TWI870413B - 用於腔室的統一電氣導管,及形成其之方法 - Google Patents
用於腔室的統一電氣導管,及形成其之方法 Download PDFInfo
- Publication number
- TWI870413B TWI870413B TW109118724A TW109118724A TWI870413B TW I870413 B TWI870413 B TW I870413B TW 109118724 A TW109118724 A TW 109118724A TW 109118724 A TW109118724 A TW 109118724A TW I870413 B TWI870413 B TW I870413B
- Authority
- TW
- Taiwan
- Prior art keywords
- conductor
- tube
- electrical conduit
- coupled
- flange
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32577—Electrical connecting means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/02—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
- H01B1/023—Alloys based on aluminium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/02—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
- H01B1/026—Alloys based on copper
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
- H01B13/06—Insulating conductors or cables
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
- H01B13/22—Sheathing; Armouring; Screening; Applying other protective layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B7/00—Insulated conductors or cables characterised by their form
- H01B7/17—Protection against damage caused by external factors, e.g. sheaths or armouring
- H01B7/18—Protection against damage caused by wear, mechanical force or pressure; Sheaths; Armouring
- H01B7/1875—Multi-layer sheaths
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B7/00—Insulated conductors or cables characterised by their form
- H01B7/42—Insulated conductors or cables characterised by their form with arrangements for heat dissipation or conduction
- H01B7/421—Insulated conductors or cables characterised by their form with arrangements for heat dissipation or conduction for heat dissipation
- H01B7/423—Insulated conductors or cables characterised by their form with arrangements for heat dissipation or conduction for heat dissipation using a cooling fluid
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32715—Workpiece holder
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02G—INSTALLATION OF ELECTRIC CABLES OR LINES, OR OF COMBINED OPTICAL AND ELECTRIC CABLES OR LINES
- H02G3/00—Installations of electric cables or lines or protective tubing therefor in or on buildings, equivalent structures or vehicles
- H02G3/02—Details
- H02G3/04—Protective tubing or conduits, e.g. cable ladders or cable troughs
- H02G3/0406—Details thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B7/00—Insulated conductors or cables characterised by their form
- H01B7/02—Disposition of insulation
- H01B7/0208—Cables with several layers of insulating material
- H01B7/0216—Two layers
Landscapes
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Structural Engineering (AREA)
- Civil Engineering (AREA)
- Architecture (AREA)
- Drying Of Semiconductors (AREA)
- Chemical Vapour Deposition (AREA)
- Plasma Technology (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201962858738P | 2019-06-07 | 2019-06-07 | |
| US62/858,738 | 2019-06-07 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW202113909A TW202113909A (zh) | 2021-04-01 |
| TWI870413B true TWI870413B (zh) | 2025-01-21 |
Family
ID=73651710
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW109118724A TWI870413B (zh) | 2019-06-07 | 2020-06-04 | 用於腔室的統一電氣導管,及形成其之方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US11368003B2 (https=) |
| JP (1) | JP7696840B2 (https=) |
| KR (1) | KR102810211B1 (https=) |
| CN (1) | CN113994451B (https=) |
| SG (1) | SG11202112708YA (https=) |
| TW (1) | TWI870413B (https=) |
| WO (1) | WO2020247375A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20220049350A1 (en) * | 2020-08-13 | 2022-02-17 | Applied Materials, Inc. | Apparatus design for photoresist deposition |
