CN206224422U - A kind of touch base plate and touch control display apparatus - Google Patents
A kind of touch base plate and touch control display apparatus Download PDFInfo
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- CN206224422U CN206224422U CN201621265111.6U CN201621265111U CN206224422U CN 206224422 U CN206224422 U CN 206224422U CN 201621265111 U CN201621265111 U CN 201621265111U CN 206224422 U CN206224422 U CN 206224422U
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- touch
- base plate
- touch control
- film layer
- semiconductor film
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Abstract
The utility model provides a kind of touch base plate and touch control display apparatus, and the touch base plate includes：Underlay substrate and the touch control layer being arranged on the underlay substrate, the touch control layer are a complete film layer in the touch area of the touch base plate, and the touch control layer includes the figure and insulation patterns of touch control electrode.In the utility model, the touch control layer of the figure including touch control electrode is a complete film layer in the touch area of touch base plate, thus the figure of touch control electrode does not have the angle of gradient, will not form reflection by light to external world, improves the display effect of the touch control display apparatus with the touch base plate.
Description
Technical field
The utility model is related to technical field of touch control, more particularly to a kind of touch base plate and touch control display apparatus.
Background technology
With the fast development of flat board smart mobile phone and panel computer, touch screen technology quickly grows.Existing touch-screen
Technology mainly has resistance-type, condenser type and infrared optics formula.Resistance-type makes two-layer electrode conduction determine touch point by pressing；Electricity
Appearance formula determines touch point by capacitance variations after human body touch；Infrared optics formula is to receive to determine by fingers blocks IR
Touch point.Due to being quick on the draw, capacitive touch screen is widely used in Mobile solution product.
The capacitive touch screen of in the market main flow is divided into：OGS (One Glass Solution), On-Cell Touch and
In-Cell Touch.OGS is to fit one to have the glass of touch function in liquid crystal panel surface；On-Cell Touch be by
Touch function is produced on color membrane substrates (CF) surface；In-Cell Touch are that touch function is produced on inside cell.Consider light
Thinning and cost factor, On-Cell Touch and In-Cell Touch be after touching technique developing direction.
Fig. 1 is refer to, Fig. 1 is a kind of structural representation of On-Cell Touch touch-screens of the prior art.The touch
Screen includes array base palte 11 and color membrane substrates 31, and array base palte 11 and color membrane substrates 31 are connected by the pairing of sealant 21, wherein,
The figure 4a of touch control electrode is arranged on color membrane substrates 31, and the figure 4a of touch control electrode generally passes through composition work by ito thin film layer
Skill (including exposure, development and etching etc. technique) formed.Because there is certain slope angle in the figure 4a of touch control electrode, the angle of gradient
Position can be to external world light form reflection, obvious reflection striations can be formed, influence display effect.
Utility model content
In view of this, the utility model provides a kind of touch base plate and touch control display apparatus, for solving existing On-
In Cell Touch touch-screens there is the angle of gradient in the figure of touch control electrode, and light that can to external world forms reflection, can be formed substantially
Reflection striations, influence display effect problem.
In order to solve the above technical problems, the utility model provides a kind of touch base plate, including：Underlay substrate and it is arranged at
Touch control layer on the underlay substrate, the touch control layer is a complete film layer in the touch area of the touch base plate, described
Touch control layer includes the figure and insulation patterns of touch control electrode.
Preferably, the figure and insulation patterns of the touch control electrode are formed by same transparent semiconductor film layer, described to touch
The figure for controlling electrode is formed by a part for transparent semiconductor film layer by conductor treatment, and the insulation patterns are by institute
The part for stating transparent semiconductor film layer is formed by insulating treatment.
Preferably, the transparent semiconductor film layer is formed by transparent metal oxide semi-conducting material.
Preferably, the transparent metal oxide semi-conducting material is InGaZnO, InGaO, ITZO or AlZnO.
Preferably, in the conductor material for being formed by conductor treatment by transparent semiconductor film layer, oxygen atom
Content is 15%~30%, in the insulating materials formed by insulating treatment by transparent semiconductor film layer, oxygen atom
Content be 70%~85%.
