm to 1.5 μm, and in some embodiments, the thickness of the insulating layer 118 is about 1.25 μm, and since the insulating layer 118 can provide good protection for the first sensing electrode 110 of the non-visible region 100NVA, after the optical matching layer (not depicted in fig. 2A) is formed between the visible region 100VA and the non-visible region 100NVA, there is no need to form a protection layer on the non-visible region 100NVA to protect the first sensing electrode 110 corresponding to the touch icon region 128, so that the manufacturing process steps of forming the protection layer can be saved. Furthermore, in some embodiments, the insulating layer 118 of the non-viewable area 100NVA and the insulating block 108 of the viewable area 100VA may be formed simultaneously from the same layer of insulating material, i.e., the insulating layer 118 and the insulating block 108 may be different portions of the same layer of insulating material.
As shown in fig. 2A, a shielding layer 124 is disposed on the non-visible area 100NVA of the touch panel 100, and the material of the shielding layer 124 is an opaque material, such as black ink, black photoresist, or opaque ink or photoresist of other colors, and the shielding layer 124 may be used as a frame of the touch panel 100 and may shield the circuit formed on the non-visible area 100NVA, and meanwhile, the shielding layer 124 may also be used to define the visible area 100VA and the non-visible area 100NVA of the touch panel 100. In some embodiments, the shielding layer 124 is disposed around the visible area 100VA on four sides of the touch panel 100; in some other embodiments, the shielding layer 124 is disposed on only one side or both sides of the touch panel 100.
In addition, as shown in fig. 2A, a touch icon 126 is disposed in the non-visible area 100NVA, and the touch icon 126 is displayed by forming a hollowed-out area on the shielding layer 124. In some embodiments, the touch icons 126 may be key graphics, such as an arrow pattern for a page back or a house pattern for a home screen, which is generally common, and in some other embodiments, the touch icons 126 may be trademark patterns, such as a branding pattern, etc. In addition, in some embodiments, the hollowed-out area of the shielding layer 124 may be filled with an opaque or translucent material having a color different from that of the shielding layer, so that the touch icon 126 has a color display effect, so that a user can distinguish a touch pattern or a trademark formed by the hollowed-out area of the shielding layer 124 from the touch device, and the material filled in the hollowed-out area of the shielding layer 124 is, for example, color ink, color photoresist or light guide ink, wherein the color ink may be a mirror silver ink.
Fig. 2B is a schematic partial cross-sectional view of the touch panel along the cross-sectional line 2-2' of fig. 2A, in which the glass substrate 101 is a protective cover of the touch panel 100 in the embodiment of the touch panel 100 with the OGS structure and the TOL structure, the first electrode portion 110-1 and the second electrode portion 110-2 of the first sensing electrode 110 are formed on the inner surface of the glass substrate 101, and the outer surface of the glass substrate 101 is used as a touch surface. In addition, a first electrode portion 110-1, in which a wire 114 is electrically connected to the first sensing electrode 110, is also formed on the inner side surface of the glass substrate 101.
With the glass substrate 101 of fig. 2B oriented downward, according to some embodiments of the present invention, a shielding layer 124 is formed in the non-visible area 100NVA of the glass substrate 101, the hollowed-out area formed in the shielding layer 124 constitutes a touch icon 126, and as shown in fig. 2B, the hollowed-out area may be filled with an opaque or translucent material. First sensing electrodes 110 corresponding to the touch icon areas 128 (shown in fig. 2A) and conductive lines 112 (shown in fig. 2A) and 114 electrically connected to the first sensing electrodes 110 are formed on the shielding layer 124 and the touch icons 126. In addition, NVA has an insulating layer 118 over the conductive lines 114 and the first sensing electrodes 110 in the non-viewable area 100, and an optical matching layer 116 over the insulating layer 118. Since the first sensing electrode 110 can be protected by the insulating layer 118, in some embodiments of the present invention, no additional protective layer is required to be formed over the optical matching layer 116, and one step of the process for forming the protective layer can be reduced.
In some embodiments, when the touch panel 100 is attached to the display panel, the touch icon area 128 is located outside the attaching area, so that the sensing electrode corresponding to the touch icon area is not protected and is affected and disturbed by the outside, and the problems of electrostatic discharge damage and scratch easily occur.
