JPWO2024038533A1 - - Google Patents
Info
- Publication number
- JPWO2024038533A1 JPWO2024038533A1 JP2024541339A JP2024541339A JPWO2024038533A1 JP WO2024038533 A1 JPWO2024038533 A1 JP WO2024038533A1 JP 2024541339 A JP2024541339 A JP 2024541339A JP 2024541339 A JP2024541339 A JP 2024541339A JP WO2024038533 A1 JPWO2024038533 A1 JP WO2024038533A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
- G03F7/70183—Zoom systems for adjusting beam diameter
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Lenses (AREA)
- Led Devices (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2022/031191 WO2024038533A1 (ja) | 2022-08-18 | 2022-08-18 | 光源ユニット、照明ユニット、露光装置、及び露光方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2024038533A1 true JPWO2024038533A1 (https=) | 2024-02-22 |
| JPWO2024038533A5 JPWO2024038533A5 (https=) | 2026-04-24 |
Family
ID=89941575
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024541339A Pending JPWO2024038533A1 (https=) | 2022-08-18 | 2022-08-18 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPWO2024038533A1 (https=) |
| KR (1) | KR20250022863A (https=) |
| CN (1) | CN119585678A (https=) |
| TW (2) | TWI876438B (https=) |
| WO (1) | WO2024038533A1 (https=) |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3950553B2 (ja) | 1998-06-30 | 2007-08-01 | キヤノン株式会社 | 照明光学系及びそれを有する露光装置 |
| JP4678493B2 (ja) * | 2005-05-23 | 2011-04-27 | 株式会社ニコン | 光源ユニット、照明光学装置、露光装置、および露光方法 |
| US20100283978A1 (en) * | 2009-05-07 | 2010-11-11 | Ultratech,Inc. | LED-based UV illuminators and lithography systems using same |
| JP5687013B2 (ja) * | 2010-09-14 | 2015-03-18 | 株式会社Ｓｃｒｅｅｎホールディングス | 露光装置および光源装置 |
| JP7025683B2 (ja) * | 2017-06-08 | 2022-02-25 | ウシオ電機株式会社 | 光源装置 |
-
2022
- 2022-08-18 JP JP2024541339A patent/JPWO2024038533A1/ja active Pending
- 2022-08-18 WO PCT/JP2022/031191 patent/WO2024038533A1/ja not_active Ceased
- 2022-08-18 CN CN202280098506.3A patent/CN119585678A/zh active Pending
- 2022-08-18 KR KR1020257001692A patent/KR20250022863A/ko active Pending
-
2023
- 2023-07-24 TW TW112127509A patent/TWI876438B/zh active
- 2023-07-24 TW TW114104002A patent/TW202522134A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| TWI876438B (zh) | 2025-03-11 |
| KR20250022863A (ko) | 2025-02-17 |
| WO2024038533A1 (ja) | 2024-02-22 |
| CN119585678A (zh) | 2025-03-07 |
| TW202427061A (zh) | 2024-07-01 |
| TW202522134A (zh) | 2025-06-01 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20250508 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20250508 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20260416 |