KR20250022863A - 광원 유닛, 조명 유닛, 노광 장치, 및 노광 방법 - Google Patents

광원 유닛, 조명 유닛, 노광 장치, 및 노광 방법 Download PDF

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Publication number
KR20250022863A
KR20250022863A KR1020257001692A KR20257001692A KR20250022863A KR 20250022863 A KR20250022863 A KR 20250022863A KR 1020257001692 A KR1020257001692 A KR 1020257001692A KR 20257001692 A KR20257001692 A KR 20257001692A KR 20250022863 A KR20250022863 A KR 20250022863A
Authority
KR
South Korea
Prior art keywords
light
optical system
light source
emitting
source unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020257001692A
Other languages
English (en)
Korean (ko)
Inventor
마사야 이와나가
사토시 가와도
Original Assignee
가부시키가이샤 니콘
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 니콘 filed Critical 가부시키가이샤 니콘
Publication of KR20250022863A publication Critical patent/KR20250022863A/ko
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70183—Zoom systems for adjusting beam diameter
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Led Devices (AREA)
KR1020257001692A 2022-08-18 2022-08-18 광원 유닛, 조명 유닛, 노광 장치, 및 노광 방법 Pending KR20250022863A (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2022/031191 WO2024038533A1 (ja) 2022-08-18 2022-08-18 光源ユニット、照明ユニット、露光装置、及び露光方法

Publications (1)

Publication Number Publication Date
KR20250022863A true KR20250022863A (ko) 2025-02-17

Family

ID=89941575

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020257001692A Pending KR20250022863A (ko) 2022-08-18 2022-08-18 광원 유닛, 조명 유닛, 노광 장치, 및 노광 방법

Country Status (5)

Country Link
JP (1) JPWO2024038533A1 (https=)
KR (1) KR20250022863A (https=)
CN (1) CN119585678A (https=)
TW (2) TWI876438B (https=)
WO (1) WO2024038533A1 (https=)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000021712A (ja) 1998-06-30 2000-01-21 Canon Inc 照明光学系及びそれを有する露光装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4678493B2 (ja) * 2005-05-23 2011-04-27 株式会社ニコン 光源ユニット、照明光学装置、露光装置、および露光方法
US20100283978A1 (en) * 2009-05-07 2010-11-11 Ultratech,Inc. LED-based UV illuminators and lithography systems using same
JP5687013B2 (ja) * 2010-09-14 2015-03-18 株式会社Ｓｃｒｅｅｎホールディングス 露光装置および光源装置
JP7025683B2 (ja) * 2017-06-08 2022-02-25 ウシオ電機株式会社 光源装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000021712A (ja) 1998-06-30 2000-01-21 Canon Inc 照明光学系及びそれを有する露光装置

Also Published As

Publication number Publication date
TWI876438B (zh) 2025-03-11
WO2024038533A1 (ja) 2024-02-22
JPWO2024038533A1 (https=) 2024-02-22
CN119585678A (zh) 2025-03-07
TW202427061A (zh) 2024-07-01
TW202522134A (zh) 2025-06-01

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