TWM257478U - Improved structure of heat conducting plate - Google Patents

Improved structure of heat conducting plate Download PDF

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Publication number
TWM257478U
TWM257478U TW93207916U TW93207916U TWM257478U TW M257478 U TWM257478 U TW M257478U TW 93207916 U TW93207916 U TW 93207916U TW 93207916 U TW93207916 U TW 93207916U TW M257478 U TWM257478 U TW M257478U
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Taiwan
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heat
shell
conducting plate
scope
item
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TW93207916U
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Chinese (zh)
Inventor
Chin-Wen Wang
Chin-Jang Wang
Pai-Chiou Wang
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Augux Co Ltd
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Priority to TW93207916U priority Critical patent/TWM257478U/en
Publication of TWM257478U publication Critical patent/TWM257478U/en

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M257478 四、創作說明(1) 【新型所屬之技術領域】 本創作係有關於一種導熱板結 發熱電子元件(如CPU) 熱交換用 導熱板的汽相變化量加大,速度加 之散熱效率者。 【先前技術】 按’隨著科技產業快速的發展 越來越快,尤其是當中央處理器之 轉時所產生之發熱量亦愈來愈高, 散發於主機外之環境,以維持中央 運作’通常會在中央處理器上設有 j處理器散熱,以增加散熱能力。 异速度越高,所產生之發敎量亦兪 熱裝置若仍由銘擠型散熱器2 對中央處理器之散熱根本無法負荷 此遂有提供—種導熱板之 該導熱板l〇a I右 * w + e /、有一中空殼體la, 囬知^又置有毛έ έ油 的古^ 織2a,且在該殼 的支撐構件3a,今 以支樓住;當中:;,内抽真空 内之工作济二1央處理器運轉後所 ^斤吸收並作献交換, 軋會往上散發, …、又恢 故可使熱氣在殼體la:?la頂端遠 ma底部處,而持續的 構改良,尤指一 之導熱板結構, 快’俾提昇整個 ,令電腦在運算 運异速度越高時 為能將此密集熱 處理器在許可溫 散熱裝置,用以 但隨著中央處理 來愈高的情況下 散熱風扇所構成 設計, 於殼體 體la内 後’由 產生之 而熱交 離發熱 體,液 進行熱 如第一圖 la四周邊 設有一呈 該支撐構 熱源會被 換後所產 處,溫度 體再由毛 交換。 種作為 以令該 導熱板 執行上 ,其運 量有效 度下能 協助中 器之運 ,一般 時,其 所示, 的内壁 皺折狀 件3 a予 殼體la 生之熱 較低, <»M257478 IV. Creation Description (1) [Technical Field to which the New Type belongs] This creation relates to a heat-conducting plate, heat-generating electronic components (such as a CPU), heat exchange plate, the increase in the vapor phase of the heat-conducting plate, the speed plus the heat dissipation efficiency. [Previous technology] Press 'As the technology industry develops faster and faster, especially when the central processing unit turns, the heat generated is also getting higher and higher, and it is distributed to the environment outside the mainframe to maintain the central operation.' J processor is usually installed on the central processor to dissipate heat to increase the cooling capacity. The higher the speed, the more heat generated by the device. If the heat sink 2 is still unable to load the central processor's heat dissipation, then there is a kind of heat conduction plate. * w + e /, there is a hollow casing la, and the ancient woven 2a, which is also filled with woolen oil, and the supporting member 3a of the shell, is now housed in a branch; among :; The work in the vacuum will be absorbed and exchanged after the central processor is running. The rolling will be emitted upwards, and it will restore the heat to the top of the casing la:? La and far from the bottom, and continue. The structure improvement, especially the structure of the heat conduction plate, quickly improves the whole, so that the computer can increase the density of the thermal processor at a higher temperature when the operation speed is higher, but it will be used as the central processing. In the case of high conditions, the design of the cooling fan is located inside the casing la, and the heat is separated from the heating body by the heat generated by the fluid. The liquid is heated as shown in the first figure. There are four heat sources around the support structure that will be replaced. At birth, the temperature body is exchanged by hair. This is to make the heat conducting plate perform, and its transportation capacity can assist the transportation of the middle device. Generally, as shown, the inner wall corrugated member 3a generates less heat to the casing la, < »