Preferably, the electrical conductivity of the figure of the touch control electrode is more than 103(Ωcm)-1, the conductance of the insulation patterns
Rate is less than 10-10(Ωcm)-1。
Preferably, the touch base plate is color membrane substrates, and the underlay substrate is the underlay substrate of the color membrane substrates.
Preferably, the figure of the touch control electrode and the insulation image are arranged at the light emission side of the underlay substrate.
Preferably, the touch control layer also includes semiconductor figure.
The utility model also provides a kind of touch control display apparatus, including above-mentioned touch base plate.
Above-mentioned technical proposal of the present utility model has the beneficial effect that：
The touch control layer of the figure including touch control electrode is a complete film layer in the touch area of touch base plate, thus touch-control
The figure of electrode does not have the angle of gradient, will not form reflection by light to external world, improves the touch-control display dress with the touch base plate
The display effect put.
Brief description of the drawings
Fig. 1 is a kind of structural representation of On-Cell Touch touch-screens of the prior art；
Fig. 2 is the sectional view of the touch base plate of the embodiment of the utility model one；
Fig. 3 A are the top view of the touch base plate of the embodiment of the utility model one；
Fig. 3 B are the top view of the touch base plate of another embodiment of the present utility model；
Fig. 4 is the structural representation of the touch control display apparatus of the embodiment of the utility model one；
Fig. 5 A- Fig. 5 H are the preparation method schematic diagram of the touch base plate of the embodiment of the utility model one；
Fig. 6 A- Fig. 6 H are the preparation method schematic diagram of the touch base plate of another embodiment of the utility model.
Specific embodiment
It is new below in conjunction with this practicality to make the purpose, technical scheme and advantage of the utility model embodiment clearer
The accompanying drawing of type embodiment, the technical scheme to the utility model embodiment is clearly and completely described.Obviously, it is described
Embodiment is a part of embodiment of the present utility model, rather than whole embodiments.Based on described of the present utility model
Embodiment, the every other embodiment that those of ordinary skill in the art are obtained belongs to the scope of the utility model protection.
To there is the angle of gradient in the figure for solving touch control electrode in existing On-Cell Touch touch-screens, can to external world
Light forms reflection, can form obvious reflection striations, influences the problem of display effect, the utility model embodiment to provide one
Touch base plate is planted, including：Underlay substrate and the touch control layer being arranged on the underlay substrate, the touch control layer is in the touch-control
The touch area of substrate is a complete film layer, and the touch control layer includes the figure and insulation patterns of touch control electrode.
Because the touch control layer of the figure including touch control electrode is a complete film layer in the touch area of touch base plate, thus
The figure of touch control electrode does not have the angle of gradient, will not form reflection by light to external world, improves the touch-control with the touch base plate and shows
The display effect of showing device.
In some embodiments of the present utility model, touch control layer only figure and insulation patterns including touch control electrode lead
Electrograph shape and insulation patterns, certainly, in some other embodiment of the present utility model, touch control layer can also include other figures
Shape, such as semiconductor figure, for example, also include semiconductor figure between the figure and insulation patterns of touch control electrode.
Fig. 2 is refer to, Fig. 2 is the sectional view of the touch base plate of the embodiment of the utility model one, and the touch base plate includes：Lining
Substrate 311 and the touch control layer being arranged on the underlay substrate 311, the touch control layer is in the Touch Zone of the touch base plate
Domain is a complete film layer, the touch control layer only figure 41 and insulation patterns 42 including touch control electrode.
In the utility model embodiment, the figure 41 and insulation patterns 42 of touch control electrode are located at same layer, and in touch-control base
The touch area of plate forms the figure 41 of a complete film layer, i.e., figure seamless connectivity between the two, thus touch control electrode
The angle of gradient will not be produced, reflection will not be formed by light to external world, improve the aobvious of the touch control display apparatus with the touch base plate
Show effect.
Fig. 3 A are refer to, Fig. 3 is the top view of the touch base plate of an embodiment of the present utility model, the implementation described in Fig. 3 A
In example, touch base plate is mutual capacitance type touch base plate, and touch control layer only includes the figure and insulation patterns of touch control electrode, touch control electrode
Figure includes the figure 411 of touch-control driving electrodes and the figure 412 of touch-control sensing electrode, as can be seen that touch-control drives from Fig. 3 A
The figure 411 of moving electrode, the figure 412 of touch-control sensing electrode and insulation patterns 42 are located at same layer, and three is in touch base plate
Touch area formed a complete film layer.
