TWI905659B - 帶電粒子線裝置 - Google Patents

帶電粒子線裝置

Info

Publication number
TWI905659B
TWI905659B TW113105216A TW113105216A TWI905659B TW I905659 B TWI905659 B TW I905659B TW 113105216 A TW113105216 A TW 113105216A TW 113105216 A TW113105216 A TW 113105216A TW I905659 B TWI905659 B TW I905659B
Authority
TW
Taiwan
Prior art keywords
aforementioned
defect
observation image
sample
light
Prior art date
Application number
TW113105216A
Other languages
English (en)
Chinese (zh)
Other versions
TW202437310A (zh
Inventor
平野大輔
Original Assignee
日商日立全球先端科技股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商日立全球先端科技股份有限公司 filed Critical 日商日立全球先端科技股份有限公司
Publication of TW202437310A publication Critical patent/TW202437310A/zh
Application granted granted Critical
Publication of TWI905659B publication Critical patent/TWI905659B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/222—Image processing arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
TW113105216A 2023-03-09 2024-02-15 帶電粒子線裝置 TWI905659B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
PCT/JP2023/009147 WO2024185143A1 (ja) 2023-03-09 2023-03-09 荷電粒子線装置
WOPCT/JP2023/009147 2023-03-09

Publications (2)

Publication Number Publication Date
TW202437310A TW202437310A (zh) 2024-09-16
TWI905659B true TWI905659B (zh) 2025-11-21

Family

ID=92674586

Family Applications (1)

Application Number Title Priority Date Filing Date
TW113105216A TWI905659B (zh) 2023-03-09 2024-02-15 帶電粒子線裝置

Country Status (4)

Country Link
JP (1) JPWO2024185143A1 (https=)
KR (1) KR20250129060A (https=)
TW (1) TWI905659B (https=)
WO (1) WO2024185143A1 (https=)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201132968A (en) * 2009-08-12 2011-10-01 Hermes Microvision Inc Charged particle beam inspection method
TW202036600A (zh) * 2019-03-27 2020-10-01 日商日立全球先端科技股份有限公司 荷電粒子線裝置
TW202336797A (zh) * 2021-10-05 2023-09-16 美商科磊股份有限公司 用於帶電粒子工具之帶通帶電粒子能量過濾偵測器

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11393657B2 (en) 2018-09-11 2022-07-19 Hitachi High-Tech Corporation Electron beam device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201132968A (en) * 2009-08-12 2011-10-01 Hermes Microvision Inc Charged particle beam inspection method
TW202036600A (zh) * 2019-03-27 2020-10-01 日商日立全球先端科技股份有限公司 荷電粒子線裝置
US20220139667A1 (en) * 2019-03-27 2022-05-05 Hitachi High-Tech Corporation Charged particle beam device
TW202336797A (zh) * 2021-10-05 2023-09-16 美商科磊股份有限公司 用於帶電粒子工具之帶通帶電粒子能量過濾偵測器

Also Published As

Publication number Publication date
WO2024185143A1 (ja) 2024-09-12
TW202437310A (zh) 2024-09-16
JPWO2024185143A1 (https=) 2024-09-12
KR20250129060A (ko) 2025-08-28

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