Fig. 3A is a schematic enlarged partial plan view of an area a of the touch panel 100 of fig. 1, and the stacked relationship of the plan views shown in fig. 3A is seen from an outer side surface (i.e., a touch surface) of a protective cover of the touch panel according to some embodiments of the present invention. As shown in fig. 3A, the non-visible area 100NVA of the touch panel 100 has the first sensing electrode 110 corresponding to the touch icon area 128, and the visible area 100VA of the touch panel 100 has the second sensing electrode 120 as the sensing electrode of the touch position, and the detailed structures of the first sensing electrode 110 and the second sensing electrode 120 are as described above and will not be repeated here.
According to some embodiments of the present invention, the first sensing electrode 110 of the non-visual area 100NVA and the jumper 106 of the visual area 100VA are formed of a first transparent conductive layer, and the first conductive unit 102U, the second conductive unit 104U and the connection portion 104C of the second sensing electrode 120 of the visual area 100VA are formed of a second transparent conductive layer.
In addition, according to some embodiments of the present invention, the non-visual area 100NVA is formed with an insulating layer 118 covering the first sensing electrode 110, as shown in FIG. 3A, in some embodiments of the present invention, the insulating layer 118 has a plurality of openings 119-1 and 119-2 exposing a portion of the first sensing electrode 110, wherein the opening 119-1 exposes a portion of the first electrode portion 110-1, the opening 119-2 exposes a portion of the second electrode portion 110-2, the wire 114 is electrically connected to the first electrode portion 110-1 via the opening 119-1, the wire 112 is electrically connected to the second electrode portion 110-2 via the opening 119-2, and the wire 112 is also electrically connected to the second axial electrode 104 of the second sensing electrode 120, in the embodiment of FIG. 3A, the wires 112 and 114 are formed on a surface of the insulating layer 118.
According to the embodiment of the invention, since the first sensing electrode 110 of the non-visible area 100NVA is already protected by the insulating layer 118, after the optical matching layer (not shown in fig. 3A) is formed between the visible area 100VA and the non-visible area 100NVA, an additional protective layer is not required to be formed on the optical matching layer to protect the first sensing electrode 110 of the non-visible area 100NVA, thereby saving a manufacturing process step for forming the protective layer.
Fig. 3B is a schematic partial cross-sectional view of the touch panel along the section line 3-3' of fig. 3A, in which, in the embodiment of the touch panel 100 with the OGS structure and the TOL structure, the glass substrate 101 is used as a protective cover plate of the touch panel 100, and the glass substrate 101 in fig. 3B is seen in a downward direction, in some embodiments of the present invention, a shielding layer 124 is formed on the non-visible area 100NVA of the inner side surface of the glass substrate 101, the hollowed-out area formed in the shielding layer 124 constitutes a touch icon 126, and opaque or semitransparent materials may be filled in the hollowed-out area, and a first sensing electrode 110 corresponding to the touch icon area 128 (as shown in fig. 3A) is formed on the shielding layer 124 and the touch icon 126, and a first electrode portion 110-1 and a second electrode portion 110-2 of the first sensing electrode 110 are formed on the inner side surface of the glass substrate 101, and the outer side surface of the glass substrate 101 is used as a contact surface of the touch panel 100. Next, an insulating layer 118 is formed on the non-visual area 100NVA to cover the first sensing electrode 110, and an opening 119-1 is formed in the insulating layer 118 to expose a portion of the first electrode portion 110-1, and a wire 114 is formed on a surface of the insulating layer 118 and filled in the opening 119-1 such that the wire 114 is electrically connected to the first electrode portion 110-1 via the opening 119-1. In addition, an optical matching layer 116 is provided on the insulating layer 118 and the wire 114.
In some embodiments of the present invention, the first sensing electrode 110 corresponding to the touch icon area 128 is located on an area outside the bonding area of the touch panel 100 and the display panel, and the first sensing electrode 110 may be covered and protected by the insulating layer 118, so that the first sensing electrode 110 is not damaged by electrostatic discharge and scratched.
Fig. 4A is a schematic partial plan view of the second sensing electrode 120 located in the visual area 100VA of the touch panel 100 according to some embodiments of the invention. As shown in fig. 4A, the second sensing electrode 120 includes a plurality of first axial electrodes 102 and a plurality of second axial electrodes 104, which are arranged in an insulating and staggered manner, for example, the directions of the first axial electrodes 102 and the second axial electrodes 104 may be perpendicular to each other, but not limited thereto. The first axial electrode 102 includes a plurality of stripe-shaped first conductive units 102U, and the first conductive units 102U are separated from each other and electrically connected via the jumper wires 106. The second axial electrode 104 includes a plurality of second conductive units 104U in the form of blocks having protruding portions 104P, the second conductive units 104U are connected to each other at the jumper wires 106 via connection portions 104C, and an insulating block 108 is provided between the jumper wires 106 and the connection portions 104C, and the insulating block 108 is provided to avoid a short circuit at the intersection of the first axial electrode 102 and the second axial electrode 104.
