TWI876438B - 光源單元、照明單元、曝光裝置、及曝光方法 - Google Patents

光源單元、照明單元、曝光裝置、及曝光方法 Download PDF

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Publication number
TWI876438B
TWI876438B TW112127509A TW112127509A TWI876438B TW I876438 B TWI876438 B TW I876438B TW 112127509 A TW112127509 A TW 112127509A TW 112127509 A TW112127509 A TW 112127509A TW I876438 B TWI876438 B TW I876438B
Authority
TW
Taiwan
Prior art keywords
light
optical system
light source
illumination
emitting
Prior art date
Application number
TW112127509A
Other languages
English (en)
Chinese (zh)
Other versions
TW202427061A (zh
Inventor
岩永正也
川戸聡
Original Assignee
日商尼康股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商尼康股份有限公司 filed Critical 日商尼康股份有限公司
Publication of TW202427061A publication Critical patent/TW202427061A/zh
Application granted granted Critical
Publication of TWI876438B publication Critical patent/TWI876438B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70183—Zoom systems for adjusting beam diameter
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Led Devices (AREA)
TW112127509A 2022-08-18 2023-07-24 光源單元、照明單元、曝光裝置、及曝光方法 TWI876438B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
WOPCT/JP2022/031191 2022-08-18
PCT/JP2022/031191 WO2024038533A1 (ja) 2022-08-18 2022-08-18 光源ユニット、照明ユニット、露光装置、及び露光方法

Publications (2)

Publication Number Publication Date
TW202427061A TW202427061A (zh) 2024-07-01
TWI876438B true TWI876438B (zh) 2025-03-11

Family

ID=89941575

Family Applications (2)

Application Number Title Priority Date Filing Date
TW112127509A TWI876438B (zh) 2022-08-18 2023-07-24 光源單元、照明單元、曝光裝置、及曝光方法
TW114104002A TW202522134A (zh) 2022-08-18 2023-07-24 光源單元

Family Applications After (1)

Application Number Title Priority Date Filing Date
TW114104002A TW202522134A (zh) 2022-08-18 2023-07-24 光源單元

Country Status (5)

Country Link
JP (1) JPWO2024038533A1 (https=)
KR (1) KR20250022863A (https=)
CN (1) CN119585678A (https=)
TW (2) TWI876438B (https=)
WO (1) WO2024038533A1 (https=)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006332077A (ja) * 2005-05-23 2006-12-07 Nikon Corp 光源ユニット、照明光学装置、露光装置、および露光方法
TW201104365A (en) * 2009-05-07 2011-02-01 Ultratech Inc LED-based UV illuminators and lithography systems using same

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3950553B2 (ja) 1998-06-30 2007-08-01 キヤノン株式会社 照明光学系及びそれを有する露光装置
JP5687013B2 (ja) * 2010-09-14 2015-03-18 株式会社Ｓｃｒｅｅｎホールディングス 露光装置および光源装置
JP7025683B2 (ja) * 2017-06-08 2022-02-25 ウシオ電機株式会社 光源装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006332077A (ja) * 2005-05-23 2006-12-07 Nikon Corp 光源ユニット、照明光学装置、露光装置、および露光方法
TW201104365A (en) * 2009-05-07 2011-02-01 Ultratech Inc LED-based UV illuminators and lithography systems using same

Also Published As

Publication number Publication date
KR20250022863A (ko) 2025-02-17
WO2024038533A1 (ja) 2024-02-22
JPWO2024038533A1 (https=) 2024-02-22
CN119585678A (zh) 2025-03-07
TW202427061A (zh) 2024-07-01
TW202522134A (zh) 2025-06-01

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