CN107390926B - Display substrate, preparation method thereof and display panel - Google Patents
Display substrate, preparation method thereof and display panel Download PDFInfo
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- CN107390926B CN107390926B CN201710587789.9A CN201710587789A CN107390926B CN 107390926 B CN107390926 B CN 107390926B CN 201710587789 A CN201710587789 A CN 201710587789A CN 107390926 B CN107390926 B CN 107390926B
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/0412—Digitisers structurally integrated in a display
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/0416—Control or interface arrangements specially adapted for digitisers
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
Abstract
The invention provides a display substrate, a preparation method thereof and a display panel, relates to the technical field of display, and can reduce the number of mask plates in the process of preparing the display substrate. The preparation method comprises the following steps: forming a plurality of first light-shielding strips and a plurality of second light-shielding strips crossed with the first light-shielding strips on a substrate to obtain a black matrix pattern; forming a plurality of first touch electrode strips on the substrate, wherein orthographic projections of the first touch electrode strips and the first shading strips on the substrate are overlapped; forming a first insulating layer covering the plurality of first touch electrode bars on the substrate base plate; forming a plurality of second touch electrode strips on the substrate, wherein orthographic projections of the second touch electrode strips and the second shading strips on the substrate are overlapped; forming a second insulating layer covering the plurality of second touch electrode bars on the substrate base plate; the plurality of first shading strips and the plurality of first touch electrode strips are obtained by exposure of a first mask plate; the plurality of second shading strips and the plurality of second touch electrode strips are obtained by exposure of a second mask plate.
Description
Technical Field
The invention relates to the technical field of display, in particular to a display substrate, a preparation method of the display substrate and a display panel.
Background
With the development of touch technology, touch display screens have been deeply inserted into the work and life of people, after apple companies propose and use in-cell touch technology, manufacturers of various brands use the in-cell touch technology, and the in-cell touch technology slowly enters into tpc (touch personal computer) products from Mobile phones for use, and even NB (Notebook computer for short) products are used in small batches. Therefore, it is a necessary trend to integrate the touch function into the display panel, and the integration is also an embodiment of the technical capability of the company product.
Currently, in-cell touch technology can use ITO (indium tin oxide) or Metal mesh as a touch electrode, and is manufactured on one side of the array substrate facing the color filter substrate, or one side of the color filter substrate facing the array substrate. When the touch electrode is manufactured on one side of the color film substrate facing the array substrate, for FHD (Full High Definition for short) or UHD (Ultra High Definition for short) products, because the distance between the sub-pixels is small, the orthographic projection of the touch electrode on the array substrate and the orthographic projection of the sub-pixels on the array substrate are partially overlapped, and moire fringes occur; in addition, when the touch electrode is made of metal, if the touch electrode is disposed on a side of the BM (black matrix) away from the array substrate, natural light is easily reflected by the touch electrode to the human eye. For a display device, visual problems arise, which undoubtedly directly affect the quality of the product.
Based on the above problems, in the prior art, the touch electrode is disposed on one side of the color film substrate, where the black matrix is close to the array substrate, and the orthographic projection of the black matrix on the array substrate covers the orthographic projection of the touch electrode on the array substrate, so as to avoid overlapping of the orthographic projection of the touch electrode on the array substrate and the orthographic projection of the sub-pixel on the array substrate, thereby avoiding moire fringes, and even if the touch electrode is made of metal, the touch electrode cannot reflect natural light due to shielding of the black matrix.
However, in the prior art, in the process of forming the black matrix, the touch electrode strips, and the insulating strips covering the touch electrode strips, five different mask plates are required, which is high in cost and not beneficial to improving the production efficiency of the production line, and because the number of the used mask plates is large, the exposure machine changes the number of the mask plates, so that the possibility that the exposure machine is polluted by the external environment in the process of changing the mask plates is increased, and the PM (predictive Maintenance, short for machine tuning) time of the exposure machine is increased.
Disclosure of Invention
The embodiment of the invention provides a display substrate, a preparation method thereof and a display panel, which can reduce the number of mask plates in the process of preparing the display substrate.
In order to achieve the above purpose, the embodiment of the invention adopts the following technical scheme:
in a first aspect, a method for manufacturing a display substrate is provided, including:
forming a plurality of first light-shielding strips and a plurality of second light-shielding strips crossed with the first light-shielding strips on a substrate to obtain a black matrix pattern; forming a plurality of first touch electrode strips on the substrate with the black matrix pattern, wherein the first touch electrode strips are overlapped with orthographic projections of the first shading strips on the substrate; forming a first insulating layer covering the plurality of first touch electrode strips on the substrate base plate on which the plurality of first touch electrode strips are formed; forming a plurality of second touch electrode strips on the substrate with the first insulating layer, wherein orthographic projections of the second touch electrode strips and the second light shielding strips on the substrate are overlapped; and forming a second insulating layer covering the plurality of second touch electrode strips on the substrate base plate on which the plurality of second touch electrode strips are formed.
The first light-shielding strips and the first touch electrode strips are obtained by exposing through a first mask plate; the plurality of second shading strips and the plurality of second touch electrode strips are obtained by exposure of a second mask plate.
Preferably, the forming of the plurality of first light-shielding bars and the plurality of second light-shielding bars crossing the first light-shielding bars on the base substrate to obtain the black matrix pattern includes: forming a black shading film and photoresist on the substrate, respectively exposing the photoresist by using the first mask plate and the second mask plate, and forming the black matrix pattern after developing, etching and stripping processes; or forming a black negative photoresist film on the substrate, respectively exposing the black negative photoresist film by using the first mask plate and the second mask plate, and developing to form the black matrix pattern.
Preferably, the forming a first insulating layer covering the plurality of first touch electrode stripes on the substrate on which the plurality of first touch electrode stripes are formed includes: the first insulating layer comprises a plurality of first insulating strips, and each first insulating strip covers one first touch electrode strip.
The forming, on the substrate on which the plurality of second touch electrode stripes are formed, a second insulating layer covering the plurality of second touch electrode stripes includes: the second insulating layer includes a plurality of second insulating strips, and each of the second insulating strips covers one of the second touch electrode strips.
In a second aspect, a method for manufacturing a display substrate is provided, including: forming a plurality of first light-shielding strips and a plurality of second light-shielding strips crossed with the first light-shielding strips on a substrate to obtain a black matrix pattern; forming a plurality of first touch electrode strips on the substrate with the black matrix pattern; forming a first insulating layer on the substrate base plate on which the plurality of first touch electrode bars are formed, wherein the first insulating layer comprises a plurality of first insulating bars, and the first insulating bars are overlapped with orthographic projections of the first light shielding bars on the substrate base plate; forming a plurality of second touch electrode strips on the substrate with the first insulating layer; and forming a second insulating layer on the substrate base plate on which the plurality of second touch electrode bars are formed, wherein the second insulating layer comprises a plurality of second insulating bars, and the orthographic projections of the second insulating bars and the second light shielding bars on the substrate base plate are overlapped.
The first light shading strips and the first insulating layer are obtained by adopting a first mask plate for exposure; the plurality of second shading strips and the second insulating layer are obtained by adopting a second mask plate for exposure; each first insulating strip covers one first touch electrode strip; each second insulating strip covers one second touch electrode strip.