M257478M257478

惟,上述習知之導 ._ , - - * ^ m Ιέ : a) V熱板10a内之毛細组織2&僅 壁面上,並未完全的結合’若之間有空户,风體h内 毛細組織2a導引液體至殼體1&底部:卢:日:’會降低 熱效率無法提卜 ^度及¥間’而使散 (b )習知之導熱板1 〇 3因僅在其内壁面 織2a ’使冷卻後所形成的液體無法报迅速的 所吸收,而降低導熱板l〇a之熱交換效率。 上設有毛細組 被毛細組織2 aHowever, the guide of the above knowledge. _,--* ^ M Ιέ: a) The capillary structure 2 in the V hot plate 10a is only on the wall, and is not completely combined. 'If there is an empty house, the wind body h Capillary tissue 2a guides the liquid to the shell 1 & bottom: Lu: Day: 'will reduce thermal efficiency and cannot be used to increase temperature and space between them' (b) The conventional heat conductive plate 103 is woven only on its inner wall surface 2a 'prevents the liquid formed after cooling from being absorbed quickly, and reduces the heat exchange efficiency of the heat conducting plate 10a. Capillary set is provided Capillary tissue 2 a

有鑑於上述習知所產生之各問題,本案創作人遂以從 事該行業多年之經驗,並本著精益求精之精神,積極研究 改良,遂有本創作『導熱板結構改良』之產生。 【新型内容】 ° 本創作之一目的在於提供一種導熱板結構改良,其係 令該導熱板内之毛細組織除可作為支撐構件外,更可穩固 的結合在導熱板之内壁面上,以提高毛細組織之吸收導引 速度及時間。 本創作之另一目的在於提供一種導熱板結構改良,其 係令該導熱板内可增加冷凝面積與冷凝效率,使熱源經熱 交換後所產生的熱氣能快速的冷卻成液體。 本創作之又一目的在於提供一種導熱板結構改良,其 係令該導熱板内經冷卻後的液體能迅速的以毛細方式吸收 傳導至導熱板底面,使導熱板的汽相變化量加大,速度加 快’進而提昇整個導熱板之散熱效率。 本創作之一特徵在於該導熱板具有一中空殼體,於殼In view of the problems arising from the above-mentioned knowledge, the creator of this case has worked in the industry for many years, and actively researched and improved in the spirit of excellence. This led to the creation of "the heat transfer plate structure improvement" in this creation. [New content] ° One of the objectives of this creation is to provide a structural improvement of the heat transfer plate, which makes the capillary tissue in the heat transfer plate not only be used as a supporting member, but also can be firmly combined on the inner wall surface of the heat transfer plate to improve Capillary tissue absorption speed and time. Another purpose of this creation is to provide an improvement in the structure of the heat transfer plate, which can increase the condensation area and the condensation efficiency in the heat transfer plate, so that the hot gas generated by the heat source after heat exchange can be quickly cooled into a liquid. Another purpose of this creation is to provide an improved structure of the heat transfer plate, which allows the cooled liquid in the heat transfer plate to quickly absorb and conduct to the bottom surface of the heat transfer plate in a capillary manner, thereby increasing the amount of vapor phase change of the heat transfer plate. Speeding up ', thus improving the heat dissipation efficiency of the entire heat conducting plate. One feature of this creation is that the heat transfer plate has a hollow shell,

