CN103487984A - Color film substrate, display panel and manufacturing method of color film substrate - Google Patents
Color film substrate, display panel and manufacturing method of color film substrate Download PDFInfo
- Publication number
- CN103487984A CN103487984A CN201310452186.XA CN201310452186A CN103487984A CN 103487984 A CN103487984 A CN 103487984A CN 201310452186 A CN201310452186 A CN 201310452186A CN 103487984 A CN103487984 A CN 103487984A
- Authority
- CN
- China
- Prior art keywords
- protective seam
- touch
- control electrode
- color membrane
- membrane substrates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Abstract
The invention discloses a color film substrate, a display panel and a manufacturing method of the color film substrate. The color film substrate comprises an underlayer substrate, a black matrix pattern and a colored matrix pattern, the black matrix pattern and the colored matrix pattern are formed on the underlayer substrate, a touch electrode is formed on the black matrix pattern, a first protecting layer is formed above the touch electrode, and a second protecting layer is formed between the black matrix pattern and the touch electrode. In the technical scheme, the first protecting layer is formed above the touch electrode, the second protecting layer is formed between the black matrix pattern and the touch electrode, and the first protecting layer and the second protecting layer are used for protecting the touch electrode to avoid technological processes of other pattern structures above and below the touch electrode from exerting influences on the touch electrode, so that the touch electrode is avoided from being in a short circuit and an open circuit.
Description
Technical field
The present invention relates to the display technique field, particularly the manufacture method of a kind of color membrane substrates, display panel and color membrane substrates.
Background technology
Along with updating of display panel technology and processing procedure, the research of contact panel and liquid crystal panel being carried out to integrated integration is increasingly popular.Contact panel can be divided into according to forming structure: contact panel (On Cell Touch Panel) and embedded touch control panel (In Cell Touch Panel) on external hanging touch panel (Add On Mode Touch Panel), panel.With respect to external hanging touch panel, on panel, the application of contact panel and embedded touch control panel more and more extensively also becomes the contact panel of main flow gradually.Wherein, embedded touch control panel is the contact panel function to be embedded in liquid crystal pixel and the panel that forms, and particularly, embedded touch control panel refers to the contact panel Function Integration Mechanism is embedded in the contact panel function in liquid crystal pixel realizing in color membrane substrates; On panel, contact panel is the contact panel function to be embedded between color membrane substrates and Polarizer and the panel that forms, particularly, on panel, contact panel refers to the touch-control sensing component layer is produced on a glass substrate, again this glass substrate and color membrane substrates are fitted and realized being embedded in touch controllable function in liquid crystal pixel, to form contact panel on panel.With contact panel on panel, compare, embedded touch control panel has panel slimming and light-weighted advantage, can reduce the thickness of manufacturing cost and panel, therefore becomes the developing direction of following contact panel.
At present, in order to make capacitance type touch control screen there is thinner panel, condenser type embedded touch control screen within color membrane substrates has appearred the touch-control electrode fabrication, wherein, the touch-control electrode can comprise: touch-control sweep trace and touch induction lines, the course of work of condenser type embedded touch control screen is: when the touch-control sweep trace is loaded to touch scanning signals, detect the voltage signal that touch induction lines is closed out by the inductance capacitance lotus root, in this process, when human body contact touch screen is arranged, people's bulk electric field will act on inductance capacitance, the capacitance of inductance capacitance is changed, and then change the voltage signal that touch induction lines is coupled out, can determine the position of touch point according to the variation of voltage signal.
In prior art, can in the process of manufacturing color membrane substrates, form the touch-control electrode.The manufacture method of conventional color membrane substrates comprises: form black Matrix Pattern; Form the touch-control electrode on black Matrix Pattern; Form the colour matrix figure on black Matrix Pattern; Form flatness layer above the colour matrix figure, this flatness layer covers touch-control electrode and colour matrix figure; Form chock insulator matter on flatness layer.Wherein, form black Matrix Pattern, colour matrix figure and chock insulator matter by composition technique, composition technique can exert an influence to the touch-control electrode, for example: in the developing process in composition technique, inorganic base in developer solution can exert an influence to the touch-control electrode, the phenomenon that makes the touch-control electrode produce short circuit and open circuit.
Summary of the invention
The invention provides the manufacture method of a kind of color membrane substrates, display panel and color membrane substrates, for the phenomenon of avoiding the touch-control electrode to produce short circuit and open circuit.
For achieving the above object; the invention provides a kind of color membrane substrates; comprise: underlay substrate and be formed at black Matrix Pattern and the colour matrix figure on described underlay substrate; be formed with the touch-control electrode on described black Matrix Pattern; described touch-control electrode top is formed with the first protective seam, between described black Matrix Pattern and described touch-control electrode, is formed with the second protective seam.
Alternatively, the material of described the first protective seam comprises organic material or inorganic material.
Alternatively, when the material of described the first protective seam comprises organic material, the thickness of described the first protective seam is 1 μ m to 3 μ m; When the material of described the first protective seam comprises inorganic material, the thickness of described the first protective seam is
extremely
Alternatively, the material of described the second protective seam comprises inorganic material or organic material.
Alternatively, when the material of described the second protective seam comprises inorganic material, the thickness of described the second protective seam is
extremely
when the material of described the second protective seam comprises organic material, the thickness of described the second protective seam is 1 μ m to 3 μ m.
Alternatively, also comprise: flatness layer, described flatness layer is formed on described the first protective seam.