Preferably, the forming of the plurality of first light-shielding stripes and the plurality of second light-shielding stripes intersecting the first light-shielding stripes on the base substrate to obtain the black matrix pattern includes: forming a black shading film and photoresist on the substrate, respectively exposing the photoresist by using the first mask plate and the second mask plate, and forming the black matrix pattern after developing, etching and stripping processes; or forming a black negative photoresist film on the substrate, respectively exposing the black negative photoresist film by using the first mask plate and the second mask plate, and developing to form the black matrix pattern.
In a third aspect, a display substrate is provided, which includes a substrate, a black matrix pattern sequentially disposed on the substrate, a plurality of first touch electrode strips, a first insulating layer covering the plurality of first touch electrode strips, a plurality of second touch electrode strips, and a second insulating layer covering the plurality of second touch electrode strips; the black matrix pattern comprises a plurality of first light-shielding strips and a plurality of second light-shielding strips which are arranged in a crossed mode.
The orthographic projections of the first touch electrode strips and the first shading strips on the substrate base plate are overlapped, and the orthographic projections of the second touch electrode strips and the second shading strips on the substrate base plate are overlapped.
Or, the first insulating layer includes a plurality of first insulating strips, the first insulating strips overlap with orthographic projections of the first light-shielding strips on the substrate, and each first insulating strip covers one first touch electrode strip; the second insulating layer comprises a plurality of second insulating strips, the second insulating strips are overlapped with orthographic projections of the second shading strips on the substrate, and each second insulating strip covers one second touch electrode strip.
Preferably, the material of the black matrix pattern is a black negative photoresist.
Preferably, the material of the plurality of first touch electrode bars and the plurality of second touch electrode bars includes a conductive metal.
Preferably, when the first touch electrode stripes overlap with orthographic projections of the first light-shielding stripes on the substrate base and the second touch electrode stripes overlap with orthographic projections of the second light-shielding stripes on the substrate base, the first insulating layer includes a plurality of first insulating stripes, and each first insulating stripe covers one first touch electrode stripe; the second insulating layer includes a plurality of second insulating strips, and each of the second insulating strips covers one of the second touch electrode strips.
In a fourth aspect, a display panel is provided, which includes the display substrate of the third aspect.
The first aspect, the third aspect, and the fourth aspect provide a display substrate, a method for manufacturing the same, and a display panel, in which a first mask plate is used to expose to obtain a first light-shielding bar, a second mask plate is used to expose to obtain a second light-shielding bar, and the first mask plate is still used to expose to form a first touch electrode bar and the second mask plate is still used to expose to form a second touch electrode bar when a first touch electrode bar is formed subsequently, so that orthographic projections of the first touch electrode bar and the first light-shielding bar on a substrate are overlapped, orthographic projections of the second touch electrode bar and the second light-shielding bar on the substrate are overlapped, and on the basis of avoiding moire and metal reflection problems, 3 different mask plates are required to be used for manufacturing the black matrix pattern, the first touch electrode bar, and the second touch electrode bar in the prior art, and this application only adopt 2 can, consequently, reduced and formed the quantity of the used mask slice of display substrates in-process can improve the utilization ratio of mask slice, has reduced the possibility that the exposure machine received external environmental pollution simultaneously to shorten the PM time, have the cost-effective, improve the production efficiency's of producing the line effect.
In the second, third and fourth aspects, the first mask plate is used for exposure to obtain the first light-shielding strips, the second mask plate is used for exposure to obtain the second light-shielding strips, the first mask plate is still used for exposure during the subsequent formation of the first insulating layer, and the second mask plate is still used for exposure during the subsequent formation of the second insulating layer, so that the orthographic projections of the first insulating strips and the first light-shielding strips on the substrate are overlapped, the orthographic projections of the second insulating strips and the second light-shielding strips on the substrate are overlapped, each first insulating strip covers one first touch electrode strip, each second insulating strip covers one second touch electrode strip, and the black matrix pattern, the second light-shielding strips and the third light-shielding strips are formed by using the same mask plate First touch-control electrode strip, second touch-control electrode strip need adopt 3 different mask slice, and this application only adopt 2 can, consequently, reduce and form the quantity of the used mask slice of display substrate in-process can improve the utilization ratio of mask slice, has reduced the possibility that the exposure machine received external environment pollution simultaneously to shorten the PM time, have the cost-effective, improve the production efficiency's of producing the line effect.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the drawings without creative efforts.
Fig. 1(a) is a first schematic top view of a display substrate according to an embodiment of the present invention;
fig. 1(b) is a schematic top view of a display substrate according to an embodiment of the invention;
fig. 2 is a first schematic flowchart of a method for manufacturing a display substrate according to an embodiment of the present invention;
fig. 3(a) is a first schematic diagram illustrating a process of preparing a black matrix pattern according to an embodiment of the present invention;
fig. 3(b) is a schematic view of a second process for preparing a black matrix pattern according to an embodiment of the present invention;
fig. 3(c) is a schematic top view of the black matrix pattern composed of fig. 3(a) and 3 (b);
fig. 4(a) is a first schematic view illustrating a process of manufacturing a display substrate according to an embodiment of the present invention;
FIG. 4(b) is an enlarged schematic view of the region H in FIG. 4 (a);
fig. 5(a) is a schematic view of a second process for preparing a display substrate according to an embodiment of the present invention;
fig. 5(b) is a schematic view of a third process for preparing a display substrate according to an embodiment of the present invention;
fig. 6(a) is a schematic view illustrating a fourth process of manufacturing a display substrate according to an embodiment of the present invention;
FIG. 6(b) is an enlarged schematic view of the region I in FIG. 6 (a);
fig. 7 is a schematic view illustrating a fifth process of manufacturing a display substrate according to an embodiment of the present invention;
fig. 8 is a third schematic top view of a display substrate according to an embodiment of the present invention;
fig. 9 is a second schematic flowchart illustrating a method for manufacturing a display substrate according to an embodiment of the invention;
fig. 10 is a sixth schematic view illustrating a process of manufacturing a display substrate according to an embodiment of the present invention;
fig. 11(a) is a schematic diagram illustrating a seventh process of manufacturing a display substrate according to an embodiment of the present invention;
FIG. 11(b) is an enlarged schematic view of the region J in FIG. 11 (a);
fig. 12 is a schematic view eight illustrating a process of preparing a display substrate according to an embodiment of the present invention;
fig. 13(a) is a schematic view illustrating a process of manufacturing a display substrate according to an embodiment of the present invention;
FIG. 13(b) is an enlarged view of the region K in FIG. 13 (a);
fig. 14 is a schematic structural diagram of a display panel according to an embodiment of the present invention.
Reference numerals:
10-a substrate base plate; 11-black matrix pattern; 111-a first shade bar; 112-a second shading strip; 12-a first touch electrode strip; 13-a first insulating layer; 131-a first insulating strip; 14-a second touch electrode strip; 15-a second insulating layer; 151-second insulating strip.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
An embodiment of the present invention provides a method for manufacturing a display substrate shown in fig. 1(a) and 1(b), which specifically includes the following steps, as shown in fig. 2:
s101, as shown in fig. 3(a) and 3(b), a plurality of first light-shielding stripes 111 and a plurality of second light-shielding stripes 112 intersecting the first light-shielding stripes 111 are formed on the base substrate 10 to obtain the black matrix pattern 11 shown in fig. 3 (c).