M257478 四、創作說明(3) 體的上、下 末燒結方式 構件的表面 專支樓構件 與殼體的上 作流體對發 熱氣會上升 則由各支撐 本創作之另 呈毛細組織 殼及頂殼之 及頂殼對應 物,而該等 體内進行熱 處’並在了頁 各支撐構件 進行熱交換 【實施方式 有關本 下,然而所 作加以限制 壁面處分 直接設有 上形成有 以支撐殼 下表面處 熱電子元 至殼體頂 構件以毛 一特徵在 的各支撐 内表面處 於中央處 支撐構件 交換後所 殼的溝槽 的毛細組 別設有連續溝槽, 複數支撐構件及工 多孔質的毛細組織 體,並利用溝槽的 月匕更為穩固的結合 件進行熱交換,而 部的溝槽上進行冷 細方式迅速的吸收 於該殼體係由底殼 構件設置在底殼及 分別設有橫向之連 理器的位置處可設 在相對應處則形成 形成的熱氣從開孔 中冷卻成液體,再 織迅速的吸收傳遞 另’在殼體 作流體,該 ; 如此,可 設置使各支 在一起,且 熱交換後所 卻,冷卻後 傳導至殼體 及頂殼所構 頂殼之間, 續溝槽,且 有微量之金 有開孔,以 處往上散發 由與溝槽相 至底殼處, 内以粉 等支撐 错由該 撐構件 藉由工 形成的 的液體 底面。 成,使 而在底 在底殼 屬燒結 令在殼 至頂殼 結合之 以持續 镥 創作之詳細說明及技術内容,配合圖式說明如 附圖式僅提供參考與說明用,並非用來對本創 者0 本創作係一種「導熱板結構改良」,請參照第二、三 圖所示’本實施例中該導熱板1 0係使用在中央處理器2 0上 ,以對中央處理器2 〇進行熱交換式的散熱;其中,該導熱M257478 IV. Creation instructions (3) The surface of the upper and lower sintered members of the body, the surface of the building and the upper fluid of the shell will increase the heating gas, and each of the additional capillary tissue shells and the top shell that support this creation And the top shell counterparts, and the body is thermally treated 'and the support members of the page are heat exchanged [the embodiment is related to the present, but the restrictions are made on the wall surface directly provided to support the lower surface of the shell The capillary group of the grooves of the shell after the support member is exchanged is provided with continuous grooves, a plurality of support members and a porous capillary. Organize the body and use the grooved moon dagger for more stable joints for heat exchange, and the grooves on the part are quickly and coldly absorbed in the shell. The shell is set by the bottom shell member on the bottom shell and the horizontal The position of the coupler can be set at the corresponding position, and the formed hot gas is cooled from the opening into a liquid, and then weaves it quickly to absorb and transfer it. In this way, it can be set to make the branches together, and after the heat exchange, after cooling, it is conducted to the shell and the top shell constructed by the top shell, and the groove is continued, and there is a small amount of gold with openings. From above, the bottom surface of the liquid formed by the supporting member is supported by powder and the like. In order to make the bottom and bottom shell sintered, the shell to the top shell is combined with the detailed description and technical content of continuous creation. The accompanying drawings, such as the drawings, are provided for reference and explanation only. Person 0 This creation is a kind of "heat-conducting plate structure improvement", please refer to the second and third figures. 'In this embodiment, the heat-conducting plate 10 is used on the central processing unit 20 to perform the processing on the central processing unit 20. Heat exchange heat dissipation; wherein the heat conduction

第7頁 M257478 四、創作說明(4) 板10具有一中空殼體1,殼體1係由底殼丨丨及頂殼12所構成 ’而在底殼11及頂殼12之内表面處分別設有橫向之連續溝 槽111、121,且在底殼11及頂殼12對應於中央處理器2〇的 位置處可設有微量之金屬燒結物。Page 7 M257478 IV. Creation instructions (4) The plate 10 has a hollow shell 1, which is composed of a bottom shell 丨 and a top shell 12 'and is disposed on the inner surfaces of the bottom shell 11 and the top shell 12 The horizontal continuous grooves 111 and 121 are separately provided, and a small amount of metal sintered matter can be provided at the positions of the bottom case 11 and the top case 12 corresponding to the central processing unit 20.