Certainly, in some other embodiment of the present utility model, touch base plate can also be self-tolerant touch base plate.
Preferably, in the utility model embodiment, the figure 41 and insulation patterns 42 of the touch control electrode are by same transparent
Semiconductor film layer is formed, and the figure 41 of the touch control electrode passes through conductor by a part for transparent semiconductor film layer
Treatment is formed, and the insulation patterns 42 are formed by a part for transparent semiconductor film layer by insulating treatment.
When the figure of the touch control layer only includes the figure and insulation patterns of touch control electrode, transparent semiconductor film layer one
The figure of touch control electrode is partially changed into, another part is changed into insulation patterns.
That is, when the figure 41 of touch control electrode is formed, it is not necessary to the composition work such as be exposed, develop and etch
Skill, it is only necessary to be initially formed the transparent semiconductor film layer of a flood, then will form touch-control the need for transparent semiconductor film layer
The part of the figure of electrode, enters column conductorization treatment and is converted to conductor material, and the transparent semiconductor film layer of other parts is carried out
Insulating treatment, is converted to insulating materials.It is still one that the figure 41 and insulation patterns 42 of the touch control electrode of formation are combined
Complete film layer structure.
It is transparent partly to lead when the figure of the touch control layer includes figure, insulation patterns and the semiconductor figure of touch control electrode
A thin-film layers part is changed into the figure of touch control electrode, and a part is changed into insulation patterns, and a part keeps not being turned into semiconductor
Figure.
Preferably, the transparent semiconductor film layer is formed by transparent metal oxide semi-conducting material.The transparent gold
Category oxide semiconductor material can be InGaZnO, InGaO, ITZO or AlZnO etc..
Preferably, in the conductor material for being formed by conductor treatment by transparent semiconductor film layer, oxygen atom
Content is 15%~30%, in the insulating materials formed by insulating treatment by transparent semiconductor film layer, oxygen atom
Content be 70%~85%.
The content of oxygen atom is higher, illustrates that electrical conductivity is lower, and the content of oxygen atom is lower, illustrates that electrical conductivity is higher.
Preferably, the electrical conductivity of the figure 41 of the touch control electrode is more than 103(Ωcm)-1.The electricity of the insulation patterns
Conductance is less than 10-10(Ωcm)-1。
Fig. 3 B are refer to, Fig. 3 B are the top view of the touch base plate of another embodiment of the present utility model, described in Fig. 3 B
In embodiment, touch base plate is mutual capacitance type touch base plate, and touch control layer includes figure, insulation patterns 42 and the semiconductor of touch control electrode
Figure 43, the figure of touch control electrode includes the figure 411 of touch-control driving electrodes and the figure 412 of touch-control sensing electrode, from Fig. 3 B
In as can be seen that the figure 411 of touch-control driving electrodes, the figure 412 of touch-control sensing electrode, insulation patterns 42 and semiconductor figure
43 are located at same layer, and four form a complete film layer in the touch area of touch base plate.
In the utility model embodiment, semiconductor figure 43 is located between the figure of touch control electrode and insulation patterns 42, is touched
The figure and insulation patterns 42 for controlling electrode are not directly contacted with, and contain due to constituting the oxygen atom of semi-conducting material of semiconductor figure 43
Amount is located at the oxygen of the oxygen atom content of the conductor material of the figure for constituting touch control electrode and the insulating materials of composition insulation patterns 42
Between atom content, thus the migration of oxygen atom between conductor material and insulating materials can be prevented, improve the stabilization of touch control layer
Property.
Certainly, in some other embodiment of the present utility model, the figure 41 and insulation patterns 42 of the touch control electrode
Can also be formed respectively, for example, in the region of the figure 41 for needing to form touch control electrode, touch control electrode is formed by patterning processes
Figure 41, touch control electrode figure 41 with layer other touch areas by patterning processes formed insulation patterns 42, formed
Touch control electrode figure 41 and insulation patterns 42 to combine be a complete film layer structure, although this kind of mode be also carried out
Patterning processes, however, due between the figure 41 and insulation patterns 42 of touch control electrode very close to each other, thus can also reduce light
Reflection, improve display effect.
