CN106125972A - The manufacture method of protective layer, array base palte and preparation method thereof and touch screen - Google Patents
The manufacture method of protective layer, array base palte and preparation method thereof and touch screen Download PDFInfo
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- CN106125972A CN106125972A CN201610407252.5A CN201610407252A CN106125972A CN 106125972 A CN106125972 A CN 106125972A CN 201610407252 A CN201610407252 A CN 201610407252A CN 106125972 A CN106125972 A CN 106125972A
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- protective layer
- touch electrode
- layer
- gap
- manufacture method
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04107—Shielding in digitiser, i.e. guard or shielding arrangements, mostly for capacitive touchscreens, e.g. driven shields, driven grounds
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- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Theoretical Computer Science (AREA)
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- General Physics & Mathematics (AREA)
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Abstract
The present invention provides the manufacture method of a kind of protective layer, array base palte and preparation method thereof and touch screen; its method comprises the following steps: S1; making the first protective layer, this first protective layer covers the upper surface of each touch electrode, and fills the gap between each adjacent two touch electrodes；S2, removes the first protective layer of the upper surface of touch electrode unless each；S3, makes the second protective layer, and this second protective layer covers the upper surface of the first protective layer in the upper surface of each touch electrode and each gap.The manufacture method of protective layer that the present invention provides, it can avoid causing various vestige (Mura phenomenon) and different aobvious etc. bad phenomenon, and touch electrode layer cannot shield the phenomenon of lower floor's electric field, thus improves display quality.
Description
Technical field
The present invention relates to display device manufacture field, in particular it relates to the manufacture method of a kind of protective layer, array base palte and
Its manufacture method and touch screen.
Background technology
At present,
Relative to touch panel is arranged on liquid crystal panel the original method used, In Cell method refers to touch
The function of panel is embedded into the method in liquid crystal pixel.In recent years, due to In-cell touch panel (in cell touch panel)
Screen can be made to become more frivolous, so In-cell touch panel application in display floater at present is more and more extensive.
Touch screen includes array base palte and the color membrane substrates arranging box, is provided with liquid crystal layer between.Wherein, as
Shown in Fig. 1, for the sectional view of existing a kind of array base palte.This array base palte includes common electrode layer 1 and to be arranged on this public
Protective layer 2 on electrode layer 1, this common electrode layer 1 is also simultaneously as touch electrode layer, including spaced multiple touch electricity
Pole, thus between adjacent two touch electrodes, form gap 11.
In actual applications, due to the existence in above-mentioned gap 11, cause the protective layer 2 being deposited on touch electrode layer upper
Stating gap location formation section and differ from 21, this section differs from 21 brightness irregularities often causing display screen, thus causes various vestige (Mura
Phenomenon) and different aobvious etc. bad phenomenon.Additionally, the existence in above-mentioned gap also can make touch electrode layer cannot shield lower floor's electric field
Phenomenon, thus affect display quality.
Summary of the invention
It is contemplated that at least solve one of technical problem present in prior art, it is proposed that the making of a kind of protective layer
Method, array base palte and preparation method thereof and touch screen, it can avoid causing various vestige (Mura phenomenon) and different aobvious etc.
Bad phenomenon, and touch electrode layer cannot shield the phenomenon of lower floor's electric field, thus improve display quality.
There is provided the manufacture method of a kind of protective layer for realizing the purpose of the present invention, touch electrode layer includes spaced
Multiple touch electrodes, to form gap between adjacent two described touch electrodes, comprise the following steps:
S1, makes the first protective layer, and described first protective layer covers the upper surface of each described touch electrode, and fills
Each described gap；
S2, removes described first protective layer of the upper surface of the most described touch electrode；
S3, makes the second protective layer, described second protective layer cover the upper surface of each described touch electrode and each
The upper surface of the first protective layer in described gap.
Preferably, described step S2 farther includes:
S21, the whole upper surface at described first protective layer makes mask layer；
S22, forms figure to be etched on described mask layer, and the described mask layer with described figure to be etched only covers
Described first protective layer in each described gap；
S23, performs etching technique to described first protective layer not covered by described mask layer.
Preferably, described mask layer is negative photoresist；Further, in described step S22, utilize and described touch electrode
The consistent mask plate of figure of layer defines the figure to be etched of described first protective layer.