^ 另,該導熱板10内設有複數支撐構件2,各支撐構件2 係配合殼體1内部的大小形狀而均勻分佈;在本創作所舉 之貫施例中,該等支撐構件2係呈放射狀之擴散排列,且 f支樓構件2係以粉末燒結的方式形成於殼體1内,使各支 撐,件2的表面上形成有呈多孔質的毛細組織,而在該等 支撑構件2相對應於中央處理器2〇之位置處係圍成有一開 孔2 1,以令在殼體丨内進行熱交換後所形成的熱氣能從開 孔21處往上散發至頂殼12處。^ In addition, the heat conducting plate 10 is provided with a plurality of supporting members 2 each of which is uniformly distributed in accordance with the size and shape of the inside of the housing 1; in the embodiment described in this creation, these supporting members 2 are Radial diffusion arrangement, and the f-branch member 2 is formed in the shell 1 by powder sintering, so that each support, the surface of the member 2 is formed with a porous capillary structure, and the support members 2 An opening 21 is enclosed at a position corresponding to the central processing unit 20, so that the heat generated after heat exchange in the casing 丨 can be radiated upward from the opening 21 to the top casing 12.

、,明參妝第四、五、六圖所示,本創作中,各支撐構令 二:結的方式直接成形於殼體1内由於,在該壳 ,的底糾及頂殼12之内壁面上分別形成有溝槽⑴、 娃#故/可使該等支撐構件2在燒結於殼體1内時,各支名 在一2知係利用溝槽111、121與底殼11及頂殼12分別的嵌言S 使久古令各支撐構件2與殼體1間緊密的貼合在一起, 設有工4U2。能更穩固的燒結在殼體1 β,並在殼體1户 器20 圖所示,當將該導熱板10使用在中央“ 並使各係:置在中央處理器20之上表面處, ,另,可在贫道 所叹之開孔2 1相對應於中央處理器2丨 以導熱板10之上方處安裝有鋁擠型散熱器3結 M257478 四、創作說明(5) 散熱風扇。 轉後所產生的熱源會 經熱交換後所產生的 孔2 1在上散發,'因導 上方設有一散熱器3 使向上散發之熱氣於 而液體則再沿著頂殼 成的毛細組織所吸收 作流體持續的與中央 作之導熱板1 〇具有以 、進行散熱時,當中央處理器20運 與導熱板1 0内之工作流體作熱交換, 熱氣則會沿著各支撐構件2所設之開 熱板1 0頂端遠離中央處理器2 〇,且在 ’會使導熱板1 0頂面的溫度較低,而 頂殼1 2的溝槽1 2 1處被冷卻成液體, 1 2壁面之溝槽1 2 1被各支撐構件2所形 ’再傳遞至殼體1之底殼丨丨處,使工 處理器20作熱交換。 經由上述結構說明後可知,本創 下之優點: (a )本創作中,該導熱板1 0内之毛細組織除可作 支件2外,更可穩固的結合在導熱板1〇之内壁面上了 以提高毛細組織之吸收速度及時間。 (b )本創作中,在該導熱板1〇之頂殼12内壁面處因 設有連續溝槽1 2 1 ,故可增加冷凝面積與冷凝效率,俾使 熱源經熱父換後所產生的熱氣能快速的冷卻成液體。 (c ) 本創作中,該導熱板1 〇内經冷卻後的液體能迅 速的以毛細方式吸收傳導至導熱板1〇底面,使導熱板1〇的 + 汽相變化量加大,速度加快,進而提昇整個導熱板丨〇之散 熱效率。 綜上所述,本創作之「導 由上述所揭露之構造,達到所 熱板結構改良」,的確能藉 述之功效。且本創作申請前As shown in Figures 4, 5, and 6 of the Mingshen makeup, in this creation, each supporting structure is ordered 2: the way of knotting is directly formed in the shell 1, because the bottom of the shell and the top shell 12 Grooves ⑴ and 娃 # are formed on the wall, so that when the supporting members 2 are sintered in the housing 1, each branch is known by the use of the grooves 111, 121 and the bottom shell 11 and the top shell. 12 Separate inscriptions S make the support members 2 and the housing 1 closely fit together for a long time, and are provided with 4U2. It can be more sintered in the housing 1 β, and in the housing 1 20 as shown in the figure. When the heat transfer plate 10 is used in the center, and the systems are placed on the upper surface of the central processing unit 20, In addition, the opening 2 1 sighed in the poor road corresponds to the central processing unit 2 丨 An aluminum extruded heat sink 3 junction M257478 is installed above the heat transfer plate 10 IV. Creation instructions (5) Cooling fan. The generated heat source will be radiated through the holes 2 1 generated after heat exchange. 'Because there is a heat sink 3 above the guide, the upwardly radiated gas will be absorbed by the liquid, and the liquid will be absorbed by the capillary tissue formed by the top shell as a fluid. When the heat conduction plate 10 with the center is continuously used for heat dissipation, when the central processing unit 20 carries heat exchange with the working fluid in the heat conduction plate 10, the heat will be heated along the heat provided by each support member 2. The top of the board 10 is far away from the central processing unit 20, and the temperature at the top surface of the heat conducting board 10 will be lower, while the grooves 12 of the top shell 12 are cooled to a liquid, and the grooves of the wall surface 12 1 2 1 is shaped by each supporting member 2 and then transferred to the bottom case 丨 丨 of the housing 1 so that the processor 20 After exchanging the above structure, we can know the advantages of this invention: (a) In this work, the capillary structure in the heat conductive plate 10 can be used as the support 2 and can be firmly combined with the heat conductive plate 10. (B) In this creation, continuous grooves 1 2 1 are provided on the inner wall surface of the top shell 12 of the heat conductive plate 10, so the condensation area and the surface area can be increased. Condensing efficiency, so that the hot gas generated after the heat source is replaced by the heat source can be quickly cooled into a liquid. (C) In this creation, the cooled liquid in the heat transfer plate 10 can be quickly absorbed and conducted to the heat conduction in a capillary manner. The bottom surface of the plate 10 increases the amount of vapor phase change of the heat transfer plate 10 and increases the speed, thereby improving the heat dissipation efficiency of the entire heat transfer plate. In summary, the "guided structure disclosed above, "Achieving the improvement of the structure of the hot plate" can indeed be borrowed. And before this creation application