First, the material of the black matrix pattern 11 is not limited as long as it has a basic function of shielding light and is not conductive.
Second, the first light-shielding bars 111 and the second light-shielding bars 112 may be formed by a single patterning process, or may be formed by two patterning processes.
For example, when the material of the black matrix pattern 11 is a black light-shielding material other than a black photoresist, a black light-shielding film is first formed on the base substrate 10, and a photoresist is formed over the black light-shielding film; respectively utilizing the first mask plate and the second mask plate to expose the photoresist, and forming a photoresist pattern after developing; then, etching the black shading film to obtain a first shading strip 111 and a second shading strip 112; finally, the photoresist pattern is removed. At this time, the first light-shielding bars 111 and the second light-shielding bars 112 are formed through a one-time patterning process.
Here, the photoresist is a negative photoresist.
Or, when the material of the black matrix pattern 11 is a black light-shielding material except for a black photoresist, first forming a first black light-shielding film on the substrate 10, and forming a photoresist over the first black light-shielding film; exposing the photoresist by using the first mask plate, and developing to form a first photoresist pattern; then, etching the first black shading film to obtain a first shading strip 111; finally, the first photoresist pattern is removed. On this basis, a second black shading film is formed on the substrate 10 on which the first shading strips 111 are formed, and a photoresist is formed above the second black shading film; exposing the photoresist by using the second mask plate, and developing to form a second photoresist pattern; then, the second black light-shielding film is etched to obtain a second light-shielding bar 112. Of course, before the second black light-shielding film, a protective layer covering the first light-shielding bar 111 may be formed to prevent the second light-shielding bar 112 from being etched into the first light-shielding bar 111. At this time, the first light-shielding bars 111 and the second light-shielding bars 112 are formed through a double patterning process.
Or, when the material of the black matrix pattern 11 is a black negative photoresist, a black negative photoresist film is formed on the base substrate 10; and then respectively exposing the black negative photoresist film by using the first mask plate and the second mask plate, and developing to form a first shading strip 111 and a second shading strip 112. At this time, the first light-shielding bars 111 and the second light-shielding bars 112 are formed through a one-time patterning process.
Or, when the material of the black matrix pattern 11 is a black negative photoresist, a first black negative photoresist film is formed on the base substrate 10; and exposing the first black negative photoresist film by using the first mask plate, and developing to form a first shading strip 111. On this basis, a second black negative photoresist film is formed on the base substrate 10 on which the first light-shielding bars 111 are formed; and exposing the second black negative photoresist film by using the second mask plate, and developing to form a second shading strip 112. Considering that the developing process during the formation of the second light-shielding bars 112 does not substantially affect the first light-shielding bars 111, the second black negative photoresist film can directly cover the first light-shielding bars 111, so that no additional film layer is needed, and the structure is relatively simple; of course, before the second black negative photoresist film is formed, a protective layer covering the first light-shielding bars 111 may be formed. At this time, the first light-shielding bars 111 and the second light-shielding bars 112 are formed through a double patterning process.
In summary, it can be seen that the formation of the first light-shielding bars 111 and the second light-shielding bars 112 by a single patterning process has the advantage of simplifying the process steps, and compared with the formation of two black light-shielding films or two black negative photoresist films, only one black light-shielding film or one black negative photoresist film is formed, so that the thickness of the finally obtained black matrix pattern 11 is smaller, which is beneficial to the thin design of the display panel when the display substrate is applied to the display panel.
Third, only 4 first light-shielding bars 111 and 4 second light-shielding bars 112 are shown in the figure, and in practice, there may be hundreds, thousands or even tens of thousands of bars in both. Generally, the first light-shielding bars 111 are parallel to each other, and the second light-shielding bars 112 are also parallel to each other.
According to the arrangement position of the sub-pixels, the first light-shielding bars 111 and the second light-shielding bars 112 are crossed, that is, there is a certain angle between the first light-shielding bars 111 and the second light-shielding bars 112, for example, the first light-shielding bars 111 and the second light-shielding bars 112 may be vertically arranged.
S102, as shown in fig. 4(a) and 4(b), a plurality of first touch electrode stripes 12 are formed on the base substrate 10 on which the black matrix pattern 11 is formed, and the orthographic projection of the first touch electrode stripes 12 and the first light-shielding stripes 111 on the base substrate 10 is overlapped.
Specifically, a conductive film is formed on the base substrate 10 on which the black matrix pattern 11 is formed, and a photoresist is formed on the conductive film; exposing the photoresist by using the first mask plate, and developing to form a photoresist pattern; then, etching the conductive film to form a plurality of first touch electrode strips 12; finally, the photoresist pattern is removed.
Here, the slope of the first touch electrode stripes 12 needs to be set reasonably by adjusting the process parameters, so that the first touch electrode stripes 12 can be attached to the first light-shielding stripes 111.
The material of the first touch electrode stripes 12 is not limited, and may be a metal material such as Cu (copper), Al (aluminum), AlNd (aluminum neodymium alloy), etc., a metal mesh structure formed by the second touch electrode using a metal material described below, or a transparent conductive material such as indium tin oxide (ito) or IZO (indium zinc oxide).
S103, as shown in fig. 5(a) and 5(b), a first insulating layer 13 covering the plurality of first touch electrode stripes 12 is formed on the base substrate 10 on which the plurality of first touch electrode stripes 12 are formed.
It should be noted that, first, the first insulating layer 13 covers the plurality of first touch electrode bars 12, and as the name implies, the first insulating layer 13 should completely wrap the plurality of first touch electrode bars 12, that is, the first insulating layer 13 should cover not only the upper surface of the plurality of first touch electrode bars 12 far away from the substrate 10, but also all the side surfaces of each first touch electrode bar 12.
Secondly, the specific structure of the first insulating layer 13 is not limited, and the first insulating layer 13 may be an entire layer covering the substrate 10, or may include a plurality of first insulating strips 131, where each first insulating strip 131 covers one first touch electrode strip 12.
In consideration of the fact that the light transmittance of the insulating material cannot reach 100%, it is preferable that the first insulating layer 13 includes a plurality of first insulating strips 131, and each first insulating strip 131 covers only one first touch electrode strip 12, so that the transmission of light in the sub-pixel region is not affected, and when the display substrate is applied to a display device, the first insulating layer 13 can be prevented from affecting the light emission luminance of the display device.
Third, the material of the first insulating layer 13 is not limited as long as it has the basic function of insulation and does not affect the normal transmission of light. For example, SiOxNy (silicon oxynitride), a resin, and the like are possible.
Here, in consideration of the fact that the use of a silicon oxynitride material is advantageous for the thin design of the display panel when the display substrate is applied to the display panel, it is preferable to use silicon oxynitride as the material of the first insulating layer 13.
Fourthly, the forming process is different according to the structure and material of the first insulating layer 13, and the following three cases can be specifically classified:
in the first case, when the material of the first insulating layer 13 is silicon oxynitride or resin and is a whole layer structure covering the substrate 10, it is only necessary to form an insulating film on the substrate 10 on which the plurality of first touch electrode bars 12 are formed.