For achieving the above object, the invention provides a kind of display panel, comprising: the above-mentioned color membrane substrates and the array base palte that are oppositely arranged.
For achieving the above object, the invention provides a kind of manufacture method of color membrane substrates, comprising:
Form black Matrix Pattern on underlay substrate;
Form the second protective seam on described underlay substrate, described the second protective seam is positioned on described black Matrix Pattern;
Form the touch-control electrode on described underlay substrate, described touch-control electrode is positioned at the top of described black Matrix Pattern;
Form the first protective seam on described underlay substrate, described the first protective seam is positioned at the top of described touch-control electrode;
Form the colour matrix figure on described underlay substrate.
Alternatively, when the material of described the first protective seam comprises organic material, the thickness of described the first protective seam is 1 μ m to 3 μ m; When the material of described the first protective seam comprises inorganic material, the thickness of described the first protective seam is
extremely
Alternatively, when the material of described the second protective seam comprises inorganic material, the thickness of described the second protective seam is
extremely
when the material of described the second protective seam comprises organic material, the thickness of described the second protective seam is 1 μ m to 3 μ m.
The present invention has following beneficial effect:
In the technical scheme of the manufacture method of color membrane substrates provided by the invention, display panel and color membrane substrates; touch-control electrode top is formed with the first protective seam; be formed with the second protective seam between black Matrix Pattern and touch-control electrode; this first protective seam and the second protective seam are for the protection of the touch-control electrode; avoid the technological process of other graphic structure of touch-control electrode above and below to exert an influence to the touch-control electrode, thus the phenomenon of having avoided the touch-control electrode to produce short circuit and open circuit.
The accompanying drawing explanation
The floor map of a kind of color membrane substrates that Fig. 1 provides for the embodiment of the present invention one;
Fig. 2 be in Fig. 1 A-A to cut-open view;
The partial schematic diagram that Fig. 3 is test zone in embodiment mono-;
Fig. 4 be in Fig. 3 B-B to cut-open view;
The floor map of a kind of color membrane substrates that Fig. 5 provides for the embodiment of the present invention two;
Fig. 6 be in Fig. 5 C-C to cut-open view;
The partial schematic diagram that Fig. 7 is test zone in embodiment bis-;
Fig. 8 be in Fig. 7 D-D to cut-open view;
The process flow diagram of the manufacture method of a kind of color membrane substrates that Fig. 9 provides for the embodiment of the present invention three;
Figure 10 a forms the schematic diagram of black Matrix Pattern in embodiment tri-;
Figure 10 b forms the schematic diagram of the second protective seam in embodiment tri-;
Figure 10 c forms the schematic diagram of touch-control electrode in embodiment tri-;
Figure 10 d forms the schematic diagram of the first protective seam in embodiment tri-;
Figure 10 e forms the schematic diagram of colour matrix figure in embodiment tri-;
Figure 10 f forms the schematic diagram of flatness layer in embodiment tri-;
The process flow diagram of the manufacture method of a kind of color membrane substrates that Figure 11 provides for the embodiment of the present invention four;
Figure 12 a forms the schematic diagram of black Matrix Pattern in embodiment tetra-;
Figure 12 b forms the schematic diagram of the second protective seam in embodiment tetra-;
Figure 12 c forms the schematic diagram of touch-control electrode in embodiment tetra-;
Figure 12 d forms the schematic diagram of the first protective seam in embodiment tetra-;
Figure 12 e forms the schematic diagram of colour matrix figure in embodiment tetra-;
Figure 12 f forms the schematic diagram of flatness layer in embodiment tetra-.
Embodiment
For making those skilled in the art understand better technical scheme of the present invention, the manufacture method below in conjunction with accompanying drawing to color membrane substrates provided by the invention, display panel and color membrane substrates is described in detail.
The floor map of a kind of color membrane substrates that Fig. 1 provides for the embodiment of the present invention one; Fig. 2 be in Fig. 1 A-A to cut-open view; as depicted in figs. 1 and 2; this color membrane substrates comprises: underlay substrate 11 and be formed at black Matrix Pattern 12 and the colour matrix figure 13 on underlay substrate 11; be formed with touch-control electrode 14 on black Matrix Pattern 11; touch-control electrode 14 tops are formed with the first protective seam 15, between black Matrix Pattern 12 and touch-control electrode 14, are formed with the second protective seam 17.
The first protective seam 15 covers touch-control electrode 14, and this first protective seam 15 is for the protection of touch-control electrode 14, and this first protective seam covers whole underlay substrate 11.In the present embodiment, preferably, the material of the first protective seam 15 comprises organic material, because the bendable folding endurance of organic material is better, therefore makes and adopts the first protective seam 15 of organic material also to possess bendable folding endurance preferably.When the color membrane substrates of the present embodiment is applied to flexible display panels, adopt the first protective seam 15 to improve the bendable folding endurance of color membrane substrates.This organic material can comprise the solid type organic material of light or heat curing-type organic material, for example: the solid type organic material of light can be the solid type photoresist of light, the heat curing-type organic material can be the heat curing-type photoresist, and above-mentioned photoresist can be positive photoresist or negative photoresist, and the present embodiment preferably adopts positive photoresist.Preferably, the thickness of the first protective seam 15 can be 1 μ m to 3 μ m, and the thickness of above-mentioned the first protective seam 15 is realizing touch-control electrode 14 being carried out to, on the basis of effectively protection, possessed bendable folding endurance preferably; And the technological ability of this thickness and existing manufacturing equipment is complementary, thereby make manufacture process more simple and be easy to realize.And preferably, the first protective seam 15 is the planarization graphic structure, can play the effect of flatness layer, thereby the section effectively reduced between black matrix and colour matrix figure is poor.