Fig. 4B is a schematic partial plan view of the second sensing electrode 120 located in the visual area 100VA of the touch panel 100 according to other embodiments of the invention. As shown in fig. 4B, the second sensing electrode 120 includes a plurality of first axial electrodes 102 and a plurality of second axial electrodes 104, which are arranged in an insulating and staggered manner, for example, the directions of the first axial electrodes 102 and the second axial electrodes 104 may be perpendicular to each other, but not limited thereto. The first axial electrode 102 includes a plurality of diamond-shaped first conductive units 102U, the first conductive units 102U are connected to each other via a connection portion 102C, the second axial electrode 104 includes a plurality of diamond-shaped second conductive units 104U, the second conductive units 104U are separated from each other and connected to each other at the connection portion 102C via a jumper wire 106, an insulating block 108 is provided between the jumper wire 106 and the connection portion 102C, and the insulating block 108 is configured to avoid a short circuit at a crossing of the first axial electrode 102 and the second axial electrode 104.
The electrode shape and configuration of the second sensing electrode 120 located in the visual area 100VA of the touch panel 100 shown in fig. 4A and 4B are only used as examples, and the shape of the sensing electrode located in the visual area 100VA of the touch panel 100 is not limited thereto.
Fig. 5 is a flowchart illustrating a method 200 for manufacturing the touch panel of fig. 2A and 2B according to some embodiments of the invention. Referring to fig. 2A and 2B, in step S201, a substrate 101 is provided. In some embodiments, the touch panel 100 may be an OGS structure or a TOL structure touch panel, so the substrate 101 in fig. 2B may be a glass substrate for both protecting the cover plate and carrying the touch sensing device. In some embodiments, the touch panel 100 may be a GG touch panel, and thus the substrate 101 in fig. 2B may be a glass substrate carrying touch sensing components.
In step S203, a first transparent conductive layer is formed on the substrate 101. The material of the first transparent conductive layer is, for example, indium Tin Oxide (ITO), indium zinc oxide (indium zinc oxide; IZO), aluminum zinc oxide (aluminum zinc oxide; AZO), or other suitable transparent conductive materials. In addition, in the embodiment in which the substrate 101 is used as the protective cover of the touch panel 100, the shielding layer 124 and the touch icons 126 are formed on the inner side surface of the substrate 101 before the first transparent conductive layer is formed.
In step S205, the first transparent conductive layer is patterned to form the first sensing electrode 110 of the non-visible area 100NVA. In addition, in step S205, the jumper 106 of the visible region 100VA is formed simultaneously, and the patterning step of the first transparent conductive layer may be achieved by using photolithography and etching processes.
In step S207, the wires 112 and 114 of the non-visible area 100NVA are formed. In some embodiments, the material of the conductive lines 112 and 114 is a metal material or a conductive metal oxide, and the conductive lines 112 and 114 may be formed using a printing process.
In step S209, the insulating layer 118 of the non-visual area 100NVA and the insulating block 108 of the visual area 100VA are formed. In some embodiments, the material of the insulating layer 118 and the insulating block 108 is, for example, photosensitive Polyimide (PI), and the insulating layer 118 and the insulating block 108 may be formed simultaneously using a photolithography process.
In step S211, a second transparent conductive layer is formed on the visible region 100VA of the substrate 101. The material of the second transparent conductive layer is, for example, indium Tin Oxide (ITO), indium zinc oxide (indium zinc oxide; IZO), aluminum zinc oxide (aluminum zinc oxide; AZO), or other suitable transparent conductive materials. In some embodiments, the material of the second transparent conductive layer may be the same as the material of the first transparent conductive layer.
In step S213, the second transparent conductive layer is patterned to form the second sensing electrode 120 with the visible area of 100VA, and the patterning step of the second transparent conductive layer can be achieved by using photolithography and etching processes.