In the second case, when the material of the first insulating layer 13 is silicon oxynitride or non-photosensitive resin and has a structure including a plurality of first insulating strips 131, an insulating film is formed on the substrate 10 on which the plurality of first touch electrode strips 12 are formed; forming photoresist above the insulating film, and forming a photoresist pattern after exposure and development; then, etching the insulating film to form a plurality of first insulating strips 131; finally, the photoresist pattern is removed.
In the third case, when the material of the first insulating layer 13 is photosensitive resin and has a structure including a plurality of first insulating strips 131, an insulating film is formed on the base substrate 10 on which the plurality of first touch electrode strips 12 are formed; the insulating film is exposed and developed to form a plurality of first insulating stripes 131.
S104, as shown in fig. 6(a) and 6(b), a plurality of second touch electrode stripes 14 are formed on the base substrate 10 on which the first insulating layer 13 is formed, and the orthographic projections of the second touch electrode stripes 14 and the second light-shielding stripes 112 on the base substrate 10 are overlapped.
Specifically, a conductive film is formed on the base substrate 10 on which the first insulating layer 13 is formed, and a photoresist is formed on the conductive film; exposing the photoresist by using the second mask plate, and developing to form a photoresist pattern; then, etching the conductive film to form a plurality of second touch electrode strips 14; finally, the photoresist pattern is removed.
Here, the slope of the second touch electrode bars 14 needs to be reasonably set by adjusting the process parameters, so that the second touch electrode bars 14 can be attached to the second light-shielding bars 112.
The material of the second touch electrode bars 14 is not limited, and may be a metal material such as copper, aluminum neodymium alloy, etc., so as to form a metal mesh structure with the first touch electrodes 12 using the metal material, or a transparent conductive material such as indium tin oxide, indium zinc oxide, etc.
S105, as shown in fig. 7, a second insulating layer 15 covering the plurality of second touch electrode stripes 14 is formed on the base substrate 10 on which the plurality of second touch electrode stripes 14 are formed.
It should be noted that, the first and second insulating layers 15 cover the plurality of second touch electrode bars 14, and as the name implies, the second insulating layer 15 should completely wrap the plurality of second touch electrode bars 14, that is, the second insulating layer 15 should cover not only the upper surface of the plurality of second touch electrode bars 14 far away from the substrate 10, but also all sides of each second touch electrode bar 14.
Secondly, the specific structure of the second insulating layer 15 is not limited, and the second insulating layer 15 may be an entire layer covering the substrate 10, or may include a plurality of second insulating strips 151, where each second insulating strip 151 covers one second touch electrode strip 14.
In view of the fact that the light transmittance of the insulating material cannot reach 100%, it is preferable that the second insulating layer 15 includes a plurality of second insulating bars 151, and each second insulating bar 151 covers only one second touch electrode bar 14, so that the transmission of light in the sub-pixel region is not affected, and when the display substrate is applied to a display device, the second insulating layer 15 is prevented from affecting the light emitting luminance of the display device.
Third, the material of the second insulating layer 15 is not limited as long as it has the basic function of insulation and does not affect the normal transmission of light. For example, silicon oxynitride, resin, or the like may be used.
Here, in consideration of the fact that the use of a silicon oxynitride material is advantageous for the thin design of the display panel when the display substrate is applied to the display panel, it is preferable to use silicon oxynitride as the material of the second insulating layer 15.
Fourthly, according to the structure and material of the second insulating layer 15, the forming process thereof is different, and the following three cases can be specifically classified:
in the first case, when the material of the second insulating layer 15 is silicon oxynitride or resin and is a whole layer structure covering the substrate 10, it is only necessary to form an insulating film on the substrate 10 on which the plurality of second touch electrode bars 14 are formed.
In the second case, when the material of the second insulating layer 15 is silicon oxynitride or non-photosensitive resin and has a structure including a plurality of second insulating stripes 151, an insulating film is formed on the substrate 10 on which the plurality of second touch electrode stripes 14 are formed; forming photoresist above the insulating film, and forming a photoresist pattern after exposure and development; then, etching the insulating film to form a plurality of second insulating stripes 151; finally, the photoresist pattern is removed.
In the third case, when the material of the second insulating layer 15 is photosensitive resin and has a structure including a plurality of second insulating strips 151, an insulating film is formed on the base substrate 10 on which the plurality of second touch electrode strips 14 are formed; and exposing and developing the insulating film to form a plurality of second insulating stripes 151.
The first light-shielding strips 111 and the first touch electrode strips 12 are obtained by exposing through a first mask plate; the plurality of second light-shielding bars 112 and the plurality of second touch electrode bars 14 are obtained by exposing with a second mask.
First, the display substrate, as its name implies, is: examples of the substrate applied in the display device may be a touch substrate, or a substrate for a touch panel integrated with a touch function.
Second, the first touch electrode strips 12 and the second touch electrode strips 14 can be used as sensing electrodes and driving electrodes, respectively, wherein when the first touch electrode strips 12 are sensing electrodes, the second touch electrode strips 14 are driving electrodes; alternatively, when the first touch electrode strips 12 are driving electrodes, the second touch electrode strips 14 are sensing electrodes.
The embodiment of the invention provides a method for manufacturing a display substrate, which comprises the steps of obtaining a first light-shielding bar 111 by adopting a first mask plate for exposure in the process of forming a black matrix pattern 11, obtaining a second light-shielding bar 112 by adopting a second mask plate for exposure, and adopting the first mask plate for exposure when a first touch electrode bar 12 is formed subsequently, and adopting the second mask plate for exposure when a second touch electrode bar 14 is formed subsequently, so that orthographic projections of the first touch electrode bar 12 and the first light-shielding bar 111 on a substrate 10 are overlapped, orthographic projections of the second touch electrode bar 14 and the second light-shielding bar 112 on the substrate 10 are overlapped, on the basis of avoiding the problems of moire and metal reflection, 3 different mask plates are required for manufacturing the black matrix pattern 11, the first touch electrode bar 12 and the second touch electrode bar 14 in the prior art, and this application only adopt 2 can, consequently, reduced and formed the quantity of the used mask slice of display substrates in-process can improve the utilization ratio of mask slice, has reduced the exposure machine simultaneously and has received external environmental pollution's possibility to shorten the PM time, have the cost-effective, improve the production efficiency's of producing the line effect.
On this basis, when the display substrate is applied to a display device, the display substrate can be used as a box-to-box substrate of the display device, and the first touch electrode strips 12 and the second touch electrode strips 14 are formed on the array substrate, so that the first touch electrode strips 12 and the second touch electrode strips 14 are formed on the box-to-box substrate and are closer to a touch surface of the display device, which is beneficial to increasing touch accuracy.
An embodiment of the present invention provides a method for manufacturing a display substrate as shown in fig. 8, which includes the following steps, as shown in fig. 9:
s201, as shown in fig. 3(a) and 3(b), a plurality of first light-shielding stripes 111 and a plurality of second light-shielding stripes 112 crossing the first light-shielding stripes 111 are formed on the base substrate 10 to obtain the black matrix pattern 11 shown in fig. 3 (c).
First, the material of the black matrix pattern 11 is not limited as long as it has a basic function of shielding light and is not conductive.
Second, the first light-shielding bars 111 and the second light-shielding bars 112 may be formed by a single patterning process, or may be formed by two patterning processes.
