JPWO2024029060A1 - - Google Patents
Info
- Publication number
- JPWO2024029060A1 JPWO2024029060A1 JP2024538635A JP2024538635A JPWO2024029060A1 JP WO2024029060 A1 JPWO2024029060 A1 JP WO2024029060A1 JP 2024538635 A JP2024538635 A JP 2024538635A JP 2024538635 A JP2024538635 A JP 2024538635A JP WO2024029060 A1 JPWO2024029060 A1 JP WO2024029060A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/314—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry with comparison of measurements at specific and non-specific wavelengths
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/33—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using ultraviolet light
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/2204—Specimen supports therefor; Sample conveying means therefore
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
- G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/07—Investigating materials by wave or particle radiation secondary emission
- G01N2223/071—Investigating materials by wave or particle radiation secondary emission combination of measurements, at least 1 secondary emission
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/60—Specific applications or type of materials
- G01N2223/611—Specific applications or type of materials patterned objects; electronic devices
- G01N2223/6116—Specific applications or type of materials patterned objects; electronic devices semiconductor wafer
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/60—Specific applications or type of materials
- G01N2223/646—Specific applications or type of materials flaws, defects
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2022/030067 WO2024029060A1 (ja) | 2022-08-05 | 2022-08-05 | 試料測定装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2024029060A1 true JPWO2024029060A1 (https=) | 2024-02-08 |
Family
ID=89848742
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024538635A Pending JPWO2024029060A1 (https=) | 2022-08-05 | 2022-08-05 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPWO2024029060A1 (https=) |
| KR (1) | KR20240158319A (https=) |
| TW (1) | TWI888844B (https=) |
| WO (1) | WO2024029060A1 (https=) |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09162253A (ja) * | 1995-12-08 | 1997-06-20 | Hitachi Ltd | 半導体評価装置 |
| WO1999046798A1 (en) * | 1998-03-09 | 1999-09-16 | Hitachi, Ltd. | Scanning electron microscope |
| JP2001093892A (ja) * | 1999-08-17 | 2001-04-06 | Samsung Electronics Co Ltd | 半導体装置の製造において使われるプラズマによって誘起される電荷帯電程度を判別する方法およびこれに用いられる判別装置 |
| JP2005164451A (ja) * | 2003-12-04 | 2005-06-23 | Hitachi Ltd | 荷電粒子ビームによる検査方法および検査装置 |
| WO2007129596A1 (ja) * | 2006-05-02 | 2007-11-15 | The University Of Tokyo | エネルギー準位の測定方法、分析方法 |
| JP2010216931A (ja) * | 2009-03-16 | 2010-09-30 | Ricoh Co Ltd | 静電潜像の評価方法、静電潜像の評価装置および画像形成装置 |
| JP2014182984A (ja) * | 2013-03-21 | 2014-09-29 | Ebara Corp | 試料検査装置及び試料の検査方法 |
| WO2017158742A1 (ja) * | 2016-03-16 | 2017-09-21 | 株式会社 日立ハイテクノロジーズ | 欠陥検査装置 |
| JP2021039844A (ja) * | 2019-08-30 | 2021-03-11 | 株式会社日立ハイテク | 荷電粒子線装置 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001144155A (ja) | 1999-11-18 | 2001-05-25 | Matsushita Electronics Industry Corp | 半導体解析装置および解析方法 |
| JP7547227B2 (ja) * | 2021-01-21 | 2024-09-09 | 株式会社ニューフレアテクノロジー | マルチビーム画像取得装置及びマルチビーム画像取得方法 |
-
2022
- 2022-08-05 JP JP2024538635A patent/JPWO2024029060A1/ja active Pending
- 2022-08-05 WO PCT/JP2022/030067 patent/WO2024029060A1/ja not_active Ceased
- 2022-08-05 KR KR1020247033184A patent/KR20240158319A/ko active Pending
-
2023
- 2023-06-12 TW TW112121830A patent/TWI888844B/zh active
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09162253A (ja) * | 1995-12-08 | 1997-06-20 | Hitachi Ltd | 半導体評価装置 |
| WO1999046798A1 (en) * | 1998-03-09 | 1999-09-16 | Hitachi, Ltd. | Scanning electron microscope |
| JP2001093892A (ja) * | 1999-08-17 | 2001-04-06 | Samsung Electronics Co Ltd | 半導体装置の製造において使われるプラズマによって誘起される電荷帯電程度を判別する方法およびこれに用いられる判別装置 |
| JP2005164451A (ja) * | 2003-12-04 | 2005-06-23 | Hitachi Ltd | 荷電粒子ビームによる検査方法および検査装置 |
| WO2007129596A1 (ja) * | 2006-05-02 | 2007-11-15 | The University Of Tokyo | エネルギー準位の測定方法、分析方法 |
| JP2010216931A (ja) * | 2009-03-16 | 2010-09-30 | Ricoh Co Ltd | 静電潜像の評価方法、静電潜像の評価装置および画像形成装置 |
| JP2014182984A (ja) * | 2013-03-21 | 2014-09-29 | Ebara Corp | 試料検査装置及び試料の検査方法 |
| WO2017158742A1 (ja) * | 2016-03-16 | 2017-09-21 | 株式会社 日立ハイテクノロジーズ | 欠陥検査装置 |
| JP2021039844A (ja) * | 2019-08-30 | 2021-03-11 | 株式会社日立ハイテク | 荷電粒子線装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI888844B (zh) | 2025-07-01 |
| TW202407342A (zh) | 2024-02-16 |
| WO2024029060A1 (ja) | 2024-02-08 |
| KR20240158319A (ko) | 2024-11-04 |
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