Preferably, described mask layer is positive photoresist；Further, in described step S22, utilize and described touch electrode
The contrary mask plate of figure of layer defines the figure to be etched of described first protective layer.
Optionally, the material that described first protective layer is used includes silicon nitride.
Optionally, the material that described second protective layer is used includes silicon nitride.
As another technical scheme, the present invention also provides for the manufacture method of a kind of array base palte, comprises the following steps:
Making touch electrode layer, described touch electrode layer includes spaced multiple touch electrode, with at adjacent two
Gap is formed between described touch electrode；
Making protective layer on touch electrode layer, the described method making protective layer on touch electrode layer uses the present invention
The manufacture method of the above-mentioned protective layer provided.
As another technical scheme, the present invention also provides for a kind of array base palte, including touch electrode layer, described touch electricity
Pole layer includes spaced multiple touch electrode, to form gap between adjacent two described touch electrodes, also includes:
First protective layer, fills in each described gap；
Second protective layer, covers the first protective layer in the upper surface of each described touch electrode and each described gap
Upper surface.
As another technical scheme, the present invention also provides for a kind of touch screen, and including array base palte, described array base palte is adopted
The above-mentioned array base palte provided by the present invention.
The method have the advantages that
The manufacture method of the protective layer that the present invention provides, it is by making the upper surface of each touch electrode of covering, and
Fill first protective layer in each gap, and remove described first protective layer of the upper surface of touch electrode unless each, it is possible to achieve
To forming the filling in gap between adjacent two touch electrodes, the most again in upper surface and each gap of each touch electrode
In the upper surface of the first protective layer cover the second protective layer, this second protective layer not section of existence is poor, such that it is able to avoid causing
Various vestiges (Mura phenomenon) and different aobvious etc. bad phenomenon.Additionally, due to form gap quilt between adjacent two touch electrodes
First protective layer is filled, and this can be avoided touch electrode layer cannot shield the phenomenon of lower floor's electric field, thus improve display quality.
The manufacture method of the array base palte that the present invention provides, the making of its above-mentioned protective layer provided by using the present invention
Method makes protective layer on touch electrode layer, can avoid causing various vestige (Mura phenomenon) and different aobvious etc. bad existing
As, and touch electrode layer cannot shield the phenomenon of lower floor's electric field, thus improve display quality.
The array base palte that the present invention provides, it is by filling the first protection in the gap between adjacent two touch electrodes
Layer, then the upper surface of the first protective layer in the upper surface and each gap of each touch electrode arranges the second protection
Layer, can make this second protective layer not section of existence poor, such that it is able to avoid causing various vestige (Mura phenomenon) and different aobvious etc.
Bad phenomenon.Additionally, by the first protective layer, it is also possible to avoid touch electrode layer cannot shield the phenomenon of lower floor's electric field, thus
Improve display quality.
The touch screen that the present invention provides, its above-mentioned array base palte provided by using the present invention, can avoid causing respectively
Kind of vestige (Mura phenomenon) and different aobvious etc. bad phenomenon, and touch electrode layer cannot shield the phenomenon of lower floor's electric field, thus
Improve display quality.
Accompanying drawing explanation
Fig. 1 is the sectional view of existing a kind of array base palte；
The FB(flow block) of the manufacture method of the protective layer that Fig. 2 provides for the present invention；
Fig. 3 is to make the sectional view of array base palte after the first protective layer；
Fig. 4 be the upper surface of touch electrode unless each the first protective layer after the sectional view of array base palte；And
Fig. 5 is to make the sectional view of array base palte after the second protective layer.
Detailed description of the invention
For making those skilled in the art be more fully understood that technical scheme, come the present invention below in conjunction with the accompanying drawings
The manufacture method of protective layer of offer, array base palte and preparation method thereof and touch screen are described in detail.
The FB(flow block) of the manufacture method of the protective layer that Fig. 2 provides for the present invention.Refer to Fig. 2, the guarantor that the present invention provides
The manufacture method of sheath, for making protective layer on touch electrode layer, this touch electrode layer includes spaced multiple tactile
Touch electrode, to form gap between adjacent two touch electrodes.This manufacture method comprises the following steps:
S1, makes the first protective layer, and this first protective layer covers the upper surface of each touch electrode, and fills each
Gap.
S2, removes the first protective layer of the upper surface of touch electrode unless each.
S3, makes the second protective layer, and this second protective layer covers in upper surface and each gap of each touch electrode
The upper surface of the first protective layer.