In the utility model embodiment, the touch base plate can be a single substrate, be attached to the light extraction of color membrane substrates
Side.
Or, the touch base plate is color membrane substrates, i.e., above-mentioned underlay substrate 311 is the underlay substrate of color membrane substrates, is touched
The figure 41 and insulation patterns 42 for controlling electrode are arranged at color membrane substrates.Preferably, the figure 41 and insulation patterns 42 of touch control electrode
It is on-cell types to be arranged at the light emission side of the underlay substrate of color membrane substrates, the i.e. touch base plate of the utility model embodiment
Touch base plate.
The utility model embodiment also provides the touch-control base in a kind of touch control display apparatus, including any of the above-described embodiment
Plate.
Fig. 4 is refer to, in an embodiment of the present utility model, the touch control display apparatus are liquid crystal display device, bag
Array base palte 11 and color membrane substrates 31 are included, the figure 41 and insulation patterns 42 of touch control electrode are arranged at the substrate base of color membrane substrates 31
The light emission side of plate.
The utility model embodiment also provides a kind of preparation method of touch base plate, including：Formed on a underlay substrate
Touch control layer, the touch control layer is a complete film layer in the touch area of the touch base plate, and the touch control layer includes touch-control electricity
The figure and insulation patterns of pole.
In some embodiments of the present utility model, the touch control layer can also include semiconductor figure.
Preferably, it is described to include the step of formation touch control layer on a underlay substrate：
Transparent semiconductor film layer is formed on the underlay substrate；
A part to transparent semiconductor film layer enters column conductorization treatment, forms the figure of the touch control electrode,
A part to transparent semiconductor film layer carries out insulating treatment, forms the insulation patterns.
When the touch control layer also includes semiconductor figure, the part to transparent semiconductor film layer is not done and is located
Reason, forms the semiconductor figure.
In the utility model embodiment, the sequencing that conductor treatment and insulating are processed is not defined, can
Column conductorization treatment is entered with the part first to transparent semiconductor film layer, the figure of the touch control electrode is formed, then
A part to transparent semiconductor film layer carries out insulating treatment, forms the insulation patterns.Can also, first to described
A part for transparent semiconductor film layer carries out insulating treatment, the insulation patterns is formed, then, to the transparent semiconductor
A part for film layer enters column conductorization treatment, forms the figure of the touch control electrode.
Preferably, the transparent semiconductor film layer is formed by transparent metal oxide semi-conducting material.The transparent gold
Category oxide semiconductor material can be InGaZnO, InGaO, ITZO or AlZnO etc..
Preferably, in the conductor material for being formed by conductor treatment by transparent semiconductor film layer, oxygen atom
Content is 15%~30%, in the insulating materials formed by insulating treatment by transparent semiconductor film layer, oxygen atom
Content be 70%~85%.
The content of oxygen atom is higher, illustrates that electrical conductivity is lower, and the content of oxygen atom is lower, illustrates that electrical conductivity is higher.
Preferably, the electrical conductivity of the figure 41 of the touch control electrode is more than 103(Ωcm)-1.The electricity of the insulation patterns
Conductance is less than 10-10(Ωcm)-1。
In an embodiment of the present utility model, Fig. 5 A- Fig. 5 H are refer to, it is described to transparent semiconductor film layer
A part enters column conductorization treatment, and the another part to transparent semiconductor film layer carries out insulating treatment, forms described
The step of figure and the insulation patterns of touch control electrode, includes：
Step 51：Fig. 5 A are refer to, the first photoresist layer 51 is formed on transparent semiconductor film layer 40；
Step 52：Fig. 5 B are refer to, using a mask plate, the first photoresist layer 51 is exposed and developed, form the
One photoetching offset plate figure 51a, the figure of the first photoetching offset plate figure 51a correspondences touch control electrode；
Step 53：Fig. 5 C are refer to, the transparent semiconductor film layer 40 to being coated with the first photoetching offset plate figure 51a enters
The treatment of row insulating, forms insulation patterns 42；
Preferably, carrying out the step of insulating is processed to transparent semiconductor film layer includes：Will be covered with first light
The transparent semiconductor film layer of photoresist figure processes 30min-120min in 100-300 DEG C of oxidizing atmosphere.