In step S215, the optical matching layer 116 is formed on the visible area 100VA and the non-visible area 100NVA of the touch panel 100, and the optical matching layer 116 covers the insulating layer 118. The refractive index of the optical matching layer 116 is similar to the refractive index of the first sensing electrode 110 and the second sensing electrode 120, and in some embodiments, the material of the optical matching layer 116 may be an inorganic material and formed using a sputtering (dispenser) fabrication process. In other embodiments, the material of the optical matching layer 116 may be an organic material and formed using a printing (printing) fabrication process.
Fig. 6 is a flowchart illustrating a method 300 for manufacturing the touch panel of fig. 3A and 3B according to some embodiments of the invention. Referring to fig. 3A and 3B, in step S301, a substrate 101 is provided. In some embodiments, the touch panel 100 may be an OGS or TOL touch panel, so the substrate 101 shown in fig. 3B may be a glass substrate for both protecting the cover plate and carrying the touch sensing device. In other embodiments, the touch panel 100 may be a GG touch panel, and thus the substrate 101 shown in fig. 3B may be a glass substrate carrying touch sensing components.
In step S303, a first transparent conductive layer is formed on the substrate 101. The material of the first transparent conductive layer is, for example, indium Tin Oxide (ITO), indium zinc oxide (indium zinc oxide; IZO), aluminum zinc oxide (aluminum zinc oxide; AZO), or other suitable transparent conductive materials. In addition, in some embodiments in which the substrate 101 is used as a protective cover of the touch panel 100, the shielding layer 124 and the touch icons 126 are formed on the inner surface of the substrate 101 before the first transparent conductive layer is formed.
In step S305, the first transparent conductive layer is patterned to form the first sensing electrode 110 of the non-visible area 100NVA. In addition, in step S305, the jumper 106 with the visible region 100VA can be formed simultaneously, and the patterning step of the first transparent conductive layer can be achieved by using photolithography and etching processes.
In step S307, the insulating layer 118 of the non-visual area 100NVA and the insulating block 108 of the visual area 100VA are formed, wherein the insulating layer 118 has openings 119-1 and 119-2 exposing a portion of the first sensing electrode 110. In some embodiments, the material of the insulating layer 118 and the insulating block 108 is, for example, photosensitive Polyimide (PI), and the insulating layer 118 and the insulating block 108, and the openings 119-1 and 119-2 in the insulating layer 118, may be formed simultaneously using a photolithography process.
In step S309, a second transparent conductive layer is formed on the visible area 100VA of the substrate 101. The material of the second transparent conductive layer is, for example, indium Tin Oxide (ITO), indium zinc oxide (indium zinc oxide; IZO), aluminum zinc oxide (aluminum zinc oxide; AZO), or other suitable transparent conductive materials. In some embodiments, the material of the second transparent conductive layer may be the same as the material of the first transparent conductive layer.
In step S311, the second transparent conductive layer is patterned to form the second sensing electrode 120 with the visible area of 100VA, and the patterning step of the second transparent conductive layer can be achieved by using photolithography and etching processes.
In step S313, the conductive lines 112 and 114 of the NVA of the non-visual area 100 are formed, and the conductive lines 114 and 112 are electrically connected to the first electrode portion 110-1 and the second electrode portion 110-2 of the first sensing electrode 110 via the openings 119-1 and 119-2 of the insulating layer 118, respectively. In some embodiments, the material of the conductive lines 112 and 114 is a metal material, the conductive lines 112 and 114 may be formed on the surface of the insulating layer 118 using a printing process, and the conductive lines 114 and 112 are filled in the openings 119-1 and 119-2 of the insulating layer 118, respectively.
In step S315, the optical matching layer 116 is formed, the refractive index of the optical matching layer 116 is similar to the refractive index of the first sensing electrode 110 and the second sensing electrode 120, the optical matching layer 116 may be formed in the visible region 100VA and the non-visible region 100NVA of the touch panel 100, and the optical matching layer 116 covers the conductive lines 112 and 114 and the insulating layer 118.
According to the embodiment of the invention, the first sensing electrode positioned in the non-visible area can be covered and protected by the insulating layer, so that the problems that the first sensing electrode positioned in the non-visible area as a touch control image target is damaged by electrostatic discharge and scratched can be avoided without additionally forming a protective layer above the optical matching layer of the non-visible area. In addition, the touch panel can save a manufacturing process step of forming the protective layer, thereby reducing the manufacturing cost of the touch panel.
Although the invention has been described in connection with the preferred embodiments, it will be understood by those skilled in the art that various changes, modifications and alterations may be made without departing from the spirit and scope of the invention. Accordingly, the scope of the invention should be determined from the following claims.

