CN203133789U - Single-layer touch screen and touch screen displayer - Google Patents
Single-layer touch screen and touch screen displayer Download PDFInfo
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- CN203133789U CN203133789U CN 201320088131 CN201320088131U CN203133789U CN 203133789 U CN203133789 U CN 203133789U CN 201320088131 CN201320088131 CN 201320088131 CN 201320088131 U CN201320088131 U CN 201320088131U CN 203133789 U CN203133789 U CN 203133789U
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- tin oxide
- touch screen
- touch
- black matrix
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Abstract
The utility model discloses a single-layer touch screen. The single-layer touch screen comprises a substrate, a shielding indium tin oxide layer, a black matrix frame arranged on the substrate, metal wires arranged above the black matrix frame, a metal bridge formed in a touch sensing region, an insulating layer formed on the metal bridge, indium tin oxide electrode layers arranged on the metal wires, the metal bridge and the insulating layer, and passivation layers arranged on the indium tin oxide electrode layers. An insulating and protecting layer is at least arranged above the black matrix frame and under the metal wires. The utility model further discloses a touch screen displayer.
Description
Technical field
The utility model relates to the touch screen technology in the technical field of liquid crystal display, relates in particular to a kind of single-layer touch screen (One Glass Solution Touch Panel) and touch-screen display.
Background technology
At present, owing to developing rapidly of touch-screen display, it has developed into the main flow flat-panel monitor gradually.From appearance so far, touch-screen display is divided according to structure and mainly is divided into following three types: external hanging type touch-screen (Out Cell Touch Panel), externally embedded type touch-screen (On Cell Touch Panel) and embedded touch-screen (In Cell Touch Panel).Current main-stream touch-screen major part all adopts the external hanging type structural design.Along with the desired optical characteristics of touch-screen display and electrology characteristic improve constantly, and the consumer is to the continuous demand of thinning display, in limited space, and under the constant situation of display effect, design have high-performance, low cost, ultra-thin thin film transistor (TFT) become the main target of all big enterprises gradually.
Fig. 1 is the cross-sectional view of existing external hanging type single-layer touch screen, as shown in Figure 1, comprise: substrate 1, be arranged at BM (black matrix) frame 2 and ITO (indium tin oxide) bridge 5 on the substrate 1, be arranged at the insulation course 4 on the ITO bridge 5, be arranged at substrate 1, BM frame 2, ITO electrode layer 3 on ITO bridge 5 and the insulation course 4, be arranged at the metal line 6 on the ITO electrode layer 3, be arranged at ITO electrode layer 3, passivation layer (PVX) 7 on metal line 6 and the insulation course 4, and being arranged at flexible print circuit (FPC) 8 on the metal line 6, described shielding ITO layer 9 is arranged at the back side of substrate 1.
In the manufacturing process of above-mentioned existing single-layer touch screen, because 5 pairs of bit comparison difficulties of ITO bridge that transverse and longitudinal induction electrode intervening portion place adopts in the touch-screen.If change ITO bridge 5 into metal bridge, the contraposition ratio is easier to, if but on prior art, directly ITO bridge 5 is replaced to metal bridge, then in the preparation, there are the following problems in meeting: need to make earlier metal line 6, then other each layers and metal line 6 carry out the contraposition making, and this technology will cause metal bombardment BM frame 2, and then cause chamber contamination.
And, in the manufacturing process of existing single-layer touch screen, because shielding ITO layer 9 needs to make at the back side of substrate 1, need upset technology, realize complicated.
In addition; need five mask plates in the entire making process of existing described single-layer touch screen: the mask plate 4 that forms the mask plate 1 of described BM frame 2, the mask plate 2 that forms described ITO bridge 5, the mask plate 3 that forms described insulation course 4, the described ITO electrode layer 3 of formation; and the mask plate 5 that forms described protective seam 7, cost is higher.