For example, when the material of the black matrix pattern 11 is a black light-shielding material other than a black photoresist, a black light-shielding film is first formed on the base substrate 10, and a photoresist is formed over the black light-shielding film; respectively utilizing the first mask plate and the second mask plate to expose the photoresist, and forming a photoresist pattern after developing; then, etching the black shading film to obtain a first shading strip 111 and a second shading strip 112; finally, the photoresist pattern is removed. At this time, the first light-shielding bars 111 and the second light-shielding bars 112 are formed through a one-time patterning process.
Here, the photoresist is a negative photoresist.
Or, when the material of the black matrix pattern 11 is a black light-shielding material except for a black photoresist, first forming a first black light-shielding film on the substrate 10, and forming a photoresist over the first black light-shielding film; exposing the photoresist by using the first mask plate, and developing to form a first photoresist pattern; then, etching the first black shading film to obtain a first shading strip 111; finally, the first photoresist pattern is removed. On this basis, a second black shading film is formed on the substrate 10 on which the first shading strips 111 are formed, and a photoresist is formed above the second black shading film; exposing the photoresist by using the second mask plate, and developing to form a second photoresist pattern; then, the second black light-shielding film is etched to obtain a second light-shielding bar 112. Of course, before the second black light-shielding film, a protective layer covering the first light-shielding bar 111 may be formed to prevent the second light-shielding bar 112 from being etched into the first light-shielding bar 111. At this time, the first light-shielding bars 111 and the second light-shielding bars 112 are formed through a double patterning process.
Or, when the material of the black matrix pattern 11 is a black negative photoresist, a black negative photoresist film is formed on the base substrate 10; and then respectively exposing the black negative photoresist film by using the first mask plate and the second mask plate, and developing to form a first shading strip 111 and a second shading strip 112. At this time, the first light-shielding bars 111 and the second light-shielding bars 112 are formed through a one-time patterning process.
Or, when the material of the black matrix pattern 11 is a black negative photoresist, a first black negative photoresist film is formed on the base substrate 10; and exposing the first black negative photoresist film by using the first mask plate, and developing to form a first shading strip 111. On this basis, a second black negative photoresist film is formed on the base substrate 10 on which the first light-shielding bars 111 are formed; and exposing the second black negative photoresist film by using the second mask plate, and developing to form a second shading strip 112. Considering that the developing process during the formation of the second light-shielding bars 112 does not substantially affect the first light-shielding bars 111, the second black negative photoresist film can directly cover the first light-shielding bars 111, so that no additional film layer is needed, and the structure is relatively simple; of course, before the second black negative photoresist film is formed, a protective layer covering the first light-shielding bars 111 may be formed. At this time, the first light-shielding bars 111 and the second light-shielding bars 112 are formed through a double patterning process.
In summary, it can be seen that the formation of the first light-shielding bars 111 and the second light-shielding bars 112 by a single patterning process has the advantage of simplifying the process steps, and compared with the formation of two black light-shielding films or two black negative photoresist films, only one black light-shielding film or one black negative photoresist film is formed, so that the thickness of the finally obtained black matrix pattern 11 is smaller, which is beneficial to the thin design of the display panel when the display substrate is applied to the display panel.
Third, only 4 first light-shielding bars 111 and 4 second light-shielding bars 112 are shown in the figure, and in practice, there may be hundreds, thousands or even tens of thousands of bars in both. Generally, the first light-shielding bars 111 are parallel to each other, and the second light-shielding bars 112 are also parallel to each other.
The first light-shielding bars 111 and the second light-shielding bars 112 are formed in a cross shape according to the arrangement positions of the sub-pixels, that is, an included angle is formed between the first light-shielding bars 111 and the second light-shielding bars 112, for example, the first light-shielding bars 111 and the second light-shielding bars 112 may be vertically arranged.
S202, as shown in fig. 10, a plurality of first touch electrode stripes 12 are formed on the base substrate 10 on which the black matrix pattern 11 is formed.
Specifically, a conductive film is formed on the base substrate 10 on which the black matrix pattern 11 is formed; forming photoresist on the conductive film, and forming a photoresist pattern after exposure and development; then, etching the conductive film to form a plurality of first touch electrode strips 12; finally, the photoresist pattern is removed.
Here, since the orthographic projection of the subsequently formed first insulating layer 13 and the first light-shielding bars 111 on the substrate 10 is overlapped, and each first insulating bar 131 covers one first touch electrode bar 12, the line width of the first touch electrode bar 12 needs to be set reasonably, so that the line width of the first touch electrode bar 12 should be smaller than the line width of the first light-shielding bar 111. In addition, the gradient of the first touch electrode bars 12 also needs to be set appropriately by adjusting the process parameters, so that the first touch electrode bars 12 can be attached to the first light-shielding bars 111.
The material of the first touch electrode bars 12 is not limited, and may be a metal material such as copper, aluminum neodymium alloy, etc., a metal mesh structure formed by the second touch electrodes using a metal material described below, or a transparent conductive material such as indium tin oxide, indium zinc oxide, etc.
S203, as shown in fig. 11(a) and 11(b), a first insulating layer 13 is formed on the base substrate 10 on which the plurality of first touch electrode bars 12 are formed, the first insulating layer 13 includes a plurality of first insulating bars 131, and the first insulating bars 131 overlap with an orthographic projection of the first light-shielding bars 111 on the base substrate 10.
First, the material of the first insulating layer 13 is not limited as long as it has a basic insulating function and does not affect the normal transmission of light. For example, silicon oxynitride, resin, or the like may be used.
Here, in consideration of the fact that the use of a silicon oxynitride material is advantageous for the thin design of the display panel when the display substrate is applied to the display panel, it is preferable to use silicon oxynitride as the material of the first insulating layer 13.
Secondly, the forming process is different according to the material of the first insulating layer 13, which can be divided into the following two cases:
in the first case, when the material of the first insulating layer 13 is silicon oxynitride or non-photosensitive resin, an insulating film is formed on the substrate 10 on which the plurality of first touch electrode bars 12 are formed; forming photoresist above the insulating film, and forming a photoresist pattern after exposure and development; then, etching the insulating film to form a plurality of first insulating strips 131; finally, the photoresist pattern is removed.
In the second case, when the material of the first insulating layer 13 is photosensitive resin, an insulating film is formed on the base substrate 10 on which the plurality of first touch electrode bars 12 are formed; the insulating film is exposed and developed to form a plurality of first insulating stripes 131.
S204, as shown in fig. 12, a plurality of second touch electrode stripes 14 are formed on the base substrate 10 on which the first insulating layer 13 is formed.
Specifically, a conductive film is formed on the base substrate 10 on which the first insulating layer 13 is formed; forming photoresist on the conductive film, and forming a photoresist pattern after exposure and development; then, etching the conductive film to form a plurality of second touch electrode strips 14; finally, the photoresist pattern is removed.
Here, since the orthographic projections of the subsequently formed second insulating layers 15 and the second light-shielding bars 112 on the substrate 10 are overlapped, and each second insulating bar 151 covers one second touch electrode bar 14, the line width of the second touch electrode bar 14 needs to be set reasonably, so that the line width of the second touch electrode bar 14 should be smaller than the line width of the second light-shielding bar 112. In addition, the slope of the second touch electrode bars 14 also needs to be set appropriately by adjusting the process parameters, so that the second touch electrode bars 14 can be attached to the second light-shielding bars 112.