第9 頁 M257478 四、創作說明(6) 未見於刊物亦未公開使用,誠已符合新型專利之新穎、進 步等要件。 惟,上述所揭之圖式及說明,僅為本創作之實施例而 已,非為限定本'創作之實施例;大凡熟悉該項技藝之人士 ,其所依本創作之特徵範疇,所作之其它等效變化或修飾 ,皆應涵蓋在以下本案之申請專利範圍内。Page 9 M257478 IV. Creative Instructions (6) It has not been seen in publications or used publicly. It has already met the requirements for novelty and progress of new patents. However, the figures and descriptions disclosed above are only examples of this creation, and are not intended to limit the examples of this creation. Anyone who is familiar with the technique, based on the characteristics of this creation, does other things. Equivalent changes or modifications should be covered by the scope of patent application in the following case.

第10頁 M257478 圖式簡單說明 [ 圖 式 簡 單說 明】 第 一 圖 係 習知 導熱板之 組合剖面圖。 第 二 圖 係 本創 作導熱板 之立體外觀分解圖 〇 第 二 圖 係 本創 作導熱板 之剖面分解圖。 第 四 圖 係 本創 作導熱板 之組合剖面圖。 第 五 圖 係 第四 圖A部份之放大示意圖。 第 六 圖 係 本創 作導熱板 之組合外觀圖。 第 七 圖 係 本創 作導熱板 之使用情形剖面圖 〇 C 元 件 代 表符 號〕 < 習 知 > 導 熱 板 10a 殼體 1 a 毛 細 組 織 2a 支撐構件 3a < 本創 作 > 導 熱 板 10 殼體 1 底 殼 11 頂殼 12 連 續 溝 槽 111 、 121 支撐構件 2 開 孔 21 中央處理器 20 散 熱 器 3 ΟPage 10 M257478 Brief description of the drawings [Simplified description of the drawings] The first picture is a sectional view of a conventional heat-conducting plate. The second picture is an exploded view of the three-dimensional appearance of the heat transfer plate. The second picture is an exploded view of the cross section of the heat transfer plate. The fourth figure is a combined sectional view of the original heat transfer plate. The fifth diagram is an enlarged schematic diagram of the fourth diagram A. The sixth figure is the combined appearance of the heat transfer plate. The seventh figure is a cross-sectional view of the use of the heat transfer plate of this creation. The representative symbol of the component] < conventional > heat transfer plate 10a housing 1 a capillary structure 2a support member 3a < this creation > heat transfer plate 10 housing 1 Bottom case 11 Top case 12 Continuous groove 111, 121 Support member 2 Opening hole 21 Central processing unit 20 Radiator 3 Ο