The utility model content
In view of this, fundamental purpose of the present utility model is to provide a kind of single-layer touch screen and touch-screen display, can when each layer and metal line carry out the contraposition making at other, prevent the sputter of metal pair BM in the manufacturing process of touch-screen, guarantees the cleaning of chamber.
For achieving the above object, the technical solution of the utility model is achieved in that
The utility model provides a kind of single-layer touch screen, comprise: substrate, the shielding indium tin oxide layer, be arranged at the black matrix frame on the substrate, be arranged at the metal line of black matrix frame top, be formed at the metal bridge in the touch-sensitive area, be formed at the insulation course on the described metal bridge, be arranged at the indium-tin oxide electrode layer on described metal line, metal bridge and the insulation course and be arranged at passivation layer on the indium-tin oxide electrode layer; At least above described black matrix frame and below described metal line, be provided with insulating protective layer.
Preferably, described shielding indium tin oxide layer and black matrix frame are arranged on the same side of substrate.
Preferably, above black matrix frame, be provided with a kind of in described indium-tin oxide electrode layer and the described shielding indium tin oxide layer at least.
Preferably, described indium-tin oxide electrode layer and described metal line are arranged at described black matrix frame top across described insulating protective layer.
Preferably, described black matrix frame is identical with the pattern form of shielding indium tin oxide layer.
Preferably, the pattern form complementation of described passivation layer and black matrix frame, or described passivation layer and the pattern form complementation that shields indium tin oxide layer.
Preferably, be formed with the shielding indium tin oxide layer identical with this passivation layer pattern shape on the described passivation layer.
Preferably, described single-layer touch screen also comprises: be arranged at the flexible print circuit on the indium-tin oxide electrode layer.
The utility model also provides a kind of touch-screen display, and described touch-screen display comprises above-mentioned single-layer touch screen.
Single-layer touch screen and touch-screen display that the utility model provides, described single-layer touch screen above black matrix frame and below described metal line, is provided with insulating protective layer at least.Therefore, the utility model when each layer and metal line carry out the contraposition making at other, can prevent the sputter of the black matrix frame of metal pair in the manufacturing process of touch-screen, guarantee the cleaning of chamber.
In addition, the front (the same side) that the shielding ITO layer of described single-layer touch screen and other layer are arranged at substrate jointly, the technology of therefore need not overturning, technology is simple relatively.
In addition, only need four mask plates in the manufacturing process of touch-screen of the present utility model, five mask plates of the prior art relatively can be saved the cost of mask plate.
In addition, the shielding ITO layer that BM described in the utility model go up to arrange can prevent that LCD (LCD) from carrying out signal to touch-screen periphery metal routing and disturbing.
In addition, the shielding ITO layer that PVX described in the utility model go up to arrange, but the viewing area that can prevent the touch-screen of LCD is carried out signal and is disturbed.
Description of drawings
Fig. 1 is the cross-sectional view of existing external hanging type single-layer touch screen;
Fig. 2 is the cross-sectional view of the utility model first embodiment single-layer touch screen;
Fig. 3 is the method for making schematic flow sheet of the utility model first embodiment single-layer touch screen;
Fig. 4 is the cross-sectional view of the utility model second embodiment single-layer touch screen;
Fig. 5 is the method for making schematic flow sheet of the utility model second embodiment single-layer touch screen.
Description of reference numerals:
1, substrate; 2, BM frame; 3, ITO electrode layer; 4, insulation course; 5, ITO bridge; 6, metal line; 7, PVX (passivation layer); 8, FPC (flexible print circuit); 9, shielding ITO layer; 10, insulating protective layer; 11, metal bridge.
Embodiment
Basic thought of the present utility model is: in order to prevent the sputter of the black matrix frame of metal pair; guarantee the cleaning of chamber; in the manufacturing process of single-layer touch screen, above described black matrix frame and below described metal line, insulating protective layer is set at least.
Preferably, described shielding indium tin oxide layer and black matrix frame are arranged on the same side of substrate.
Preferably, above described black matrix frame, be provided with a kind of in described indium-tin oxide electrode layer and the described shielding indium tin oxide layer at least.