The material of the second touch electrode bars 14 is not limited, and may be a metal material such as copper, aluminum neodymium alloy, etc., so as to form a metal mesh structure with the first touch electrodes 12 using the metal material, or a transparent conductive material such as indium tin oxide, indium zinc oxide, etc.
S205, as shown in fig. 13(a) and 13(b), a second insulating layer 15 is formed on the base substrate 10 on which the plurality of second touch electrode bars 14 are formed, the second insulating layer 15 includes a plurality of second insulating bars 151, and the second insulating bars 151 overlap with orthographic projections of the second light-shielding bars 112 on the base substrate 10.
First, the material of the second insulating layer 15 is not limited as long as it has a basic insulating function and does not affect the normal transmission of light. For example, silicon oxynitride, resin, or the like may be used.
Here, in consideration of the fact that the use of a silicon oxynitride material is advantageous for the thin design of the display panel when the display substrate is applied to the display panel, it is preferable to use silicon oxynitride as the material of the second insulating layer 15.
Secondly, the forming process is different according to the material of the second insulating layer 15, and the following two cases can be specifically distinguished:
in the first case, when the material of the second insulating layer 15 is silicon oxynitride or non-photosensitive resin, an insulating film is formed on the substrate 10 on which the plurality of second touch electrode bars 14 are formed; forming photoresist above the insulating film, and forming a photoresist pattern after exposure and development; then, etching the insulating film to form a plurality of second insulating stripes 151; finally, the photoresist pattern is removed.
In the second case, when the material of the second insulating layer 15 is photosensitive resin, an insulating film is formed on the base substrate 10 on which the plurality of second touch electrode stripes 14 are formed; and exposing and developing the insulating film to form a plurality of second insulating stripes 151.
The first light-shielding strips 111 and the first insulating layer 13 are obtained by exposing with a first mask; the plurality of second light-shielding strips 112 and the second insulating layer 15 are obtained by exposing with a second mask plate; each first insulating strip 131 covers one first touch electrode strip 12; each of the second insulating strips 151 covers one of the second touch electrode strips 14.
It should be noted that, each first insulating strip 131 covers one first touch electrode strip 12, and as the name implies, one first insulating strip 131 should completely wrap one first touch electrode strip 12, that is, one first insulating strip 131 should cover not only the upper surface of one first touch electrode strip 12 far away from the substrate base plate 10, but also all the side surfaces of the one first touch electrode strip 12; each second insulating strip 151 covers one second touch electrode strip 14, and as the name implies, one second insulating strip 151 should completely wrap one second touch electrode strip 14, that is, one second insulating strip 151 should cover not only the upper surface of one second touch electrode strip 14 away from the substrate base plate 10, but also all the side surfaces of the second touch electrode strip 14.
Secondly, the display substrate, as the name implies: examples of the substrate applied in the display device may be a touch substrate, or a substrate for a touch panel integrated with a touch function.
Third, the first touch electrode strips 12 and the second touch electrode strips 14 can be used as sensing electrodes and driving electrodes, respectively, wherein when the first touch electrode strips 12 are sensing electrodes, the second touch electrode strips 14 are driving electrodes; alternatively, when the first touch electrode strips 12 are driving electrodes, the second touch electrode strips 14 are sensing electrodes.
In the process of forming the black matrix pattern 11, the first mask plate is used for exposure to obtain the first light-shielding bars 111, the second mask plate is used for exposure to obtain the second light-shielding bars 112, the first mask plate is still used for exposure when the first insulating layer 13 is subsequently formed, and the second mask plate is still used for exposure when the second insulating layer 15 is formed, so that orthographic projections of the first insulating bars 131 and the first light-shielding bars 111 on the substrate 10 are overlapped, orthographic projections of the second insulating bars 151 and the second light-shielding bars 112 on the substrate 10 are overlapped, each first insulating bar 131 covers one first touch electrode bar 12, each second insulating bar 151 covers one second touch electrode bar 14, and the black matrix pattern 11, the second touch electrode bar and the second touch electrode bar 14 can be manufactured on the basis of avoiding the problems of moire and metal reflection in the prior art, First touch-control electrode strip 12, second touch-control electrode strip 14 need adopt 3 different mask slice, and this application only adopt 2 can, consequently, reduce and form the quantity of the used mask slice of display substrate in-process can improve the utilization ratio of mask slice, has reduced the possibility that the exposure machine received external environment pollution simultaneously to shorten the PM time, have the cost-effective, improve the production efficiency's of producing the line effect.
On this basis, when the display substrate is applied to a display device, the display substrate can be used as a box-to-box substrate of the display device, and the first touch electrode strips 12 and the second touch electrode strips 14 are formed on the array substrate, so that the first touch electrode strips 12 and the second touch electrode strips 14 are formed on the box-to-box substrate and are closer to a touch surface of the display device, which is beneficial to increasing touch accuracy.
An embodiment of the present invention provides a display substrate, as shown in fig. 1(a), 1(b) and 8, including a substrate 10, a black matrix pattern 11, a plurality of first touch electrode stripes 12, a first insulating layer 13 covering the plurality of first touch electrode stripes 12, a plurality of second touch electrode stripes 14, and a second insulating layer 15 covering the plurality of second touch electrode stripes 14, which are sequentially disposed on the substrate 10; the black matrix pattern 11 includes a plurality of first light-shielding bars 111 and a plurality of second light-shielding bars 112 arranged in a crossing manner.
The orthographic projection of the first touch electrode stripes 12 and the first light-shielding stripes 111 on the substrate 10 is overlapped, and the orthographic projection of the second touch electrode stripes 14 and the second light-shielding stripes 112 on the substrate 10 is overlapped.
Alternatively, the first insulating layer 13 includes a plurality of first insulating strips 131, the first insulating strips 131 overlap with the orthographic projections of the first light-shielding strips 111 on the substrate 10, and each first insulating strip 131 covers one first touch electrode strip 12; the second insulating layer 15 includes a plurality of second insulating bars 151, the second insulating bars 151 overlap with orthographic projections of the second light-shielding bars 112 on the base substrate 10, and each second insulating bar 151 covers one second touch electrode bar 14.
First, the material of the black matrix pattern 11 is not limited as long as it has a basic function of shielding light and is not conductive.
Second, the first light-shielding bar 111 and the second light-shielding bar 112 may have hundreds, thousands or even tens of thousands of bars. Generally, the first light-shielding bars 111 are parallel to each other, and the second light-shielding bars 112 are also parallel to each other.
According to the arrangement position of the sub-pixels, the first light-shielding bars 111 and the second light-shielding bars 112 are disposed in a cross shape, that is, there is a certain included angle between the first light-shielding bars 111 and the second light-shielding bars 112, for example, the first light-shielding bars 111 and the second light-shielding bars 112 may be disposed vertically.
Third, the material of the first touch electrode stripes 12 and the second touch electrode stripes 14 is not limited, and may be a metal material such as copper, aluminum neodymium alloy, etc., and the two may form a metal mesh structure, or a transparent conductive material such as indium tin oxide, indium zinc oxide, etc.