| US20240071729A1 (en) * | 2022-08-26 | 2024-02-29 | Applied Materials, Inc. | Gas cooled high power connection rod |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW368701B (en) * | 1997-01-24 | 1999-09-01 | Applied Materials Inc | A high temperature, high deposition rate process and apparatus for depositing titanium layers |
| CN101257159A (zh) * | 2007-01-31 | 2008-09-03 | 应用材料公司 | 到至少一个耗电设备的电压馈电器 |
| US7448906B1 (en) * | 2007-08-22 | 2008-11-11 | Andrew Llc | Hollow inner conductor contact for coaxial cable connector |
| TW201227870A (en) * | 2010-10-22 | 2012-07-01 | Applied Materials Inc | Substrate support with symmetrical feed structure |
| TW201440142A (zh) * | 2007-04-27 | 2014-10-16 | 應用材料股份有限公司 | 環形擋板 |
| WO2015047722A1 (en) * | 2013-09-26 | 2015-04-02 | Applied Materials, Inc. | Rotatable substrate support having radio frequency applicator |
Family Cites Families (39)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2762025A (en) * | 1953-02-11 | 1956-09-04 | Erich P Tilenius | Shielded cable connectors |
| US3336563A (en) * | 1964-04-13 | 1967-08-15 | Amphenol Corp | Coaxial connectors |
| US3871735A (en) * | 1973-08-23 | 1975-03-18 | Amp Inc | Shielded high voltage connector |
| US3982059A (en) * | 1974-12-26 | 1976-09-21 | The Machlett Laboratories, Incorporated | Flexible cable termination |
| US4046451A (en) * | 1976-07-08 | 1977-09-06 | Andrew Corporation | Connector for coaxial cable with annularly corrugated outer conductor |
| US4479702A (en) * | 1982-07-06 | 1984-10-30 | Olin Corporation | Method and apparatus for assembling a compact multi-conductor optical fiber communication cable |
| US4426127A (en) * | 1981-11-23 | 1984-01-17 | Omni Spectra, Inc. | Coaxial connector assembly |
| US4485266A (en) * | 1982-07-29 | 1984-11-27 | The United States Of America As Represented By The United States Department Of Energy | Termination for a superconducting power transmission line including a horizontal cryogenic bushing |
| US4603023A (en) * | 1983-12-01 | 1986-07-29 | International Business Machines Corporation | Method of making a hybrid dielectric probe interposer |
| US4896939A (en) * | 1987-10-30 | 1990-01-30 | D. G. O'brien, Inc. | Hybrid fiber optic/electrical cable and connector |
| US5574815A (en) * | 1991-01-28 | 1996-11-12 | Kneeland; Foster C. | Combination cable capable of simultaneous transmission of electrical signals in the radio and microwave frequency range and optical communication signals |
| US5167533A (en) * | 1992-01-08 | 1992-12-01 | Andrew Corporation | Connector for coaxial cable having hollow inner conductors |
| US5302780A (en) * | 1992-06-29 | 1994-04-12 | Hughes Aircraft Company | Split coaxial cable conductor and method of fabrication |
| US6231357B1 (en) * | 1998-01-20 | 2001-05-15 | Relight America, Inc. | Waterproof high voltage connector |
| US6863835B1 (en) | 2000-04-25 | 2005-03-08 | James D. Carducci | Magnetic barrier for plasma in chamber exhaust |
| US6581275B2 (en) * | 2001-01-22 | 2003-06-24 | Applied Materials Inc. | Fabricating an electrostatic chuck having plasma resistant gas conduits |
| US6830939B2 (en) | 2002-08-28 | 2004-12-14 | Verity Instruments, Inc. | System and method for determining endpoint in etch processes using partial least squares discriminant analysis in the time domain of optical emission spectra |
| JP3962661B2 (ja) * | 2002-08-30 | 2007-08-22 | 三菱重工業株式会社 | 静電チャック支持機構及び支持台装置及びプラズマ処理装置 |
| US7134189B2 (en) * | 2002-09-12 | 2006-11-14 | Andrew Corporation | Coaxial cable connector and tool and method for connecting a coaxial cable |
| US6926555B2 (en) * | 2003-10-09 | 2005-08-09 | Radio Frequency Systems, Inc. | Tuned radio frequency coaxial connector |
| JP2005347620A (ja) | 2004-06-04 | 2005-12-15 | Tokyo Electron Ltd | プラズマ処理装置及びプラズマ処理装置の載置台ユニット |