Further, described indium-tin oxide electrode layer and described metal line are arranged at described black matrix frame top across described insulating protective layer.
Below in conjunction with drawings and the specific embodiments the utility model is described in further detail.
Fig. 2 shields the structural representation of first embodiment for the utility model single-layer touch; as shown in Figure 2; comprise: be arranged at the BM frame 2 on the substrate 1; be arranged at the shielding ITO layer 9 on the BM frame 2; be arranged at the insulating protective layer 10 on shielding ITO layer 9 and the substrate 1; be arranged at the metal line 6 on the insulating protective layer 10; metal bridge 11; be arranged at the insulation course 4 on the metal bridge 11; be arranged at metal line 6; insulating protective layer 10; ITO electrode layer 3 on metal bridge 11 and the insulation course 4; be arranged at the FPC 8 on the ITO electrode layer 3, and be arranged at the PVX 7 on insulation course 4 and the ITO electrode layer 3.
Wherein, described BM frame 2 is identical with the pattern form of shielding ITO layer 9; Described PVX 7 and the pattern form complementation of BM frame 2 or the pattern form complementation of described PVX 7 and shielding ITO layer 9.
Preferably, also be formed with the shielding ITO layer (not shown) identical with PVX 7 shapes on the PVX 7.
Manufacturing process to the described single-layer touch screen of Fig. 2 is described in detail below, as shown in Figure 3, comprises following flow process:
Step 301: form BM at substrate;
Be specially: can adopt prior art deposition one deck BM material at substrate 1, and form BM frame 2 by masking process, as shown in Figure 2; Described BM frame 2 is mainly used in blocking the light of screen periphery and arranging of metal wire.
Here, first mask plate is adopted in the formation of described BM frame 2, and described first mask plate can adopt existing mask plate; Selected photoresist is positive glue (positive photoresist).
Step 302: form shielding ITO layer at the substrate that is formed with BM;
Be specially: the substrate 1 deposition one deck ITO being formed with BM frame 2 alternatively, forms shielding ITO layer 9 by masking process, as shown in Figure 2.
Here, same first mask plate that adopts of the formation of described shielding ITO layer 9 is identical with the mask plate that forms BM frame 2; Selected photoresist is similarly positive glue.
Usually, when LCD (LCD) display frame, need be from LCD periphery input signal (described signal is bigger than the signal the viewing area usually), this signal can produce stray capacitance to the touch-control device that the LCD upper strata arranges, and may cause false touch control or other interference.Therefore, the described shielding ITO layer 9 that arranges in the utility model can be used for preventing that the touch-screen periphery of LCD metal routing from carrying out signal and disturbing.
Here, preferably, described shielding ITO layer 9 is arranged at the front of substrate 1, is positioned at the homonymy of substrate 1 with other layer, so the technology of need not overturning, and technology is simple relatively; And alternatively, 9 on described shielding ITO layer keeps peripheral pattern form (identical with BM frame 2 pattern forms), can effectively play touch-screen periphery signal, as: the shielding action of AC signal.
Step 303: form insulating protective layer at the substrate that is formed with shielding ITO layer;
Be specially: at substrate 1 and shielding ITO layer 9 deposition one deck insulating material, as: SiN
xPerhaps SiO
2, form insulating protective layer 10, as shown in Figure 2; Described insulating protective layer 10 is mainly used in preventing that peripheral BM frame 2 from by metal sputtering, adopting whole depositional mode, need not adopt mask plate.
Generally, the temperature that BM frame 2 can bear is lower, and shielding ITO layer 9 described in the utility model can effectively be protected BM frame 2, behind whole the making insulating protective layer 10, carries out the making of follow-up metal line 6 again, can avoid the risk of metal etch BM frame 2.
In addition, if shielding ITO layer 9, insulating protective layer 10 (SiN are not set
xDeng) need under cryogenic conditions, to make, otherwise it is smooth air spots to occur, phenomenons such as bubble.Therefore, the utility model shields the same manufacture difficulty that reduces insulating protective layer 10 that arranges of ITO layer 9, that is, can carry out under hot conditions, and then reduce technology difficulty of the present utility model on the whole.