Fourthly, the first insulating layer 13 should completely wrap the plurality of first touch electrode strips 12, that is, the first insulating layer 13 should cover not only the upper surface of the plurality of first touch electrode strips 12 away from the substrate base plate 10, but also all the side surfaces of each first touch electrode strip 12; the second insulating layer 15 should completely cover the plurality of second touch electrode bars 14, that is, the second insulating layer 15 should cover not only the upper surface of the plurality of second touch electrode bars 14 away from the substrate base plate 10, but also all sides of each second touch electrode bar 14.
Fifth, the materials of the first insulating layer 13 and the second insulating layer 15 are not limited as long as they have the basic function of insulation and do not affect the normal transmission of light. For example, silicon oxynitride, resin, or the like may be used.
Here, in consideration of the fact that the use of a silicon oxynitride material is advantageous for the thin design of the display panel when the display substrate is applied to the display panel, it is preferable to use silicon oxynitride as the material of the first insulating layer 13 and the second insulating layer 15.
Sixthly, the display substrate, as the name implies: examples of the substrate applied in the display device may be a touch substrate, or a substrate for a touch panel integrated with a touch function.
Seventh, the first touch electrode strips 12 and the second touch electrode strips 14 can be used as sensing electrodes and driving electrodes, respectively, wherein when the first touch electrode strips 12 are sensing electrodes, the second touch electrode strips 14 are driving electrodes; alternatively, when the first touch electrode strips 12 are driving electrodes, the second touch electrode strips 14 are sensing electrodes.
The embodiment of the invention provides a display substrate, which is obtained by exposing a plurality of first light-shielding strips 111 and first touch electrode strips 12 by using a first mask plate, so that orthographic projections of the first light-shielding strips 111 and the first touch electrode strips 12 on a substrate 10 are overlapped, and a plurality of second light-shielding strips 112 and second touch electrode strips 14 are exposed by using a second mask plate, so that orthographic projections of the second light-shielding strips 112 and the second touch electrode strips 14 on the substrate 10 are overlapped; or, by exposing the plurality of first light-shielding bars 111 and the first insulating layer 13 with a first mask, so as to overlap the orthographic projections of the first light-shielding bars 111 and the first insulating bars 131 on the substrate 10, and exposing the plurality of second light-shielding bars 112 and the second insulating layer 15 with a second mask, so as to overlap the orthographic projections of the second light-shielding bars 112 and the second insulating bars 151 on the substrate 10, and disposing the first insulating layer 13 covering the plurality of first touch electrode bars 12, and disposing the second insulating layer 15 covering the plurality of second touch electrode bars 14, on the basis of avoiding the moire and metal reflection problems, since 3 different masks are required to be employed in the prior art for manufacturing the black matrix pattern 11, the first touch electrode bars 12, and the second touch electrode bars 14, the present application only employs 2 masks, thereby reducing the number of masks used in the process of forming the display substrate, the utilization rate of the mask plate can be improved, and the possibility that the exposure machine is polluted by the external environment is reduced, so that the PM time is shortened, the cost is saved, and the production efficiency of a production line is improved.
On this basis, when the display substrate is applied to a display device, the display substrate can be used as a box-to-box substrate of the display device, and the first touch electrode strips 12 and the second touch electrode strips 14 are arranged on the array substrate, and the first touch electrode strips 12 and the second touch electrode strips 14 are arranged on the box-to-box substrate, so that the touch surface of the display device is closer, the touch accuracy is favorably increased, and the process for preparing the display substrate is simple, and the display device is easy to touch.
Considering that a black negative photoresist is used as the material of the black matrix pattern 11, the black matrix pattern 11 can be obtained only by exposure and development, which has the effect of simplifying the process steps, and therefore, it is preferable that the material of the black matrix pattern 11 is a black negative photoresist.
Preferably, the material of the plurality of first touch electrode bars 12 and the plurality of second touch electrode bars 14 includes a conductive metal.
In the embodiment of the invention, compared with an indium tin oxide material, the sheet resistance of a metal material is smaller, the requirement on an active pen is lower, and when the display substrate is applied to a display device, the touch performance of the edge area of the display device is better than that of a touch device with a GFF (Glass-Film) structure.
Preferably, as shown in fig. 5(b) and 7, when the first touch electrode stripes 12 overlap with the orthographic projection of the first light-shielding stripes 111 on the base substrate 10 and the second touch electrode stripes 14 overlap with the orthographic projection of the second light-shielding stripes 112 on the base substrate 10, the first insulating layer 13 includes a plurality of first insulating stripes 131, and each first insulating stripe 131 covers one first touch electrode stripe 12; the second insulating layer 15 includes a plurality of second insulating bars 151, and each second insulating bar 151 covers one second touch electrode bar 14.
In the embodiment of the present invention, since the light transmittance of the insulating material cannot reach 100%, the first insulating layer 13 includes a plurality of first insulating strips 131, each first insulating strip 131 only covers one first touch electrode strip 12, the second insulating layer 15 includes a plurality of second insulating strips 151, and each second insulating strip 151 only covers one second touch electrode strip 14, so that the transmission of light in the sub-pixel region is not affected, and when the display substrate is applied to a display device, the first insulating layer 13 and the second insulating layer 15 can be prevented from affecting the light emission luminance of the display device.
An embodiment of the invention provides a display panel, as shown in fig. 14, including the display substrate according to any of the foregoing embodiments.
Here, the display panel may be a liquid crystal display panel including an array substrate, a display substrate, and a liquid crystal layer disposed therebetween. The display substrate may include a black matrix pattern 11, a color film, and a common electrode. Here, the color film may be disposed on the display substrate or on the array substrate; the common electrode may be disposed on the display substrate or the array substrate.
Embodiments of the present invention provide a display panel having the same technical effects as the display substrate, and are not described herein again.
The above description is only for the specific embodiments of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art can easily conceive of the changes or substitutions within the technical scope of the present invention, and all the changes or substitutions should be covered within the scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the protection scope of the appended claims.
Claims (10)
1. A method for preparing a display substrate is characterized by comprising the following steps:
forming a plurality of first light-shielding strips and a plurality of second light-shielding strips crossed with the first light-shielding strips on a substrate to obtain a black matrix pattern;
forming a plurality of first touch electrode strips on the substrate with the black matrix pattern, wherein the first touch electrode strips are overlapped with orthographic projections of the first shading strips on the substrate;
forming a first insulating layer covering the plurality of first touch electrode strips on the substrate base plate on which the plurality of first touch electrode strips are formed;
forming a plurality of second touch electrode strips on the substrate with the first insulating layer, wherein orthographic projections of the second touch electrode strips and the second light shielding strips on the substrate are overlapped;
forming a second insulating layer covering the plurality of second touch electrode bars on the substrate base plate on which the plurality of second touch electrode bars are formed;
the first light-shielding strips and the first touch electrode strips are obtained by exposing through a first mask plate; the plurality of second shading strips and the plurality of second touch electrode strips are obtained by exposure of a second mask plate.
2. The method of claim 1, wherein forming a plurality of first light-shielding bars and a plurality of second light-shielding bars crossing the first light-shielding bars on a substrate to obtain a black matrix pattern comprises:
forming a black shading film and photoresist on the substrate, respectively exposing the photoresist by using the first mask plate and the second mask plate, and forming the black matrix pattern after developing, etching and stripping processes;
alternatively, the first and second electrodes may be,
and forming a black negative photoresist film on the substrate, respectively exposing the black negative photoresist film by using the first mask plate and the second mask plate, and developing to form the black matrix pattern.