In the present embodiment, can be using the first protective seam 15 as flatness layer, can be without flatness layer is set again in color membrane substrates.But in order further to improve the planarization effect, also more effectively the section of reducing is poor, and further, this color membrane substrates can also comprise: flatness layer 16, and flatness layer 16 is formed on the first protective seam 15, and this flatness layer 16 covers whole underlay substrate 11.The material of this flatness layer 16 can comprise positive photoresist or negative photoresist, the present embodiment, the material of this flatness layer 16 preferably adopts negative photoresist, and the price of negative photoresist is lower, so the material of flatness layer 16 adopts negative photoresist can effectively reduce the manufacturing cost of color membrane substrates.
Further, this color membrane substrates also comprises: chock insulator matter 18, this chock insulator matter 18 can be arranged on flatness layer 16.In the present embodiment, if flatness layer 16 is not set in color membrane substrates, this chock insulator matter 18 can be arranged on the first protective seam 15.It should be noted that: chock insulator matter 18 is not shown in Fig. 1.
In the present embodiment, the second protective seam 17 is positioned on black Matrix Pattern 12 and is positioned under touch-control electrode 14, and this second protective seam 17 covers whole underlay substrate 11.In the present embodiment, preferably, the material of the second protective seam 17 comprises inorganic material, because the water preventing ability of inorganic material is stronger, thereby make, adopts the second protective seam 17 of inorganic material also to possess good water preventing ability, can effectively intercept water oxygen.For example: this inorganic material can comprise SiNx, SiOx or SiNO.Preferably, the thickness of the second protective seam 17 can be
extremely
the thickness of above-mentioned the second protective seam 17 is realizing touch-control electrode 14 being carried out to, on the basis of effectively protection, possessed good water preventing ability; And the technological ability of this thickness and existing manufacturing equipment is complementary, thereby make manufacture process more simple and be easy to realize.This second protective seam 17 has effectively intercepted the contact between black Matrix Pattern 12 and touch-control electrode 14; while preventing from forming black matrix by composition technique in the developing process of composition technique the inorganic base in developer solution the touch-control electrode is exerted an influence, thereby prevent the phenomenon that black Matrix Pattern 12 causes touch-control electrode 14 to produce short circuits and open circuit.
In the present embodiment, colour matrix figure 13 can be arranged on the first protective seam 15, and these colour matrix figure 13 parts are positioned on black Matrix Pattern 12.In actual applications; can need to change the position of colour matrix figure 13 according to technique; for example: colour matrix figure 13 can be arranged between underlay substrate 11 and black Matrix Pattern 12; perhaps colour matrix figure 13 can be arranged between black matrix 12 and the second protective seam 17, or colour matrix figure 13 can be arranged between the first protective seam 15 and the second protective seam 17.Preferably, this colour matrix figure 13 can comprise: red Matrix Pattern, green Matrix Pattern or blue Matrix Pattern.
Be formed with viewing area and the test zone that is positioned at the viewing area periphery on color membrane substrates.The partial schematic diagram that Fig. 3 is test zone in embodiment mono-; Fig. 4 be in Fig. 3 B-B to cut-open view; as shown in Figure 3 and Figure 4; test zone comprises: underlay substrate 11 and be formed at the resolution chart (Pad) 19 on underlay substrate 11; be formed with successively the second protective seam 17, the first protective seam 15 and flatness layer 16 on resolution chart 19; resolution chart 19 tops are formed with via hole 20, and this via hole 20 is arranged in the second protective seam 17, the first protective seam 15 and flatness layer 16.Resolution chart 19 is connected with the metallic test signal wire for via hole 20.
In the color membrane substrates that the present embodiment provides; touch-control electrode top is formed with the first protective seam; be formed with the second protective seam between black Matrix Pattern and touch-control electrode; this first protective seam and the second protective seam are for the protection of the touch-control electrode; avoid the technological process of other graphic structure of touch-control electrode above and below to exert an influence to the touch-control electrode, thus the phenomenon of having avoided the touch-control electrode to produce short circuit and open circuit.
The floor map of a kind of color membrane substrates that Fig. 5 provides for the embodiment of the present invention two; Fig. 6 be in Fig. 5 C-C to cut-open view; as shown in Figure 5 and Figure 6; this color membrane substrates comprises: underlay substrate 11 and be formed at black Matrix Pattern 12 and the colour matrix figure 13 on underlay substrate 11; be formed with touch-control electrode 14 on black Matrix Pattern 11; touch-control electrode 14 tops are formed with the first protective seam 15, between black Matrix Pattern 12 and touch-control electrode 14, are formed with the second protective seam 17.
The first protective seam 15 covers touch-control electrode 14, and this first protective seam 15 is for the protection of touch-control electrode 14, and this first protective seam covers whole underlay substrate 11.In the present embodiment, preferably, the material of the first protective seam 15 comprises inorganic material, because the water preventing ability of inorganic material is stronger, thereby make, adopts the first protective seam 15 of inorganic material also to possess good water preventing ability, can effectively intercept water oxygen.For example: this inorganic material can comprise SiNx, SiOx or SiNO.Preferably, the thickness of the first protective seam 15 is thought
extremely
the thickness of above-mentioned the first protective seam 15 is realizing touch-control electrode 14 being carried out to, on the basis of effectively protection, possessed good water preventing ability; And the technological ability of this thickness and existing manufacturing equipment is complementary, thereby make manufacture process more simple and be easy to realize.