第11頁Page 11

Claims (1)

M257478 五、申請專利範圍 1 、一種導熱板結構改良,其具有一中空殼體,於殼 體上下内表面處分別設有橫向之連續溝槽,另設有複數支 撐構件’該等支樓構件係設置在殼體内’並與殼體^—t下 内表面'處所設之溝槽分別嵌設在一起,'使支撐構件的表面 上形成有呈多孔質的毛細組織。 2、如申請專利範圍第1項所述之導熱板結構改良, 其中該殼體係由底殼及頂殼所構成。 3 、如申請專利範圍第2項所述之導熱板結構改良, 其中該底殼及頂殼對應於中央處理器的位置處具有微量之 金屬燒結物。 4、 如申請專利範圍第1項所述之導熱板結構改良, 其中該等支撐構件係呈放射狀之擴散排列於殼體内部。 5、 如申請專利範圍第1項所述之導熱板結構改良, 其中該等支撐構件係以粉末燒結方式固定在殼體内,且與 殼體内壁面相緊密結合。 6、 如申請專利範圍第1項所述之導熱板結構改良, 其中該等支撐構件相對應於中央處理器之位置處係形成有 一開孔。M257478 V. Application for Patent Scope 1. An improvement of the structure of the heat-conducting plate, which has a hollow shell, with horizontal continuous grooves at the upper and lower inner surfaces of the shell, and a plurality of supporting members. The grooves provided in the casing 'and the lower inner surface of the casing ^' are respectively embedded together, so that a porous capillary structure is formed on the surface of the supporting member. 2. The heat-conducting plate structure is improved according to item 1 of the scope of patent application, wherein the shell is composed of a bottom shell and a top shell. 3. The heat-conducting plate structure improvement as described in item 2 of the scope of the patent application, wherein the bottom case and the top case have trace amounts of metal sintered material at positions corresponding to the central processing unit. 4. The structure of the heat conducting plate is improved as described in item 1 of the scope of the patent application, wherein the supporting members are radially diffused and arranged inside the casing. 5. The structural improvement of the heat conducting plate as described in item 1 of the scope of patent application, wherein the supporting members are fixed in the shell by powder sintering, and are tightly combined with the inner wall surface of the shell. 6. The structural improvement of the heat conducting plate as described in item 1 of the scope of patent application, wherein an opening is formed at a position corresponding to the central processing unit of the supporting members. 第12頁Page 12
TW93207916U 2004-05-20 2004-05-20 Improved structure of heat conducting plate TWM257478U (en)

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102810521A (en) * 2011-05-31 2012-12-05 奇鋐科技股份有限公司 Temperature-equalizing plate and manufacturing method thereof
TWI394031B (en) * 2007-12-31 2013-04-21 Foxconn Tech Co Ltd Heat sink
US8561674B2 (en) 2008-03-21 2013-10-22 Delta Electronics, Inc. Heat dissipation module and heat pipe thereof
TWI617783B (en) * 2017-06-23 2018-03-11 雙鴻科技股份有限公司 Vapor chamber
CN109121354A (en) * 2017-06-23 2019-01-01 泽鸿(广州)电子科技有限公司 Temperature-uniforming plate

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI394031B (en) * 2007-12-31 2013-04-21 Foxconn Tech Co Ltd Heat sink
US8561674B2 (en) 2008-03-21 2013-10-22 Delta Electronics, Inc. Heat dissipation module and heat pipe thereof
CN102810521A (en) * 2011-05-31 2012-12-05 奇鋐科技股份有限公司 Temperature-equalizing plate and manufacturing method thereof
CN102810521B (en) * 2011-05-31 2015-08-19 奇鋐科技股份有限公司 Equalizing plate structure and manufacture method thereof
TWI617783B (en) * 2017-06-23 2018-03-11 雙鴻科技股份有限公司 Vapor chamber
CN109121354A (en) * 2017-06-23 2019-01-01 泽鸿(广州)电子科技有限公司 Temperature-uniforming plate

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