3. The production method according to claim 1,
the forming, on the substrate on which the plurality of first touch electrode stripes are formed, a first insulating layer covering the plurality of first touch electrode stripes includes:
the first insulating layer comprises a plurality of first insulating strips, and each first insulating strip covers one first touch electrode strip;
the forming, on the substrate on which the plurality of second touch electrode stripes are formed, a second insulating layer covering the plurality of second touch electrode stripes includes:
the second insulating layer includes a plurality of second insulating strips, and each of the second insulating strips covers one of the second touch electrode strips.
4. A method for preparing a display substrate is characterized by comprising the following steps:
forming a plurality of first light-shielding strips and a plurality of second light-shielding strips crossed with the first light-shielding strips on a substrate to obtain a black matrix pattern;
forming a plurality of first touch electrode strips on the substrate with the black matrix pattern;
forming a first insulating layer on the substrate base plate on which the plurality of first touch electrode bars are formed, wherein the first insulating layer comprises a plurality of first insulating bars, and the first insulating bars are overlapped with orthographic projections of the first light shielding bars on the substrate base plate;
forming a plurality of second touch electrode strips on the substrate with the first insulating layer;
forming a second insulating layer on the substrate on which the plurality of second touch electrode bars are formed, wherein the second insulating layer comprises a plurality of second insulating bars, and the second insulating bars are overlapped with orthographic projections of the second light shielding bars on the substrate;
the first light shading strips and the first insulating layer are obtained by adopting a first mask plate for exposure; the plurality of second shading strips and the second insulating layer are obtained by adopting a second mask plate for exposure;
each first insulating strip covers one first touch electrode strip; each second insulating strip covers one second touch electrode strip.
5. The method of claim 4, wherein forming a plurality of first light-shielding strips and a plurality of second light-shielding strips crossing the first light-shielding strips on a substrate to obtain a black matrix pattern comprises:
forming a black shading film and photoresist on the substrate, respectively exposing the photoresist by using the first mask plate and the second mask plate, and forming the black matrix pattern after developing, etching and stripping processes;
alternatively, the first and second electrodes may be,
and forming a black negative photoresist film on the substrate, respectively exposing the black negative photoresist film by using the first mask plate and the second mask plate, and developing to form the black matrix pattern.
6. A display substrate is characterized by comprising a substrate base plate, a black matrix pattern, a plurality of first touch electrode strips, a first insulating layer, a plurality of second touch electrode strips and a second insulating layer, wherein the black matrix pattern, the plurality of first touch electrode strips, the first insulating layer, the plurality of second touch electrode strips and the second insulating layer are sequentially arranged on the substrate base plate;
the black matrix pattern comprises a plurality of first light-shielding strips and a plurality of second light-shielding strips which are arranged in a crossed manner;
the orthographic projections of the first touch electrode strips and the first shading strips on the substrate are overlapped, and the orthographic projections of the second touch electrode strips and the second shading strips on the substrate are overlapped;
the first light-shielding strips and the first touch electrode strips are obtained by exposing through a first mask plate; the plurality of second shading strips and the plurality of second touch electrode strips are obtained by adopting a second mask plate for exposure;
or, the first insulating layer includes a plurality of first insulating strips, the first insulating strips overlap with orthographic projections of the first light-shielding strips on the substrate, and each first insulating strip covers one first touch electrode strip; the second insulating layer comprises a plurality of second insulating strips, the second insulating strips are overlapped with orthographic projections of the second shading strips on the substrate, and each second insulating strip covers one second touch electrode strip;
the first light-shielding strips and the first insulating strips are obtained by adopting a first mask plate for exposure; the plurality of second shading strips and the plurality of second insulating strips are obtained by exposure of a second mask plate.
7. The display substrate according to claim 6, wherein the material of the black matrix pattern is a black negative photoresist.
8. The display substrate of claim 6, wherein a material of the first touch electrode strips and the second touch electrode strips comprises a conductive metal.
9. The display substrate according to claim 6, wherein when the first touch electrode stripes overlap with orthographic projections of the first light-shielding stripes on the substrate and the second touch electrode stripes overlap with orthographic projections of the second light-shielding stripes on the substrate, the first insulating layer comprises a plurality of first insulating stripes, each of the first insulating stripes covers one of the first touch electrode stripes; the second insulating layer includes a plurality of second insulating strips, and each of the second insulating strips covers one of the second touch electrode strips.
10. A display panel comprising the display substrate according to any one of claims 6 to 9.
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| CN107908316B (en) * | 2018-01-03 | 2021-10-26 | 京东方科技集团股份有限公司 | Touch screen, preparation method thereof and touch display device |
| CN108922905A (en) | 2018-07-17 | 2018-11-30 | 京东方科技集团股份有限公司 | A kind of display base plate and preparation method, display panel |
| CN108984038B (en) * | 2018-07-25 | 2022-04-05 | 京东方科技集团股份有限公司 | Display substrate, embedded touch screen and display device |
| CN109739395B (en) * | 2019-01-02 | 2022-11-01 | 京东方科技集团股份有限公司 | Touch display panel, manufacturing method thereof and touch display device |
| WO2020258025A1 (en) | 2019-06-25 | 2020-12-30 | Boe Technology Group Co., Ltd. | Touch control display panel, touch control display apparatus, counter substrate, and method of fabricating touch control display panel |
| CN110941363B (en) * | 2019-11-26 | 2023-07-04 | 京东方科技集团股份有限公司 | Touch panel and display device |
| CN111430439B (en) * | 2020-04-27 | 2022-08-30 | 武汉天马微电子有限公司 | Display panel and display device |
| CN113534519B (en) * | 2021-07-30 | 2023-03-24 | 惠科股份有限公司 | Liquid crystal display panel and display device |
| CN113631002B (en) * | 2021-09-13 | 2022-12-13 | Oppo广东移动通信有限公司 | Shell assembly and electronic equipment |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104635372A (en) * | 2015-02-06 | 2015-05-20 | 京东方科技集团股份有限公司 | Color film substrate and display device |
Family Cites Families (6)
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| CN103558942B (en) * | 2013-11-08 | 2016-03-09 | 京东方科技集团股份有限公司 | Touch-screen and manufacture method thereof |
| CN103558712B (en) * | 2013-11-21 | 2015-12-02 | 京东方科技集团股份有限公司 | A kind of color membrane substrates, its method for making, In-cell touch panel and display device |
| CN104156131B (en) * | 2014-08-20 | 2017-07-28 | 深圳市华星光电技术有限公司 | The manufacture method of touch-screen |
| CN105159514B (en) * | 2015-09-15 | 2019-03-15 | 深圳市华星光电技术有限公司 | A kind of touch panel and preparation method thereof |
| CN106293294B (en) * | 2016-08-09 | 2019-01-15 | 京东方科技集团股份有限公司 | A kind of touch module and preparation method thereof, display panel and display device |
| CN106919284A (en) * | 2017-02-27 | 2017-07-04 | 京东方科技集团股份有限公司 | Touch base plate and preparation method thereof, electronic installation |
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