Claims (18)

1. A touch panel, comprising:
the first sensing electrode is arranged in a non-visible area;
the second sensing electrode is arranged in a visible area and comprises a first axial electrode and a second axial electrode which are staggered in an insulating way, wherein the first axial electrode comprises a plurality of first conductive units, and the second axial electrode comprises a plurality of second conductive units;
a wire electrically connected to the first sensing electrode; and
an insulating layer disposed in the invisible region and covering the first sensing electrode and the conductive wire,
wherein the first sensing electrode is formed by a first transparent conductive layer, the first conductive units and the second conductive units are formed by a second transparent conductive layer,
the first sensing electrode includes a first electrode portion and a second electrode portion, the first electrode portion is electrically connected with the conductive wire, and the second electrode portion is electrically connected to the second sensing electrode via another conductive wire.
2. The touch panel of claim 1, wherein the first conductive units are separated from each other and electrically connected via a jumper line, the second conductive units are connected to each other via a connection portion at the jumper line, and the jumper line is formed of the first transparent conductive layer.
3. The touch panel of claim 2, further comprising an insulating block disposed between the jumper and the connection portion, the insulating block and the insulating layer being different portions of a layer of insulating material, wherein the insulating block is located in the viewing area.
4. The touch panel of claim 1, further comprising a substrate, wherein the first sensing electrode and the second sensing electrode are formed on the substrate.
5. The touch panel of claim 4, wherein the substrate is a protective cover plate of the touch panel.
6. The touch panel of claim 1, further comprising an optical matching layer disposed between the visible region and the non-visible region, wherein the insulating layer is interposed between the conductive line and the optical matching layer, and the insulating layer is interposed between the first sensing electrode and the optical matching layer.
7. The touch panel of claim 1, wherein the insulating layer has an opening exposing a portion of the first sensing electrode, and the conductive line is electrically connected to the first sensing electrode through the opening.
8. The touch panel of claim 7, further comprising an optical matching layer disposed between the visible region and the non-visible region, wherein the conductive line is interposed between the insulating layer and the optical matching layer, and the insulating layer is interposed between the first sensing electrode and the optical matching layer.
9. The touch panel of claim 1, wherein the first sensing electrode is disposed in the non-visible region and corresponds to a touch icon region, and a touch map target operation command in the touch icon region is obtained through the first sensing electrode.
10. A method for manufacturing a touch panel, comprising:
forming a first transparent conductive layer on a substrate, patterning the first transparent conductive layer to form a first sensing electrode located in a non-visible area;
forming a second transparent conductive layer on the substrate, patterning the second transparent conductive layer to form a second sensing electrode located in a visible area;
forming a wire electrically connected to the first sensing electrode; and
forming an insulating layer on the invisible region to cover the first sensing electrode and the conductive wire,
the first sensing electrode includes a first electrode portion and a second electrode portion, the first electrode portion being electrically connected to the conductive line, and further including forming another conductive line to electrically connect the second electrode portion to the second sensing electrode.
11. The method of claim 10, wherein the second sensing electrode comprises a first axial electrode and a second axial electrode, the first axial electrode comprises a plurality of first conductive units separated from each other, and the second axial electrode comprises a plurality of second conductive units connected to each other via a connection portion.
12. The method of claim 11, wherein patterning the first transparent conductive layer further comprises forming a jumper wire in the visible region, the jumper wire electrically connecting the first conductive units separated from each other.
13. The method of claim 12, further comprising forming an insulating block between the jumper and the connection portion, wherein the insulating block and the insulating layer are formed simultaneously from a layer of insulating material.
14. The method of claim 10, wherein the conductive line is formed before the step of forming the insulating layer.
15. The method of claim 14, further comprising forming an optical matching layer between the visible region and the non-visible region, wherein the insulating layer is interposed between the conductive line and the optical matching layer, and the insulating layer is interposed between the first sensing electrode and the optical matching layer.
16. The method of claim 10, wherein the conductive line is formed after the step of forming the insulating layer, and the step of forming the insulating layer includes forming an opening in the insulating layer to expose a portion of the first sensing electrode.
17. The method of claim 16, wherein the conductive line is filled in the opening of the insulating layer to be electrically connected to the first sensing electrode, and the conductive line is formed on the surface of the insulating layer.
18. The method of claim 16, further comprising forming an optical matching layer between the visible region and the non-visible region, wherein the conductive line is between the insulating layer and the optical matching layer, and the insulating layer is between the first sensing electrode and the optical matching layer.
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