The oxidizing atmosphere includes：Oxygen or containing oxygen plasma etc..
The transparent semiconductor increases, oxygen atom due to very sensitive to oxygen by oxygen atom content after insulating treatment
Content increases to 70%~85% from 45%~60%, and conductive characteristic drastically declines, and is formed as metal oxide insulator, its electricity
Conductance is less than 10-10(Ωcm)-1。
Step 54：Fig. 5 D are refer to, the first photoetching offset plate figure 51a is peeled off；
Step 55：Fig. 5 E are refer to, the second photoresist layer 52 is formed on transparent semiconductor film layer 40；
Step 56：Fig. 5 F are refer to, using a mask plate, the second photoresist layer 52 is exposed and developed, form the
Two photoetching offset plate figure 52a, the second photoetching offset plate figure 52a correspondences insulation patterns 42；
Step 57：Fig. 5 G are refer to, the transparent semiconductor film layer 40 to being coated with the second photoetching offset plate figure 52a enters
Column conductorization treatment, forms the figure 41 of the touch control electrode；
Preferably, transparent semiconductor film layer 40 is entered the step of column conductor is processed to include：Will be covered with described second
Transparent semiconductor film layer processes 30min-120min in 100-300 DEG C of reducing atmosphere described in photoetching offset plate figure 52a.
The reducing atmosphere includes：Hydrogen or containing hydrogen plasma etc..
Transparent semiconductor film layer is reduced by oxygen atom after conductorization treatment, oxygen atom content from 45%~
60% is reduced to 15%~30%, is formed as conductive metal material, and its electrical conductivity is more than 103(Ωcm)-1。
Step 58：Fig. 5 H are refer to, the second photoetching offset plate figure 52a is peeled off.
In another embodiment of the present utility model, Fig. 6 is refer to, to transparent semiconductor film layer
Divide to enter column conductorization treatment, the another part to transparent semiconductor film layer carries out insulating treatment, forms the touch-control
The step of figure and the insulation patterns of electrode, includes：
Step 61：6A is refer to, the first photoresist layer 61 is formed on transparent semiconductor film layer 40；
Step 62：6B is refer to, using a mask plate, the first photoresist layer 61 is exposed and developed, form first
Photoetching offset plate figure 61a, the first photoetching offset plate figure 61a correspondences insulation patterns；
Step 63：6C is refer to, the transparent semiconductor film layer 40 to being coated with the first photoetching offset plate figure 61a is carried out
Conductorization treatment, forms the figure 41 of the touch control electrode；
Preferably, transparent semiconductor film layer is entered the step of column conductor is processed to include：Will be covered with second light
The transparent semiconductor film layer of photoresist figure processes 30min-120min in 100-300 DEG C of reducing atmosphere.
The reducing atmosphere includes：Hydrogen or containing hydrogen plasma etc..
Transparent semiconductor film layer is reduced by oxygen atom after conductorization treatment, oxygen atom content from 45%~
60% is reduced to 15%~30%, is formed as conductive metal material, and its electrical conductivity is more than 103(Ωcm)-1。
Step 64：6D is refer to, the first photoetching offset plate figure 61a is peeled off；
Step 65：6E is refer to, the second photoresist layer 62 is formed on transparent semiconductor film layer 40；
Step 66：6F is refer to, using a mask plate, the second photoresist layer 62 is exposed and developed, form second
Photoetching offset plate figure 62a, the figure of the second photoetching offset plate figure 62a correspondences touch control electrode；
Step 67：6G is refer to, the transparent semiconductor film layer to being coated with the second photoetching offset plate figure 62a is carried out absolutely
The edgeization treatment insulation patterns 42；
Preferably, carrying out the step of insulating is processed to transparent semiconductor film layer 40 includes：Will be covered with described first
The transparent semiconductor film layer of photoetching offset plate figure processes 30min-120min in 100-300 DEG C of oxidizing atmosphere.
The oxidizing atmosphere includes：Oxygen or containing oxygen plasma etc..
The transparent semiconductor increases, oxygen atom due to very sensitive to oxygen by oxygen atom content after insulating treatment
Content increases to 70%~85% from 45%~60%, and conductive characteristic drastically declines, and is formed as metal oxide insulator, its electricity
Conductance is less than 10-10(Ωcm)-1。
Step 68：6H is refer to, the second photoetching offset plate figure 62a is peeled off.