Fig. 3 is to make the sectional view of array base palte after the first protective layer.Refer to Fig. 3, after completing step S1, the
One protective layer 3 includes the Part I 31 covering the upper surface of each touch electrode 1, and it is tactile to be filled in each adjacent two
Touch the Part II 32 in the gap between electrode 1.
Fig. 4 be the upper surface of touch electrode unless each the first protective layer after the sectional view of array base palte.Refer to
Fig. 4, after completing step S2, the Part I 31 of the upper surface covering each touch electrode 1 of the first protective layer 3 is gone
Remove, and only retain the Part II in the gap being filled between each two adjacent touch electrodes 1 of the first protective layer 3
32, the upper surface of this Part II 32 and the upper surface flush of each touch electrode 1.By this Part II 32, can keep away
Exempt from touch electrode layer and cannot shield the phenomenon of lower floor's electric field, thus improve display quality.
Preferably, above-mentioned steps S2 farther includes:
S21, the whole upper surface (i.e. Part I 31 and the upper surface of Part II 32) at the first protective layer 3 makes to be covered
Film layer；
S22, forms figure to be etched on this mask layer, and the mask layer with this figure to be etched only covers the first protection
Part II 32 in the gap being filled between each two adjacent touch electrodes 1 of layer 3；
S23, first to the upper surface covering each touch electrode 1 of the first protective layer 3 not covered by mask layer
Divide 31 to perform etching technique, thus complete the removal to this Part I 31.Due to the existence of mask layer, Part II 32 is protected
It is left behind.
Further, in above-mentioned steps 22, mask layer can be negative photoresist.On this basis, by utilize with
The consistent mask plate of the figure of touch electrode layer defines the figure to be etched of the first protective layer 3, it is possible to achieve make mask layer only cover
Cover the Part II 32 of the first protective layer 3, and the Part I 31 of the first protective layer 3 is come out.
Or contrary, mask layer can be positive photoresist.On this basis, by utilizing the figure with touch electrode layer
The mask plate that shape is contrary defines the figure to be etched of the first protective layer 3, equally realizes making mask layer only cover the first protection
The Part II 32 of layer 3, and the Part I 31 of the first protective layer 3 is come out.
Optionally, above-mentioned first protective layer and/or the second protective layer can use the transparent material system of such as silicon nitride etc.
Make.
It should be noted that in actual applications, it is also possible to use other any means to go the upper of touch electrode unless each
First protective layer on surface, this is had no particular limits by the present invention.
Fig. 5 is to make the sectional view of array base palte after the second protective layer.Refer to Fig. 5, after step s 3 is completed, the
Each adjacent two that are filled in of upper surface and the first protective layer 3 that two protective layers 4 cover each touch electrode 1 touch electricity
The upper surface of the Part II 32 in the gap between pole 1.Upper surface and each touch electrode 1 upper due to Part II 32
Surface flush, it is possible to obtain the second protective layer 4 of upper surface flush, the and section of existence is not poor, such that it is able to avoid causing various
Vestige (Mura phenomenon) and different aobvious etc. bad phenomenon.
As another technical scheme, the present invention also provides for the manufacture method of a kind of array base palte, and it comprises the following steps:
Making touch electrode layer, this touch electrode layer includes spaced multiple touch electrode, to touch at adjacent two
Touch formation gap between electrode.
Making protective layer on touch electrode layer, the method making this protective layer have employed the above-mentioned protection that the present invention provides
The manufacture method of layer.
The manufacture method of the array base palte that the present invention provides, the making of its above-mentioned protective layer provided by using the present invention
Method makes protective layer on touch electrode layer, can avoid causing various vestige (Mura phenomenon) and different aobvious etc. bad existing
As, and touch electrode layer cannot shield the phenomenon of lower floor's electric field, thus improve display quality.
As another technical scheme, the present invention also provides for a kind of array base palte, and it includes touch electrode layer, this touch electricity
Pole layer includes spaced multiple touch electrode, to form gap between adjacent two touch electrodes, also includes: first protects
Sheath and the second protective layer.Wherein, the first protective layer is filled in the gap between each adjacent two touch electrodes.Second protects
Sheath covers the upper surface of the first protective layer in the upper surface of each touch electrode and each gap.