Further, this color membrane substrates can also comprise: flatness layer 16, and flatness layer 16 is formed on the first protective seam 15, and this flatness layer 16 covers whole underlay substrate 11.The material of this flatness layer 16 can comprise positive photoresist or negative photoresist, in the present embodiment, the material of this flatness layer 16 preferably adopts negative photoresist, and the price of negative photoresist is lower, so the material of flatness layer 16 adopts negative photoresist can effectively reduce the manufacturing cost of color membrane substrates.
Further, this color membrane substrates also comprises: chock insulator matter 18, this chock insulator matter 18 can be arranged on flatness layer 16.It should be noted that: chock insulator matter 18 is not shown in Fig. 5.
In the present embodiment, the second protective seam 17 is positioned on black Matrix Pattern 12 and is positioned under touch-control electrode 14, and this second protective seam 17 covers whole underlay substrate 11.In the present embodiment, preferably, the material of the second protective seam 17 comprises organic material, because the bendable folding endurance of organic material is better, therefore makes and adopts the second protective seam 17 of organic material also to possess bendable folding endurance preferably.When the color membrane substrates of the present embodiment is applied to flexible display panels, adopt the second protective seam 17 to improve the bendable folding endurance of color membrane substrates.This organic material can comprise the solid type organic material of light or heat curing-type organic material, for example: the solid type organic material of light can be the solid type photoresist of light, the heat curing-type organic material can be the heat curing-type photoresist, the present embodiment preferably adopts the heat curing-type photoresist, and above-mentioned photoresist can be positive photoresist or negative photoresist.Preferably, the thickness of the second protective seam 17 can be 1 μ m to 3 μ m, and the thickness of above-mentioned the second protective seam 17 is realizing touch-control electrode 14 being carried out to, on the basis of effectively protection, possessed bendable folding endurance preferably; And the technological ability of this thickness and existing manufacturing equipment is complementary, thereby make manufacture process more simple and be easy to realize.And preferably, the second protective seam 17 is the planarization graphic structure, can play the effect of flatness layer, thereby it is poor to effectively reduce the section of deceiving Matrix Pattern 12.This second protective seam 17 has effectively intercepted the contact between black Matrix Pattern 12 and touch-control electrode 14; while preventing from forming black matrix by composition technique in the developing process of composition technique the inorganic base in developer solution the touch-control electrode is exerted an influence, thereby prevent the phenomenon that black Matrix Pattern 12 causes touch-control electrode 14 to produce short circuits and open circuit.
In the present embodiment, colour matrix figure 13 can be arranged on the first protective seam 15, and these colour matrix figure 13 parts are positioned on black Matrix Pattern 12.In actual applications; can need to change the position of colour matrix figure 13 according to technique; for example: colour matrix figure 13 can be arranged between underlay substrate 11 and black Matrix Pattern 12; perhaps colour matrix figure 13 can be arranged between black matrix 12 and the second protective seam 17, or colour matrix figure 13 can be arranged between the first protective seam 15 and the second protective seam 17.Preferably, this colour matrix figure 13 can comprise: red Matrix Pattern, green Matrix Pattern or blue Matrix Pattern.
Be formed with viewing area and the test zone that is positioned at the viewing area periphery on color membrane substrates.The partial schematic diagram that Fig. 7 is test zone in embodiment bis-; Fig. 8 be in Fig. 7 D-D to cut-open view; as shown in Figure 7 and Figure 8; test zone comprises: underlay substrate 11 and be formed at the resolution chart (Pad) 19 on underlay substrate 11; be formed with successively the second protective seam 17, the first protective seam 15 and flatness layer 16 on resolution chart 19; resolution chart 19 tops are formed with via hole 20, and this via hole 20 is arranged in the second protective seam 17, the first protective seam 15 and flatness layer 16.Resolution chart 19 is connected with the metallic test signal wire for via hole 20.
In the color membrane substrates that the present embodiment provides; touch-control electrode top is formed with the first protective seam; be formed with the second protective seam between black Matrix Pattern and touch-control electrode; this first protective seam and the second protective seam are for the protection of the touch-control electrode; avoid the technological process of other graphic structure of touch-control electrode above and below to exert an influence to the touch-control electrode, thus the phenomenon of having avoided the touch-control electrode to produce short circuit and open circuit.
The embodiment of the present invention three provides a kind of display panel, this display panel can comprise: the color membrane substrates be oppositely arranged and array base palte, wherein, the color membrane substrates that color membrane substrates can adopt above-described embodiment one or embodiment bis-to provide, specific descriptions can, referring to above-described embodiment one or embodiment bis-, repeat no more herein.
The process flow diagram of the manufacture method of a kind of color membrane substrates that Fig. 9 provides for the embodiment of the present invention three, as shown in Figure 9, the method comprises:
Figure 10 a forms the schematic diagram of black Matrix Pattern in embodiment tri-, as shown in Figure 10 a, particularly, the black matrix material layer of deposition on underlay substrate 11, carry out composition technique to form black Matrix Pattern 12 to black matrix material layer.