Step 304: form metal line and metal bridge at the substrate that is formed with insulating protective layer;
Be specially: the substrate 1 deposition layer of metal material being formed with insulating protective layer 10, can adopt the existing used material of metal line, for example: metal molybdenum (Mo) etc., and by masking process formation metal line 6 and metal bridge 11, as shown in Figure 2.
Here, second mask plate is adopted in the formation of described metal line 6 and metal bridge 11.
Step 305: form insulation course at the substrate that is formed with metal bridge;
Be specially: the substrate 1 deposition one deck insulating material being formed with metal bridge 11, can adopt SiN
xPerhaps SiO
2Deng, and by masking process formation insulation course 4, as shown in Figure 2.
Here, the 3rd mask plate is adopted in the formation of described insulation course 4.
Step 306: form the ITO layer at the substrate that is formed with on metal line, insulating protective layer, metal bridge and the insulation course;
Be specially: at the substrate 1 deposition one deck ITO that is formed with the ITO layer on metal line 6, insulating protective layer 10, metal bridge 11 and the insulation course 4, and by masking process formation ITO electrode layer 3, as shown in Figure 2.
Here, the 4th mask plate is adopted in the formation of described ITO electrode layer 3.
Step 307: form PVX at the substrate that is formed with on insulation course and the ITO layer;
Be specially: at the substrate 1 deposition one deck PVX film that is formed with on insulation course 4 and the ITO electrode layer 3, and by masking process formation PVX 7, as shown in Figure 2.
Preferably, first mask plate is selected in the formation of described PVX 7 for use, and selected photoresist then is negative glue (negative photoresist), expense that therefore can corresponding minimizing mask plate.
Preferably, also comprise the steps: on PVX 7, further to form the shielding ITO layer (not shown) identical with PVX 7 shapes by using first mask plate and negative photoresist.Help further to shield display like this to the signal interference of the touch electrode of viewing area.
Further, the utility model method also comprises: at described ITO electrode layer 3 FPC 8 is set.
In the such scheme, the utility model only need adopt four mask plates to get final product, and prior art adopts five mask plates, and obviously, the utility model can be saved the cost of mask plate.
The utility model also provides a kind of touch-screen display, and described touch-screen display comprises single-layer touch screen mentioned above.
Fig. 4 shields the structural representation of second embodiment for the utility model single-layer touch; as shown in Figure 4; comprise: be arranged at BM frame 2 and metal bridge 11 on the substrate 1; be arranged at the insulating protective layer 10 on the BM frame 2; be arranged at the metal line 6 on the insulating protective layer 10; be arranged at the insulation course 4 on the metal bridge 11; be arranged at substrate 1; metal bridge 11; insulation course 4; ITO electrode layer 3 on insulating protective layer 10 and the metal line 6; be arranged at ITO electrode layer 3; PVX 7 on insulation course 4 and the insulating protective layer 10; be arranged at the shielding ITO layer 9 of PVX 7, and be arranged at the FPC 8 on the ITO electrode layer 3.
Wherein, described BM frame 2 is identical with the pattern form of insulating protective layer 10; The pattern form complementation of described PVX 7 and BM frame 2 or insulating protective layer 10; The pattern form complementation of described shielding ITO layer 9 and BM frame 2 or insulating protective layer 10.
Manufacturing process to the described single-layer touch screen of Fig. 4 is described in detail below, as shown in Figure 5, comprises following flow process:
Step 501: form BM at substrate;
Be specially: on substrate 1, can adopt prior art deposition one deck BM material, and form BM frame 2 by masking process, as shown in Figure 4; Described BM frame 2 is mainly used in blocking the light of screen periphery and arranging of metal wire.
Here, first mask plate is adopted in the formation of described BM frame 2, can adopt existing mask plate; Selected photoresist is positive glue.