The array base palte that the present invention provides, it is by filling the first protection in the gap between adjacent two touch electrodes
Layer, then the upper surface of the first protective layer in the upper surface and each gap of each touch electrode arranges the second protection
Layer, can make this second protective layer not section of existence poor, such that it is able to avoid causing various vestige (Mura phenomenon) and different aobvious etc.
Bad phenomenon.Additionally, by the first protective layer, it is also possible to avoid touch electrode layer cannot shield the phenomenon of lower floor's electric field, thus
Improve display quality.
As another technical scheme, the present invention also provides for a kind of touch screen, including the array base palte arranging box and coloured silk
Film substrate, is provided with liquid crystal layer between.Wherein, array base palte have employed the above-mentioned array base palte that the present invention provides.
The touch screen that the present invention provides, its above-mentioned array base palte provided by using the present invention, can avoid causing respectively
Kind of vestige (Mura phenomenon) and different aobvious etc. bad phenomenon, and touch electrode layer cannot shield the phenomenon of lower floor's electric field, thus
Improve display quality.
It is understood that the principle that is intended to be merely illustrative of the present of embodiment of above and the exemplary enforcement that uses
Mode, but the invention is not limited in this.For those skilled in the art, in the essence without departing from the present invention
In the case of god and essence, can make various modification and improvement, these modification and improvement are also considered as protection scope of the present invention.
Claims (9)
1. a manufacture method for protective layer, touch electrode layer includes spaced multiple touch electrode, with at adjacent two
Gap is formed, it is characterised in that comprise the following steps between described touch electrode:
S1, makes the first protective layer, and described first protective layer covers the upper surface of each described touch electrode, and fills each
Described gap；
S2, removes described first protective layer of the upper surface of the most described touch electrode；
S3, makes the second protective layer, described second protective layer cover the upper surface of each described touch electrode and each described in
The upper surface of the first protective layer in gap.
The manufacture method of protective layer the most according to claim 1, it is characterised in that described step S2 farther includes:
S21, the whole upper surface at described first protective layer makes mask layer；
S22, forms figure to be etched on described mask layer, and the described mask layer with described figure to be etched only covers each
Described first protective layer in described gap；
S23, performs etching technique to described first protective layer not covered by described mask layer.
The manufacture method of protective layer the most according to claim 2, it is characterised in that described mask layer is negative photoresist；
Further,
In described step S22, the mask plate consistent with the figure of described touch electrode layer is utilized to define described first protective layer
Figure to be etched.
The manufacture method of protective layer the most according to claim 2, it is characterised in that described mask layer is positive photoresist；
Further,
In described step S22, the mask plate contrary with the figure of described touch electrode layer is utilized to define described first protective layer
Figure to be etched.
5. according to the manufacture method of the protective layer described in claim 1-4 any one, it is characterised in that described first protective layer
The material used includes silicon nitride.
6. according to the manufacture method of the protective layer described in claim 1-4 any one, it is characterised in that described second protective layer
The material used includes silicon nitride.
7. the manufacture method of an array base palte, it is characterised in that comprise the following steps:
Making touch electrode layer, described touch electrode layer includes spaced multiple touch electrode, with described in adjacent two
Gap is formed between touch electrode；
Making protective layer on touch electrode layer, the described method making protective layer on touch electrode layer uses claim 1-
The manufacture method of the protective layer described in 6 any one.
8. an array base palte, including touch electrode layer, described touch electrode layer includes spaced multiple touch electrode, with
Gap is formed, it is characterised in that also include between adjacent two described touch electrodes:
First protective layer, fills in each described gap；
Second protective layer, covers the upper of the first protective layer in the upper surface of each described touch electrode and each described gap
Surface.
9. a touch screen, including array base palte, it is characterised in that described array base palte uses the array described in claim 8
Substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610407252.5A CN106125972A (en) | 2016-06-12 | 2016-06-12 | The manufacture method of protective layer, array base palte and preparation method thereof and touch screen |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201610407252.5A CN106125972A (en) | 2016-06-12 | 2016-06-12 | The manufacture method of protective layer, array base palte and preparation method thereof and touch screen |
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| CN108732838A (en) * | 2018-05-29 | 2018-11-02 | 武汉华星光电技术有限公司 | A kind of production method of array substrate, array substrate, display panel and device |
| CN109100054A (en) * | 2018-07-06 | 2018-12-28 | 京东方科技集团股份有限公司 | Touch sensing device and system |
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Application publication date: 20161116 |