TWI888844B - 試料測定裝置 - Google Patents

試料測定裝置 Download PDF

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Publication number
TWI888844B
TWI888844B TW112121830A TW112121830A TWI888844B TW I888844 B TWI888844 B TW I888844B TW 112121830 A TW112121830 A TW 112121830A TW 112121830 A TW112121830 A TW 112121830A TW I888844 B TWI888844 B TW I888844B
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TW
Taiwan
Prior art keywords
sample
control device
light
charged particles
detector
Prior art date
Application number
TW112121830A
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English (en)
Chinese (zh)
Other versions
TW202407342A (zh
Inventor
白崎保宏
內保美南
備前大輔
榊原慎
Original Assignee
日商日立全球先端科技股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 日商日立全球先端科技股份有限公司 filed Critical 日商日立全球先端科技股份有限公司
Publication of TW202407342A publication Critical patent/TW202407342A/zh
Application granted granted Critical
Publication of TWI888844B publication Critical patent/TWI888844B/zh

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/314—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry with comparison of measurements at specific and non-specific wavelengths
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/33—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using ultraviolet light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/2204—Specimen supports therefor; Sample conveying means therefore
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/07—Investigating materials by wave or particle radiation secondary emission
    • G01N2223/071—Investigating materials by wave or particle radiation secondary emission combination of measurements, at least 1 secondary emission
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/60—Specific applications or type of materials
    • G01N2223/611—Specific applications or type of materials patterned objects; electronic devices
    • G01N2223/6116—Specific applications or type of materials patterned objects; electronic devices semiconductor wafer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/60—Specific applications or type of materials
    • G01N2223/646—Specific applications or type of materials flaws, defects

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
TW112121830A 2022-08-05 2023-06-12 試料測定裝置 TWI888844B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
PCT/JP2022/030067 WO2024029060A1 (ja) 2022-08-05 2022-08-05 試料測定装置
WOPCT/JP2022/030067 2022-08-05

Publications (2)

Publication Number Publication Date
TW202407342A TW202407342A (zh) 2024-02-16
TWI888844B true TWI888844B (zh) 2025-07-01

Family

ID=89848742

Family Applications (1)

Application Number Title Priority Date Filing Date
TW112121830A TWI888844B (zh) 2022-08-05 2023-06-12 試料測定裝置

Country Status (4)

Country Link
JP (1) JPWO2024029060A1 (https=)
KR (1) KR20240158319A (https=)
TW (1) TWI888844B (https=)
WO (1) WO2024029060A1 (https=)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040089805A1 (en) * 1998-03-09 2004-05-13 Hitachi, Ltd. Scanning electron microscope
US20210066029A1 (en) * 2019-08-30 2021-03-04 Hitachi High-Tech Corporation Charged particle beam device
TW202229850A (zh) * 2021-01-21 2022-08-01 日商紐富來科技股份有限公司 多射束圖像取得裝置及多射束圖像取得方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09162253A (ja) * 1995-12-08 1997-06-20 Hitachi Ltd 半導体評価装置
KR100327337B1 (ko) * 1999-08-17 2002-03-06 윤종용 반도체 장치 제조에서 사용되는 플라즈마에 의해서 유기되는전하 대전 정도를 판별하는 방법 및 이에 이용되는 판별장치
JP2001144155A (ja) 1999-11-18 2001-05-25 Matsushita Electronics Industry Corp 半導体解析装置および解析方法
JP4248382B2 (ja) * 2003-12-04 2009-04-02 株式会社日立ハイテクノロジーズ 荷電粒子ビームによる検査方法および検査装置
JP2007322411A (ja) * 2006-05-02 2007-12-13 Univ Of Tokyo エネルギー準位の測定方法、分析方法
JP5434164B2 (ja) * 2009-03-16 2014-03-05 株式会社リコー 静電潜像の評価方法、静電潜像の評価装置および画像形成装置
JP6232195B2 (ja) * 2013-03-21 2017-11-15 株式会社荏原製作所 試料検査装置及び試料の検査方法
CN108603851B (zh) * 2016-03-16 2021-01-01 株式会社日立高新技术 缺陷检查装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040089805A1 (en) * 1998-03-09 2004-05-13 Hitachi, Ltd. Scanning electron microscope
US20210066029A1 (en) * 2019-08-30 2021-03-04 Hitachi High-Tech Corporation Charged particle beam device
TW202229850A (zh) * 2021-01-21 2022-08-01 日商紐富來科技股份有限公司 多射束圖像取得裝置及多射束圖像取得方法

Also Published As

Publication number Publication date
JPWO2024029060A1 (https=) 2024-02-08
TW202407342A (zh) 2024-02-16
WO2024029060A1 (ja) 2024-02-08
KR20240158319A (ko) 2024-11-04

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