KR20250129060A - 하전 입자선 장치 - Google Patents

하전 입자선 장치

Info

Publication number
KR20250129060A
KR20250129060A KR1020257024936A KR20257024936A KR20250129060A KR 20250129060 A KR20250129060 A KR 20250129060A KR 1020257024936 A KR1020257024936 A KR 1020257024936A KR 20257024936 A KR20257024936 A KR 20257024936A KR 20250129060 A KR20250129060 A KR 20250129060A
Authority
KR
South Korea
Prior art keywords
defect
sample
observation image
light
computer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020257024936A
Other languages
English (en)
Korean (ko)
Inventor
다이스께 히라노
Original Assignee
주식회사 히타치하이테크
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 히타치하이테크 filed Critical 주식회사 히타치하이테크
Publication of KR20250129060A publication Critical patent/KR20250129060A/ko
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/222—Image processing arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
KR1020257024936A 2023-03-09 2023-03-09 하전 입자선 장치 Pending KR20250129060A (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2023/009147 WO2024185143A1 (ja) 2023-03-09 2023-03-09 荷電粒子線装置

Publications (1)

Publication Number Publication Date
KR20250129060A true KR20250129060A (ko) 2025-08-28

Family

ID=92674586

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020257024936A Pending KR20250129060A (ko) 2023-03-09 2023-03-09 하전 입자선 장치

Country Status (4)

Country Link
JP (1) JPWO2024185143A1 (https=)
KR (1) KR20250129060A (https=)
TW (1) TWI905659B (https=)
WO (1) WO2024185143A1 (https=)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020053967A1 (ja) 2018-09-11 2020-03-19 株式会社日立ハイテクノロジーズ 電子線装置
WO2020194575A1 (ja) 2019-03-27 2020-10-01 株式会社日立ハイテク 荷電粒子線装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8692214B2 (en) * 2009-08-12 2014-04-08 Hermes Microvision, Inc. Charged particle beam inspection method
US11749495B2 (en) * 2021-10-05 2023-09-05 KLA Corp. Bandpass charged particle energy filtering detector for charged particle tools

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020053967A1 (ja) 2018-09-11 2020-03-19 株式会社日立ハイテクノロジーズ 電子線装置
WO2020194575A1 (ja) 2019-03-27 2020-10-01 株式会社日立ハイテク 荷電粒子線装置

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
Quan Sun et al. "Direct imaging of the near field and dynamics of surface plasmon resonance on gold nanostructures using photoemission electron microscopy", Light: Science & Applications, December 2013
Zhaogang Dong et al. "Ultraviolet Interband Plasmonics with Si nanostructures", Nano Letters, September 2019

Also Published As

Publication number Publication date
WO2024185143A1 (ja) 2024-09-12
TW202437310A (zh) 2024-09-16
TWI905659B (zh) 2025-11-21
JPWO2024185143A1 (https=) 2024-09-12

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PA0105 International application

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PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

Q12 Application published

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D21 Rejection of application intended

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PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902