Figure 10 b forms the schematic diagram of the second protective seam in embodiment tri-; as shown in Figure 10 b; particularly; deposition the second protective seam 17 on underlay substrate 11; preferably; depositing temperature is 150 ℃, adopts above-mentioned depositing temperature can effectively avoid manufacturing the problem that causes other structure volatilization in the process of the second protective seam 17 due to excess Temperature, thereby has guaranteed the quality of product.This second protective seam 17 is positioned on black Matrix Pattern 12, and preferably, the second protective seam 17 covers whole underlay substrate 11.In the present embodiment, preferably, the material of the second protective seam 17 comprises inorganic material, and for example: this inorganic material can comprise SiNx, SiOx or SiNO.Preferably, the thickness of the second protective seam 17 can be
extremely
Figure 10 c forms the schematic diagram of touch-control electrode in embodiment tri-, as shown in Figure 10 c, deposition touch-control electrode material layer on underlay substrate 11, carry out composition technique to form touch-control electrode 14 to the touch-control electrode material layer, and this touch-control electrode 14 is positioned at the top of black Matrix Pattern 12.In the present embodiment, preferably, touch-control electrode 14 is positioned on the second protective seam 17 of black Matrix Pattern 12 tops.
Figure 10 d forms the schematic diagram of the first protective seam in embodiment tri-, as shown in Figure 10 d, particularly, on underlay substrate 11, deposition the first protective material layer, be cured processing to the first protective material layer, forms the first protective seam 15.Alternatively, if the first protective seam 15 is the planarization graphic structure, also need the first protective seam 15 is carried out to planarization.Preferably, the thickness of the first protective seam 15 can be 1 μ m to 3 μ m.
In the present embodiment; preferably; the material of the first protective seam 15 comprises organic material; this organic material can comprise the solid type organic material of light or heat curing-type organic material; for example: the solid type organic material of light can be the solid type photoresist of light; the heat curing-type organic material can be the heat curing-type photoresist, and above-mentioned photoresist can be positive photoresist or negative photoresist, and the present embodiment preferably adopts positive photoresist.
In the present embodiment, if, when the material of the first protective seam 15 is the solid type organic material of light, the first protective material layer is carried out to the photocuring processing, form the first protective seam 15; When if the material of the first protective seam 15 is the heat curing-type organic material, the first protective material layer is carried out to the heat curing processing, form the first protective seam 15.
Figure 10 e forms the schematic diagram of colour matrix figure in embodiment tri-, as shown in Figure 10 e, particularly, deposition colour matrix material layer on the first protective seam 15, carry out composition technique to form colour matrix figure 13 to the colour matrix material layer.Preferably; this colour matrix figure 13 can comprise: red Matrix Pattern, green Matrix Pattern or blue Matrix Pattern; therefore can repeat above-mentioned steps, form successively red Matrix Pattern, green Matrix Pattern and blue Matrix Pattern on the first protective seam 15.
Figure 10 f forms the schematic diagram of flatness layer in embodiment tri-, as shown in Figure 10 f, particularly, form flatness layer 16 on underlay substrate 11, and this flatness layer 16 covers whole underlay substrate 11, and preferably, this flatness layer 16 is positioned on colour matrix figure 13.
As shown in Figure 2, particularly, deposition chock insulator matter material layer on underlay substrate 11, carry out composition technique to form chock insulator matter 18 to the chock insulator matter material layer.
As shown in Figure 4, etch away the second protective seam 17, the first protective seam 15 and the flatness layer 16 of resolution chart 19 tops by dry etch process, form via hole 20.
In the present embodiment, alternatively, if the material of the first protective seam adopts the solid type photoresist of light, step 104 specifically can comprise: deposition the first protective material layer on underlay substrate; The first protective material layer is carried out to mask plate mask, exposure and developing process, thereby removal is positioned at the first protective material layer of resolution chart top to form via hole above resolution chart; The first protective material layer after developing is carried out to the photocuring processing, form the first protective seam.In step 105, the colour matrix material layer of deposition can be filled in the via hole of formation, can be by the colour matrix material layer of filling in composition technique removal via hole in by composition technique, forming colour matrix figure process.If the material of flatness layer comprises positive photoresist or negative photoresist, step 106 specifically can comprise: form flatness layer on underlay substrate, to flatness layer line mask plate mask, exposure and developing process, thereby remove the flatness layer that is arranged in via hole.In step 107, the chock insulator matter material layer of deposition can be filled in the via hole of formation, can be by the chock insulator matter material layer of filling in composition technique removal via hole in the process that forms chock insulator matter by composition technique.Alternatively, when the present embodiment is carried out above steps, can be without performing step again 108.
The manufacture method of the color membrane substrates that the present embodiment provides can be used for manufacturing the color membrane substrates that above-described embodiment one provides, and the specific descriptions of color membrane substrates can, referring to above-described embodiment one, be repeated no more herein.
It should be noted that: the composition technique in the present embodiment generally includes: the techniques such as photoresist coating, mask plate mask, exposure, development, etching, photoresist lift off.
In the color membrane substrates that the manufacture method of the color membrane substrates that the present embodiment provides produces; touch-control electrode top is formed with the first protective seam; be formed with the second protective seam between black Matrix Pattern and touch-control electrode; this first protective seam and the second protective seam are for the protection of the touch-control electrode; avoid the technological process of other graphic structure of touch-control electrode above and below to exert an influence to the touch-control electrode, thus the phenomenon of having avoided the touch-control electrode to produce short circuit and open circuit.
The process flow diagram of the manufacture method of a kind of color membrane substrates that Figure 11 provides for the embodiment of the present invention four, as shown in figure 11, the method comprises:
Step 201, form black Matrix Pattern on underlay substrate.