Step 502: form insulating protective layer at the substrate that is formed with BM;
Be specially: at the substrate 1 deposition one deck insulating material that is formed with BM frame 2, as: SiN
xPerhaps SiO
2, and by masking process formation insulating protective layer 10, as shown in Figure 4; Described insulating protective layer 10 is mainly used in preventing that peripheral BM frame 2 is by metal sputtering.
Here, same first mask plate that adopts of the formation of described insulating protective layer 10, selected photoresist is similarly positive glue.
Step 503: form metal line and metal bridge at the substrate that is formed with insulating protective layer;
Be specially: the substrate 1 deposition layer of metal material being formed with insulating protective layer 10, can adopt the existing used material of metal line, and form metal line 6 and metal bridge 11 by masking process, as shown in Figure 4.Here, second mask plate is adopted in the formation of described metal line 6 and metal bridge 11.
Step 504: form insulation course at the substrate that is formed with metal bridge;
Be specially: the substrate 1 deposition one deck insulating material being formed with metal bridge 11, can adopt SiN
xPerhaps SiO
2Deng, and by masking process formation insulation course 4, as shown in Figure 4.
Here, the 3rd mask plate is adopted in the formation of described insulation course 4.
Step 505: form the ITO layer at the substrate that is formed with metal bridge, insulation course, insulating protective layer and metal line;
Be specially: be formed with substrate deposition one deck ITO of metal bridge 11, insulation course 4, insulating protective layer 10 and metal line 6, and forming ITO electrode layer 3 by masking process, as shown in Figure 4.
Here, the 4th mask plate is adopted in the formation of described ITO electrode layer 3.
Step 506: form PVX at the substrate that is formed with on insulation course and the ITO layer;
Be specially: at the substrate 1 deposition one deck PVX film that is formed with on insulation course 4 and the ITO electrode layer 3, and by masking process formation PVX 7, as shown in Figure 4.
Preferably, first mask plate is still selected in the formation of described PVX 7 for use, but selected photoresist is negative glue, so, and expense that can corresponding minimizing mask plate.
Further, also comprise step 507: form shielding ITO layer at the substrate that is formed with PVX;
Be specially: be formed with substrate deposition one deck ITO of PVX 7, and forming shielding ITO layer 9 by masking process, as shown in Figure 4.
Here, the setting of described shielding ITO layer 9 is mainly used in preventing LCD (LCD) but signal is carried out in the viewing area of touch-screen disturb, former because: described shielding ITO layer can be isolated the LCD signal to the interference of touch-control device, namely shields the signal that ITO layer maskable LCD device produces.
Here, same first mask plate that adopts of the formation of described shielding ITO layer 9, selected photoresist is negative glue.
Further, the utility model method also comprises: at described ITO electrode layer 3 FPC 8 is set.
Same only need of such scheme adopts four mask plates to get final product, and prior art adopts five mask plates, and therefore, the utility model can be saved the cost of mask plate.
The utility model also provides a kind of touch-screen display, and described touch-screen display comprises single-layer touch screen mentioned above.
The above is preferred embodiment of the present utility model only, is not for limiting protection domain of the present utility model.
Claims (9)
1. a single-layer touch shields, comprise: substrate, the shielding indium tin oxide layer, be arranged at the black matrix frame on the substrate, be arranged at the metal line of black matrix frame top, be formed at the metal bridge in the touch-sensitive area, be formed at the insulation course on the described metal bridge, be arranged at the indium-tin oxide electrode layer on described metal line, metal bridge and the insulation course and be arranged at passivation layer on the indium-tin oxide electrode layer; It is characterized in that, above described black matrix frame and below described metal line, be provided with insulating protective layer at least.
2. single-layer touch screen according to claim 1 is characterized in that described shielding indium tin oxide layer and black matrix frame are arranged on the same side of substrate.
3. single-layer touch according to claim 2 screen is characterized in that, is provided with a kind of in described indium-tin oxide electrode layer and the described shielding indium tin oxide layer above black matrix frame at least.