| US7556718B2 (en) | 2004-06-22 | 2009-07-07 | Tokyo Electron Limited | Highly ionized PVD with moving magnetic field envelope for uniform coverage of feature structure and wafer |
| US7217155B2 (en) * | 2004-07-16 | 2007-05-15 | John Mezzalinaqua Associates, Inc. | Compression connector for braided coaxial cable |
| US20060254801A1 (en) * | 2005-05-27 | 2006-11-16 | Stevens Randall D | Shielded electrical transmission cables and methods for forming the same |
| US9520276B2 (en) * | 2005-06-22 | 2016-12-13 | Tokyo Electron Limited | Electrode assembly and plasma processing apparatus |
| KR100941070B1 (ko) | 2007-05-10 | 2010-02-09 | 세메스 주식회사 | 플라즈마를 이용하여 기판을 처리하는 장치 |
| JP5222598B2 (ja) | 2008-03-25 | 2013-06-26 | 東京エレクトロン株式会社 | プラズマ処理装置及び給電棒 |
| DE102010027619B3 (de) * | 2010-07-20 | 2011-11-17 | Roth & Rau Ag | Mikrowellenplasmaquelle mit einer Vorrichtung zur Zuführung von Mikrowellenenergie |
| US9088074B2 (en) * | 2011-07-14 | 2015-07-21 | Nuvotronics, Llc | Hollow core coaxial cables and methods of making the same |
| JP5969840B2 (ja) * | 2012-06-29 | 2016-08-17 | オリンパス株式会社 | 光電気複合コネクタ |
| JP6424049B2 (ja) | 2014-09-12 | 2018-11-14 | 株式会社日立ハイテクノロジーズ | プラズマ処理装置 |
| JP6478748B2 (ja) * | 2015-03-24 | 2019-03-06 | 東京エレクトロン株式会社 | マイクロ波プラズマ源およびプラズマ処理装置 |
| US10049862B2 (en) * | 2015-04-17 | 2018-08-14 | Lam Research Corporation | Chamber with vertical support stem for symmetric conductance and RF delivery |
| US20170040140A1 (en) | 2015-08-06 | 2017-02-09 | Seagate Technology Llc | Magnet array for plasma-enhanced chemical vapor deposition |
| US9805963B2 (en) * | 2015-10-05 | 2017-10-31 | Lam Research Corporation | Electrostatic chuck with thermal choke |
| JP6697346B2 (ja) * | 2016-07-20 | 2020-05-20 | 株式会社ディスコ | 吸着確認方法、離脱確認方法、及び減圧処理装置 |
| US10163609B2 (en) * | 2016-12-15 | 2018-12-25 | Taiwan Semiconductor Manufacturing Co., Ltd. | Plasma generation for ion implanter |
| JP6394721B2 (ja) * | 2017-03-03 | 2018-09-26 | 日立金属株式会社 | 同軸ケーブル |
| CN107093545B (zh) * | 2017-06-19 | 2019-05-31 | 北京北方华创微电子装备有限公司 | 反应腔室的下电极机构及反应腔室 |
-
2020
- 2020-06-02 JP JP2021572473A patent/JP7696840B2/ja active Active
- 2020-06-02 KR KR1020217043386A patent/KR102810211B1/ko active Active
- 2020-06-02 WO PCT/US2020/035709 patent/WO2020247375A1/en not_active Ceased
- 2020-06-02 SG SG11202112708YA patent/SG11202112708YA/en unknown
- 2020-06-02 CN CN202080041800.1A patent/CN113994451B/zh active Active
- 2020-06-03 US US16/891,429 patent/US11368003B2/en active Active
- 2020-06-04 TW TW109118724A patent/TWI870413B/zh active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW368701B (en) * | 1997-01-24 | 1999-09-01 | Applied Materials Inc | A high temperature, high deposition rate process and apparatus for depositing titanium layers |
| CN101257159A (zh) * | 2007-01-31 | 2008-09-03 | 应用材料公司 | 到至少一个耗电设备的电压馈电器 |
| TW201440142A (zh) * | 2007-04-27 | 2014-10-16 | 應用材料股份有限公司 | 環形擋板 |
| US7448906B1 (en) * | 2007-08-22 | 2008-11-11 | Andrew Llc | Hollow inner conductor contact for coaxial cable connector |
| TW201227870A (en) * | 2010-10-22 | 2012-07-01 | Applied Materials Inc | Substrate support with symmetrical feed structure |
| WO2015047722A1 (en) * | 2013-09-26 | 2015-04-02 | Applied Materials, Inc. | Rotatable substrate support having radio frequency applicator |
Also Published As
| Publication number | Publication date |
|---|---|
| US11368003B2 (en) | 2022-06-21 |
| SG11202112708YA (en) | 2021-12-30 |
| JP2022534804A (ja) | 2022-08-03 |
| JP7696840B2 (ja) | 2025-06-23 |
| TW202113909A (zh) | 2021-04-01 |
| WO2020247375A1 (en) | 2020-12-10 |
| CN113994451B (zh) | 2025-09-12 |
| KR20220027091A (ko) | 2022-03-07 |
| US20200388998A1 (en) | 2020-12-10 |
| KR102810211B1 (ko) | 2025-05-19 |
| CN113994451A (zh) | 2022-01-28 |
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