Figure 12 a forms the schematic diagram of black Matrix Pattern in embodiment tetra-, as shown in Figure 12 a, particularly, the black matrix material layer of deposition on underlay substrate 11, carry out composition technique to form black Matrix Pattern 12 to black matrix material layer.
Step 202, form the second protective seam on underlay substrate, this second protective seam is positioned on black Matrix Pattern.
Figure 12 b forms the schematic diagram of the second protective seam in embodiment tetra-, as shown in Figure 12 b, particularly, on underlay substrate 11, deposition the second protective material layer, be cured processing to the second protective material layer, forms the second protective seam 17.Alternatively, if the second protective seam 17 is the planarization graphic structure, also need the second protective seam 17 is carried out to planarization.Preferably, the thickness of the second protective seam 17 can be 1 μ m to 3 μ m.
In the present embodiment; preferably; the material of the second protective seam 17 comprises organic material; this organic material can comprise the solid type organic material of light or heat curing-type organic material; for example: the solid type organic material of light can be the solid type photoresist of light; the heat curing-type organic material can be the heat curing-type photoresist, and above-mentioned photoresist can be positive photoresist or negative photoresist, and the present embodiment preferably adopts positive photoresist.
In the present embodiment, if, when the material of the second protective seam 17 is the solid type organic material of light, the second protective material layer is carried out to the photocuring processing, form the second protective seam 17; When if the material of the second protective seam 17 is the heat curing-type organic material, the second protective material layer is carried out to the heat curing processing, form the second protective seam 17.
Step 203, form the touch-control electrode on underlay substrate, this touch-control electrode is positioned at the top of black Matrix Pattern.
Figure 12 c forms the schematic diagram of touch-control electrode in embodiment tetra-, as shown in Figure 12 c, deposition touch-control electrode material layer on underlay substrate 11, carry out composition technique to form touch-control electrode 14 to the touch-control electrode material layer, and this touch-control electrode 14 is positioned at the top of black Matrix Pattern 12.In the present embodiment, preferably, touch-control electrode 14 is positioned on the second protective seam 17 of black Matrix Pattern 12 tops.
Step 204, form the first protective seam on underlay substrate, the first protective seam is positioned at the top of touch-control electrode.
Figure 12 d forms the schematic diagram of the first protective seam in embodiment tetra-; as shown in Figure 12 d; particularly; deposition the first protective seam 15 on underlay substrate 11; preferably; depositing temperature is 150 ℃, adopts above-mentioned depositing temperature can effectively avoid manufacturing the problem that causes other structure volatilization in the process of the first protective seam 15 due to excess Temperature, thereby has guaranteed the quality of product.This first protective seam 15 is positioned on black Matrix Pattern 12, and preferably, the first protective seam 15 covers whole underlay substrate 11.In the present embodiment, preferably, the material of the first protective seam 15 comprises inorganic material, and for example: this inorganic material can comprise SiNx, SiOx or SiNO.Preferably, the thickness of the first protective seam 15 can be
extremely
Step 205, form the colour matrix figure on underlay substrate, the colour matrix figure is positioned on the first protective seam.
Figure 12 e forms the schematic diagram of colour matrix figure in embodiment tetra-, as shown in Figure 12 e, particularly, deposition colour matrix material layer on the first protective seam 15, carry out composition technique to form colour matrix figure 13 to the colour matrix material layer.Preferably; this colour matrix figure 13 can comprise: red Matrix Pattern, green Matrix Pattern or blue Matrix Pattern; therefore can repeat above-mentioned steps, form successively red Matrix Pattern, green Matrix Pattern and blue Matrix Pattern on the first protective seam 15.
Step 206, form flatness layer on underlay substrate.
Figure 12 f forms the schematic diagram of flatness layer in embodiment tetra-, as shown in Figure 12 f, particularly, form flatness layer 16 on underlay substrate 11, and this flatness layer 16 covers whole underlay substrate 11, and preferably, this flatness layer 16 is positioned on colour matrix figure 13.
Step 207, form chock insulator matter on flatness layer.
As shown in Figure 6, particularly, deposition chock insulator matter material layer on underlay substrate 11, carry out composition technique to form chock insulator matter 18 to the chock insulator matter material layer.
Step 208, form via hole by dry etch process above resolution chart.
As shown in Figure 8, etch away the second protective seam 17, the first protective seam 15 and the flatness layer 16 of resolution chart 19 tops by dry etch process, form via hole 20.
The manufacture method of the color membrane substrates that the present embodiment provides can be used for manufacturing the color membrane substrates that above-described embodiment two provides, and the specific descriptions of color membrane substrates can, referring to above-described embodiment two, be repeated no more herein.
It should be noted that: the composition technique in the present embodiment generally includes: the techniques such as photoresist coating, mask plate mask, exposure, development, etching, photoresist lift off.
In the color membrane substrates that the manufacture method of the color membrane substrates that the present embodiment provides produces; touch-control electrode top is formed with the first protective seam; be formed with the second protective seam between black Matrix Pattern and touch-control electrode; this first protective seam and the second protective seam are for the protection of the touch-control electrode; avoid the technological process of other graphic structure of touch-control electrode above and below to exert an influence to the touch-control electrode, thus the phenomenon of having avoided the touch-control electrode to produce short circuit and open circuit.