4. single-layer touch screen according to claim 3 is characterized in that, described indium-tin oxide electrode layer and described metal line are arranged at described black matrix frame top across described insulating protective layer.
5. single-layer touch screen according to claim 3 is characterized in that, described black matrix frame is identical with the pattern form of shielding indium tin oxide layer.
6. single-layer touch screen according to claim 3 is characterized in that, the pattern form complementation of described passivation layer and black matrix frame, or described passivation layer and the pattern form complementation that shields indium tin oxide layer.
7. single-layer touch screen according to claim 6 is characterized in that, is formed with the shielding indium tin oxide layer identical with this passivation layer pattern shape on the described passivation layer.
8. single-layer touch screen according to claim 1 is characterized in that, described single-layer touch screen also comprises: be arranged at the flexible print circuit on the indium-tin oxide electrode layer.
9. a touch-screen display is characterized in that, described touch-screen display comprises each described single-layer touch screen in the claim 1 to 8.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320088131 CN203133789U (en) | 2013-02-26 | 2013-02-26 | Single-layer touch screen and touch screen displayer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320088131 CN203133789U (en) | 2013-02-26 | 2013-02-26 | Single-layer touch screen and touch screen displayer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203133789U true CN203133789U (en) | 2013-08-14 |
Family
ID=48941750
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201320088131 Expired - Lifetime CN203133789U (en) | 2013-02-26 | 2013-02-26 | Single-layer touch screen and touch screen displayer |
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| Country | Link |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103487984A (en) * | 2013-09-27 | 2014-01-01 | 京东方科技集团股份有限公司 | Color film substrate, display panel and manufacturing method of color film substrate |
| CN103558942A (en) * | 2013-11-08 | 2014-02-05 | 京东方科技集团股份有限公司 | Touch screen and manufacturing method thereof |
| CN104007863A (en) * | 2013-02-26 | 2014-08-27 | 北京京东方光电科技有限公司 | Single-layer touch screen and manufacturing method thereof and touch screen displayer |
| CN104750294A (en) * | 2013-12-31 | 2015-07-01 | 比亚迪股份有限公司 | Touch screen, manufacturing method of touch screen and touch device comprising touch screen |
-
2013
- 2013-02-26 CN CN 201320088131 patent/CN203133789U/en not_active Expired - Lifetime
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104007863A (en) * | 2013-02-26 | 2014-08-27 | 北京京东方光电科技有限公司 | Single-layer touch screen and manufacturing method thereof and touch screen displayer |
| CN103487984A (en) * | 2013-09-27 | 2014-01-01 | 京东方科技集团股份有限公司 | Color film substrate, display panel and manufacturing method of color film substrate |
| CN103558942A (en) * | 2013-11-08 | 2014-02-05 | 京东方科技集团股份有限公司 | Touch screen and manufacturing method thereof |
| CN104750294A (en) * | 2013-12-31 | 2015-07-01 | 比亚迪股份有限公司 | Touch screen, manufacturing method of touch screen and touch device comprising touch screen |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: BEIJING BOE PHOTOELECTRICITY SCIENCE + TECHNOLOGY Effective date: 20150630 Owner name: JINGDONGFANG SCIENCE AND TECHNOLOGY GROUP CO., LTD Free format text: FORMER OWNER: BEIJING BOE PHOTOELECTRICITY SCIENCE + TECHNOLOGY CO., LTD. Effective date: 20150630 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20150630 Address after: 100015 Jiuxianqiao Road, Beijing, No. 10, No. Patentee after: BOE TECHNOLOGY GROUP Co.,Ltd. Patentee after: BEIJING BOE OPTOELECTRONICS TECHNOLOGY Co.,Ltd. Address before: 100176 Beijing city in Western Daxing District economic and Technological Development Zone, Road No. 8 Patentee before: BEIJING BOE OPTOELECTRONICS TECHNOLOGY Co.,Ltd. |
|
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20130814 |