The difference of above-mentioned two embodiment is that one embodiment is the figure for being initially formed touch control electrode, is re-formed absolutely
Edge figure, and in second embodiment, insulation patterns are initially formed, re-form the figure of touch control electrode.
The above is preferred embodiment of the present utility model, it is noted that for the ordinary skill of the art
For personnel, on the premise of principle described in the utility model is not departed from, some improvements and modifications can also be made, these improvement
Protection domain of the present utility model is also should be regarded as with retouching.
Claims (10)
1. a kind of touch base plate, it is characterised in that including：Underlay substrate and the touch control layer being arranged on the underlay substrate,
The touch control layer is a complete film layer in the touch area of the touch base plate, and the touch control layer includes the figure of touch control electrode
And insulation patterns.
2. touch base plate according to claim 1, it is characterised in that the figure and insulation patterns of the touch control electrode are by same
One transparent semiconductor film layer is formed, and the figure of the touch control electrode is passed through to lead by a part for transparent semiconductor film layer
Body treatment is formed, and the insulation patterns are formed by a part for transparent semiconductor film layer by insulating treatment.
3. touch base plate according to claim 2, it is characterised in that the transparent semiconductor film layer is by transparent metal oxygen
Compound semi-conducting material is formed.
4. touch base plate according to claim 3, it is characterised in that the transparent metal oxide semi-conducting material is
InGaZnO, InGaO, ITZO or AlZnO.
5. touch base plate according to claim 3, it is characterised in that conductor is passed through by transparent semiconductor film layer
In the conductor material that treatment is formed, the content of oxygen atom is 15%~30%, by transparent semiconductor film layer by insulation
Change in the insulating materials that treatment is formed, the content of oxygen atom is 70%~85%.
6. touch base plate according to claim 3, it is characterised in that the electrical conductivity of the figure of the touch control electrode be more than
103(Ωcm)-1, the electrical conductivity of the insulation patterns is less than 10-10(Ωcm)-1。
7. touch base plate according to claim 1, it is characterised in that the touch base plate is color membrane substrates, the substrate
Substrate is the underlay substrate of the color membrane substrates.
8. touch base plate according to claim 7, it is characterised in that the figure of the touch control electrode and the insulation image
It is arranged at the light emission side of the underlay substrate.
9. the touch base plate according to claim any one of 1-8, it is characterised in that the touch control layer also includes semiconductor figure
Shape.
10. a kind of touch control display apparatus, it is characterised in that including the touch base plate as described in claim any one of 1-9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621265111.6U CN206224422U (en) | 2016-11-21 | 2016-11-21 | A kind of touch base plate and touch control display apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621265111.6U CN206224422U (en) | 2016-11-21 | 2016-11-21 | A kind of touch base plate and touch control display apparatus |
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| Publication Number | Publication Date |
|---|---|
| CN206224422U true CN206224422U (en) | 2017-06-06 |
Family
ID=58791432
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201621265111.6U Expired - Fee Related CN206224422U (en) | 2016-11-21 | 2016-11-21 | A kind of touch base plate and touch control display apparatus |
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| CN (1) | CN206224422U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107272950A (en) * | 2017-06-14 | 2017-10-20 | 京东方科技集团股份有限公司 | One kind covering surface-type touch-screen, its preparation method and display device |
| CN106502468B (en) * | 2016-11-21 | 2023-12-05 | 合肥京东方光电科技有限公司 | Touch substrate, touch display device and manufacturing method |
-
2016
- 2016-11-21 CN CN201621265111.6U patent/CN206224422U/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106502468B (en) * | 2016-11-21 | 2023-12-05 | 合肥京东方光电科技有限公司 | Touch substrate, touch display device and manufacturing method |
| CN107272950A (en) * | 2017-06-14 | 2017-10-20 | 京东方科技集团股份有限公司 | One kind covering surface-type touch-screen, its preparation method and display device |
| WO2018228098A1 (en) * | 2017-06-14 | 2018-12-20 | 京东方科技集团股份有限公司 | Surface covering touch screen, manufacturing method therefor, and display device |
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Granted publication date: 20170606 Termination date: 20211121 |