Be understandable that, above embodiment is only the illustrative embodiments adopted for principle of the present invention is described, yet the present invention is not limited thereto.For those skilled in the art, without departing from the spirit and substance in the present invention, can make various modification and improvement, these modification and improvement also are considered as protection scope of the present invention.
Claims (10)
1. a color membrane substrates; comprise: underlay substrate and be formed at black Matrix Pattern and the colour matrix figure on described underlay substrate; it is characterized in that; be formed with the touch-control electrode on described black Matrix Pattern; described touch-control electrode top is formed with the first protective seam, between described black Matrix Pattern and described touch-control electrode, is formed with the second protective seam.
2. color membrane substrates according to claim 1, is characterized in that, the material of described the first protective seam comprises organic material or inorganic material.
3. color membrane substrates according to claim 2, is characterized in that, when the material of described the first protective seam comprises organic material, the thickness of described the first protective seam is 1 μ m to 3 μ m; When the material of described the first protective seam comprises inorganic material, the thickness of described the first protective seam is
extremely
4. color membrane substrates according to claim 1, is characterized in that, the material of described the second protective seam comprises inorganic material or organic material.
5. color membrane substrates according to claim 4, is characterized in that, when the material of described the second protective seam comprises inorganic material, the thickness of described the second protective seam is
extremely
when the material of described the second protective seam comprises organic material, the thickness of described the second protective seam is 1 μ m to 3 μ m.
6. color membrane substrates according to claim 1, is characterized in that, also comprises: flatness layer, described flatness layer is formed on described the first protective seam.
7. a display panel comprises: the color membrane substrates be oppositely arranged and array base palte, it is characterized in that, and described color membrane substrates adopts the arbitrary described color membrane substrates of the claims 1 to 6.
8. the manufacture method of a color membrane substrates, is characterized in that, comprising:
Form black Matrix Pattern on underlay substrate;
Form the second protective seam on described underlay substrate, described the second protective seam is positioned on described black Matrix Pattern;
Form the touch-control electrode on described underlay substrate, described touch-control electrode is positioned at the top of described black Matrix Pattern;
Form the first protective seam on described underlay substrate, described the first protective seam is positioned at the top of described touch-control electrode;
Form the colour matrix figure on described underlay substrate.
9. the manufacture method of color membrane substrates according to claim 8, is characterized in that, when the material of described the first protective seam comprises organic material, the thickness of described the first protective seam is 1 μ m to 3 μ m; When the material of described the first protective seam comprises inorganic material, the thickness of described the first protective seam is
extremely
10. the manufacture method of color membrane substrates according to claim 8, is characterized in that, when the material of described the second protective seam comprises inorganic material, the thickness of described the second protective seam is
extremely
when the material of described the second protective seam comprises organic material, the thickness of described the second protective seam is 1 μ m to 3 μ m.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310452186.XA CN103487984A (en) | 2013-09-27 | 2013-09-27 | Color film substrate, display panel and manufacturing method of color film substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310452186.XA CN103487984A (en) | 2013-09-27 | 2013-09-27 | Color film substrate, display panel and manufacturing method of color film substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN103487984A true CN103487984A (en) | 2014-01-01 |
Family
ID=49828325
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310452186.XA Pending CN103487984A (en) | 2013-09-27 | 2013-09-27 | Color film substrate, display panel and manufacturing method of color film substrate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103487984A (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103558942A (en) * | 2013-11-08 | 2014-02-05 | 京东方科技集团股份有限公司 | Touch screen and manufacturing method thereof |
| WO2015074319A1 (en) * | 2013-11-21 | 2015-05-28 | 京东方科技集团股份有限公司 | Color film substrate, manufacturing method therefor, in-cell touch panel, and display apparatus |
| CN108345400A (en) * | 2017-01-22 | 2018-07-31 | 京东方科技集团股份有限公司 | Display base plate and display device |
| WO2019140916A1 (en) * | 2018-01-19 | 2019-07-25 | 京东方科技集团股份有限公司 | Touch substrate and manufacturing method thereof, and touch display device |
| CN110660838A (en) * | 2019-10-31 | 2020-01-07 | 厦门天马微电子有限公司 | OLED display panel and display device |
| CN111413819A (en) * | 2020-04-17 | 2020-07-14 | Tcl华星光电技术有限公司 | Display panel and display device |
| CN111562856A (en) * | 2020-04-17 | 2020-08-21 | Tcl华星光电技术有限公司 | Display panel and display device |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1333884A (en) * | 1998-11-30 | 2002-01-30 | 国际商业机器公司 | Color filters for flat panel display |
| CN101377582A (en) * | 2008-09-28 | 2009-03-04 | 友达光电股份有限公司 | Flexible liquid crystal display panel and manufacturing method thereof |
| CN101414067A (en) * | 2007-10-19 | 2009-04-22 | 统宝光电股份有限公司 | Image displaying system and related touch control sensing circuit |
| CN101752424A (en) * | 2008-12-17 | 2010-06-23 | 财团法人工业技术研究院 | Thin film transistor |
| CN102522421A (en) * | 2011-11-17 | 2012-06-27 | 友达光电股份有限公司 | Flexible active element array substrate and organic electroluminescent element |
| JP2012181392A (en) * | 2011-03-02 | 2012-09-20 | Toppan Printing Co Ltd | Color filter substrate and display device having the same |
| CN102749766A (en) * | 2012-06-18 | 2012-10-24 | 北京京东方光电科技有限公司 | Touch display panel and displayer |
| CN103163677A (en) * | 2011-12-15 | 2013-06-19 | 乐金显示有限公司 | Liquid crystal display device having touch and three-dimensional display functions and method for manufacturing the same |
| CN203133789U (en) * | 2013-02-26 | 2013-08-14 | 北京京东方光电科技有限公司 | Single-layer touch screen and touch screen displayer |
-
2013
- 2013-09-27 CN CN201310452186.XA patent/CN103487984A/en active Pending
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1333884A (en) * | 1998-11-30 | 2002-01-30 | 国际商业机器公司 | Color filters for flat panel display |
| CN101414067A (en) * | 2007-10-19 | 2009-04-22 | 统宝光电股份有限公司 | Image displaying system and related touch control sensing circuit |
| CN101377582A (en) * | 2008-09-28 | 2009-03-04 | 友达光电股份有限公司 | Flexible liquid crystal display panel and manufacturing method thereof |
| CN101752424A (en) * | 2008-12-17 | 2010-06-23 | 财团法人工业技术研究院 | Thin film transistor |
| JP2012181392A (en) * | 2011-03-02 | 2012-09-20 | Toppan Printing Co Ltd | Color filter substrate and display device having the same |
| CN102522421A (en) * | 2011-11-17 | 2012-06-27 | 友达光电股份有限公司 | Flexible active element array substrate and organic electroluminescent element |
| CN103163677A (en) * | 2011-12-15 | 2013-06-19 | 乐金显示有限公司 | Liquid crystal display device having touch and three-dimensional display functions and method for manufacturing the same |
| CN102749766A (en) * | 2012-06-18 | 2012-10-24 | 北京京东方光电科技有限公司 | Touch display panel and displayer |
| CN203133789U (en) * | 2013-02-26 | 2013-08-14 | 北京京东方光电科技有限公司 | Single-layer touch screen and touch screen displayer |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103558942A (en) * | 2013-11-08 | 2014-02-05 | 京东方科技集团股份有限公司 | Touch screen and manufacturing method thereof |
| WO2015074319A1 (en) * | 2013-11-21 | 2015-05-28 | 京东方科技集团股份有限公司 | Color film substrate, manufacturing method therefor, in-cell touch panel, and display apparatus |
| CN108345400A (en) * | 2017-01-22 | 2018-07-31 | 京东方科技集团股份有限公司 | Display base plate and display device |
| WO2019140916A1 (en) * | 2018-01-19 | 2019-07-25 | 京东方科技集团股份有限公司 | Touch substrate and manufacturing method thereof, and touch display device |
| US11537255B2 (en) | 2018-01-19 | 2022-12-27 | Hefei Xinsheng Optoelectronics Technology Co., Ltd. | Touch substrate, method for manufacturing the same, and touch display device |
| CN110660838A (en) * | 2019-10-31 | 2020-01-07 | 厦门天马微电子有限公司 | OLED display panel and display device |
| CN110660838B (en) * | 2019-10-31 | 2021-12-21 | 厦门天马微电子有限公司 | OLED display panel and display device |
| CN111413819A (en) * | 2020-04-17 | 2020-07-14 | Tcl华星光电技术有限公司 | Display panel and display device |
| CN111562856A (en) * | 2020-04-17 | 2020-08-21 | Tcl华星光电技术有限公司 | Display panel and display device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103487984A (en) | Color film substrate, display panel and manufacturing method of color film substrate | |
| CN104965333B (en) | COA type liquid crystal display panels and preparation method thereof | |
| CN107039352B (en) | The production method and TFT substrate of TFT substrate | |
| US9405143B2 (en) | Liquid crystal panel, liquid crystal display and method for manufacturing the same | |
| CN104123054B (en) | Touch control display apparatus | |
| CN104238823B (en) | A kind of touch-control display panel and preparation method thereof, touch control display apparatus | |
| CN104035231B (en) | Liquid crystal display panel and liquid crystal display device comprising same | |
| CN104731437B (en) | Touch-control display panel and preparation method thereof, display device | |
| CN105607321B (en) | Touch display device and manufacturing method thereof | |
| CN105068373A (en) | Manufacturing method of TFT (Thin Film Transistor) substrate structure | |
| CN102955288B (en) | A kind of color membrane substrates, method for making and lcd touch display device | |
| CN103646852B (en) | A kind of production method of substrate | |
| CN102955612B (en) | A kind of touch sensing, its preparation method and display device | |
| CN107025027A (en) | Touch base plate and preparation method thereof, display panel and display device | |
| WO2015117468A1 (en) | Touch screen, manufacturing method therefor, and touch display device | |
| CN104020902A (en) | Touch screen panel and display device | |
| CN105159489A (en) | Display apparatus, touch panel and manufacturing method thereof | |
| CN103558712A (en) | Color film substrate, manufacture method of color film substrate, embedded touch panel and display device | |
| CN104483776A (en) | Color film base plate as well as manufacturing method and display device thereof | |
| US9600105B2 (en) | Touch panel device and method for manufacturing the same | |
| CN104698675A (en) | Display panel and method for forming same | |
| CN106873238A (en) | A kind of opposite substrate, display panel, display device and preparation method | |
| CN106526937A (en) | TFT array substrate, liquid crystal display panel and display device | |
| CN104076551A (en) | Colored-film base plate and preparation method thereof, display panel and display device | |
| CN103728797A (en) | Display panel, production method thereof and display device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20140101 |
|
| RJ01 | Rejection of invention patent application after publication |